Heat radiation fin of heat insulating cylinder for manufacturing semiconductor wafers

- Tokyo Electron Limited
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Description

FIG. 1 is a perspective view;

FIG. 2 is a front view;

FIG. 3 is a rear view;

FIG. 4 is a right side view the left side being a mirror image thereof;

FIG. 5 is a plan view;

FIG. 6 is a bottom view; and,

FIG. 7 is a sectional view thereof along line 77 of FIG. 2.

Claims

The ornamental design for a heat radiation fin of heat insulating cylinder for manufacturing semiconductor wafers, as shown and described.

Referenced Cited
U.S. Patent Documents
5567986 October 22, 1996 Ishida
5718574 February 17, 1998 Shimazu
D404373 January 19, 1999 Kimura
D404374 January 19, 1999 Kimura
6099302 August 8, 2000 Hong et al.
6575231 June 10, 2003 Wu
6716027 April 6, 2004 Kim et al.
7163393 January 16, 2007 Adachi
7204887 April 17, 2007 Kawamura et al.
20030000472 January 2, 2003 Lim et al.
20040069453 April 15, 2004 Tanaka et al.
Patent History
Patent number: D600220
Type: Grant
Filed: Sep 26, 2008
Date of Patent: Sep 15, 2009
Assignee: Tokyo Electron Limited (Tokyo)
Inventor: Izumi Sato (Oshu)
Primary Examiner: Selina Sikder
Attorney: Smith, Gambrell & Russell, LLP
Application Number: 29/309,698