Abstract: In resin coating, carrying a light-passing member test-coated with a resin on a light-passing member carrying unit; making a light source placed above the light-passing member carrying unit emit excitation light exciting the fluorescent substance; measuring light emission characteristics of the light by irradiating the excitation light emitted from the light source unit from above to the resin coated onto the light-passing member and receiving the light that the resin emits from below the light-passing member by a light emission characteristic measurement unit; obtaining a deviation between a measurement result of the light emission characteristic measurement unit and a prescribed light emission characteristic; and deriving the appropriate resin coating quantity of the resin to be coated onto the LED element as what is used for practical production based on the deviation.

Abstract: A plasma processing apparatus including: a monitor device which monitors a process quantity generated at plasma processing; a monitor value estimation unit which has monitor quantity variation models for storing change of a monitor value of the process quantity in accordance with the number of processed specimens and which estimates a monitor value for a process of a next specimen by referring to the monitor quantity variation models; and a control quantity calculation unit which stores a relation between a control quantity for controlling the process quantity of the vacuum processing device and a monitor value and which calculates the control quantity based on a deviation of the estimated monitor value from a target value to thereby control the process quantity for the process of the next specimen.

Abstract: An organic material deposition device configured to sense a deposition amount of an organic material deposited in a vacuum chamber by detecting a back propagation characteristic variation of a passive radio frequency identification (RFID) sensor. The organic material deposition device includes: a chamber configured to perform an organic material deposition process therein; a deposition source mounted in the chamber to vaporize an organic material; a deposition mask mounted to face the deposition source and configured to bond a substrate at an opposite side to the deposition source; an antenna mounted in the chamber to receive back propagation from a radio frequency identification (RFID) sensor; and a radio frequency (RF) reader connected to the antenna to measure an organic material deposition amount from a variation of the back propagation.

Abstract: The present invention provides a liquid crystal sealant forming device and a display panel assembly apparatus using the same. The display panel assembly apparatus comprises the liquid crystal sealant forming device, an alignment assembly device, a transporting device and a curing device. The liquid crystal sealant forming device comprises a forming substrate; a plurality of liquid crystal dispensing openings formed on one side of the forming substrate for dispensing a liquid crystal on a substrate; and at least one sealant coating opening disposed around the liquid crystal dispensing openings for coating a sealant on the substrate. The present invention can form the liquid crystal and the sealant in the same apparatus.

Abstract: A plasma processing apparatus includes a temperature measuring unit; airtightly sealed temperature measuring windows provided in a mounting table, for optically communicating to transmit a measurement beam through a top surface and a bottom surface of the mounting table; and one or more connection members for connecting the mounting table and a base plate, which is provided in a space between the mounting table and the base plate. In the plasma processing apparatus, a space above the mounting table is set to be maintained under a vacuum atmosphere, and a space between the mounting table and the base plate is set to be maintained under a normal pressure atmosphere, and each collimator is fixed to the base plate at a position corresponding to each temperature measuring window, thereby measuring a temperature of the substrate via the temperature measuring windows by the temperature measuring unit.

Abstract: A manufacturing apparatus includes a chuck for contacting a peripheral portion of a workpiece. The apparatus includes a nozzle to eject a process fluid (liquid or gas) toward a first surface while the workpiece is in contact with the chuck. The apparatus also includes a plate having an opening configured such that a support fluid (liquid or gas) can be ejected toward a second surface of the workpiece while the workpiece is in contact with the chuck. In an example, the support fluid can be used to counteract a displacement of the interior portion in the direction perpendicular to the plane of the workpiece due to, for example, gravity and/or hydrostatic pressure of the process fluid.

Abstract: A manufacturing method for a solar cell, wherein after a texture is formed on a principal surface of a substrate, infrared light in a predetermined wave number range is applied to a portion, on which the texture is formed, of the principal surface, a wave number at a specified transmission detection rate of the infrared light transmitted through the substrate and detected is acquired, the Tx size of the substrate is calculated on the basis of the acquired wave number using a previously obtained relationship between the wave number at the specified transmission detection rate and the Tx size, and when the calculated Tx size is within a reference value range, a collecting electrode is formed on the principal surface.

Abstract: An adhering amount detecting process includes: lowering the nozzle to a trial application position; performing a trial application to apply the viscous material to a trial application surface disposed on an application stage; and detecting an amount of the viscous material adhering to the nozzle. Then, whether a difference between maximum and minimum values of the amounts of the viscous material adhering to the nozzle detected by performing the adhering amount detecting process a plurality of times exceeds a threshold is determined. If the difference is determined as not exceeding the threshold, the lowered position of the nozzle with respect to the application target is set such that a gap between the nozzle at the lowered position and an application surface of an application target coincides with a gap between the nozzle at the trial application position and the trial application surface.

Abstract: Provided are a crucible for vapor deposition, a vapor deposition apparatus and a vapor deposition method capable of detecting a film formation rate using a sensor in vapor deposition by proximity vapor deposition. The crucible according to the present invention includes a storage section that stores a vapor deposition source, a first guide passage that guides a vaporized material emitted from the vapor deposition source toward a substrate to be treated, a wall section for defining the first guide passage and a second guide passage that diverges from a middle part of the first guide passage, penetrates the wall section and communicates with the outside.

Abstract: The present disclosure relates to a micro-fluidic probe card that deposits a fluidic chemical onto a substrate with a minimal amount of fluidic chemical waste, and an associated method of operation. In some embodiments, the micro-fluidic probe card has a probe card body with a first side and a second side. A sealant element, which contacts a substrate, is connected to the second side of the probe card body in a manner that forms a cavity within an interior of the sealant element. A fluid inlet, which provides a fluid from a processing tool to the cavity, is a first conduit extending between the first side and the second side of the probe card body. A fluid outlet, which removes the fluid from the cavity, is a second conduit extending between the first side and the second side of the probe card body.

Abstract: A plasma reactor having a reactor chamber and an electrostatic chuck having a surface for holding a workpiece inside the chamber includes inner and outer zone backside gas pressure sources coupled to the electrostatic chuck for applying a thermally conductive gas under respective pressures to respective inner and outer zones of a workpiece-surface interface formed whenever a workpiece is held on the surface, and inner and outer evaporators inside respective inner and outer zones of the electrostatic chuck and a refrigeration loop having respective inner and cuter expansion valves for controlling flow of coolant through the inner and outer evaporators respectively. The reactor further includes inner and outer zone temperature sensors in inner and outer zones of the electrostatic chuck and a thermal model capable of simulating heat transfer through the inner and outer zones, respectively, between the evaporator and the surface based upon measurements from the inner and outer temperature sensors, respectively.

Abstract: A waxing device is used for applying a waxing treatment to a polishing wheel, and includes a supporting assembly, an adjusting assembly, a driving mechanism, a mounting assembly, a motor, a wax block and a resisting mechanism. The supporting assembly includes a sliding rail, and the adjusting assembly is slidably positioned on the sliding rail; the driving mechanism is mounted on the adjusting assembly; the mounting assembly includes a mounting member positioned on the driving mechanism; the motor is mounted on mounting member; the wax block is positioned on the motor and rotated by the motor; the resisting mechanism is positioned on the supporting assembly and resists the adjusting assembly for adjusting a pressure applied to the polishing wheel during the waxing process.

Abstract: Electrostatic chucks with variable pixelated heating are described. For example, an electrostatic chuck (ESC) includes a ceramic plate having a front surface and a back surface, the front surface for supporting a wafer or substrate. A base is coupled to the back surface of the ceramic plate. A light carrying medium is disposed in the base, the light carrying medium configured to provide pixelated light-based heating capability for the ESC.

Abstract: A system for processing a substrate includes a plasma chamber to generate a plasma therein. The system also includes a process chamber to house the substrate, where the process chamber is adjacent the plasma chamber. The system also includes a rotatable extraction electrode disposed between the plasma chamber and substrate, where the rotatable extraction electrode is configured to extract an ion beam from the plasma, and configured to scan the ion beam over the substrate without movement of the substrate by rotation about an extraction electrode axis.

Abstract: The invention relates to a method for producing a structured, at least partly optically transparent varnish surface on a surface of a substrate board, preferably of a wood material board, having a decoration. The steps of the method include applying a transparent or at least partly transparent varnish to an applicator roll thereby producing a structured varnish surface and transferring the structured varnish surface to a substrate board having a decoration. The varnish is applied to the applicator roll by a plurality of digitally controlled nozzles in a distribution defining a structure and/or is transformed on the applicator roll into a distribution defining a structure. Furthermore, a device for carrying out the method is described.

Abstract: A system and method for depositing a coating may comprise a coating chemical reactor, surface activation component, and a deposition component. A target surface may be prepared for deposition with the surface activation component. The coating chemical reactor may comprise a coating chemical dispenser and a coating chemical verifier that prepares the coating chemical for deposition. The coating chemical verifier may utilize an optical excitation source and at least one optical detector, wherein chemical substances are identified by unique signatures composed of binary code. The coating chemical may be received by the deposition component to depositing the coating chemical on the target surface.

Abstract: In an apparatus for manufacturing a dye-sensitized solar cell, a photosensitization dye solution makes contact with an electrode material layer that functions as a working electrode of a dye-sensitized solar cell so that the photosensitizing dye is adsorbed on the layer. Such an apparatus for manufacturing a dye-sensitized solar cell has a substrate housing section to house a substrate with the electrode material layer formed on its surface, and a circulation mechanism to circulate the photosensitization dye solution in such a way that the solution passes a surface of the substrate housed in the substrate housing section. In such an apparatus, a cross-sectional area of a flow path for the photosensitization dye solution in a portion facing the substrate in the substrate housing section is set smaller than a cross-sectional area of a flow path for the photosensitization dye solution in other portions.

Abstract: Systems and methods of solvent temperature control for wafer coating processes are provided. In an embodiment, a method for spin coating a wafer includes attaching the wafer to a rotatable chuck. The chuck is then rotated, and solvent is dispensed onto the wafer. The solvent dispensing temperature is controlled while the solvent is dispensed onto the wafer.

Abstract: A non-contact edge coating apparatus includes an applicator for applying a coating material on an edge of a solar cell substrate and a control system configured to drive the applicator. The control system may drive the applicator along an axis to maintain a distance with an edge of the substrate as the substrate is rotated to have the edge coated with a coating material. The applicator may include a recessed portion into which the edge of the substrate is received for edge coating. For example, the applicator may be a roller with a groove. Coating material may be introduced into the groove for application onto the edge of the substrate. A variety of coating materials may be employed with the apparatus including hot melt ink and UV curable plating resist.

Abstract: A process of coating at least one substrate with a plurality of deposition sources, a method of tooling, a carrier unit and a deposition system are described. The systems and methods provide for or allow for exposing a first substrate portion 112a of said at least one substrate 112 to a first deposition source 118a through an aperture 122 of a carrier unit 110, 510, depositing a first layer 126a over the first substrate portion, said first layer including material from said first deposition source, varying a relative position between said at least one substrate and said aperture for exposing a second substrate portion of said at least one substrate, or another substrate, to a second deposition source, and depositing a second layer 126b over the second substrate portion 112b, said second layer including material from said second deposition source.

Abstract: Disclosed are coating apparatus including flow coating and roll-coating that may be used for uniform sol-gel coating of substrates such as glass, solar panels, windows or part of an electronic display. Also disclosed are methods for substrate preparation, flow coating and roll coating. Lastly systems and methods for skin curing sol-gel coatings deposited onto the surface of glass substrates using a high temperature air-knife are disclosed.

Abstract: Preferably, obtaining internal and external thermal measurement values of a sealed process chamber allows a control system to generate a control signal based on a comparison of the internal and external thermal measurement values to the predetermined value. The control signal is provided to a fluid handling system, wherein the fluid handling system modulates flow of a first fluid around the exterior of the sealed process chamber. The control signal is further provided to a closed loop heat exchange system, wherein the closed loop heat exchange system modulates flow of a second fluid within an interior cavity of the sealed process chamber based on the control signal. The control signal is still further provided to an open loop heat exchange system, wherein the open loop heat exchange system modulates flow of a third fluid within the interior of cavity of the sealed process chamber.

Abstract: A manufacturing facility is provided for manufacturing a product on a foil (FO). The manufacturing facility comprises a deposition zone (10) formed by a clean room wherein at least a first and a second deposition facility (21, 22) are arranged for depositing a layer of a material on the foil. The manufacturing facility further comprises at least one processing facility (31) for processing the deposited layer, said processing facility being arranged outside said deposition zone and comprising a processing trajectory with a first path (31a) away from said deposition zone, towards a turning facility (41) and with a second path (31b) from said turning facility back towards said deposition zone.

Abstract: A drawing device includes a drawing device main body which has a cartridge setting unit in which a drawing liquid cartridge is set in a detachable manner, and discharges a supplied drawing liquid from the drawing head to perform a drawing process, a chamber room which accommodates the drawing device main body, a booth opening which is provided in the chamber room and causes a drawing liquid cartridge to be received in the chamber room, a transport unit which transports the drawing liquid cartridge between the receiving area and the relay area, and a transfer unit which transfers the drawing liquid cartridge between the relay area and the cartridge setting unit.

Abstract: Provided is a vapor deposition apparatus including a deposition unit including a plurality of deposition modules disposed parallel to each other and a substrate mounting unit located below the deposition unit, on which a substrate is mounted. In this case, each of the plurality of deposition modules includes a nozzle configured to selectively inject a raw gas and a purge gas toward the substrate mounting unit, and the nozzle injects the raw gas while the substrate mounting unit is being located below the nozzle.

Abstract: An apparatus for cladding the interior surfaces of a curved pipe section includes a flexible track that is positioned longitudinally within the curved pipe and supported at opposite ends to corresponding opposite ends of the curved pipe. The flexible track is caused to bend and conform to the radius of curvature of an interior surface of the curved pipe. A robotic crawler is supported on the track section and carries a material applicator head. The robotic crawler is driven back-and-forth across the track section while the material applicator head applies an overlay material to the interior surface of the curved pipe. In a method, the position of the curved pipe in space, the travel direction and speed of the crawler and the position of the application head are all coordinated to maintain the application of the overlay material in the “flat plane” position.

Abstract: Apparatus and methods of determining a position of a height sensor in a dispensing system. The dispensing system includes a dispenser, height sensor, camera, and a calibration device configured to receive a signal from the height sensor. The calibration device may include an optical sensor that generates an alignment signal in response to receiving light from the height sensor and/or a fiducial that causes the height sensor to generate the alignment signal in response to a detected height change. The alignment signal is used to automatically determine the position at which the height sensor is aligned with the calibration device. The position of the height sensor relative to a camera is determined by aligning the camera with the calibration device and recording its position. The recorded coordinates of the camera are compared to the coordinates of the height sensor when the height sensor is automatically aligned with the calibration device.

Abstract: A time period required for replacement work of a divided cable is shortened. An electrostatic coating cable (6) includes a power supply line (12) that supplies power to a high voltage generator (2), a signal line (14) that controls the high voltage generator (2), and a ground line (16). The power supply line (12) and the ground line (16) are connected by a first inspection line (18), the signal line (14) and the ground wire (16) are connected by a second inspection line (20), a first diode (22) is interposed in the first inspection line (18), and a second diode (24) is interposed in the second inspection line (20). The first and the second diodes (22) and (24) inhibit a current from flowing through the first and the second inspection lines (18) and (20) during an operation of the electrostatic coater (1).

Abstract: A drug coating apparatus (100) for coating an implant (206) with a drug is described. The drug coating apparatus (100) includes a holding unit (102) having a top collet (202-1) for holding the implant (206) from a top end of the implant (206), and a bottom collet (202-2) to hold the implant (206) from a bottom end of the implant (206). The drug coating apparatus (100) includes at least one rotary drive (115) coupled to the holding unit (102) for rotating the top collet (202-1), the bottom collet (202-2) and the implant (206), and includes a spraying unit (104) to spray-coat the drug on the implant (206).

Abstract: To provide an apparatus and process capable of continuously forming a fluorinated organosilicon compound thin film having high durability while a substrate is transported.

Abstract: A detection of urethane applied to a workpiece, and more particularly to automated infrared detection of urethane application on a workpiece in order to detect improper application of the urethane.

Abstract: Methods are disclosed including applying a layer of binder material onto an LED structure. A luminescent solution including an optical material suspended in a solution is atomized using a flow of pressurized gas, and the atomized luminescent solution is sprayed onto the LED structure including the layer of binder material using the flow of pressurized gas.

Abstract: Provided are an apparatus and a method for controlling the heating of the base within a chemical vapour deposition chamber, which apparatus is applicable to an MOCVD reaction chamber.

Abstract: The invention relates to a painting booth for coating components, particularly for painting motor vehicle body components, with a booth wall (10) and a coating agent line (1), which runs from the exterior of the booth through the booth wall (10) into the interior of the booth. The invention proposes that the coating agent line (1) has an electrically conductive and axially running potential-compensating element (15) inside the line for electrically connecting the coating agent inside the line to an electrical reference potential, said potential-compensating element (15) extending from the exterior of the booth through the booth wall (10), so that the free end of the potential-compensating element (15) is inside the booth.

Abstract: Systems and methods of reducing outgassing of a substance within a reaction chamber of a reactor are disclosed. Exemplary methods include depositing a barrier layer within the reaction chamber and using a scavenging precursor to react with species on a surface of the reaction chamber. Exemplary systems include gas-phase deposition systems, such as atomic layer deposition systems, which include a barrier layer source and/or a scavenging precursor source fluidly coupled to a reaction chamber of the system.

Abstract: The embodiments described herein generally relate to devices and systems for increased pressure control of near atmospheric deposition processes. Devices and systems disclosed herein generally include an exhaust apparatus for a processing chamber in connection with an automated valve which is positioned between the exhaust port and the abatement system. The processing chamber can generally be maintained at a pressure above atmospheric pressure while the automated valve controls the flow of gases leaving the chamber to keep the pressure constant in the chamber.

Abstract: In one aspect, methods of making a carbon coating are described herein. In some implementations, a method of making a carbon coating comprises applying a first adhesive material to a substrate surface to provide an adhesive surface; rolling a carbon source over the adhesive surface to provide a carbon layer on the adhesive surface; and rolling an adhesive roller over the carbon layer to remove some but not all of the carbon of the carbon layer to provide the carbon coating.

Abstract: A first device is provided. The device includes a print head. The print head further includes a first nozzle hermetically sealed to a first source of gas. The first nozzle has an aperture having a smallest dimension of 0.5 to 500 microns in a direction perpendicular to a flow direction of the first nozzle. At a distance from the aperture into the first nozzle that is 5 times the smallest dimension of the aperture of the first nozzle, the smallest dimension perpendicular to the flow direction is at least twice the smallest dimension of the aperture of the first nozzle.

Abstract: An ion implantation system and method are provided where an ion source generates an ion and a mass analyzer mass analyzes the ion beam. A beam profiling apparatus translates through the ion beam along a profiling plane in a predetermined time, wherein the beam profiling apparatus measures the beam current across a width of the ion beam concurrent with the translation, therein defining a time and position dependent beam current profile of the ion beam. A beam monitoring apparatus is configured to measure the ion beam current at an edge of the ion beam over the predetermined time, therein defining a time dependent ion beam current, and a controller determines a time independent ion beam profile by dividing the time and position dependent beam current profile of the ion beam by the time dependent ion beam current, therein by cancelling fluctuations in ion beam current over the predetermined time.

Abstract: A vapor phase growth apparatus of an embodiment includes: a reaction chamber; a gas supply path connected to an organic metal supply source at a first connection, the gas supply path being connected to a carrier gas supply source, the gas supply path supplies a process gas including organic metal and a carrier gas into the reaction chamber; a gas discharge path connected to the organic metal supply source at a second connection, the gas discharge path discharges the process gas to the outside of the apparatus; a first mass flow controller and a first adjustment device provided at the gas supply path; a second adjustment device provided at the gas discharge path; and a shortcut path connecting the gas supply path to the gas discharge path. One of the first and the second adjustment device is a back pressure regulator, and the other is a mass flow controller.

Abstract: An analysis device includes an X-ray generation part configured to generate four monochromatic X-rays with different energies to irradiate a sample, an electrically conductive sample stage configured to place the sample thereon and formed of an electrically conductive material, an electrode configured to detect an electric current carried by irradiating the sample with the four monochromatic X-rays with different energies, and an electric power source configured to apply a voltage between the electrically conductive sample stage and the electrode, wherein the four monochromatic X-rays with different energies are X-rays included within a range from an absorption edge of a compound semiconductor included in the sample to a higher energy side of 300 eV.

Abstract: Apparatus to apply a coating to media. The apparatus includes a first roller for receiving a continuous belt. The continuous belt is for receiving a coating from a second roller and for transferring the coating to media. The first roller is arranged to provide an adjustable width of the continuous belt to the second roller. The width of the continuous belt provided to the second roller is adjustable to substantially correspond to the width of the media.

Abstract: A system for depositing selenium on a substrate comprises includes a substrate carrier including a body, means for holding the substrate, and a plurality of selenium vapor outlets formed in the body to direct a flux of selenium vapor onto the substrate. A selenium supply container provides selenium vapor to the selenium vapor outlets. At least one temperature sensor is coupled to the substrate carrier to sense temperature of the substrate. A heat source is positioned to heat the substrate. A controller is coupled to the temperature sensor and the heat source.

Abstract: Provided is a coating-forming apparatus. The coating-forming apparatus according to one embodiment of the present invention includes a support member rotatably supporting a tube body about the central axis thereof; a robot moving in the longitudinal direction of the tube body and spraying paint or an abrasive material on the outer circumferential surface of the tube body, a rotation-detecting device attached to the tube body and measuring the angle of rotation of the tube body, and a controller for controlling the supporting member or the robot.

Abstract: A light-emitting element and its fabrication method are provided. The light-emitting element includes an EL layer between a pair of electrode, and the EL layer is formed by evaporation of an organic compound. The evaporation is conducted so that the partial pressure of a component with a specific molecular weight in a film-formation chamber, which is monitored by a mass spectrometer, does not exceed a specific value during the evaporation. This method allows the formation of a light-emitting element having an improved lifetime.

Abstract: Provided are a substrate processing apparatus, a method of manufacturing a semiconductor device, and a non-transitory computer-readable recording medium, which are capable of reducing an effect on a substrate, which is caused by a change in an atmosphere in a substrate storage container, by appropriately supplying an inert gas into the substrate storage container.

Abstract: A device and method for dispensing liquid spin-on glass (SOG) onto semiconductor wafers. The method includes dispensing liquid SOG through a dispenser nozzle, detecting liquid SOG outside of the dispenser nozzle, indicating the presence of liquid SOG in an abnormal length relative to the dispenser nozzle and adjusting a suck back (SB) valve to withdraw liquid SOG from the abnormal length.

Abstract: The invention relates to a device for applying preferably liquid flavorings (15), in particular menthol, to a medium (16), wherein flavoring (15) is supplyable from a (storage or processing) container (10) to an applicator unit (14) via at least one conduit (11, 13). The invention is characterized in that the applicator unit (14) has a controllable valve for the application of flavoring (15) to the medium (16).

Abstract: A printing process for printing (P) an ink pattern on a substrate is provided. The ink pattern to be printed is based on an available pattern layout (R). The pattern layout defines a desired layout of the ink pattern to be printed. Based on the pattern layout an input image (rii) for allocating dot positions of the ink pattern is generated. The printing process comprises a step of comparing a scan (S) image (rsi) with the input image to carry out a quality inspection (Q) to detect any print defects in the printed ink pattern. The printing process comprises a step of providing a decision (os) on an approval or a rejection of the printed ink pattern. In case of an approval, the substrate can be supplied to a subsequent processing station (E) to finalise the substrate. In case of a rejection, the substrate including print defects can be recycled (D).

Abstract: Provided is an active material-coating apparatus for a secondary battery and methods of operating the same. The active material-coating apparatus includes a tank having an active material, a pump coupled to the tank such that the active material is routed through the pump, a temperature control unit coupled to the pump and configured to control heating or cooling of a temperature of the active material routed through the pump. The temperature control unit may include a control unit configured to control a temperature of the temperature control unit. The active material-coating apparatus may further include a coating unit coupled to the temperature control unit, and a reel including a current collector, the reel being configured to route the current collector through the coating unit such that the current collector is coated with the active material routed through the temperature control unit and ejected from the coating unit.