Abstract: In some examples, a method for conditioning a wafer processing chamber comprises setting a pressure in the chamber to a predetermined pressure range, setting a temperature of the chamber to a predetermined temperature, and supplying a process gas mixture to a gas distribution device within the chamber. A plasma is struck within the chamber and a condition in the chamber is monitored. Based on a detection of the monitored condition meeting or transgressing a threshold value, a chamber conditioning operation is implemented. The chamber conditioning operation may include depositing a preconditioning film onto an internal surface of the chamber, depositing a silicon oxycarbide (SiCO) film onto the preconditioning film, and depositing a protective layer onto the SiCO film.

Abstract: A substrate processing apparatus includes a processing tub, a liquid recovery unit, a liquid recovery unit drain line, a storage, a first and a second liquid supply lines, a discharge line, a first and a second liquid flow rate controllers. The liquid recovery unit receives a processing liquid overflown from the processing tub. The liquid recovery unit drain line drains the processing liquid from the liquid recovery unit. The first and the second liquid supply lines supply a first and a second liquids, respectively. The cleaning liquid contains the first liquid and the second liquid, and removes a precipitate from the processing liquid. The discharge line discharges the cleaning liquid, the first liquid or the second liquid toward the liquid recovery unit. The first and the second liquid flow rate controllers are provided at the first and the second liquid supply lines, and adjust flow rates thereof, respectively.

Abstract: An imprint apparatus that forms a pattern of an imprint material on a substrate with use of a mold includes a mold holding unit configured to hold the mold, a suction unit provided at the mold holding unit and configured to suction a gas in a space in which the mold and the substrate face each other, a detector configured to detect particles included in the gas suctioned by the suction unit, and a control unit configured to perform error processing depending on a result of detection performed by the detector.

Abstract: A substrate processing method is provided. In the method, a process gas is supplied into a chamber. A pressure in the chamber is controlled to a first pressure by evacuating the chamber via a first exhaust line. Then, the pressure in the chamber is controlled to a second pressure that is higher than the first pressure by evacuating the chamber via a second exhaust line while closing the first exhaust line. Next, the pressure in the chamber is controlled to the first pressure by evacuating the chamber via the first exhaust line while closing the second exhaust line.

Abstract: A substrate processing method in substrate processing apparatus comprises repeating cycle including: supplying source gas into process container causing the source gas to be adsorbed to substrate; exhausting excess source gas from the process container; supplying reaction gas into the process container causing the reaction gas to react with the source gas; and exhausting excess reaction gas, wherein at least one of a gap width between placement stage and member forming processing space between the member and the stage and degree of opening of pressure adjustment valve in at least one of the supplying the source gas and the supplying the reaction gas is smaller than at least one of a gap width between the stage and the member and the degree of opening of the pressure adjustment valve in at least one of the exhausting the excess source gas and the exhausting the excess reaction gas, respectively.

Abstract: An article of footwear including an upper and a sole secured to the upper, where the sole includes an upper surface. A support member is positioned on the sole, and includes at least one portion positioned a designated distance above the upper surface of the sole to form a space between the support member and the sole, where the portion of the support member moves through the space and toward the upper surface of the sole when pressure is applied to the portion of the support member, and flexes away from the upper surface when pressure is decreased or released from the portion of the support member.

Abstract: A wafer manufacturing system includes a wafer manufacturing device provided with a sensor; a host PC that is connected to the wafer manufacturing device via a data communication line; a logic controller that samples and stores an analog output signal of the sensor; and a relay PC that extracts tracking information transmitted on the data communication line for a wafer or a single crystal that is being processed by the wafer manufacturing device and sends the tracking information to the logic controller, and the logic controller stores a digital value of the analog output signal of the sensor in association with the tracking information that is sent from the relay PC.

Abstract: Systems and method for producing graphene on a substrate are described. Certain types of exemplar systems include lateral arrangements of a substrate gas scavenging environment and an annealing environment. Certain other types of exemplar systems include lateral arrangements of a graphene producing environment and a cooling environment, which cools the graphene produced on the substrate. Yet other types of exemplar systems include lateral arrangements of a localized annealing environment, localized graphene producing environment and a localized cooling environment inside the same enclosure. Certain type of exemplar methods for producing graphene on a substrate include scavenging a first portion of the substrate and preferably, contemporaneously annealing a second portion of the substrate.

Abstract: Systems and method for producing graphene on a substrate are described. Certain types of exemplar systems include lateral arrangements of a substrate gas scavenging environment and an annealing environment. Certain other types of exemplar systems include lateral arrangements of a graphene producing environment and a cooling environment, which cools the graphene produced on the substrate. Yet other types of exemplar systems include lateral arrangements of a localized annealing environment, localized graphene producing environment and a localized cooling environment inside the same enclosure. Certain type of exemplar methods for producing graphene on a substrate include scavenging a first portion of the substrate and preferably, contemporaneously annealing a second portion of the substrate.

Abstract: A system and method for positioning a food product with respect to a print head for printing on a surface thereof. The system is incorporated into a printer. The system has a movable support surface for supporting the food product thereon, the support surface being vertically and horizontally moveable with respect to the print head. A sensor is provided for detecting a position of a surface of the food product positioned on the moveable support surface with respect to the print head. The sensor provides a signal to the printer indicative of a position of the surface of the food product and wherein the moveable support surface is adjustable in response thereto. The sensor is a position sensor configured to detect the position of a top surface of the food product.

Abstract: Particulate deposition rate on a photolithographic mask, particularly of tin (Sn) particles produced within an EUV light source, is reduced by producing turbulence within a radiation source chamber of the EUV light source. Turbulence can be produced by changing the temperature, pressure, and/or gas flow rate within the radiation source chamber. The turbulence reduces the number of particles exiting the EUV light source which could be deposited on the photomask.

Abstract: A system for forming surface modified substrates includes a laser system, and a laser processing chamber. A laser scanner automatically controls a position of the laser beam or an x-y translating stage upon which the laser processing chamber is mounted thereon for scanning the laser beam relative to a substrate of material (M) having a bulk portion and an outer surface integrated with the bulk portion, and a coating including metal organic molecules including at least one metal X or particles of metal X on the outer surface. At laser-heated spots atoms of X from the metal coating diffuse into the outer surface to form a modified surface layer including both M and X. The modified surface layer has a thickness of 1 nm, and a 25° C. electrical conductivity ?2.5% above or ?2.5% below a 25° C. electrical conductivity in the bulk portion.

Abstract: A method for controlling and optimizing a transverse uniformity of a coating thickness on at least one side of a running metal strip in an industrial galvanization installation, the coating being deposited by hot dip coating in a pot containing a liquid metal bath, includes at least the steps of: heating the strip substrate to a temperature higher than a pot temperature; passing the strip through the bath by wrapping the strip around at least a first deflector roll or sink roll followed by at least one second deflector roll, the second deflector roll improving a flatness of the strip; wiping excess coating thickness carried away by the strip on one or both sides of the strip by wiping nozzles blowing a gas on the strip at an exit of the liquid metal bath; and measuring an actual distance profile between the nozzles and the strip.

Abstract: A single pass inkjet printer that utilizes a modular printing system with one or more self-contained printing modules, where each printing module is easy to remove and replace from a large printing machine, thus resulting in an overall system that is easy to service and maintain Each module is a self-contained printer including an ink supply, printhead drive electronics, and printhead assembly in order to provide one color or fluid of inkjet printing capability. Each module includes a precise three-point compliant self-aligning mount system to obtain accurate printhead positioning, and a unique integrated printhead tending system that includes a compact movable vacuum knife for cleaning the printheads, and a printhead capping station for sealing and protecting the printheads from the ambient environment when not in use.

Abstract: A coating of a coating medium, produced by means of a multichannel printhead (5) in a coating region (3) on a two- or three-dimensional surface (2) of an object (1), which is built up from coating points (8) along tracks (7) of one or more coating paths (6), characterized in that the starting coating point (HP) of at least one track (7) is aligned with a starting contour (AK) and an end coating point (EP) of the track (7) is aligned with an end contour (EK).

Abstract: A substrate processing apparatus includes a substrate stage on which a substrate is disposed, a first radio-frequency power supply configured to supply first radio-frequency power having a first frequency to the substrate stage, an impedance converter configured to convert an impedance on a load side seen from the first radio-frequency power supply into a set impedance, a second radio-frequency power supply configured to supply second radio-frequency power having a second frequency lower than the first frequency to the substrate stage, and a controller configured to control the set impedance of the impedance converter, and the controller sets the set impedance according to a substrate processing.

Abstract: The invention is in particular directed to a method for manufacturing a three-dimensional object by successive deposition of uniform layers of a viscous material, the method comprising a prior calibrating operation comprising the following steps: positioning at least one calibration stop at a distance comprised between a first distance and a second distance from a working surface, the at least one calibration stop being configured to enable the triggering of a signal in case of contact between the at least one calibration stop and a proximity sensor linked to a recoater blade; moving the recoater blade (310) linked to the proximity sensor towards one of the at least one calibration stop; stopping the movement of the recoater blade as soon as a signal indicates a contact between the calibration stop and the proximity sensor; and estimating (320) the distance between the recoater blade and the working surface after stopping the movement, the at least one calibration value comprising the estimated distance.

Abstract: A re-circulatory blasting device obtained is capable of performing stable treatment for a prolonged period of time even in cases in which an elastic abrasive employed has abrasive grains adhered to the surface of elastic cores. An elastic abrasive regeneration device provided to the blasting device regenerates elastic abrasive employed for re-circulation. The elastic abrasive regeneration device includes a mixer and a combining unit. Recovered abrasive fed in from an abrasive recovery section is mixed in the mixer with abrasive grains fed in from an abrasive grain feeder, and the abrasive grains are adhered to the surface of the cores of the recovered abrasive. In the combining unit, the abrasive grains are pressed against and combined to the surface of the cores by passing an aggregated state of the recovered abrasive mixed by the mixer along a constricted flow path having a flow path cross-sectional area that gradually narrows.

Abstract: An apparatus and a method for performing liquid treatment for a substrate are provided. The apparatus for treating the substrate includes a treating container having a treatment space inside the treating container, a substrate support unit to support a substrate in the treatment space, and a liquid supply unit to supply treatment liquid to the substrate supported by the substrate support unit. The liquid supply unit includes a nozzle, a supply line to supply the treatment liquid to the nozzle and having a first valve mounted in the supply line, and a discharge line branching from a branch point which is a point downstream of the first valve in the supply line to discharge the treatment liquid from the supply line, and having a second valve mounted in the discharge line. A valve is absent in an area between the branch point and the nozzle, in the supply line.

Abstract: An outer packing material for vacuum insulation material including a thermally weldable film and a gas barrier film; wherein the gas barrier film includes a base material and a metal aluminum film formed on one surface of the base material; and the metal aluminum film satisfies the below formula (1) and formula (2): 1.0*10?3?(IA/IB)/T?3.5*10?3??(1) (A/B)/T?3.8*10?3??(2).

Abstract: A pipe doping apparatus comprises a bucket assembly including a base and a bucket supported on the base and having an inside volume, a lubricating unit having at least one lubricant applicator inside the bucket; and a source of torque configured to rotate the bucket and/or the lubricating unit relative to a tubular. The apparatus may include a cleaning unit and/or a drying unit and the source of torque may be a fluid jet in either. At least one lubricant applicator may be retractable and may be actuated between a retracted position and an extended position by centripetal force. The apparatus may further include a positioning assembly supporting the base and the rotary bucket assembly and a controller connected to and controlling each of:—the positioning assembly, the cleaning unit, the drying unit, and the lubricating unit.

Abstract: An optical distance measuring device and a method for operating an optical distance measuring device are disclosed. In an embodiment an optical distance measuring device includes a pixelated radiation source with at least two pixels, a radiation detector configured to detect electromagnetic radiation emitted by the radiation source and reflected in measuring regions and a control unit configured to operate the radiation source and to receive electrical signals from the radiation detector, wherein the pixelated radiation source is configured to illuminate different measuring regions with electromagnetic radiation with pairwise different properties.

Abstract: Provided are a photocuring-type three-dimensional printing device capable of automatic continuous printing, and a system. A three-dimensional model is automatically composed, the composed three-dimensional model is automatically printed and pick-up collected, and a material tank can also be automatically replenished when replenishment is needed, thereby implementing automatic continuous printing without manual intervention.

Abstract: Embodiments of systems and methods for monitoring one or more characteristics of a substrate are disclosed. Various embodiments of utilizing optical sensors (in one embodiment a camera) to provide data regarding characteristics of a fluid dispensed upon the substrate are described. A variety of hardware improvements and methods are provided to improve the collection and analysis of the sensor data. More specifically, a wide variety of hardware related techniques may be utilized, either in combination or singularly, to improve the collection of data using the optical sensor. These hardware techniques may include improvements to the light source, improvements to the optical sensors, the relationship of the physical orientation of the light source to the optical sensor, the selection of certain pixels of the image for analysis, and the relationship of the optical sensor frame rate with the rotational speed of the substrate.

Abstract: A system for reflowing a semiconductor workpiece including a stage, a first vacuum module and a second vacuum module, and an energy source is provided. The stage includes a base and a protrusion connected to the base, the stage is movable along a height direction of the stage relative to the semiconductor workpiece, the protrusion operably holds and heats the semiconductor workpiece, and the protrusion includes a first portion and a second portion surrounded by and spatially separated from the first portion. The first vacuum module and the second vacuum module respectively coupled to the first portion and the second portion of the protrusion, and the first vacuum module and the second vacuum module are operable to respectively apply a pressure to the first portion and the second portion. The energy source is disposed over the stage to heat the semiconductor workpiece held by the protrusion of the stage.

Abstract: An apparatus for producing semiconductor cells, the apparatus comprises a printing device for printing on a semiconductor cell, a monitoring device configured to monitor characteristics of the printed semiconductor cell, and a cleaning device configured for cleaning at least one part of the printing device based on the monitored characteristics of the semiconductor cells.

Abstract: A robot for transferring a wafer is disclosed. A blade of the robot includes a first sensor on an upper surface of the blade and the second sensor on a back surface of the blade. The first sensor is operable to align the blade with a wafer. The second sensor is operable to align the blade with a holder that holds the wafer.

Abstract: An ink jet process is used to deposit a material layer to a desired thickness. Layout data is converted to per-cell grayscale values, each representing ink volume to be locally delivered. The grayscale values are used to generate a halftone pattern to deliver variable ink volume (and thickness) to the substrate. The halftoning provides for a relatively continuous layer (e.g., without unintended gaps or holes) while providing for variable volume and, thus, contributes to variable ink/material buildup to achieve desired thickness. The ink is jetted as liquid or aerosol that suspends material used to form the material layer, for example, an organic material used to form an encapsulation layer for a flat panel device. The deposited layer is then cured or otherwise finished to complete the process.

Abstract: A thin film deposition system includes a vacuum-preloaded gas bearing deposition head positioned in an external environment having an ambient pressure, the deposition head having an output face including a plurality of source openings through which gaseous materials are supplied and one or more exhaust openings. An exhaust pressure at the exhaust openings is less than ambient pressure, and a source pressure at the source openings is greater than that at the exhaust openings, with the pressure at the outermost source openings being greater than ambient pressure. A motion control system moves a substrate unit over the output face in the in-track direction without constraining its motion in a direction normal to the output face to a point where a center of gravity of the substrate unit is beyond the first edge of the output face.

Abstract: A gas supply system includes first and second gas supply lines, first and second valves, and a controller. The first gas supply line is connected between a process gas source and a substrate processing chamber and has an intermediate node. The second gas supply line is connected between a purge gas source and the intermediate node. The first valve is disposed upstream of the intermediate node on the first gas supply line. The second valve is disposed upstream of the first valve on the first gas supply line. A controller controls the first and second valves to open the first and second valves in a first mode for supplying a process gas from the process gas source to the substrate processing chamber, and close the first and second valves in a second mode for supplying a purge gas from the purge gas source to the substrate processing chamber.

Abstract: A method for forming an isolating layer of a crucible includes placing a round crucible sideways with a bottom surface of an inside thereof perpendicular to a horizontal plane, and then performing a plurality of spraying processes to form the isolating layer on the bottom surface and a wall surface of the round crucible. Each spraying process includes spraying a slurry on the bottom surface; using an optical positioner to set a spraying range the same as one of a plurality of partial areas divided from the wall surface; aligning one of the plurality of partial areas with the spraying range; fixing the round crucible and spraying the slurry in the spraying range; stopping the spraying; and rotating the round crucible to move another partial area to the spraying range. Then, the steps are repeated until the spraying of all the partial areas is completed.

Abstract: The present disclosure discloses a light-emitting device, a display apparatus and a manufacturing method.

Abstract: A pipe repair device includes a body defining a first body end, a second body end, and a middle body section therebetween; a pivotable arm attached to the body, wherein the pivotable arm is pivotable relative to the body to radially reposition the pivotable arm relative to the body; a locomotion subsystem configured to drive the pipe repair device through a pipe, the locomotion subsystem mounted to the pivotable arm and configured to engage an inner surface of the pipe; and a stent mounted to the body, the stent comprising a sealing layer and a spring.

Abstract: An imprinting apparatus 100 includes a control unit 126 that controls movement of a stage 104. During a period after a pattern is formed in a first region of regions until a pattern is formed in a second region that differs from the first region of the regions, the control unit 126 does not allow the first region to pass through a facing portion that faces a discharge ports 122b. After a predetermined time has elapsed since the discharging unit 106 finally discharges a imprint material 127 to the substrate with an airstream generated along a substrate from the facing portion at the facing portion that faces the discharge ports 122b, the control unit 126 controls movement of the stage such that the regions in which the pattern is formed are allowed to pass through the facing portion.

Abstract: The present disclosure provides a position-detectable shielding device, which includes a first-shield member, a second-shield member, a driver and two position sensors. The driver includes a motor, an outer tube and a main shaft within the outer tube. The motor is connected to the first-shield member and the second-shield member, respectively via the outer tube and the main shaft. Such that, the motor drives and swings the two shield members between a shielding state and an open state. The two position sensors are respectively disposed for detecting that the outer tube has rotated to a first position where the first-shield member is in the open state, and for detecting that the outer tube has rotated to a second position where the first-shield member is in the shielding state, thereby to confirm that the two shield members are exactly at the preset shielding state or the open state.

Abstract: The present disclosure provides a method of making an article, including: providing a composition comprising two or more types of polymerizable monomers and two or more types of polymerization initiators; exposing the build region to one or more polymerization stimuli; polymerizing the two or more polymerizable monomers at the build region to provide a polymer layer; and advancing the polymer layer away from the build region to provide a three-dimensional article containing two or more integrally mixed polymers.

Abstract: Plasma applications are disclosed that operate with argon or helium at atmospheric pressure, and at low temperatures, and with high concentrations of reactive species in the effluent stream. Laminar gas flow is developed prior to forming the plasma and at least one of the electrodes can be heated which enables operation at conditions where the argon or helium plasma would otherwise be unstable and either extinguish, or transition into an arc. The techniques can be employed to clean and activate a metal substrate, including removal of oxidation, thereby enhancing the bonding of at least one other material to the metal.

Abstract: This method describes techniques to create 3D parts by dispensing a liquid polymer or slurry in evenly delivered layers, which are exposed to light from a visual display screen before the print platform upon which it is being built is moved one-layer thickness away and the process is repeated. The process of dispensing the photosensitive material is via a pumped system through a metering device that discharges and levels the material. Multiple dispensing devices can be arranged in sequence to deliver different materials, either multiple photosensitive dispensing heads or alternative mechanisms such as robocasting, fused deposition modelling or inkjet in addition to a photosensitive deposition head.

Abstract: A substrate etching system includes a support to hold a wafer in a face-up orientation, a dispenser arm movable laterally across the wafer on the support, the dispenser arm supporting a delivery port to selectively dispense a liquid etchant onto a portion of a top face of the wafer, and a monitoring system comprising a probe movable laterally across the wafer on the support.

Abstract: Embodiments herein describe a DTG printing environment that uses autonomous robots to move garments between DTG processing stages (e.g., retrieval stages, pretreatment stages, printing stages, drying stages, etc.). Doing so removes the dependency of DTG printing process on the stage that consumes the most time. In one embodiment, the DTG processing stages or the autonomous robot include an actuator for moving the garment and the DTG processing stage closer together. In one embodiment, the processing stage includes a lift (e.g., an actuator) that lifts a detachable carrier from the robot on which the garment is mounted. The lift can level and rotate the detachable carrier to provide a fine alignment between the garment and the DTG processing stage. While a lift is specifically disclosed, in other embodiments, the actuator could be disposed on the robot to lift up the garment.

Abstract: Embodiments of process kits for use in a process chamber are provided herein. In some embodiments, a process kit includes a slit door having an arcuate profile and including a first plate coupled to a second plate, wherein the first plate is configured to be coupled to an actuator, and wherein the second plate has a processing volume facing surface that includes silicon.

Abstract: Systems and methods for coating a thin film with a viscous material, such as a liquid, a paste, or an adhesive, at a desired thickness. In such a system, two films move adjacent to one another, optionally in opposite directions, atop two rollers separated by a known gap that defines a coating thickness, with the material being transferred from one film to the other. The rollers may be maintained in their relative positions by springs and/or linear actuators and positioned using linear encoders. In alternative arrangements, the material to be coated could be low viscosity material such as a polymeric solution. Air knives may be provided near the gap to create an air flow that aids in preventing the free flow of low viscosity materials outside the bounds of the film during coating.

Abstract: The present disclosure provides a thin-film-deposition equipment for detecting shielding mechanism, which includes a reaction chamber, a carrier, a shielding mechanism and two distance sensors. The carrier and the shielding mechanism is partially disposed within the reaction chamber. The shielding mechanism includes two shield unit and a driver. The driver interconnects and drives the two shield units to sway in opposite directions and into an open state and a shielding state. Each of the two shield unit is disposed with a reflective surface for each of the two distance sensors to respectively project optical beams onto and detect a distances therebetween when the two shield units are operated in the shielding state, such that to confirm that the shielding mechanism is in the shielding state.

Abstract: Methods of and systems for performing leak checks of gas-phase reactor systems are disclosed. Exemplary systems include a first exhaust system coupled to a reaction chamber via a first exhaust line, a bypass line coupled to a gas supply unit and to the first exhaust system, a gas detector coupled to the bypass line via a connecting line, a connecting line valve coupled to the connecting line, and a second exhaust system coupled to the connecting line. Methods include using the second exhaust system to exhaust the connecting line to thereby remove residual gas in the connecting line that may otherwise affect the accuracy of the gas detector.

Abstract: There is provided a method for manufacturing a three-dimensional shaped object by a continuous formation of a plurality of solidified layers through a light beam irradiation, the three-dimensional shaped object being provided with a hollow portion in an interior of the shaped object. The manufacturing method performs the formation of the solidified layer by irradiating a raw material with a light beam at the time of suppling the raw material, thereby allowing a sintering of the raw material or a melting and subsequent solidification of the raw material. In particular, a solidified foundation portion is provided as a part of the three-dimensional shaped object, the solidified foundation portion being used for a platform for a formation of a subsequent layer provided as the solidified layer. An orientation of the solidified foundation portion is changed prior to the formation of the subsequent solidified layer.

Abstract: An imprint apparatus includes: a substrate stage configured to move a substrate; an ejection unit including a plurality of nozzles and configured to eject an ejection material from the nozzles onto the substrate in synchronization with movement of the substrate stage; and a mold driving mechanism configured to drive a mold on which a pattern is formed to press down the mold onto the substrate. The imprint apparatus determines a relative ejection timing of an abnormal nozzle with respect to a normal nozzle based on ejection properties of the nozzles and a moving direction of the substrate stage, determines an ejection timing of the normal nozzle based on the determined relative ejection timing, and controls a synchronization timing of the substrate stage and the ejection unit based on the determined ejection timing of the normal nozzle.

Abstract: A substrate processing apparatus having an improved exhaust structure includes a reaction space formed between a processing unit and a substrate support unit, an exhaust unit surrounding the reaction space, an exhaust port with a channel inside, a partition wall with an exhaust line inside, wherein the channel of the exhaust port connects the exhaust unit and the exhaust line.

Abstract: The present disclosure relates to a plasma generation system with a dielectric window, an inductive coil disposed on the dielectric window, a gas distribution element disposed on the dielectric window, and a gas conditioning system coupled to the gas distribution element. The gas distribution element is configured to discharge a thermally conditioned gas on the dielectric window and regulate a temperature across the dielectric window. The gas conditioning system is configured to supply the thermally conditioned gas to the gas distribution element.

Abstract: The apparatus and methods include moving an optical fiber over a fiber path that includes a marking location at which resides a marking unit that dispenses an ink-jet stream. A centering method is performed whereby the optical fiber is incrementally moved in a lateral direction through the path of the ink-stream and the mark number density of marks formed on the optical fiber is measured along with the optical fiber position. A process window is defined by the range of lateral fiber positions over which a target mark number density is formed on a consistent basis. A controller calculates an optimum fiber path position and stores it memory for future reference while also moving the fiber path to the optimum position. The initially wet ink marks are dried and the fiber coated with a transparent protective overcoat to form a coated and marked optical fiber.

Abstract: Various approaches can be used to interrogate a surface such as a surface of a layered semiconductor structure on a semiconductor wafer. Certain approaches employ Second Harmonic Generation and in some cases may utilize pump and probe radiation. Other approaches involve determining current flow from a sample illuminated with radiation. Decay constants can be measured to provide information regarding the sample. Additionally, electric and/or magnetic field biases can be applied to the sample to provide additional information.