Abstract: The present disclosure includes devices, methods, and systems for processing copper and, in particular, copper layer processing using sulfur plasma, One or more embodiments can include a method of forming a copper sulfur compound by reacting copper with a plasma gas including sulfur and removing at least a portion of the copper sulfur compound with water.

Abstract: A method for producing silicon or a reactive metal is disclosed herein that includes: introducing a silicon-bearing feed or reactive metal-bearing feed into a reactor chamber, wherein the reactor chamber includes a reactor chamber wall having (i) an inside surface facing a reaction space and (ii) an opposing outside surface; generating a first thermal energy within the reaction space sufficient to generate a liquid silicon product or a liquid reactive metal product; generating a second thermal energy exterior to the reactor chamber wall such that a heat flow from the second thermal energy initially impacts the outside surface of the reactor chamber wall; and establishing an inside surface wall temperature within a temperature range that is above or below a melting point temperature of the silicon or the reactive metal by controlling the first thermal energy source and the second thermal energy source.

Abstract: The present invention includes methods of plasma treating a surface of an object. A hollow body, which has one wall made of dielectric material, is filled with a process gas and sealed to form a gas-tight inner chamber having an internal pressure of at least 0.5 bar. The hollow body is then positioned in a space between two electrodes. The space has an external pressure of at least 0.5 bar and is filled with a gas which has a higher ignition field strength than the process gas. A plasma is then ignited in the inner chamber of the hollow body by applying a sufficiently high alternating voltage to the electrodes.

Abstract: Production of pore-free carbon/carbon-silicon carbide composite materials with mechanical properties making them suitable for use in such applications as the production of aircraft landing system brake components including brake discs. The method includes: providing a porous carbon-carbon composite preform; surrounding the porous carbon-carbon composite preform with silicon powder to form an intermediate construct; applying a uniaxial load to the construct; applying direct electrical current to an assembly containing the loaded construct of porous carbon-carbon preform surrounded by silicon powder, thereby melting the silicon powder and infiltrating the pores of the carbon-carbon preform with liquid silicon; and initiating a combustion-type reaction between the silicon and carbon in the preform, thereby forming silicon carbide in the preform.

Abstract: Methods for enhancing hydrogen spillover and storage are disclosed. One embodiment of the method includes doping a hydrogen receptor with metal particles, and exposing the hydrogen receptor to ultrasonification as doping occurs. Another embodiment of the method includes doping a hydrogen receptor with metal particles, and exposing the doped hydrogen receptor to a plasma treatment.

Abstract: The disclosure provides methods for preparation of multiphasic micro-components, such as core-shell or anisotropic (e.g., Janus) multiphasic particles with well-defined structures using electrohydrodynamic co-jetting of two polymer solutions containing polyelectrolytes. Suitable polyelectrolytes include polyacrylic acid (PAA), poly(acrylamide acrylic acid (PAAm), and/or poly(acryl amide-co-acrylic acid) (PAAm-AA), sodium polystyrene sulfonate (PSS), polyethylene imine (PEI), polypeptides, copolymers, and combinations of these. Control of certain variables, such as relative conductivities of the two jetting solutions, controls the particle morphologies formed, leading to a predetermined phase orientation for the same polymer system. In certain aspects, after cross-linking, core-shell particles are stable in aqueous solutions and exhibit reproducible swelling behavior, while maintaining the original core-shell geometry.

Abstract: A mechanism of initiating a redox reaction, such as hydrogen gas production by direct-water-splitting, is provided in which a piezoelectric material is mechanically stressed by actively applying a mechanical stress to the material. The mechanical stress applied to the piezoelectric material causes an electrical potential build up on the surface of the material due to the piezoelectric properties of the material. When the piezoelectric material stressed in this manner is placed in direct contact with the redox reaction reactant(s), the potential on the polarized surface can be used as chemical driving energy to initiate the reaction, such as to split water and generate hydrogen gas. In this manner the mechanical energy applied to the piezoelectric material, such as vibration energy from natural or man-made sources, can be converted directly into chemical energy to initiate the reaction.

Abstract: A plasma generating electrode 1 of the present invention includes a plurality of unit electrodes 2 hierarchically layered at predetermined intervals, the unit electrodes 2 including a deficient unit electrode 2b in which a conductive film 4 has an absent portion and a normal unit electrode 2a in which the conductive film 4 does not have an absent portion. Spaces V formed between the unit electrodes 2 include a normal space Va formed so that the distance between conductive films 4 corresponds to the distance between the unit electrodes 2 and a deficient space Vb formed so that the distance between the conductive films 4 is greater than the distance between the conductive films 4 in the normal space Va. The plasma generating electrode 1 of the present invention can efficiently treat a plurality of predetermined components contained in a treatment target fluid by utilizing different types of plasma suitable for respective reactions by causing the treatment target fluid to flow only once.

Abstract: The invention is a method and system for the generation of high voltage, pulsed, periodic corona discharges capable of being used in the presence of conductive liquid droplets. The method and system can be used, for example, in different devices for cleaning of gaseous or liquid media using pulsed corona discharge. Specially designed electrodes and an inductor increase the efficiency of the system, permit the plasma chemical oxidation of detrimental impurities, and increase the range of stable discharge operations in the presence of droplets of water or other conductive liquids in the discharge chamber.

Abstract: The present invention relates to a plasma reaction apparatus and a plasma reaction method using the same. More particularly, the present invention relates to a plasma reaction apparatus which is applied to the reforming of fuel by generating rotating arc plasma and using the rotating arc being generated, the chemical treatment of a persistent gas, and the apparatus for decreasing NOx by an occlusion catalyst, and a plasma reaction method using the same. For this purpose, a raw material for a reaction is allowed to flow through an inflow hole in a swirl structure so that the raw material forms a rotating flow to progress. Accordingly, the raw material is sufficiently reacted in a plasma reaction space of a restrictive volume, and a high temperature plasma reaction is more promptly performed.

Abstract: A discharge produced plasma radiation source includes a laser beam pulse generator configured to provide a laser beam pulse to trigger a pinch in a plasma of the discharge produced plasma radiation source. The laser beam pulse generator is arranged to provide a laser beam pulse having an energy greater than an optimum laser beam pulse energy that corresponds to a maximum output of a given wavelength of radiation for a given discharge energy.

Abstract: A method of stimulating chemical reactions within a fluid media uses a gas plasma ejected from a gas-buffered microhollow cathode discharge apparatus into the fluid media. The apparatus has an electrically-conductive housing with an electrode positioned therein such as to create air channels between the electrode and the housing. The electrode is electrically insulated from the housing except at a location near the plasma outlet. A DC voltage is applied across the electrode and housing to accelerate the plasma and eject it into the fluid media. In another aspect, the housing includes a cup portion and a conduit portion that are electrically isolated from each other. When a DC voltage is applied across the electrode and the conduit, the plasma is ejected and filamentous discharges occur between the cup and the conduit. Such multicavity coupled plasma discharges provide voltage amplification and DC pulses with rates in the nanosecond regime.

Abstract: Methods for processing substrate surfaces comprising metallic nanoparticles are disclosed. The methods involve providing a substrate surface comprising metallic nanoparticles, and exposing the substrate surface to a plasma.

Abstract: A transmission path of microwaves even after a temperature increases, is maintained in an appropriate state. A microwave plasma processing apparatus performs plasma processing on a substrate by exciting gas due to the electric field energy of microwaves emitted from a slot plate of a radial line slot antenna (RLSA). The microwave plasma processing apparatus includes: a processing container in which plasma processing is performed; a microwave source outputting microwaves; a rectangular waveguide transmitting the microwaves outputted from the microwave source; a coaxial converter converting a mode of the microwaves transmitted to the rectangular waveguide; a coaxial waveguide transmitting the microwaves of which the mode is converted by the coaxial converter; a taper-shaped connector attached to an inner conductor of the coaxial waveguide without contacting the slot plate; and an elastic body electrically connecting the taper-shaped connector and the slot plate.

Abstract: Hollow cathode source pollution abatement systems for the remediation of chemical and microbiological pollutants are disclosed. The systems comprise a plasma generator having a hollow cathode source (HCS) for generating plasma to break down pollutant chemicals and microorganisms into simpler byproducts. The byproducts are trapped on an inner surface of the HCS. The systems allow for elimination of pollutant chemicals and microorganisms from air or gas streams as well as from the surfaces of articles. Methods of operating such systems are also disclosed.

Abstract: An apparatus and method for hydrogen production by dissociating water molecules in response to plasma output from a plasma source. This plasma source can have an RF antenna, capable of operating in capacitive, inductive, or helicon mode when operating conditions match those required to excite these modes. Hydrogen is produced by injecting water vapor into the plasma source. According to the principles of the present teachings, the apparatus and method are, thus, capable of dissociating water molecules into their constituent species.

Abstract: The subject matter relates to devices and methods for dust suppression utilizing an electrostatic dust suppression apparatus which develops an ion cloud containing charged particles for attracting or charging floating dust by bonding to the dust molecules. The particle are introduced through an electrode of the electrostatic dust suppression apparatus which adds an electrostatic charge to the particles as they are dispersed onto an area of fugitive dust. The disbursement of the electrostatic charged particles is accomplished by a pressurized air stream. The electrostatically charged particles attract the fugitive dust and cause the formation of large agglomerates that gravitationally fall to the earth or are electrostatically attracted to the earth.

Abstract: A method of processing a workpiece in a plasma reactor chamber in which plasma RF source and bias power is delivered into the chamber, by sensing fluctuations in a plasma parameter such as load impedance or reflected power at one of the generators, and modulating the output of the other generator to minimize the fluctuation.

Abstract: A method of inducing explosive atomization of materials is provided using a metal-oxide-semiconductor (MOS)-based structure under electrical excitation. Explosive atomization of the gate electrode and surrounding dielectric materials creates a microplasma that is substantially confined with the device at the metal/dielectric interface. The device can generate a microplasma in either the accumulation or inversion regime. The high degree of confinement of the microplasma allows chip-scale implementation of atomic emission spectroscopy and detection using a minimal amount of analyte.

Abstract: A crystal poling apparatus has as ingle-domain ferroelectric substrate (e.g. MgO doped LiNbO3 substrate), a sample holder, a high voltage source, a corona torch, a gas source, a chamber, and at least one vacuum pump. An electrode with a certain structure (e.g. a periodical pattern) is formed on the first surface of the substrate, and the substrate is set with the electrode facing down on top of the sample holder. The electrode is grounded so that high electric field is formed in the area with electrode due to the formation of charges generated by the corona torch on the second surface of the substrate. The charge distribution on the second surface of the substrate is controlled by the high voltage source and the gas source. To achieve the optimized crystal poling, the temperature of the substrate is set by the temperature controller, and the electrode on the first surface of the substrate is isolated by the vacuum pump.

Abstract: A reactor apparatus and method for removing chemical and biological contaminants from a contaminated fluid while minimizing disinfection by-products, sludges, and harmful residue. The reactor has a sequential, multi-stage, reaction vessel with an upper end region and a lower end region. The vessel has a liquid inlet port into which the contaminated fluid may pass. Treated liquid may exit the reactor through a liquid outlet port. A gas inlet port and a gas outlet port are provided. A plurality of stacked reaction chambers have a sieve tray and flange assembly, the sieve tray having holes up through which a gaseous phase may pass. A gas phase electrode, an electrical power supply capable of producing pulsed electrical discharges connected thereto, and a liquid phase electrode are provided. The electrodes create therebetween a pulsed corona discharge for generating reactive species in situ and destroying bacterial contaminants in the liquid.

Abstract: A method for plasma-treating a porous body, comprising the steps of generating plasma using an inert gas or a mixed gas of an inert gas and a reactive gas, (a) blowing the resultant plasma gas to the porous body at a flow rate per a unit area of the porous body of 0.002 to 2 L/minute/cm2, (b) sucking the porous body in a plasma gas atmosphere, or (c) sucking the porous body while blowing the plasma gas to the porous body at said flow rate, thereby treating the plasma the surfaces and pores of said porous body with plasma.

Abstract: The present invention provides an apparatus, comprising a first mechanical structure having a first rigid surface, an area of the first rigid surface having a nanostructured surface. The apparatus also includes a second mechanical structure having a second rigid surface and opposing the first mechanical structure. The second rigid surface is cooperable with the nanostructured surface such that a microscopic particle is locatable between the nanostructured surface and the second rigid surface.

Abstract: A method and apparatus are described that couples a plurality of electromagnetic sources to a material for the purpose of either processing the material or promoting a chemical reaction. The apparatus couples various electromagnetic sources of various frequencies, including provision for static magnetic fields, radio frequency fields, and microwave fields, with the possibility of applying them all simultaneously or in any combination.

Abstract: The present invention provides a method and apparatus for manufacturing halogen gas using a plasma chemical reaction, with the features of having simplicity, practicality, and maintaining safety in handling source materials and of being able to manufacture halogen gas in the same facility where halogen gas is used, and also provides a halogen gas circulatory and recovery system capable of circulating and using halogen gas efficiently. After the gas expressed in the chemical formula AiXj (A represents metallic element or semiconductor element, X represents halogen element, and i and j represent integers) is introduced into a reaction container in vacuum, plasmas are generated in the reaction container to produce a plasma chemical reaction. Fine particles produced by the plasma chemical reaction and containing an element other than halogen element as the major constituent are removed from the reaction container so as to generate halogen gas in the reaction container.

Abstract: A plasma generator in which the variation of the impedance in the cavity before and after plasma is ignited is less and hardly affected by the shape of the cavity, and the ignitability of the plasma is improved and a method of generating plasma using the plasma generator are provided. The plasma generator comprises a nonconductive gas flow pipe (1) for introducing a gas (9) for generating plasma and discharging it into the atmosphere and a conductive antenna pipe (2) surrounding the gas flow pipe. A microwave (7) is applied to the antenna pipe to change the gas in the gas flow pipe into plasma. The plasma generator is characterized in that a slit (3) with a predetermined length is formed in the antenna pipe (2) along the axial direction of the gas flow pipe. Preferably, the plasma generator is characterized in that the length of the slit is an integral multiple of the half-wave length of the applied microwave.

Abstract: This invention pertains to densely integrated programmable electrode arrays for sensing and manipulating biological cells and substances. Using the programmable electrode arrays according to a method of the invention, it is possible to generate arbitrary, dynamically reconfigurable electric field patterns on and around the electrodes at magnitudes which have been shown to induce neurite outgrowth and enhance cellular regeneration of damaged tissue. It is also possible to use the programmable electrode arrays to sense signals coupled to or in close proximity with the electrodes of the array, and to program arbitrary gain, calibration and offsets onto the individual electrodes of the array and/or their associated circuit elements.

Abstract: The present invention provides reaction cells capable of maintaining stable analytical performance by preventing bubble adhesion and reducing sample carryover even if the amount of sample liquid for a single test is further reduced in the future. The invention further provides an automatic analyzer that uses the reaction cells and a method for enhancing the hydrophilicity of the inner surfaces of the reaction cells. According to the invention, a reaction cell has a first electrode inserted thereinto and a second electrode disposed on the bottom side of the reaction cell. A voltage is applied between the first electrode and the second electrode to cause electric discharge between the electrodes. This allows for enhancing only the hydrophilicity of the bottom inner surface and the four bottom corners of the reaction cell to which large bubbles adhere easily.

Abstract: A plasma processing apparatus includes a vacuum evacuable processing chamber; a first electrode for supporting a substrate to be processed in the processing chamber; a processing gas supply unit for supplying a processing gas into a processing space; a plasma excitation unit for generating a plasma by exciting the processing gas in the processing chamber; a first radio frequency power supply unit for supplying a first radio frequency power to the first electrode to attract ions in the plasma to the substrate; and a first radio frequency power amplitude modulation unit for modulating an amplitude of the first radio frequency power at a predetermined interval. The plasma processing apparatus further includes a first radio frequency power frequency modulation unit for modulating a frequency of the first radio frequency power in substantially synchronously with the amplitude modulation of the first radio frequency power.

Abstract: Systems and methods of forming plasma are provided. In an embodiment, a plasma generator system is provided including a container, a single coil disposed around the container, the single coil being a single member and having a first end, a second end, a first winding, and a second winding, wherein the first winding extends from the first end, and the second winding is integrally formed as part of the first winding and extends to the second end, an energy source electrically coupled directly to the first end of the single member, and a capacitor electrically coupled directly to the second end of the single member.

Abstract: A method of preparing nanoparticles includes using low-temperature plasma and a pulsed second process gas. Nanoparticles having uniform sizes and nanoparticles having a core-shell structure may be formed. A lithium battery includes an electrode that includes the nanoparticles.

Abstract: In a method for treatment of a dispersed material in a plasma, in which a plasma-forming gas is introduced into a reaction chamber and ionized and a dispersed material is introduced into the reaction chamber and into the area of the plasma, treated under the action of the plasma, and subsequently removed from the area of the plasma, the introduction of the plasma-forming gas and the introduction of the dispersed material are performed independently of one another and from different directions. In an apparatus for treatment of a dispersed material in a plasma, which comprises a reaction chamber having a plasma generator, a first inlet for a plasma-forming gas, and a second inlet for the dispersed material, the second inlet is situated spatially separated in relation to the first inlet so that the dispersed material is conducted from the outside into the plasma.

Abstract: A method for processing a workpiece in a plasma reactor having a set of n coils includes constructing, for each one of the n coils, a set of plasma distributions for discrete values of coil current in a predetermined current range. The distributions are grouped, each group having one distribution for each of the n coils, and being a unique set of n distributions. A combined plasma distribution is computed from each group of distributions. The variance of each combined distribution is computed. The method further includes finding an optimum one of the combined distributions having an at least nearly minimum variance, and identifying the n coil currents associated with the optimum distribution. During plasma processing of the workpiece, currents through the coils are maintained at levels corresponding to the n coil currents associated with the one combined distribution.

Abstract: A droplet operation device has a substrate with light transmissibility and having been subjected to a water repellent treatment, a way for supplying droplets onto the substrate, a way for transporting the droplets on the water repellent substrate, and a way for measuring the state of the droplets. The droplet operation device includes the light transmittable substrate, solvent feeding ports for leading reagent or specimen droplets onto the substrate, optical measuring units, and electric field application units. As a result, the inside of the droplets can be observed with a microscope, and results of the reaction of the droplets against other droplets can be measured and classified by stopping and moving the droplets in any direction.

Abstract: An IPVD source assembly and method is provided for supplying and ionizing material for coating a semiconductor wafer. The assembly includes a process space containing a plasma and an electrostatic chuck moveable in to and out of the process space. The chuck is configured to support the semiconductor wafer. The assembly further includes a first shield in electrical communication with a table and a second shield. The first shield is configured to shield at least a portion of the electrostatic chuck when the chuck is in the process space and the second shield is configured to shield at least a portion of a space below the electrostatic chuck and the process space. A conducting element electrically connects the second shield to the table to substantially prevent a formation of a second plasma in the space below the electrostatic chuck and the process space.

Abstract: A plasma gliding arc discharge reactor is described. The reactor may include a housing having a plurality of divergent electrodes, a power supply connected to the electrodes, which delivers pulsed power to the reactor, and a nozzle that directs a mixture of a carrier gas and a liquid to a region between the divergent electrodes, thereby generating plasma in the region. The nozzle can include a first inlet for receiving the carrier gas, a second inlet for receiving the liquid and a mixing chamber that is configured to mix the carrier gas and the liquid prior to being directed to the region.

Abstract: An apparatus and method are provided for controlling the intensity and distribution of a plasma discharge in a plasma chamber. In one embodiment, a shaped electrode is embedded in a substrate support to provide an electric field with radial and axial components inside the chamber. In another embodiment, the face plate electrode of the showerhead assembly is divided into zones by isolators, enabling different voltages to be applied to the different zones. Additionally, one or more electrodes may be embedded in the chamber side walls.

Abstract: A method and apparatus for controlling plasma uniformity is disclosed. When etching a substrate, a non-uniform plasma may lead to uneven etching of the substrate. Impedance circuits may alleviate the uneven plasma to permit more uniform etching. The impedance circuits may be disposed between the chamber wall and ground, the showerhead and ground, and the cathode can and ground. The impedance circuits may comprise one or more of an inductor and a capacitor. The inductance of the inductor and the capacitance of the capacitor may be predetermined to ensure the plasma is uniform. Additionally, the inductance and capacitance may be adjusted during processing or between processing steps to suit the needs of the particular process.

Abstract: In the process of the present invention, first, voltage is applied between an electroconductive substance (11) capable of adsorbing ions and a counter electrode (12) in an aqueous solution (20) containing at least one type of ions (L) other than hydrogen ions and hydroxide ions, so that at least a part of the ions (L) contained in the aqueous solution (20) are allowed to be adsorbed on the electroconductive substance (11). Subsequently, the electroconductive substance (11) is removed from the aqueous solution (20) and then is washed.

Abstract: A method for processing a substrate in a plasma processing chamber is provided. The substrate is disposed above a chuck and surrounded by an edge ring. The edge ring is electrically isolated from the chuck. The method includes providing RF power to the chuck. The method also includes providing a tunable capacitance arrangement. The tunable capacitance arrangement is coupled to the edge ring to provide RF coupling to the edge ring, resulting in the edge ring having an edge ring potential. The method further includes generating a plasma within the plasma processing chamber to process the substrate. The substrate is processed while the tunable capacitance arrangement is configured to cause the edge ring potential to be dynamically tunable to a DC potential of the substrate while processing the substrate.

Abstract: A chamber component configured to be coupled to a processing chamber is described. The chamber component comprises one or more adjustable gas passages through which a process gas is introduced to the process chamber. The adjustable gas passage may be configured to form a hollow cathode that creates a hollow cathode plasma in a hollow cathode region having one or more plasma surfaces in contact with the hollow cathode plasma. Therein, at least one of the one or more plasma surfaces is movable in order to vary the size of the hollow cathode region and adjust the properties of the hollow cathode plasma. Furthermore, one or more adjustable hollow cathodes may be utilized to adjust a plasma process for treating a substrate.

Abstract: Nanotechnology methods for creating stoichiometric and non-stoichiometric substances with unusual combination of properties by lattice level composition engineering are described.

Abstract: An apparatus for exciting a gas, comprising at least one pair of electrodes connecting with an alternate current electric source in a housing having an inlet opening for the gas to be treated and an outlet opening for a treated gas, the pair being a combination of a protected electrode and a protected electrode, or a combination of a protected electrode and an exposed electrode, wherein at least one protected electrode is composed of a core electrode with an insulating coating layer carried thereon and covering an entire surface thereof is disclosed.

Abstract: Embodiments of the invention relate to an apparatus or hydrogen generating system including a galvanic or first hydrogen generator and a thermally-activated or second hydrogen generator connectable to one another.

Abstract: Disclosed is a method of forming an Al—C covalent bond between aluminum and a carbon material by applying an electric arc to a mixture of the aluminum and the carbon material under vacuum, heated and pressurized conditions. In order to enhance the reactivity of the carbon material, the method may include the step of introducing defects in the carbon material and thus functionalizing the carbon material by treating the carbon material with acid, a microwave, or plasma.

Abstract: A device for sustaining a plasma in a torch is provided. In certain examples, the device comprises a first electrode configured to couple to a power source and constructed and arranged to provide a loop current along a radial plane of the torch. In some examples, the radial plane of the torch is substantially perpendicular to a longitudinal axis of the torch.

Abstract: Compounds are provided comprising at least one neutral, positive, or negative hydrogen species having a binding energy greater than its corresponding ordinary hydrogen species, or greater than any hydrogen species for which the corresponding ordinary hydrogen species is unstable or is not observed. Compounds comprise at least one increased binding energy hydrogen species and at least one other atom, molecule, or ion other than an increased binding energy hydrogen species. One group of such compounds contains one or more increased binding energy hydrogen species selected from the group consisting of Hn, Hn?, and Hn+ where n is a positive integer, with the proviso that n is greater than 1 when H has a positive charge.

Abstract: The present invention generally provides apparatus and method for adjusting plasma density distribution in an inductively coupled plasma chamber. One embodiment of the present invention provides an apparatus configured for processing a substrate. The apparatus comprises a chamber body defining a process volume configured to process the substrate therein, and a coil assembly coupled to the chamber body outside the process volume, wherein the coil assembly comprises a coil mounting plate, a first coil antenna mounted on the coil mounting plate, and a coil adjusting mechanism configured to adjust the alignment of the first coil antenna relative to the process volume.

Abstract: The present invention generally provides apparatus and method for processing a substrate. Particularly, the present invention provides apparatus and methods to obtain a desired distribution of a process gas. One embodiment of the present invention provides an apparatus for processing a substrate comprising an injection nozzle having a first fluid path including a first inlet configured to receive a fluid input, and a plurality of first injection ports connected with the first inlet, wherein the plurality of first injection ports are configured to direct a fluid from the first inlet towards a first region of a process volume, and a second fluid path including a second inlet configured to receive a fluid input, and a plurality of second injection ports connected with the second inlet, wherein the second injection ports are configured to direct a fluid from the second inlet towards a second region of the process volume.

Abstract: An electrostatic dehydrator or separator having at least two generally horizontal electrodes will function as a separator for water and oil, and also for gas, water and oil. Gas/liquid separation occurs in the front section of the vessel. Oil/water separation takes place in a subsequent section of the vessel which may have two or three independent generally horizontal electrodes or grids spaced at different distances above the generally horizontal oil/water interface. The two or three independent electrodes or grids will each have their own transformer. The higher grid(s) will continue to operate even if the lower grid(s) short out.