Abstract: A vacuum exhausting apparatus, a semiconductor manufacturing apparatus, and a vacuum processing method in which high performance semiconductor device can be manufactured with high stability and high yield. The present invention comprises a turbo-molecular pump and an auxiliary pump connected to an exhaust side of the turbo-molecular pump, and provides a gas introducing section for introducing a specified gas into an area between the turbo-molecular pump and the auxiliary pump, in which gas inside the vacuum chamber is exhausted while a specified gas is being introduced thereinto from the introducing section.

Abstract: Sheets to be coated with water-based coating material, for example a primer and a low adhesion backsize, are supplied from a feeder (1), in end-to-end overlapping relationship, to a dual coater (3) in which the sheets are coated individually on both sides. A sheet inserter (2) is provided, upstream of the dual coater, to insert sheets from a second supply into the sheets from the feeder (1). The dual coated sheets are dried as individual sheets or as a pseudo-web of overlapped sheets. The sheets are then overlapped, unless previously overlapped, and the direction of overlap changed, if necessary, to provide the trailing edge of each sheet on top of the leading edge of each succeeding sheet. The overlapped sheets are conveyed through an adhesive transfer station (7) where stripes (236) of at least partially dried adhesive are coated onto the dual coated sheets from a transfer belt (71).

Abstract: A bubble stripping and coating apparatus for stripping entrained gas from the surface of a fiber, then coating the fiber with a coating material having a bubble stripping and coater body and a die assembly. The bubble stripping and coater body has a bubble stripping gas entrance for providing a bubble stripping argon gas to a bubble stripping gas chamber for stripping entrained gas from the fiber and having a die assembly bore. The die assembly is arranged in the die assembly bore, and has a guide die having a lower guide die opening with a diameter of less than 0.016 inches.

Abstract: A rapid thermal heating apparatus including a substrate support and a bearing assembly in a processing chamber. The substrate support is mounted on the bearing assembly so that it may be rotated. A rotatable drive ring is located external to the processing chamber. The drive ring provides a force to couple the bearing assembly to the drive ring without the use of a vacuum seal so that rotation of the drive ring causes the substrate support to rotate.

Abstract: In a vapor phase apparatus such as a plasma chemical vapor deposition (CVD) having a pair of electrodes, a surface of one of the electrodes has an uneven shape (concave portion and convex portion). An interval between the electrodes is 10 mm or less. A density of a convex portion is increased in a center portion of the electrode. An aspect ratio of the uneven shape is increased from a peripheral portion of the electrode to a center portion of the electrode. The aspect ratio represents a ratio (b/a) of a pitch (a) and a height (b) of the convex portion.

Abstract: A flat, elongate, trough-shaped part (8) made of an electrically conductive ceramic can be heated by the direct passage of current between clamping points at opposite ends. The trough-shaped part (8) being provided with openings (12) for reducing cross sectional area where increased ohmic heating is desired, such as near the clamping points and between individual areas where wire is fed for melting in the trough.

Abstract: Smoothing surfaces of a substrate having a profile and irregular surfaces. According to one embodiment, a layer of fill material is applied to at least one surface of the substrate, wherein the fill material fills irregularities in the at least one surface. The layer of fill material is scraped from the at least one surface to provide a relatively smooth at least one surface.

Abstract: Apparatus for removing an excess amount of a liquid coating material from portions of a moving web following coating of the moving web with the liquid coating material along a coating path. A vacuum head having a suction slot is defined by upstream and downstream walls and adapted to be movably positioned in an inoperative position away from the coating path and in an operative position contacting at least a portion of the liquid coating material on the moving web along the coating path, the downstream wall positively displacing a portion of the liquid coating material when the vacuum head is positioned in the operative position. A suction mechanism is operatively coupled to the vacuum head for establishing a vacuum manifold within the suction slot and communicating with a disposal system. A supply of liquid is operatively coupled to the vacuum head for supplying liquid to the suction slot.

Abstract: A single chamber of a vapor deposition system is used to deposit both Ti and TiN. A Ti layer is deposited on the sample using a noncollimated process. N.sub.2 gas is then introduced in the chamber. A TiN layer is then deposited over the Ti layer. A second Ti layer is deposited over the TiN layer. A separate Ti pasting of a TiN chamber is eliminated, thereby increasing throughput. Further, only three physical vapor deposition chambers are used, thereby allowing the fourth chamber to be used for other metal deposition. Moreover, the second Ti layer eliminates the first wafer effect and reduces sheet resistance relative to a same chamber Ti/TiN underlayer. Lastly, the Al deposited on this new stack has a stronger <111> crystallographic texture, which leads to better electromigration resistance.

Abstract: Apparatus for the wet-paint spray painting of articles having a device for catching the paint surplus which has an air-permeable dry filter, wherein the dry filter is arranged movably and there is provided a suction removal device which sucks the dried paint particles away from the dry filter.

Abstract: An apparatus is provided for continuously coating particulate material, such as seeds. The apparatus includes a frame, a cylindrical drum rotatable about an axis tilted with respect to a horizontal plane, and a series of spray nozzles extending into the drum so as to spray one or more coating solutions onto the particulate material which tumbles within the rotating drum. The drum includes a rifling with flighting which carries the material upwardly from approximately 6 o'clock position to a 9 o'clock position, wherein the material falls from the flighting in a curtain spaced apart from the sidewall of the drum. Perforations in the sidewall of the drum allow a flow of air through the drum and curtain of material so as to dry the coating solution on the material substantially instantaneously as the material is coated with solution in the drum. The drum is maintained at a negative pressure during the coating process.

Abstract: A suction chuck and an inner cup are rotated in unison with each other to spread a coating solution uniformly over a planar object in the inner cup under centrifugal forces. Vent holes defined in an outer cup lid which closes an outer cup are held out of communication with vent holes defined in a ring-shaped closure member, so that the interior space in the outer cup is kept out of communication with the exterior space around the outer cup. The concentration of a solvent in the outer cup remains so high that no mist is produced in the outer cup. After the planar object has been coated and before the outer cup lid is opened, the ring-shaped closure member is turned to align the vent holes in the outer cup lid with the vent holes in the ring-shaped closure member, breaking any vacuum in the outer cup with ambient air introduced through the vent holes into the outer cup. Thereafter, the outer and inner cup lids are opened, and the coated planar object is taken out.

Abstract: An improved method of in-situ cleaning a throttle valve in a CVD device and exhaust flow control apparatus for facilitating such cleaning. The throttle valve is repositioned such that it is juxtaposed in close proximity to the exhaust gas port of the reaction chamber. A plasma is then ignited in a cleaning gas mixture of nitrogen trifluoride, hexafluoroethane and oxygen.

Abstract: A hot melt applicator particularly adapted to apply a continuous coating of hot melt adhesive to a substrate includes a plurality of dispensing nozzles connected directly to an adhesive manifold having passages for directing molten hot melt adhesive to each of the dispensing nozzles. A plurality of needle valves corresponding in number to the dispensing nozzles are also connected to the adhesive manifold for allowing individual control of the adhesive flowing to each nozzle. The applicator further includes an air manifold for supplying pressurized air to each of the dispensing nozzles and for causing the adhesive to be discharged from some or all of the nozzles in a swirling pattern. At least one adhesive supply valve is mounted to the adhesive manifold for controlling the supply of adhesive to the passages in the adhesive manifold and ultimately to the nozzles.

Abstract: A composition for negative type chemically amplified resist including, as main components, a random copolymer of vinyl phenol and vinyl cyclohexanol, a melamine resin having an enhanced hexamethoxymethylmelamine content, an acid generator for generating an acid upon irradiation by ionizing radiation, and a solvent. The resist pattern formation process and apparatus are also disclosed.

Abstract: A method for injecting a treating liquid into a wood or stone material. The liquid is injected in an initial pressure-applying/injecting step in which the wood or stone material is immersed at ambient temperature in a treating liquid under an initial liquid pressure of 1 to 10 kg/cm.sup.2, and maintained at this pressure for a period of time. Subsequently, the pressure is increased to a final pressure having a maximum value of 50 kg/cm.sup.2. Where wood is being treated, the pressure is raised in a plurality of steps of 5 to 10 kg/cm.sup.2 each, followed by a defined holding period. Where stone is being treated, the pressure is increased in a single step. Finally, the treated material is depressurized over a period of at least 20 minutes.

Abstract: There is a gap between the respective inner regions of the end face of the cylindrical side wall and the abutting portion of the top plate, which are situated inside the seal member. Even though the top plate is bent inward by atmospheric pressure when the container is decompressed to a predetermined degree of vacuum, therefore, the abutting portion thereof cannot come into contact with the inner edge of the end face of the cylindrical side wall. Thus, if decompression and exposure to atmospheric pressure are repeated to bend the cylindrical side wall repeatedly, there is no possibility of the inner edge portion of the end face of the cylindrical side wall being separated or rubbed off to produce dust. Moreover, the cylindrical side wall and top plate are joined together in the region outside the seal member. If dust is produced by the contact between the cylindrical side wall and top plate at their junctions outside the seal member, therefore, it is prevented from entering the container by the seal member.

Abstract: A ferroelectric thin film superior in coatability, fineness of structure and uniformity of composition, is obtained by a method comprised of inducing ferroelectric reactant materials consisting of plural elements into dissociation by exciting plasma with RF power in order for them to participate in a deposition reaction; setting an optimal process condition in which the ions dissociated from the reactant materials by the excited plasma are subjected to deposition at high temperatures under low pressures; supplying the reactant materials through conduits, a manifold and a shower head to a reactor without deterioration, the manifold collecting the reactant materials, the shower head serving to spray the mixed reactant materials; and depositing a ferroelectric thin film in the reactor while purging residual gas from the conduits.

Abstract: A tube-shaped film, made of fluorine resin, has a fold-free, smooth, and uniform inner peripheral surface formed thereon by a surface treatment. An apparatus for treating the inner peripheral surface of the tube-shaped film includes a holding device for holding the tube-shaped film on the inner peripheral surface of a cylindrical body with a cylindrical configuration of the tube-shaped film maintained. A treatment device is inserted into the cylindrical body to treat the inner peripheral surface of the tube-shaped film held on the inner peripheral surface of the cylindrical body. The holding device and the treatment device make a uniform linear motion relative to each other and a uniform rotary motion relative to each other.

Abstract: An arrangement for painting all sides of an elongated rigid object comprises a closed container containing in its bottom portion a paint mixture of binder, monomer and pigment. The elongated object passes through the closed container above the surface of the paint mixture to be coated on all sides by the paint mixture, followed by passage through an apparatus for drying the bottom surface of the object. The object is freely suspended while passing through the closed container and the drying apparatus for the bottom surface, and then is passed to a drying apparatus for the top surface of the object.

Abstract: A method of capturing and removing contaminant particles moving within an evacuated interior region of an ion beam implanter is disclosed. The steps of the method include: providing a particle collector having a surface to which contaminant particles readily adhere; securing the particle collector to the implanter such that particle adhering surface is in fluid communication to the contaminant particles moving within the interior region; and removing the particle collector from the implanter after a predetermined period of time.

Abstract: An area of an insulating strip (3) which is to remain free of metal is covered by an endless cover strip (4), which rests on the insulating strip (3) and travels along with it at the same speed. Before it enters a vapor deposition zone (5), the cover strip is provided with a film of oil on the side facing the metal evaporator (6) and, after the cover strip (4) has passed through the vapor deposition zone (5) and after the cover strip (4) and the insulating strip (3) have been separated from each other, the oil which has been deposited from the vapor phase onto the cover strip (4) is removed by heating the cover strip (4) with a heater (7) installed in the immediate vicinity of the cover strip (4).

Abstract: A vacuum deposition system is shown in the form of a sputtering system for rigid disk substrates which uses a single vacuum envelope and a single transport to avoid multiple pump downs or valved isolation structures during the multiple coating processes or the transfer of workpieces between conveyer devices. Work stations carried by a modular processing unit provide a slotted opening through which work pieces supported on the transport enter and leave the work station and which affords sufficient restriction to enable a processing gas atmosphere to be maintained within the work station that is above the pressure of the vacuum envelope while being isolated from the adjoining work stations. The work stations are supported on and readily releasable from the modular processing units to allow service and target replacement to occur offline.

Abstract: A method of and apparatus for depositing a silicon oxide layer onto a wafer or substrate is provided. The present method includes introducing into a processing chamber a process gas including silicon, oxygen, boron, phosphorus and germanium to form a germanium doped BPSG oxide layer having a reflow temperature of less than 800.degree. C. Preferred embodiments of the present method are performed in either a subatmospheric CVD or a plasma enhanced CVD processing apparatus.

Abstract: A tank-like deposition chamber for use in depositing vapors on desired substrates. The deposition chamber has top and bottom ends, and includes a floor which defines the bottom end thereof. In addition to the floor, the deposition chamber includes a vertical sidewall having an inner surface and an upper edge, and at least one wall extension member which is releasably attached to the upper edge of the sidewall and has an upper rim which defines the top end of the deposition chamber. The wall extension member, sidewall and floor define an interior compartment. Attached to the sidewall and communicating with the interior compartment is a vapor inlet port and a first vapor outlet port. Additionally, attached to the wall extension member and communicating with the interior compartment is a second vapor outlet port. The wall extension member increases the storage capacity of the deposition chamber when attached to the upper edge of the sidewall.

Abstract: A vacuum rig apparatus for introducing a liquid into a space defined by a shaped article, which apparatus comprises a series of interconnected vessels attached through a port to a vacuum line, wherein one of the vessels is adapted to hold the shaped article and the apparatus is tiltable about a point midway along the vessel so that liquid from a reservoir flows into the vessel to surround the shaped article and fill the space therein when a vacuum is applied to the apparatus.

Abstract: Damping fluid is applied to a surface of a paper web and is caused to be transported into the web by a gas pressure gradient. The surface of the paper web bearing the damping fluid is subjected to a higher pressure over a large area. The gas pressure gradient can be changed or controlled to vary the rate of damping solution absorption into the paper web.

Abstract: A method and apparatus for applying a coating to a continuous length of tubing. A coating chamber having entry and exit ports substantially encloses a portion of the tubing while permitting the tubing to pass continuously therethrough. Airflow into the coating chamber through the exit port strips excess coating material from the tubing surface. Air is withdrawn from the coating chamber by vacuum pumps through one or more separation chambers which separate entrained particles or droplets of coating material from the air. The coating chamber is preferably disposed at a distance from the separation chamber(s). The vacuum line connecting the coating chamber with the separation chamber(s) is preferably flexible or breakable. The separation chambers are preferably capable of being operated in series or in parallel. Adjustable masks are preferably provided at the entry and exit ports of the coating chamber. A seal is preferably provided at the entry port.

Abstract: In an apparatus for the transport of discoidal substrates (3, 3', . . . ) through a treatment station or from a first to a second processing station (4 and 5, respectively) of a vacuum coating apparatus a motor unit (6) is provided, having three planar, positive conveyors driven by the latter, each having at least two sprockets (10, 10' and 12, 12') and a cogbelt (13, 14) guided over each sprocket pair, two of these conveyors being disposed to one another such that their sprockets (10, 10') extend in a common plane, the sprockets (12, 12') of a third conveyor extending in a plane which runs at right angles to the plane of the sprockets (10, 10') of the other two conveyors, and all three of the parallel strands of the three conveyors, which are at an angle to one another, being tangent to the outside edge of circular discoidal substrates (3, 3', . . .

Abstract: A resist processing apparatus has a washing nozzle inclined outward at a predetermined angle, for jetting a washing liquid to a vicinity of the undersurface of the peripheral portion of an article to be processed, and a collecting device for collecting the washing liquid from a portion above the article. The washing liquid is supplied by the force of the jet and the centrifugal force of the washing liquid from the washing nozzle to the undersurface of the article to remove coated films formed on the peripheral portion of the undersurface of the article. The washing liquid further reaches the upper surface of the article through the peripheral edge of the article. The width of the coated films to be removed is adjusted by properly regulating the amount of flow and the sucked amount of the washing liquid determined by its viscosity.

Abstract: A method and apparatus for filling small diameter, high aspect ratio via openings with a plating solution are disclosed. An apparatus according to the invention comprises a sealable chamber for receiving one or more a multichip module substrate comprising via openings to be plated. A vacuum pump is used to evacuate the chamber after the substrate(s) are positioned therein and the chamber has been sealed. Plating solution is then introduced into the chamber to immerse the substrate(s), and the solution is pressurized, forcing the liquid into the via openings. In one preferred embodiment, the chamber comprises two subchambers separated by a flexible wall. After the subchamber holding the substrate(s) has been evacuated and filled with plating solution, the other subchamber is pressurized, as with compressed air, such that a force is applied to the flexible wall creating hydrostatic pressure within the first subchamber.

Abstract: Lenses are brought individually or in pairs on a transport device (12) to a continuous vacuum apparatus (1) equipped with a rotating substrate carrier (3). The eyeglass lenses (13) are introduced through a system of locks (15) into the continuous vacuum apparatus (1), where they are coated in at least one controllable coating station (5, 6, 7) with at least one transparent layer and then sent back to the transport device (12). The eyeglass lenses (13) are given codes (18), and the codes are read by a code reader (19). The coating parameters of the individual coating stations (5, 6, 7) and the drive of the substrate carrier (3) are controlled by the code reader (19).

Abstract: A method of fabrication of preforms for manufacturing of optical fibers based on surface plasma wave chemical vapor deposition (CVD) is proposed. A surface plasma wave of either the symmetric E.sub.01 or the hybrid HE.sub.11 type is excited on the outside surface of a dielectric starting body. The plasma leads to a CVD of doped or undoped silica layers to obtain the preform. The advantages of the method are the absence of any moving parts in the machinery, high deposition rates, minimal precursor gas usage. Equipment to carry out this process is described as well.

Abstract: An improved vacuum arc coating apparatus is provided, having a tube defining reaction zone with a plasma channel defined within a series of aligned annular substrate holders, or between an outer wall of an axial chain of substrate holder blocks and the inner wall of the tube. The substrate holders thus act as a liner, confining an arc within the plasma channel. Carrier and plasma-creating gases and the reaction species are introduced into the tube, and the deposition process may be carried out at a pressure between 100 Torr and 1000 Torr. Magnetic coils may be used to create a longitudinal magnetic field which focuses the plasma column created by the arc, and to create a transverse magnetic field which is used to bias the plasma column toward the substrates. Substrates can thus be placed anywhere within the reaction zone, and the transverse magnetic field can be used to direct the plasma column toward the substrate, or the tube itself can be rotated to pass the substrate through the plasma column.

Abstract: A boat, carrying wafers to be processed, is pushed into a furnace by a substantially elongated and cantilevered actuator arm having a lug that pushes by first rotating the arm, to cause the lug to traverse a vertical rod attached to against a plate affixed to the boat. The boat is later pulled out of the furnace the boat, and thereafter pulling on the arm to enable the lug to pull against the vertical rod to withdraw the boat. Reliable operation is attained regardless of sagging of the actuator arm relative to the boat.

Abstract: Disclosed is a continuous process of non-compressively and uniformly applying a liquid saturant throughout a permeable sheet. The process includes the steps of: 1) providing a continuously advancing permeable sheet having a first surface and a second surface, 2) depositing a substantially laminar flowing curtain of a liquid saturant generally across and onto the first surface of the continuously advancing permeable sheet, 3) applying a vacuum to the second surface of the continuously advancing permeable sheet, and 4) drawing a substantial portion of the liquid saturant through the permeable sheet to generate a substantially uniform distribution of liquid saturant throughout the permeable sheet. The process may also include the step of drying the liquid saturated permeable sheet. The dry bulk of the liquid saturant treated permeable sheet may be within about 15 percent of the dry bulk of an identical untreated permeable sheet.

Abstract: In order to subject a workpiece, such as a semiconductor wafer, to elevated pressures the workpiece is enclosed in a void (16) between two enclosure parts (6,7) which have been forced together by upper and lower actuators (12,13). The enclosure parts (6,7) are themselves enclosed in a vacuum chamber (1) evacuatable by a vacuum pumping system. Gas is then supplied from a suitable pressure source via a pipe (17) into void (10), thereby to subject the workpiece to elevated pressure. Heating means may be provided to permit the workpiece to be subject to elevated temperature.

Abstract: In a plasma-CVD method and apparatus, plasma is formed from a film material gas in a process chamber and, in the plasma, a film is deposited on a substrate disposed in the process chamber. Formation of the plasma from the material gas is performed by application of an rf-power prepared by effecting an amplitude modulation on a basic rf-power having a frequency in a range from 10 MHz to 200 MHz. A modulation frequency of the amplitude modulation is in a range from 1/1000 to 1/10 of the frequency of the basic rf-power. Alternatively, the rf-power is prepared by effecting on the basic rf-power a first amplitude modulation at a frequency in a range from 1/1000 to 1/10 of the frequency of the basic rf-power, and additionally effecting a second amplitude modulation on the modulated rf-power. A modulation frequency of the second amplitude modulation is in a range from 1/100 to 100 times the modulation frequency of the first amplitude modulation.

Abstract: A microwave plasma enhanced PVD/CVD apparatus and method. The apparatus includes an evacuable deposition chamber having a plasma region and a deposition region adjacent one another. The apparatus also includes a source of microwave energy, and a microwave waveguide to transfer microwave energy from the source thereof to the plasma region. Additionally, the apparatus includes a plate, crucible or boat for holding solid or liquid starting materials within said plasma region, and a system of flow controllers and gas transport tubing for introducing gaseous materials into the plasma region, the interaction of the microwave energy with the gaseous materials forms a plasma within the plasma region. The plasma provides thermal energy for the evaporation of the solid or liquid starting materials and causes the reaction of any reactive gases or vapors present in the plasma region.

Abstract: An apparatus for coating and bonding parts in a vacuum includes a floating mount assembly holding one part and applying a bonding load to the parts. A pivoting mount assembly holds one part and is pivoted between a coating position and a bonding position. At least one coating source is provided for depositing a thin film of a metal onto a surface of each of the parts to improve the cold weld between the two parts. A restraining lever controls the application of the bonding load to the parts. The coating and bonding process occurs in a vacuum chamber with a single set-up.

Abstract: The present invention is the formation of solid polymer layers under vacuum. More specifically, the present invention is the use of "standard" polymer layer-making equipment that is generally used in an atmospheric environment in a vacuum, and degassing the monomer material prior to injection into the vacuum. Additional layers of polymer or metal or oxide may be vacuum deposited onto solid polymer layers. Formation of polymer layers under a vacuum improves material and surface characteristics, and subsequent quality of bonding to additional layers. Further advantages include use of less to no photoinitiator for curing, faster curing, fewer impurities in the polymer electrolyte, as well as improvement in material properties including no trapped gas resulting in greater density, and reduced monomer wetting angle that facilitates spreading of the monomer and provides a smoother finished surface.

Abstract: A method and apparatus are disclosed for forming thin films of chemical compounds utilized in integrated circuits. The method includes steps of forming a precursor liquid comprising a chemical compound in a solvent, providing a substrate within a vacuum deposition chamber, producing a mist of the precursor liquid, and flowing the mist into the deposition chamber while maintaining the chamber at ambient temperature to deposit a layer of the precursor liquid on the substrate. The liquid is dried to form a thin film of a solid material on the substrate, then the integrated circuit is completed to include at least a portion of the film of solid material in a component of the integrated circuit.

Abstract: In a gas deposition apparatus including: an ultra fine particle evaporation chamber; an evaporation source arranged in the ultra fine particle evaporation chamber; a deposition chamber; a substrate arranged in the deposition chamber; a transfer pipe connecting the ultra fine particle evaporation chamber with the deposition chamber; an inlet port of the transfer pipe indirect facing relationship to the evaporation source in the ultra fine particle evaporation chamber and an outlet port of the transfer pipe being in the deposition chamber; a nozzle connected to the outlet port of the transfer pipe, facing the substrate in the deposition chamber; and an introducing port for introducing inert gas into the ultra fine particle evaporation chamber wherein ultra fine particles are evaporated from the evaporation source by heating the latter.

Abstract: An adhesive spray delivery apparatus and a method of applying a predetermined quantity of anchoring adhesive in a predetermined spray pattern to an advancing web of cigarette paper are disclosed. The apparatus includes a pressurized spray system under control of a programmable controller for precisely and uniformly applying the adhesive in an atomized spray to the advancing cigarette paper, thereby eliminating the need to increase the density of the tobacco rod at discrete intervals of the rod to compensate for a significant volume of loose ends. The apparatus is portable and may be retrofitted to existing cigarette makers.

Abstract: A spincup having a wafer backside deposition reduction apparatus is used to reduce wafer backside particle deposition of materials on a wafer during processing. The spincup includes an opening for accommodating a wafer supporting chuck and a particle guard which circumscribes the chuck. The particle guard contacts the base of the spincup and circumscribes the chuck. When the chuck supports a wafer, a wafer backside region is defined between the chuck and the particle guard. The spincup further includes an exhaust channel coupled to the wafer backside region to independently exhaust the wafer backside region. In one embodiment, the exhaust channel includes an exhaust port for connecting a vacuum generator to the exhaust channel and a shroud contacting a base of the spincup and the particle guard. In another embodiment, the exhaust channel includes exhaust tubes which replace the exhaust manifold shroud and exhaust port.

Abstract: An oil applicator for applying a film of oil to a strip of metal has a hollow tubular shaft having a porous, oil absorbent sleeve, with oil sprays spraying oil onto the surface of the sleeve and a vacuum drawn through the hollow of the shaft to draw excess oil through apertures in the shaft wall for collection in a housing. A casing is provided that contains the applicator roll and a slot in the wall of the casing communicates with a duct through which a second vacuum is drawn which removes excess oil that may be applied to the strip of metal and collects the same in a second housing.

Abstract: A gap is defined between an inner region of an end face of a first container member of a container and an inner region of an abutting portion of a second container member, the inner regions being situated inside a seal member. The respective inner regions of the end face of the first container member and the abutting portion of the second container member, which are situated inside the seal member, are prevented from coming into contact with each other when the interior of the container is decompressed. Even though the second container member is bent inward by atmospheric pressure when the container is decompressed to a predetermined degree of vacuum, therefore, the abutting portion thereof cannot come into contact with the inner edge of the end face of the first container member.

Abstract: In order to subject a workpiece, such as a semiconductor wafer, to elevated pressures the workpiece is enclosed in a void (16) between two enclosure parts (6,7) which have been forced together by upper and lower actuators (12,13). The enclosure parts (6,7) are themselves enclosed in a vacuum chamber (1) evacuatable by a vacuum pumping system. Gas is then supplied from a suitable pressure source via a pipe (17) into void (10), thereby to subject the workpiece to elevated pressure. Heating means may be provided to permit the workpiece to be subject to elevated temperature.

Abstract: Apparatus for impregnating wood veneer with a liquid impregnant comprises a container having an upper chamber communicated to a lower impregnation chamber. A clamping mechanism is releasably engageable to a peripheral region of the wood veneer and is cooperably received in the upper chamber in a manner to suspend the wood veneer in the impregnation chamber. An elevator overlies the container and is releasably connectable to the clamping mechanism for lowering the clamping mechanism into the upper chamber to suspend the wood veneer in the impregnation chamber therebelow. The clamping mechanism is disconnected from the elevator such that the clamping mechanism remains in the upper chamber during impregnation of the wood veneer with liquid impregnant. The impregnation chamber is evacuated by a vacuum pump after the wood veneer is suspended therein, and liquid impregnant is introduced from a storage tank to the impregnation chamber about the wood veneer.

Abstract: A process and apparatus for the plasma deposition of a carbon-rich coating onto a substrate is provided. This method includes the steps of: providing a substrate in a vacuum chamber; and generating a carbon-rich plasma in the vacuum chamber by injecting a plasma gas into a hollow cathode slot system containing a cathode made of two electrode plates arranged parallel to each other, providing a sufficient voltage to create and maintain a carbon-rich plasma in the hollow cathode slot system, and maintaining a vacuum in the vacuum chamber sufficient for maintaining the plasma. The plasma is deposited on the substrate to form a carbon-rich coating.