Nozzle holder of substrate processing apparatus
Latest KOKUSAI ELECTRIC CORPORATION Patents:
- SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM
- PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, PROCESSING APPARATUS AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM
- SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM
- SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM
- METHOD OF PROCESSING SUBSTRATE, SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR PROCESSING APPARATUS, AND RECORDING MEDIUM
Description
Claims
The ornamental design for a nozzle holder of substrate processing apparatus, as shown and described.
Referenced Cited
U.S. Patent Documents
Foreign Patent Documents
D288954 | March 24, 1987 | McDermott |
D341418 | November 16, 1993 | Akimoto |
D439636 | March 27, 2001 | Hamilton |
D583224 | December 23, 2008 | Holdsworth |
D826702 | August 28, 2018 | Barnes |
D899901 | October 27, 2020 | Barnes |
D901564 | November 10, 2020 | Murata et al. |
D924953 | July 13, 2021 | Shimada |
D964443 | September 20, 2022 | Murata |
20210118668 | April 22, 2021 | Nandwana |
202130625333.4 | September 2021 | JP |
Patent History
Patent number: D1017561
Type: Grant
Filed: Sep 21, 2021
Date of Patent: Mar 12, 2024
Assignee: KOKUSAI ELECTRIC CORPORATION (Tokyo)
Inventor: Hironori Shimada (Toyama)
Primary Examiner: Shawn T Gingrich
Assistant Examiner: Caleb M Baker
Application Number: 29/808,585
Type: Grant
Filed: Sep 21, 2021
Date of Patent: Mar 12, 2024
Assignee: KOKUSAI ELECTRIC CORPORATION (Tokyo)
Inventor: Hironori Shimada (Toyama)
Primary Examiner: Shawn T Gingrich
Assistant Examiner: Caleb M Baker
Application Number: 29/808,585
Classifications
Current U.S. Class:
Semiconductor, Transistor Or Integrated Circuit (24) (D13/182)