Abstract: Disclosed is a processing apparatus. The processing apparatus includes: a load port in which a conveyance container accommodating a plurality of semiconductor wafers is placed; a dummy wafer storage area in which a conveyance container accommodating a plurality of dummy wafers is placed; a normal-pressure conveyance room in which a first conveyance arm is installed; an equipment that processes the plurality of semiconductor wafers in a state where the semiconductor wafers and the dummy wafers which are conveyed are placed in slots, respectively; and a controller that controls each component of the processing apparatus. The controller classifies the dummy wafers accommodated in the conveyance container into a plurality of groups, and controls the first conveyance arm to preferentially convey the dummy wafers within one of the classified groups to the equipment and, in replacing the dummy wafers, to perform replacement of the dummy wafers group to group as classified.

Abstract: An RF matching network includes a control circuit configured to instruct at least one EVC to alter its variable capacitance, the alteration of the variable capacitance causing the matching network to achieve a preliminary match state, the preliminary match state having an associated first reflection parameter value at an RF source output; and upon the achievement of the preliminary match state, instruct an RF source to alter a variable RF source frequency, the alteration of the variable RF source frequency causing achievement of a final match state, the final match state having an associated second reflection parameter value at the RF source output; wherein the second reflection parameter value is less than the first reflection parameter value.

Abstract: An inkjet printer for printing on a continuous web of recording media includes a receiver to receive a beam of collimated light transmitted across the surface of a continuous web of recording media supported by a roller. The intensity of the transmitted beam received by the receiver can be used to determine the presence of a defect in the continuous web or in the roller. A controller is configured to reduce the speed of or stop movement of the web through the printer and to retract one or more printheads from a printing location to prevent the defect from damaging the printhead(s).

Abstract: Systems and methods for performing edge ramping are described. A system includes a base RF generator for generating a first RF signal. The first RF signal transitions from one state to another. The transition from one state to another of the first RF signal results in a change in plasma impedance. The system further includes a secondary RF generator for generating a second RF signal. The second RF signal transitions from one state to another to stabilize the change in the plasma impedance. The system includes a controller coupled to the secondary RF generator. The controller is used for providing parameter values to the secondary RF generator to perform edge ramping of the second RF signal when the second RF signal transitions from one state to another.

Abstract: A method is for etching the whole width of a substrate to expose buried features. The method includes etching a face of a substrate across its width to achieve substantially uniform removal of material; illuminating the etched face during the etch process; applying edge detection techniques to light reflected or scattered from the face to detect the appearances of buried features; and modifying the etch in response to the detection of the buried feature. An etching apparatus for etching substrate across its width to expose buried is also disclosed.

Abstract: A method for achieving an etch rate is described. The method includes receiving a calculated variable associated with processing a work piece in a plasma chamber. The method further includes propagating the calculated variable through a model to generate a value of the calculated variable at an output of the model, identifying a calculated processing rate associated with the value, and identifying based on the calculated processing rate a pre-determined processing rate. The method also includes identifying a pre-determined variable to be achieved at the output based on the pre-determined processing rate and identifying a characteristics associated with a real and imaginary portions of the pre-determined variable. The method includes controlling variable circuit components to achieve the characteristics to further achieve the pre-determined variable.

Abstract: A method and system are provided for determining mechanical stress experienced by a film during fabrication thereof on a substrate positioned in a vacuum deposition chamber. The substrate's first surface is disposed to have the film deposited thereon and the substrate's opposing second surface is a specular reflective surface. A portion of the substrate is supported. An optical displacement sensor is positioned in the vacuum deposition chamber in a spaced-apart relationship with respect to a portion of the substrate's second surface. During film deposition on the substrate's first surface, displacement of the portion of the substrate's second surface is measured using the optical displacement sensor. The measured displacement is indicative of a radius of curvature of the substrate, and the radius of curvature is indicative of mechanical stress being experienced by the film.

Abstract: A reactor apparatus includes a first chamber coupled to a first source of vacuum, a monitor chamber isolated from the first chamber and coupled to a second source of vacuum, and at least one removable deposition monitor disposed in the monitor chamber.

Abstract: An apparatus and method is described herein for automatically labeling using labels having a fluid activatable adhesive along the back surface of such label. The apparatus has multiple pallets each being positionable with the lowermost label of a stack of one or more labels to releasably secure by suction the label against the pallet, and multiple pads each being positionable with respect to pallets to receive labels from the pallets and then releasably retain such labels until application onto containers. Fluid for activating adhesive is applied by an applicator onto labels retained upon the pad to change the fluid activatable adhesive along the label's back surface from a non-tacky state to a tacky state just prior to application of the label onto container.

Abstract: An apparatus to support a substrate may include a base, a clamp portion to apply a clamping voltage to the substrate, and a displacement assembly configured to hold the clamp portion and base together in a first operating position, and to move the clamp portion with respect to the base from the first operating position to a second operating position, wherein the clamp portion and base are separate from one another in the second operating position.

Abstract: Systems and methods for using variables based on a state associated with a plasma system. A method includes determining whether the state associated with the plasma system is a first state or a second state and determining a first variable upon determining that the state is the first state. The first variable is determined based on a measurement at a communication medium. The method further includes determining a second variable upon determining that the state is the second state. The second variable is determined based on a measurement at the communication medium. The method includes determining whether the second variable exceeds a first threshold, providing an instruction to reduce power supplied to a plasma chamber upon determining that the second variable exceeds the first threshold, and providing an instruction to increase power supplied to the plasma chamber upon determining that the second variable is below the first threshold.

Abstract: Disclosed is a system and method for constructing fibrous mats. In accordance with the disclosure, continuous lengths of filament are pre-coated with a liquefied thermoplastic. The pre-coated filaments are then laid down upon a belt to form a fibrous mat. The filaments can be laid down in continuous lengths or they can be chopped into discontinuous lengths. The filaments are heated after they have been laid down in order to re-liquefy the thermoplastic and facilitate bonding between intersecting fibers. The disclosure further relates to a system and method for incorporating constructed fibrous mats into a composite building board.

Abstract: The present invention relates to in-line viscometers with no moving parts for monitoring the viscosity of fluids. One embodiment of the invention is a viscometer including a first tube, a second tube, a first flow metering device coupled with the first tube, a second flow metering device coupled with the second tube. The second tube is larger in diameter than the first tube. Another embodiment is directed to a method for maintaining a desired viscosity during a process.

Abstract: A film deposition apparatus includes a turntable to rotate a substrate thereon, a process gas supply part to supply a process gas to form a thin film on the substrate, a heating part to heat the substrate up to a predetermined film deposition temperature to form a thin film, a plasma treatment part to treat the thin film for modification, a heat lamp provided above the turntable and configured to heat the substrate up to a temperature higher than the predetermined film deposition temperature by irradiating the substrate with light in an adsorption wavelength range of the substrate, and a control part to output a control signal so as to repeat a step of depositing the thin film and a step of modifying the thin film by the plasma, and then to stop supplying the process gas and to heat the substrate by the heat lamp.

Abstract: A differential transformer type magnetic sensor includes a board, a drive coil, a first differential coil, and a second differential coil. The drive coil includes a planar coil in which a dimension of a first direction is smaller than that of a second direction, and is disposed on the board. The first differential coil includes a planar coil having the same shape as the drive coil, and is disposed on the board. The second differential coil includes a planar coil having the same shape as the drive coil, and is disposed on the board. The first differential coil and the second differential coil are electrically connected so that a direction of induced current flowing along the first differential coil and a direction of induced current flowing along the second differential coil are opposite to each other.

Abstract: Systems and methods for performing edge ramping are described. A system includes a base RF generator for generating a first RF signal. The first RF signal transitions from one state to another. The transition from one state to another of the first RF signal results in a change in plasma impedance. The system further includes a secondary RF generator for generating a second RF signal. The second RF signal transitions from one state to another to stabilize the change in the plasma impedance. The system includes a controller coupled to the secondary RF generator. The controller is used for providing parameter values to the secondary RF generator to perform edge ramping of the second RF signal when the second RF signal transitions from one state to another.

Abstract: A method of measuring vapor flux density including directing a light beam through a vapor flux to a pixel array sensor and using the pixel array sensor to measure attenuation of the light beam.

Abstract: Disclosed systems and methods for testing a device under test (DUT) with a probe system are selected to test a DUT at a temperature below the dew point of the ambient environment surrounding the probe system. Probe systems include a measurement chamber configured to isolate a cool, dry testing environment and a measurement chamber door configured to selectively isolate the internal volume of the measurement chamber. When a DUT, that is or is included on a substrate, is tested at a low temperature, systems and methods are selected to heat the substrate in a dry environment, at least partially isolated from the measurement chamber, to at least a temperature above the dew point and/or the frost point of the ambient environment.

Abstract: A device for producing a composite fiber material in the form of a fiber band impregnated with a polymer includes a transport device for supplying and for transporting a fiber band along a processing path. To preheat the raw fiber band to a processing temperature a preheating device is used. An application device is used for applying the melted polymer on the whole width onto the surface of the raw fiber band. At least one pressure shearing vibration application device is used to apply pressure to the raw fiber band perpendicular to the band plane after the application of the polymer, where the application of pressure is performed by at least one pressure stamp with the simultaneous shearing vibration of the pressure stamp by a vibration movement component (y) in the band plane and transversely to a band running direction. At least one tempering device is used to keep the raw fiber band within a processing temperature range.

Abstract: A method of controlling a polishing operation includes polishing a substrate, during polishing obtaining a sequence over time of measured spectra from the substrate with an in-situ optical monitoring system, for each measured spectrum from the sequence of measured spectra determining a difference between the measured spectrum and an immediate previous spectrum from the sequence, accumulating the difference for each measured spectrum to generate a total difference, comparing the total difference to a threshold, and detecting a polishing endpoint based on the comparison of the total difference to the threshold.

Abstract: Provided is a test jig including a jig main body having, at an end portion thereof, an insertion part into which an electrode lead is inserted and a fixing member detachably coupled to the insertion part to fix the electrode lead inserted to the insertion part, wherein the insertion part includes insertion faces outwardly extending from both end portions of the jig main body, and coupling faces extending from the insertion faces toward insides of the jig main body and brought into contact with the fixing member, and thus a tensile test is performed on an ultrasonic-welded portion of the electrode lead without an additional cell.

Abstract: Provided is a test jig including a jig main body having, at an end portion thereof, an insertion part into which an electrode lead is inserted and a fixing member detachably coupled to the insertion part to fix the electrode lead inserted to the insertion part, wherein the insertion part includes insertion faces outwardly extending from both end portions of the jig main body, and coupling faces extending from the insertion faces toward insides of the jig main body and brought into contact with the fixing member, and thus a tensile test is performed on an ultrasonic-welded portion of the electrode lead without an additional cell.

Abstract: A mask support frame for supporting a mask is provided. The frame is configured to secure both ends of a mask and apply tension to the mask in a first direction. The frame includes a frame main body defining an opening for exposing a patterned opening area of the mask and an end tensioner coupled to the frame main body, and configured to apply tension to one of both ends of the mask in a second direction crossing the first direction.

Abstract: A substrate treatment apparatus configured such that substrates in a same lot are distributed by a delivery mechanism into a plurality of unit blocks, each unit block including a solution treatment module, an ultraviolet irradiation module, and a substrate carrying mechanism, the apparatus includes: an illuminance detection part that detects an illuminance of a light source of the ultraviolet irradiation module; and a control part that controls, when an illuminance detection value of the ultraviolet irradiation module in one unit block among the plurality of unit blocks becomes a set value or less, the delivery mechanism to stop delivery of a substrate to the one unit block and deliver subsequent substrates to another unit block, and the ultraviolet irradiation module to perform irradiation on substrates which have already been delivered to the one unit block with an irradiation time adjusted to a length according to the illuminance detection value.

Abstract: A spacer for a thermal plate in semiconductor processing includes a base substrate having a top surface defined thereon, a wafer having a bottom surface covering a portion of the base substrate, and a plurality of air passages formed in between the bottom surface of the wafer and the base substrate. The air passages connect the bottom surface of the wafer to an ambience.

Abstract: A gas supply device for intermittently supplying raw material gas into a film forming process unit that includes a raw material container for accommodating a raw material, a carrier gas supply unit for supplying carrier gas to evaporate the raw material, a raw material gas supply path for supplying the raw material gas and the carrier gas into the film forming process unit, a flow rate detector, a flow rate regulating valve, a raw material supply and block unit for supplying and blocking the raw material gas into the film forming process unit, and a control unit for outputting a control signal for intermittently supplying the raw material gas into the film forming process unit.

Abstract: A system for modifying the uniformity pattern of a thin film deposited in a plasma processing chamber includes a single radio-frequency (RF) power source that is coupled to multiple points on the discharge electrode of the plasma processing chamber. Positioning of the multiple coupling points, a power distribution between the multiple coupling points, or a combination of both are selected to at least partially compensate for a consistent non-uniformity pattern of thin films produced by the chamber. The power distribution between the multiple coupling points may be produced by an appropriate RF phase difference between the RF power applied at each of the multiple coupling points.

Abstract: The present invention provides methods for making pnictide compositions, particularly photoactive and/or semiconductive pnictides. In many embodiments, these compositions are in the form of thin films grown on a wide range of suitable substrates to be incorporated into a wide range of microelectronic devices, including photovoltaic devices, photodetectors, light emitting diodes, betavoltaic devices, thermoelectric devices, transistors, other optoelectronic devices, and the like. As an overview, the present invention prepares these compositions from suitable source compounds in which a vapor flux is derived from a source compound in a first processing zone, the vapor flux is treated in a second processing zone distinct from the first processing zone, and then the treated vapor flux, optionally in combination with one or more other ingredients, is used to grow pnictide films on a suitable substrate.

Abstract: Deposition chambers (102) for use with deposition systems (100) include a chamber wall (112) comprising a transparent material. The chamber wall may include an outer metrology window (122) surface extending from and at least partially circumscribed by an outer major surface of the wall, and an inner metrology window surface extending from and at least partially circumscribed by an inner major surface of the wall. The window surfaces may be oriented at angles to the major surfaces. Deposition systems include such chambers. Methods include the formation of such deposition chambers. The depositions systems and chambers may be used to perform in-situ metrology.

Abstract: A curtain coating method including forming a curtain including a coating material. A coated web is formed by coating a moving primary web with the coating material. The curtain and the primary web meet at a contact line. A primary pattern is projected on a material layer. The material layer moves with respect to the contact line. The primary pattern includes a first pointer feature. A first image is captured. The first image includes a first sub-image of the first pointer feature. The position of the first sub-image is in the first image is detected. Distance information is provided by comparing the detected position of the first sub-image with a reference position.

Abstract: A deposition system includes a chamber, an electrical power module, a first detection module and a second detection module. The chamber includes a target, a substrate, and a plasma. The substrate is spaced apart with the target and corresponded to the target. The plasma is generated between the target and the substrate. The target, the substrate and the plasma are in an interior of the chamber. The electrical power module is electrically connected with the target so as to generate a potential difference between the target and the substrate. The first detection module is connected with the interior of the chamber for detecting a composition of the plasma so as to generate a first detection result. The second detection module is connected with the first detection module, and includes an avalanche photodiode detector for analyzing the first detection result so as to generate a second detection result.

Abstract: Systems and methods for supplying a precursor material for an atomic layer deposition (ALD) process are provided. A gas supply provides one or more precursor materials to a deposition chamber. The deposition chamber receives the one or more precursor materials via an input line. A gas circulation system is coupled to an output line of the deposition chamber. The gas circulation system includes a gas composition detection system configured to produce an output signal indicating a composition of a gas exiting the deposition chamber through the output line. The gas circulation system also includes a circulation line configured to transport the gas exiting the deposition chamber to the input line. A controller is coupled to the gas supply. The controller controls the providing of the one or more precursor materials by the gas supply based on the output signal of the gas composition detection system.

Abstract: A dispensing apparatus used to dispense glue on a workpiece includes a first conveyer, a robot arm and a first storing module. The first conveyer has a work region and a storage region. The workpiece is loaded on the first conveyer and transmitted from the work region to the storage region. The robot arm is movably disposed adjacent to the work region and has a dispensing unit and an image identifying unit. The image identifying unit retrieves an image signal of the work region. The robot aim controls the dispensing unit to dispense glue on the workpiece according to the image signal of the work region. The first conveyer transmits the dispensed workpiece from the work region to the storage region. The first storing module, which is disposed adjacent to the storage region, supports the dispensed workpiece and lifts it away from the first conveyer.

Abstract: A method for spreading a resin paste onto a carrier film includes feeding resin paste into a doctor blade unit having a doctor blade, using a feed device that includes a discharge opening through which the resin paste is fed from the feed device into the doctor blade unit, moving a carrier film on a base surface through a doctor blade gap that is formed between the doctor blade and the base surface, and spreading the resin paste onto the carrier film using the doctor blade. The discharge opening is positioned to be immersed into the resin paste that is in the doctor blade unit during operation of a doctor blade apparatus configured to perform the method. A resin mat installation for producing resin mats, particularly of SMC, includes at least one doctor blade apparatus as described above.

Abstract: A plasma processing chamber is provided comprising one or more process gas inlets, one or more exhaust gas outlets, plasma generating hardware configured to generate a process gas plasma in a plasma processing portion of the plasma processing chamber, a wafer processing stage positioned in the plasma processing chamber, and a plasma monitoring probe assembly. The plasma monitoring probe assembly comprises an electrically conductive probe and an insulator sleeve assembly positioned about the electrically conductive probe. The insulator sleeve assembly comprises a plasma-side sleeve portion and a subterranean sleeve portion positioned about distinct portions of a longitudinal probe axis of the electrically conductive probe of the probe assembly.

Abstract: A system for coating a non-rotating pipe work piece including: valves, flow lines, and a mixing block for receiving a first and a second component material each delivered at a pressure, flow measurement devices to measure the flows of the components, a static mixer in fluid communication with the mixing block for receiving the combined components, a C-shaped plate member arranged around the work piece, a drive mechanism to oscillate a partial rotation of the C-shaped member about the work piece with the rate of oscillations controlled by a logic controller, at least two spray guns disposed on the C-shaped member to spray towards the outside surface of the work piece, a drive mechanism to traverse the at least two spray guns longitudinally with the rate of traverse controlled by a logic controller; and the logic controller(s) programmed to control based on a number of input and measured parameters.

Abstract: Provided are a deposition data processing apparatus, an apparatus and a method for manufacturing an organic EL device, which make it possible to check deposition states of constituent layers of each of organic EL elements that are continuously formed on a substrate being conveyed. The deposition data processing apparatus includes a scanning section configured to scan at least two of a plurality of constituent layers that constitute each of the organic EL elements; and a processor configured to accumulate data of the constituent layers scanned by the scanning section at a specific position in a longitudinal direction of the substrate as data of a specific one of the organic EL elements.

Abstract: A multiple degrees of freedom control apparatus for a roll-to-roll printing system.

Abstract: An ion implant apparatus and moveable ion beam current sensor are described. Various examples provide moving the ion beam current sensor during an ion implant process such that a distance between the ion beam current sensor and a substrate is maintained during scanning of the ion beam toward the substrate. The ion beam current sensor is disposed on a moveable support configured to move the ion beam current sensor in a first direction corresponding to the scanning of the ion beam while the substrate is moved in a second direction.

Abstract: A vapor deposition apparatus includes a substrate mount unit on which a substrate is mounted, a plurality of first nozzle units which injects a first raw material in a direction of the substrate mount unit, a plurality of second nozzle units which is alternately disposed with the plurality of first nozzle units and injects a second raw material in the direction of the substrate mount unit, and a plasma module unit which supplies the second raw material to the plurality of second nozzle units. The second raw material is a radical, and the substrate mount unit includes an electrostatic generation part.

Abstract: The present invention relates to a vapor deposition equipment for fabricating CIGS film, in which a Se vapor deposition module, a In/Ga/In linear vapor deposition module and a Cu linear vapor deposition module are integrated in an identical vacuum chamber, used for fabricating the CIGS absorber layers on a flexible solar cell substrate by an automatic manufacturing process in accordance with an unwinding module, a heating device, a heat reducing device, a speed-controlling roller module, a cooling module, and a winding module. Moreover, in the present invention, a film thickness measuring module is used for measures the thickness of the CIGS chalcopyrite crystalline film on the flexible solar cell substrate, and the thickness data of the CIGS chalcopyrite crystalline film would be transmitted to the electromechanical control module for being references of the parameter modulation of following fabricating process, and such way is so-called APC (Advanced Process Control) system.

Abstract: A marking device for marking a truss element of a truss may include a print mechanism arranged to print selected truss information on lumber elements moving on a conveyance system passed the print mechanism, the selected truss information including one of an element identifying truss diagram, a truss plate location, and an intersecting member identifier, a position sensing device configured to sense the position of the lumber relative to the print mechanism, and a computing component, the computing component including a geometry extraction module for extracting the geometry of the element to be marked, an element marking generator for generating print instructions for the selected truss information, a position sensing module for interfacing with the position sensing device to ascertain the position of the lumber element, and a print control module for controlling the print mechanism to print the selected truss information.

Abstract: An apparatus for aligning a dispenser includes a table having a first alignment mark, an alignment plate provided along at least one side of the table, at least one syringe supplying a dispensing material to the alignment plate through a nozzle provided at one end portion thereof to form a second alignment mark, a first image camera provided along a side of the syringe and detecting an image of the second alignment mark, a second image camera detecting an image of the first alignment mark, and an alignment control unit aligning the image of the second alignment mark and a first reference position, and aligning an image of the first alignment mark and a second reference position.

Abstract: A method for producing a plurality of optoelectronic components may include measuring at least one measurement parameter for a first optoelectronic component and a second optoelectronic component, and processing the first optoelectronic component and the second optoelectronic component taking account of the measured measurement parameter value of the first optoelectronic component and the measured measurement parameter value of the second optoelectronic component, such that the optoelectronic properties of the first optoelectronic component and the optoelectronic properties of the second optoelectronic component are changed in a different way toward at least one common predefined optoelectronic target property. The processing of at least one value of a measurement parameter of the optoelectronic properties of the first optoelectronic component or of the optoelectronic properties of the second optoelectronic component toward the optoelectronic target property is formed by means of a compensation element.

Abstract: A single axis application unit for processing a glass workpiece includes a workpiece supporting table, an applicator movable on a traveler shiftable along a first linear axis and a central suction unit that is activateable to grip the glass workpiece that travels along a second linear axis oriented generally perpendicular to the first linear axis. A central suction unit brake selectively secures the central suction unit both rotationally and translationally. The central suction unit is freely moveable both translationally and rotationally when the central suction unit brake is released. A mid-peripheral suction unit is located at a fixed location remote from the central suction unit and selectively activateable to grip the glass workpiece to hold the glass workpiece in a fixed orientation. A corner suction gripper is movable with the applicator parallel to the first linear axis, and is selectively activateable to grip the glass workpiece.

Abstract: A continuous galvanizing line having an annealing furnace of an all radiant tube heating type includes a moisture removal device, dew-point meters, outlets through which the atmospheric gas in the furnace is collected and inlets through which the atmospheric gas from which moisture has been removed with the moisture removal device is fed into the furnace, the dew-point meters and the outlets being placed at least at two points which respectively exist on a side wall in the vicinity of the entrance of the annealing furnace and on a side wall in the vicinity of the furnace top or the furnace bottom at a position where a steel sheet has a maximum end-point temperature, the inlets being placed at two points which respectively exist on side walls on the sides opposite to the sides of the two points for the outlets in the height direction of the furnace, making it possible to steadily control the dew-point of the atmospheric gas to be ?45° C. or lower and ?80° C.

Abstract: To obtain a circulation-type blasting device which enables stable processing for a long period of time even in a case that an elastic abrasive of which abrasive grains are attached to a surface of an elastic core are used. A circulation-type blasting device is provided with a device for recycling an elastic abrasive for recycling all or a part of elastic abrasive used in a cyclic way, and the device for recycling the elastic abrasive is provided with a mixing unit for mixing recovered abrasives recovered from an abrasive recovery unit and abrasive grains introduced from an abrasive grain supplying unit in a gas flow by introducing the abrasive grains and the recovered abrasive in the gas flow to generate a solid-gas biphase flow, and a combining unit composed of at least one bent space to which the solid-gas biphase flow is introduced.

Abstract: Provided is a coating system allowing on-demand preparation and coating of an ink. The coating system (10) includes an ingredient ink supply portion (20), a first pipe (90a), a stirring tank (50) including an ink stirring mechanism (52), a supply regulator portion (30) regulating the respective amounts of ingredient inks supplied to the stirring tank, a controller portion (70) connected to the supply regulator portion through an electric telecommunication line (80), determining a mixing ratio of the ingredient inks, and controlling operation of the supply regulator portion based on the mixing ratio, and a coating device (100) including an ink transport portion (120) connected to the stirring tank and including an ink discharge portion (130).

Abstract: A dispensing apparatus includes a frame having a gantry configured to provide movement in the X axis and Y axis directions, and first and second dispensing units coupled to the gantry and configured to dispense material onto a substrate. The second dispensing unit is coupled to the gantry by an automatic adjustment mechanism. The dispensing apparatus further includes a controller configured to control the operation of the gantry, the first dispenser, the second dispenser, and the automatic adjustment mechanism. The automatic adjustment mechanism is configured to move the second dispenser in the X axis and Y axis directions to manipulate a spacing between the first dispensing unit and the second dispensing. Methods of dispensing material on the substrate are further disclosed.

Abstract: In resin coating, carrying a light-passing member test-coated with a resin on a light-passing member carrying unit; making a light source placed above the light-passing member carrying unit emit excitation light exciting the fluorescent substance; measuring light emission characteristics of the light by irradiating the excitation light emitted from the light source unit from above to the resin coated onto the light-passing member and receiving the light that the resin emits from below the light-passing member by a light emission characteristic measurement unit; obtaining a deviation between a measurement result of the light emission characteristic measurement unit and a prescribed light emission characteristic; and deriving the appropriate resin coating quantity of the resin to be coated onto the LED element as what is used for practical production based on the deviation.