Abstract: To lower electrical resistance by increasing the interfacial surface area and the adhesion between a current collector and an active material or an electrolyte, or between the active material and the electrolyte in an all-solid-state battery. In addition, to improve battery performance by eliminating or minimizing residual carbon originating from a binder. A slurry, composed of an electrode active material and a solvent, and a slurry, composed of electrolyte particles and a solvent, can be impacted against a target and thereby attached thereto to form a high-density layer and improve adhesion. Moreover, residual carbon is eliminated or minimized by eliminating or minimizing the content of binders, thereby improving battery performance.

Abstract: A photovoltaic device comprises plural layers separated into plural cells, each comprising a region of a photoactive layer and electrodes on opposite sides thereof. Each of the regions of the photoactive layer are formed comprising a first part that comprises photoactive material and a second part that is not photoactive and that has a greater transmittance of visible light than the light absorbing photoactive material, in pre-selected locations, or in a pre-selected distribution of locations, across the region of the photoactive layer. One of the first and second parts are located in plural separate areas within the other of the first and second parts. The transparency of the photovoltaic device is increased by the transmission of light through the second part that is not photoactive.

Abstract: In some embodiments, a method of processing a substrate disposed atop a substrate support in a physical vapor deposition process chamber includes: (a) forming a plasma from a process gas within a processing region of the physical vapor deposition chamber, wherein the process gas comprises an inert gas and a hydrogen-containing gas to sputter silicon from a surface of a target within the processing region of the physical vapor deposition chamber; and (b) depositing an amorphous silicon layer atop a first layer on the substrate, wherein adjusting the flow rate of the hydrogen containing gas tunes the optical properties of the deposited amorphous silicon layer.

Abstract: A scan display system includes a picture receiving unit, a scan needle, a picture display screen having first and second opposing surfaces, and a driving unit. The scan needle includes a substrate, a first color light emitting pixel array comprising a plurality of first color light emitting pixels, a second color light emitting pixel array comprising a plurality of second color light emitting pixels, and a third color light emitting pixel array comprising a plurality of third color light emitting pixels. The first color light emitting pixel array is parallel to the second color light emitting pixel array, and the second color light emitting pixel array is parallel to the third color light emitting pixel array. The first color light emitting pixel array, the second color light emitting pixel array, and the third color light emitting pixel array extend in the horizontal direction.

Abstract: Disclosed is a method of forming wiring of a substrate includes masking a substrate side portion, on which the wiring will be formed, by attaching a deposition mask to the substrate; and forming the wiring on the substrate side portion based on sputtering after introducing the masked substrate into a chamber.

Abstract: A laminate can include a first panel and including a first transparent substrate having a first refractive index. The laminate can further include a second panel and a third panel, each coupled to the first panel. The second panel includes a second transparent substrate having a second refractive index, and the third panel includes a third transparent substrate having a third refractive index. The laminate can further include a fill material disposed within a gap between the second and third panels and having a fill material refractive index. The fill material refractive index is within 0.09 of the second refractive index, the third refractive index, or a value between the second and third refractive indices. Coupling may be direct or may be achieved with an adhesive film. The fill material can help to reduce the likelihood of seeing seams between the second and third panels.

Abstract: A treatment method of a sapphire material, said method comprising bombardment of a surface of the sapphire material, said surface facing a medium different from the sapphire material, by a single- and/or multi-charged gas ion beam so as to produce an ion implanted layer in the sapphire material, wherein the ions are selected from ions of the elements from the list consisting of helium (He), neon (Ne), argon (Ar), krypton (Kr), xenon (Xe), boron (B), carbon (C), nitrogen (N), oxygen (O), fluorine (F), silicon (Si), phosphorus (P) and sulphur (S). Use of said method to obtain a capacitive touch panel having a high transmission in the visible range.

Abstract: A process for manufacturing an electrochromic glazing unit includes forming, on one face of a glass sheet, a complete all-solid-state electrochromic stack including in succession a first layer of a transparent conductive oxide; a layer of a cathodically colored mineral electrochromic material to form an electrochromic electrode; a layer of an ionically conductive mineral solid electrolyte; a layer of a cation intercalation material to form a counter electrode; and a second layer of a transparent conductive oxide; then heat treatment of the complete electrochromic stack by irradiation with radiation having a wavelength comprised between 500 and 2000 nm, the radiation originating from a radiating device placed facing the electrochromic stack, a relative movement being created between the radiating device and the substrate so as to raise the electrochromic stack to a temperature at least equal to 300° C. for a brief duration, for example shorter than 100 milliseconds.

Abstract: A method of forming a resistive random access memory device which contains uniform layer composition is provided. The method enables the in-situ deposition of a bottom electrode layer (i.e., a metal layer), a resistive switching element (i.e., at least one metal oxide layer), and a top electrode layer (i.e., a metal nitride layer and/or a metal layer) with compositional control. Resistive random access memory devices which contain uniform layer composition enabled by the in-situ deposition of the bottom electrode layer, the resistive switching element, and the top electrode layer provide significant benefits for advanced memory technologies.

Abstract: A coated article includes a low emissivity (low-E) coating supported by a glass substrate. The low-E coating includes at least one silver (Ag) based infrared (IR) reflecting layer(s) that is provided adjacent to and contacting at least one protective metallic or substantially metallic doped silver layer in order to improve chemical durability characteristics of the low-E coating. The silver based IR reflecting layer and adjacent protective doped silver layer are part of a low emissivity (low-E) coating, and may be sandwiched between at least transparent dielectric layers. A barrier layer including Ni and/or Cr may be provided over and directly contacting the protective doped silver layer in order to further improve durability of the low-E coating.

Abstract: Embodiments disclosed therein generally pertain to selectively strengthening glass. More particularly, techniques are described for selectively strengthening cover glass, which tends to be thin, for electronic devices, namely, portable electronic devices.

Abstract: The present invention generally comprises a semiconductor film and the reactive sputtering process used to deposit the semiconductor film. The sputtering target may comprise pure zinc (i.e., 99.995 atomic percent or greater), which may be doped with aluminum (about 1 atomic percent to about 20 atomic percent) or other doping metals. The zinc target may be reactively sputtered by introducing nitrogen and oxygen to the chamber. The amount of nitrogen may be significantly greater than the amount of oxygen and argon gas. The amount of oxygen may be based upon a turning point of the film structure, the film transmittance, a DC voltage change, or the film conductivity based upon measurements obtained from deposition without the nitrogen containing gas. The reactive sputtering may occur at temperatures from about room temperature up to several hundred degrees Celsius. After deposition, the semiconductor film may be annealed to further improve the film mobility.

Abstract: The disclosure discloses a method and apparatus for measuring a size of a crystal grain, and a method for fabricating a poly-silicon thin film. The method for measuring the size of the crystal grain includes: obtaining a grain morphology image of a crystalline region of a crystal, and drawing a grain interface diagram according to the grain morphology image; measuring at least one crystal grain in the grain interface diagram, and determining a transverse size and a longitudinal size of each measured crystal grain; and determining a transverse size and a longitudinal size of a crystal grain of the crystal according to the transverse size and the longitudinal size of each measured crystal grain.

Abstract: Provided is a method for producing a glass unit. The method comprises a step (A) of obtaining a glass plate comprising a glass substrate and a Low-E layer placed on the glass substrate; a step (B) of applying a protective sheet to the Low-E layer surface of the glass plate; an optional step (C) of subjecting the glass plate to at least one process selected from the group consisting of transportation, storage, processing, washing and handling; a step (D) of removing the protective sheet from the glass plate; and a step (E) of assembling a glass unit using the glass plate. The protective sheet comprises a substrate layer, and a PSA layer provided to at least one face of the substrate layer. The PSA layer comprises, as a corrosion inhibitor, a surfactant free of sulfur atoms.

Abstract: A coated article includes a low emissivity (low-E) coating supported by a glass substrate. The low-E coating includes at least one silver (Ag) based infrared (IR) reflecting layer(s) that is provided adjacent to and contacting at least one protective metallic or substantially metallic doped silver layer in order to improve chemical durability characteristics of the low-E coating. The silver based IR reflecting layer and adjacent protective doped silver layer are part of a low emissivity (low-E) coating, and may be sandwiched between at least transparent dielectric layers. A barrier layer including Ni and/or Cr may be provided over and directly contacting the protective doped silver layer in order to further improve durability of the low-E coating.

Abstract: A contrast-amplifying support for the observation of a sample, comprises a transparent substrate carrying at least one absorbing layer whose complex refractive index N1=n1?jk1 and thickness are chosen in such a way that the layer behaves in the guise of antireflection layer when it is illuminated under normal incidence at an illumination wavelength ? through the substrate, the face of the layer opposite to the d substrate being in contact with a transparent so-called ambient medium whose refractive index n3 is less than that of the refractive index n0 of the substrate. Methods for producing a contrast-amplifying support and for observing a sample, or for detecting or assaying at least one chemical or biological species, using such a contrast-amplifying support are provided.

Abstract: An antistatic article including a substrate having a first surface, a sputtered conductive layer arranged on the first surface and having a thickness ranging from approximately 0.5 nanometers to approximately 10 nanometers, and an outer layer or a series of layers arranged atop the sputtered conductive layer, wherein, the antistatic article exhibits a surface resistivity of less than approximately 1012 ohms/square. A method of making an antistatic article includes pretreating a surface of the substrate, sputtering the conductive layer onto the surface to a thickness ranging from approximately 0.5 nanometers to approximately 10 nanometers, and sputtering the outer layer and one or more additional layers atop the conductive layer, wherein, the antistatic article exhibits a surface resistivity of less than approximately 1012 ohms/square.

Abstract: A coated article is provided which may be heat treated (e.g., thermally tempered) in certain example instances. In certain example embodiments, the coated article includes a low-emissivity (low-E) coating having a zinc stannate based layer provided over a silver-based infrared (IR) reflecting layer, where the zinc stannate based layer is preferably located between first and second silver based IR reflecting layers. The zinc stannate based layer may be provided between and contacting (i) an upper contact layer of or including Ni and/or Cr (or Ti, or TiOx), and (ii) a layer of or including silicon nitride.

Abstract: A coated article includes a low emissivity (low-E) coating supported by a glass substrate. The low-E coating includes at least one silver (Ag) based infrared (IR) reflecting layer(s) that is provided adjacent to and contacting at least one protective metallic or substantially metallic doped silver layer in order to improve chemical durability characteristics of the low-E coating. The silver based IR reflecting layer and adjacent protective doped silver layer are part of a low emissivity (low-E) coating, and may be sandwiched between at least transparent dielectric layers. A barrier layer including Ni and/or Cr may be provided over and directly contacting the protective doped silver layer in order to further improve durability of the low-E coating.

Abstract: The disclosure is directed to broadband, glass optical polarizers and to methods for making the glass optical polarizers. The glass optical polarizer includes a substantially bubble free fusion drawn glass having two pristine glass surfaces and a plurality of elongated zero valent metallic particle polarizing layers.

Abstract: A method for forming a film with an annealing step and a deposition step is disclosed. The method comprises an annealing step for inducing self-assembly or alignment within a polymer. The method also comprises a selective deposition step in order to enable selective deposition on a polymer.

Abstract: A mask manufacturing method, including manufacturing a first mold, including forming first patterns having inclined surfaces by patterning a silicon substrate; manufacturing a second mold, including forming second patterns that correspond to the first patterns by coating and curing a hardener on a surface of the first mold in which the first patterns are formed; separating the second mold from the first mold; forming a mask pattern by coating a metal layer on the second mold; and separating the metal layer from the second mold.

Abstract: A display substrate, a method for manufacturing the display substrate, a display panel and a display device are disclosed. The display substrate includes a base substrate. At least two refractive layers are provided on the base substrate, and a gate electrode is provided on the refractive layers. A refractive index of the refractive layer of two adjacent refractive layers close to the base substrate is less than a refractive index of the refractive layer of two adjacent refractive layers away from the base substrate, and thicknesses of the refractive layers are n?+?/4, where ? is a wavelength of incident light, and n is a nonnegative integer.

Abstract: A manufacturing method that forms a multilayer thin film on the inner surface of a housing forming a transparent appearance of an electronic product to provide a deep metal texture and an electronic product having a metal texture provided at the inner surface of the housing. The multilayer thin film manufacturing method includes reforming an inner surface of a housing having an outer surface and the inner surface through plasma processing, depositing at least one hardness reinforcement layer on the inner surface, and depositing a color layer on the hardness reinforcement layer.

Abstract: The invention provides a glazing sheet and a low-emissivity coating on the glazing sheet. The low-emissivity coating comprises, in sequence moving outwardly from the glazing sheet, a layer comprising oxide film, nitride film, or oxynitride film, an infrared-reflective film, a nickel-aluminum blocker film, and an oxide film. Also provided are methods of depositing such a low-emissivity coating.

Abstract: A single lithography process for multi-layer metal/dielectric coatings using a series of developing, baking, and lifting steps to coat two or more thin films without re-patterning that results in the encapsulation and profile optimization of multi-spectral patterned thin film coatings is disclosed.

Abstract: The disclosure herein describes methods for Photosensitized Chemically Amplified Resist Chemicals (PS-CAR) to pattern light sensitive films (e.g., photoresist on anti-reflective coatings) on a semiconductor substrate. In one embodiment, a two-step exposure process may generate higher acid concentration regions within a photoresist layer. The PS-CAR chemicals may include photoacid generators (PAGs) and photosensitizer elements that enhance the decomposition of the PAGs into acid. The first exposure may be a patterned EUV or UV exposure that generates an initial amount of acid and photosensitizer. The second exposure may be a non-EUV flood exposure that excites the photosensitizer which increases the acid generation rate where the photosensitizer is located in the film stack. The distribution of energy during the exposures may be optimized by using certain characteristics (e.g., thickness, index of refraction, doping) of the photoresist layer, an underlying layer, and/or an overlying layer.

Abstract: A spectacle lens having a front surface intended to be fitted away from the eye. The spectacle lens includes a substrate made from mineral glass or an organic material. The spectacle lens has selective light wavelength filter properties. The selective light wavelength filter properties include a spectral transmittance between 80% and 95% for all wavelengths in a wavelength range between 428 nm and 452 nm for a light ray entering the spectacle lens on the front surface at an angle of incidence of 0°, a spectral transmittance between 95% and 100% for all wavelengths in a wavelength range between 500 nm and 700 nm for a light ray entering the spectacle lens on the front surface with an angle of incidence of 0° and a yellowness index of no more than 10 for a standard illuminant D65 and a standard observer function of 2° (D65/2°).

Abstract: An interference filter includes a layers stack comprising a plurality of layers of at least: layers of amorphous hydrogenated silicon with added nitrogen (a-Si:H,N) and layers of one or more dielectric materials, such as SiO2, SiOx, SiOxNy, a dielectric material with a higher refractive index in the range 1.9 to 2.7 inclusive, or so forth. The interference filter is designed to have a passband center wavelength in the range 750-1000 nm inclusive. Layers of a dielectric material with a higher refractive index in the range 1.9 to 2.7 inclusive provide a smaller angle shift compared with a similar interference filter using SiO2 as the low index layers.

Abstract: A field-sequential display panel, a field-sequential display apparatus and a driving method are provided. The field-sequential display apparatus includes a liquid crystal display panel and an OLED light source arranged at one side of the liquid crystal display panel where light is incident to provide trichromatic light for pixel cells of the liquid crystal display panel. The OLED light source includes multiple groups of trichromatic light sources, each of the groups of trichromatic light sources includes a first color sub-light source, a second color sub-light source and a third color sub-light source, and each sub-light source includes an anode, a cathode and a light emitting layer between the anode and the cathode.

Abstract: A coated article is provided which may be heat treated (e.g., thermally tempered) in certain example instances. In certain example embodiments, the coated article includes a low-emissivity (low-E) coating having a zinc stannate based layer provided over a silver-based infrared (IR) reflecting layer, where the zinc stannate based layer is preferably located between first and second silver based IR reflecting layers. The zinc stannate based layer may be provided between and contacting (i) an upper contact layer of or including Ni and/or Cr (or Ti, or TiOx), and (ii) a layer of or including silicon nitride.

Abstract: A color splitting/combining prism splits apart illumination light from a projector and combines together projection light from the projector. A part of the illumination light that is not used as the projection light passes through the color splitting/combining prism as OFF-light via an image display element in a direction different from the projection light. The color splitting/combining prism includes a dichroic film of which a cutoff wavelength, at which the dichroic film exhibits a transmittance of 50% when splitting two different colors between reflection and transmission, is provided in a wavelength range in which wavelength separation is possible for all of the illumination light, the projection light, and the OFF-light that are incident at different incidence angles respectively.

Abstract: The present disclosure provides a display device, a device and a method for gamma compensation. The device for gamma compensation includes: a flexure recording module, provided in a flexible display panel, and configured to acquire a flexure count of the flexible display panel; a parameter inquiring module, connected to the flexure recording module, and configured to inquire a corresponding gamma correction value from a comparison table involving a correspondence between flexure counts of the flexible display panel and gamma correction values according to the flexure count of the flexible display panel; and a voltage output module, connected to the parameter inquiring module, and configured to provide a gamma compensation voltage to the flexible display panel according to the gamma correction value.

Abstract: Provided are a color separating and combining prism and an optical system using the same for a projector. A color separating and combining prism (DP) includes dichroic films (B, R) that reflect the light of the wavelength range of either a first or third range from among the first wavelength range of a blue region, a second wavelength range of a green region, and a third wavelength range of a red region, and pass the light of the remaining two adjacent wavelength ranges, and at a specific angle of incidence, the average reflectance in the two wavelength ranges which the films pass is lower than the wavelength average reflectance of the wavelength region sandwiched by the two wavelength ranges.

Abstract: In a method of manufacturing a one-dimensionally varying optical filter, a substrate is coated to form a stack of layers of two or more different types. The coating may, for example, employ sputtering, electron-beam evaporation, or thermal evaporation. During the coating, the time-averaged deposition rate is varied along an optical gradient direction by generating reciprocation between a shadow mask and the substrate in a reciprocation direction that is transverse to the optical gradient direction. In some approaches, the shadow mask is periodic with a mask period defined along the direction of reciprocation, and the generated reciprocation has a stroke equal to or greater than the mask period along the direction of reciprocation. The substrate and the shadow mask may also be rotated together as a unit during the coating. Also disclosed are one-dimensionally varying optical filters, such as linear variable filters, made by such methods.

Abstract: In a MEMS device having a substrate and a moveable micromachined member, a mechanical structure secures the moveable micromachined member to the substrate, thermally isolates the moveable micromachined member from the substrate and provides a conduction path to enable heating of the moveable micromachined member to a temperature of at least 300 degrees Celsius.

Abstract: The present invention is a transparent conductive film having a flexible transparent base and a transparent conductive layer made of a crystalline conductive metal oxide that is formed on one surface of the flexible transparent base, in which the thickness of the flexible transparent base is 80 ?m or less, and the difference H1?H2 between the dimensional change rate H1 when the transparent conductive film is heated at 140° C. for 30 minutes and the dimensional change rate H2 when the transparent conductive layer is removed from the transparent conductive film by etching and the transparent conductive film is heated at 140° C. for 30 minutes is ?0.02 to 0.043%. Because of that, the level difference at the pattern boundary when the film is assembled into a touch panel, etc. is decreased and the deterioration of the appearance can be also suppressed.

Abstract: The present invention relates to a flexible transparent electrode for a dye-sensitized solar cell and a manufacturing method for same, and more specifically, to a flexible Ti—In—Zn—O transparent electrode for a dye-sensitized solar cell and a manufacturing method for same, and to a metal-inserted three-layer transparent electrode with high conductivity using the flexible transparent electrode and a manufacturing method for same, wherein compared with the conventional fluorine-doped tin oxide (FTO) and indium-tin oxide (ITO) transparent electrodes with a high deposition temperature, the flexible transparent electrode, despite being deposited at room or low temperature, has low surface resistance, high conductivity and transmittance, superior resistance against external bending, improved surface characteristics and better surface roughness performance.

Abstract: One object is to provide a structure including a thin primer film formed by a dry process and tightly bound to a fluorine-containing silane coupling agent. In accordance with one aspect, a structure according to an embodiment of the present disclosure includes: a substrate; and a thin primer film containing at least one substance selected from the group consisting of silicon, titanium, aluminum, aluminum oxide, and zirconium and formed on a surface of the substrate by a dry process.

Abstract: The invention provides a glazing sheet and a low-emissivity coating on the glazing sheet. The low-emissivity coating comprises, in sequence moving outwardly from the glazing sheet, a layer comprising oxide film, nitride film, or oxynitride film, an infrared-reflective film, a nickel-aluminum blocker film, and an oxide film. Also provided are methods of depositing such a low-emissivity coating.

Abstract: The invention provides a substrate bearing a low-emissivity coating. The low-emissivity coating comprises at least one graded film region. In certain embodiments, at least one graded film region is provided between the two infrared-reflective layers of a double-type low-emissivity coating. The graded film region has a substantially continuously decreasing concentration of a first dielectric material and a substantially continuously increasing concentration of a second dielectric material. Also provided are methods of depositing such low-emissivity coatings and substrates bearing these coatings.

Abstract: A method of obtaining a substrate coated on a first face with at least one transparent and electrically conductive thin layer based on at least one oxide, including depositing the at least one thin layer on the substrate and subjecting the at least one thin layer to a heat treatment in which the at least one layer is irradiated with aid of radiation having a wavelength between 500 and 2000 nm and focused on a zone of the at least one layer, at least one dimension of which does not exceed 10 cm. The radiation is delivered by at least one radiation device facing the at least one layer, a relative displacement being created between the radiation device and the substrate to treat the desired surface, the heat treatment being such that resistivity of the at least one layer is reduced during the treatment.

Abstract: A method to deposit CIGS thin film for solar panel construction comprising: providing a first chamber; providing a substrate and placing said substrate inside said first chamber; providing a metallic target wherein said metallic target is made with elements and/or compounds selected from the group consisting of Cu, CuGa, In, CuIn and CuInGa; placing said metallic target inside said first chamber; reducing pressure within said first chamber to a pressure of less than 1×10?6 Torr; adding sputtering gas into said first chamber after reducing pressure within said first chamber to a pressure of less than 1×10?6 Torr until said pressure in said chamber is increased to about 100 mTorr or less, sputtering said elements and/or compounds from said metallic target to said substrate; providing a second chamber; transferring said substrate from said first chamber to said second chamber after said substrate is sputtered with said elements; proving a Se vapor into said second chamber; perform vapor deposition as to allow sa

Abstract: The objective of the present invention is to provide a technique capable of easily forming an alloy layer containing an additive metal on an object to provide a concentration gradient in a thickness direction by sputtering in one treatment vessel. That is, the present invention can form a film with the desired concentration, and includes a first film forming process and a second film forming process that changes at least one of, the pressure in the treatment vessel, and the electric power so they are different from the first film forming process, so that the concentration of the additive metal is different from the concentration of the additive metal of the first alloy film.

Abstract: Certain example embodiments relate to robust semi-transparent coatings that are suitable for use in a wide variety of display-on-demand mirror applications, and methods of making the same. In certain example embodiments, a coated article includes a coating supported by a glass substrate. A reflective metal-inclusive layer is formed, directly or indirectly, on the glass substrate. A silicon oxide inclusive layer is formed, directly or indirectly, on the reflective metallic layer. A titanium oxide inclusive layer is formed, directly or indirectly, on the silicon oxide inclusive layer. The metal-inclusive layer is formed so as to reflect incoming light away from the glass substrate such that substantially less incoming light would be reflected away from the glass substrate if lighting were provided on a side of the glass substrate opposite the coating than if no lighting were provided. The surface of the coated article need not necessarily be conductive.

Abstract: A method for forming an anti-reflective coating (ARC) includes positioning a substrate below a target and flowing a first gas to deposit a first portion of the graded ARC onto the substrate. The method includes gradually flowing a second gas to deposit a second portion of the graded ARC, and gradually flowing a third gas while simultaneously gradually decreasing the flow of the second gas to deposit a third portion of the graded ARC. The method also includes flowing the third gas after stopping the flow of the second gas to form a fourth portion of the graded ARC. In another embodiment a film stack having a substrate having a graded ARC disposed thereon is provided. The graded ARC includes a first portion, a second portion disposed on the first portion, a third portion disposed on the second portion, and a fourth portion disposed on the third portion.

Abstract: In a method for forming a metal fluoride film, a metal fluoride film is formed on a substrate by sputtering using a metal target and a mixed gas containing O2 gas and a reactive gas being a fluorocarbon gas.

Abstract: A light-emitting panel includes: a substrate and a light-emitting functional multilayer formed on the substrate, wherein the light-emitting functional multilayer including a first functional layer and a second functional layer, a thickness of part of the first functional layer positioned in a first light-emitting region is smaller than a thickness of part of the first functional layer positioned in a second light-emitting region, a thickness of part of the second functional layer positioned in the first light-emitting region is greater than a thickness of part of the second functional layer positioned in the second light-emitting region, and when the light-emitting functional multilayer is viewed in a layering direction, the first light-emitting region and the second light-emitting region are adjacent or distant from each other in a direction perpendicular to the layering direction, and each include a plurality of pixels that are each composed of a plurality of adjacent sub-pixels.

Abstract: This invention relates to a transparent or translucent transaction card having a base comprising a core of substantially transparent or translucent material with a plurality of coats, including optically recognizable ink comprising one or more infrared blocking dyes and other nanoparticles, such as rare earth nanophosphors and other metal nanoparticles, and/or optically recognizable film comprising nanoparticles, such as rare earth nanophosphors, and other metal oxide and/or non-oxide complexes, and methods for their preparation.

Abstract: Prior electrochromic devices frequently suffer from high levels of defectivity. The defects may be manifest as pin holes or spots where the electrochromic transition is impaired. This is unacceptable for many applications such as electrochromic architectural glass. Improved electrochromic devices with low defectivity can be fabricated by depositing certain layered components of the electrochromic device in a single integrated deposition system. While these layers are being deposited and/or treated on a substrate, for example a glass window, the substrate never leaves a controlled ambient environment, for example a low pressure controlled atmosphere having very low levels of particles. These layers may be deposited using physical vapor deposition.