Abstract: A plasma reactor (10) is provided. The plasma reactor (10) includes a reaction chamber (12) formed by a wall (13). Proximate to the first end of the reaction chamber, the plasma reactor includes a feed gas inlet (14) for creating a reverse vortex gas flow (16) in the reaction chamber. The plasma reactor (10) also includes an anode and a cathode connected to a power source for generation of an electric arc for plasma generation in said reaction chamber. The plasma reactor (10) may optionally include a movable electrode adapted for movement from a first, ignition position to a second, operational position in the reaction chamber. Also provided is a method of converting light hydrocarbons to hydrogen-rich gas, using the plasma reactor of the invention.

Abstract: The present subject matter is directed to plasma dissociation of fluidic hydrogen sulfide to hydrogen and sulfur. A reactor is configured to have a plasma discharge and a vortex flow pattern. The plasma discharge provides energy to the hydrogen sulfide disassociation reaction and the vortex flow pattern helps to cause the condensation of sulfur molecules. The condensation of sulfur molecules helps to reduce the amount of energy input required to disassociate a certain amount of hydrogen sulfide. Additionally, the reactor may be configured to have a vortex flow pattern that provides for a recirculation zone in which relatively warm reaction products may exchange their heat energy with relatively cool input fluids.

Abstract: To form a thick coating by a discharge surface treatment, a voltage between an electrode and a workpiece during a discharge is detected, and it is determined that a discharge surface treatment state is abnormal if it is detected that the voltage is reduced. With this arrangement, it is possible to accurately detect an unstable phenomenon in the discharge surface treatment, and take appropriate measures before a state of the coating and a state of the electrode are worsened due to the unstable phenomenon. By discriminating a stability of the discharge surface treatment, the coating and the electrode are prevented from being damaged.

Abstract: An object is to provide a novel anatase titanium oxide having especially high photocatalytic activity as a photocatalyst useful as a material for environmental clean-up, such as removal of toxic substances, deodorization and decomposition of malodorous substances, prevention of fouling and sterilization, and a method of producing such an anatase titanium oxide. There is provided a titanium oxide having a reflectance of 80% or lower with respect to light having a wavelength of 400 nm to 700 nm. There is also provided a method of producing an anatase titanium oxide, comprising creating pulsed plasma by an electric current of lower than 5 amperes between titanium electrodes in water to oxidize a titanium. Preferably, the titanium oxide has a percentage weight loss of 1.0% or lower when heated at a temperature within the range of 400° C. to 800° C., and has the anatase structure or the anatase and rutile structures.

Abstract: Accelerated charged particles are provided by inductive amplification of particle energy in connection with a deflagration-mode plasma discharge. The deflagration mode discharge tends to increase particle energy relative to other operating modes. Inductive amplification of particle energy further increases output particle velocity. Inductive amplification can occur by formation of a current loop in the plasma discharge, and/or by a sudden increase in inductance due to collapse of the current distribution of the plasma discharge. Applications include particle therapy and production of radio-isotopes.

Abstract: The invention relates to a method for treating fumes generated during the production, conversion and/or handling of oil-based products and a device for carrying out said method. The invention further relates to the use of the method or device in which the trapping device comprises at least one fluidized bed of granular material in the preparation of a granular material for use in production of road materials.

Abstract: The disclosure relates to a method for purifying silicon by exposing liquid silicon to a plasma, wherein the silicon flows continuously into a channel so that the free surface thereof is exposed to the plasma. The disclosure also relates to a device for implementing the method.

Abstract: Disclosed are method and apparatus for generating compound plasma and electro-thermal cooking apparatus using the compound plasma. An electro-thermal cooking apparatus has an evaporator for generating water vapor by heating water therein with electric energy, a blast nozzle for blasting the water vapor supplied from the evaporator, and an electric discharge means, installed in an insulating body around the blast nozzle, for making the water vapor electrically discharged by applying strong energy to the water vapor blasted from the blast nozzle so as to convert the water vapor into compound plasma of hydrogen plasma and oxygen plasma. The compound plasma is used as an energy transfer medium for a cooking utensil. According to the present invention, efficiency of heat transfer is improved because the compound plasma of high temperature of which energy density is relatively high is used, although it employs electrically heating method. The heating time can also be reduced even with a downsized device.

Abstract: An apparatus and method are disclosed for producing nanoparticles in a dense fluid medium. The method is based on the formation of nanoparticles from nanoparticle precursors in a dense fluid medium in which a plasma discharge is created between electrodes submerged in the dense fluid medium. The electrodes define a plasma discharge zone between opposing electrode discharge faces and further define an internal cavitation zone into which a cavitation gas is released, creating bubbles in the dense fluid medium. The result is the efficient production of nanoparticles using a high-frequency, high-voltage electric field to react dense-phase precursors in an atmospheric pressure, low temperature environment.

Abstract: Versions of the invention include compositions and methods for making them that include a polymeric porous membrane with one or more atmospheric pressure microwave plasma modified surfaces. The modified porous membrane is stable, non-dewetting, and retains its mechanical strength.

Abstract: An object of the invention is to provide a method for the stable production of a high-purity Group II-VI compound semiconductor on an industrial scale, and also a hexagonal crystal of Group II-VI compound semiconductor in which a metal can be doped easily. Another object of the invention is to provide a method of producing a Group II-VI compound semiconductor phosphor. The objects are achieved by a method of producing a Group II-VI compound semiconductor comprising generating a pulsed electrical discharge plasma between metallic electrodes in sulfur to produce a Group II-VI compound semiconductor; a method of producing a Group II-VI compound semiconductor phosphor using a pulsed electrical discharge plasma; and a hexagonal crystal of Group II-VI compound semiconductor composed of a plurality of twin crystals.

Abstract: A plasma reactor is provided, which includes a discharge chamber with dimensional characteristics and configuration of dielectric and electrodes so as to enhance efficiency based on the characteristics of the corona discharge streamers generated. Upon application of a pulsed high voltage potential, the discharge chamber enables formation of plasma where surface streamers play a greater role in the overall energy density of the discharge chamber than gas streamers. The formation of gas streamers is constrained. Because surface streamers have a higher energy density, the present invention is able to achieve improved energy efficiency while preserving effectiveness for gas treatment.

Abstract: A method of H2S dissociation which comprises generating radicals or ions. The H2S dissociation is initiated at relatively low temperature, e.g., of less than 1875 K. The residence time for dissociation generally ranges from about 0.01 s to 10 s. In one embodiment, plasmas are used to generate ions for use in the H2S dissociation.

Abstract: This invention relates to a plasma surface modification process (and a corresponding a system) of a solid object (100) comprising creating plasma (104) by a plasma source (106), application of the plasma (104) to at least a part of a surface (314) of the solid object (100), generating ultrasonic high intensity and high power acoustic waves (102) by at least one ultrasonic high intensity and high power acoustic wave generator (101), wherein the ultrasonic acoustic waves are directed to propagate towards said surface (314) of the object (100) so that a laminar boundary layer (313) of a gas or a mixture of gases (500) flow in contact with said solid object (100) is thinned or destructed for at least a part of said surface (314). In this way, the plasma can more efficiently access and influence the surface of the solid object to be treated by the plasma, which speeds the process time up significantly.

Abstract: The present invention is a vitrification and gasification system that operates at elevated pressures. The system includes a processing chamber having numerous penetrations, and seals for effectively sealing the penetrations to the processing chamber.

Abstract: A semiconductor sensing field effect transistor uses an organic unimolecular film formed on a gate insulating layer. In the semiconductor sensing field effect transistor and a semiconductor sensing device, the gate insulating layer has a stack structure wherein a second silicon oxide layer is stacked on a first silicon oxide layer through a silicon nitride layer. A semiconductor sensor chip and the semiconductor sensing device are provided with a field effect transistor chip wherein the gate insulating layer, a source electrode and a drain electrode are integrated on a silicon board, a source electrode terminal wiring connected with the source electrode, and a drain electrode terminal wiring connected with the drain electrode.

Abstract: The invention describes a microsphere with diameter from 0.1 to 50 micrometers, made of a material selected from the group consisting of: silicon, doped silicon, SixGe1-x wherein 0?x?1, and SixH1-x wherein 0.5?x?1, that is able to work as optical microcavity with resonating Mie modes for wavelengths from 1 to 160 micrometers, and a photonic sponge based on the above mentioned microspheres, that scatter light strongly in a wide range of wavelengths, namely from 1 to 160 micrometers. The manufacturing method is based on the decomposition of gaseous precursors by heating means. These microspheres are suitable for fabricating photonic devices like, for instance, photovoltaic cells, photodiodes, lasers and sensors.

Abstract: A method for controlling plasma density distribution in a plasma chamber in order to control a critical dimension (CD) and obtain uniformity of an etching rate. The plasma density distribution control method is used to fabricate a semiconductor device in the plasma chamber and comprises the steps of establishing an intended plasma density distribution in the plasma chamber and controlling a voltage distribution in the plasma chamber with relation to the established plasma density distribution.

Abstract: Systems, methods and apparatus for reducing instabilities in a plasma-based processing system are disclosed. An exemplary method includes applying power to a plasma with a power amplifier; determining whether low frequency instability oscillations are present or high frequency instability oscillations are present in the plasma; and altering, based upon whether high or low frequency instability oscillations are present, an impedance of a load that is experienced by the power amplifier, the load experienced by the power amplifier including at least an impedance of the plasma.

Abstract: A method of manufacturing a dosage form is described wherein a liquid solution of a biologically compatible polymer containing a suspension of particulate material that is insoluble in the polymer is supplied to a liquid supply tube (2) having an outlet (2a) and an electrical field is established between the outlet (2a) and a surface (19) spaced from the outlet (2a) to cause liquid issuing from the outlet to form a jet which dries to form a polymer fibre containing particles of the particulate material and which deposits onto the surface (19) to form a dosage which consists of said particulate containing fibre which fibre dissolves or disintegrates in a wet environment such as the mouth.

Abstract: A plasma generation method in a toroidal plasma generator that includes a gas passage having a gas entrance and a gas outlet and forming a circuitous path and a coil wound around a part of the gas passage includes the steps of supplying a mixed gas of an Ar gas and an NF3 gas containing at least 5% of NF3 and igniting plasma by driving the coil with a high-frequency power, wherein the plasma ignition step is conducted under a total pressure of 6.65-66.5 Pa.

Abstract: The present invention relates to a method and apparatus for extracting kerogen oil from oil shale without adverse environmental impacts. A first plasma reactor is employed for creating a syngas from a carbon-based fuel. A turbine uses the syngas to produce electricity after the syngas' sensible heat passes through a heat exchanger to heat recycling gases used to pyrolyze the oil shale. A kiln receives the oil shale and heats the oil shale to a temperature at which hydrocarbons from the oil shale are released and captured. The hydrocarbons are sent to a distillation tower to produce a usable fuel. A second plasma reactor vitrifies the spent shale to produce an environmentally inert byproduct. The second plasma reactor is powered by electricity produced by the syngas turbine. Carbon dioxide generated by the process is captured and stored to prevent its release into the environment.

Abstract: An impedance matching device is provided with a basic element having variable characteristic parameters for impedance matching, and an auxiliary element having variable characteristic parameters. At the time of generating plasma by using the impedance matching device, the characteristic parameters of the basic element of each antenna element are fixed, respectively, and the characteristic parameters of the auxiliary element are adjusted for each antenna element. Thus, in an adjusted status where impedance matching for each antenna element is adjusted, each antenna element of an antenna array is fed with a high frequency signal, an electromagnetic wave is radiated from the antenna element, the characteristic parameters of the basic element of each antenna element are synchronized and adjusted, and the impedances of the whole antenna array are matched.

Abstract: The invention relates to a method of producing nanotubes from coaxial jets of immiscible liquids or poorly-miscible liquids. The purpose of the invention is to produce hollow fibers (nanotubes) or composite fibers having diameters ranging from a few micras to tens of nanometers and comprising walls, in the case of nanotubes, with a thickness ranging from hundreds of nanometers to a few nanometers. The inventive nanotube-formation method involves the generation of coaxial nanojets of two liquids using electrohydrodynamic technology.

Abstract: The invention provides, with a simple technique, a jig for reliably stemming one or a plurality of flow paths and/or a portion of reaction fields continuously provided in a reaction chip, and for making the flow paths and/or reaction fields independent, and a reaction ship processing apparatus.

Abstract: A device for producing high power microwave plasmas. The device comprises at least one microwave feed that is surrounded by at least one dielectric tube. A dielectric fluid flows through the space between the microwave feed and the outer dielectric tube. The dielectric fluid has a small dielectric loss factor tan ? in the region of between 10?2 to 10?7. A fluid cools at least the outer dielectric tube.

Abstract: Particles are trapped away from a wafer transport zone in a chamber. A first electrode is on one side of the zone. A second electrode is on an opposite side of the zone. A power supply connected across the electrodes establishes an electrostatic field between the electrodes. The field traps particles at the electrodes, away from the zone. For transporting the wafer from the chamber, the second electrode mounts the wafer for processing, and the first electrode is opposite to the second electrode defining a process space. The zone is in the space with a separate part of the space separating the zone from each electrode. Particles are urged away from the wafer by simultaneously terminating plasma processing of the wafer, connecting the second electrode to ground, applying a positive DC potential to the first electrode, and de-chucking the wafer from the second electrode into the zone.

Abstract: The present invention is related to a method to control the nucleation and to achieve designed domain inversion in single-domain ferroelectric substrates (e.g. MgO doped LiNbO3 substrates). It includes the first poling of the substrate with defined electrode patterns based on the corona discharge method to form shallow domain inversion (i.e. nucleation) under the electrode patterns, and is followed by the second crystal poling based on the electrostatic method to realize deep uniform domain inversion. Another objective of the present invention is to provide methods to achieve broadband light sources using a nonlinear crystal with a periodically domain inverted structure.

Abstract: The present invention describes polymer nanoparticles with a cationic surface potential, in which both hydrophobic and hydrophilic pharmaceutically active substances can be encapsulated. The hydrophilic and thus water-soluble substances are encapsulated in the particle core by co-precipitation through ionic complexing with a charged polymer. Both therapeutic agents and diagnostic agents can be used as pharmaceutically active substances for encapsulation. The cationic particle surface permits stable, electrostatic surface modification with partially oppositely charged compounds, which can contain target-specific ligands for improving passive and active targeting.

Abstract: Provided is a submerged-type, electrosorption-based desalination apparatus for water purification and method, comprising applying a DC voltage of 0.1 to 2.0 volts to a carbon electrode of the reactor to thereby adsorb inorganic ions on the carbon electrode, and reversely applying the same DC voltage having opposite polarity to recycle regeneration solution to the outside of the apparatus or into the treatment tank, thereby enhancing a recovery rate. In addition, in order to improve desalination efficiency, the reactor used in the desalination apparatus may be embodied in various forms of T-shaped, linear type, single, composite, and ion exchange membrane electrodes. Therefore, the present invention may be applied to remove inorganic ions from industrial wastewater, sea water, and brackish water, which contain large amounts of inorganic ions.

Abstract: This invention relates generally to novel methods and novel devices for the continuous manufacture of nanoparticles, microparticles and nanoparticle/liquid solution(s). The nanoparticles (and/or micron-sized particles) comprise a variety of possible compositions, sizes and shapes. The particles (e.g., nanoparticles) are caused to be present (e.g., created and/or the liquid is predisposed to their presence (e.g., conditioned)) in a liquid (e.g., water) by, for example, preferably utilizing at least one adjustable plasma (e.g., created by at least one AC and/or DC power source), which plasma communicates with at least a portion of a surface of the liquid. At least one subsequent and/or substantially simultaneous adjustable electrochemical processing technique is also preferred. Multiple adjustable plasmas and/or adjustable electrochemical processing techniques are preferred.

Abstract: A falling film plasma reactor (FFPR) provides a number of benefits for the treatment of process gases. The falling film plasma reactor uses high voltage alternating current or pulsed direct current which is applied to radially separated electrodes to thereby create a dielectric breakdown of the process gas that is flowing within the large radial gap between the two electrodes. Typical plasma reactors often utilize fixed dielectric construction which can result in potential failure of the device by arcing between the electrodes as portions of the dielectric fail. Such failures are prevented by using a dielectric liquid that constantly flows over the electrodes, or over a fixed dielectric barrier over the electrodes.

Abstract: A method and system for producing synthesis gas in which a carbonaceous material and at least one oxygen carrier are introduced into a non-thermal plasma reactor at a temperature in the range of about 300° C. to about 700° C. and a pressure in a range of about atmospheric to about 70 atmospheres and a non-thermal plasma discharge is generated within the non-thermal plasma reactor. The carbonaceous material and the oxygen carrier are exposed to the non-thermal plasma discharge, resulting in the formation of a synthesis gas in the non-thermal plasma reactor.

Abstract: The invention relates to a surface dielectric barrier discharge plasma unit. The unit comprises a solid dielectric structure provided with an interior space wherein an interior electrode is arranged. Further, the unit comprises a further electrode for generating in concert with the interior electrode a surface dielectric barrier discharge plasma. The unit is also provided with a gas flow path along a surface of the structure.

Abstract: In a plasma processing apparatus including a processing chamber in a vacuum container to form plasma in the processing chamber in which pressure is reduced, a sample stage in lower part of inside of the processing chamber and having an upper surface on which a wafer to be processed by plasma is put, a plurality of pins in the sample stage to be moved in vertical direction so that the pins abut against rear side of the wafer to move the wafer up and down over the upper surface of the sample stage, and a plurality of openings formed in the upper surface of the sample stage so that the pins are moved in the openings, gas is fed from supply ports communicating with the openings into the processing chamber through the openings when the wafer is not put on the upper surface of the sample stage.

Abstract: The invention concerns a system for treating gases such as PFC or HFC with plasma, comprising: (6) pumping means (6) whereof the outlet is at a pressure substantially equal to atmospheric pressure, plasma generator (8), at the pump output, to produce a plasma at atmospheric pressure.

Abstract: The present invention describes a method of fabrication of nanocomposite semiconductor materials comprising aligned arrays of metal or semiconductor nanowires incorporated into semiconductor material for application in various electronic, optoelectronic, photonic and plasmonic devices employing self-assembling of the nanowires under light illumination from charged interstitial defect atoms, which are either inherently present in the semiconductor material or artificially introduced in the matrix semiconductor material.

Abstract: A method of using honeycomb material having opposite surfaces and flow channels between the surfaces, includes directing fluid flow through the channels while applying a voltage between the surfaces and across fluid flowing in the channels. A method of using honeycomb material that includes at least one electrode, the honeycomb material and electrode be useful in an electrical or electronic device, includes using the honeycomb material to support or to suspend the electrical or electronic device. An apparatus includes a honeycomb structure of dielectric material having a number of flow channels therethrough, an electrode at a surface of the dielectric material responsive to electrical input to apply an electrical response alone or with regard to another electrode, the honeycomb structure having cohesive strength and rigidity to support itself and the electrode from in suspended relation.

Abstract: A method and system for producing product gases in which a carbonaceous material and at least one oxygen carrier are introduced into a non-thermal plasma reactor at a temperature in the range of about 300° C. to about 700° C. and a pressure in a range of about atmospheric to about 70 atmospheres and a non-thermal plasma discharge is generated within the non-thermal plasma reactor. The carbonaceous material and the oxygen carrier are exposed to the non-thermal plasma discharge, resulting in the formation of a product gas in the non-thermal plasma reactor, which product gas comprises substantial amounts of hydrocarbons, such as methane, hydrogen and/or carbon monoxide.

Abstract: An ion source that utilizes exited and/or atomic gas injection is disclosed. In an ion beam application, the source gas can be used directly, as it is traditionally supplied. Alternatively or additionally, the source gas can be altered by passing it through a remote plasma source prior to being introduced to the ion source chamber. This can be used to create excited neutrals, heavy ions, metastable molecules or multiply charged ions. In another embodiment, multiple gasses are used, where one or more of the gasses are passed through a remote plasma generator. In certain embodiments, the gasses are combined in a single plasma generator before being supplied to the ion source chamber. In plasma immersion applications, plasma is injected into the process chamber through one or more additional gas injection locations. These injection locations allow the influx of additional plasma, produced by remote plasma sources external to the process chamber.

Abstract: The present invention allows the relatively easy production of binary and ternary compounds of metals, including noble metals. Embodiments of the invention allow, for the first time, the production of novel compositions of metal compounds, such as thick, stress-free single-phase binary and ternary compositions of metals, and porous compositions of such compounds. As such, the present invention allows for the production of metal compounds and/or compositions of matter thereof that have not before been possible, thereby providing for important new materials that find use in a multitude of different applications, including medical device and non-medical device applications.

Abstract: A plasma generating electrode 1 of the present invention includes two or more electrodes 2 disposed to face each other, and holding members 3 for holding electrodes 2 at a predetermined interval, and can generate plasma by applying voltage between electrodes 2. At least one of electrodes facing each other 2 has a plate-shaped ceramic body 6 serving as a dielectric body, and a conductive film 7 disposed inside the body 6, and the holding members 3 fix the opposite side end portions 5 (fixed end portions 5a) of electrodes facing each other 2 in the state of a cantilever in such a condition that electrodes 2 are held by holding members in the state of cantilevers of the different directions alternately at a predetermined interval as a whole. This relaxes the thermal stress and effectively prevents distortion and breakage of electrodes caused by to a temperature change.

Abstract: A number of RF power transmission paths are defined to extend from an RF power source through a matching network, through a transmit electrode, through a plasma to a number of return electrodes. A number of tuning elements are respectively disposed within the number of RF power transmission paths. Each tuning element is defined to adjust an amount of RF power to be transmitted through the RF power transmission path within which the tuning element is disposed. A plasma density within a vicinity of a particular RF power transmission path is directly proportional to the amount of RF power transmitted through the particular RF power transmission path. Therefore, adjustment of RF power transmitted through the RF power transmission paths, as afforded by the tuning element, enables control of a plasma density profile across a substrate.

Abstract: Disclosed is a method, apparatus and system for sorting ions. According to some embodiments of the present invention, ions may be sorted to produce hydrogen gas from water. The apparatus may include a first electric field source, an insulation layer to electrically isolate the first field sources from the water, a first deionization surface within a field line of the first field source; and a conductor connected to the first deionization surface and adapted to discharge charge built up due to attracted ions at the first deionization surface.

Abstract: A method for generating plasma for removing metal oxide from a substrate is provided. The method includes providing a powered electrode assembly, which includes a powered electrode, a dielectric layer, and a wire mesh disposed between the powered electrode and the dielectric layer. The method also includes providing a grounded electrode assembly disposed opposite the powered electrode assembly to form a cavity wherein the plasma is generated. The wire mesh is shielded from the plasma by the dielectric layer when the plasma is present in the cavity, which has an outlet at one end for providing the plasma to remove the metal oxide. The method further includes introducing at least one inert gas and at least one process gas into the cavity. The method yet also includes applying an rf field to the cavity using the powered electrode to generate the plasma from the inert and the process gas.

Abstract: A strongly-ionized plasma generator includes a chamber for confining a feed gas. An anode is positioned inside the chamber. A cathode assembly is positioned adjacent to the anode inside the chamber. An output of a pulsed power supply is electrically connected between the anode and the cathode assembly. The pulsed power supply comprising solid state switches that are controlled by micropulses generated by drivers. At least one of a pulse width and a duty cycle of the micropulses is varied so that the power supply generates a multi-step voltage waveform at the output having a low-power stage including a peak voltage and a rise time that is sufficient to generate a plasma from the feed gas and a transient stage including a peak voltage and a rise time that is sufficient to generate a more strongly-ionized plasma.

Abstract: Embodiments discussed herein generally include electrodes having parallel ferrite boundaries that suppress RF currents perpendicular to the ferrite boundary and absorb magnetic field components parallel to the boundary. The ferrites cause the standing wave to stretch outside the ferrites and shrink inside the ferrite. A plurality of power sources are coupled to the electrode. The phase of the VHF current delivered from the power sources may be modulated to move the standing wave that is perpendicular to the ferrites in a direction parallel to the ferrites. Thus, the VHF current on the uncovered electrode area will be a plane wave, quasi-uniform (in a direction perpendicular to the ferrites) propagating in the direction parallel to the ferrites.

Abstract: An electrode for an electrical-discharge surface-treatment method is molded with a metallic powder or a metallic compound powder having an average grain diameter of 6 micrometers to 10 micrometers. A coat on a surface of a workpiece is formed with a material constituting the electrode or a substance that is generated by a reaction of the material due to a pulse-like electrical discharge. The coat is built up with a material containing metal as a main constituent under conditions of a width of a current pulse for the pulse-like electrical discharge in a range of 50 microseconds to 500 microseconds and a peak of the current pulse equal to or less than 30 amperes.

Abstract: A gas purifying device (10) includes a first electric field forming unit which forms an electric field for discharge in a gas channel (36) in which a purification target gas (EG) flows to generate a discharge plasma (P), and charges and burns PM included in the purification target gas (EG) by action of the discharge plasma (P), a second electric field forming unit which forms an electric field for dust collection to capture the charged PM by an electrical dust collection function and draw out the discharge plasma (P) to the gas channel side, and a charge electrode (35) for charging a flowing purification target gas (EG), which is disposed on an upstream side positions where the first electric field forming unit and the second electric field forming unit are disposed.

Abstract: The object of the present invention is a method and an apparatus for underwater decomposition of organic content of aqueous waste solutions, involving the measurement and, if necessary, adjustment of the pH and electric conductivity of the solution, maintaining optimum pH and/or electric conductivity during the process, and further involving the partial or total decomposition of organic materials contained by the solution. The apparatus comprises a feed tank, at least one decomposition loop, and a storage tank. The method according to the invention is characterized by submerging electrodes in the solution, producing and maintaining an electric arc between the electrodes and the electrically conductive the solution, where the arc is produced by an electric current of at least 0.