Abstract: A method for spin coating a surface of an optical article, includes the steps of: selecting as the optical article an article (10) with a concave face (12) able to adopt a facing up position in which its uppermost portion is an edge (15) and selecting the concave face as the surface to be coated; dispensing a predetermined volume of a coating solution (18) on the concave face (12) along the edge (15), the concave face (12) facing up and the solution being dispensed in a top down manner; waiting with no motion of the article (10) for the solution to flow on the concave face (12) until it collects centrally; and spinning the article (10) to force the solution back to the edge (15) of the concave face (12).

Abstract: There is provided an apparatus including: a processing cup having an opening opened upward to allow a substrate to be loaded and unloaded, an exhaust port for exhausting an unnecessary atmosphere produced in forming a film applied on the substrate, and an aspiration port for aspirating external air; and an aspiration device aspirating the unnecessary atmosphere through the exhaust port, wherein when the substrate is accommodated in the opening of the processing cup, the substrate has a perimeter spaced from the opening by a predetermined gap, and below the substrate accommodated in the processing cup there is formed an exhaust flow path extending from the aspiration port to the exhaust port.

Abstract: An apparatus and process operate to impose sonic pressure upon a spin-on film liquid mass that exhibits a liquid topography and in a solvent vapor overpressure to alter the liquid topography. Other apparatus and processes are disclosed.

Abstract: There is provided a coating and processing apparatus including a spin chuck horizontally holding a quadrangular substrate and rotating the substrate in a horizontal plane, a coating solution nozzle for supplying a coating solution to a front surface of the substrate horizontally held by the spin chuck, and a solvent supply mechanism provided in the spin chuck for supplying a solvent to a back surface of the substrate, in which the solvent supplied to the back surface of the substrate is allowed to reach the back surface and side surface of each of corners of the substrate by centrifugal force, thereby removing the coating solution attached.

Abstract: A method of drying a surface of a substrate is provided. The method includes supporting a substrate; rotating the substrate about a rotational center point; applying a liquid to the substrate via a liquid dispenser; applying a drying fluid to the substrate via a drying fluid dispenser; moving the drying fluid dispenser and the liquid dispenser in a direction toward an edge region of the substrate, the drying fluid being applied closer to the rotational center point than the fluid; upon the liquid being applied to the edge region of the substrate, discontinuing application of the liquid while continuing the manipulation of the drying fluid dispenser; and upon the drying fluid being applied to the edge region of the substrate, continuing to apply the drying fluid for a predetermined period of time.

Abstract: A coating method for coating a treatment liquid having a viscosity of 5 cp or less on a substrate includes rotating the substrate, increasing a rotation speed of the substrate while discharging the treatment liquid on the substrate from a nozzle, and repeating at least twice increasing and decreasing the rotation speed of the substrate while discharging the treatment liquid on the substrate from the nozzle.

Abstract: A substrate processing apparatus including a holder for rotatably holding a substrate; a coating solution supply nozzle for supplying a coating solution onto a front surface of the substrate to be processed held by the holder; a treatment chamber housing the holder and the coating solution supply nozzle; a cooling device which cools the substrate before the coating solution is supplied to the substrate, to a predetermined temperature; a heating devices which heats the substrate coated with the coating solution to a predetermined temperature; and a transferer that transfers the substrate between the treatment chamber, the cooling device and the heating device, wherein the treatment chamber, the cooling device and the heating device are partitioned from ambient air, and wherein at least the treatment chamber is connected to a gas supply mechanism having a supply source of a gas having a kinematic viscosity coefficient higher than that of air.

Abstract: Disclosed herein is an apparatus for preparing composite particulates, including a rotary body having a bottom surface and a side wall and operative to contain particulates to which an adhering material is to be made to adhere; a centrifugal machine for rotating the rotary body so as to apply centrifugal forces to the particulates in the rotary body; and an inclination varying device operative to vary the inclination of the rotary body to an arbitrary inclination angle in the range from an angle at which the bottom surface of the rotary body forms a horizontal surface perpendicular to the direction of gravity to an angle at which the bottom surface forms a vertical surface parallel to the direction of gravity, and operative to support the rotary body at the arbitrary inclination angle.

Abstract: A substrate transfer system to reduce total processing time by transferring a substrate at a first delivery stage to a process block where processing can be carried out earliest. The substrate processing apparatus includes a first transfer device delivering a wafer with respect to a substrate carrier, and a second transfer device delivering a wafer between a plurality of process blocks and the first transfer device via a first delivery stage, to transfer the wafer with respect to the process blocks. The process block where there is no wafer or where processing of the last wafer within the relevant process block will be completed earliest is determined based on processing information of the wafers from the process blocks, and the wafer of the first delivery stage is transferred by the second transfer device to the relevant process block. This ensures smooth transfer of the wafer to the process block.

Abstract: A coating apparatus includes a liquid film forming mechanism configured to form a liquid film of a process liquid for preventing a contaminant derived from a coating liquid from being deposited or left on a back side peripheral portion of a substrate. The liquid film forming mechanism includes a counter face portion facing the back side peripheral portion of the substrate and a process liquid supply portion for supplying the process liquid onto the counter face portion. The coating apparatus further includes a posture regulating mechanism disposed around the substrate holding member and configured to damp a vertical wobble of the peripheral portion of the substrate being rotated. The posture regulating mechanism includes delivery holes arrayed in a rotational direction of the substrate and configured to deliver a gas onto a back side region of the substrate on an inner side of the peripheral portion.

Abstract: A wet processing system detects a globule of a process solution in a drippy or dripping state from the tip of any one of process solution pouring nozzles being moved to a pouring position for pouring the process solution onto a substrate by obtaining image data on the process solution pouring nozzle, and takes proper measures to prevent the process solution from dripping. A wet processing system 1 pours a process solution, such as a resist solution, through one of process solution pouring nozzles 10 onto a surface of a substrate, such as a wafer W, held substantially horizontally by a substrate holding device 41 surrounded by a cup 5 to process the surface by a wet process. A nozzle carrying mechanism 10a carries the process solution pouring nozzles 10 between a home position on a nozzle bath 14 and a pouring position above the substrate held by the substrate holding device 41. An optical image of the tips of the process solution pouring nozzles 10 is obtained by an image pickup means, such as a camera 17.

Abstract: A method and device for wet treatment of plate-like articles includes, a chuck for holding a single plate-like article having an upwardly facing surface for receiving liquid running off a plate-like article when being treated with liquid, wherein the chuck is outwardly bordered by a circumferential annular lip. The chuck has an outer diameter greater than the greatest diameter of the plate-like article to be treated, and a rotatable part with an upwardly facing ring-shaped surface for receiving liquid running off the circumferential lip of the chuck. The rotatable part is rotatable with respect to the chuck, the ring-shaped surface is coaxially arranged with respect to the circumferential annular lip, the inner diameter of the ring-shaped surface is smaller than the outer diameter of the chuck, and the distance d between the lip and the upwardly facing ring-shaped surface is in a range from 0.1 mm to 5 mm.

Abstract: Embodiments of the invention provide methods and systems for depositing a viscous material on a substrate surface. In one embodiment, the invention provides a method of depositing a viscous material on a substrate surface, the method comprising: applying a pre-wet material to a surface of a substrate; depositing a viscous material atop the pre-wet material; rotating the substrate about an axis to spread the viscous material along the surface of the substrate toward a substrate edge; and depositing additional pre-wet material in a path along the surface and adjacent the spreading viscous material.

Abstract: A resist coating method supplies a resist solution to substantially the center of a target substrate to be processed while rotating the target substrate at a first rotational speed, then reduces a rotational speed of the target substrate to a second rotational speed lower than the first rotational speed, reduces the rotational speed of the target substrate to a third rotational speed lower than the second rotational speed or until rotational halt to adjust the film thickness of the resist solution, and accelerates the rotation of the target substrate to a fourth rotational speed higher than the third rotational speed to spin off a residue of the resist solution.

Abstract: A coating apparatus includes a driving unit configured to rotate a substrate holding member about a vertical axis to spread a coating liquid supplied on a front side central portion of a substrate toward a front side peripheral portion of the substrate by a centrifugal force. The apparatus is provided with a wobble damping mechanism including a gas delivery port and a suction port both disposed to face a back side of the substrate and configured to damp a wobble of the substrate being rotated by delivering a gas from the delivery port and sucking the gas into the suction port.

Abstract: A resin layer formation method, resin layer formation device, disk and disk manufacturing method for making a resin layer uniform on a substrate before lamination or on a substrate to be coated by a simple procedure are provided. Adhesive A is coated at the inner circumference side while rotating a substrate P at low speed, a first adhesive layer AL1 is formed on the surface of the substrate P by rotating the substrate P at high speed, a step difference section H is formed around a rotation center of the substrate P by irradiating ultraviolet on an area in the inner circumference side of the first adhesive layer AL1 and hardening the area, the adhesive A is coated at the rotation center side from the step difference section H on the substrate P, and a second adhesive layer AL2 is formed on the first adhesive layer AL1 by rotating the substrate P at high speed. The first adhesive layer AL1 and the second adhesive layer AL2 are integrated to form a uniform adhesive layer B as a whole.

Abstract: Techniques for arranging materials on a substrate are provided. In one embodiment, a system may comprise a driver for providing a rotational force, an outer body having an inner surface, and an inner body having an outer surface and disposed within the outer body in a concentric relationship therewith. The inner body may be coupled to the driver to be rotated by the rotational force. The system may further comprise a coupler attached to the outer body in order to retain a substrate, which forms at least one patterned groove therein. A fluid channel, which may be defined between the inner and outer bodies, may be filled with a fluid medium containing materials such as nano materials. When the inner body rotates via the rotational force, the materials contained in the fluid medium may be arranged in the patterned groove of the substrate.

Abstract: An apparatus for making and using a fastener suitable for use in airplane manufacture or repair that is coated with a pre-mixed moisture cure sealant. The sealant layer is coated with a frangible moisture barrier that will break apart when the fastener is installed, thus exposing the sealant to a moisture source. Once exposed to moisture, the sealant will begin to cure. Preferred embodiments also provide a premature cure indicator that provides a visual indication that the outer moisture resistant layer has been damaged.

Abstract: A substrate processing apparatus is provided. The substrate processing apparatus includes a substrate supporting member including a spin head on which a substrate is placed, a nozzle discharging processing liquid to the substrate placed on the spin head, and a processing liquid supplying source supplying the processing liquid to the nozzle. The nozzle includes a nozzle main body that has a plurality of discrete discharging openings and an integration discharging opening. The discrete discharging openings have a slit-shaped cross section having a first length and are arrayed in series in a predetermined direction. The integration discharging opening is formed by connecting the discrete discharging openings to each other in a single slot shape having a length greater than the first length, and finally discharges the processing liquid.

Abstract: An apparatus for applying a layer to a hydrophobic surface. The apparatus including: a chuck having a top surface and rotatable about a axis perpendicular to the top surface and passing through a center point of the top surface; and hollow first and second dispense nozzles having respective first and second bores, the first and second dispense nozzles mounted on a application head disposed above the top surface of the chuck, the application head moveable in a direction parallel to the top surface of the chuck, the first dispense nozzle alignable over the center point when the application head is in a first position and the second dispense nozzle alignable over the center point when the application head is in a second position, at least a portion of the bore of second dispense tube having a maximum cross-sectional dimension of between about 0.5 millimeters and about 2.0 millimeters.

Abstract: To manufacture a photochromic lens by uniformly applying a coating liquid having a photochromic function without leaving an uncoated area, with a minimum necessary coating amount. There is provided a manufacturing method of the photochromic lens for dripping and applying a coating liquid 9 having the photochromic function onto a coating surface 2 of a spectacle lens, while rotating a spectacle lens 1, and forming a photochromic film having the photochromic function on the coating surface, comprising dripping (ring-shaped drip part 25) the coating liquid in a ring shape in the vicinity of an outer circumference on the coating surface of the spectacle lens, and thereafter dripping (spiral-shaped drip part 26) the coating liquid in a spiral shape toward a geometrical center or an optical center of the spectacle lens from the vicinity of the outer circumference, wherein the coating surface has a convex curved shape, and a viscosity of the coating liquid is 25 to 500 cps at 25° C.

Abstract: The invention intends to provide a method for preventing deterioration in quality of the primer layer resulting from spinning-off and reattachment of a primer liquid on forming a polyurethane primer layer on a substrate for an eyeglass lens or the like using a coating composition containing a moisture-curing polyurethane resin. The method for producing a laminate according to the present invention comprises performing spin-coating while a spin-coating apparatus is forcefully evacuated through the side wall and/or the bottom thereof, on producing a laminate by spin-coating the surface of a substrate with a coating composition containing a moisture-curing polyurethane resin.

Abstract: A chemical solution is uniformly dispensed from a nozzle by N2 in spin-coating equipment. The dispensing apparatus includes a canister configured to receive a bottle containing the chemical solution, gas supply piping connecting a source of N2 to the inside of the canister, a pressure control valve disposed in the gas supply piping, a chemical supply line by which the bottle is connected to the nozzle, a pressure sensor for sensing the pressure of the chemical solution supplied from the bottle, and a controller that controls the pressure control valve on the basis of the pressure sensed by the pressure sensor. The controller opens the pressure control valve further when the value of the signal output by the pressure sensor is less than a value representative of the minimum of a predetermined pressure range, and closes the pressure control valve further when the value of the signal output by the pressure sensor is greater than a value representative of the maximum of the predetermined pressure range.

Abstract: An apparatus for forming silicon oxide film is disclosed. The apparatus includes a spin coating unit, a carrying unit, and an oxidation unit. The spin coating unit forms a polymer film above a substrate by spin coating a solution including a polymer containing a silazane bond dissolved in an organic solvent. The carrying unit carries the substrate to the oxidation unit without contacting the polymer film. The oxidation unit, when receiving the substrate from the carrying unit, converts the polymer film into the silicon oxide film by either immersing the polymer film with a heated aqueous solution containing hydrogen peroxide, spraying the heated aqueous solution containing hydrogen peroxide over the polymer film, or exposing the polymer film to a reaction gas containing a hydrogen peroxide vapor. The apparatus, by itself, completes the polymer film formation and the polymer-to-silicon oxide film conversion within the apparatus itself.

Abstract: A coating apparatus comprises a tray, a nozzle for supplying a coating liquid, and a squeegee which serves as an applicator for spreading a coating liquid. The tray has a recessed portion into which a substrate is placed, and a spinner chuck is provided in the recessed portion. In the spinner chuck, a chuck for attracting the substrate is attached to the upper end of a spinner shaft which can be lifted and lowered, and the upper surface of the chuck and the bottom surface of the recessed portion are arranged to be in the same plane in a state where the spinner shaft is lowered to the lowest position.

Abstract: A system, apparatus, and method for creating designs on an underlying material by spinning a platform on which the material is positioned while applying a coloring agent onto the material, and a system and method for lifting and disassembling a spinning platform to remove the painted material.

Abstract: A semiconductor manufacturing apparatus comprises a discharge portion discharging a coating liquid onto a substrate; a gas supply tube supplying an inert gas into a liquid container that contains the coating liquid, and pressurizing an interior of the liquid container; a coating liquid supply tube airtightly supplying the coating liquid from the liquid container to the discharge portion using pressurization from the gas supply tube; a first connecting portion capable of attaching and detaching the liquid container to and from the coating liquid supply tube; a second connecting portion capable of attaching and detaching the liquid container to and from the gas supply tube; and a solvent supply tube supplying a solvent, which can dissolve the coating liquid, to the first connecting portion.

Abstract: In order to apply a liquid material including a small number of bubbles, in particular almost no bubbles larger than a predetermined size, a liquid material supplying apparatus includes: a pressure tank applying a positive pressure higher than the atmospheric pressure to the liquid material; a syringe having a nozzle for discharging the liquid material; and a liquid path member forming a liquid path leading the liquid material from the pressure tank to the syringe; a valve member which is provided on the liquid path member and which opens/closes the liquid path; a bubble defoaming filter which is provided on the liquid path member between the syringe and the valve member and which removes bubbles from the liquid material lead in the liquid path member; and a pressure applying mechanism which starts/stops discharging the liquid material from the nozzle by selectively applying a first pressure higher than the atmospheric pressure and a second pressure lower than the first pressure.

Abstract: Embodiments of the invention provide methods and systems for depositing a viscous material on a substrate surface. In one embodiment, the invention provides a method of depositing a viscous material on a substrate surface, the method comprising: applying a pre-wet material to a surface of a substrate; depositing a viscous material atop the pre-wet material; rotating the substrate about an axis to spread the viscous material along the surface of the substrate toward a substrate edge; and depositing additional pre-wet material in a path along the surface and adjacent the spreading viscous material.

Abstract: A method of cleaning a spin coater apparatus is provided. In one embodiment, the method comprises providing a spin coater apparatus having a coater cup comprising a basin with sidewalls, a rotatable platform situated inside the cup adapted for holding and rotating a wafer to be coated, and a solvent dispensing means mounted under the rotatable platform; placing the substrate on the rotatable platform; rotating the rotatable platform; continuously dispensing a cleaning solvent from the solvent dispensing means to rinse the backside of the wafer with the cleaning solvent and to pre-wet an interior surface of the sidewalls; and dispensing a coating material upon the wafer, the substrate mounted on the rotatable platform.

Abstract: A drain port and an exhaust port arranged at the bottom of a cup surrounding a substrate holding unit. A drainage tray is arranged below the cup so as to cover the moving area of the drain port when the substrate holding unit and the cup move in X-directions and Y-directions. An exhaust unit is arranged at a position corresponding to the position of the exhaust port of the cup when the substrate holding unit is in its spin-drying position. The exhaust unit is connected to the exhaust port to suck the interior of the cup when the spin-drying of the substrate is executed. The use of a flexible tube which is always connected to the exhaust port is no longer necessary.

Abstract: The present invention provides a coating apparatus which can form a stable photochromic coating film. In the invention, a centering device, a lens height measuring device, a primer fluid applicator device, a primer spinning device, a drying device, a photochromic fluid applicator device, a photochromic spinning device, a UV device and a lens transport means comprising a pair of handling devices are provided to a coating apparatus.

Abstract: A resin layer formation method, resin layer formation device, disk and disk manufacturing method for making a resin layer uniform on a substrate before lamination or on a substrate to be coated by a simple procedure are provided. Adhesive A is coated at the inner circumference side while rotating a substrate P at low speed, a first adhesive layer AL1 is formed on the surface of the substrate P by rotating the substrate P at high speed, a step difference section H is formed around a rotation center of the substrate P by irradiating ultraviolet on an area in the inner circumference side of the first adhesive layer AL1 and hardening the area, the adhesive A is coated at the rotation center side from the step difference section H on the substrate P, and a second adhesive layer AL2 is formed on the first adhesive layer AL1 by rotating the substrate P at high speed. The first adhesive layer AL1 and the second adhesive layer AL2 are integrated to form a uniform adhesive layer B as a whole.

Abstract: To provide a coating apparatus capable of automatically executing a series of steps of measuring the shape of a lens and applying a primer solution thereon, drying the primer solution and applying a photochromic coating solution thereon, and curing the coated solutions by the UV irradiation, liberating the operator from the work of setting the lenses piece by piece. A lens-feeding portion 2 is arranged upstream of the series of steps, the lens-feeding portion 2 having lens-holding units 22 in which a plurality of lenses are arranged straight in the horizontal direction and/or in the up-and-down direction, and a first lens sub-carrier means 31 for carrying the lenses held therein to the lens-measuring portion 3.

Abstract: A method of substrate edge treatment includes forming a processing target film on a treatment target substrate, applying an energy line to a predetermined position on the processing target film to form a latent image on the processing target film, heating the treatment target substrate in which the latent image is formed on the processing target film, developing the processing target film after the heating, inspecting whether a residue is present at an edge of the treatment target substrate after the developing, and cleaning an end of the treatment target substrate to remove the residue at the edge of the treatment target substrate determined to be defective in the inspecting.

Abstract: A coating method based on such a technique includes a prewetting step of supplying a prewetting liquid to the center of a substrate (W) and rotating the substrate thereby spreading the prewetting liquid over the whole surface of a first substrate, and a coating film forming step of supplying a coating solution (e.g., a resist solution) to the substrate supplied with the prewetting liquid and drying the coating solution thereby forming a coating film on the surface of the first substrate. The prewetting liquid used is a mixed liquid obtained by mixing a solvent capable of dissolving components of the coating film (e.g., components of resist) and a high surface tension liquid having a surface tension higher than that of the solvent, the mixed liquid having a surface tension higher than that of the coating solution.

Abstract: The present invention discloses a method for preparing a substrate coated support for use in micro-array devices. The method of the present invention comprises the steps of applying a first coat of substrate to a support, making the substrate coating ramp by subjecting the coated support to centripetal forces, adding a second coat of substrate to the resulting support having a ramping planar coat and subjecting the coated support to centripetal forces for a second time to produce a substrate coated membrane in which the thickness of the substrate layer is uniform across the entire coated surface.

Abstract: A coating film processing method is used for processing a coating film formed on a surface of a substrate to prepare for an immersion light exposure process arranged to perform light exposure through a liquid. The method includes supplying a solvent-containing liquid comprising a combination of a solvent and a solvent-ability decreasing agent for decreasing solvent ability, or a diluted solvent, onto an edge portion of the coating film, thereby performing edge portion cutting; and supplying a cleaning liquid onto the edge portion of the coating film, thereby performing edge portion cleaning, subsequently to the edge portion cutting.

Abstract: There is disclosed a film forming method comprising continuously discharging a solution adjusted so as to spread over a substrate by a given amount to the substrate through a discharge port disposed in a nozzle, moving the nozzle and substrate with respect to each other, and holding the supplied solution onto the substrate to form a liquid film, wherein a distance h between the discharge port of the nozzle and the substrate is set to be not less than 2 mm and to be in a range less than 5×10?5 q? (mm) given with respect to a surface tension ? (N/m) of the solution, discharge speed q (m/sec) of the solution continuously discharged through the discharge port, and a constant of 5×10?5 (m·sec/N).

Abstract: A resist pipe and a resist coating device are provided. Support portions are provided at an inner wall of a resist supply portion towards a cross-sectional center of the resist supply portion from three locations. The support portions are provided at equal intervals at the inner wall, and the leading ends thereof extend to positions at which a circular rod-shaped liquid level sensor portion is nipped by a peripheral surface of the liquid level sensor portion. In this manner, the support portions support the liquid level sensor portion from three directions, and gaps are formed between the liquid level sensor portion and the inner wall of the resist supply portion. The liquid level sensor portion inside the resist supply portion is supported by the support portions such that a sensing portion is substantially in the same plane as an inlet aperture of the resist supply portion.

Abstract: This disclosure describes a sample drying system and method that provides a high rates of evaporation and sublimation that is commonly employed in compound processing procedures. The drying increases the sample-solute concentration and removes the solvent completely to produce the dried sample as a non-volatile solute precipitate. Re-circulating of drying gas is disclosed along with a solvent cold trap.

Abstract: It is shown a method and apparatus for distributing a viscous liquid over a surface of a substrate, e.g. a semiconductor wafer or a datastorage media, by conditioning the substrate thermally, locally specific before or during the spin coating process.

Abstract: A system of drying a surface of a substrate is provided. The system includes a rotary support for supporting a substrate; and an assembly comprising a first dispenser, a second dispenser, and a third dispenser, the assembly positioned above the surface of the substrate, the second and third dispensers positioned on the assembly adjacent to and in contact with one another and spaced from the first dispenser, the second dispenser having an opening that is larger than an opening of the third dispenser, and the second dispenser being located between the first and third dispensers; and means for translating the assembly generally parallel to the surface of the substrate.

Abstract: A substrate processing apparatus includes a rotary cup disposed outside a substrate holding member to surround a substrate held on the substrate holding member and to rotate along with the substrate holding member, and having a wall portion that receives a process liquid thrown off from the substrate being rotated. Further, this apparatus includes an exhaust and drain cup disposed outside the rotary cup to surround the rotary cup and the substrate holding member, and including an annular liquid receptacle that receives the process liquid thrown off from the substrate being rotated and an inner annular space formed on an inward side from the annular liquid receptacle. An exhaust mechanism is connected to the inner annular space of the exhaust and drain cup.

Abstract: A system or device for spin coating an implantable medical device, such as a stent, is disclosed. The device includes a coating table to support the stent, the stent being positioned on top of the coating table and supported on the table by a support fixture. The coating table has an axis of rotation. The axis of rotation of the table can intersect a center of the mass of the stent. A driving means can be provided for rotating the stent about the longitudinal axis of the stent and for rotating the coating table about the axis of rotation.

Abstract: The present invention supplies a solvent to the front surface of a substrate while rotating the substrate. Subsequently, the substrate is acceleratingly rotated to a first number of rotations, and a resist solution is supplied to a central portion of the substrate during the accelerating rotation and the rotation at the first number of rotations. Thereafter, the substrate is deceleratingly rotated to a second number of rotations, and after the number of rotations of the substrate reaches the second number of rotations, the resist solution is discharged to the substrate. The substrate is then acceleratingly rotated to a third number of rotations higher than the second number of rotations so that the substrate is rotated at the third number of rotations. According to the present invention, in application of the resist solution by spin coating, the consumption of the resist solution can be suppressed, and a high in-plane uniformity can be obtained for the film thickness of the resist film.

Abstract: A spin coating device includes a container and a rotating member. The container is used for holding a first solution and includes a sidewall which a plurality of substrates are arranged on. The rotating member is rotatable within the container and includes an inlet and at least one outlet. A second solution flows into the rotating member through the inlet, and flows into the container through the at lease one outlet. A mixture of the first solution and the second solution is spread onto the substrate by centrifugal force of the rotating member.

Abstract: Leakage of an atmosphere of a solvent vapor used by a smoothing process for smoothing the surface of a resist pattern outside from a smoothing unit is prevented to facilitate incorporating the smoothing unit into a coating and developing system. A substrate processing system has a coating and developing block 20, a smoothing block 50, an airflow producing unit 60 for producing down airflow that flows down from above the coating and developing block 20 and the smoothing block 50, and a main controller 100 for controlling the airflow producing unit 60.

Abstract: The invention relates to a treatment apparatus (1) for treating a surface (21) of a body (2) with a first treatment medium (31) and a second treatment medium (32). In this respect, the treatment apparatus (1) includes a holding device (5) rotatable about an axis of rotation (4) for receiving and holding the body (2) and a rotary drive (6) rotationally fixedly coupled to the rotatable holding device (5) as well as a supply device (7) for supplying the first treatment medium (31) and the second treatment medium (32) to the surface (21) of the body (2) held in the holding device (5). The treatment apparatus includes a collection container (8) having a separation element (80) which separation element (80) divides the collection container (8) into a first chamber (81) and into a second chamber (82) such that the first treatment medium (31) can be collected in the first chamber (81) and the second treatment medium (32) can be collected separately in the second chamber (82).

Abstract: Wafers A1 to A10 of a first lot A and wafers B1 to B10 of a second lot B are processed by a second heating unit at different temperatures, respectively. A wafer W is carried in a processing block included in coating and developing system along a route passing a temperature control unit CPL2, a coating unit BCT, a heating unit LHP2, a temperature control unit CPL3, a coating unit COT, a heating unit LHP3, and a cooling unit COL in that order. The process temperature of the heating unit LHP3 is changed after the last wafer A10 of the first lot A has been processed by the heating unit LHP3.