Cover of seal cap for reaction chamber of semiconductor

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Description

FIG. 1 is a front, top and right side perspective view of a cover of seal cap for reaction chamber of semiconductor showing my new design;

FIG. 2 is a top plan view thereof;

FIG. 3 is a bottom plan view thereof;

FIG. 4 is a front elevational view thereof;

FIG. 5 is a rear elevational view thereof;

FIG. 6 is a right side elevational view thereof;

FIG. 7 is a left side elevational view; and,

FIG. 8 is a cross-sectional view take along line 8-8 in FIG. 4.

Claims

The ornamental design for a cover of seal cap for reaction chamber of semiconductor, as shown and described.

Referenced Cited
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Patent History
Patent number: D813181
Type: Grant
Filed: Jan 25, 2017
Date of Patent: Mar 20, 2018
Assignee: HITACHI KOKUSAI ELECTRIC INC. (Tokyo)
Inventors: Yusaku Okajima (Toyama), Shuhei Saido (Toyama), Mika Urushihara (Toyama)
Primary Examiner: Elizabeth J Oswecki
Application Number: 29/591,907