Abstract: A semiconductor device is provided. The semiconductor device includes an active fin region, at least a gate strip, and a dummy fin region. The active fin region comprises at least an active fin. The gate strip is formed on the active fin region and extending across the active fin. The dummy fin region, comprising a plurality of dummy fins, is formed on two sides of the active fin region, and the dummy fins are formed on two sides of the gate strip.

Abstract: The present invention relates to a semiconductor structure comprising at least a first and a second three-dimensional transistor, wherein the first transistor and the second transistor are electrically connected in parallel to each other, and wherein each transistor comprises a source and a drain, wherein the source and/or drain of the first transistor is at least partially separated from, respectively, the source and/or drain of the second transistor. The invention further relates to a process for realizing such a semiconductor structure.

Abstract: One device disclosed includes a gate structure positioned around a perimeter surface of the fin, a layer of channel semiconductor material having an axial length in the channel length direction of the device that corresponds approximately to the overall width of the gate structure being positioned between the gate structure and around the outer perimeter surface of the fin, wherein an inner surface of the layer of channel semiconductor material is spaced apart from and does not contact the outer perimeter surface of the fin. One method disclosed involves, among other things, forming first and second layers of semiconductor material around the fin, forming a gate structure around the second semiconductor material, removing the portions of the first and second layers of semiconductor material positioned laterally outside of sidewall spacers and removing the first layer of semiconductor material positioned below the second layer of semiconductor material.

Abstract: The present invention provides a semiconductor structure comprising: a semiconductor base located on an insulating layer, wherein the insulating layer is located on a semiconductor substrate; source/drain regions, which are in contact with first sidewalls of the semiconductor base opposite to each other; gates located on second sidewalls of the semiconductor base opposite to each other; an insulating via located on the insulating layer and embedded into the semiconductor base; and an epitaxial layer sandwiched between the insulating via and the semiconductor base. The present invention further provides a method for manufacturing a semiconductor structure comprising: forming an insulating layer on a semiconductor substrate; forming a semiconductor base on the insulating layer; forming a void within the semiconductor base, wherein the void exposes the semiconductor substrate; forming an epitaxial layer in the void through selective epitaxy; and forming an insulating via within the void.

Abstract: The present invention provides a semiconductor device which suppresses a short circuit and a leakage current between a semiconductor film and a gate electrode generated by a break or thin thickness of a gate insulating film in an end portion of a channel region of the semiconductor film, and the manufacturing method of the semiconductor device. Plural thin film transistors which each have semiconductor film provided over a substrate continuously, conductive films provided over the semiconductor film through a gate insulating film, source and drain regions provided in the semiconductor film which are not overlapped with the conductive films, and channel regions provided in the semiconductor film existing under the conductive films and between the source and drain regions. And impurity regions provided in the semiconductor film which is not overlapped with the conductive film and provided adjacent to the source and drain regions.

Abstract: Disclosed is a method of driving a transistor including a semiconductor layer, a first insulating layer, a second insulating layer, a first conductive layer, and a second conductive layer such that the semiconductor layer is disposed between the first and second insulating layers, one surface of the first insulating layer opposite the other surface in contact with the semiconductor layer is in contact with the first conductive layer, one surface of the second insulating layer opposite the other surface in contact with the semiconductor layer is in contact with the second conductive layer. The method includes applying a voltage VBG that satisfies the relation of VBG?VON1×C1/(C1+C2) to the second conductive layer.

Abstract: A semiconductor diode includes a semiconductor substrate having a lightly doped region with a first conductivity type therein. A first heavily doped region with a second conductivity type opposite to the first conductivity type is in the lightly doped region. A second heavily doped region with the first conductivity type is in the lightly doped region and is in direct contact with the first heavily doped region. A first metal silicide layer is on the semiconductor substrate and is in direct contact with the first heavily doped region. A second metal silicide layer is on the semiconductor substrate and is in direct contact with the second heavily doped region. The second metal silicide layer is spaced apart from the first metal silicide layer.

Abstract: A trench MOS PN junction diode structure includes a first conductive type substrate, a plurality of trenches defined on a face of the first conductive type substrate, a gate oxide layer formed at least on inner sidewalls of the trenches, a polysilicon layer formed in the trenches, a second conductive type low-concentration ion-implanted region formed at least in the first conductive type substrate, a high-concentration ion-implanted region formed below the trenches, and an electrode layer covering the first conductive type substrate, the second conductive type low-concentration ion-implanted region, the gate oxide and the polysilicon layer. The high-concentration ion-implanted region below the trenches provides pinch-off voltage sustention in reversed bias operation to reduce leakage current of the trench MOS PN junction diode structure.

Abstract: Provided is a solar cell. The solar cell includes: a substrate including through lines opposing to each other; a semiconductor layer on a top side of the substrate; bus lines at both edges of a top side of the semiconductor layer; and bus bars connected electrically to the bus lines, respectively, and extending to a rear side of the substrate through the through lines.

Abstract: An optical device manufacturing apparatus includes an encapsulating device for encapsulating an optical semiconductor element 4 mounted on a substrate 2 by a liquid resin R in a lens shape, and a curing device for curing the liquid resin R, wherein the encapsulating device includes a dispenser capable of vertically moving a nozzle 25 for supplying the liquid resin R, and brings the tip of the nozzle 25 close to the optical semiconductor element 4 and then supplies the liquid resin R while raising the nozzle 25. According to this optical device manufacturing apparatus, an optical device having the desired optical properties can be obtained promptly and easily.

Abstract: A dielectric, structure and a method of forming a dielectric structure for a rear surface of a silicon solar cell are provided. The method comprises forming a first dielectric layer over the rear surface of the silicon solar cell, and then depositing a layer of metal such as aluminum over the first dielectric layer. The metal layer is then anodized to form a porous layer and a material layer is deposited over a surface of the porous layer such that the material deposits on the surface of the porous layer without contacting the silicon surface.

Abstract: An image sensor may be provided having a pixel array that includes optical cavity image pixels. An optical cavity image pixel may include a photosensitive element in a substrate and a reflective cavity formed from a frontside reflector that is embedded in an intermetal dielectric stack, a backside reflector formed in a dielectric layer above the photosensor that partially covers the photosensor, and sidewall reflectors formed in the substrate between adjacent photosensors using deep trench isolation techniques. Each optical cavity image pixel may also include a light-guide trench above the photosensor that guides light into the reflective cavity for that pixel. Each optical cavity pixel may also include color filter material in the trench. Light that is guided into the reflective cavity by the light-guide trench may experience multiple reflections from the reflectors of the reflective cavity before being absorbed and detected by the photosensor.

Abstract: A semiconductor light-receiving device includes a substrate having a principal surface including first and second areas; a post disposed on the first area, the post including a semiconductor mesa; and a resin layer disposed on the second area in contact with a side surface of the post. The resin layer has, on a ray extending from a first point within the first area through a second point within the second area, a first thickness and a second thickness respectively at a third point and a fourth point that are located within the second area at different distances from the first point. The distance from the first point to the fourth point is larger than the distance from the first point to the third point. The first thickness is larger than the second thickness. The resin layer has a surface that monotonically changes from the first thickness to the second thickness.

Abstract: A high-efficiency solar cell including an Indium, Gallium, Aluminum and Nitrogen (in a combination comprising InGaN, or InAlN, or InGaAlN) alloy which may be blended with a polyhedral oligomeric silsesquioxane (POSS) material, and which may include an absorption-enhancing layer including one of more of carbon nanotubes, quantum dots, and undulating or uneven surface topography.

Abstract: A polyimide-metal laminate comprising a polyimide film and a metal layer for use as an electrode, which is formed on the side (Side B) of the polyimide film which was in contact with a support when producing a self-supporting film in the production of the polyimide film, is used to produce a CIS solar cell.

Abstract: Various embodiment include optical and optoelectronic devices and methods of making same. Under one aspect, an optical device includes an integrated circuit having an array of conductive regions, and an optically sensitive material over at least a portion of the integrated circuit and in electrical communication with at least one conductive region of the array of conductive regions. Under another aspect, a film includes a network of fused nanocrystals, the nanocrystals having a core and an outer surface, wherein the core of at least a portion of the fused nanocrystals is in direct physical contact and electrical communication with the core of at least one adjacent fused nanocrystal, and wherein the film has substantially no defect states in the regions where the cores of the nanocrystals are fused. Additional devices and methods are described.

Abstract: Biaxially stretched film with polymeric constituents formed mainly of polyester in which the film includes at least one copper salt and one halide, with the resulting film having an AC (alternating current) dielectric strength of at least 100 kV/mm at 23° C. and 50 Hz. The invention further relates to the use of the film of the invention, in particular in solar modules, and also to a process for its production.

Abstract: Provided is a solar module with improved reliability. A solar module (1) is provided with a solar cell (10), a wiring member (11), a resin adhesive layer (12), and a buffer region (40). The wiring member (11) is electrically connected to the solar cell (10). The resin adhesive layer (12) bonds the solar cell (10) and the wiring member (11) to one another. The buffer region (40) is provided at least partially between the wiring member (11) and the solar cell (10). The buffer region (40) contains a non-crosslinked resin.

Abstract: A solar energy plant/system includes different combinations of solar energy receivers and arrangements of the receivers that make it possible to optimize solar energy collection and conversion into other forms of energy to maximize value.

Abstract: Provided is a wavelength converting structure for near-infrared rays and a solar cell using the same. More particularly, provided is a novel wavelength converting structure for near-infrared rays using gap plasmon characteristics and up-conversion nanoparticles. When applying the wavelength converting structure for near-infrared rays to a solar cell, it is possible to convert the light within a wavelength range of near-infrared rays into electric energy so that the photoconversion efficiency may be improved.

Abstract: A photovoltaic device that includes an upper cell that absorbs a first range of wavelengths of light and a bottom cell that absorbs a second range of wavelengths of light. The bottom cell includes a heterojunction comprising a crystalline germanium containing (Ge) layer. At least one surface of the crystalline germanium (Ge) containing layer is in contact with a silicon (Si) containing layer having a larger band gap than the crystalline (Ge) containing layer.

Abstract: Plasma-assisted techniques are provided for fabricating semiconductor devices. In one aspect, a plasma is applied to a substrate before exfoliating layers of a multi-layer structure of atomically thin two-dimensional sheets onto the substrate. The exfoliated layers serve as the basis for constructing a semiconductor device. In another aspect, a p-n junction is formed by applying a plasma to top layers of a multi-layer structure of atomically thin two-dimensional sheets and then exfoliating a portion of the multi-layer structure onto a bottom electrode.

Abstract: A photovoltaic device including a single junction solar cell provided by an absorption layer of a type IV semiconductor material having a first conductivity, and an emitter layer of a type III-V semiconductor material having a second conductivity, wherein the type III-V semiconductor material has a thickness that is no greater than 50 nm.

Abstract: Methods for treating a semiconductor material, and for making devices containing a semiconducting material, are presented. One embodiment is a method for treating a semiconductor material that includes a chalcogenide. The method comprises contacting at least a portion of the semiconductor material with a chemical agent. The chemical agent comprises a solvent, and an iodophor dissolved in the solvent.

Abstract: A light emitting device according to the embodiment includes a first conductive semiconductor layer; an active layer over the first conductive semiconductor layer; a second conductive semiconductor layer over the active layer; a bonding layer over the second conductive semiconductor layer; a schottky diode layer over the bonding layer; an insulating layer for partially exposing the bonding layer, the schottky diode layer, and the first conductive semiconductor layer; a first electrode layer electrically connected to both of the first conductive semiconductor layer and the schottky diode layer; and a second electrode layer electrically connected to the bonding layer.

Abstract: A semiconductor light emitting device includes a substrate, a semiconductor laminate disposed on the substrate and divided to a plurality of light emitting cells with an isolation region, and a wiring unit electrically connecting the plurality of light emitting cells. A region of lateral surfaces of each of the light emitting cells in which the wiring unit is disposed has a slope gentler than slopes of other regions of the lateral surfaces of each of the light emitting cells.

Abstract: A method for producing an optoelectronic component is provided. A transfer layer, containing InxGa1-xN with 0<x<1, is grown onto a growth substrate. Subsequently, ions are implanted into the transfer layer to form a separation zone, a carrier substrate is applied, and the transfer layer is separated by way of heat treatment. A further transfer layer, containing InyGa1-yN with 0<y?1 and y>x, is grown onto the previously grown transfer layer, ions are implanted into the further transfer layer to form a separation zone, a further carrier substrate is applied, and the further transfer layer is separated by way of heat treatment. Subsequently, a semiconductor layer sequence, containing an active layer, is grown onto the surface of the further transfer layer facing away from the further carrier substrate.

Abstract: The present invention discloses a nitride semiconductor light emitting device with improved light efficiency. The nitride semiconductor light emitting device includes a n-type nitride layer and p-type nitride layer, an active layer disposed between the n-type and p-type nitride layers and with a multiple quantum well structure wherein a plurality of quantum well layers and a plurality of quantum barrier layers are stacked alternatively in the active layer, and a superlattice layer between the active layer and the p-type nitride layer with asymmetric structure. Herein, a thickness of a well layers gradually increases from the p-type nitride layer to the active layer and the height of the barrier layers gradually increases from the active layer to the p-type nitride layer and therefore, an injection efficiency of a hole supplied from p-type nitride layer to an active layer is increased.

Abstract: Phosphors formed using silicon nanoparticles are provided. The phosphors exhibit bright fluorescence and high quantum yield, making them ideal for lighting applications. Methods for making the silicon phosphors are also provided, along with lighting devices that incorporate the silicon phosphors.

Abstract: The present invention provides a Group III nitride semiconductor light-emitting device which exhibits improved light emission efficiency. The light-emitting layer has a MQW structure in which a plurality of layer units are repeatedly deposited, each layer unit comprising a well layer, a capping layer, and a barrier layer sequentially deposited. The well layer is formed of InGaN, the capping layer has a structure in which a GaN layer and an AlGaN layer are deposited in this order on the well layer, and the barrier layer is formed of AlGaN. The AlGaN layer has a higher Al composition ratio than that of the barrier layer. The AlGaN layer in the former portion has a lower Al composition ratio than that of the AlGaN layer in the latter portion when the light-emitting layer is divided into a former portion at the n-cladding layer side and a latter portion at the p-cladding layer side in a thickness direction.

Abstract: A light emitting element includes a first conductivity-type semiconductor layer, a first electrode, a second conductivity-type semiconductor layer and a second electrode. The second conductivity-type semiconductor layer has a square peripheral shape. The first electrode includes a first connecting portion on a first diagonal line and a first extending portion extending from the first connecting portion onto the first diagonal line. The second electrode includes a second connecting portion on the first diagonal line facing the first connecting portion via the first extending portion. Two second extending portions extend from the second connecting portion and having a first portion and a second portion respectively. The first connecting portion includes an end portion closer to the second connecting portion than a straight line intersecting the tip ends of the two second extending portions, and a center portion at a side father from the second connecting portion than the second diagonal line.

Abstract: A semiconductor light-emitting element includes, a first semiconductor layer, a second semiconductor layer, a light-emitting layer provided between the first semiconductor layer and the second semiconductor layer, a first electrode connected to the first semiconductor layer, and a second electrode provided on the second semiconductor layer. A side of the second electrode facing to the second semiconductor layer is composed of at least any one of silver and silver alloy. The second electrode has a void having a width of emission wavelength or less of the light-emitting layer in a plane of the second electrode facing to the second semiconductor layer.

Abstract: According to one embodiment, a semiconductor light emitting device includes a stacked structure body and an electrode. The stacked structure body has a first conductivity type first semiconductor layer including a nitride-based semiconductor, a second conductivity type second semiconductor layer including a nitride-based semiconductor, and a light emitting layer provided between the first and second semiconductor layers. The electrode has first, second and third metal layers. The first metal layer is provided on the second semiconductor layer and includes silver or silver alloy. The second metal layer is provided on the first metal layer and includes at least one element of platinum, palladium, rhodium, iridium, ruthenium, osmium. The third metal layer is provided on the second metal layer. A thickness of the third metal layer along a direction from the first toward the second semiconductor layer is equal to or greater than a thickness of the second metal layer.

Abstract: A laminate capable of emitting light comprises a reflective layer. The reflective layer increases the amount of light output from the laminate. A lighting apparatus containing the improved laminate is also provided.

Abstract: A semiconductor device having light-emitting diodes (LEDs) formed on a concave textured substrate is provided. A substrate is patterned and etched to form recesses. A separation layer is formed along the bottom of the recesses. An LED structure is formed along the sidewalls and, optionally, along the surface of the substrate between adjacent recesses. In these embodiments, the surface area of the LED structure is increased as compared to a planar surface. In another embodiment, the LED structure is formed within the recesses such that the bottom contact layer is non-conformal to the topology of the recesses. In these embodiments, the recesses in a silicon substrate result in a cubic structure in the bottom contact layer, such as an n-GaN layer, which has a non-polar characteristic and exhibits higher external quantum efficiency.

Abstract: Disclosed are a light emitting device. The light emitting device includes first and second light emitting cells on a conductive support member and having a hole. The first and second light emitting cells includes first and second semiconductor layers, and an active layer. First and second conducive layers are between the first light emitting cell and the conductive support member, and a third and fourth conductive layers are between the second light emitting cell and the conductive support member. First insulating layer is between the second and fourth conductive layers and the conductive support member. Second insulating layer is disposed in the hole. The second conductive layer is electrically connected to the first light emitting cells through the hole and the third conductive layer.

Abstract: To provide an illumination method and a light-emitting device which are capable of achieving, under an indoor illumination environment where illuminance is around 5000 lx or lower when performing detailed work and generally around 1500 lx or lower, a color appearance or an object appearance as perceived by a person, will be as natural, vivid, highly visible, and comfortable as though perceived outdoors in a high-illuminance environment, regardless of scores of various color rendition metric. Light emitted from the light-emitting device illuminates an object such that light measured at a position of the object satisfies specific requirements. A feature of the light-emitting device is that light emitted by the light-emitting device in a main radiant direction satisfies specific requirements.

Abstract: The present disclosure provides a light emitting diode (LED) apparatus. The LED apparatus includes an LED emitter having a top surface; and a phosphor feature disposed on the LED emitter. The phosphor feature includes a first phosphor film disposed on the top surface of the LED emitter and having a first dimension defined in a direction parallel to the top surface of the LED emitter; a second phosphor film disposed on the first phosphor film and having a second dimension defined in the direction; and the second dimension is substantially less than the first dimension.

Abstract: The invention relates to a light-emitting semiconductor component, having: a light-emitting semiconductor chip (1) with an active region (11) which, in operation, emits light (31) having a first spectrum; a wavelength conversion element (2) which is positioned remote from the semiconductor chip (1), is downstream of the semiconductor chip (1) in the beam path of the light (31) having the first spectrum and converts the light (31) having the first spectrum at least partially into light (32) having a second spectrum; and a filter layer (3), which reflects at least a part (34) of a light (33) incident on the semiconductor component from the outside. The part (34) of the light (33) incident on the semiconductor component from the outside that is reflected by the filter layer (3) has a visible wavelength range and overlaps a color impression produced by the wavelength conversion element when the semiconductor component is in a switched-off state.

Abstract: The invention relates to an optoelectronic semiconductor element that emits mixed-color radiation when in operation. The optoelectronic semiconductor component comprises an optoelectronic semiconductor chip, a conversion element that has a curvature, and a spacer element that is arranged between the optoelectronic semiconductor chip and conversion element. The spacer has a curved surface that faces the conversion element, with the conversion element being in direct contact with the curved surface.

Abstract: There is herein described a patterned thin-film wavelength converter which comprises a substrate having a first patterned surface with a first pattern, and a thin film deposited on the first patterned surface. The thin film consists of a wavelength converting material and has a second patterned surface that is distal from the substrate. The second patterned surface has a second pattern that is substantially the same as the first pattern of the substrate. An advantage of the patterned thin-film wavelength converter is that post-deposition processing is not required to produce a textured surface on the wavelength converting material. A method of making the patterned thin-film wavelength converter is also described.

Abstract: An electronic part package comprises a sealing resin layer, an electronic part and a metal plating pattern layer. The sealing resin layer is provided with a principal surface including a first region that has a bellows-like shape having alternate ridges and valleys and a second region that is flat. The electronic part includes an electrode having a principal surface and is covered by the sealing resin layer except the principal surface, which is surrounded by the second region. The metal plating pattern layer is integrally provided on the first and second regions and on the principal surface of the electrode. A portion of the metal plating pattern layer, the portion located on the first region, has a bellows-like shape having alternate ridges and valleys along an outline of the first region.

Abstract: LED light source having at least one light-emitting component. The light-emitting component is at least partly protected with a transparent protective material, which contains aliphatic thermoplastic polyurethane (TPU). A light-source band also includes at least one light-emitting component.

Abstract: A semiconductor light emitting element includes: a laminated semiconductor layer in which an n-type semiconductor layer, a light emitting layer and a p-type semiconductor layer are laminated; plural n-side electrodes that are laminated on the n-type semiconductor layer, electrically connected to the n-type semiconductor layer and arranged to surround at least a partial region of the light emitting layer and the p-type semiconductor layer as viewed from a lamination direction; and a p-side electrode that is provided on the p-type semiconductor layer, provided with a reflective property to light outputted from the light emitting layer and electrically connected to the p-type semiconductor layer, the p-side electrode including a connecting portion, which is used for electrical connection with an outside, at a region surrounded by the plural n-side electrodes as viewed from the lamination direction.

Abstract: An optoelectronic semiconductor chip includes a semiconductor body of semiconductor material, a p-contact layer and an n-contact layer. The semiconductor body includes an active layer intended for generating radiation. The semiconductor body includes a p-side and an n-side, between which the active layer is arranged. The p-contact layer is intended for electrical contacting the p-side. The n-contact layer is intended for electrical contacting the n-side 1b. The n-contact layer contains a TCO layer and a mirror layer, the TCO-layer being arranged between the n-side of the semiconductor body and the mirror layer.

Abstract: An optoelectronic semiconductor component includes an optoelectronic semiconductor chip having a first surface. The semiconductor chip is embedded in a mold body. The first surface is elevated with respect to a top side of the mold body. A reflective layer is arranged on the top side of the mold body.

Abstract: A light emitting device of the invention includes a substrate having a metal on a surface thereof; a light emitting element installed on the surface of the substrate; a wire that connects the light emitting element and the metal; and a light reflecting member that covers the metal, the wire having a first bonding ball that is disposed on a surface of the metal, and an extension that extends above the first bonding ball, and the light reflecting member having a protrusion over the first bonding ball.

Abstract: A flip-chip light-emitting diode (LED) unit includes a substrate, an electrode pad set disposed on the substrate, and three flip-chip LEDs disposed on the electrode pad set in a flip-chip manner and including one first LED and two second LEDs that are spaced apart from the first LED and that are electrically coupled to the first LED in a series configuration.

Abstract: A solar energy heat to electricity conversion device is provided that includes a thermally conductive solar receiver having a cylinder with an open end and a cup-shape closed end and a thermally conductive fin disposed on an outside surface of the cup-shape closed end, where the thermally conductive solar receiver is capable of absorbing solar energy directed into the cylinder, a thermoelectric module (TEM) that includes a first plate and a second plate, where the first plate is in contact with a surface of the thermally conductive fin, where the conductive fin is capable of transferring heat to the first plate, and a thermally conductive water block in contact with the TEM that is capable of cooling the TEM, where the water block includes a fluid input and a fluid output, where the TEM generates electricity according to a temperature difference between the first plate and the second plate.

Abstract: An industrial thermoelectric generation assembly and method are provided. A plurality of thermoelectric generation elements is provided. Each element has a first side, a second side opposite the first side, and a lateral surface. A thermally insulative material surrounds the lateral surface of each thermoelectric element. The first side of each thermoelectric element is disposed to contact a process heat source, and the second side is configured to be exposed to an ambient environment. At least two of the plurality of thermoelectric generation elements are wired in series. The thermoelectric generation elements, being good thermal insulators, provide good thermal insulation to the process. Withholding heat within the process (which is desired), is converted to electricity.