Upper chamber for a plasma processing device

Description

FIG. 1 is a front, top and left side perspective view of an upper chamber for a plasma processing device according to the design;

FIG. 2 is a front view thereof;

FIG. 3 is a rear view thereof;

FIG. 4 is a right side view thereof;

FIG. 5 is a left side view thereof;

FIG. 6 is a top plan view thereof;

FIG. 7 is a bottom plan view thereof;

FIG. 8 is a cross-sectional view taken along line 8-8 of FIG. 2; and,

FIG. 9 is an enlarged view of the portion shown in box, labeled, “FIG. 9,” in FIG. 8.

The broken line box shown in FIG. 8 defines the enlarged portion view shown in FIG. 9 and forms no part of the claimed design.

Claims

The ornamental design for an upper chamber for a plasma processing device as shown and described.