Abstract: The electrochemical processing of a component such as an injection nozzle, must be calibrated in order to compare the throughput of the nozzle to a standard nozzle. Both throughput rates are determine at the same high pressure which is far above 100 bar. As a throughput medium, electrolyte is used in an ecm unit. From this a sufficient quantity is delivered into a temporarily pressure chamber in which another fluid has been supplied by a high pressure pump. A predetermined high pressure is built up which by way of a highly accurate control valve is maintained during the calibration procedure.

Abstract: A system for screening and measuring the effectiveness of catalysts, comprising an electrolytic cell having a counter electrode comprising a plurality of segmented anodes, each of the anodes electrically isolated from each other, and a catalyst support adapted for holding an associated plurality of cathodes, where each cathode is operatively arranged to function as a working electrode when a discrete catalyst is deposited thereon, wherein the catalyst support positioned between the counter electrode and the working electrodes, and, means for measuring current in each of the plurality of segmented anodes, where the current is an indication of effectiveness of each discrete catalyst.

Abstract: A method composition and apparatus for the hybridization and separation of molecules having a desired target sequence in a sample by contacting a sample of single stranded nucleic acids with a detectable PNA probe having a sequence complementary to the target sequence so that the target sequence, if present, will hybridize with the detectable probe to form a detectable duplex, and then separating the duplex in a denaturing medium from unbound sample components by electrophoresis. The invention also relates to methods compositions and apparatus for the hybridization and separation of molecules having a desired target sequence in a mixed sample of single stranded nucleic acids and their complementary strands by contacting the sample with a detectable PNA probe.

Abstract: An electrochemical reaction assembly and methods of inducing electrochemical reactions, such as for deposition of materials on semiconductor substrates. The assembly and method achieve a highly uniform thickness and composition of deposition material or uniform etching or polishing on the semiconductor substrates by retaining the semiconductor substrates on a moving cathode immersed in an appropriate reaction solution wherein a wire mesh anode rotates about the moving cathode during electrochemical reaction.

Abstract: A sensor for detecting analytes is described. Analyte presence or concentration is determined through measurement of changes in induced electromotive force, current or other electrical property in a base member during analyte exposure to the sensor. According to one class of embodiments, the present device immobilizes natural or synthetic macromolecules sufficiently close to an electrically-conductive base member to insure that any alteration in the motion and/or electrostatic fields of the macromolecules during interaction with a predetermined analyte will induce an increased electromotive force in the base member.

Abstract: A process and apparatus for supplying a soluble metal compound to an electrolyte solution uses a powder wetting device in a loop from a working tank. The powder wetting machine supplies the powdered metal compound directly into the electrolyte solution which rapidly dissolves to replenish the electrolyte compound during the treating process. The process and apparatus are particularly suitable for replenishing the metal salts consumed during an electroplating process.

Abstract: A substrate (155) is placed into a plating bath (19, 59), a current in the bath is measured, and a film (110) is plated onto the substrate (155). In one embodiment the current is measured using a sensing array (57) positioned within the bath, and the measurement is used to control a plating deposition parameter. In an alternative embodiment the current is measured using the sensing array (57) and a characteristic of the plated film is controlled using a corresponding control array (53) also positioned within the plating bath (59).

Abstract: A process and apparatus for forming oxide coatings on bodies of aluminum and aluminum alloys are described. The process includes forming an electrolyte bath in an inert container. At least two reactive metal bodies are suspended in the bath. The bodies are connected to electrodes which, in turn, are connected to a multiphase AC circuit. A multiphase power (preferably three-phase between three bodies) potential is imposed between each of the bodies. The bodies are moved in the electrolyte bath relative to each other until micro-arcs occur on the surfaces of the bodies, whereby to commence oxidation of the bodies. The imposition of the potential between each of the bodies is continued until the desired thickness of oxide is formed on the bodies.

Abstract: An electrochemical deposition and testing system consisting of individually addressable electrode arrays, a fully automated deposition head, and a parallel screening apparatus is described. The system is capable of synthesizing and screening millions of new compositions at an unprecedented rate.

Abstract: A power supply for producing complex non-periodic waveforms from a sum of periodic waveforms is disclosed. The power supply includes a controller which measures the output signal and compares it to the desired signal in order to produce an error signal. The error signal is fed to the power stage and is used to modify the input signal and produce the desired output. The desired signal is programmed by the user by selecting a plurality of pre-defined stored waveforms, modifying them, and arranging them such that the desired complex non-periodic waveform is created. The user can enter the instructions for modifying and arranging the waveforms via a panel having a keypad and display, or using a computer running software which enables the user to modify the stored waveforms on-screen. Such control is particularly useful in industries in which a very specific complex output signal is desirable, such as in the electrolytic plating industry.

Abstract: An apparatus for measuring the throwing power of electroplating solutions which provides a nearly linear current density distribution across the panel. The apparatus includes a cylindrical body adapted for rotation about a longitudinal axis thereof, a cylindrical cathode arranged coaxially about a central portion of the cylindrical body, an anode coaxially positioned at a lower end portion of the cylindrical body, a conical shield coaxially arranged around an upper end portion of the cathode; and an annular disk-baffle coaxially arranged around a lower end portion of the cathode. The conical shield and the disk-baffle provide a substantially linear current distribution over the cathode.

Abstract: The device described herein is an enzyme-based biosensor for detecting and/or quantifying molecules of interest. The biosensor relies on the following properties shared by all enzymes: (1) that enzymes are highly specific molecules designed to bind with only one analyte type or one class of analyte molecules; (2) that enzymes contain charges; (3) that enzymes undergo significant spacial fluctuation during periods of interaction with substrates; and (4) that these spacial fluctuations cause the charged moieties on the enzyme to move and thus generate a measurable electrostatic potential (voltage) in both the enzyme and support layers. The instant device determines analyte presence/concentration through measurement of changes in voltage or current in a conducting or semiconducting support material as a result of changes in the position of immobilized charged enzyme molecules during their interaction with analyte.

Abstract: A barrel plating method wherein each box containing pieces to be plated is provided with a kanban corresponding to the pieces contained in the box. The kanban of each box is read by an apparatus before the pieces are transferred from the box to a plating barrel, so that a plating coefficient corresponding to the information read from the kanban is retrieved from a host computer in which plating coefficients for various kinds of pieces are stored. The plating coefficient retrieved corresponding to the kanban of each box is proportional to a value of plating current to be supplied to a unit weight of pieces contained in the box. A value of plating current for each barrel is automatically calculated by multiplying the plating coefficient by the measured weight of the pieces put in the barrel. Barrel plating is performed by supplying each barrel with the value of the calculated plating current from power sources that correspond in number to barrels that are subjected to a plating process at a given time.

Abstract: A method for producing a photoreceptor having a substrate subjected to a surface finishing treatment to result in a finished substrate surface, wherein the method includes:(a) analyzing the finished substrate surface by performing a first surface energy reading, a first ellipsometry reading, a first x-ray diffraction reading, and a first profilometry reading;(b) removing electrochemically via an alternating voltage or alternating current a portion of the finished substrate surface, thereby resulting in a cleaned substrate surface;(c) analyzing the cleaned substrate surface by performing a second surface energy reading, a second ellipsometry reading, a second x-ray diffraction reading, and a second profilometry reading, wherein the removing step (b) is accomplished to the extent that the second surface energy reading and the second ellipsometry reading are measurably changed from the first surface energy reading and the first ellipsometry reading, but the second x-ray diffraction reading and the second profilo

Abstract: Methods of treating wafers for analyzing defects present therein comprise providing wafers having front side surfaces comprising defective portions and a back side surfaces opposite thereto; and decorating the defective portion of the front side of the wafer with copper.

Abstract: The invention relates to a method and device for electroplating plate-shaped product, particularly printed circuit boards, in horizontal continuous plants with optional sequence of product, revolving contacting means serving for electrical connection of a source of bath current via wiper rails with the product, and the beginning and end of each individual product item at the inlet to the electroplating plant, and the transport speed of the product, being detected with the aid of sensors, said sensors sending sensor signals to a control system which ascertains whether a product item is present at the gripping point of the contacting means or not, the contacting means being connected electrically and in the electroplating sense in a low-resistance manner to the sources of bath current only when product is present in the region of contacts of the contacting means.

Abstract: A method for preparing a nickel-zinc-copper or nickel-zinc alloy electroplating solution from at least one electroplating waste solution and/or at least one acidic leach solution of metal scrap containing nickel and/or zinc ions is disclosed. The method involves mixing two or more than two of solutions of the electroplating waste solutions and the acidic leach solutions, and optionally water, so that the ion concentrations of Ni, Zn, Cu, Fe, Cr and Pb of the resulting mixed solution are within the following ion concentrations:15 gdm.sup.-3 <Ni.sup.2+ <58 gdm.sup.-3, 28 gdm.sup.-3 <Zn.sup.2+ <44 gdm.sup.-3, 0<Cu.sup.2+ <1430 gm.sup.-3, 0<Fe.sup.2+ +Fe.sup.3+<5000 gm.sup.-3, 0<Cr.sup.3+ <1000 gm.sup.-3 and 0<Pb.sup.2+ <50 gm.sup.-3.

Abstract: A method for performing fine working of a material by electrochemical reaction comprises a two-step scanning operation in which a surface topography of the material is obtained during a first scan which is used to control the position of a probe during a second scan in which an electrochemical reaction is performed. During the first scan, an electrochemical cell is constructed with a four-electrode system, including the probe, a material to be worked, a reference electrode and a counter electrode. The potential of each of the probe and the material to be worked is set so that no electrochemical reaction occurs during the first scan. Data representative of the surface topography is stored and used to control the position of the probe during the second scan in which an electrochemical cell is constructed with a three-electrode system, including the probe, the material, and the reference electrode.

Abstract: Oligosaccharides are structurally characterized utilizing enzymatic digestion with an array of highly specific exoglycosidases followed by electrochemical detection and measurement of the molar quantity of cleaved monosaccharides in each enzymatic digest.

Abstract: The present invention relates to a control solution for and a method of testing the performance of an electrochemical sensing device for determining the concentration of an analyte in a blood sample. The device contains a sensing means having a working electrode on which is deposited an enzyme capable of reacting with the analyte to provide electrons and a mediator to shuttle the electrons to the surface of the working electrode. The control solution is formulated so that the device will recognize the control solution as being something other than blood and automatically exclude the results obtained with the control solution from its memory unit.

Abstract: An apparatus and method for measuring electrical parameters of a medium such as electrical conductivity and dielectric constant between a pair of electrodes are disclosed. The medium can be a liquid, gas, powder, etc., and the electrodes can be coaxial metallic circular cylinders. To compute electrical conductivity, the device is immersed in the medium to an immersion depth and the conductance across the electrodes is determined. The measurement is repeated at at least one additional immersion depth. By obtaining a differential conductance measurement with respect to the immersion depth, the effects of fringe conductances are eliminated from the measurement. The device can also be used to determine dielectric constant of the material by obtaining a differential capacitance measurement with respect to immersion depth. The device need not be calibrated by performing resistance measurements in a known standard solution.

Abstract: This invention relates to an electrochemical treatment of metal substrates, including so-called "difficult to plate metals" such as tungsten and molybdenum, wherein deoxidation and plating are carried out in the same electrolyte bath by exploiting the electrochemical window in potential and pH of a reduction/deposition. This window may be illustrated using Pourbaix diagrams. In the first step of the treatment, a direct current at a reduction potential is applied to the substrate to reduce oxides present on the surface of the substrate without causing metal to be deposited from the electrolyte. In the second step, the reduction potential is changed to a more negative deposition potential, and a direct current at this deposition potential is applied for a time sufficient to deposit metal from the electrolyte.

Abstract: A method for producing a compound oxide superconducting thin film, comprising forming an oxide thin film on the surface of a substrate of a first metal element having a redox charge by oxidizing the metal, using the oxide thin film thus formed as an electrode for oxidation reaction of a second metal element contained in an electrolyte solution or molten salt to incorporate the second metal element in the oxide thin film, using the compound oxide thin film thus formed as an electrode to obtain a cyclic voltammogram, and electrochemically processing the compound oxide thin film at an electrolytic potential that is determined based on the cyclic voltammogram.

Abstract: A dissipation factor measurement is used to predict as-anodized fixture performance prior to actual use of the fixture in an etching environment. A dissipation factor measurement of the anodic coating determines its dielectric characteristics and correlates to the performance of the anodic coating in actual use. The ability to predict the performance of the fixture and its anodized coating permits the fixture to be repaired or replaced prior to complete failure.

Abstract: A process for electrolytic production of fine-grained, single-phase, metallic alloy powders, especially powders of intermetallic compounds as well as noble metal alloy powders, is described in which powdery metallic precipitates are galvanically produced on the cathode from an electrolytic precipitating bath known in the art, which contains in solution the metals to be precipitated, under electrolysis conditions causing a powder precipitation known in the art. For the production of alloy powders with defined properties, it is determined, first in preliminary tests by gradual increase of the cathode potential with otherwise constant process parameters, the minimum cathode potential at which single-phase alloy powders result and then the powder precipitation is potentiostatically performed in a cathode potential at or above the minimum for the single-phase alloy precipitation.

Abstract: The invention provides an apparatus and method for determining levelling power of an electrolyte. An anode and cathode are immersed in the electrolyte. The cathode has a plating surface for electrodeposition of a metal from the electrolyte. The plating surface has a peak region and a base region separated and electrically isolated by an insulator. The peak region has a greater tendency to electrodeposit the metal per unit surface area than the base region. The anode and cathode are placed in a test cell or suspended in a commercial electrodeposition cell. A means for applying current between said anode and said cathode is used for causing the metal from the electrolyte to electrodeposit on the plating surface of the cathode. The current from plating on the peak region and the base region are measured separately to determine levelling power of an electrolyte.

Abstract: A direct method of analyzing brighteners and levelers used in metal electroplating baths. The method is based on the differential adsorption of these additives on a working electrode during a sequence of steps prior to and during metal plating. The sensitivity of the method allows for the determination of both brightener and leveler in the same sample without cyclic processing.