Abstract: An organic light-emitting device an improved anode structure and an organic electroluminescent display device using the same are provided. The anode structure has a 3 layers stack structure in which a layer closest to an organic light-emissive layer of the organic light-emitting device is made of a material with a high work function such as 5.1 to 5.3 eV. Thus, hole injection efficiency is improved and occurrence of dark spots is suppressed.

Abstract: In a method of manufacturing a reflective mask, a photo resist layer is formed over a mask blank. The mask blank includes a substrate, a reflective multilayer on the substrate, a capping layer on the reflective multilayer, an absorber layer on the capping layer and a hard mask layer, and the absorber layer is made of Cr, CrO or CrON. The photo resist layer is patterned, the hard mask layer is patterned by using the patterned photo resist layer, the absorber layer is patterned by using the patterned hard mask layer, and an additional element is introduced into the patterned absorber layer to form a converted absorber layer.

Abstract: A composite pane with an electrically switchable functional element, includes first and second panes, a thermoplastic intermediate layer joining the first pane to the second pane and including a first laminating film with a thickness of at least 0.3 mm and a second laminating film with a thickness of at most 70 ?m. The first laminating film is inserted substantially areally between the first and second panes. The second laminating film is inserted exclusively in the region of the at least one functional element and protrudes with an overhang x of at least 1 mm and at most 10 mm beyond the outer edges of the functional element. The direct layer sequence in the region of an electrically switchable functional element consists of the first pane, the second laminating film, the electrically switchable functional element, optionally, a further second laminating film, the first laminating film, and the second pane.

Abstract: A process comprises cold-forming a flat glass substrate into a non-planar shape using a die. The cold-formed glass substrate is bonded to a non-planar rigid support structure at a plurality of non-planar points using the die. Bonding methods include injection molding the non-planar rigid support structure, and direct bonding. An article is also provided, comprising a cold-formed glass substrate having opposing major surfaces and a curved shape, the opposing major surfaces comprising a surface stress that differ from one another. The cold-formed glass substrate is attached to a rigid support structure having the curved shape. The cold-formed glass substrate includes an open region not in direct contact with the non-planar rigid support structure, and the open region has a curved shape maintained by the non-planar rigid support structure.

Abstract: A display panel and a display device are provided. The display panel includes a stretchable display area; and the stretchable display area includes a plurality of island-shaped structures and a plurality of stretchable bridges. A stretchable bridge of the plurality of stretchable bridges is configured to connect adjacent island-shaped structures of the plurality of island-shaped structures; at least one pixel is disposed on an island-shaped structure of the plurality of island-shaped structures; the stretchable display area includes a first stretchable display area and a second stretchable display area adjacent to the first stretchable display area; the first stretchable display area is disposed corresponding to an under-screen camera; and a stretchable degree of the first stretchable display area is greater than a stretchable degree of the second stretchable display area.

Abstract: A material includes a transparent substrate coated with a stack of thin layers acting on infrared radiation including at least one functional layer. The stack includes a protective coating deposited above at least a part of the functional layer. The protective coating includes at least one lower protective layer based on titanium and zirconium, these two metals being in the metal, oxidized or nitrided form, and at least one upper protective layer of carbon, within which layer the carbon atoms are essentially in an sp2 hybridization state, located above the layer based on titanium and zirconium.

Abstract: A micromechanical component, including an adjustable part that is connected, at least via springs, to the mounting, and an actuator device with which a first oscillating motion of the adjustable part is excitable about a first rotational axis and at the same time a second oscillating motion of the adjustable part is excitable about a second rotational axis. The actuator device includes four piezoelectric bending actuators, and the adjustable part is settable into the first oscillating motion and/or into the second oscillating motion by deformation of the four piezoelectric bending actuators, and each of the four piezoelectric bending actuators at its first end is anchored to the mounting, and the adjustable part is suspended, at least via the springs, on the four piezoelectric bending actuators.

Abstract: An x-ray spectrometer includes at least one x-ray optic configured to receive x-rays having an incident intensity distribution as a function of x-ray energy and at least one x-ray detector configured to receive x-rays from the at least one x-ray optic and to record a spatial distribution of the x-rays from the at least one x-ray optic. The at least one x-ray optic includes at least one substrate having at least one surface extending at least partially around and along a longitudinal axis. A distance between the at least one surface and the longitudinal axis in at least one cross-sectional plane parallel to the longitudinal axis varies as a function of position along the longitudinal axis. The at least one x-ray optic further includes at least one mosaic crystal structure and/or a plurality of layers on or over at least a portion of the at least one surface.

Abstract: A material includes a transparent substrate coated with a stack of thin layers including at least one functional coating including at least one silver-based metal functional layer, and at least one niobium-based metal or nitride functional layer.

Abstract: A sputtering target structure includes a body having a first side and an opposing second side. A first sputtering target is coupled to the first side of the body. The first sputtering target includes a first material. A second sputtering target is coupled to the second side of the body. The second sputtering target includes a second material. A rotation mechanism is coupled to the body and is configured to allow rotation of the body from a first orientation to a second orientation.

Abstract: Disclosed herein is a cooking apparatus capable of cooking a plurality of cooking materials using a heat transfer regulator having a plurality of regions in which a reflectance against heat generated by a heater is variable, and a controlling method thereof. In accordance with one aspect of the present disclosure, a cooking apparatus includes at least one heater and a heat transfer regulator provided to face the at least one heater and provided with a plurality of regions each having a different reflectance against heat generated by the at least one heater.

Abstract: A method for reducing the adhesion of dirt to a substrate is provided, where a thin, incompletely closed layer of a material is deposited on at least one surface area of the substrate by means of a vacuum deposition process, and then said surface area is acted upon by accelerated ions.

Abstract: A window or other component may have glass layers and an interposed polymer layer in which a textured light-scattering layer with a diffuse reflectivity is embedded. The textured light-scattering layer may have a textured polymer carrier film coated with a partially reflective layer such as a metal layer. The polymer carrier film may be textured to cause gaps to form within the partially reflective layer. The gaps may be patterned to form ohmic heating current paths or other signal paths through the partially reflective layer. The partially reflective layer may also serve as an electrode in a light modulator such as a liquid crystal light modulator or other light modulator. Images may be projected onto the textured light-scattering layer. The light-scattering layer may also help extract light from a light guiding layer adjacent to the partially reflective layer.

Abstract: A laminated metal consisting of any metallic or semi-metallic base material onto which alternate layers of monocrystalline nickel and monolayer graphene are deposited. The base material can be any metal, such as alloys of steel, copper, aluminum, nickel, palladium, cobalt, platinum, or silicon. The finished material will have one or more layers of nickel/graphene on its surface. In the case of wire, the layers are coaxial to the core material.

Abstract: Selective solar absorbent coating and manufacturing method, with solar absorption and low emissivity properties. The coating comprises a substrate (1) of metal, dielectric or ceramic material, at least one highly reflective metal layer (2) in mid-far infrared applied to the substrate itself which provides low emissivity properties, a mufti-layer structure of alternating dielectric and metallic layers (3) of subnanometric thickness applied to the reflective metal layer and at least one dielectric layer (4) that acts as an anti-reflective layer for the solar spectrum. The coating is applicable as a selective absorbent coating in absorbent tubes for parabolic-trough solar collectors, in solar panels for hot water, heating or domestic cooling, both in the form of absorbent tubes and absorbent sheets, in capture systems in tower solar thermoelectric power plants, and in capture systems in Stirling disk systems.

Abstract: An infrared-ray reflective film (100) of the present invention is configured by disposing an infrared reflective layer (20) and a transparent protective layer (30) on a transparent film backing (10) in this order. The infrared reflective layer (20) comprises: a first metal oxide layer (21); a metal layer (25) made of a silver alloy containing silver in an amount of 96 to 99.9 weight %; and a second metal oxide layer (22), which are arranged in this order from the side of the transparent film backing (10), wherein each of the first metal oxide layer (21) and the second metal oxide layer (22) is in direct contact with the metal layer (25). There is no metal layer between the transparent film backing (10) and the infrared reflective layer (20) and between the infrared reflective layer (20) and the transparent protective layer (30). Preferably, the infrared-ray reflective film of the present invention has a visible ray transmittance of 65% or more, a shading coefficient of less than 0.

Abstract: A building material includes a base material, a first mirror coating formed on the surface of the base material, a second mirror coating formed on the surface of the first mirror coating, wherein the first mirror coating contains a filler and a first resin material, the pencil hardness of the first mirror coating is in the range of about 3H to about 8H, the second mirror coating contains at least a second resin material, and the pencil hardness of the second mirror coating is in the range of about B to about 2H.

Abstract: A dielectric mirror includes a coating having alternating high and low index layers. The mirror coating has no metallic reflective layer, and may have film side and/or glass side visible reflection of from about 50-90% (more preferably from about 60-80% and most preferably from about 65-75%) and visible transmission of from about 10-50% (more preferably from about 20-40%, and most preferably from about 25-35%).

Abstract: The present invention addresses the issue of providing an optical selective film that contributes to efficiently converting light into heat. This optical selective film is characterized in that: the optical selective film includes at least an Ag-containing layer, and an Ag diffusion prevention layer that is disposed adjacent to the Ag-containing layer; and the Ag diffusion prevention layer contains FeSix (X=1 to 2).

Abstract: An architectural transparency includes a substrate, a first dielectric layer formed over at least a portion of the substrate, a continuous metallic layer formed over at least a portion of the first dielectric layer, a second dielectric layer formed over at least a portion of the first metallic layer, and a subcritical metallic layer formed over at least a portion of the second dielectric layer such that the subcritical metallic layer forms discontinuous metallic regions.

Abstract: A display device includes a printed circuit board (PCB) having a plurality of light emitting members, an anti-moiré member spaced away from the plurality of light emitting members at about a first distance (d), and a frame member receiving the PCB such that the PCB is interposed between the anti-moiré and the frame member. The anti-moiré member includes a first layer disposed to face the PCB and having a first foil with a randomized pattern surface. The first distance (d) equals L/(2*tan (?)). The second distance (L) is a shortest distance between two adjacent light emitting members. Each of the array of light emitting members has a radiation angle ?.

Abstract: A coated glass pane comprising at least the following layers in sequence: a glass substrate; a lower anti-reflection layer; a silver-based functional layer; a barrier layer, comprising at least the following three partial barrier layers in sequence from the silver-based functional layer, a lower partial barrier layer based on an oxide of Zn, Ti, ZnSn, InSn, Zr, Al, Sn and/or Si, and/or an (oxi)nitride of Si and/or of Al, having a thickness of at most 5 nm, a central partial barrier layer based on an oxide of Zn, Ti, Zn Sn, InSn, Zr, Al, Sn and/or Si, and/or an (oxi)nitride of Si and/or of Al, having a thickness of at most 5 nm, and an upper partial barrier layer based on an oxide of Zn, Ti, Zn Sn, InSn, Zr, Al, Sn and/or Si, and/or an (oxi)nitride of Si and/or of Al, having a thickness of at most 10 nm; and an upper anti-reflection layer; wherein the central partial barrier layer has a different composition to both the lower partial barrier layer and the upper partial barrier layer.

Abstract: Provided is a thermal insulation laminate having both of an excellent thermal insulation property and high visible light transmittance, and further having a provided antifouling property and an excellent scratch resistance. A thermal insulation laminate includes a photocatalytic layer (4); a transparent thermal insulation layer (10) having two transparent base plates (1, 1) and composite materials including a fiber assembly (2) and inorganic particles (3) therebetween; and an adhesive layer (5); the photocatalytic layer (4) is an outermost layer of one side thereof, and the adhesive layer (5) is an outermost layer of other side. A hard coat layer may be sandwiched in either at least one of between the photocatalytic layer (4) and the transparent thermal insulation layer (10), and between the transparent thermal insulation layer (10) and the adhesive layer (5).

Abstract: The invention relates to a transparent substrate for an organic light-emitting device comprising an electrode-bearing carrier, said electrode consisting in a multilayer comprising at least, in order starting from the substrate, a first dielectric layer (D1), a first conduction metal layer (M1), a second dielectric layer (D2), a second conduction metal layer (M2), and a third dielectric layer (D3), the conduction metal layers (M) in the electrode (11) being two in number, and the third dielectric layer (D3) not comprising an indium-oxide-based layer. It is characterised in that the geometric thickness of the second dielectric layer (D2) is at least 65 nm and the geometric thickness of the first conduction metal layer (M1) is at least 8.5 nm.

Abstract: A method of in situ treating an optical component reflecting EUV and/or soft X-ray radiation in an optical device includes providing at least one source of one or several surface materials in a vacuum chamber of the optical device where the optical component is arranged. The optical component includes one or several reflecting surfaces having a top layer of one or several surface materials. The method includes providing a source of the one or several surface materials in the chamber, and depositing surface material from the source on the one or several reflecting surfaces during operation and/or during operation-pauses of the optical device in order to cover or substitute deposited contaminant material and/or to compensate for ablated surface material.

Abstract: An infrared reflector is provided. The infrared reflector includes a metallic substrate coated with a layer of zirconium and chromium nitride of general formula (ZrxCr1-x)1-yNy with x between 0.15 and 0.7 and y between 0.01 and 0.265. A method of manufacturing this infrared reflector is also provided.

Abstract: In a method for forming a metal fluoride film, a metal fluoride film is formed on a substrate by sputtering using a metal target and a mixed gas containing O2 gas and a reactive gas being a fluorocarbon gas.

Abstract: A textured reflector for a solar cell of thin film type is produced by deposition of a metal film on a support through openings of a mask. The mask is formed by a thin film formed by coplanar and preferably joined balls, the gaps between the balls forming the openings of the mask. The thin film is further advantageously formed by balls made from silica or from polymer material.

Abstract: A mirror (1) for the EUV wavelength range having a reflectivity of greater than 40% for at least one angle of incidence of between 0° and 25° includes a substrate (S) and a layer arrangement, wherein the layer arrangement has at least one non-metallic individual layer (B, H, M), and wherein the non-metallic individual layer (B, H, M) has a doping with impurity atoms of between 10 ppb and 10%, in particular between 100 ppb and 0.1%, providing the non-metallic individual layer (B, H, M) with a charge carrier density of greater than 6*1010 cm?3 and/or an electrical conductivity of greater than 1*10?3 S/m, in particular with a charge carrier density of greater than 6*1013 cm?3 and/or an electrical conductivity of greater than 1 S/m.

Abstract: an anisotropic conductive adhesive which uses conductive particles where a silver-based metal is used as a conductive layer, having high light reflectance and excellent migration resistance is provided. The anisotropic conductive adhesive includes light reflective conductive particles in an insulating adhesive resin. The light reflective conductive particle includes a light reflective metal layer made of a metal alloy including silver, gold and hafnium formed on the surface of a resin particle as a core by sputtering method. The light reflective metal layer is preferably formed having a composition ratio of a silver of at least 50% by weight to at most 80% by weight: a gold of at least 10% by weight to at most 45%: a hafnium of at least 10% by weight to at most 40% by weight, and a total ratio does not exceed 100% by weight.

Abstract: A chromium-based reflective coating for a polymeric substrate, wherein the coating has a thickness of 200 nm or less and is an alloy of chromium and a dopant material, the dopant material being selected from the hexagonally close-packed transition metals, the alloy having a crystal structure of a primary body-centered cubic phase in coexistence with a secondary omega hexagonally close-packed phase.

Abstract: The present invention discloses an improved method of LED reflector manufacturing process where the method includes providing a substrate, wherein said substrate comprises a reflector unit, and a Light Emitting Diode; providing a shield member with ferromagnetic property; placing said shield member over the desired area of over the substrate; providing a magnet where said shield member is attracted to; placing said magnet immediately below the substrate wherein said magnet is capable of immobilizing the shield member over the substrate; performing a vacuum deposition coating; and removing the magnet and the shield member.

Abstract: A method of fabricating a component for use in a watch includes a step of depositing a first thin film on a wafer wherein the first thin film is adapted to allow light reflected away from the wafer to be indicative of a first color characteristic. The step of depositing the first thin film is performed by using a plasma-enhanced chemical vapor deposition process or a low pressure chemical vapor deposition process. The method may further include a step of fabricating a second color characteristic, including defining a pattern on the first thin film using photolithography, and, processing a region within a boundary of the pattern so that the region is adapted to allow light reflected away from the wafer to be indicative of the second color characteristic. The step of processing the region within the boundary of the pattern includes depositing a metal or a ceramic material within the boundary of the pattern which is indicative of the second color characteristic.

Abstract: A method for forming boron oxide films formed using reactive sputtering. The boron oxide films are candidates as an anti-reflection coating. Boron oxide films with a refractive index of about 1.38 can be formed. The boron oxide films can be formed using power densities between 2 W/cm2 and 11 W/cm2 applied to the target. The oxygen in the reactive sputtering atmosphere can be between 40 volume % and 90 volume %.

Abstract: A method and apparatus for forming a thin film of a copper indium gallium selenide (CIGS)-type material are disclosed. The method includes providing first and second targets in a common sputtering chamber. The first target includes a source of CIGS material, such as an approximately stoichiometric polycrystalline CIGS material, and the second target includes a chalcogen, such as selenium, sulfur, tellurium, or a combination of these elements. The second target provides an excess of chalcogen in the chamber. This can compensate, at least in part, for the loss of chalcogen from the CIGS-source in the first target, resulting in a thin film with a controlled stoichiometry which provides effective light absorption when used in a solar cell.

Abstract: Disclosed herein are systems, methods, and apparatus for forming low emissivity panels. In some embodiments, a partially fabricated panel may be provided that includes a substrate, a reflective layer formed over the substrate, and a barrier layer formed over the reflective layer such that the reflective layer is formed between the substrate and the barrier layer. The barrier layer may include a partially oxidized alloy of three or more metals. A first interface layer may be formed over the barrier layer. A top dielectric layer may be formed over the first interface layer. The top dielectric layer may be formed using reactive sputtering in an oxygen containing environment. The first interface layer may prevent further oxidation of the partially oxidized alloy of the three or more metals when forming the top dielectric layer. A second interface layer may be formed over the top dielectric layer.

Abstract: The invention is related to a process to apply a heater function to a plastic glass that was made of a polycarbonate. The process includes a sputtering process that allows producing high performance heater function on a plastic glass. Another aspect of the invention is the plastic glass mirrors produced by the inventive process.

Abstract: Disclosed herein are systems, methods, and apparatus for forming a low emissivity panel. In various embodiments, a partially fabricated panel may be provided. The partially fabricated panel may include a substrate, a reflective layer formed over the substrate, and a top dielectric layer formed over the reflective layer such that the reflective layer is formed between the substrate and the top dielectric layer. The top dielectric layer may include tin having an oxidation state of +4. An interface layer may be formed over the top dielectric layer. A top diffusion layer may be formed over the interface layer. The top diffusion layer may be formed in a nitrogen plasma environment. The interface layer may substantially prevent nitrogen from the nitrogen plasma environment from reaching the top dielectric layer and changing the oxidation state of tin included in the top dielectric layer.

Abstract: Low emissivity panels can include a separation layer of Zn2SnOx between multiple infrared reflective stacks. The low emissivity panels can also include NiNbTiOx as barrier layer. The low emissivity panels have high light to solar gain, color neutral, together with similar observable color before and after a heat treatment process.

Abstract: Systems and methods for improving the performance of one way mirror applications are disclosed. Methods consistent with the present disclosure include introducing a glass substrate into a processing chamber. The processing chamber comprises a sputter target assembly disposed over the substrate. Next, depositing metal silicide material within a plurality of site-isolated regions on the substrate to form a metal silicide coating within each region. Notably, each metal silicide coating has a thickness between 0.001 and 0.5 microns. Finally, evaluating results of the metal silicide coating formed within the plurality of site-isolated regions.

Abstract: Disclosed herein are systems, methods, and apparatus for forming low emissivity panels that may include a first reflective layer, a second reflective layer, and a spacer layer disposed between the first reflective layer and the second reflective layer. In some embodiments, the spacer layer may have a thickness of between about 20 nm and 90 nm. The spacer layer may include a bi-metal oxide that may include tin, and may further include one of zinc, aluminum, or magnesium. The spacer layer may have a substantially amorphous structure. Moreover, the spacer layer may have a substantially uniform composition throughout the thickness of the spacer layer. The low emissivity panel may be configured to have a color change as determined by Rg ?E (i.e. as determined on the glass side) that is less than about 1.7 in response to an application of a heat treatment to the low emissivity panel.

Abstract: A layer system that can be annealed comprises a transparent substrate, preferably a glass substrate, and a first layer sequence which is applied directly to the substrate or to one or more bottom layers that are deposited onto the substrate. The layer sequence includes a substrate-proximal blocking layer, a selective layer and a substrate-distal blocking layer. Also provided is a method for producing a layer system that can be annealed and has a sufficient quality even under critical climatic conditions and/or undefined conditions of the substrate. During the heat treatment (annealing, bending), the color location of the layer system is maintained substantially stable and the color location can be widely varied at a low emissivity of the layer system. For this purpose, a first dielectric intermediate layer is interposed between the substrate-proximal blocking layer and the selective layer and is configured as a substoichiometric gradient layer.

Abstract: Method and apparatus for sputter depositing silver selenide and controlling defect formation in and on a sputter deposited silver selenide film are provided. A method of forming deposited silver selenide comprising both alpha and beta phases is further provided. The methods include depositing silver selenide using sputter powers of less than about 200 W, using sputter power densities of less than about 1 W/cm2, using sputter pressures of less than about 40 mTorr and preferably less than about 10 mTorr, using sputter gasses with molecular weight greater than that of neon, using cooling apparatus having a coolant flow rate at least greater than 2.5 gallons per minute and a coolant temperature less than about 25° C., using a magnetron sputtering system having a magnetron placed a sufficient distance from a silver selenide sputter target so as to maintain a sputter target temperature of less than about 350° C. and preferably below about 250° C.

Abstract: The invention relates to multilayer systems for selective reflection of electromagnetic radiation from the wavelength spectrum of sunlight, and to a method for producing said systems on suitable, preferably polymeric, carrier materials. Such a multilayer system of the invention is formed with at least one layer composed of silver or silver alloy, which is coated over the whole area on both surfaces with in each case a seed layer and a cap layer. In this case, the seed layer and cap layer are formed from dielectric material. These are ZnO and/or ZnO:X. In this case, at least one such multilayer system is formed on a flexible polymeric substrate, preferable a film which is optically transparent in the visible spectral range.

Abstract: An anisotropic conductive adhesive which uses conductive particles where a silver-based metal is used as a conductive layer, having high light reflectance and excellent migration resistance is provided. The anisotropic conductive adhesive includes light reflective conductive particles in an insulating adhesive resin. The light reflective conductive particle includes a light reflective metal layer made of a metal having at least 60% of reflectance at a peak wavelength of 460 nm formed on the surface of a resin particle as a core, and a coating layer made of a silver alloy formed on the surface of the light reflective metal layer. The light reflective metal layer is preferably formed by a plating method.

Abstract: A multilayer mirror for use in device lithography is configured to reflect and/or pattern radiation having a wavelength in the range of about 6.4 nm to about 7.2 nm. The multilayer mirror has a plurality of alternating layers of materials. The plurality of alternating layers of materials include first layers of materials and second layers of materials. The second layers have a higher refractive index for the radiation than the first layers. The materials of the first layers and the materials of the second layers are mutually chemically unreactive at an interface therebetween at temperatures less than 300° C. This may allow the mirrors to have a narrow boundary region of intermingled materials from alternating layers between the layers, for example of 0.5 nm or less in width, which may improve sharpness of the boundary region and improve reflectivity.

Abstract: Conventional electrochromic devices frequently suffer from poor reliability and poor performance. Improvements are made using entirely solid and inorganic materials. Electrochromic devices are fabricated by forming an ion conducting electronically-insulating interfacial region that serves as an IC layer. In some methods, the interfacial region is formed after formation of an electrochromic and a counter electrode layer. The interfacial region contains an ion conducting electronically-insulating material along with components of the electrochromic and/or the counter electrode layer. Materials and microstructure of the electrochromic devices provide improvements in performance and reliability over conventional devices.

Abstract: Conventional electrochromic devices frequently suffer from poor reliability and poor performance. Improvements are made using entirely solid and inorganic materials. Electrochromic devices are fabricated by forming an ion conducting electronically-insulating interfacial region that serves as an IC layer. In some methods, the interfacial region is formed after formation of an electrochromic and a counter electrode layer. The interfacial region contains an ion conducting electronically-insulating material along with components of the electrochromic and/or the counter electrode layer. Materials and microstructure of the electrochromic devices provide improvements in performance and reliability over conventional devices.

Abstract: A method of coating a rear glass substrate for an electrochromic reflective element includes providing a fixture having a recess and a masking element extending from a perimeter region of the recess over a portion of the recess. The masking element includes a disc portion and an arm portion extending between the disc portion and the perimeter region of the recess of the fixture. A rear glass substrate is positioned in the recess and the masking element extends over and is spaced from the surface of the glass substrate. The glass substrate surface is coated with a mirror reflector coating. The masking element is shaped such that the mirror reflector coating is deposited at the surface behind the arm portion but is substantially not deposited behind the disc portion so as to establish a window region through the mirror reflector coating at the glass substrate surface.

Abstract: The present invention relates to a double-multilayer monochromator. The monochromator comprises a base, a housing moveably mounted on the base and having in one side thereof at least one inlet window for the inlet of a X-ray beam and in another side thereof an outlet window for the outlet a monochromatized X-ray beam, support means mounted in the housing to support opposed mirror pairs, wherein each of the mirrors has a coated surface, each of said coated mirror surfaces being coated with a multilayer coating in alternating layers of a scatterer material (A) having a thickness dA and a spacer material (B) having a thickness dB. The present monochromator provides an enhanced purity of the synchrotron beam, where even and odd orders of higher harmonics are rejected. This is achieved in that the ratio dA:(dA+dB) on one of the facing mirrors of the mirror pairs is about 1:2 and the ratio dA:(dA+dB) on the other of the facing mirrors of the mirror pairs is about 1:3.