Target profile for a physical vapor deposition chamber target

- APPLIED MATERIALS, INC.
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Description

FIG. 1 is a perspective view of a target profile for a physical vapor deposition chamber target, showing our new design;

FIG. 2 is a top plan view thereof;

FIG. 3 is a bottom plan view thereof;

FIG. 4 is a right side elevation view thereof;

FIG. 5 is a left side elevation view thereof;

FIG. 6 is a back elevation view thereof;

FIG. 7 is a front elevation view thereof; and,

FIG. 8 is a cross sectional view taken along line 8-8 in FIG. 2.

The broken lines in FIGS. 1-8 represent unclaimed environment and form no part of the claimed design.

Claims

The ornamental design for a target profile for a physical vapor deposition chamber target, as shown and described.

Referenced Cited
U.S. Patent Documents
6659850 December 9, 2003 Korovin
D557226 December 11, 2007 Uchino
D614593 April 27, 2010 Lee
D616390 May 25, 2010 Sato
D633452 March 1, 2011 Namiki
D691974 October 22, 2013 Osada
D716742 November 4, 2014 Jang
D724553 March 17, 2015 Choi
D741823 October 27, 2015 Tateno
D769200 October 18, 2016 Fukushima
D770992 November 8, 2016 Tauchi
20050152089 July 14, 2005 Matsuda
20050193952 September 8, 2005 Goodman
Other references
  • U.S. Appl. No. 29/524,109, filed Apr. 16, 2015, Riker et al.
  • U.S. Appl. No. 29/530,683, filed Jun. 18, 2015, Hanson et al.
Patent History
Patent number: D797067
Type: Grant
Filed: Apr 21, 2015
Date of Patent: Sep 12, 2017
Assignee: APPLIED MATERIALS, INC. (Santa Clara, CA)
Inventors: Fuhong Zhang (San Jose, CA), William Johanson (Gilroy, CA), Yu Liu (Campbell, CA), Adolph Miller Allen (Oakland, CA), Brij Datta (Cupertino, CA), Keith A. Miller (Mountain View, CA)
Primary Examiner: Elizabeth J Oswecki
Application Number: 29/524,557