Abstract: The present disclosure provides a substrate processing method and a substrate processing apparatus. The substrate processing method includes: generating an SPM liquid of a first temperature that contains Caro's acid having a separation effect of a resist film formed on the surface of a substrate by mixing heated sulfuric acid with hydrogen peroxide; cooling the SPM liquid to a second temperature at which a reduction effect of film loss occurs; and applying the SPM liquid of the second temperature to the resist film thereby separating the resist film.

Abstract: A washing/drying machine according to the present invention is capable of efficiently performing a drying operation to reduce a drying period. The washing/drying machine includes a tank (11) for storing used water, and the water is circulated from the tank (11) for dehumidification of air circulated through a drying air duct (20). Since the water is circulated from the tank (11), a great amount of water can be supplied as dehumidification water for higher dehumidification efficiency. The amount of the circulated water (the amount of cooling water (dehumidification water)) is reduced in a first half of a drying process, and increased in a second half of the drying process. As a result, the drying efficiency is improved during the drying operation, thereby reducing the drying period.

Abstract: A cleaning apparatus in which a cleaning process is simplified, a time required for the cleaning process is reduced and which has an excellent cleaning effect, and a high pressure cleaner for use therein are provided.

Abstract: Disclosed are methods and apparatus for cleaning heat exchangers and similar vessels by introducing chemical cleaning solutions and/or solvents while maintaining a target temperature range by direct steam injection into the cleaning solution. The steam may be injected directly into the heat exchanger or into a temporary side stream loop for recirculating the cleaning solution or admixed with fluids being injected to the heat exchanger. The disclosed methods are suitable for removing metallic oxides from a heat exchanger under chemically reducing conditions or metallic species such as copper under chemically oxidizing conditions. In order to further enhance the heat transfer efficiency of heating cleaning solvents by direct steam injection, mixing on the secondary side of the heat exchanger can be enhanced by gas sparging or by transferring liquid between heat exchangers when more than one heat exchanger is being cleaned at the same time.

Abstract: A micro-bubble generating device is provided with a micro-bubble generating mechanism and a leading conduit provided with a widening section and a tube part, the widening section and the tube part in communication with each other in the leading conduit. The widening section has a hollow shape which has an axis Z as a central axis, and has base surfaces and a peripheral surface, and communicates with a nozzle of the micro-bubble-generating mechanism via one base surface of the widening section, and communicates with the tube part via the other base surface. The cross section orthogonal to a flow axis Z of the micro-bubbles of the widening section is larger than the cross section orthogonal to the flow axis Z of the tube part.

Abstract: Disclosed are a liquid processing apparatus and a liquid processing method. The liquid processing apparatus includes an ejection port ejecting a first liquid to a wafer, a first liquid supply mechanism supplying sulphuric acid to the ejection port, and a second liquid supply mechanism supplying hydrogen peroxide solution to the ejection port. The first liquid supply mechanism includes a first temperature adjustment mechanism maintaining the first liquid heated to a first temperature, a second temperature adjustment mechanism connected to the first temperature adjustment mechanism, and an ejection line connecting the second temperature adjustment mechanism with the ejection port. The second temperature adjustment mechanism includes a second circulation line and a second heater. The ejection line connects the second circulation line through a switching valve at a location further downstream than the second heater.

Abstract: A water-conducting domestic appliance, in particular a domestic dishwasher, the water-conducting domestic appliance including a washing compartment for receiving items therein that are to be subjected to a handling process by the water-conducting domestic appliance; and a detergent dosing system, the detergent dosing system having a detergent dispenser with a receiving compartment, the receiving compartment for receiving at least one cartridge that is configured to hold at least one detergent. The detergent dosing system is formed from a plurality of housing walls and at least one portion of at least one housing wall of the detergent dosing system has thermal insulation.

Abstract: A substrate processing apparatus supplies a resist stripping solution, formed by mixing sulfuric acid and a hydrogen peroxide solution, to a surface of a substrate. The substrate processing apparatus includes a nozzle that discharges the resist stripping solution toward the substrate, a hydrogen peroxide solution supply passage through which the hydrogen peroxide solution flows toward the nozzle, a plurality of sulfuric acid supply passages respectively connected to a plurality of mixing positions along the hydrogen peroxide solution supply passage that differ in flow passage length to the nozzle, and a sulfuric acid supply passage selecting unit that introduces the sulfuric acid from a sulfuric acid supply source to a sulfuric acid supply passage selected from among the plurality of sulfuric acid supply passages.

Abstract: Disclosed is a substrate processing apparatus for cleaning and drying a substrate such as a semiconductor wafer. This substrate processing apparatus includes a liquid processing unit for processing a substrate by immersing the substrate in stored purified water, a drying unit arranged above the liquid processing unit and configured to dry the substrate, a substrate transfer apparatus for transferring the substrate between the liquid processing unit and drying unit, a fluid supply mechanism for supplying a fluid mixture containing vapor or mist of purified water and vapor or mist of a volatile organic solvent to the drying unit, and a controller for controlling the supply of the fluid mixture.

Abstract: A technique for cleaning a tea concentrate brewing mechanism including heat exchanger tubing and concentrate receptacles employs a safe and effective aqueous chlorine dioxide solution. A chemical dispensing unit employs a venturi body that mixes a sodium chlorite sanitizer with a weak-acid activator injected into the water flow. Preset water-flow rate metering regulation draws in equal amounts of sanitizer and activator. The chemicals are made up in respective concentrations so that the same volume is required of each one. The cleansing solution may be flowed through the brewing mechanism or sprayed on surfaces to be cleaned.

Abstract: To provide a cleaning sterilization apparatus capable of sterilizing an object to be cleaned such as a medical instrument effectively in a short time by generating and using ozone water containing ozone with particle diameters hard to disappear in water, the cleaning sterilization apparatus is provided with cleaning water supply means, ozone water generating means, and squirting means for squirting cleaning water and ozone water toward the object to be cleaned inside a container, where the ozone water generating means is provided with a mixing pump which takes in ozone and water to mix and generates ozone-mixed water, ozone supply means for supplying ozone to the mixing pump, stirring means for colliding the ozone-mixed water from the mixing pump sequentially with a plurality of protrusions with running-water pressure applied inside an enclosed running-water channel with the plurality of protrusions arranged therein, and thereby making ozone contained in the ozone-mixed water finer to generate ozone water, an

Abstract: An assembly structured to clean the head portion of a stethoscope comprising a housing including a path of travel along which the head portion passes during cleaning. A supply of cleaning fluid associated with a dispenser assembly is cooperatively disposed relative to an activating assembly. The activating assembly is operated in moveable engagement with the head portion, and activates the dispenser assembly when engaged by the head portion as it passes along the path of travel. The dispenser assembly delivers the cleaning fluid to an applicator assembly which distributes the cleaning fluid to the head portion and facilitates the cleaning thereof and removal of excess cleaning fluid there from. At least one disinfectant agent is dispersed within or comprises a portion of the housing and is formulated to be destructively effective against pathogenic bacteria, such as in the spore form, which is generally not affected by the cleaning fluid.

Abstract: In an example embodiment, a device for generating a cleaning foam includes a female housing and a male plug. The plug includes an aperture into which a fluid flows from another component of the cleaning system. The plug includes a premix chamber which receives the fluid from the aperture and into which a gas is injected to form a foam. In an example embodiment, the chamber is a hollow cylinder and the gas is injected into the cylinder through channels which are tangential to the cylinder. The plug also includes a solid cylinder with a continuous helical indentation on the outside of the solid cylinder. When the male plug is inserted into the female housing, the continuous helical indentation and the inner surface of the housing form a helical channel through which the foam flows and is further mixed on its way back into the cleaning system.

Abstract: The present invention concerns an improved apparatus for cleaning the interior of a liquid handling probe to reduce the amount time and the volume of wash fluid required to clean the probe and minimize carryover of material between different samples. In addition to the probe, the apparatus includes one or more wash fluid reservoirs, a compressed gas supply, one or more pumps, two or more valve-controlled probe lines and a controller for opening and closing the valves and actuating the pump(s) at desired time intervals. The invention further concerns a method of cleaning a liquid handling probe using the claimed apparatus and comprising sequential steps of pumping wash fluid and compressed gas through the probe.

Abstract: Conduit can connect a beverage line in fluid communication with a supply of first fluid. A pump operates to allow a second fluid to enter the conduit in a predetermined proportion relative to the first fluid. A primary first fluid control means and a secondary first fluid control means are selectively and independently movable between respective open positions in which the first fluid can flow into the conduit and respective closed positions in which flow of the first fluid into the conduit is substantially prevented. In use, the primary first fluid control means is in the open position, and the secondary first fluid control means selectively alternates between the open position and the closed position so as to create a pulsed secondary flow of the first fluid into the conduit for enhanced cleaning.

Abstract: Disclosed is a substrate processing apparatus for cleaning and drying a substrate such as a semiconductor wafer. This substrate processing apparatus includes a liquid processing unit for processing a substrate by immersing the substrate in stored purified water, a drying unit arranged above the liquid processing unit and configured to dry the substrate, a substrate transfer apparatus for transferring the substrate between the liquid processing unit and drying unit, a fluid supply mechanism for supplying a fluid mixture containing vapor or mist of purified water and vapor or mist of a volatile organic solvent to the drying unit, and a controller for controlling the supply of the fluid mixture.

Abstract: A system for controlling and monitoring the chemical usage in a car wash systems that form an aqueous cleaning solution by diluting a cleaning chemical concentrate in a process water stream to form. Level sensors are mounted to the bulk containers containing the chemical concentrate to measure and track the usage of the chemical concentrates. The usage data is collected and used to adjust flow rate controllers controlling the dilution of the concentrate into the process water stream. The system can be integrated into continuous processes where the aqueous cleaning solution is dispensed immediately after production and batch processes where the cleaning solution is stored temporarily before being dispensed onto a vehicle.

Abstract: A surface treating device includes a member adapted for engaging a surface to be treated and a driver operatively associated with the member. The driver is adapted for imparting a linear reciprocating motion to the member, wherein the member engages the surface in a manner substantially perpendicular to the surface to be treated. The surface treating device further includes a dispenser for delivering a fluid drawn from a discrete fluid source to the surface being treated by the member.

Abstract: A method and apparatus provides for dispensing a liquid concentrate. The source pressure of a liquid diluent is changed by a boost pump (52) to bring the pressure of the diluent to an elevated pressure. The diluent then enters an aspirator assembly (10) wherein the concentrate and diluent are mixed to form a use solution. The dynamic pressure of the diluent entering the aspirator assembly (10) is sufficient so that the amount of concentrate delivered over time is more constant.

Abstract: A chemical concentration controller and recorder is disclosed for controlling and recording chemical concentrations in a cleaning system. The invention allows a user to control the concentration of two or more chemicals in the cleaning system simultaneously using either concentration-based feed or timed feed. The invention records and archives chemical concentration data from sensors in the cleaning system tanks or the cleaning system fluid conduits during operation of the cleaning system. The data may then be downloaded by a user and analyzed for efficiency and cost control purposes. For example, the data may indicate the overfeeding of chemicals to the cleaning system or leaking valves in the cleaning system.

Abstract: A substrate treatment method including the steps of: generating droplets of a treatment liquid by mixing the treatment liquid with a gas; and causing the treatment liquid droplets generated in the liquid droplet generating step to impinge on a surface of a substrate being treated. The treatment liquid droplets have a volume median diameter of 5 ?m to 40 ?m.

Abstract: An apparatus and method are disclosed in which a semiconductor substrate having a surface containing contaminants is cleaned or otherwise subjected to chemical treatment using a foam. The semiconductor wafer is supported either on a stiff support (or a layer of foam) and foam is provided on the opposite surface of the semiconductor wafer while the semiconductor wafer is supported. The foam contacting the semiconductor wafer is pressurized using a form to produce a jammed foam. Relative movement between the form and the semiconductor wafer, such as oscillation parallel and/or perpendicular to the top surface of the semiconductor wafer, is then induced while the jammed foam is in contact with the semiconductor wafer to remove the undesired contaminants and/or otherwise chemically treat the surface of the semiconductor wafer using the foam.

Abstract: A mixing valve assembly 42 is communicated with a dedicated tank 51D, storing therein a compatibilizer D, via an inlet valve 43 and is also communicated with dedicated tanks 51A-51C via three injection valves, the tanks storing therein auxiliaries A-C respectively. A chemical formulation is prepared by selectively injecting any one(s) of four chemical agents into the mixing valve assembly 42 by way of on-off control of the inlet valve 43 and the injection valves and blending together the injected chemical agents. Then, the chemical formulation is pumped into SCF by a high-pressure pump 45 such that the SCF and the chemical formulation are mixed together to form a process fluid. Thus, the number of components of a high-pressure portion can be reduced to achieve a cost reduction of an apparatus. Furthermore, a pipe line for pumping the chemical agents is simplified.

Abstract: A portable surface cleaning apparatus has a first tank connected to the housing and with a body of a liquid protectant composition therein, a second tank mounted to the housing with a body of water therein, and a fluid delivery system with an inlet in fluid communication with each of the first and second tanks and an outlet in fluid communication with a spray nozzle for spraying a mixture of the liquid protectant and water onto a surface.

Abstract: A surface cleaning apparatus comprises a fluid delivery system including supplies of first and second fluids and a dispenser for distributing at least one of the fluids to the surface to be cleaned. The fluid delivery system can further include a mixing manifold that mixes the first and second fluids at different concentrations.

Abstract: A drip tray sanitizing system includes a pump connectable to a sanitizer solution container and a valve connectable to a diluent source. A spray manifold disposed in the drip tray receives a mixture of the two streams and sprays the mixture into the drip tray in a prescribed routine to produce a sanitizing or cleansing effect. Methods for using the drip tray sanitizing system include manual, semi-automatic, and automatic sanitizing, as well as manual and automatic rinsing. The semi-automatic and automatic sanitizing routines require the use of a controller. Use of this apparatus in a product dispenser may widen the range of products and product concentrates available for use with a product dispenser.

Abstract: A reaction vessel for entraining ozone gas in an aqueous ozone solution for an industrial cleaning system is described. The reaction vessel includes a conical-shaped surface having two or more edges. The conical-shaped surface defines a generally hollow interior, and the two or more edges are in contact with the generally hollow interior. An inlet port is in fluidic communication with a supply of an aqueous ozone solution to supply the aqueous ozone solution to the conical-shaped surface. Nozzles are in fluidic communication with a supply of water, and the nozzles direct the water under pressure at the conical-shaped surface, and the water mixes with the aqueous ozone solution from the inlet port. An outlet is in fluidic communication with the industrial cleaning system. The reaction vessel may receive the aqueous ozone solution from an injector.

Abstract: The present invention is directed to a device for receiving and holding a plurality of unit doses of a detergent composition and/or additive and for individually dispensing said unit doses into an automatic dishwashing machine over a plurality of washing cycles, wherein the device comprises (i) a housing adapted to receive said plurality of unit doses each separately contained in a package or compartment thereof, (ii) means for opening said package or compartment or for at least partly ejecting said unit dose therefrom; and (iii) means to allow access of water or wash liquor to said unit doses contained in the opened package or compartment or ejected therefrom within a controlled time period after opening thereof to allow dissolution of the unit dose into the water or wash liquor of the machine, as well as to a blister pack for use therewith.

Abstract: One embodiment of the present invention includes an apparatus for washing a product with a fluid. The tank may receive a plurality of product, such as fruits and vegetables, into the fluid and be configured to receive a moving conveyor, having a first end, a second end, a first section, and a second section. The conveyor may have a plurality of protruding panels being structured and arranged on the conveyor to push the product through the fluid in the tank and to lift the product from the fluid in the tank to the second end of the conveyor. At least one first nozzle may be positioned substantially above the conveyor and configured to deliver the fluid onto the product as the product is pushed by the plurality of panels. The fluid delivered from the at least one first nozzle may rotate the product in the fluid in the tank.

Abstract: A chemical supply system comprises, as principal elements, a chemical storage tank in which a liquid chemical for cleaning is stored in the state of its formulated concentrate, a chemical supply apparatus connected to the chemical storage tank for positively performing chemical supply, a piping system connected to the chemical supply apparatus to form a supply flow passage that is a passage for ultrapure water which the liquid chemical is to be mixed with, a pair of discharge nozzles disposed at end portions of the piping system so as to oppose surfaces of a wafer set in a cleaning chamber to supply a cleaning liquid onto the surfaces. Thereby, remarkable miniaturization/simplification of a cleaning liquid supply system including chemical tanks is intended, it is made possible easily and rapidly to compound and supply a cleaning liquid at an accurate chemical concentration, and particles or the like being generated and mixing in a cleaning liquid, are suppressed to the extremity.

Abstract: A wafer drying method includes submerging a wafer in a cleaning solution in a dry chamber. An organic liquid vapor from an organic liquid is supplied into the dry chamber at a first volumetric supply rate to form an organic liquid layer on a surface of the cleaning solution, the organic liquid layer having at least a prescribed concentration of the organic liquid. The organic liquid vapor is supplied into the dry chamber at a second volumetric supply rate that is lower than the first volumetric supply rate. During and/or following the supplying of the organic liquid vapor into the dry chamber, at least a portion of the wafer is removed from the cleaning solution through the organic liquid layer.

Abstract: An apparatus for selective eductive dispensing of multiple chemical fluids from separate fluid containers includes a motive fluid inlet; an eductor in fluid communication with said motive fluid inlet; a selector switch defining at least one inlet and an outlet therein, said inlet and outlet in fluid communication with one another and said outlet in fluid communication with said eductor and wherein said selector switch inlet is in selective fluid communication with said fluid containers depending on the position of the selector switch; and a valve located between said motive fluid inlet and said eductor, said valve selectively opened and closed by movement of said selector switch.

Abstract: A cleaning device with a toggle serves for increasing ozone dissolution in water for cleaning vegetables and fruits. The cleaning device is placed in a washing barrel. The cleaning device comprises a toggle being a circular body which is installed with at least one water circulation hole; and an air-stone disk formed by a bottom disk and a plurality of air stones; a lateral side of the bottom disk being connected to an air inlet tube for inputting air into the air-stone disk for diffusing airs. An upper periphery of the bottom disk is installed with a combining recess for combing the toggle. The washing barrel is a hollow barrel for receiving washing barrel therein; and a top of the washing barrel is installed with a cover.

Abstract: An automotive wheel washer comprising a circular conduit having a diameter of approximately 12 to 20 inches and further provided with a plurality of circumferentially spaced nozzles which direct cleaning fluid and chemicals laterally of the wheel washer and toward the adjacent wheel in an inwardly converging fashion. An additional 360° center nozzle produces an outwardly diverging spray pattern which, in combination with the plurality of spaced outer nozzles, is effective to cause direct application of cleaning chemicals to all surfaces of a wheel and reduce the shadowing effect caused by intricate wheel structure patterns. Foaming is created by a porous material in a foaming chamber serving as a common inlet to all nozzles and further having a high pressure air inlet. The circular conduit may be made of plastic or stainless steel or any of a number of essentially equivalent materials.

Abstract: Disclosed is a method and apparatus for treating a substrate with a reaction solvent formed of supercritical ozone in a feed phase. The feed phase can be aqueous, e.g., formed of heated, deionized water, nonaqueous, e.g., formed of a dense fluid, such as supercritical carbon dioxide, liquid carbon dioxide, supercritical nitrogen or combinations the dense fluids or the feed phase can be a mixture of aqueous and nonaqueous phases.

Abstract: A process for efficiently preparing fine zeolite particles comprising synthesizing zeolite in the presence of an alkaline earth metal-containing compound and/or with controlling the preparation process of zeolite, thereby giving fine zeolite particles being composed of crystalline aluminosilicate, the fine zeolite particles having a fine average primary particle size, being excellent in the cationic exchange properties and the oil-absorbing ability, having a fine average aggregate particle size, and being excellent in the dispersibility; fine zeolite particles obtainable by the above process; and a detergent composition comprising the fine zeolite particles, the detergent composition being excellent in the detergency.

Abstract: A method of and apparatus for mixing chemicals in a single wafer process. According to the present invention a chemical is fed into a valve system having a tube of a known volume. The chemical is fed into the valve system to fill the tube with a chemical to generate a measured amount of the chemical. The measured amount of chemical is then used in a single wafer process.

Abstract: A chemical supply system comprises, as principal elements, a chemical storage tank in which a liquid chemical for cleaning is stored in the state of its formulated concentrate, a chemical supply apparatus connected to the chemical storage tank for positively performing chemical supply, a piping system connected to the chemical supply apparatus to form a supply flow passage that is a passage for ultrapure water which the liquid chemical is to be mixed with, a pair of discharge nozzles disposed at end portions of the piping system so as to oppose surfaces of a wafer set in a cleaning chamber to supply a cleaning liquid onto the surfaces. Thereby, remarkable miniaturization/simplification of a cleaning liquid supply system including chemical tanks is intended, it is made possible easily and rapidly to compound and supply a cleaning liquid at an accurate chemical concentration, and particles or the like being generated and mixing in a cleaning liquid, are suppressed to the extremity.

Abstract: A cleaning device for a hair removing apparatus such as a dry shaver has a basin that receives a shaver head and is supplied with a cleaning liquid for cleaning the head. A single pump is utilized for supplying the liquid from a tank to the basin. The tank is hermetically sealed and is selectively open to the atmosphere by way of an air valve. The valve and the pump are actuated in a controlled manner to selectively give a supply mode for supplying the liquid to the basin from the tank and a recovery mode for recovering the liquid from the basin to the tank.

Abstract: A manual carwash nozzle structure includes a grip body, a barrel member, and a spray nozzle. The barrel member is formed of a connection body, an adjustment valve, and a detergent container. The connection body is provided with a water inlet in communication with a hose connector of the grip body, and a water outlet in communication with the water inlet and the spray nozzle. A bypass is jointly provided by the connection body and the adjustment valve, so as to allow a portion of incoming water in the water inlet to enter the detergent container in which a water-detergent mixture is formed. The mixture is let out of the container into the water outlet via the bypass.

Abstract: Microelectronic substrate processing systems include a microelectronic substrate processing chamber that is configured to contain therein at least one microelectronic substrate. A carbon dioxide supply system is configured to supply densified carbon dioxide to the microelectronic substrate processing chamber. A detergent supply system is configured to supply detergent to the microelectronic substrate processing chamber.

Abstract: The present invention relates to a spray gun generally employed with a multi-functional surface cleaning machine having a fluid tank, a pump, a dispensing device, and at least one receptacle for holding concentrated cleaning chemicals. The dispensing device, or spray gun, of one embodiment of the present invention include a curved lance wand, a trigger mechanism, and a valve that provides selective alteration of fluid flow and pressure.

Abstract: The substrate processing apparatus is provided with a gas-liquid mixing nozzle for generating a gas-liquid mixture by mixing a liquid and a pressurized gas, to discharge the gas-liquid mixture to a substrate at high speeds. The mixture process is conducted in an open space out of the nozzle, and change in the supply pressure of the gas does not affect the supply of the liquid. The reaction products which having been generated on the substrate in etching process is removed at high speeds with the flow of the gas-liquid mixture, whereby the quality of the process is improved.

Abstract: A spray caddy (10) for storing and transporting chemicals and cleaning accessories and method of dispensing diluted liquid chemicals with improved efficiency. The spray caddy (10) comprises a container (11) and an elongate rigid tubular handle assembly (12) that extends through a first hole (32) and a second hole (34) in container (11). Hot (>180. degree. F.

Abstract: The present invention relates to a multi-functional surface cleaning machine having a fluid tank, a pump, and at least one receptacle for holding concentrated cleaning chemicals. The receptacle(s) are in fluid communication with an operator controllable selector. The selector, either alone or in combination with a metering valve, may control which chemical(s) and the amount of such chemical(s) that will be allowed to flow to an inlet of a multi-inlet mixing member. A second input to the mixing member is a fluid to be stored within the fluid tank. The fluid and chemical which may be supplied to the mixing member may be mixed within the mixing member to create a cleaning solution, which may be supplied to any number of dispensing devices. One such device could be a spray gun for dispensing pressurized cleaning solutions onto a surface to be cleaned.

Abstract: The present invention relates to a multi-functional surface cleaning machine having a fluid tank, a primary fluid pump, a secondary priming pump, and at least one receptacle for holding concentrated cleaning chemicals. The receptacle(s) are in fluid communication with an operator controllable selector. The selector, either alone or in combination with a metering valve, may control which chemical(s) and the amount of such chemical(s) that will be allowed to flow to an inlet of a multi-inlet mixing member. A second input to the mixing member is a fluid to be stored within the fluid tank. The fluid and chemical which may be supplied to the mixing member may be mixed within the mixing member to create a cleaning solution, which may be supplied to any number of dispensing devices. One such device may be a spray gun for dispensing pressurized cleaning solutions onto a surface to be cleaned.

Abstract: Resists can be removed while metal contamination of wafers, etc. and generation of particles, and growth of oxide films are suppressed. An ozone gas feed system 40 for feeding ozone gas 2 into a processing vessel 10 holding wafers W, and a steam feed means 30 for feeding steam 1 into the processing vessel 10 are provided. An on-off valve 49 inserted in the ozone gas feed pipe 42, an on-off valve 36 inserted in the steam feed pipe 34 and a switch 48 and an on-off valve 49 of ozone gas generator 41 are connected to CPU 100 which is control means and are controlled by the CPU 100. Ozone gas 2 is fed into the processing vessel 10 to pressurize the atmosphere surrounding the wafers W, and then steam 1 is fed into the processing vessel 10 while ozone gas 2 is fed into the processing vessel 10, whereby a resist of the wafers W can be removed with the steam 1 and the ozone 2 while metal corrosion, etc. can be prevented.

Abstract: The substrate processing apparatus is provided with a gas-liquid mixing nozzle for generating a process liquid mist by mixing a liquid and a pressurized gas, to discharge the process liquid mist to a substrate at high speeds. The liquid may be remover liquid, intermediate rinse liquid or deionized water. The reaction products which having been generated on the substrate in etching process is removed at high speeds with the flow of the mist, whereby the quality of the process is improved.

Abstract: Apparatus for supplying a car wash installation with chemical additives which are admixed with the wash water, wherein at least one additive is poured into a cartridge in highly concentrated form. An associated holding device of the car wash receives the cartridge, wherein the additive of the cartridge can be removed continuously, according to need. Several additives are poured into several cartridges in highly concentrated form and each cartridge and each associated holding device differs from the other cartridges and associated holding devices, by a mistake-proof flange-mounting.

Abstract: In the art of wet-cleaning a substrate by etching with a cleaning solution prepared by dissolving hydrofluoric acid as an active component in water, using the process of measuring the concentration of a predetermined component regularly and then replenishing the cleaning solution with a component for correcting the concentration at need on the basis of the result of measurement on the concentration in case of cleaning the substrate with an aqueous solution of ammonium fluoride as the cleaning solution while controlling air in a cleaning draft at an exhaust rate within a predetermined range.