Inner tube for process tube for manufacturing semiconductor wafers

- Tokyo Electron Limited
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Description

FIG. 1 is perspective view of an inner tube for process tube for manufacturing semiconductor wafers showing our new design;

FIG. 2 is a front view thereof;

FIG. 3 is a rear view thereof;

FIG. 4 is a right side thereof;

FIG. 5 is a left side view thereof;

FIG. 6 is a top plan view thereof;

FIG. 7 is a bottom plan view thereof;

FIG. 8 is a cross-sectional view taken along line 8-8 of FIG. 6;

FIG. 9 is an enlarged view of portion 9 encircled in FIG. 8;

FIG. 10 is another front view thereof, shown in a used condition; and,

FIG. 11 is an enlarged view of portion 11 encircled in FIG. 5.

The broken lines shown in the drawings represent portions of the inner tube for process tube for manufacturing semiconductor wafers that form no part of the claimed design.

Claims

The ornamental design for an inner tube for process tube for manufacturing semiconductor wafers, as shown and described.

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Patent History
Patent number: D720309
Type: Grant
Filed: May 10, 2012
Date of Patent: Dec 30, 2014
Assignee: Tokyo Electron Limited (Minato-Ku)
Inventors: Hirofumi Kaneko (Oshu), Atsushi Endo (Nirasaki)
Primary Examiner: Elizabeth J Oswecki
Application Number: 29/420,537