Deposition ring of a process kit for semiconductor substrate processing

Info

Patent number: D1059312
Type: Grant
Filed: Aug 4, 2022
Date of Patent: Jan 28, 2025
Assignee: APPLIED MATERIALS, INC. (Santa Clara, CA)
Inventors: Abhishek Chowdhury (Bangalore), Nataraj Bhaskar Rao (Bangalore), Edwin C. Suarez (Pleasanton, CA), Harisha Sathyanarayana (Bangalore), Diego Ramiro Puente Sotomayor (Phoenix, AZ), Qanit Takmeel (Mesa, AZ), Mohammad Kamruzzaman Chowdhury (Phoenix, AZ), Arun Chakravarthy Chakravarthy (Tamil Nadu)
Primary Examiner: Brett Miller
Assistant Examiner: Russell Carnell Smith, Jr.
Application Number: 29/848,747

Description

Description

FIG. 1 is a top isometric view of a deposition ring of a process kit for semiconductor substrate processing, according to the novel design.

FIG. 2 is a bottom isometric view thereof.

FIG. 3 is a top plan view thereof.

FIG. 4 is a bottom plan view thereof.

FIG. 5 is a left elevation view thereof, enlarged to more clearly show details.

FIG. 6 is a right elevation view thereof, enlarged to more clearly show details.

FIG. 7 is a back elevation view thereof, enlarged to more clearly show details; and,

FIG. 8 is a front elevation view thereof, enlarged to more clearly show details.

Claims

The ornamental design for a deposition ring of a process kit for semiconductor substrate processing, as shown and described.