Abstract: A quartz window with an interior plenum is operable as a shutter or UV filter in a degas chamber by supplying the plenum with an ozone-containing gas. Pressure in the plenum can be adjusted to block UV light transmission into the degas chamber or adjust transmittance of UV light through the window. When the plenum is evacuated, the plenum allows maximum transmission of UV light into the degas chamber.

Abstract: Disclosed are methods and apparatus for cleaning heat exchangers and similar vessels by introducing chemical cleaning solutions and/or solvents while maintaining a target temperature range by direct steam injection into the cleaning solution. The steam may be injected directly into the heat exchanger or into a temporary side stream loop for recirculating the cleaning solution or admixed with fluids being injected to the heat exchanger. The disclosed methods are suitable for removing metallic oxides from a heat exchanger under chemically reducing conditions or metallic species such as copper under chemically oxidizing conditions. In order to further enhance the heat transfer efficiency of heating cleaning solvents by direct steam injection, mixing on the secondary side of the heat exchanger can be enhanced by gas sparging or by transferring liquid between heat exchangers when more than one heat exchanger is being cleaned at the same time.

Abstract: A micro-bubble generating device is provided with a micro-bubble generating mechanism and a leading conduit provided with a widening section and a tube part, the widening section and the tube part in communication with each other in the leading conduit. The widening section has a hollow shape which has an axis Z as a central axis, and has base surfaces and a peripheral surface, and communicates with a nozzle of the micro-bubble-generating mechanism via one base surface of the widening section, and communicates with the tube part via the other base surface. The cross section orthogonal to a flow axis Z of the micro-bubbles of the widening section is larger than the cross section orthogonal to the flow axis Z of the tube part.

Abstract: A method for drying sludge comprising the following steps: (a) Dry dehydrated sludge to obtain a carrier for drying sludge (6); (b) Transport the carrier for drying sludge (6) and dehydrated sludge to be dried (1) to a stirring and mixing apparatus (2) for stirring and mixing and thereby obtain mixed sludge; (c) Transport the mixed sludge (3) to a drying apparatus (4) for drying; (d) Repeat steps (b) and (c); characterized in that in said step (d) a portion of the mixed sludge (3) obtained from the stirring and mixing apparatus (2) which is in an amount determined by amount of sludge carrier (6) required for drying is extracted and transported to the drying apparatus (4) for drying and the rest of the mixed sludge is discharged as final product (7).

Abstract: The ultrasonic ozone-generating unit in accordance with the present invention has an ozone-generating device, an independent seat, a sink device, an utensil-holding device and a vegetable basket. The utensil-holding device and the vegetable basket are mounted in a receiving space of the independent seat or in a sink of the sink device. An ozone gas generated by the ozone-generating device with a close-type air-pumping device capable of producing powerful ultrasonic carrier-airflow is guided into the receiving space or the sink and dissolved in water to sterilize deodorize and bleach an object to be cleansed.

Abstract: The invention relates to a method for cleaning a vacuum pump embedded in a technical system. Water is provided for the cleaning, and a rotational speed of the vacuum pump is adjusted to a value in a cleaning rotational speed range. A defined amount of cold water and/or warm water is supplied to the vacuum pump and the vacuum pump is rinsed with the water during a predetermined time period. After letting the water escape from the vacuum pump, the vacuum pump is dried by aeration with gas or a gas mixture. The invention also relates to a cleaning system for cleaning the vacuum pump.

Abstract: A sterilizing device is described, for sterilizing items through steam sterilization. The device has a base and a cover that couple to form an enclosed space, with an item mount provided within the enclosed space. A portion of water is provided in the base portion, which can be converted to steam in a microwave to sterilize any items placed on the mount. The device further employs several downward-facing valves to provide for the release of steam and the draining of excess or heated water.

Abstract: A two-fluid nozzle 34 for spraying, toward a processing target object, droplets of a processing solution which are formed by mixing the processing solution discharged from a liquid discharge portion 48 and a gas discharged from a gas discharge opening 52 can uniformly spray the droplets of the processing solution having small diameters. Here, the liquid discharge portion 48 includes a multiple number of liquid discharge openings 47 arranged along a circle inside the gas discharge opening 52, and the multiple number of liquid discharge openings 47 discharge the processing solution in an outward direction of the circle.

Abstract: A dishwasher is provided that allows oxygenating gases, especially ozone, to be effectively used at least for cleaning and disinfecting. An oxygenating gas is added to the rinsing liquor or the crude water and/or the washing container for use in a partial program cycle having a cleaning effect, e.g. the “cleaning” cycle, in order to be able to use the gas at least for cleaning and disinfecting.

Abstract: An apparatus for treating objects with a treatment gas comprises a treatment chamber, a chamber input through which objects enter the treatment chamber, and a chamber output (which may be the same as the chamber input) through which the objects leave the treatment chamber. The treatment chamber encloses the treatment gas, which can be steam. The chamber output and/or the chamber input include an intermediate medium, such as a liquid, through which the objects pass. The intermediate medium prevents escape of the treatment gas from the treatment chamber and the ingress of external gases into the treatment chamber, while facilitating input of the objects to the chamber, and output of the objects from the chamber.

Abstract: A system and method are provided in which a laminar flow of pressurized gas from a curved slit in a chamber is directed across a surface to propel a laminar flow of a liquid, below the laminar flow gas, across the surface to prevent surface contamination or remove contaminants from the surface. In a particular application, the system and method are employed in a self-cleaning dental mirror tool including a dental mirror attached to a handle, wherein the gas is air, the liquid is water, and the surface is the reflective surface of the dental mirror.

Abstract: A steam generation system comprises: an oxygenated water treatment (OWT) sub-system configured to generate water having oxidizing chemistry; a steam generation sub-system configured to convert the water having oxidizing chemistry into steam having oxidizing chemistry; an attemperator or other injection device or devices configured to add an oxygen scavenger to the steam having oxidizing chemistry to generate steam having less oxidizing or reducing chemistry; and a condenser configured to condense the steam having less oxidizing or reducing chemistry into condensed water.

Abstract: A rotary rinsing machine has at least one rinsing unit for rinsing a respective container with a wash mixture fed to the rinsing unit by a first conduit, which is connected to a first header containing a liquid fluid, and is connected to a second conduit for feeding a gaseous fluid from a second header to the first conduit; at least one measuring device being provided to measure the pressure in the first header and/or in the second header and/or in the first conduit and/or in the second conduit.

Abstract: There are provided a two-fluid nozzle for effectively performing a liquid process on a substrate while suppressing a damage on the substrate, and a substrate liquid processing apparatus, a substrate liquid processing method and a storage medium using the two-fluid nozzle. The two-fluid nozzle includes a first liquid discharge hole for discharging a first liquid and a gas discharge hole for discharging a gas, and discharges, toward a target object, a mixed fluid of the first liquid discharged from the first liquid discharge hole and the gas discharged from the gas discharge hole. The mixed fluid is mixed at an outside of the two-fluid nozzle. The two-fluid nozzle further includes a second liquid discharge hole for supplying a second liquid toward an outer periphery of a target spot on the target object or toward an inner side of the outer periphery of the target spot.

Abstract: An endoscope processing apparatus of the invention includes: a cleaning tank which can house an endoscope; a liquid drainage port, a liquid inlet port and a discharge port which are opening portions provided to the cleaning tank; a first-liquid introducing section which introduces a first liquid into a multipurpose conduit; a second-liquid introducing section which introduces a second liquid into the multipurpose conduit; a gas-liquid mixing section which mixes a liquid in the multipurpose conduit with gas, to deliver the mixed fluid to the discharge port; a liquid-feeding section which delivers a liquid in the multipurpose conduit to the gas-liquid mixing section; and an opening/closing section which opens and closes a connection between the multipurpose conduit and the gas-liquid mixing section; and a compressor which delivers the gas to the gas-liquid mixing section.

Abstract: A liquid treatment method including: retaining a substrate with a treatment target surface being set as a lower surface, and rotating the substrate; supplying DIW (deionized water) to the lower surface of the substrate, thereby performing a rinsing process to the substrate; and thereafter supplying a mist containing IPA (isopropyl alcohol) and N2 gas, thereby substituting the IPA for the DIW. The supplying of the mist is performed using a nozzle positioned below the substrate, the nozzle comprising a plurality of ejection ports which are arrayed between a position opposing a central portion of the substrate and a position opposing a peripheral portion of the substrate.

Abstract: A substrate processing system that enables foreign matter adhered to a rear surface or a periphery of a substrate to be completely removed. A substrate processing apparatus performs predetermined processing on the substrate. A substrate cleaning apparatus cleans the substrate at least one of before and after the predetermined processing. A jetting apparatus jets a cleaning substance in two phases of a gas phase and a liquid phase and a high-temperature gas towards the rear surface or the periphery of the substrate.

Abstract: A rinsing liquid (DIW) is discharged from a rinsing liquid discharge port formed in a blocking member to perform rinsing processing to a substrate surface while a nitrogen gas is supplied into a clearance space, and a liquid mixture (IPA+DIW) is discharged from a liquid mixture discharge port formed in the blocking member to replace the rinsing liquid adhering to the substrate surface with the liquid mixture while the nitrogen gas is supplied into the clearance space. Thus, an increase of the dissolved oxygen concentration of the liquid mixture can be suppressed upon replacing the rinsing liquid adhering to the substrate surface with the liquid mixture, which makes it possible to securely prevent from forming an oxide film or generating watermarks on the substrate surface.

Abstract: A reaction vessel for entraining ozone gas in an aqueous ozone solution for an industrial cleaning system is described. The reaction vessel includes a conical-shaped surface having two or more edges. The conical-shaped surface defines a generally hollow interior, and the two or more edges are in contact with the generally hollow interior. An inlet port is in fluidic communication with a supply of an aqueous ozone solution to supply the aqueous ozone solution to the conical-shaped surface. Nozzles are in fluidic communication with a supply of water, and the nozzles direct the water under pressure at the conical-shaped surface, and the water mixes with the aqueous ozone solution from the inlet port. An outlet is in fluidic communication with the industrial cleaning system. The reaction vessel may receive the aqueous ozone solution from an injector.

Abstract: A laparoscopic lens cleaner which is suitable for maintaining the lens of a laparoscope in a clean, dry condition during a laparoscopic surgical procedure is disclosed. An illustrative embodiment of the laparoscopic lens cleaner includes an elongated cleaner sheath having a sheath interior, a fluid conduit provided in the cleaner sheath, a fluid discharge nozzle provided in the sheath interior and communicating with the fluid conduit, a gas conduit provided in the cleaner sheath and a gas discharge nozzle provided in the sheath interior and communicating with the gas conduit.

Abstract: A substrate processing apparatus according to the present invention comprises: a processing part configured to process a substrate; a chemical-liquid storing container configured to store a chemical liquid; a chemical-liquid supply driving part configured to supply the chemical liquid from the chemical-liquid storing container into the processing part; a circulation line configured to circulate the chemical liquid stored in the chemical-liquid storing container; and a mixture generating part provided on the circulation line. An inert-gas supply source is configured to supply an inert gas into the mixture generating part. The mixture generating part is configured to mix the chemical liquid supplied from the chemical-liquid storing container and the inert gas supplied from the inert-gas supply source with each other so as to generate a gas-liquid mixture.

Abstract: A wafer W is held in a horizontal attitude within an airtight container 41 by a vacuum chuck 42 such that small gaps are formed between the wafer W and the inner surfaces of the airtight container 41. A cleaning liquid is supplied toward the center portion of a front surface of the wafer W through a fluid supply port 40 which is an end of a fluid supply path 5, and is discharged through a fluid discharge portion 44 arranged in the bottom portion of the airtight container 41 in a form of a groove running along a circle having its center located on the center axis of the wafer W. The cleaning liquid flows and spreads from the center portion of the wafer W toward the peripheral portion while removing particles adhered to the wafer W, and is discharged through the fluid discharge portion 44. This arrangement allows the particles to be uniformly and reliably removed without rotating the wafer W. The entire cleaning apparatus 4 has a small size.

Abstract: A laparoscopic lens cleaner which is suitable for maintaining the lens of a laparoscope in a clean, dry condition during a laparoscopic surgical procedure is disclosed. An illustrative embodiment of the laparoscopic lens cleaner includes an elongated cleaner sheath having a sheath interior, a fluid conduit provided in the cleaner sheath, a fluid discharge nozzle provided in the sheath interior and communicating with the fluid conduit, a gas conduit provided in the cleaner sheath and a gas discharge nozzle provided in the sheath interior and communicating with the gas conduit.

Abstract: A spray cleaning device having an atomizing unit with at least one gas passage and at least one cleaning fluid passage converging into a atomizing area. The gas flowing though the gas passage and the cleaning fluid flowing through the cleaning fluid passages combine to form a mixture at the atomizing area. The accelerating unit has an acceleration passage for spraying the mixture onto a substrate surface. The gas passages are preferably angled with respect to the cleaning acceleration passage.

Abstract: The substrate cleaning method of and the substrate cleaning apparatus for removing contaminants such as particles adhering to a surface of a substrate attain a high throughput and effectively remove the particles and the like. To clean the back surface Wb of the substrate W, DIW cooled down to a temperature near its freezing point and cooling gas which is at a lower temperature than the freezing point of the DIW are discharged toward the center of the lower surface of the substrate which rotates. When thus cooled DIW flows along the back surface Wb of the substrate W, the particles and the like adhering to the substrate are removed.

Abstract: An object of the present invention is to continuously feed an object to be treated to a high-pressure reactor which treats the object to be treated containing 10 mass % or more of water under high pressure, while preventing backflow of a high-pressure atmosphere from the high-pressure reactor. This is embodied by making a configuration such that the object to be treated is fed to the high-pressure reactor connected to a discharge port of a screw feeder which is provided with a feed unit for the object to be treated and the discharge port on one end side and the other end side respectively and forms a high-pressure atmosphere pressurized to, for example, 2 MPa or higher, while air-tightness between the high-pressure atmosphere and the one end side of the screw feeder is maintained by a sealing action of an accumulation compressed on the other end side of the screw feeder.

Abstract: A dishwasher includes a tub, a steam generator for generating steam, a water supply passage for supplying washing water to the steam generator, a release valve having a steam passage along which the steam generated by the steam generator is supplied to the tub, and a condensed water passage connected to the water supply passage to allow water condensed by the steam to fall to the water supply passage.

Abstract: A dishwasher and a controlling method thereof are provided. The dishwasher includes a tub, a door, a steam supplying unit, a fan, and a passage. The tub stores dishes. The door opens and closes the tub. The steam supplying unit supplies steam into the tub. The fan blows the steam. The passage forming unit is formed to circulate the steam blown by the fan inside the tub, or to discharge the steam to the outside of the tub.

Abstract: A cause of deteriorating the hydrogen termination on the surface of a wafer is found to be water adsorbed on the surface. By exposing the wafer to an inert gas atmosphere containing an H2 gas so as to suppress the oxidation reaction due to the water, it is possible to improve the hydrogen termination on the wafer surface.

Abstract: A water vapor cleaning system includes a vapor-producing chamber in communication with a water source, e.g. a hot water line, of an existing plumbing system. The vapor-producing device includes a vapor exit. The cleaning system includes a nozzle having an inlet, an outlet, and a valve selectively allowing or denying fluid communication between the inlet and outlet. The nozzle includes an actuator for selection between allowing or denying fluid communication. The nozzle is connected to the vapor-producing chamber with tubing. The nozzle also includes a vacuum device for suctioning items or blowing air through the tubing. A selector switch on the nozzle facilitates selection between steaming, vacuuming, blowing, soaping, and rinsing modes. A set of nozzle accessories are included for cleaning various types of surfaces.

Abstract: A dishwashing machine comprising a washing station having a wash water tank, a plurality of wash water dispensing nozzles, a recirculation pump adapted to circulate the wash water from the tank to the nozzles; and a hydraulic filling container communicating with the recirculation pump via a first and a second conduit respectively connected to a delivery conduit and to a suction conduit of the pump itself.

Abstract: System and apparatuses for utilizing in-situ generated hydrogen fluoride (HF) in a cleaning process. An exemplary system includes a cleaning retort operable at a temperature sufficient to promote an in-situ reaction between a liquid or gaseous halogenated feedstock and hydrogen gas to form the HF. The system includes a liquid or gaseous halogenated feedstock source and a hydrogen gas source disposed outside the cleaning retort which, upon reaction generate the HF within the cleaning retort. A HF scrubber, disposed within the cleaning retort, is operable to substantially remove residual HF gas formed by the in-situ reaction. An exemplary apparatus includes a cleaning retort having a first region able to hold parts in need of cleaning and a second region operable as a HF scrubber.

Abstract: A dishwasher and a controlling method thereof are provided. The dishwasher includes a tub, a door, a steam generator, and a dish storage. The tub holds dishes and is opened at one end. The door selectively seals the opened end of the tub. The steam generator is provided outside the tub to generate steam. The steam discharger discharges the steam generated by the steam generator into the tub. The dish storage stores dishes to be sterilized by the steam discharged from the steam discharger.

Abstract: A dishwasher is disclosed, by which efficiency in washing tableware difficult to be washed through water spray can be raised. The present invention includes a cabinet, a washtub provided within the cabinet to wash tableware therein, and a steam supplier enabling either steam or superheated steam to be selectively supplied to the washtub.

Abstract: In an example embodiment, a device for generating a cleaning foam includes a female housing and a male plug. The plug includes an aperture into which a fluid flows from another component of the cleaning system. The plug includes a premix chamber which receives the fluid from the aperture and into which a gas is injected to form a foam. In an example embodiment, the chamber is a hollow cylinder and the gas is injected into the cylinder through channels which are tangential to the cylinder. The plug also includes a solid cylinder with a continuous helical indentation on the outside of the solid cylinder. When the male plug is inserted into the female housing, the continuous helical indentation and the inner surface of the housing form a helical channel through which the foam flows and is further mixed on its way back into the cleaning system.

Abstract: The present invention provides: a nanofluid generating apparatus that has relatively simple construction, is capable of stably generating nanobubbles, is easy to handle and makes it possible to reduce manufacturing cost; and a cleaning apparatus that uses nanofluid. An apparatus for generating nanofluid containing nanobubbles, wherein the nanobubbles are gas bubbles with diameter less than 1 ?m, comprising: a gas-liquid mixing chamber 7 for mixing gas and liquid; and a pressurization pump 4 and an air intake valve 21 for supplying the pressurized gas and liquid to the gas-liquid mixing chamber, wherein the gas-liquid mixing chamber comprises therein: a turbulence generating means Z having projecting lines 9 and grooves 10, 12, and a conical section 11, for forcibly mixing the supplied gas and liquid by generating turbulence therein; and a nano-outlet 20 for turning the forcibly mixed gas and liquid mixture into nanofluid having nano bubbles and discharging the nanofluid.

Abstract: A method for processing a substrate is provided which includes generating a fluid meniscus to process the substrate and applying the fluid meniscus to a surface of the substrate. The method further includes reducing evaporation of fluids from a surface in the substrate processing environment.

Abstract: A cleaning method highly effectively cleans a surface of a semiconductor wafer by removing a dissolution product, produced when a surface of a semiconductor wafer is processed by a developing process that develops an exposed film formed on the semiconductor wafer by wetting the exposed film with a developer, from the surface of the semiconductor wafer. A cleaning liquid is poured through a cleaning liquid pouring nozzle onto a central part of a rotating wafer processed by a developing process to spread the cleaning liquid in a film over the surface of the wafer. Then, the cleaning liquid pouring nozzle is shifted to create a dry area in a central part of the wafer and the wafer is rotated at 1500 rpm to expand the dry area.

Abstract: A substrate treatment method including the steps of: generating droplets of a treatment liquid by mixing the treatment liquid with a gas; and causing the treatment liquid droplets generated in the liquid droplet generating step to impinge on a surface of a substrate being treated. The treatment liquid droplets have a volume median diameter of 5 ?m to 40 ?m.

Abstract: An apparatus for foam-assisted cleaning comprising a closable container with a funnel-shaped working chamber formed between the surface of the semiconductor wafer and the tapered base plate. The apparatus is provided with a fluid supply unit that incorporates a foam generator in the form of conical body with a flat surface on a wider end face of the conical body. This flat surface functions as a deflector for jets of neutral gas ejected onto the deflector and reflected therefrom into the interior of the fluid supply body filled with a foamable liquid. The jets of neutral gas create a zone of reduced pressure that generates gas bubbles which form the foam. The latter is displaced from the foam generator into the working chamber through a Bernoulli nozzle formed by the tip of the conical body and the outlet opening of the foam generator. The foam is formed from de-ionized water, isopropyl alcohol, and, if necessary, a surfactant.

Abstract: An apparatus and method are disclosed in which a semiconductor substrate having a surface containing contaminants is cleaned or otherwise subjected to chemical treatment using a foam. The semiconductor wafer is supported either on a stiff support (or a layer of foam) and foam is provided on the opposite surface of the semiconductor wafer while the semiconductor wafer is supported. The foam contacting the semiconductor wafer is pressurized using a form to produce a jammed foam. Relative movement between the form and the semiconductor wafer, such as oscillation parallel and/or perpendicular to the top surface of the semiconductor wafer, is then induced while the jammed foam is in contact with the semiconductor wafer to remove the undesired contaminants and/or otherwise chemically treat the surface of the semiconductor wafer using the foam.

Abstract: A substrate treatment method including the steps of: generating droplets of a treatment liquid by mixing the treatment liquid with a gas; and causing the treatment liquid droplets generated in the liquid droplet generating step to impinge on a surface of a substrate being treated. The treatment liquid droplets have a volume median diameter of 5 ?m to 40 ?m.

Abstract: The invention relates to a nozzle arrangement for a vehicle washing installation, a vehicle washing installation equipped with this nozzle arrangement, and to a method in which a drying nozzle (1) that can be rotated about a longitudinal axis (7) by a motor and two high-pressure hoses (2a, 2b) parallel to the longitudinal axis (7) are provided with several high-pressure nozzles (13a, 13b) for high-pressure cleaning. The high-pressure hoses (2a, 2b) are supported so that they can rotate about their longitudinal axes (8a, 8b) according to the invention and coupled to the drying nozzle (1) for common adjustment by means of a mechanism (14, 15a, 15b, 16; 17a, 17b, 18a, 18b).

Abstract: The invention is an automatic no contact machine for cleaning and drying tips, air caps, retainers and cups on spray apparatus when changing liquid or when the apparatus will be idle, or to remove build up of paint on applicators that cause spits and drips on surfaces and electrostatic arcing to spray apparatus while containing and recovering cleaning effluents to an environmental standard.

Abstract: Hollow porous fibers containing adhered contaminants are cleaned to remove the contaminants by backflushing a liquid to fill the pores, and adding a flow of gas so as to form a two-phase mixture of gas and bubbles of liquid that can scrub the fibers, loosening the contaminants and allowing them to be flushed from the hollow fibers. The method is particularly useful for cleaning hemodialyzers used for dialysis and hollow fiber modules used in water treatment and separations. The two phase flow method is specifically effective in cleaning piping systems having high length to diameter (l/d) ratios.

Abstract: A substrate processing apparatus includes: a mounting table to have the substrate placed thereon in a process chamber; a first temperature adjusting mechanism temperature-adjusting the substrate placed on the mounting table; a lifter mechanism lifting up the substrate from the mounting table in the process chamber; and a second temperature adjusting mechanism temperature-adjusting the substrate lifted up from the mounting table by the lifter mechanism, wherein the first temperature adjusting mechanism and the second temperature adjusting mechanism temperature-adjust the substrate to different temperatures respectively.

Abstract: A substrate processing apparatus includes: a support member supporting a substrate in a process chamber; a first temperature adjusting member in thermal contact with the support member; and a second temperature adjusting member capable of thermally coming into contact with and separating from the support member, wherein the first temperature adjusting member and the second temperature adjusting member are temperature-adjusted to different temperatures respectively.

Abstract: A soft spray nozzle discharging a cleaning mist is vertically directed and fixed to an arm. A rinse nozzle discharging rinsing deionized water for suppressing obstruction is vertically fixed to the arm at a prescribed distance from the soft spray nozzle. During cleaning, it follows that both nozzles discharge detergents while keeping relative layout relation. Therefore, the discharged cleaning mist and rinsing deionized water do not interfere with each other before reaching the substrate but the used detergents are entirely horizontally splashed and recovered in a cup. Thus, the cleaning mist is prevented from scattering and adhering to the periphery.

Abstract: Pure water dissolving nitrogen gas and containing microbubbles is supplied to a substrate. Since microbubbles are very minute in size and also have the electrostatic property, they can efficiently adsorb particles on the substrate surface or in the pure water. Further, since pure water dissolving nitrogen gas is unlikely to be charged, the pure water itself never carries new particles from each component of the apparatus. These functions allow efficient particle removal from the substrate surface or the liquid.

Abstract: Hollow porous fibers containing adhered contaminants are cleaned to remove the contaminants by backflushing a liquid to fill the pores, and adding a flow of gas so as to form a two-phase mixture of gas and bubbles of liquid that can scrub the fibers, loosening the contaminants and allowing them to be flushed from the hollow fibers. The method is particularly useful for cleaning hemodialyzers used for dialysis and hollow fiber modules used in water treatment and separations. The two phase flow method is specifically effective in cleaning piping systems having high length to diameter (l/d) ratios.