With Indicating, Testing, Inspecting, Or Measuring Means Patents (Class 118/712)
  • Patent number: 11969937
    Abstract: An apparatus for producing a three-dimensional object includes a support assembly having a build platform, a track extending through a build area, and a deposition mechanism mounted on the track and configured for producing the three-dimensional object in a layer-by-layer technique. The deposition mechanism includes a carriage movable along the track, a supply of a flowable material mounted on the carriage, a roller in communication with the flowable material, where the roller is rotatably mounted on the carriage and configured for rotating to carry the flowable resin to an application for application to produce the object, and an exposure device mounted on the carriage. The exposure device emits electromagnetic waves to an exposure site to solidify the applied flowable material to produce the object. The roller is permeable to the electromagnetic waves, such that the waves pass through the roller in traveling from the exposure device to the exposure site.
    Type: Grant
    Filed: January 25, 2021
    Date of Patent: April 30, 2024
    Assignee: PAXIS LLC
    Inventors: Frederick Knecht, Michael G. Littrell
  • Patent number: 11965243
    Abstract: Techniques for controlling a solid precursor vapor source are provided. An example method disclosure includes providing a carrier gas to a precursor material in a sublimation vessel, such that the sublimation vessel includes an inlet area and an outlet area configured to enable the carrier gas to flow through the precursor material, and at least one thermal device configured to add or remove heat from the sublimation vessel, determining a sublimation temperature value and a delta temperature value based on the precursor material and the carrier gas, setting a first temperature in the sublimation vessel based on the sublimation temperature value and the delta temperature value, such that the first temperature is measured proximate to the inlet area, and setting a second temperature in the sublimation vessel based on the sublimation temperature value, such that the second temperature is measured proximate to the outlet area.
    Type: Grant
    Filed: April 12, 2021
    Date of Patent: April 23, 2024
    Assignee: CeeVee Tech, LLC
    Inventor: Egbert G. Woelk
  • Patent number: 11964444
    Abstract: A method for building tyres is described. An elementary semifinished product is deposited on a building drum rotated by an output end effector of a robotized arm in form of coils forming a component of a tyre. A processor determines a target rotation speed of the building drum and a target value for a speed parameter associated with the rotation. If the target value is not an integer number, the processor: i) determines a drive interval shorter than the effector settling time; ii) calculates first and second values corresponding to integer numbers immediately preceding and immediately following the target value; iii) calculates a speed parameter PWM profile with minimum and maximum values corresponding to the first and second values; and iv) controls the effector according to the PWM profile.
    Type: Grant
    Filed: June 18, 2020
    Date of Patent: April 23, 2024
    Assignee: PIRELLI TYRE S.P.A.
    Inventor: Emanuele Luca Schiavon
  • Patent number: 11958306
    Abstract: In an example of the disclosure, a priming lane and a non-priming lane are identified within an image frame to be printed by a printer. A line of molten wax is applied to the roller. The molten wax when cooled is to form a wax ridge upon the roller. The roller having the formed wax ridge is wetted with the primer. The wetted roller is rotated against the substrate to apply the primer. A first width of the wetted roller that does not include the wax ridge forms the priming lane upon the substrate. A second width of the roller that includes the wax ridge causes the primer to not transfer and thereby forms the non-priming lane upon the substrate.
    Type: Grant
    Filed: September 30, 2019
    Date of Patent: April 16, 2024
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Chen Zigdon, Mirit Shitrit, Liora Braun
  • Patent number: 11959173
    Abstract: A method of forming structure includes providing a substrate in a reaction chamber, forming a first layer overlaying the substrate, and forming a second layer onto the first layer. Temperature of the first layer is controlled during the forming of the first layer using infrared electromagnetic radiation emitted by the first layer. Temperature of the second layer is controlled during the forming of the second layer using infrared electromagnetic radiation emitted by the second layer. Semiconductor device structures and semiconductor processing systems are also described.
    Type: Grant
    Filed: March 17, 2022
    Date of Patent: April 16, 2024
    Assignee: ASM IP Holding B.V.
    Inventors: Amir Kajbafvala, Yanfu Lu, Robinson James, Caleb Miskin
  • Patent number: 11946136
    Abstract: A semiconductor processing device is disclosed. The device can include a reactor and a solid source vessel configured to supply a vaporized solid reactant to the reactor. A process control chamber can be disposed between the solid source vessel and the reactor. The device can include a valve upstream of the process control chamber. A control system can be configured to control operation of the valve based at least in part on feedback of measured pressure in the process control chamber.
    Type: Grant
    Filed: September 8, 2020
    Date of Patent: April 2, 2024
    Assignee: ASM IP Holding B.V.
    Inventors: Jereld Lee Winkler, Eric James Shero, Carl Louis White, Shankar Swaminathan, Bhushan Zope
  • Patent number: 11945163
    Abstract: A three-dimensional object printing apparatus includes a liquid discharge head having a nozzle surface, a moving mechanism that changes a position and a pose of the liquid discharge head relative to a three-dimensional workpiece, and a controller. The workpiece has a first surface and a second surface that forms a corner bent or curved in a convex shape between the first surface and the second surface. When an axis along a scanning direction of the liquid discharge head with respect to the workpiece in a first printing operation of performing printing on the first surface is a first scanning axis and a normal vector of the nozzle surface in the first printing operation is a first discharge vector, the controller controls the driving of the moving mechanism such that the first discharge vector has a component in a direction toward the second surface along the first scanning axis.
    Type: Grant
    Filed: June 27, 2021
    Date of Patent: April 2, 2024
    Assignee: Seiko Epson Corporation
    Inventor: Masaru Kumagai
  • Patent number: 11948782
    Abstract: A control system includes: a specifying part for specifying a model corresponding to a processing apparatus and a control algorithm that generates a control signal for controlling the processing apparatus; a simulator for simulating the state of the processing apparatus with the model; a first control signal generation part for generating a control signal based on the measurement value by using the control algorithm; a second control signal generation part for generating a control signal based on an output value of the simulator by using the control algorithm; a first adjustment part for adjusting a value of a model parameter included in the model; and a second adjustment part for adjusting a value of a control parameter included in the control algorithm so that an evaluation value calculated for the output value of the simulator becomes closer to a target value.
    Type: Grant
    Filed: November 23, 2020
    Date of Patent: April 2, 2024
    Assignee: TOKYO ELECTRON LIMITED
    Inventor: Ryuta Higuchi
  • Patent number: 11939694
    Abstract: The present invention relates to a method for coating a component of a turbomachine in a bath, in which method, the component is partially immersed in the bath containing a coating material; the component is rotated at least intermittently around an axis of rotation, which lies outside of the bath, during the at least partial immersion; the component is at most immersed partially over and beyond the rotation.
    Type: Grant
    Filed: May 26, 2022
    Date of Patent: March 26, 2024
    Assignee: MTU Aero Engines AG
    Inventors: Christoph Konstant, Stefan Mayr
  • Patent number: 11942308
    Abstract: A microwave plasma source that generates a microwave plasma in a processing space in which a target substrate is processed, includes: a microwave generation part for generating microwave; a waveguide through which the microwave generated by the microwave generation part propagates; an antenna part including a slot antenna having a predetermined pattern of slots formed therein and being configured to radiate the microwave propagating through the waveguide into the processing space and a microwave-transmitting plate being made of a dielectric material and being configured to transmit the microwave radiated from the slots therethrough and supply the microwave into the processing space; a temperature detector for detecting a temperature at a predetermined position in a microwave propagation path leading to the slot antenna; and an abnormality detection part for receiving the temperature detected by the temperature detector and detect an abnormality in the microwave propagation path based on the detected temperatu
    Type: Grant
    Filed: April 13, 2021
    Date of Patent: March 26, 2024
    Assignee: TOKYO ELECTRON LIMITED
    Inventor: Yasuaki Taniike
  • Patent number: 11931963
    Abstract: A method for producing a three-dimensional element on a timepiece component, in particular on a dial, that includes generating, by means of a control unit, at least one control instruction for a printing device for reproducing a reference digital graphical representation relating to said three-dimensional element, and constructing, by means of the printing device, at least two substantially superimposed or superimposed layers each having at least one particle which is printed on the timepiece component and which forms the three-dimensional element.
    Type: Grant
    Filed: December 6, 2018
    Date of Patent: March 19, 2024
    Assignee: ETA SA Manufacture Horlogere Suisse
    Inventors: Brice Raillard, Vlada Mihailovic, Felix Jaeggi, Christophe Emmenegger, Frederic Jeanrenaud
  • Patent number: 11933826
    Abstract: An execution device according to an exemplary embodiment includes an operation device, an acceleration sensor, and an arithmetic device. The operation device is a device for executing a predetermined operation. The acceleration sensor measures acceleration applied to the execution device. The arithmetic device measures an elapsed time after the acceleration measured by the acceleration sensor becomes a value within a reference range, and when a predetermined time elapses while the acceleration remains a value within the reference range, causes the operation device to execute the predetermined operation.
    Type: Grant
    Filed: September 8, 2021
    Date of Patent: March 19, 2024
    Assignee: Tokyo Electron Limited
    Inventors: Yuto Usuki, Takayuki Hatanaka
  • Patent number: 11927482
    Abstract: One or more embodiments described herein generally relate to systems and methods for calibrating an optical emission spectrometer (OES) used for processing semiconductor substrates. In embodiments herein, a light fixture is mounted to a plate within a process chamber. A light source is positioned within the light fixture such that it provides an optical path that projects directly at a window through which the OES looks into the process chamber for its reading. When the light source is on, the OES measures the optical intensity of radiation from the light source. To calibrate the OES, the optical intensity of the light source is compared at two separate times when the light source is on. If the optical intensity of radiation at the first time is different than the optical intensity of radiation at the second time, the OES is modified.
    Type: Grant
    Filed: March 27, 2020
    Date of Patent: March 12, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Kin Pong Lo, Lara Hawrylchak, Malcolm J. Bevan, Theresa Kramer Guarini, Wei Liu, Bernard L. Hwang
  • Patent number: 11923232
    Abstract: A positioning apparatus includes a stage configured to hold a substrate, a first pin configured to hold an edge ring and a second pin separately provided from the first pin and configured to hold the edge ring. The positioning apparatus further includes a rotation mechanism configured to rotate the stage and the first pin, an elevating mechanism configured to raise and lower at least one of the first pin and the second pin and a detection mechanism configured to detect a position of an outer circumference of the substrate held by the stage and a position of an inner circumference of the edge ring held by the first pin.
    Type: Grant
    Filed: February 26, 2021
    Date of Patent: March 5, 2024
    Assignee: TOKYO ELECTRON LIMITED
    Inventor: Toshiaki Toyomaki
  • Patent number: 11919230
    Abstract: A three-dimensional (3D) printing system includes a resin vessel containing photocurable resin, an imaging system, a build plate with a plate upper surface, a vertical positioner, a volume compensator (VC), and a controller. The controller is configured to: (a) operate the VC to maintain a resin upper surface proximate to a build plane, (b) operate the imaging system and the vertical positioner to generate a plurality of base layers upon the plate upper surface, (c) receive a first signal responsive to vertical motion of the resin upper surface, (d) analyze the first signal to determine a metric that is related to an extent of immersion of the plate upper surface below the resin upper surface during formation of the base layers, and (e) operate the imaging system and the vertical positioner to begin generation of the 3D article after the metric has reached a predefined threshold.
    Type: Grant
    Filed: April 13, 2021
    Date of Patent: March 5, 2024
    Assignee: 3D SYSTEMS, INC.
    Inventors: Andrew Enslow, Eric M. Innes
  • Patent number: 11911982
    Abstract: A system (1) for applying a sealing agent to the surface (5) of an internal cavity (2) of a pneumatic tyre (3) provided with an applicator device (12) for supplying a strip of sealing agent that is applied to the surface (5) and an opto-electronic device (4*; 20) that is integral to the nozzle (18) of the applicator device (12) and that is provided with at least one sensor element (9*; 20) that is able to acquire a plurality of images of the surface (5) and to provide a plurality of signals that are indicative of said plurality of acquired images; and an electronic processing system (11) connected to the opto-electronic device (4*; 20), and to the applicator device (12) and configured so as to acquire the signals that are indicative of the plurality of images acquired by the opto-electronic device (4*; 20); and to control the application of the sealing agent as a function of the plurality of signals that are indicative of the plurality of images acquired by the opto-electronic device (4*; 20).
    Type: Grant
    Filed: December 18, 2018
    Date of Patent: February 27, 2024
    Assignee: Bridgestone Europe NV/SA
    Inventor: Roberto Pontone
  • Patent number: 11911955
    Abstract: Disclosed herein are embodiments of a system for use in additive manufacturing methods. The system can comprise a first container, and a first fluid and a second fluid forming a fluid-fluid interface within the first container. The first fluid is between the fluid-fluid interface and the transparent portion of the first container and configured to remove oxygen from the second fluid at the fluid-fluid interface to facilitate polymerization of a monomeric component in the second fluid. The system can also comprise a circulation system configured to circulate the first fluid through the first container such that the first fluid flows between the fluid-fluid interface and the inner surface of the transparent portion of the first container.
    Type: Grant
    Filed: December 3, 2020
    Date of Patent: February 27, 2024
    Assignee: Triad National Security, LLC
    Inventors: Kyle Cluff, Matthew Lee, Nicholas Parra-Vasquez, Matthew Crall
  • Patent number: 11890858
    Abstract: A coating apparatus includes a coating member, a pressing member, an abutment member, and a restriction member. The coating member coats a sheet with a coating agent. The pressing member is movable and abuts on the coating member to form a nip. The abutment member abuts on the coating member at a position different from a position of the nip. The restriction member restricts movement of the coating member in a separation direction in which the coating member separates from the abutment member.
    Type: Grant
    Filed: July 7, 2021
    Date of Patent: February 6, 2024
    Assignee: Ricoh Company, Ltd.
    Inventors: Keita Achi, Isao Matsushima
  • Patent number: 11890630
    Abstract: The disclosure relates to a paint supply system for a coating installation (e.g. painting installation) comprising a ring line for circulation of a coating agent, a ring line tapping point in the ring line for extraction of the coating agent from the ring line, a consumer and a tap line leading from the ring line tapping point to the consumer. The disclosure provides a device for alternately moving the coating agent forward and backward in the tap line to avoid settling of the coating agent in the tap line.
    Type: Grant
    Filed: November 10, 2020
    Date of Patent: February 6, 2024
    Assignee: Dürr Systems AG
    Inventors: Alexander Rüger, Sascha Hermann, Luis Jimenez Cadenas, Eduard Frühsorger
  • Patent number: 11887818
    Abstract: Apparatus and methods to control the phase of power sources for plasma process regions in a batch process chamber. A master exciter controls the phase of the power sources during the process sequence based on feedback from the match circuits of the respective plasma sources.
    Type: Grant
    Filed: October 11, 2021
    Date of Patent: January 30, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Tsutomu Tanaka, John C. Forster, Ran Liu, Kenichi Ohno, Ning Li, Mihaela Balseanu, Keiichi Tanaka, Li-Qun Xia
  • Patent number: 11885748
    Abstract: Nephelometric measuring devices are described. The nephelometric measuring devices can be configured such that an amount of scattered light having different pathlengths impingent upon one or more scattered-light detectors from a beam propagating through a suspension can result in substantially equivalent sensitivity and in correlation between the scattered-light detectors' response and a turbidity value of the suspension. The response of the scattered-light detector(s) receiving scattered light at a nephelometric angle of 85-110° from a beam of light propagating through the suspension can be in accordance to an equation selected from a group of non-linear equations where: x/y=anxn+an?1xn?1+ . . . +a2x2+a1x+a0; where “n” is an integer greater than 0; “x” is equal to the turbidity value of the suspension; “y” is equal to the response of the scattered-light detector; and “an” are calibration coefficients.
    Type: Grant
    Filed: November 2, 2020
    Date of Patent: January 30, 2024
    Assignee: Tintometer GmbH
    Inventors: Perry Palumbo, Elmar Grabert
  • Patent number: 11884004
    Abstract: Systems and methods for making it easier to remove support structures printed in conjunction with printing an object using stereolithographic additive manufacturing are disclosed. In some exemplary embodiments, one or more interfaces between the printed object and the support structures are modulated to allow for easy separation between them, in some instances even when the object and support structures are made from the same material. Various modulation techniques are disclosed, including adjusting an intensity of exposure to light at interfaces between the object and support structures, and using two materials where one material cures at two wavelength ranges and the other material only cures at one of the two wavelength ranges. Other systems and methods that allow for easy separation of part and support structure are also described.
    Type: Grant
    Filed: November 12, 2019
    Date of Patent: January 30, 2024
    Assignee: MASSACHUSETTS INSTITUTE OF TECHNOLOGY
    Inventors: Abhinav Rao, Anastasios John Hart
  • Patent number: 11881381
    Abstract: A method and an apparatus of plasma-assisted semiconductor processing is provided. The method comprises: a) providing substrates at each of the multiple stations; b) distributing RF power including a first target frequency to multiple stations to thereby generate a plasma in the stations, wherein the RF power is distributed according to a RF power parameter configured to reduce station to station variations; c) tuning an impedance matching circuit for a first station included in the multiple stations while distributing RF power to the first station by: i) measuring a capacitance of a capacitor in the impedance matching circuit without disconnecting the capacitor from the impedance matching circuit; and ii) adjusting, according to the capacitance measured in (i) and the RF power parameter, a capacitance of the capacitor; and d) performing a semiconductor processing operation on the substrate at each station.
    Type: Grant
    Filed: February 22, 2019
    Date of Patent: January 23, 2024
    Assignee: Lam Research Corporation
    Inventors: Sunil Kapoor, Thomas Frederick
  • Patent number: 11865768
    Abstract: Methods and systems for forming objects through photo-curing of a liquid resin in a tank by selective exposure (through a mask) to radiation, in which during printing operations the liquid resin in the tank is displaced relative to the build area along an axis orthogonal to that along which the object is extracted from the liquid resin in the tank. A volume of the photo-curing liquid resin may be cycled through a cooling arrangement by being extracted from the tank, cooled, and then reintroduced into the tank as printing of the object is taking place. The mask is preferably one in which charged colorant particles are dispersed in an optically transparent fluid within a plurality of bi-state cells.
    Type: Grant
    Filed: October 1, 2021
    Date of Patent: January 9, 2024
    Assignee: NEXA3D INC.
    Inventor: Izhar Medalsy
  • Patent number: 11862436
    Abstract: A plasma processing apparatus includes a processing vessel; a placing table, serving as a lower electrode, disposed within the processing vessel; an upper electrode serving as a facing electrode of the placing table; a plasma processor configured to form a gas within the processing vessel into plasma by supplying a high frequency power and to process a processing target object on the placing table with the plasma; a cover member configured to cover the upper electrode from thereabove; a cooler provided within the cover member and configured to cool the upper electrode with a coolant having a temperature lower than a dew point temperature of exterior air outside the processing vessel; and a gas supply configured to supply a low-dew point gas having a dew point temperature lower than the dew point temperature of the exterior air into a space surrounded by the cover member and the upper electrode.
    Type: Grant
    Filed: October 20, 2021
    Date of Patent: January 2, 2024
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Toru Fujii, Yoshitomo Konta, Kohei Otsuki
  • Patent number: 11859307
    Abstract: The embodiments described herein generally relate to a stem assembly for coupling a susceptor to a process chamber. The stem assembly includes a pivot mechanism, a first flexible seal coupled to the pivot mechanism, a second flexible seal coupled to a plate on a first side of the plate, the plate having a second side coupled to the first flexible seal, a housing coupled to the second flexible seal, and a motion assembly adapted to move the housing in an X axis and a Y axis, and position the susceptor angularly relative to an X-Y plane of the process chamber.
    Type: Grant
    Filed: September 24, 2020
    Date of Patent: January 2, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Edric Tong, James Francis Mack, Paul Brillhart
  • Patent number: 11858813
    Abstract: Systems and method for producing graphene on a substrate are described. Certain types of exemplar systems include lateral arrangements of a substrate gas scavenging environment and an annealing environment. Certain other types of exemplar systems include lateral arrangements of a graphene producing environment and a cooling environment, which cools the graphene produced on the substrate. Yet other types of exemplar systems include lateral arrangements of a localized annealing environment, localized graphene producing environment and a localized cooling environment inside the same enclosure. Certain type of exemplar methods for producing graphene on a substrate include scavenging a first portion of the substrate and preferably, contemporaneously annealing a second portion of the substrate.
    Type: Grant
    Filed: December 6, 2022
    Date of Patent: January 2, 2024
    Assignee: General Graphene Corporation
    Inventors: Vig Sherrill, Mira Baraket, Richard Philpott
  • Patent number: 11851757
    Abstract: Coated nanofibers and methods for forming the same. A magnetic nanofiber is formed and a barrier coating is deposited on the magnetic nanofiber by atomic layer deposition (“ALD”) process. The coated nanofiber may include a reduced magnetic nanostructure and a barrier coating comprising a first oxide coating on the nanofiber, the coating being non-reactive with the magnetic polymer nanofiber, the barrier coating have a thickness of 2 nm to 12 nm.
    Type: Grant
    Filed: January 30, 2020
    Date of Patent: December 26, 2023
    Assignee: UCHICAGO ARGONNE, LLC
    Inventors: Anil U. Mane, Yuepeng Zhang, Devika Choudhury, Jeffrey W. Elam, Kaizhong Gao, John N. Hryn
  • Patent number: 11850622
    Abstract: Provided are a coating apparatus and a coating system, where the coating apparatus includes: a coating module, the coating module including a coating roller and a coating die, where the coating roller is configured to drive, when rotating, a substrate to move toward the coating die, and the coating die is configured to apply a coating onto the substrate; an error acquisition module having a predetermined distance to the coating roller and configured to acquire a circular run-out error of rotation of the coating roller and transmit the circular run-out error to a linkage module; and the linkage module configured to adjust position of the coating die in real time according to the circular run-out error transmitted to the linkage module, so as to keep a distance between the coating roller and the coating die unchanged.
    Type: Grant
    Filed: June 26, 2023
    Date of Patent: December 26, 2023
    Assignee: JIANGSU CONTEMPORARY AMPEREX TECHNOLOGY LIMITED
    Inventors: Xiaoliang Gao, Xiaokang Yan, Xing Wang, Tuo Zheng, Shisong Li
  • Patent number: 11840760
    Abstract: In a layer deposition method, a substrate is loaded into a process chamber. A gas filling tank is charged with a gas to a predetermined charge pressure. The pressure of the gas is elevated to a pressure greater than the predetermined charge pressure. The gas is introduced into the process chamber.
    Type: Grant
    Filed: December 3, 2018
    Date of Patent: December 12, 2023
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Shin-Jae Kang, Dong-Hoon Han, Do-Hyung Kim, Kyung-Wook Park, Kevin Bae, Sun-Soo Lee, In-Jae Lee, Jeon-Il Lee, Chae-Mook Lim
  • Patent number: 11833756
    Abstract: The invention is generally a system for washing off residual resin from objects which are three-dimensionally (3D) printed through a vat polymerization (VP) process. Exemplary systems may include a solvent receptacle, a wash reservoir in fluid communication with the solvent receptacle, and a controller configured to pump a solvent from the solvent receptacle to the wash reservoir for washing off residual resin from a 3D-printed object. Exemplary methods may include pumping a first solution of a plurality of solvent solutions from the solvent receptacle to the wash reservoir, dispersing the first solution onto the 3D-printed object, pumping the first solution from the wash reservoir to the solvent receptacle, pumping a second solution of the plurality of solvent solutions from the solvent receptacle to the wash reservoir, and dispersing the second solution onto the 3D-printed object.
    Type: Grant
    Filed: February 23, 2022
    Date of Patent: December 5, 2023
    Assignee: SprintRay Inc.
    Inventors: Amir Mansouri, Huijian Tian, Shukun Ye, Hossein Bassir, Aayush Patel, Hang Ye
  • Patent number: 11832468
    Abstract: Light emitting device, method of manufacturing the light emitting device, and display device including the light emitting device are disclosed. The light emitting device includes a first electrode and a second electrode each having a surface opposite the other, a light emitting layer including quantum dots that is disposed between the first electrode and the second electrode, and an electron auxiliary layer disposed between the light emitting layer and the second electrode, wherein the electron auxiliary layer includes metal oxide nanoparticles including an anion of an organic acid bound to a surface of the metal oxide nanoparticle.
    Type: Grant
    Filed: June 25, 2021
    Date of Patent: November 28, 2023
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Hongkyu Seo, Kwanghee Kim, Eun Joo Jang, Won Sik Yoon, Tae Hyung Kim, Tae Ho Kim
  • Patent number: 11819876
    Abstract: The present disclosure relates to a slot die coating apparatus for coating an electrode active material slurry onto an electrode collector, the slot die coating apparatus including a coating roller, a die comprising a lower discharge opening, through which a first electrode active material slurry is discharged, and an upper die located on the upper side of the lower die and having an upper discharge opening, through which a second electrode active material slurry is discharged, and an upper air vent may be installed in the upper die and a lower air vent may be installed in the lower die.
    Type: Grant
    Filed: May 12, 2020
    Date of Patent: November 21, 2023
    Inventors: Ki Tae Kim, Do Hyun Lee, Taek Soo Lee, Cheolwoo Kim, Sang Hoon Choy
  • Patent number: 11823923
    Abstract: To provide a transfer chamber capable of replacing a chemical filter without affecting an internal atmosphere, and shortening or eliminating stop time of a transfer process of a wafer (W) associated with replacement of the chemical filter. The transfer chamber transfers the wafer (W) to or from a processing device (6) by using a transfer robot (2) provided thereinside, and includes a circulation path (CL1) formed inside of a transfer chamber (1) to circulate gas, a chemical filter unit (7) provided in the midstream of the circulation path (CL1), and a connecting and disconnecting means (8) which switches connection and disconnection of the chemical filter unit (7) to and from the circulation path (CL1).
    Type: Grant
    Filed: July 8, 2022
    Date of Patent: November 21, 2023
    Assignee: SINFONIA TECHNOLOGY CO., LTD.
    Inventors: Toshihiro Kawai, Takashi Shigeta, Munekazu Komiya, Yasushi Taniyama
  • Patent number: 11813646
    Abstract: A substrate processing device includes: a chamber; a substrate processing mechanism that has a holding member, and discharges a processing fluid onto a substrate held by the holding member; a joint pipe that has a lower opening provided below the holding member, and an upper opening provided above the holding member, and is disposed such that at least part of the joint pipe from the lower opening to the upper opening passes through the outside of the chamber; and an air flow generator that is provided in the joint pipe. The air flow generator circulates an atmosphere in the chamber by discharging the atmosphere in the chamber from the lower opening to the joint pipe to allow the atmosphere to pass through the joint pipe, thereby introducing the atmosphere again into the chamber via the upper opening so that a downflow of the atmosphere occurs in the chamber.
    Type: Grant
    Filed: October 5, 2021
    Date of Patent: November 14, 2023
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Nobuaki Okita, Joichi Nishimura
  • Patent number: 11813630
    Abstract: The disclosure concerns a coating method and a corresponding coating device for coating components with a nozzle applicator with several nozzles, in particular for painting motor vehicle body components. The disclosure provides that the nozzle applicator is flexibly controlled during the coating method.
    Type: Grant
    Filed: November 22, 2021
    Date of Patent: November 14, 2023
    Assignee: Dürr Systems AG
    Inventors: Hans-Georg Fritz, Benjamin Wöhr, Marcus Kleiner, Moritz Bubek, Timo Beyl, Frank Herre, Steffen Sotzny
  • Patent number: 11801627
    Abstract: A method and apparatus for forming extruded shapes having at least a hollow portion using a hydrodynamic nozzle, a curable fluid, and a core fluid.
    Type: Grant
    Filed: July 20, 2021
    Date of Patent: October 31, 2023
    Assignee: Hummingbird Nano, Inc.
    Inventor: Eleanor Augusta Derbyshire
  • Patent number: 11801645
    Abstract: A three-dimensional (3D) printing system for manufacturing a three-dimensional article includes a resin vessel for containing a volume of photocurable resin having a resin upper surface, an imaging system configured to define a build plane, a build plate having a build plate upper surface, a build plate positioner, a sensor configured to generate a signal indicative of a fluid-related vertical position of one or more of the resin upper surface and a component of a volume compensator (VC), and a controller. The controller is configured to (1) operate the build plate positioner to vertically translate build plate upper surface, (2) concurrent with operating the build plate positioner, receiving the signal from the sensor, (3) analyze the signal to determine a build plate geometric signature, and (4) determine or suspend a build plan for building the 3D article based upon the determined geometric signature.
    Type: Grant
    Filed: August 2, 2021
    Date of Patent: October 31, 2023
    Assignee: 3D SYSTEMS, INC.
    Inventors: Andrew Enslow, Nickalaus Podgursky, Daniel Alonzo
  • Patent number: 11804395
    Abstract: A substrate processing method includes: carrying out a substrate from a substrate transfer container by a substrate transfer device; placing the substrate in a first position of a substrate holder; moving the substrate holder into a reaction container and processing the substrate in the reaction chamber; obtaining a film thickness measurement result of the substrate processed in the reaction container; creating a model from the film thickness measurement result; determining a second position where the substrate is placed in the substrate holder and a transfer position setting value obtained from the model; adjusting the first position of the substrate to the second position; calculating an eccentricity state of the substrate from a newly obtained film thickness measurement result; calculating an optimization such that the eccentricity state is minimized; and determining a third position to which a new substrate is placed from the transfer position setting value.
    Type: Grant
    Filed: March 2, 2022
    Date of Patent: October 31, 2023
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Youngtai Kang, Yuichi Takenaga
  • Patent number: 11793021
    Abstract: A method of fabricating a display device, the method comprising: preparing a mother substrate having a first cell region and a second cell region, and a first target region and a second target region in the first cell region and the second cell region, respectively; providing an encapsulation material on a first printing region in the first target region to form a first encapsulation layer; and providing the encapsulation material on a second printing region in the second target region to form a second encapsulation layer, wherein a center of the second printing region is shifted from a center of the second target region in a specific direction.
    Type: Grant
    Filed: August 21, 2020
    Date of Patent: October 17, 2023
    Assignee: Samsung Display Co., Ltd.
    Inventors: JoongHyun Kim, Dongjin Lee, Juin Park, Taeyoun Won, Kyong-Taeg Lee, Seok Choo
  • Patent number: 11786928
    Abstract: A dispensing device includes a dispensing mechanism and a calibration mechanism coupled to the dispensing mechanism. The calibration mechanism includes a control unit. The control unit is configured to detect a position difference between a dispensing needle and a reference coordinate in a direction. The dispensing mechanism is configured to adjust the dispensing needle in the direction according to the position difference.
    Type: Grant
    Filed: September 10, 2020
    Date of Patent: October 17, 2023
    Assignee: Fulian Yuzhan Precision Technology Co., Ltd
    Inventors: Ai-Jun Tang, Shi Chen, Wei-Zheng Wang, Jun-Yu Lin, Bo Yang, Jian-Guo Liao
  • Patent number: 11787106
    Abstract: In a method for the lithography-based generative production of a three-dimensional component, in which electromagnetic radiation emitted by an irradiation device is successively focused on focal points within a material, wherein in each case a volume element of the material located at the focal point is solidified by means of multiphoton absorption, wherein a substructure is each built up from the volume elements in a writing area of the irradiation device, the build-up of the component comprises the following steps: a) a plurality of substructures are arranged next to one another, then b) substructures are arranged one above the other so that upper substructures bridge the interface(s) between lower substructures arranged next to one another.
    Type: Grant
    Filed: February 26, 2020
    Date of Patent: October 17, 2023
    Assignee: UPNANO GMBH
    Inventor: Peter Gruber
  • Patent number: 11779472
    Abstract: The present invention provides a three-dimensional bioprinter for fabricating cellular constructs such as tissues and organs using electromagnetic radiation (EMR) at or above 405 nm. The bioprinter includes a material deposition device comprising a cartridge for receiving and holding a composition which contains biomaterial that cures after exposure to EMR. The bioprinter also includes an EMR module that emits EMR at a wavelength of about 405 nm or higher. Also provided is a bioprinter cartridge which contains cells and a material curable at a wavelength of about 405 nm or greater. The cells are present in a chamber and are extruded through an orifice to form the cellular construct.
    Type: Grant
    Filed: June 14, 2021
    Date of Patent: October 10, 2023
    Assignee: 3D SYSTEMS, INC.
    Inventors: Ricardo D. Solorzano, Sohaib K. Hashmi, Daniel Cabrera
  • Patent number: 11780242
    Abstract: A deposition device is described. The deposition device has a substrate support and an imaging system disposed to image a portion of a substrate positioned on the substrate support. The imaging system comprises an LED light source and an imaging unit, and is coupled to a deposition assembly disposed across the substrate support.
    Type: Grant
    Filed: October 20, 2021
    Date of Patent: October 10, 2023
    Assignee: Kateeva, Inc.
    Inventors: Jerry Chang, Matt Audet
  • Patent number: 11774370
    Abstract: Provided are an apparatus for processing a substrate and a method for measuring a temperature of the substrate. The apparatus for processing the substrate includes a temperature measurement part and a light-transmitting shield plate. The temperature measurement part includes a light source, a light receiving part configured to receive reflected light reflected by the substrate or the shield plate among the light irradiated from the light source, and a radiant light emitted from the substrate to measure a quantity of the reflected light and an intensity of the radiant light and a temperature calculation part configured to calculate the temperature of the substrate, to which a contamination level of the shield plate is reflected, by using the quantity of the reflected light and the intensity of the radiant light.
    Type: Grant
    Filed: October 21, 2021
    Date of Patent: October 3, 2023
    Inventors: Yong Soo Moon, Hahn Joo Yoon, Chan Ho Hong, Seung Hwan Lee, Oh Seung Kwon
  • Patent number: 11778926
    Abstract: A physical vapor deposition system includes a chamber, three target supports to targets, a movable shield positioned having an opening therethrough, a workpiece support to hold a workpiece in the chamber, a gas supply to deliver nitrogen gas and an inert gas to the chamber, a power source, and a controller. The controller is configured to move the shield to position the opening adjacent each target in turn, and at each target cause the power source to apply power sufficient to ignite a plasma in the chamber to cause deposition of a buffer layer, a device layer of a first material that is a metal nitride suitable for use as a superconductor at temperatures above 8° K on the buffer layer, and a capping layer, respectively.
    Type: Grant
    Filed: August 8, 2022
    Date of Patent: October 3, 2023
    Assignee: Applied Materials, Inc.
    Inventors: Mingwei Zhu, Zihao Yang, Nag B. Patibandla, Ludovic Godet, Yong Cao, Daniel Lee Diehl, Zhebo Chen
  • Patent number: 11768480
    Abstract: Disclosed is a method for providing a control command set for an additive manufacturing device. The method includes providing a parameter set consisting of a number of parameters, and a construction rule, which is suitable for describing at least one section of the object by the parameter set geometrically as a number of linear or flat elements in space; generating a computer-based layer model of the section of the object by determining, for each layer, the position and shape of a cross-section of the section of the object within the layer, generating a control command set for an additive manufacturing device by which the production of the section of the object is implemented on the basis of the layer model.
    Type: Grant
    Filed: January 24, 2019
    Date of Patent: September 26, 2023
    Assignee: EOS GmbH Electro Optical Systems
    Inventors: Michael Goeth, Martin Leuterer
  • Patent number: 11768484
    Abstract: A cooling controller receives, from one or more sensors, wafer information associated with a wafer. The cooling controller determines a pattern mask area for the wafer based on the wafer information. The cooling controller determines a cooling time for the wafer based on the pattern mask area. The cooling controller causes a cooling plate to cool the wafer for a time duration equal to the cooling time. Determining the cooling time for a wafer based on a pattern mask area provides stable and consistent wafer temperatures for wafers having different mask and layout properties, which reduces mask overlay variation and increases wafer yield.
    Type: Grant
    Filed: March 31, 2021
    Date of Patent: September 26, 2023
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yung-Yao Lee, Cheng-Kang Hu, Jui-Chun Peng, Hsu-Shui Liu
  • Patent number: 11767927
    Abstract: A solenoid valve having a solenoid body with a solenoid receiving cavity and a flow receiving passage. A solenoid assembly is provided in the solenoid receiving cavity. A valve is provided in the flow receiving passage. An armature extends from the solenoid to the valve. The solenoid valve also includes a control circuitry, a power connection and a bidirectional communications connection. At least one sensor is provided in the flow receiving passage. The at least one sensor is in communication with the control circuitry. When in operation, power is continuously supplied through the power connection and the actuation of the solenoid valve is initiated by the bidirectional communications connection.
    Type: Grant
    Filed: July 7, 2021
    Date of Patent: September 26, 2023
    Assignees: TE CONNECTIVITY SOLUTIONS GMBH, TYCO ELECTRONICS (SHANGHAI) CO. LTD.
    Inventors: Robin Wesson, Pai Rajendra, Tian Xia, Tracy Chen
  • Patent number: 11761079
    Abstract: In some examples, a method for conditioning a wafer processing chamber comprises setting a pressure in the chamber to a predetermined pressure range, setting a temperature of the chamber to a predetermined temperature, and supplying a process gas mixture to a gas distribution device within the chamber. A plasma is struck within the chamber and a condition in the chamber is monitored. Based on a detection of the monitored condition meeting or transgressing a threshold value, a chamber conditioning operation is implemented. The chamber conditioning operation may include depositing a preconditioning film onto an internal surface of the chamber, depositing a silicon oxycarbide (SiCO) film onto the preconditioning film, and depositing a protective layer onto the SiCO film.
    Type: Grant
    Filed: December 6, 2018
    Date of Patent: September 19, 2023
    Assignee: Lam Research Corporation
    Inventors: Fengyuan Lai, Bo Gong, Guangbi Yuan, Chen-Hua Hsu, Bhadri Varadarajan