Abstract: Methods and systems are provided for a self-cleaning camera. The system includes a camera including a lens and a housing surrounding the lens. The system includes a shroud coupled to the housing about the lens. The shroud includes at least one anchor point for coupling the shroud to a vehicle. The system also includes a motor coupled to the housing of the camera via a coupling system such that an activation of the motor moves the camera relative to the shroud, and the movement of the camera relative to the shroud assists in cleaning the lens of the camera.

Abstract: Provided herein are a dishwasher comprising a washing chamber arranged for holding soiled items to be washed, a filter, and a circulation pump, and methods of operating the same. The washing chamber may be arranged such that, when the flow of washing liquid passes through the washing chamber, soil is released from the items to be washed and caught in the flow. The filter may be such arranged that, when the flow of washing liquid with soil passes through the filter, soil is separated from the flow of washing liquid and caught at the filter. The dishwasher may further include a soil trap, which is located separate from the circulation flow, and a soil removing unit including a transport unit for transport of the soil caught at the filter into the soil trap.

Abstract: A desmear module for a horizontal galvanic or wet-chemical process line for metal, in particular copper, deposition on a substrate to be treated for a removal of precipitates comprising a desmear container connectable to a desmear unit, a pump and at least a first liquid connection element for connecting said pump with the desmear unit, wherein said pump is in conjunction with said desmear unit by said at least first liquid connection element; and wherein a treatment liquid level is provided inside the desmear module, which is above an intake area of the pump; wherein the desmear module further comprises at least a first liquid area, at least an adjacent second liquid area comprising the intake area of the pump, and at least a first separating element arranged between said at least first liquid area and said at least second liquid area.

Abstract: A detergent reservoir reserves detergent for cleaning of a sample probe and includes a cleaning liquid supply port, a detergent supply port, and a waste liquid port When a predetermined condition for execution of cleaning of the detergent reservoir is not satisfied, and a remaining amount of the detergent reserved in the detergent reservoir is a predetermined amount or less, a pump is operated to increase the remaining amount of the detergent to the predetermined amount; and when the predetermined condition for execution of cleaning of the detergent reservoir is satisfied, a solenoid valve is opened to dispose of the detergent in the detergent reservoir. Then, after the detergent in the detergent reservoir is disposed of, the solenoid valve is closed, and a pump is operated to supply cleaning liquid to the detergent reservoir.

Abstract: A method of laser drilling a hole comprising providing a laser source at a first side of a component to laser drill a hole through the component. A light source is positioned in the path of the laser beam at the opposite side of the component. A camera is provided at the first side of the component. The camera is positioned such that it has a line of sight view of the light source through the laser drilled hole. The laser drilled hole in the component is viewed using the light provided by the light source at the opposite side of the component. The parameters of the laser drilled hole are measured using the view of the laser drilled hole provided by the camera and a flow of gas is provided over the surface of the light source to protect the light source.

Abstract: A device for spraying a liquid for use in dye penetration inspection into an inner cavity of a workpiece for making a turbine engine part, the device including a workpiece support, a manifold for spraying the inspection liquid into the inner cavity, a manifold for sucking up and discharging the sprayed inspection liquid, and a mechanism for tilting at least a portion of the support from a substantially horizontal position to an inclined position in which the workpiece is inclined so that the inspection liquid sprayed into the cavity flows under gravity to a zone from which it is sucked up.

Abstract: A slurry feed system includes a valve manifold, a mixing tank, a slurry feed pump, a surface tension meter and suction piping, discharge piping as well as slurry return piping. The valve manifold includes inlet piping, outlet piping fluidly coupled to the inlet piping, and a slurry discharge header for supplying slurry to CMP stations. The slurry feed pump is connected to the mixing tank by the suction piping. The discharge piping is routed from the slurry feed pump to the inlet piping of the valve manifold. The slurry return piping is routed from the outlet piping of the valve manifold to the mixing tank. The suction piping, the discharge piping, the inlet piping, the outlet piping and the slurry return piping define a first slurry supply loop. The surface tension meter is coupled to the first slurry supply loop.

Abstract: A laundry treatment apparatus includes a cabinet, a drawer with a drawer body and a drawer panel, an accommodation unit in the drawer body and defining a space for receiving washing water, a discharge unit for discharging washing water from the accommodation unit to the outside of the accommodation unit, a water discharge channel for guiding discharged washing water in the discharge unit to the outside of the cabinet, and a residual water discharge unit that provides an alternative path for discharging washing water in the discharge unit to the outside of the cabinet, wherein at least a portion of the residual water discharge unit is exposed to and accessible from the outside of the cabinet based on the drawer body being withdrawn from the cabinet, and wherein the entire residual water discharge unit is covered by the cabinet based on the drawer body being retracted within the cabinet.

Abstract: The present invention is related with a method of cleaning a substrate by ultraviolet rays with adjustable radiation energy, comprising steps of: providing an ultraviolet ray light (10) and a substrate (20) to be cleaned with the ultraviolet rays; locating several shading plates (30) between the ultraviolet ray light (10) and the substrate (20) to be cleaned with the ultraviolet rays; rotating the shading plates (30) to adjust an area of the substrate (20) irradiated with the ultraviolet rays emitted by the ultraviolet ray light (10) and thus to control the radiation energy on the substrate (20) in the unit time; cleaning the substrate (20) with the ultraviolet rays emitted by the ultraviolet ray light (10). With the method, the radiation energy of the ultraviolet rays for cleaning the substrate can be flexibly adjusted. The objectives of efficiently removing the organic matter stick on the surface of the substrate and preventing the static damage to the circuit pattern of the substrate can be achieved.

Abstract: In order to provide a process container for carrying out a cleaning process, a drying process, a deburring process, a coating process and/or a coating removal process on a workpiece in the interior of the process container, comprising a wall delimiting the interior of the process container, which is usable in a maintenance-friendly and flexible manner, it is proposed that the process container comprises at least one medium passage, by means of which a medium is guidable through the wall of the process container, at least two different process elements of different types being adaptable to at least one of the medium passages.

Abstract: After molten metal has been poured from a ladle 6 into a converter, metal 6b adhering to the ladle 6 is dropped into the ladle 6 on-line, and molten metal is poured from an electric furnace into the ladle 6 into which the metal 6b has been dropped. As a result, the metal 6b is melted and is recovered as a material.

Abstract: The present invention is generally related to a device and method for sanitizing a medical instrument with ozone, in particular the invention relates to a system, method and a device for sanitizing a continuous positive airway pressure (CPAP) device. The device has an ozone compartment, an ozone operating system and one or more ozone distribution lines that distribute ozone to a continuous positive airway pressure device. The device may further include a heater adapter unit to connect heating systems in CPAP devices while distributing ozone to sanitize the CPAP device in accordance with the present invention.

Abstract: A system for trapping particles in a gas comprising a chamber; an intake for intake of a gas containing at least one particle to be trapped and released, and an outlet for exit of the gas out of the chamber containing at least one particle; a first passage operatively connected to the intake operating to create a flow of a gas containing at least one particle into the chamber, a second passage operatively connected to the outlet for flow of the gas; a third passage operatively connected to a gaseous flow for creating a flow of fluid in a direction substantially opposite to the transfer of gas from the first passage so as to counteract the flow of gas from the first passage; an image sensor for recording an image; and a laser for generating a light beam for forming a photophoretic trap between the first and third passages.

Abstract: A method for conditioning a flexible medical endoscope (10) having internal channels (12), so as to maintain disinfection of said endoscope (10) following processing to a state of high level disinfection, comprises the steps of: (a) connecting the internal channels (12) of the endoscope (10) to connectors (31-34) enabling fluid communication with a reservoir (24) of disinfectant fluid (25); (b) charging the internal channels (12) with disinfectant fluid (25) from the reservoir (24); (c) disconnecting the internal channels (12) from the connectors (31-34); (d) sealing the endoscope (10) in a pouch (56) having a substantially air-tight seal (57) and a valve (55) enabling connection to suction means (53); and (e) connecting and activating the suction means (53) so as substantially to reduce pressure within the pouch (56), thereby partially evacuating the pouch (56).

Abstract: Methods and devices are provided for an agricultural pesticide-free air sterilization machine. In one embodiment, the machine employs a liquid-gas mixing device, an ozone generator, a water inlet; and/or a water outlet. The mixing device may have a water inlet, a water outlet, a feed pump, a jet device, and/or a liquid-gas mixer. Further, the ozone generator utilizes an oxygen generator, an oxygen storage container, and a high voltage discharge chamber. In other embodiments, the feed pump is connected to the water inlet of the jet device via a hose, and the ozone generator is connected to the gas inlet of the jet device via a gas tube.

Abstract: A dishwasher includes a main sump that holds the main wash fluid supply, and a separate sump formed in the bottom wall of the tub away from the main sump. The separate sump holds a concentrated wash fluid supply. The separate sump supplies wash fluid for washing periods in which a highly concentrated chemistry mixture is desired.

Abstract: An apparatus for non-contact cleaning a paint spray tip of a spray gun. The apparatus includes a housing with a top and an opening formed in the top to receive the spray tip. At least one drier nozzle is fluidly connected to a source of compressed air so that discharge from the nozzle impinges upon and dries the spray tip. Similarly, at least one solvent nozzle is also attached to the housing around the opening and discharges solvent on the spray tip when positioned in the housing opening. One or more down flow nozzles are also mounted to the housing to create a downdraft through the housing opening to facilitate cleaning and drying of the spray gun spray tip. A heated fluid also flows through the housing in close proximity to the fluid passageways for the drier nozzle and solvent nozzle in order to heat both the drier nozzle air flow and solvent flow to facilitate cleaning of the spray tip.

Abstract: A fluid transfer system for an oil drilling rig which generally includes a portable housing container which includes a pump, a manifold, an air compressor and a pressure washer. The manifold will generally include three inlets, with a first inlet connected to a drilling rig, a second inlet connected to a first storage tank such as a water tank, and the third inlet connected to a second storage tank such as an invert tank. The pump is connected to the manifold to transfer mixed fluids back out the drilling rig. The air compressor is linked to the manifold flow blowing out the fluid conduits prior to transfer of the container or to prevent spillage. The pressure washer may be used to clean various components at the drilling site. The present invention is fully portable such that it may easily be packed up and transferred between multiple drilling sites for use.

Abstract: Device for collecting paint, lacquer and adhesive residues out of paint, lacquer, and adhesive guns, in particular guns connectable to a hose. The device having a receptacle for collecting the residue, and the receptacle configured in such a way that during an interior rinsing of the guns using a rinsing flow for interior cleaning of the guns with a solvent, the degree of interior cleaning of the guns can be controlled optically by the user of the device. The indicator element for displaying the degree of interior cleaning may be made removable from the device. The device for collecting the residue out of paint, lacquer, and adhesive guns may likewise be used when the guns are connected to a hose.

Abstract: A substrate treatment installation includes an installation chamber and a light source for the exposure of substrates to light. The light source is arranged in the interior of the substrate treatment installation and includes at least one discharge lamp arranged in a housing, which is permeable to light at least in sections and has a vacuum-tight cavity for accommodating the lamp, and also at least one reflector element arranged in spatial proximity to the at least one lamp and having an electrical connection.

Abstract: Disclosed is a supercritical processing apparatus which can suppress the occurrence of pattern collapse, improve the throughput, and prolong a maintenance interval. In the disclosed supercritical processing apparatus to remove a liquid remained on a substrate by a super-critical state processing fluid, a heating unit heats the processing fluid to place the processing fluid into a processing receptacle in a supercritical state, and a cooling mechanism forcibly cools an area capable of transferring the heat to the substrate from the heating unit in order to suppress the liquid from being evaporated from the substrate until the substrate is disposed on a seating unit.

Abstract: A substrate cleaning apparatus capable of removing particles that exist in minute recesses formed on a substrate surface is disclosed. The substrate cleaning apparatus includes a substrate holder configured to hold a substrate; and a two-fluid nozzle configured to deliver a two-fluid jet onto a surface of the substrate. The two-fluid nozzle includes a first jet nozzle configured to emit a first two-fluid jet and a second jet nozzle configured to emit a second two-fluid jet at a velocity higher than a velocity of the first two-fluid jet, and the second jet nozzle surrounds the first jet nozzle.

Abstract: Disclosed is a liquid treatment apparatus including a nozzle positioned below the substrate retained by a substrate retaining unit. The nozzle is capable of ejecting two fluids of a mixture of a liquid and a gas. The nozzle includes a plurality of liquid-ejecting passages for ejecting a liquid and a plurality of gas-ejecting passages for ejecting a gas, and also includes a plurality of liquid-ejecting ports each corresponding to one of the liquid-ejecting passages. The liquid-ejecting ports are arrayed on a horizontal line extending inwardly from a position below a peripheral portion of the substrate. The liquid-ejecting ports are configured to eject the liquid towards the lower surface of the substrate in an ejecting direction, and the ejecting direction is inclined at an inclination angle in a rotating direction of the substrate rotated by rotational driving unit with respect to a plane including the lower surface of the substrate.

Abstract: The assembly (1) comprises an integrated device (2) for dispensing washing agents, comprising a body (2a) intended to be mounted in an opening (G) of a sheet-like wall (F) which delimits the washing chamber (C) of a dishwashing machine (WD) and which has a peripheral formation (2b) which protrudes towards the outside and is intended to abut against the surface of this wall (F) surrounding the opening (G), on the side of this wall (F) which faces the washing chamber (C); and an ozone-generating device (3), with a housing (3a) which has an outlet opening (39) and contains an electric ozone-flow generator (34, 36) suitable for emitting a flow of ozone towards said outlet opening (39), so as to introduce it into the washing chamber (C) of the machine (WD). In the body (A) of the washing-agent dispensing device (2) there is defined an outlet chamber (13) able to communicate, in the condition of use, with the washing chamber (C) and having an inlet passage (45) accessible from the outside.

Abstract: A method for drying a material using an acoustic wave drying including an acoustic resonant chamber that imparts acoustic energy to transiting air received from an airflow source. The acoustic resonant chamber includes a primary air channel having side surfaces connecting an air inlet and an air outlet, the primary air channel having a primary air channel length between the air inlet and the air outlet. One or more secondary closed-end resonant chambers are formed into side surfaces of the primary air channel. An air impingement airstream containing acoustic energy exits the air outlet and impinges on the material.

Abstract: A substrate treatment apparatus is used for treating a major surface of a substrate with a chemical liquid. The substrate treatment apparatus includes: a substrate holding unit which holds the substrate; a chemical liquid supplying unit having a chemical liquid nozzle which supplies the chemical liquid onto the major surface of the substrate held by the substrate holding unit; a heater having an infrared lamp to be located in opposed relation to the major surface of the substrate held by the substrate holding unit to heat the chemical liquid supplied onto the major surface of the substrate by irradiation with infrared radiation emitted from the infrared lamp, the heater having a smaller diameter than the substrate; and a heater moving unit which moves the heater along the major surface of the substrate held by the substrate holding unit.

Abstract: A beverage can cleaning apparatus for cleaning beverage cans before they are dispensed from vending machines. The apparatus has a can holder, a hinged platform, tubes, a first nozzle, a second nozzle and a sensing block that matches the profile of the can top periphery. The sensing block is depressed a compressed distance, the distance being dependent on the orientation of the can, and cleaning fluid or compressed air is selectively directed through the first or second nozzle. Subsequent to air or cleaning fluid being dispensed against the top of the beverage can, the can holder releases the hinged platform sending the beverage can into the vending machine's dispenser.

Abstract: A method for reducing contaminants in a semiconductor device is provided. The method includes cleaning the semiconductor substrate. The cleaning includes rotating the semiconductor substrate and dispersing an aerosol at a predetermined temperature to a surface of the semiconductor substrate or a layer formed on the substrate to be cleaned. The aerosol includes a chemical having a predetermined pressure and a gas having a predetermined flow rate.

Abstract: A substrate cleaning apparatus may include a substrate support member to support a substrate having a first side and a contaminated second side; a liquid carbon dioxide source; a gaseous carbon dioxide source; and one or more nozzles coupled to the liquid carbon dioxide source and to the gaseous carbon dioxide source, wherein the one or more nozzles are configured to receive liquid carbon dioxide and to discharge a first mixture of solid and gaseous carbon dioxide from the liquid carbon dioxide source to the second side of the substrate and to receive gaseous carbon dioxide and to discharge a second mixture of solid and gaseous carbon dioxide from the gaseous carbon dioxide source to the second side of the substrate. Methods of cleaning a substrate may be performed in the substrate cleaning apparatus.

Abstract: A method of supplying oxygenated water is performed on a water tank, in which oxygenated water is received. The method lets the water tank supply a constant amount of the oxygenated water once, and then supply the water tank with water and pure oxygen to recover the dissolution ratio of oxygen of the oxygenated water in the water tank. The method may supply a constant amount of oxygenated water every time for the user to drink it up once.

Abstract: Improved removal of ion-implanted photoresist in a single wafer front-end wet processing station is achieved by dissolving gaseous ozone into relatively cool inorganic acid, dispensing the acid ozone mixture onto a wafer, and rapidly heating the surface of the wafer to a temperature at least 30° C. higher than the temperature of the acid ozone mixture.

Abstract: By means of the present invention, in dishwashers (1), by means of connecting the ozone generator (6) to the suction line (4) prior to the circulation pump (3), the ozone gas generated by the ozone generator (6) is provided to be sucked through the connection hose (7) with the vacuum effect created by the circulation pump (3), the dissolvability of ozone gas in the washing liquid is increased with the vortex effect of the motor (11) since the washing water-ozone gas mixture flows through the circulation pump (3).

Abstract: A cryogenic cleaning apparatus is disclosed. The cryogenic cleaning apparatus has a source of cryogen, a nozzle coupled to the source of cryogen, the nozzle including a main passage adapted to receive the cryogen, one or more auxiliary gas inlets adapted to supply an auxiliary gas to mix with the cryogen either within the nozzle or at a nozzle exit of the nozzle to produce cryogen droplets, and a heated holder adapted to receive a substrate to be cleaned. Cryogenic cleaning methods adapted to clean substrates are provided, as are numerous other aspects.

Abstract: A substrate cleaning apparatus includes: a substrate holder configured to hold and rotate a substrate; an ultrasonic cleaning unit configured to impart an ultrasonic vibration energy to deaerated pure water and then supply the deaerated pure water onto a surface of the substrate; a pure water spray nozzle configured to spray deaerated pure water onto the surface of the substrate; a chamber surrounding the substrate holder and the pure water spray nozzle; and an inert gas supply line configured to supply an inert gas into the chamber.

Abstract: The present invention provides: a nanofluid generating apparatus that has relatively simple construction, is capable of stably generating nanobubbles, is easy to handle and makes it possible to reduce manufacturing cost; and a cleaning apparatus that uses nanofluid. An apparatus for generating nanofluid containing nanobubbles, wherein the nanobubbles are gas bubbles with diameter less than 1 ?m, comprising: a gas-liquid mixing chamber 7 for mixing gas and liquid; and a pressurization pump 4 and an air intake valve 21 for supplying the pressurized gas and liquid to the gas-liquid mixing chamber, wherein the gas-liquid mixing chamber comprises therein: a turbulence generating means Z having projecting lines 9 and grooves 10, 12, and a conical section 11, for forcibly mixing the supplied gas and liquid by generating turbulence therein; and a nano-outlet 20 for turning the forcibly mixed gas and liquid mixture into nanofluid having nano bubbles and discharging the nanofluid.

Abstract: An endoscope processing apparatus of the invention includes: a cleaning tank which can house an endoscope; a liquid drainage port, a liquid inlet port and a discharge port which are opening portions provided to the cleaning tank; a first-liquid introducing section which introduces a first liquid into a multipurpose conduit; a second-liquid introducing section which introduces a second liquid into the multipurpose conduit; a gas-liquid mixing section which mixes a liquid in the multipurpose conduit with gas, to deliver the mixed fluid to the discharge port; a liquid-feeding section which delivers a liquid in the multipurpose conduit to the gas-liquid mixing section; and an opening/closing section which opens and closes a connection between the multipurpose conduit and the gas-liquid mixing section; and a compressor which delivers the gas to the gas-liquid mixing section.

Abstract: A rinsing liquid (DIW) is discharged from a rinsing liquid discharge port formed in a blocking member to perform rinsing processing to a substrate surface while a nitrogen gas is supplied into a clearance space, and a liquid mixture (IPA+DIW) is discharged from a liquid mixture discharge port formed in the blocking member to replace the rinsing liquid adhering to the substrate surface with the liquid mixture while the nitrogen gas is supplied into the clearance space. Thus, an increase of the dissolved oxygen concentration of the liquid mixture can be suppressed upon replacing the rinsing liquid adhering to the substrate surface with the liquid mixture, which makes it possible to securely prevent from forming an oxide film or generating watermarks on the substrate surface.

Abstract: A method for clearing native oxide is described. A substrate is provided, including an exposed portion whereon a native oxide layer has been formed. A clearing process is performed to the substrate using nitrogen trifluoride (NF3) and ammonia (NH3) as a reactant gas, wherein the volumetric flow rate of NF3 is greater than that of NH3.

Abstract: A control system for multiple sterilization chambers for the sterilization of medical and other instruments interact with a common vacuum pump, steam generator and ozone generator via a common controller. Instead of placing all instruments of one type in one large chamber and running one generic sterilization program followed by another such program, instruments may be grouped by the type of sterilization program needed and the sterilization programs may be run using a single pump and a single ozone generator fed into multiple sterilization chambers controlled by the controller. One smaller and less expensive vacuum pump and ozone generator may be sufficient to sterilize large amounts of medical equipment present in the total assembly of chambers. The controller may run sterilization programs in parallel fully or overlapping partially in time. Control valves governing flow passage of air, steam and ozone in and out of the chambers are also controlled by the controller.

Abstract: The present invention provides a delivery system for providing an atomized treatment agent like a cleaner or lubricant to a specific internal location of a closed mechanical system like an internal combustion engine. The atomized treatment agent is delivered via a flexible, non-rigid conduit to the desired internal location of the engine between, e.g., the ID/OD coupling joint between the air inlet hose and the throttle body. A special conduit support guide, the end of which is inserted through the ID/OD coupling joint, provides the proper geometry for gently configuring the conduit to enter the ID/OD coupling joint without crimping and controlling the directional approach and distance of the conduit free end inside the engine.

Abstract: A quartz window with an interior plenum is operable as a shutter or UV filter in a degas chamber by supplying the plenum with an ozone-containing gas. Pressure in the plenum can be adjusted to block UV light transmission into the degas chamber or adjust transmittance of UV light through the window. When the plenum is evacuated, the plenum allows maximum transmission of UV light into the degas chamber.

Abstract: A cloth treating apparatus is disclosed, including a cabinet having a housing space for housing cloth, a water supply unit for supplying steam to the housing space selectively, and a water spray unit movably provided to one side of the cabinet to be connected to the water supply unit selectively for supplying the steam from the water supply unit to the cloth.

Abstract: A liquid treatment method including: retaining a substrate with a treatment target surface being set as a lower surface, and rotating the substrate; supplying DIW (deionized water) to the lower surface of the substrate, thereby performing a rinsing process to the substrate; and thereafter supplying a mist containing IPA (isopropyl alcohol) and N2 gas, thereby substituting the IPA for the DIW. The supplying of the mist is performed using a nozzle positioned below the substrate, the nozzle comprising a plurality of ejection ports which are arrayed between a position opposing a central portion of the substrate and a position opposing a peripheral portion of the substrate.

Abstract: In order to produce a particularly efficient device for deburring and/or cleaning a work piece that is dipped in a fluid medium comprising a fluid discharge device for producing a high pressure fluid jet, it is proposed that the device should comprise a gas discharge device for the production of a gas flow which at least partially envelops the fluid jet.

Abstract: A nozzle cleaning device is capable of uniformly cleaning a nozzle from a front end of the nozzle to an upper part thereof. The nozzle cleaning device includes a storage tank, a liquid discharging portion and an overflow discharging portion. The storage tank has a cylindrical inner peripheral surface and is configured to store therein a cleaning liquid that cleans a nozzle used in a substrate process. The liquid discharging portion is configured to discharge the cleaning liquid into the storage tank toward a position eccentric with respect to a central axis of the cylindrical inner peripheral surface to store the cleaning liquid within the storage tank and configured to form a vortex flow of the cleaning liquid revolving within the storage tank. The overflow discharging portion is configured to discharge the cleaning liquid that overflows the storage tank.

Abstract: A substrate processing system which enables a minute piece of foreign matter attached to a substrate surface to be detected and are suitable for mass production of substrates. The substrate processing system has a substrate processing apparatus that carries out predetermined processing on a substrate. The substrate processing system comprises a substrate surface processing apparatus having a fluid supply unit that supplies onto a surface of the substrate a fluid containing an altering substance that alters a substance exposed at the surface of the substrate, and a substrate surface inspecting apparatus that inspects the surface of the substrate onto which the fluid has been supplied.

Abstract: The present disclosure provides a substrate processing method and a substrate processing apparatus. The substrate processing method includes: generating an SPM liquid of a first temperature that contains Caro's acid having a separation effect of a resist film formed on the surface of a substrate by mixing heated sulfuric acid with hydrogen peroxide; cooling the SPM liquid to a second temperature at which a reduction effect of film loss occurs; and applying the SPM liquid of the second temperature to the resist film thereby separating the resist film.

Abstract: A cleaning apparatus for a semiconductor wafer includes: a gas jet device including a gas nozzle which jets a first gas onto the surface of a semiconductor wafer to thin the thickness of a stagnant layer on the surface of the semiconductor wafer; and a two-fluid jet device including a two-fluid nozzle which jets droplet mist onto a region where thickness of the stagnant layer of the semiconductor wafer is thinned, the droplet mist being mixed two-fluid of a liquid and a second gas.

Abstract: Electrical household appliance comprising a base (1) for the generation of steam, having a liquid tank (6) mounted removably on a receiving socket (10) and having a steam generator located outside of said tank (6), the steam generator being supplied by gravity by a supply line from the tank (6) and having a steam outlet through which the steam can escape towards a work tool, such as a crease-removing brush, said supply line comprising an inlet orifice located on the receiving socket (10), and said tank (6) comprising a closed enclosure (61) having only one outlet orifice (52) which connects the said inlet orifice when the tank is placed on the receiving socket (10), which appliance is characterized in that said tank (6) connects leaktightly onto said receiving socket (10) and in that said appliance has a vent line admitting air to the outlet orifice (52) of the tank, said vent line having one end connected to the exterior which is higher than the outlet orifice (52) of the tank.

Abstract: A washing/drying machine according to the present invention is capable of efficiently performing a drying operation to reduce a drying period. The washing/drying machine includes a tank (11) for storing used water, and the water is circulated from the tank (11) for dehumidification of air circulated through a drying air duct (20). Since the water is circulated from the tank (11), a great amount of water can be supplied as dehumidification water for higher dehumidification efficiency. The amount of the circulated water (the amount of cooling water (dehumidification water)) is reduced in a first half of a drying process, and increased in a second half of the drying process. As a result, the drying efficiency is improved during the drying operation, thereby reducing the drying period.