Abstract: The object of the present invention is to provide a cleaning apparatus for a nozzle comprising a brush which can be moved in the vertical direction and the horizontal direction while being rotated.

Abstract: A portable billiard ball polishing device configured for use with a buffing pad comprising a generally hollow body having a closed bottom surface, arcuate sidewalls and an open upper surface. The hollow body sidewalls are segmented to provide lower and upper cavities of varying diameter, to receive a first resilient pad in the lower cavity, and a second resilient pad in the upper cavity of the device, and a sleeve-shaped inner liner configured to the sidewalls of the hollow body.

Abstract: The invention relates to the cleaning of contaminated accelerating or guiding electrodes of ion sources used for ion generation by desorption. A cleaning plate is used that has an outer contour similar to that of a standard sample support plate, and may be equipped with cleaning scrubbers that can be moved out when necessary to contact the electrodes. The scrubbers may include soft covers, and can carry out the cleaning by dry rubbing or with the help of high-boiling solvents for the matrix substances. The moving out of the cleaning scrubbers can be controlled by external light pulses from a laser or video camera spot light. Alternatively, the cleaning plate may be equipped with spray nozzles connected to a reservoir of cleaning fluid which is sprayed onto the electrodes, and the evacuation of the ventilated ion source chamber may be used to initiate the spraying.

Abstract: The present invention is directed to a shower and bath appliance that provides improved cleansing as well as massaging properties. The appliance for cleansing and massaging has a housing with an impeller rotatably mounter within the housing. The housing is adapted to receive water from a shower pipe or other water source. The impeller is rotated by the flow of water from the water source. The motion of impeller rotates one or more brushes mounted on the impeller. In addition, the water flows from the impeller through the brushes as they rotate.

Abstract: An optical connector cleaning device for cleaning a ferrule end surface of an optical or fiberoptic connector is described. The device includes a cleaning rod, a drive mechanism, and a cleaning media, such as a swab, a brush, a pad, or a foam, connected to an end of the cleaning rod and having a thickness past the end of the cleaning rod of at least about 0.125 inches. A mating connector housing the cleaning rod may be provided for connecting with the optical connector. The drive mechanism may be housed in a handheld body or may be mounted on a dummy card connector physically compatible with a slot in a card-cage. The dummy card connector may include an adjustable frame which can be adjusted to modify card size in order for the same dummy card connector to be physically compatible with more than one physical slot configuration.

Abstract: A motor driven and or mounted cleaning attachment manufactured of a rigid material, having no need for adjustment, for the purpose of clearing multiple bolt pitch diameters and lengths. Consist of plates sandwiched and fastened together. Mounting plate manufactured to mount directly to motor housing, or a base being driven by a motor, jack-shaft and pulley or gear driven system. The mounting plate is bored with an indexed pattern of multiple diameter bored through holes. Center working plate is mounted to the mounting plate, and has the same indexed pattern of bored through holes as the mounting plate. Except the index has been partially bored away and exposed to the cleaning wheel bore. The Cleaning wheel rotates within the cleaning wheel bore located in the center working plate. Cover plate is mounted to the center working plate, and has the same indexed pattern of through holes.

Abstract: A method and system for processing a wafer is disclosed. The method includes receiving a wafer having a process side and a backside. The method further includes removing un-wanted particles from the backside of the wafer to prevent gaps from forming between the backside of the wafer and a chucking surface. The method also includes performing a specific processing task on the process side of the wafer after cleaning the backside of the wafer.

Abstract: The present invention is directed to an apparatus, system and method for detecting a user's oral health habits and providing the oral health data over a network for access by a remote user. For example, the user may utilize an oral health apparatus to brush his teeth. During brushing, oral health data may be obtained relating to the user's oral health habits and usage of the oral health apparatus. The oral health data may then be provided over a network to a remote user, such as the user's dental health professional or parent in the case of a young child.

Abstract: A wafer scrubbing unit includes a mounting assembly for a scrubber brush. The mounting assembly has a rotary flow through tube through which cleaning liquid is delivered to the brush. A stationary tube may be mounted in the bore of the rotary tube. Spinning shields mounted on the rotary tube form labyrinth seals to protect a bearing housing from the cleaning liquid. Bearings for rotatably mounting the rotary tube are mounted within the housing.

Abstract: The present invention is directed to a shower and bath appliance that provides improved cleansing as well as massaging properties. The appliance for cleansing and massaging has a housing with an impeller rotatably mounter within the housing. The housing is adapted to receive water from a shower pipe or other water source. The impeller is rotated by the flow of water from the water source. The motion of impeller rotates one or more brushes mounted on the impeller. In addition, the water flows from the impeller through the brushes as they rotate.

Abstract: A portable scrubber and methodology for using the scrubber, the scrubber for scrubbing objects such as tools, garden equipment, metal objects, kitchenware, footwear, sporting equipment, grills, plastic objects, and small household objects, and the like, while avoiding the associated mess and pain of the manual scrubbing process. The scrubber has a bottom carriage, a vertical support extending above the bottom carriage and a top carriage hinged to the vertical support. Flaps between the top ad bottom carriages help to suppress the escape of cleaning fluids from the scrubber. A motor in the bottom carriage drives brushes in each of the top and bottom carriages through a drive system. Components of the drive system include sprockets attached to the brushes and timing belts for driving the sprockets. The drive system also includes a driven sprocket having its axis of rotation corresponding to the axis of the hinge and a water containment system.

Abstract: The present invention is directed to a tool for cleaning an anode in a coating machine. The anode cleaning tool has a rotary brush driven by a driver such as a cordless power drill. The rotary brush and the driver are connected to a support structure and an adapter which allows the tool to be joined to a shaft associated with the coating machine. The tool further includes a light source connected to the support structure for enabling an operator to see an anode as it is being cleaned.

Abstract: Embodiments of an apparatus and method for cleaning the probes of a probe device are disclosed. In an illustrated embodiment, a cleaning apparatus comprises a cleaning member having a cleaning surface and a support member for supporting the cleaning member. An adjustment mechanism is operable to adjust the tilt orientation of the cleaning surface relative to the probe tips to maximize contact between the probe tips and the cleaning surface when the probe tips are rubbed against the cleaning surface to remove debris therefrom. In particular embodiments, the adjustment mechanism comprises one or more adjusting screws and one or more corresponding hold-down screws extending generally co-axially through the adjusting screws.

Abstract: A substrate cleaning apparatus of the present invention includes one sheet roll wound with one end of a polishing sheet that is arranged to be in contact with the surface of a liquid crystal panel, and the other sheet roll for rolling up the polishing sheet from the other end. The substrate cleaning apparatus further includes a rotating unit provided with a motor, a belt, and a rotation shaft for rotating the polishing sheet and the pair of sheet rolls with respect to the liquid crystal panel. Thus, the substrate cleaning apparatus can be provided which is capable of reducing an operation time required for removing foreign matters, enhancing operation efficiency, stably and reliably removing foreign matters, and restraining operation time even if the size of the substrate increases.

Abstract: The paintbrush-cleaning device includes a housing with an open top, a bottom drain and a central space, containing paintbrush-cleaning liquid therein. A pair of rotatable radial brushes brackets the paintbrushes in the central space and are powered by an electric motor connected to the housing. A number of spaced upwardly directed jet nozzles are disposed in the central space and direct streams of cleaning liquid under pressure upwards towards the paintbrushes. An impeller pump may be connected to a manifold in the central space, from which manifold the jet nozzles extend. Two radial brushes may be used, with the members disposed opposite each other adjacent the sides of the top opening. The radial brushes bear a bristle portion comprising cleaning bristles, which is configured in a spiral along the length of the radial wound brush.

Abstract: A wafer cleaning apparatus for cleaning wafers for manufacturing semiconductor devices is provided. The wafer cleaning apparatus includes a chuck for chucking a wafer to be cleaned, means for rotating the wafer chucked by the chuck, a cleaning solution spray nozzle for spraying a cleaning solution toward the top surface of the wafer rotated by the rotating means, at least two brushes installed to be moved horizontally above the wafer with a predetermined distance spaced apart from the top surface of the wafer in a contact state with the sprayed cleaning solution, and brush moving means for selectively moving the respective brushes horizontally above the wafer, wherein distances between the top surface of the wafer and lower ends of the respective brushes are different from each other when the respective brushes clean the wafer as horizontally moving above the wafer.

Abstract: A washing machine includes a washing drum, an openable cover mounted on a top end opening of the washing drum, a laundry mount rotatably disposed in a lower portion of the washing drum and on which an article to be washed is mounted, a motor for rotating the laundry mount, an upper brush disposed in an upper portion of the washing drum for brushing the laundry in accordance with the rotation of the laundry mount, a water supply unit for supplying water to the washing drum, and a water drain unit for draining water from the washing drum. In the washing machine, laundry such as sports shoes and bags made of thick fabrics can be cleanly washed.

Abstract: An apparatus and method for improving traction for mobile robots where traction is a concern. The mobile robot of the invention includes wheels and brushes. The wheels are mounted to the body of the robot. The brush is mounted to the body close to the wheels. When the wheels are rotating, the brush rubs against the wheel to get rid of debris on the tread of the wheel and cleans the wheel so that traction for the robot can be improved. An alternative way to improve traction by reducing slippage utilizes suction cups or wiper elements mounted on the wheel.

Abstract: A substrate cleaning apparatus and method for a liquid crystal display panel capable of removing foreign substances attached to the lower and upper surfaces of a substrate as well as onto the side surface thereof. The apparatus includes upper and lower cleaning modules arranged in such a manner as to contact the upper and lower surfaces of the substrate. Also, a side-cleaning module is arranged at the side surfaces of the substrate.

Abstract: A motorized body scrubber is invented to scrub from the neck to the toes easily, safely and non-strenuously for anyone, especially for disabled users.

Abstract: Tools for brushing an inner surface of a hole are provided including a rotatable shaft, an inlet in fluid communication with a source of pressurized fluid, at least one outlet positioned so as to wet an inner surface of a hole, and a flow path extending between the inlet and the outlet. The tool further includes at least one brush being radially moveable relative to the shaft to an extended position and a retracted position.

Abstract: The present invention provides a system for cleaning and polishing an optical disk. The system comprises a tray having a circular floor and a parameter wall; an armature having at least two circular pads being rotatably coupled to the armature; and a mechanism for rotating the armature parallel to the floor and about a central axis of the wall being perpendicular to the floor. The mechanism rotates the armature in a first direction, which in turn rotates each pad in a second direction to clean and polish the optical disk.

Abstract: The cones used to position poultry carcasses on poultry processing lines must be cleaned frequently. In order to clean the cones, a cone cleaning device is provided. A stainless steel frame holds four rotating cylindrical brushes in position so that the cones can be passed between the brushes. Nozzles spray water on the cones as they pass between the rotating brushes. The brushes are rotated with motors mounted on the frame.

Abstract: Heretofore, a wafer cleaning device used for CMP and others cannot adjust parallelism between a wafer and a roll brush quantitatively and cannot grasp the change of the parallelism.

Abstract: A cleaning device for cleaning individual items of cutlery includes a liquid-proof container having spray nozzles with a supply line within the liquid-proof container through which a cleaning fluid is able to be sprayed, the container having a base with an outlet and an aperture through which an item of cutlery is able to be partially inserted into the container for cleaning. The spray nozzles within the container are, preferably, stationary relative to the item of cutlery being cleaned and directed so that the cleaning fluid strikes the item of cutlery inserted into the container for cleaning with a control device for controlling the supply of the cleaning fluid passing through the supply line to the spray nozzles. There is at least one slot in the top side of the cleaning device, so that the item of cutlery can be stored in close proximity to the liquid-proof container.

Abstract: An apparatus for cleaning a spraying end of a paint sprayer includes a solvent vessel having an opening and containing a solvent. The opening is configured to receive the spraying end of the paint sprayer. A rotatable brush is only partially submerged in the solvent such that the spraying end contacts the brush when inserted into the opening. A motor is interconnected with and provides rotation to the brush. A signal generator is operable to provide an actuation signal that activates the motor such that the brush rotates and cleans paint from the spraying end of the paint gun.

Abstract: In order to remove impurities, especially liquids (5) and/or particles (4) from surfaces of plate-shaped workpieces (2) contaminated or wetted with liquid (5), at least one wiping element (3) is provided which moves with respect to the surface (2a) the wiping element (3) to be cleaned and contacts this surface (2a). The wiping element (3) is cooled down so that the liquid (5) coming into contact with this wiping element (3) and bristles (8) preferably provided thereon assumes a higher viscosity or even solidifies and consequently remains adhered together with the particles (4) contained in the liquid (5) to the wiping element (3) or its bristles (8). This cleaning principle can be assisted and influenced by heating of the surface of workpiece (2) upstream of the wiping element or elements (3) in the feed direction.

Abstract: A footwear cleaning apparatus includes a vertically oriented frame with an upper frame for supporting the user that is standing while cleaning the footwear. The apparatus receives water from a garden hose and provides a control valve for regulating the water flow while the user is standing upright. The water is directed upwardly through a foot platform on the lower frame, and also through a lower brush onto the footwear sole, the resulting splash causing water to wet two side brushes that are oriented to bear upon the sides of the footwear. A scraper assembly is also on the lower frame and provides a horizontal scraping edge and two vertical scraping edges for the sole and sides of the footwear, respectively. After the water is turned off a drain outlet allows the device to be drained.

Abstract: In a scrubber adapted to clean a semiconductor wafer, the torque of a brush rotation motor is monitored while a scrubber brush is in contact with the wafer and is being rotated by the motor. The position of the brush relative to the wafer may be adjusted based on the monitored torque to regulate the pressure applied to the wafer by the brush. Open loop positioning or closed loop control may be employed.

Abstract: The case comprises a housing to receive at least one safety razor and a closing cover movable between a closed and an open position of said housing, and is characterized in that it combines:

Abstract: A method of cleaning a substrate supported on an upper end of a spindle by first positioning a brush at a fixed elevation over the substrate. Next, the spindle is moved upward to bring the substrate into contact with the brush. Thereafter, a cleaning force on the substrate caused by the brush is measured, and the spindle is moved in response to the measured cleaning force on the substrate.

Abstract: A substrate cleaning apparatus comprises a side surface cleaning member and a peripheral edge cleaning member. The side surface cleaning member includes a cylindrical scrub cleaning body having a cylindrical surface and opposite ends. The cylindrical scrub cleaning body is adapted to be rotated about its axis with the cylindrical surface thereof engaged with a side surface of a substrate to be cleaned to effect scrub cleaning of the side surface. The peripheral edge cleaning member is adapted to be engaged with a peripheral edge of the substrate to effect scrub cleaning of the peripheral edge. The peripheral edge cleaning member is attached to one of the opposite ends of the cylindrical scrub cleaning body so as to be rotated along with the cylindrical scrub cleaning body about the axis of the cylindrical scrub cleaning body. The peripheral edge cleaning member comprises a sponge member adapted to be engaged with and scrub the peripheral edge of the substrate.

Abstract: A brush core and method of making a brush core are provided. The brush core is configured to be implemented in substrate preparation systems. The brush core is connected between a first end and a second end of a non-rotating shaft. A motor is contained within the brush core for rotating the brush core around the non-rotating shaft. The first end and the second end are each capable of being adjusted to calibrate and position the brush core. The calibrated position of the brush core can be set to compensate for a skewed substrate, or to achieve a desired pressure application profile over the substrate.

Abstract: A cleaner (10) for cleaning dross off of the surface of ingot-filled-molds (F) moving along a conveyor (C) is disclosed. The cleaner (10) includes a boom (14) pivotally mounted to a base (12), an arm (16) housed at least partially within the boom (14) and pivotally mounted thereto, a cutting blade (18) slidably mounted on the arm (16) and a rotatable brush (20) pivotally mounted to a brush arm (132). The cutting blade (18) is driven by a piston and cylinder assembly (112) pivotally coupled between the blade (18) and the arm (16). The arm (16) is pivoted by a piston and cylinder unit (120) coupled between the arm (16) and the boom (14). The brush (20) is pivoted by a piston and cylinder combination (168) coupled between the brush (20) and the brush arm (132).

Abstract: The present invention 10 discloses a hand-operated golf ball 18 cleaning device comprising a housing 22 having bristles 34 located therein, wherein the bristle ends being configured to form a circular, semi-spherical entrainment groove 35 into which the golf balls 18 to be cleaned are placed for cleaning. Also shown are a hinged 26, securable cover 24 with a central recess for accommodating a shaft member 36, a shaft member 36 having a handle 14 portion on the exterior distal end, a ball entrainment block 30 on the distal end facing the housing, and a means therebetween for rotatably securing the shaft member within the shaft recess of the cover. The entrainment block 30 has two recesses 32 of a diameter similar to that of a golf ball 18 and sized to receive approximately one-third of each ball therein when the cover 24 is closed.

Abstract: A scrubbing assembly for a wafer-cleaning device is provided. The wafer-cleaning device is provided with a base. The scrubbing assembly comprises a scrubber, a cup and an oscillator. The scrubber is disposed on the base in a manner such that it can move between a first position and a second position. The scrubber scrubs a wafer when it locates in the first position. The cup, for receiving DI water, is disposed on the base. The scrubber locates inside the cup and contacts the DI water when it locates in the second position. The oscillator is disposed at the cup, and it vibrates the DI water when the scrubber locates inside the cup and is contact with the DI water.

Abstract: A wafer cleaning apparatus for cleaning wafers for manufacturing semiconductor devices is provided. The wafer cleaning apparatus includes a chuck for chucking a wafer to be cleaned, means for rotating the wafer chucked by the chuck, a cleaning solution spray nozzle for spraying a cleaning solution toward the top surface of the wafer rotated by the rotating means, at least two brushes installed to be moved horizontally above the wafer with a predetermined distance spaced apart from the top surface of the wafer in a contact state with the sprayed cleaning solution, and brush moving means for selectively moving the respective brushes horizontally above the wafer, wherein distances between the top surface of the wafer and lower ends of the respective brushes are different from each other when the respective brushes clean the wafer as horizontally moving above the wafer.

Abstract: This invention provides an ultrasonically driven nail cleaner, where the ultrasonic frequency both loosens hand and nail soil, as well as providing motion to at least a pair of brushes for removing the soil from the user's hands and nails. The moving force for the brushes and the ultrasonic loosening action are enabled by linkages providing straight line bilateral motion for both of the brushes. A rechargeable battery and a battery charger are provided for multiple uses for the structure provided, without the necessity of an AC outlet proximate the user.

Abstract: An apparatus for performing a wafer cleaning method includes providing a plurality of sponge portions mounted on a common body for movement relative to a surface of a wafer to be cleaned, each sponge portion defining a sponge surface positioned to contact the surface of the wafer. A cleaning fluid flow is directed through each of the sponge portions perpendicular to the sponge surface and onto the surface of the wafer to generate a streaming potential across each of the sponge portions. The fluid pressure and pH of the cleaning fluid are adjusted until electrical charges on the sponge portions, the wafer, and contaminant particles on the surface of the wafer are all the same electrical sign.

Abstract: A scrub washing apparatus comprises a spin chuck for holding a substrate to be processed substantially horizontally, a nozzle for supplying a washing liquid to the substrate mounted on the spin chuck, an arm vertically and horizontally movably supported, an output shaft provided at the arm, a sponge brush connected directly or indirectly to the output shaft, for scrubbing the substrate on the spin chuck in contact therewith, a press mechanism moving the sponge brush downward together with the output shaft, for pressing the sponge brush against the substrate on the spin chuck, and a rotation drive mechanism provided above the press mechanism at a position where the rotation drive mechanism is capable of being engaged with the output shaft, for directly rotating the sponge brush by engaging with the output shaft.

Abstract: A device for cleaning a wafer of abrasive agent suspension (slurry) remaining after polishing with brushes and DI water includes an upper gear casing having an upper side with an end, a motor in the upper gear casing, a drive shaft, an upper gear mechanism, and a lower gear casing substantially mirroring the upper gear casing. The lower receiving plate and upper receiving plate form a brush unit, between which a part of a wafer can be clamped and cleaned by rotating the brush unit. The lower gear mechanism turns the lower drive wheel in a same direction as the upper drive wheel. The cleaning is achieved by a rotational movement of a number of pairs of brushes (scrubber brushes) on both sides of the wafer and the application of deionized water.

Abstract: A modular surgical prep sponge holder is provided for improving the cleaning of hands and arms prior to medical procedures. The device includes a tubular member containing a flexible cable and a flexible water line that extend through the tube. A rotating head is attached to the end of the tube, which moves 180 degrees in any direction. The disposable part of the device, being encased in a plastic housing, is connected to the rotating head. The housing includes a main gear, and a movement-plate with end clasps. Once the housing is inserted onto the end of the flexible cable, and a motor is turned on, the flexible cable will rotate. The rotational motion of the flexible cable will be transferred to the main gear and will be converted to lateral motion, causing the movement-plate to move in a lateral direction. Depending upon the setting of the motor, the system may deliver several hundred more strokes per minute than could manually be performed by an individual.

Abstract: The present invention provides a method of removing residual particles from a polished surface. The method comprises the steps of: providing a substrate, forming a dielectric layer on the substrate, brush-cleaning and etching the dielectric layer on the substrate with a liquid when residual particles are trapped therein, whereby the residual particles are loosened and then relocated to the dielectric layer, and finally cleaning the dielectric layer to remove the relocated residual particles.

Abstract: A system for cleaning both the exterior and the interior of drywall tools uses a standard bucket, a metal frame, and a set of brushes. The brushes are rigidly mounted to the frame, and the brush/frame assembly is placed inside the bucket. The system also has a foot-actuated pump having a supply hose that mounts to the bucket and a delivery hose that mounts to a tool to be cleaned. The system is used to clean both the exterior surfaces of the soiled tool and its interior chambers. The bucket is filled with water and the delivery hose is attached to an inlet port of the tool. The tool is lowered into the bucket and scrubbed against the brushes to clean the exterior of the tool. Simultaneously, the pump is actuated by the user to force water through the tool to clean compound out of its interior chambers.

Abstract: A brush mounting system for a wafer scrubbing device includes a brush mandrel and a mounting assembly on which the brush mandrel is mounted. The mounting assembly includes a mounting member adapted to be mounted to a wall of the wafer scrubbing device, and a bearing secured to the mounting member. A brush support is rotatably mounted on the bearing and has an outer end that includes a contact surface adapted to contact the brush mandrel. The contact surface has a spherical profile. The brush mandrel includes a corresponding contact surface having a spherical profile, so that the brush mandrel and the mounting assembly form a spherical joint at the point of contact.

Abstract: The present invention provides a wafer cleaning apparatus. In an advantageous embodiment, the wafer cleaning apparatus includes cleaning brushes mounted within a brush box and a sensor associated with at least one of the cleaning brushes and configured to detect a degree of wetness of the at least one of the cleaning brushes. In most cases, the cleaning brushes are comprised of an absorbent material, such as polyvinyl alcohol, that becomes more compressible as the cleaning brushes become more wetted with a solution. Thus, a degree of compressibility can be related to a degree of wetness of a cleaning brush, which provides data that allows an operator to determine when the cleaning brushes are wet enough to send a wafer through the cleaning apparatus without incurring unnecessary damage.

Abstract: Disclosed is an apparatus imparting a wobbling motion to a planar surface. In one embodiment the wobbling motion is imparted to a brush which can be used to clean uneven surfaces efficiently and easily. In another embodiment the wobbling motion is imparted to a brush which can be used to clean surfaces in confined spaces and reducing the risk of scratching or marring areas in the confined spaces. In another embodiment a method of cleaning a surface using a wobbling apparatus is disclosed.

Abstract: A substrate cleaning apparatus with a vertically extending spindle having a substrate supported on its upper end. A brush extends generally horizontally over the substrate, and a force measuring gage is mounted with respect to the spindle for detecting forces applied to the substrate. A spindle drive moves the spindle upward and downward directions, and a spindle control is electrically connected to the force measuring gage and causes the spindle drive to move upward and downward in response to cleaning forces being detected by the force measuring gage.

Abstract: A cleaner (10) for cleaning dross off of the surface of ingot-filled-molds (F) moving along a conveyor (C) is disclosed. The cleaner (10) includes a boom (14) pivotally mounted to a base (12), an arm (16) housed at least partially within the boom (14) and pivotally mounted thereto, a cutting blade (18) slidably mounted on the arm (16) and a rotatable brush (20) pivotally mounted to a brush arm (132). The cutting blade (18) is driven by a piston and cylinder assembly (112) pivotally coupled between the blade (18) and the arm (16). The arm (16) is pivoted by a piston and cylinder unit (120) coupled between the arm (16) and the boom (14). The brush (20) is pivoted by a piston and cylinder combination (168) coupled between the brush (20) and the brush arm (132).

Abstract: An apparatus for cleaning ninepins and bowling pins is provided. The apparatus includes a drum-like container that rotates about its longitudinal axis, and that is provided with at least one brush that is disposed in the longitudinal direction of the container. The bristles of the brushes extend perpendicular to the axis of rotation of the container. The container has at least the length of the pin that is to be cleaned, is closed at the bottom, and can, additionally, be filled with cleaning fluid. The length of the bristles of the brush or brushes is adapted to the contour of the pin that is to be cleaned and that does not rotate along with the container.