Heat radiation fin of heat insulating cylinder for manufacturing semiconductor wafers
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Description
Claims
The ornamental design for a heat radiation fin of heat insulating cylinder for manufacturing semiconductor wafers, as shown and described.
Referenced Cited
U.S. Patent Documents
5567986 | October 22, 1996 | Ishida |
5718574 | February 17, 1998 | Shimazu |
D404373 | January 19, 1999 | Kimura |
D404374 | January 19, 1999 | Kimura |
6099302 | August 8, 2000 | Hong et al. |
6575231 | June 10, 2003 | Wu |
6716027 | April 6, 2004 | Kim et al. |
7163393 | January 16, 2007 | Adachi |
7204887 | April 17, 2007 | Kawamura et al. |
20030000472 | January 2, 2003 | Lim et al. |
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Patent History
Patent number: D600220
Type: Grant
Filed: Sep 26, 2008
Date of Patent: Sep 15, 2009
Assignee: Tokyo Electron Limited (Tokyo)
Inventor: Izumi Sato (Oshu)
Primary Examiner: Selina Sikder
Attorney: Smith, Gambrell & Russell, LLP
Application Number: 29/309,698
Type: Grant
Filed: Sep 26, 2008
Date of Patent: Sep 15, 2009
Assignee: Tokyo Electron Limited (Tokyo)
Inventor: Izumi Sato (Oshu)
Primary Examiner: Selina Sikder
Attorney: Smith, Gambrell & Russell, LLP
Application Number: 29/309,698
Classifications
Current U.S. Class:
Semiconductor, Transistor Or Integrated Circuit (24) (D13/182);
Heat Sink (D13/179)