Patents by Inventor Yong Chen

Yong Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6998333
    Abstract: A method for forming first and second linear structures of a first composition that meet at right angles, there being a gap at the point at which the structures meet. The linear structures are constructed on an etchable crystalline layer having the first composition. First and second self-aligned nanowires of a second composition are grown on this layer and used as masks for etching the layer. The self-aligned nanowires are constructed from a material that has an asymmetric lattice mismatch with respect to the crystalline layer. The gap is sufficiently small to allow one of the structures to act as the gate of a transistor and the other to form the source and drain of the transistor. The gap can be filled with electrically switchable materials thereby converting the transistor to a memory cell.
    Type: Grant
    Filed: August 20, 2004
    Date of Patent: February 14, 2006
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Yong Chen, R. Stanley Williams
  • Patent number: 6994541
    Abstract: A uniform pressing apparatus used in nanoimprint lithographic process is proposed, including a housing having a first flange; a first carrier unit for carrying an imprint mold and having at least one second flange freely attaches to the first flange; a second carrier unit for carrying a substrate; at least one uniform pressing unit mounted on a imprint force transmission path; and a power source driving at least one of the housing and the second carrier unit to allow a contact to be formed between the mold and the moldable layer. Therefore, the nanoimprint lithographic process is achieved with good parallelism between the substrate and the mold and with uniform pressure distribution.
    Type: Grant
    Filed: September 17, 2003
    Date of Patent: February 7, 2006
    Assignee: Industrial Technology Research Institute
    Inventors: Yong-Chen Chung, Chia-Hung Lin, Chia-Chun Hsu, Chuan-Feng Chen, Wen-Hung Feng, Ming-Chi Chen
  • Publication number: 20060022697
    Abstract: A method for re-testing semiconductor device includes following processes: (1) providing a first carrier for accommodating semiconductor devices which have been tested; (2) taking the semiconductor devices out from the first carrier and placing them according to the information of a fist map by a pick-and-place machine, wherein the information of the first map has the coordinates of the positions of the film frame where the semiconductor is to be placed; (3) placing the film frame with the semiconductor devices placed thereon to a testing machine, and re-testing the semiconductor devices according to the information of the first map by the tester; (4) placing the film frame with the semiconductor devices attached thereon to a pick-and-place machine, and taking the semiconductor devices out according to the result of the retesting from the film frame, and placing the semiconductor devices on at least one carriers.
    Type: Application
    Filed: June 28, 2005
    Publication date: February 2, 2006
    Applicant: Advanced Semiconductor Engineering, Inc.
    Inventors: Chin-Chen Chuan, Chiu-Cheng Lin, Cheng Lee, Kuei Huang, Yong Chen, Jui Wang, Pao Chien, Hsiang-Han Kung, Chao Hwu
  • Publication number: 20060012079
    Abstract: A method is provided for coating a surface having features thereon with a self-assembled monolayer for aiding release of the surface during an imprinting procedure. The method comprises exposing the surface to a vapor of a mold release agent.
    Type: Application
    Filed: July 16, 2004
    Publication date: January 19, 2006
    Inventors: Gun-Young Jung, Yong Chen, R. Williams, Sivapackia Ganapathiappan
  • Publication number: 20060006463
    Abstract: A nano-scale device and method of fabrication provide a nanowire having (111) vertical sidewalls. The nano-scale device includes a semiconductor-on-insulator substrate polished in a [110] direction, the nanowire, and an electrical contact at opposite ends of the nanowire. The method includes wet etching a semiconductor layer of the semiconductor-on-insulator substrate to form the nanowire extending between a pair of islands in the semiconductor layer. The method further includes depositing an electrically conductive material on the pair of islands to form the electrical contacts. A nano-pn diode includes the nanowire as a first nano-electrode, a pn-junction vertically stacked on the nanowire, and a second nano-electrode on a (110) horizontal planar end of the pn-junction. The nano-pn diode may be fabricated in an array of the diodes on the semiconductor-on-insulator substrate.
    Type: Application
    Filed: July 9, 2004
    Publication date: January 12, 2006
    Inventors: M. Islam, Yong Chen, Shih-Yuan Wang, R. Williams
  • Publication number: 20060003265
    Abstract: A molecular layer includes a Langmuir-Blodgett (LB) film of a molecule connected to a plurality of active device molecules, the molecule having a moiety with first and second connecting groups at opposed ends of the moiety. Each of the plurality of active device molecules includes a switching moiety, a self-assembling connecting group at one end of the switching moiety, and a linking group at an opposed end of the moiety. One or more defect site(s) exist between the plurality of active device molecules. A respective number of the first connecting groups of the LB film are connected to the plurality of active device molecules via at least some of the linking groups such that the LB film covers the plurality of active device molecules and the one or more defect site(s).
    Type: Application
    Filed: June 30, 2004
    Publication date: January 5, 2006
    Inventors: Sean Zhang, Yong Chen
  • Publication number: 20060002176
    Abstract: A method of attaching a molecular layer to a substrate includes attaching a temporary protecting group(s) to a molecule having a molecular switching moiety with first and second connecting groups attached to opposed ends thereof. The temporary protecting group(s) is attached to the first and/or second connecting group so as to cause the opposed ends of the switching moiety to exhibit a difference in hydrophilicity such that one of the ends remains at at least one of a water/solvent interface and a water/air interface, and the other end remains in air during a Langmuir-Blodgett (LB) process. An LB film is formed on the interface. The temporary protecting group(s) is removed. The substrate is passed through the LB film to form the molecular layer chemically bonded on the substrate. The difference in hydrophilicity between the opposed ends causes formation of a substantially well-oriented, uniform LB film at the interface.
    Type: Application
    Filed: June 30, 2004
    Publication date: January 5, 2006
    Inventors: Sean Zhang, Zhang-lin Zhou, Yong Chen
  • Publication number: 20050282388
    Abstract: A method is provided for imprinting a pattern having nanoscale features from a mold into the patternable layer on a substrate. The method comprises: providing the mold; forming the patternable layer on the substrate; and imprinting the mold into the patternable layer, wherein the patternable layer comprises a metal or alloy having a transition temperature from its solid form to its liquid form that is within a range of at least 100 above room temperature.
    Type: Application
    Filed: June 16, 2004
    Publication date: December 22, 2005
    Inventor: Yong Chen
  • Publication number: 20050280147
    Abstract: A method is provided for imprinting a pattern having nanoscale features from a mold into the patternable layer on a substrate. The method comprises: providing the mold; forming the patternable layer on the substrate; and imprinting the mold into the patternable layer, wherein the patternable layer comprises a metal or alloy having a transition temperature from its solid form to its liquid form that is within a range of at least 10° above room temperature.
    Type: Application
    Filed: April 14, 2005
    Publication date: December 22, 2005
    Inventor: Yong Chen
  • Publication number: 20050274609
    Abstract: A composition of matter is provided that results in a change of electrical properties through intra-molecular charge transfer or inter-molecular charge transfer or charge transfer between a molecule and an electrode, wherein the charge transfer is induced by an electric field.
    Type: Application
    Filed: May 18, 2004
    Publication date: December 15, 2005
    Inventors: Yong Chen, Xiao-An Zhang, Alexandre Bratkovski, R. Williams
  • Publication number: 20050246798
    Abstract: Novel proteins are provided herein, including proteins capable of catalyzing the acetylation of glyphosate and other structurally related proteins. Also provided are novel polynucleotides capable of encoding these proteins, compositions that include one or more of these novel proteins and/or polynucleotides, recombinant cells and transgenic plants comprising these novel compounds, diversification methods involving the novel compounds, and methods of using the compounds. Some of the novel methods and compounds provided herein can be used to render an organism, such as a plant, resistant to glyphosate.
    Type: Application
    Filed: April 29, 2004
    Publication date: November 3, 2005
    Applicants: Verdia Inc., Pioneer Hi-Bred International, Inc.
    Inventors: Linda Castle, Dan Siehl, Lorraine Giver, Jeremy Minshull, Christina Ivy, Yong Chen, Phillip Patten, Rebecca Gorton, Nicholas Duck, Billy McCutchen, Roger Kemble
  • Publication number: 20050233977
    Abstract: A synthesis method of alanyl-glutamine includes the steps of: The N-terminal protected alanine reacts with triphenylphosphine and hexachloroethane in organic solvent to form active ester, the active ester reacts with glutamine in a solution mixture containing organic solvent and aqueous solution of inorganic base, the resultant mixture is acidified with inorganic acid, and then the N-terminal protecting group is removed. In this method, the raw materials are cheap, the synthesis technique is simple, no disposals of separation and purification are needed, the product is easy to be separated and purified, the toxicities of all the reagents used in the course of production are minimal, it is advantageous to environment protection.
    Type: Application
    Filed: May 30, 2003
    Publication date: October 20, 2005
    Inventors: Yufen Zhao, Guo Tang, Ning Zhou, Liming Hu, Yong Chen
  • Patent number: 6955767
    Abstract: The lithographic process described herein involves aligning a patterned mold with respect to an alignment mark that is disposed on a substrate based upon interaction of a scanning probe with the alignment mark. By this method, the patterned mold may be aligned to an atomic accuracy (e.g., on the order of 10 nm or less), enabling nanometer-scale devices to be fabricated. A device formed by this lithographic method and a system for implementing this lithographic method with alignment also are described.
    Type: Grant
    Filed: March 22, 2001
    Date of Patent: October 18, 2005
    Assignee: Hewlett-Packard Development Company, LP.
    Inventor: Yong Chen
  • Publication number: 20050194526
    Abstract: Langmuir-Blodgett films are provided in which a molecule is chemically bonded with a bottom electrode substrate as part of a crossed wire device comprising two electrodes and a molecular layer therebetween. The molecule, which comprises a switchable moiety and a connecting moiety, is provided with a photolabile capping group attached to the connecting moiety. The photolabile capping group temporarily caps the reactive connecting group of the molecule. The capped molecules are processed to form a LB film on the water-air interface of water. The films are then exposed to UV light. The photolabile capping group decomposes to give back the connecting group, which remains in the water. As the uncapped LB films are transferred to a bottom electrode substrate, the surface of the electrode reacts with the reactive connecting group of the molecule to form a chemically bonded LB layer on the substrate, thereby providing improved LB films.
    Type: Application
    Filed: March 2, 2004
    Publication date: September 8, 2005
    Inventors: Zhang-Lin Zhou, Yong Chen, Xiao-An
  • Publication number: 20050162881
    Abstract: A memory device including a substrate, and multiple self-alignednano-rectifying elements disposed over the substrate. Each nano-rectifying element has multiple first electrode lines, and multiple device structures disposed on the multiple first electrode lines forming the multiple self-aligned nano-rectifying elements. Each device structure has at least one lateral dimension less than about 75 nanometers. The memory device also includes multiple switching elements disposed over the device structures and self-aligned in at least one direction with the device structures. In addition, the memory device includes multiple second electrode lines disposed over, electrically coupled to, and self-aligned to the switching elements, whereby a memory device is formed.
    Type: Application
    Filed: January 27, 2004
    Publication date: July 28, 2005
    Inventors: James Stasiak, Kevin Peters, Jennifer Wu, Pavel Kornilovich, Yong Chen
  • Patent number: 6918045
    Abstract: A power management mode selection system includes a video controller and a switching circuit. The switching circuit is configured to receive an input signal associated with an operating system processable by the system and provide a first power signal or a second power signal to the video controller in response to the input signal.
    Type: Grant
    Filed: January 28, 2002
    Date of Patent: July 12, 2005
    Assignee: Dell Products L.P.
    Inventors: Yong Chen, Thomas Shu
  • Publication number: 20050148945
    Abstract: An improved medical syringe enables quick operation of a handle member to position a needle and syringe barrel in selected positions to extend and withdraw a needle to provide a needle system or a needle-less system.
    Type: Application
    Filed: December 24, 2003
    Publication date: July 7, 2005
    Inventor: Yong Chen
  • Patent number: D511601
    Type: Grant
    Filed: May 14, 2004
    Date of Patent: November 15, 2005
    Assignee: Nieh Chuang Industrial Co., Ltd.
    Inventor: Chun Yong Chen
  • Patent number: D517393
    Type: Grant
    Filed: May 14, 2004
    Date of Patent: March 21, 2006
    Assignee: Nieh Chaung Industrial Co., Ltd.
    Inventor: Chun Yong Chen
  • Patent number: D517895
    Type: Grant
    Filed: May 14, 2004
    Date of Patent: March 28, 2006
    Assignee: Nieh Chuang Industrial Co., LTD
    Inventor: Chun Yong Chen