Patents by Inventor Yong Chen

Yong Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20090159567
    Abstract: An improved method of forming features on substrates by imprinting is provided. In the method, a polymer solution that contains at least one polymer dissolved in at least one polymerizable monomer and the polymer solution is deposited on the substrate to form a liquid film thereon. Further, the liquid film is cured by causing the at least one monomer to polymerize and optionally cross-linking the at least one polymer to thereby form a polymer film, the polymer film having a glass transition temperature of less than 100° C., and the polymer film is imprinted with a mold having a desired pattern to form a corresponding negative pattern in the polymer film. Alternatively, the liquid film is imprinted with the mold and the liquid film is cured in the presence of the mold to form the polymer film with the negative pattern.
    Type: Application
    Filed: March 3, 2009
    Publication date: June 25, 2009
    Inventors: Gun Young Jung, Sivapackia Ganapathiappan, Yong Chen, R. Stanley Williams
  • Publication number: 20090104550
    Abstract: A nanoscale lithographic method in which a reusable conductive mask, having a pattern of conductive surfaces and insulating surfaces, is positioned upon a substrate whose surface contains an electrically responsive resist layer over a buried conductive layer. When an electric field is applied between the conductive mask and buried conductive layer, the resist layer is altered in portions adjacent the conductive areas of the mask. Selective processing is performed on the surface of the substrate, after mask removal, to remove portions of the resist layer according to the pattern transferred from the mask. The substrate may be a target substrate, or the substrate may be utilized for a lithographic masking step of another substrate. In one aspect of the invention the electrodes to which the charge is applied are divided, such as into a plurality of rows and columns wherein any desired pattern may be created without the need to fabricate specific masks.
    Type: Application
    Filed: October 12, 2008
    Publication date: April 23, 2009
    Applicant: THE REGENTS OF THE UNIVERSITY OF CALIFORNIA
    Inventor: Yong Chen
  • Publication number: 20090054072
    Abstract: A system, comprising various methods and apparatus, for Reverse Link Admission Control (RLAC) with QoS differentiation in wireless communication systems is disclosed. With the present invention, wireless systems may admit new calls or transmission flows based upon sector loading conditions QoS requirements or characteristics of an incoming transmission—providing optimal system performance and stability while addressing QoS needs.
    Type: Application
    Filed: August 20, 2007
    Publication date: February 26, 2009
    Applicant: FutureWei Technologies, Inc.
    Inventors: Yong Chen, Mazin Al-Shalash
  • Publication number: 20090026122
    Abstract: A biocompatible coating for solid phase microextraction (SPME) of a small molecule from a biological matrix. The coating comprises SPME particles and a biocompatible polymer. The biocompatible polymer (e.g. polyacrylonitrile) reduces adsorption of proteins or macromolecules onto the SPME particles and allows the SPME particles to extract the small molecule from the matrix. A process for coating a flexible fiber with a biocompatible coating. The process comprises: coating the fiber with a suspension of SPME particles, the SPME particles being suspended in a solution of a biocompatible polymer and a solvent, the biocompatible polymer can comprise polyacrylonitrile (PAN); drying the coated fiber to remove the solvent; and curing the dried coated fiber at an elevated temperature.
    Type: Application
    Filed: July 16, 2008
    Publication date: January 29, 2009
    Applicant: Janusz
    Inventors: Janusz B. Pawliszyn, Florin Marcel Musteata, Mihaela L. Musteata, Robert E. Shirey, Leonard M. Sidisky, Yong Chen
  • Publication number: 20080318855
    Abstract: This invention is generally directed to a recombinant method of producing SDF-1 receptor antagonists. More particularly, the invention is directed to the isolated and/or recombinant polynucleotide sequences encoding analogs of human SDF-1 alpha or beta and, in particular, SDF-1 analogs having the proline at residue position number 2 replaced with a glycine to provide an SDF-1 receptor antagonist. The recombinant method can be used to produce drugs for a variety of therapeutic uses including, but not limited to, treatment of cancer, inhibiting angiogenesis, and hematopoietic cell proliferation.
    Type: Application
    Filed: May 23, 2007
    Publication date: December 25, 2008
    Applicant: CHEMOKINE CORPORATION
    Inventors: Yong Chen, Gleb Feldman, Hassan Salari
  • Publication number: 20080296785
    Abstract: Methods for forming a predetermined pattern of catalytic regions having nanoscale dimensions are provided for use in the growth of nanowires. The methods include one or more nanoimprinting steps to produce arrays of catalytic nanoislands or nanoscale regions of catalytic material circumscribed by noncatalytic material.
    Type: Application
    Filed: April 23, 2008
    Publication date: December 4, 2008
    Inventors: Theodore I. Kamins, Philip J. Kuekes, Yong Chen
  • Patent number: 7455788
    Abstract: A nanoscale lithographic method in which a reusable conductive mask, having a pattern of conductive surfaces and insulating surfaces, is positioned upon a substrate whose surface contains an electrically responsive resist layer over a buried conductive layer. When an electric field is applied between the conductive mask and buried conductive layer, the resist layer is altered in portions adjacent the conductive areas of the mask. Selective processing is performed on the surface of the substrate, after mask removal, to remove portions of the resist layer according to the pattern transferred from the mask. The substrate may be a target substrate, or the substrate may be utilized for a lithographic masking step of another substrate. In one aspect of the invention the electrodes to which the charge is applied are divided, such as into a plurality of rows and columns wherein any desired pattern may be created without the need to fabricate specific masks.
    Type: Grant
    Filed: June 29, 2006
    Date of Patent: November 25, 2008
    Assignee: The Regents of the University of California
    Inventor: Yong Chen
  • Publication number: 20080283624
    Abstract: A multiple nozzle differential fluid delivery head is disclosed. The fluid delivery head includes a body that defines a fluid chamber having a longitudinal axis. The body includes an inlet for connection to a fluid source, and the inlet is in fluid communication with the fluid chamber. The fluid delivery head includes a plurality of outlet ports connected to and extending away from the body. Each outlet port has an interior space in fluid communication with the fluid chamber. The fluid delivery head includes a nozzle insert removably secured in an outer end of each outlet port. At least one nozzle insert has a fluid delivery aperture in fluid communication with the interior space of its associated outlet port for delivering fluid out of the interior space of its associated outlet port. One or more of the outlet ports is angled away from a plane normal to the axis of the fluid delivery head.
    Type: Application
    Filed: May 16, 2007
    Publication date: November 20, 2008
    Inventors: Michael M. Sawalski, Michael J. Skalitzky, Nitin Sharma, Padma Prabodh Varanasi, Yong Chen, Allen D. Miller
  • Patent number: 7445742
    Abstract: A method and mold for creating nanoscale patterns in an ion-selective polymer membrane is provided, in which a mold comprising a substrate and a molding layer having at least one protruding feature is imprinted on the ion-selective polymer membrane, thereby creating a recessed feature in the membrane. Protruding features having nanoscale dimensions can be created, e.g., by using self-assembled nanostructures as a shadow mask for etching a molding layer. In one embodiment, an imprinted ion selective polymer membrane, suitable for use as a solid electrolyte, is adapted for use in an electrochemical device or fuel cell by adding a metal catalyst to one portion of the membrane to serve as a catalytic electrode.
    Type: Grant
    Filed: August 15, 2003
    Date of Patent: November 4, 2008
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Yong Chen, David Hacklernan, Laurie S. Mittelstadt, Yoocham Jeon, Richard Stanley Williams
  • Publication number: 20080259352
    Abstract: A detecting apparatus used in a bonding apparatus including a capillary and a detection camera disposed with a certain amount of offset from the capillary and capable of detecting a press-bonded ball at a bonding portion after bonding. For a pad in which two edges of a press-bonded ball corresponding to two adjacent sides of the pad are definite, the detecting apparatus detects the respective distances between the two sides of the pad and the corresponding two edges of the press-bonded ball, and compares the detected values to determine if these values fall within previously set allowable ranges; and if the detected values are outside the allowable ranges, the amount of offset is corrected so that the press-bonded ball comes within the allowable ranges.
    Type: Application
    Filed: March 6, 2008
    Publication date: October 23, 2008
    Inventors: Kenji Sugawara, Yong Chen
  • Publication number: 20080203055
    Abstract: A technique is provided for forming a molecule or an array of molecules having a defined orientation relative to the substrate or for forming a mold for deposition of a material therein. The array of molecules is formed by dispersing them in an array of small, aligned holes (nanopores), or mold, in a substrate. Typically, the material in which the nanopores are formed is insulating. The underlying substrate may be either conducting or insulating. For electronic device applications, the substrate is, in general, electrically conducting and may be exposed at the bottom of the pores so that one end of the molecule in the nanopore makes electrical contact to the substrate. A substrate such as a single-crystal silicon wafer is especially convenient because many of the process steps to form the molecular array can use techniques well developed for semiconductor device and integrated-circuit fabrication.
    Type: Application
    Filed: October 3, 2007
    Publication date: August 28, 2008
    Inventors: Theodore I. Kamins, Yong Chen, Patricia A. Beck
  • Patent number: 7404981
    Abstract: A method is provided for printing electronic and opto-electronic circuits. The method comprises: (a) providing a substrate; (b) providing a film-forming precursor species; (c) forming a substantially uniform and continuous film of the film-forming precursor species on at least one side of the substrate, the film having a first electrical conductivity; and (d) altering portions of the film with at least one conductivity-altering species to form regions having a second electrical conductivity that is different than the first electrical conductivity, the regions thereby providing circuit elements. The method employs very simple and continuous processes, which make the time to produce a batch of circuits very short and leads to very inexpensive products, such as electronic memories (write once or rewriteable), electronically addressable displays, and generally any circuit for which organic electronics or opto-electronics are acceptable.
    Type: Grant
    Filed: April 21, 2003
    Date of Patent: July 29, 2008
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Xiao-An Zhang, R. Stanley Williams, Yong Chen
  • Patent number: 7378347
    Abstract: Methods for forming a predetermined pattern of catalytic regions having nanoscale dimensions are provided for use in the growth of nanowires. The methods include one or more nanoimprinting steps to produce arrays of catalytic nanoislands or nanoscale regions of catalytic material circumscribed by noncatalytic material.
    Type: Grant
    Filed: October 28, 2002
    Date of Patent: May 27, 2008
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Theodore I. Kamins, Philip J. Kuekes, Yong Chen
  • Patent number: 7368395
    Abstract: An imprinting apparatus and method of fabrication provide a mold having a pattern for imprinting. The apparatus includes a semiconductor substrate polished in a [110] direction. The semiconductor substrate has a (110) horizontal planar surface and vertical sidewalls of a wet chemical etched trench. The sidewalls are aligned with and therefore are (111) vertical lattice planes of the semiconductor substrate. The semiconductor substrate includes a plurality of vertical structures between the sidewalls, wherein the vertical structures may be nano-scale spaced apart. The method includes wet etching a trench with spaced apart (111) vertical sidewalls in an exposed portion of the (110) horizontal surface of the semiconductor substrate along (111) vertical lattice planes. A chemical etching solution is used that etches the (111) vertical lattice planes slower than the (110) horizontal lattice plane. The method further includes forming the imprinting mold.
    Type: Grant
    Filed: November 16, 2006
    Date of Patent: May 6, 2008
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: M. Saif Islam, Gun Young Jung, Yong Chen, R. Stanley Williams
  • Publication number: 20080094051
    Abstract: A demultiplexed nanowire sensor array for detecting different chemical and biological species are provided, comprising a sensor array and a demultiplexer array. Methods of detecting at least two chemical and/or biological species are also provided, using the demultiplexed nanowire sensor array.
    Type: Application
    Filed: October 19, 2006
    Publication date: April 24, 2008
    Inventors: R. Stanley Williams, Philip J. Kuekes, Yong Chen
  • Publication number: 20080054531
    Abstract: A solid imaging apparatus and method employing levels of exposure varied with gray scale or time or both of digitally light projected image of a cross-section of a three-dimensional object on a solidifiable photopolymer build material. The gray scale levels of exposure of projected pixels permits the polymerization boundaries in projected boundary pixels to be controlled to achieve preserved image features in a three-dimensional object and smooth out rough or uneven edges that would otherwise occur using digital light projectors that are limited by the number of pixels in an image projected over the size of the image. Software is used to control intensity parameters applied to pixels to be illuminated in the image projected in the cross-section being exposed in the image plane.
    Type: Application
    Filed: August 29, 2006
    Publication date: March 6, 2008
    Inventors: Thomas Alan Kerekes, Jouni P. Partanen, Yong Chen, Charles W. Hull
  • Patent number: 7335579
    Abstract: A memory device including a substrate, and multiple self-aligned nano-rectifying elements disposed over the substrate. Each nano-rectifying element has multiple first electrode lines, and multiple device structures disposed on the multiple first electrode lines forming the multiple self-aligned nano-rectifying elements. Each device structure has at least one lateral dimension less than about 75 nanometers. The memory device also includes multiple switching elements disposed over the device structures and self-aligned in at least one direction with the device structures. In addition, the memory device includes multiple second electrode lines disposed over, electrically coupled to, and self-aligned to the switching elements, whereby a memory device is formed.
    Type: Grant
    Filed: January 12, 2006
    Date of Patent: February 26, 2008
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: James Stasiak, Kevin F Peters, Jennifer Wu, Pavel Kornilovich, Yong Chen
  • Patent number: 7307571
    Abstract: Various embodiments of the present invention are directed to a binary signal converter that facilitates distinguishing an original direct signal on a nanowire by superimposing an alternating signal on the original direct signal. The binary signal converter includes an alternating signal source connected to the nanowire that superimposes an alternating signal with an initial amplitude on the nanowire. The binary signal converter may also include a selective alternating signal filter that selectively passes the alternating signal from the nanowire to a signal sink.
    Type: Grant
    Filed: April 27, 2005
    Date of Patent: December 11, 2007
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventor: Yong Chen
  • Publication number: 20070281534
    Abstract: An electrical connector (1) for electrically connecting an electronic package with a circuit substrate. The connector includes a housing (11), a fastening device assembled with the housing, and a stiffener (12) surrounding the housing. The stiffener includes a back end (123), and a pair of spaced first walls (125) adjoining the back end. Each first wall has a latch (128) extending upwardly therefrom, and then bends inwardly. The back end has a pair of spaced spring fingers (129) extending substantially horizontally, and then bends slightly upwardly. The latches are fastened to the housing for locating the housing in a vertical direction. The spring fingers abut against the housing for locating the housing in a horizontal direction. The stiffener reinforces the housing, and protects the housing from deformnation or warpage.
    Type: Application
    Filed: June 5, 2007
    Publication date: December 6, 2007
    Inventors: Zhan-Jun Xu, Fu-Jin Peng, Ming-Yong Chen
  • Patent number: 7297557
    Abstract: A method of attaching a molecular layer to a substrate includes attaching a temporary protecting group(s) to a molecule having a molecular switching moiety with first and second connecting groups attached to opposed ends thereof. The temporary protecting group(s) is attached to the first and/or second connecting group so as to cause the opposed ends of the switching moiety to exhibit a difference in hydrophilicity such that one of the ends remains at at least one of a water/solvent interface and a water/air interface, and the other end remains in air during a Langmuir-Blodgett (LB) process. An LB film is formed on the interface. The temporary protecting group(s) is removed. The substrate is passed through the LB film to form the molecular layer chemically bonded on the substrate. The difference in hydrophilicity between the opposed ends causes formation of a substantially well-oriented, uniform LB film at the interface.
    Type: Grant
    Filed: June 30, 2004
    Date of Patent: November 20, 2007
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Sean X. Zhang, Zhang-lin Zhou, Yong Chen