Program, Cyclic, Or Time Control Patents (Class 118/696)
  • Patent number: 10269598
    Abstract: A substrate treating apparatus includes a treating section for treating substrates. The treating section has a front face and a rear face both connectable to an indexer section for feeding the substrates to the treating section. Such substrate treating apparatus can improve the degree of freedom for arranging the treating section and the indexer section.
    Type: Grant
    Filed: November 9, 2016
    Date of Patent: April 23, 2019
    Assignee: SCREEN Holdings Co., Ltd.
    Inventor: Yukihiko Inagaki
  • Patent number: 10217680
    Abstract: A test apparatus includes a lighting unit radiating light on a to-be-tested object having a light transmitting resin containing a light conversion material; a camera unit obtaining an image of the to-be-tested object while the light transmitting resin is emitted by receiving light emitted by the lighting unit; and a controller determining whether the to-be-tested object is defective by calculating gray values from the image obtained by the camera unit.
    Type: Grant
    Filed: January 11, 2017
    Date of Patent: February 26, 2019
    Inventors: Dae Seo Park, Song Ho Jeong, Oh Seok Kwon, Jong Tae Kim, Choo Ho Kim
  • Patent number: 10006146
    Abstract: Provide an apparatus for selective epitaxial growth. The apparatus for selective epitaxial growth, the apparatus comprising, a process tube comprising an inner tube in which a substrate stack unit for receiving a plurality of substrates is accommodated and an outer tube surrounding the inner tube, a heater assembly disposed to surround the process tube and a side nozzle unit vertically disposed inside the process tube, wherein the side nozzle unit comprises first and second side nozzles for respectively spraying an etching gas and a depo gas for the selective epitaxial growth.
    Type: Grant
    Filed: March 26, 2013
    Date of Patent: June 26, 2018
    Inventors: Yong Sung Park, Sung Kwang Lee, Dong Yeul Kim, Ki Hoon Kim
  • Patent number: 9929030
    Abstract: Provided is a substrate processing device capable of improving throughput without increasing the operation speed of a drive device. Vacuum processing chambers which house a wafer for plasma processing of the wafer are respectively provided with gate valves for opening and closing a wafer inlet/outlet port, and wafer detection sensors for detecting the wafer moving forward or backward through the wafer inlet/outlet port, and a scara robot for making extending/retracting motion and rotating motion transfers the wafer. At this time, the scara robot starts the rotating motion to transfer the wafer picked up from the vacuum processing chamber in response to a trigger signal transmitted from the wafer detection sensor. The trigger signal indicates that the wafer has passed through the wafer inlet/outlet port and has arrived at a point where the gate valve and the wafer inlet/outlet port no longer interfere with the wafer.
    Type: Grant
    Filed: November 12, 2013
    Date of Patent: March 27, 2018
    Inventor: Shinji Wakabayashi
  • Patent number: 9902565
    Abstract: An article transport facility includes a traveling portion configured to travel on a traveling rail, a cleaning unit coupled to the traveling portion, a feeding portion configured to supply traveling driving power for the traveling portion and cleaning driving power for the cleaning unit, a power storage device connected between the feeding portion and the cleaning unit, and a power control portion. The power control portion is configured to: charge the power storage device with power corresponding to a driving state of the traveling portion and a position of the traveling portion along the transport path; and discharge the power storage device when power received from the feeding portion is insufficient relative to a total power of the traveling driving power and the cleaning driving power.
    Type: Grant
    Filed: February 7, 2017
    Date of Patent: February 27, 2018
    Assignee: Daifuku Co., Ltd.
    Inventors: Ryuya Murakami, Junji Shibata
  • Patent number: 9732909
    Abstract: A gas supply system for supplying a gas into a processing chamber for processing a substrate to be processed includes: a processing gas supply unit; a processing gas supply line; a first and a second branch line; a branch flow control unit; an additional gas supply unit; an additional gas supply line; and a control unit. The control unit performs, before processing the substrate to be processed, a processing gas supply control and an additional gas supply control by using the processing gas supply unit and the additional gas supply unit, respectively, wherein the additional gas supply control includes a control that supplies the additional gas at an initial flow rate greater than a set flow rate and then at the set flow rate after a lapse of a period of time.
    Type: Grant
    Filed: July 24, 2014
    Date of Patent: August 15, 2017
    Inventors: Shinichiro Hayasaka, Ken Horiuchi, Fumiko Yokouchi, Takeshi Yokouchi
  • Patent number: 9441791
    Abstract: A gas supply unit, for supplying a gas into a processing chamber in which a substrate is processed, includes a plurality of gas supply sources, a mixing line for mixing a plurality of gases supplied from the gas supply sources to make a gaseous mixture, a multiplicity of branch lines for branching the gaseous mixture to be supplied to a multiplicity of places in the processing chamber, and an additional gas supply unit for supplying a specified additional gas to a gaseous mixture flowing in at least one branch line. The gas supply unit also includes pressure gauges and valves for adjusting gas flow rates in the branch lines, respectively, and a pressure ratio controller for controlling that gaseous mixtures branched into the branch lines to have a specified pressure ratio by adjusting opening degrees of the valves based on measurement results obtained by using the pressure gauges.
    Type: Grant
    Filed: November 30, 2012
    Date of Patent: September 13, 2016
    Inventors: Kenetsu Mizusawa, Keiki Ito, Masahide Itoh
  • Patent number: 9152054
    Abstract: In an entire region exposure unit, a platform section and a local transfer mechanism are arranged in one direction. The local transfer mechanism is provided with a local transfer hand. A substrate on which a resist film having a predetermined pattern is formed is held by the local transfer hand. A light-emitting device is attached to the upper portion of the local transfer mechanism. Strip-shaped light is emitted from the light-emitting device toward below. The local transfer mechanism operates such that the local transfer hand is moved relative to the light-emitting device. At this time, the light-emitting device irradiates one surface of the substrate that is moving horizontally with the strip-shaped light. The resist film is modified by the light.
    Type: Grant
    Filed: March 18, 2013
    Date of Patent: October 6, 2015
    Assignee: SCREEN Semiconductor Solutions Co., Ltd.
    Inventors: Kazuhiro Nishimura, Akihiko Morita, Yukihiko Inagaki
  • Patent number: 9121095
    Abstract: A thin film deposition apparatus used to produce large substrates on a mass scale and improve manufacturing yield. The thin film deposition apparatus includes a deposition source; a first nozzle disposed at a side of the deposition source and including a plurality of first slits arranged in a first direction; a second nozzle disposed opposite to the first nozzle and including a plurality of second slits arranged in the first direction; and a barrier wall assembly including a plurality of barrier walls arranged in the first direction so as to partition a space between the first nozzle and the second nozzle.
    Type: Grant
    Filed: May 21, 2010
    Date of Patent: September 1, 2015
    Assignee: Samsung Display Co., Ltd.
    Inventors: Choong-Ho Lee, Jung-Min Lee
  • Patent number: 9085108
    Abstract: A film adhering mechanism includes a base, a film adsorbing platform, at least two flexible members, a vacuum generator; and an electromagnetic valve. The film adsorbing platform includes a main body positioned on the base, and a protective pad covered on the main body away from the base. The at least two flexible members are separately mounted on the base, and pass through the main body and the protective pad, and protrude from the protective pad. A gas inlet and a first adsorbing hole communicating with the gas inlet are defined in the main body. A second adsorbing hole is defined in the protective pad communicating with the first adsorbing hole. The vacuum generator communicates with the gas inlet, and the electromagnetic valve controls the vacuum generator.
    Type: Grant
    Filed: October 23, 2013
    Date of Patent: July 21, 2015
    Inventor: Chao Shen
  • Patent number: 9085001
    Abstract: The disclosed electrostatic coating system (1) includes a spray gun (2) for electrostatic coating, a high-voltage generator (5), and an alternating-current source unit (4), and further includes a removable grounding member (7), in a state attached to the main body of the gun, provided to close an open-circuit portion (3c) of the grounded power source line (3a), and a control circuit (8) for controlling the alternating current source unit (4) by detecting the current flowing through the power source line (3) or the voltage of the power source line (3) by a current coil (13) to stop application of the alternating voltage (Vac) to the high-voltage generator (5) when the detected electric current or the detected voltage has dropped or either the current or the voltage is not detected during supply of the alternating voltage (Vac) to the high voltage generator (5) of the spray gun (2). This system enables prevention of charging of the removable grounding member (7) to improve the safety in the coating operation.
    Type: Grant
    Filed: September 27, 2010
    Date of Patent: July 21, 2015
    Inventors: Masami Murata, Tatsuya Nishio, Satoshi Yamasaki, Teruo Ando
  • Publication number: 20150140228
    Abstract: The present invention provides apparatus, including a pigging tool, that comprises a spraying mechanism configured to move along an inner surface of a pipeline, including a slurry transport pipeline in a minable oilsands facility or plant, and to spray a coating on the inner surface of the pipeline; and a curing source, including an ultraviolet (UV) light source, a microwave source or an RF source, configured to cure the coating sprayed on the inner surface of the pipeline in situ as the spray mechanism moves along the inner surface of the pipeline.
    Type: Application
    Filed: October 18, 2012
    Publication date: May 21, 2015
    Inventors: Alan D. Kersey, Mark R. Fernald, John Viega, Francis K. Didden
  • Publication number: 20150122175
    Abstract: A detector for detecting a position of a mark comprises: an image sensing device; an optical system which projects the mark onto an image sensing surface of the image sensing device; a pattern located in a position between the image sensing surface and an optical element located closest to a plane on which the mark is to be located, among optical elements forming the optical system, the position being optically conjugated with the plane; and a processor which calculates a position of the mark with respect to one of a position of the pattern and a position already known from the position of the pattern, based on a moire pattern formed on the image sensing surface by the mark and the pattern.
    Type: Application
    Filed: January 7, 2015
    Publication date: May 7, 2015
    Inventor: Hiroshi SATO
  • Publication number: 20150124345
    Abstract: A method and system for forming filter elements on a plurality of display substrates using a digital imaging system operable to selectively deposit filter material at a plurality of deposition locations is disclosed. The method involves receiving orientation information defining a disposition of a plurality of pixels associated with the at least one display substrate, identifying pixels in the plurality of pixels that are to receive filter material for forming a filter element on the pixel, selecting deposition locations within each of the identified pixels in accordance with the orientation information to meet an alignment criterion associated with placement of the filter element within the pixel, and controlling the digital imaging system to cause deposition of the filter material at the selected deposition locations.
    Type: Application
    Filed: July 21, 2011
    Publication date: May 7, 2015
    Applicant: E INK CORPORATION
    Inventors: Gil Rosenfeld, Eran Elizur, Gregory Dean Peregrym, David Victor Marcolin, Guy Sirton
  • Publication number: 20150118390
    Abstract: A method and system for forming filter elements on a plurality of display substrates using a digital imaging system operable to selectively deposit filter material at a plurality of deposition locations is disclosed. The method involves receiving orientation information defining a disposition of a plurality of pixels associated with the at least one display substrate, identifying pixels in the plurality of pixels that are to receive filter material for forming a filter element on the pixel, selecting deposition locations within each of the identified pixels in accordance with the orientation information to meet an alignment criterion associated with placement of the filter element within the pixel, and controlling the digital imaging system to cause deposition of the filter material at the selected deposition locations.
    Type: Application
    Filed: December 18, 2014
    Publication date: April 30, 2015
    Inventors: Gil Rosenfeld, Eran Elizur, Gregory Dean Peregrym, David Victor Marcolin, Guy Sirton
  • Patent number: 8997686
    Abstract: A system for and method of delivering pulses of a desired mass of gas to a tool is described.
    Type: Grant
    Filed: September 29, 2010
    Date of Patent: April 7, 2015
    Assignee: MKS Instruments, Inc.
    Inventor: Junhua Ding
  • Patent number: 8997685
    Abstract: A single axis application unit for processing a glass workpiece includes a workpiece supporting table, an applicator movable on a traveler shiftable along a first linear axis and a central suction unit that is activateable to grip the glass workpiece that travels along a second linear axis oriented generally perpendicular to the first linear axis. A central suction unit brake selectively secures the central suction unit both rotationally and translationally. The central suction unit is freely moveable both translationally and rotationally when the central suction unit brake is released. A mid-peripheral suction unit is located at a fixed location remote from the central suction unit and selectively activateable to grip the glass workpiece to hold the glass workpiece in a fixed orientation. A corner suction gripper is movable with the applicator parallel to the first linear axis, and is selectively activateable to grip the glass workpiece.
    Type: Grant
    Filed: August 7, 2012
    Date of Patent: April 7, 2015
    Assignee: Erdman Automation Corporation
    Inventor: Morgan Donohue
  • Patent number: 8991332
    Abstract: Systems and apparatus are disclosed for adjusting the temperature of at least a portion of the surface of a reaction chamber during a film formation process to control film properties. More than one portion of the chamber surface may be temperature-modulated.
    Type: Grant
    Filed: February 27, 2009
    Date of Patent: March 31, 2015
    Assignee: Applied Materials, Inc.
    Inventors: Satheesh Kuppurao, David K. Carlson, Manish Hemkar, Andrew Lam, Errol Sanchez, Howard Beckford
  • Patent number: 8993353
    Abstract: In resin coating, carrying a light-passing member test-coated with a resin on a light-passing member carrying unit; making a light source placed above the light-passing member carrying unit emit excitation light exciting the fluorescent substance; measuring light emission characteristics of the light by irradiating the excitation light emitted from the light source unit from above to the resin coated onto the light-passing member and receiving the light that the resin emits from below the light-passing member by a light emission characteristic measurement unit; obtaining a deviation between a measurement result of the light emission characteristic measurement unit and a prescribed light emission characteristic; and deriving the appropriate resin coating quantity of the resin to be coated onto the LED element as what is used for practical production based on the deviation.
    Type: Grant
    Filed: May 30, 2012
    Date of Patent: March 31, 2015
    Assignee: Panasonic Intellectual Property Management Co., Ltd.
    Inventor: Masaru Nonomura
  • Patent number: 8991333
    Abstract: A substrate processing method includes a first step of subjecting a target substrate to a gas process within an atmosphere containing a fluorine-containing process gas, thereby forming a fluorine-containing reaction product on a surface of the target substrate. The method further includes a second step of subjecting the target substrate treated by the gas process to a heating process and a gas process within an atmosphere containing a reactive gas that reacts with fluorine.
    Type: Grant
    Filed: November 9, 2011
    Date of Patent: March 31, 2015
    Assignee: Tokyo Electron Limited
    Inventor: Shigeki Tozawa
  • Patent number: 8991331
    Abstract: A method for providing steerability in a plasma processing environment during substrate processing is provided. The method includes managing, power distribution by controlling power being delivered into the plasma processing environment through an array of electrical elements. The method also includes directing gas flow during substrate processing by controlling the amount of gas flowing through an array of gas injectors into the plasma processing environment, wherein individual ones of the array of gas injectors are interspersed between the array of electrical elements. The method further includes controlling gas exhausting during substrate processing by managing amount of gas exhaust being removed by an array of pumps, wherein the array of electrical elements, the array of gas injectors, and the array of pumps are arranged to create a plurality of plasma regions, each plasma region being substantially similar, thereby creating a uniform plasma region across the substrate.
    Type: Grant
    Filed: August 16, 2013
    Date of Patent: March 31, 2015
    Assignee: Lam Research Corporation
    Inventor: Neil Martin Paul Benjamin
  • Publication number: 20150086728
    Abstract: A light guide plate includes a first transparent base layer, an adhesive layer and a transparent composite layer. The adhesive layer is configured for bonding the transparent composite layer on the first transparent base layer. The transparent composite layer is located on the adhesive layer, and the transparent composite layer comprising a light emitting surface, the light emitting surface includes a plurality of microstructures.
    Type: Application
    Filed: September 18, 2014
    Publication date: March 26, 2015
    Inventor: PO-CHOU CHEN
  • Publication number: 20150081073
    Abstract: A method and apparatus for coating a group of objects may be provided. A three-dimensional model of the group of objects may be generated. Segments that represent each object in the group of objects in the three-dimensional model may be formed. Instructions for coating the group of objects may be generated based on the segments. The instructions may be configured to cause a robotic coating system to coat the group of objects.
    Type: Application
    Filed: September 18, 2013
    Publication date: March 19, 2015
    Inventors: Peter F. Trautman, Hui Li
  • Publication number: 20150072068
    Abstract: The embodiments disclosed herein relate to construction systems, assemblies, and methods. The construction systems can include concrete dispensing assemblies. The concrete dispensing assemblies can be configured to dispense a plurality of discrete units. The concrete dispensing assemblies can also be configured to simultaneously dispense two or more concrete mixtures. One or more dispensing parameter may be controllable, for example, by a computer control system. Additives and/or curing agents may also be used. Exemplary curing agents include carbon dioxide containing materials.
    Type: Application
    Filed: September 6, 2013
    Publication date: March 12, 2015
    Applicant: Elwha, LLC
    Inventors: Jeffrey A. Bowers, Bran Ferren, W. Daniel Hillis, Roderick A. Hyde, Cameron A. Myhrvold, Conor L. Myhrvold, Nathan P. Myhrvold, Clarence T. Tegreene, Lowell L. Wood, Jr.
  • Publication number: 20150068681
    Abstract: A plasma processing device includes a processing chamber for generating a plasma, a vacuum window that constitutes a part of a wall of the processing chamber, induction antennas including at least two systems for generating plasma in the processing chamber, radio frequency power sources for applying the current independently to the respective induction antennas, and a controller including phase circuits for controlling the phase of the current of the radio frequency power sources of the respective systems or the current value over time, and a control unit. The controller sequentially time modulates the phase difference between currents flowing to the systems or the current value within a sample processing period to move the plasma generation position so as to make the ion incident angle to the wafer uniform in the wafer plane.
    Type: Application
    Filed: February 17, 2014
    Publication date: March 12, 2015
    Inventors: Tsutomu Tetsuka, Makoto Satake, Tadayoshi Kawaguchi
  • Publication number: 20150064349
    Abstract: A machine (1) for transferring fluids to a moving web (3), comprises: a spreading roller (2) by which the fluids are spread and which is configured to come into contact with the moving web (3); a plurality of distribution rollers (5a-5e) on which the web (3), which is subject to tensioning, is made to run; and a transfer system (8) for transferring fluids to the spreading roller (2); the plurality of distribution rollers (5a-5e) is rotatably pivoted on fixed pins relative to the machine (1) and the spreading roller (2) is slidably constrained to the machine. The invention also relates to a method for transferring fluids to a web by means of the machine.
    Type: Application
    Filed: September 2, 2014
    Publication date: March 5, 2015
  • Publication number: 20150056385
    Abstract: In a Cu wiring structure forming method, a barrier film serving as a Cu diffusion barrier is formed at least on a surface of a recess in a first insulating film formed on a substrate, and the recess is filled with an Al-containing Cu film. A Cu wiring is formed from the Al-containing Cu film, and a cap layer including a Ru film is formed on the Cu wiring. Further, an interface layer containing a Ru—Al alloy is formed at an interface between the Cu wiring and the cap layer by heat generated in forming the cap layer or by a heat treatment performed after forming the cap layer. A second insulating film is formed on the cap layer.
    Type: Application
    Filed: August 20, 2014
    Publication date: February 26, 2015
    Inventors: Tadahiro ISHIZAKA, Kenji SUZUKI
  • Publication number: 20150056383
    Abstract: Method for printing high resolution features on a substrate, the method comprising: depositing a nanoparticle ink, comprising metal/semi-metal nanoparticles and an adhesive compound, having a binder on a substrate; and applying a laser beam, directly on some or all of the deposited nanoparticle ink to define the print feature, wherein the laser beam is configured to remove the nanoparticle coating or binder thereby allowing the adhesive compound to bond to the nanoparticles and the laser beam is further configured to transform the ink to form a metal/semi-metal structure. The remaining uncured structure can be easily washed away using standard developer solutions such as sodium or potassium hydroxide.
    Type: Application
    Filed: August 13, 2012
    Publication date: February 26, 2015
    Inventors: Jose Pedrosa, Daniel Johnson, Richard Dixon
  • Patent number: 8960123
    Abstract: Disclosed are coating apparatus including flow coating and roll-coating that may be used for uniform sol-gel coating of substrates such as glass, solar panels, windows or part of an electronic display. Also disclosed are methods for substrate preparation, flow coating and roll coating. Lastly systems and methods for skin curing sol-gel coatings deposited onto the surface of glass substrates using a high temperature air-knife are disclosed.
    Type: Grant
    Filed: December 23, 2013
    Date of Patent: February 24, 2015
    Assignee: Enki Technology, Inc.
    Inventors: Brenor L. Brophy, Sina Maghsoodi, Patrick J. Neyman, Peter R. Gonsalves, Jeffrey G. Hirsch, Yu S. Yang
  • Publication number: 20150040828
    Abstract: A substrate processing system for sequentially processing substrates includes processing chambers, a transfer unit, and a control unit controlling the processing chambers and the transfer unit. The control unit includes a transfer control unit controlling an operation of the transfer unit, a transfer order setting unit setting a transfer order of substrates to the processing chambers, an accumulation unit for accumulating a film thickness of a formed thin film or the number of processed substrates after completion of previous cleaning or previous pre-coating in the processing chambers, a processing chamber priority determination unit for determining priority of processing the substrates in the processing chambers based on predetermined rules, and an execution instruction unit for executing conditioning in the processing chambers.
    Type: Application
    Filed: August 8, 2014
    Publication date: February 12, 2015
    Inventors: Daisuke MORISAWA, Junichi OGAWA
  • Patent number: 8950470
    Abstract: Preferably, obtaining internal and external thermal measurement values of a sealed process chamber allows a control system to generate a control signal based on a comparison of the internal and external thermal measurement values to the predetermined value. The control signal is provided to a fluid handling system, wherein the fluid handling system modulates flow of a first fluid around the exterior of the sealed process chamber. The control signal is further provided to a closed loop heat exchange system, wherein the closed loop heat exchange system modulates flow of a second fluid within an interior cavity of the sealed process chamber based on the control signal. The control signal is still further provided to an open loop heat exchange system, wherein the open loop heat exchange system modulates flow of a third fluid within the interior of cavity of the sealed process chamber.
    Type: Grant
    Filed: December 30, 2010
    Date of Patent: February 10, 2015
    Assignee: Poole Ventura, Inc.
    Inventors: Mark R. Erickson, Aaron L. Dingus, Arthur W. Custer, III, Henry J. Poole, Nader Jamshidi
  • Patent number: 8945339
    Abstract: A film formation apparatus includes a gas supply mechanism for supplying an aminosilane-based gas, and a silane-based gas that does not include an amino group. Processes of forming a seed layer on a surface of the insulation film having the opening reaching the conductive substance and on a bottom surface of the opening by supplying the aminosilane-based gas into the process chamber, and forming a silicon film on the seed layer by supplying the silane-based gas that does not include the amino group into the process chamber, are sequentially performed in the process chamber.
    Type: Grant
    Filed: October 28, 2011
    Date of Patent: February 3, 2015
    Assignee: Tokyo Electron Limited
    Inventors: Akinobu Kakimoto, Katsuhiko Komori, Kazuhide Hasebe
  • Publication number: 20150031164
    Abstract: Vapor deposition apparatus for forming stacked thin films on discrete photovoltaic module substrates conveyed in a continuous non-stop manner through the apparatus are provided. The apparatus includes a first sublimation compartment positioned over a first deposition area of said apparatus, a second sublimation compartment positioned over a second deposition area of said apparatus, and an internal divider positioned therebetween and defining a middle seal member. An actuator is attached to the internal divider and is configured to move the internal divider to control intermixing of first source material vapors and second source material vapors within the first deposition area and the second deposition area. Methods are also generally provided for depositing stacked thin films on a substrate.
    Type: Application
    Filed: July 26, 2013
    Publication date: January 29, 2015
    Applicant: First Solar, Inc.
    Inventor: Mark Jeffrey Pavol
  • Publication number: 20150024118
    Abstract: According to one example there is provided a system for applying fluid to a substrate using a first and second array of fluid applicators.
    Type: Application
    Filed: July 9, 2014
    Publication date: January 22, 2015
    Inventors: Alex Veis, Alex Davidson
  • Publication number: 20150011088
    Abstract: Methods are disclosed for depositing material onto and/or etching material from a substrate in a surface processing tool having a processing chamber, a controller and one or more devices for adjusting the process parameters within the chamber. The method comprises: the controller instructing the one or more devices according to a series of control steps, each control step specifying a defined set of process parameters that the one or more devices are instructed to implement, wherein at least one of the control steps comprises the controller instructing the one or more devices to implement a defined set of constant process parameters for the duration of the step, including at least a chamber pressure and gas flow rate through the chamber, which duration is less than the corresponding gas residence time (Tgr) of the processing chamber for the step.
    Type: Application
    Filed: February 27, 2013
    Publication date: January 8, 2015
    Inventors: Mark Edward McNie, Michael Joseph Cooke, Leslie Michael Lea
  • Publication number: 20150007518
    Abstract: Embodiments of the invention provide systems and methods for insulating a component of a home or building. An insulated component may include a generally planar surface and a frame positioned atop one side of the generally planar surface. The frame may include a plurality of outer studs coupled together to form an outer periphery and inner studs that divide the frame into one or more sections. One or more of the sections may include a cavity or hollow space. The insulated component may also include a first layer of insulation within one or more of the cavities. The first layer of insulation may include a pour insulation material that transitions from a liquid state or phase to a solid state or phase.
    Type: Application
    Filed: September 25, 2014
    Publication date: January 8, 2015
    Inventor: Ralph Michael Fay
  • Patent number: 8927440
    Abstract: A film deposition apparatus that laminates layers of reaction product by repeating cycles of sequentially supplying process gases that mutually reacts in a vacuum atmosphere includes a turntable receiving a substrate, process gas supplying portions supplying mutually different process gases to separated areas arranged in peripheral directions, and a separation gas supplying portion separating the process gases, wherein at least one process gas supplying portion extends between peripheral and central portions of the turntable and includes a gas nozzle discharging one process gas toward the turntable and a current plate provided on an upstream side to allow the separation gas to flow onto its upper surface, wherein a gap between the current plate and the turntable is gradually decreased from a central side of the turntable to a peripheral side of the turntable, and the gap is smaller on the peripheral side by 1 mm or greater.
    Type: Grant
    Filed: July 8, 2013
    Date of Patent: January 6, 2015
    Assignee: Tokyo Electron Limited
    Inventors: Hitoshi Kato, Shigehiro Miura
  • Publication number: 20140373781
    Abstract: An approach is provided to cause an operation comprising one or more of a substrate tamping process, a substrate offset process, and a mechanism actuation process. The approach involves determining an instruction to cause the operation. The approach also involves causing a movement of one or more of a slide element and a shaft based on the instruction. The slide element and the shaft are configured to move in a first direction and a second direction along a length of the shaft. The movement in the first direction and the second direction of one or more of the slide element and the shaft corresponds to the operation.
    Type: Application
    Filed: June 25, 2013
    Publication date: December 25, 2014
    Inventors: Brian J. DUNHAM, Carlos Manuel TERRERO
  • Publication number: 20140370199
    Abstract: A liquid processing apparatus includes multiple substrate holding units each configured to horizontally hold a substrate and arranged in a left/right direction; a moving unit that is spaced from an arrangement of the substrate holding units in a forward/backward direction and is moved in the left/right direction; a nozzle standby unit, provided between a movement path of the moving unit and the arrangement of the substrate holding units, at which a nozzle that supplies a processing liquid to the substrate held by the substrate holding unit is on standby; and a rotatable arm having one end at which a nozzle holding unit that detachably holds the nozzle and the other end rotatably provided at the moving unit. The nozzle is transferred between the nozzle standby unit and a supply position where the processing liquid is supplied to the substrate together by the moving unit and the rotatable arm.
    Type: Application
    Filed: June 11, 2014
    Publication date: December 18, 2014
    Inventor: Naofumi Kishita
  • Patent number: 8904957
    Abstract: An etching chamber 1 incorporates a focus ring 9 so as to surround a semiconductor wafer W provided on a lower electrode 4. The plasma processor is provided with an electric potential control DC power supply 33 to control the electric potential of this focus ring 9, and so constituted that the lower electrode 4 is supplied with a DC voltage of, e.g., ?400 to ?600 V to control the electric potential of the focus ring 9. This constitution prevents surface arcing from developing along the surface of a substrate to be processed.
    Type: Grant
    Filed: March 4, 2013
    Date of Patent: December 9, 2014
    Assignee: Tokyo Electron Limited
    Inventors: Akihiro Kikuchi, Satoshi Kayamori, Shinya Shima, Yuichiro Sakamoto, Kimihiro Higuchi, Kaoru Oohashi, Takehiro Ueda, Munehiro Shibuya, Tadashi Gondai
  • Publication number: 20140356549
    Abstract: Provided are methods and systems for providing silicon carbide class of films. The composition of the silicon carbide film can be controlled by the choice of the combination of precursors and the ratio of flow rates between the precursors. The silicon carbide films can be deposited on a substrate by flowing two different organo-silicon precursors to mix together in a reaction chamber. The organo-silicon precursors react with one or more radicals in a substantially low energy state to form the silicon carbide film. The one or more radicals can be formed in a remote plasma source.
    Type: Application
    Filed: May 31, 2013
    Publication date: December 4, 2014
    Inventor: Bhadri N. Varadarajan
  • Publication number: 20140352613
    Abstract: A paint station may include a frame with a table attached to it. A track may run along the length of the table. A bridge may be connected to the track and may move along the track. The bridge may extend across the width of the table. A painting component may be attached to the bridge and may move along the bridge. Therefore the painting component may run along two axes over the table. A computer may be connected to the paint station to direct the movement of the painting component along the two axes. A user may place a clothing apparel on the table and may input a command to paint a desired design on the clothing apparel.
    Type: Application
    Filed: May 30, 2013
    Publication date: December 4, 2014
    Inventor: David Sargent
  • Patent number: 8901013
    Abstract: An oxygen-containing gas and a hydrogen-containing gas are supplied into a pre-reaction chamber heated to a second temperature and having the pressure set to less than an atmospheric pressure, and a reaction is induced between both gases in the pre-reaction chamber to generate reactive species, and the reactive species are supplied into the process chamber and exhausted therefrom, in which a substrate heated to the first temperature is housed and the pressure is set to less than the atmospheric pressure, and processing is applied to the substrate by the reactive species, with the second temperature set to be not less than the first temperature at this time.
    Type: Grant
    Filed: August 2, 2011
    Date of Patent: December 2, 2014
    Assignee: Hitachi Kokusai Electric Inc.
    Inventors: Kazuhiro Yuasa, Masanao Fukuda, Takafumi Sasaki, Yasuhiro Megawa, Masayoshi Minami
  • Publication number: 20140331929
    Abstract: Control of locating equipment used by a locate technician to perform a locate and/or marking operation to detect and/or mark a presence or an absence of at least one underground facility at a work site is based at least in part on marking specifications (e.g., government-based regulations, industry-based recommended guidelines/best practices, standard operating procedures of locate companies and/or facility owners, and/or contractual obligations relating to marking operations). In various examples, control signals are generated to alert a locate technician when to start and stop dispensing of a marking material, or control signals are generated to automatically or semi-automatically control dispensing of the marking material by a marking device, so as to facilitate compliance with marking specifications.
    Type: Application
    Filed: November 11, 2013
    Publication date: November 13, 2014
    Applicant: CertusView Technologies, LLC
    Inventors: Steven Nielsen, Curtis Chambers, Curtis Chambers
  • Publication number: 20140326178
    Abstract: The present disclosure discloses an electromagnetic vapor deposition apparatus comprising a plurality of electromagnets which form a plurality of electromagnetic regions when electronic current passes through. A programmable control equipment is electronically connected to each magnet unit to control magnetic polarity and magnetic intensity of each magnet unit. The programmable control equipment can adjust the magnetic intensity of each of the plurality of electromagnetic regions to adsorb the metal mask tightly. Meanwhile, the problem of colors mixing is overcome.
    Type: Application
    Filed: May 1, 2014
    Publication date: November 6, 2014
    Applicant: EverDisplay Optronics (Shanghai) Limited
    Inventors: ChiaChen LI, TeinWang HUANG
  • Publication number: 20140329032
    Abstract: A device and a method for improving uniformity of a film, which uses the controllable magnets instead of permanent magnets and controlling the magnetic polarity by a programmable control device, so that when the clamping frame is aligned with the mask, the magnetic polarity of the electromagnet is controlled to generate an alternating magnetic field which will affect the coating material sprayed from the evaporation source. With the help of the alternating magnetic field, the coating material will be evenly sprayed to a substrate. Consequently, uniformity of the film for coating and the yield of products are improved.
    Type: Application
    Filed: May 1, 2014
    Publication date: November 6, 2014
    Applicant: EverDisplay Optronics (Shanghai) Limited
    Inventors: ChiaChen LI, TeinWang HUANG
  • Patent number: 8875648
    Abstract: The disclosure relates to a method and apparatus for preventing oxidation or contamination during a circuit printing operation. The circuit printing operation can be directed to OLED-type printing. In an exemplary embodiment, the printing process is conducted at a load-locked printer housing having one or more of chambers. Each chamber is partitioned from the other chambers by physical gates or fluidic curtains. A controller coordinates transportation of a substrate through the system and purges the system by timely opening appropriate gates. The controller may also control the printing operation by energizing the print-head at a time when the substrate is positioned substantially thereunder.
    Type: Grant
    Filed: February 22, 2013
    Date of Patent: November 4, 2014
    Assignee: Kateeva, Inc.
    Inventors: Sass Somekh, Eliyahu Vronsky
  • Publication number: 20140318450
    Abstract: A system for processing a semiconductor substrate is provided. The system includes a mainframe having a plurality of modules attached thereto. The modules include processing modules, storage modules, and transport mechanisms. The processing modules may include combinatorial processing modules and conventional processing modules, such as surface preparation, thermal treatment, etch and deposition modules. In one embodiment, at least one of the modules stores multiple masks. The multiple masks enable in-situ variation of spatial location and geometry across a sequence of processes and/or multiple layers of a substrate to be processed in another one of the modules. A method for processing a substrate is also provided.
    Type: Application
    Filed: July 8, 2014
    Publication date: October 30, 2014
    Inventors: Richard R. Endo, Tony P. Chiang, James Tsung
  • Publication number: 20140308812
    Abstract: An apparatus and method for manufacturing an interconnect structure to provide ohmic contact in a semiconductor device is provided. The method includes providing a semiconductor device, such as a transistor, comprising a substrate, a gate dielectric, a gate electrode, and source and drain regions in the substrate. An ultra-thin interfacial dielectric is deposited by chemical vapor deposition (CVD) over the source and drain regions, where the interfacial dielectric can have a thickness between about 3 ? and about 20 ?. The ultra-thin interfacial dielectric is configured to unpin the metal Fermi level from the source and drain regions. Other steps such as the deposition of a metal by CVD and the cleaning of the substrate surface can be performed in an integrated process tool without a vacuum break. The method further includes forming one or more vias through a pre-metal dielectric over the source and drain regions of the substrate.
    Type: Application
    Filed: April 12, 2013
    Publication date: October 16, 2014
    Inventors: Reza Arghavani, Jeffrey Marks, Benjamin A. Bonner
  • Patent number: 8858766
    Abstract: A system and method for combinatorial processing of substrates in a processing chamber. The system includes a plurality of generators for supplying power into the processing chamber. A plurality of sputter guns provides power to different regions of a substrate. A switchbox switches power from a generator to a sputter gun via a plurality of coaxial switches. A controller positioned within the switchbox automatically distributes power from a specific generator to a specific sputter gun under programmable logic control.
    Type: Grant
    Filed: December 27, 2011
    Date of Patent: October 14, 2014
    Assignee: Intermolecular, Inc.
    Inventors: Brian K. Hatcher, Kent Riley Child