Abstract: A substrate processing method includes holding a substrate; and supplying an etching liquid to the substrate held in the holding of the substrate. The etching liquid contains an etching agent configured to etch a metal-based first material and a silicon-based second material exposed on the substrate and a protection agent configured to react with the second material between the first material and the second material to form a protection layer on a surface of the second material. Here, the etching agent is a liquid which contains fluorine atoms and an organic solvent and substantially does not contain water, and the protection layer protects the second material from etching with the etching agent.

Abstract: A method for manufacturing a cast product in which a core can be easily discharged from a casting roughly-shaped material is provided. A method for manufacturing a cast product according to the present disclosure includes: a step of hermetically sealing a casting roughly-shaped material formed by casting using a core in a container containing water; a step of heating the water contained in the container while keeping the casting roughly-shaped material hermetically sealed and thereby destroying the core while keeping a pressure inside the container at a pressure higher than an atmospheric pressure, and thereby forming core sand; and a step of discharging the core sand from the casting roughly-shaped material.

Abstract: A vitreous enamel coating for an electrosurgical metal cutting blade, in which incident light striking the vitreous enamel coating is diffusely reflected or absorbed, and the vitreous enamel coating exhibits a 60° gloss value less than 100 gloss units as measured according to ASTM D523-14, Standard Test Method for Specular Gloss. The coating reduces glare from light sources such as a nearby plasma-mediated discharge, operating theater lights or lights provided on an electrosurgery apparatus. The coating may also lessen interference with markers, sensors or other instruments designed to measure light emitted by or passing through nearby tissue such as by transillumination.

Abstract: A watch component is provided with a base material having light transmissivity, and a metal film layered on the base material. The metal film includes a plurality of through holes formed penetrating the metal film, and recessed portions are formed in the base material in positions corresponding to the through holes.

Abstract: A backside illuminated image sensor device with a shielding layer and a manufacturing method thereof are provided. In the backside illuminated image senor device, a patterned conductive shielding layer is formed on a dielectric layer on a backside surface of a semiconductor substrate and surrounding a pixel array on a front side surface of the semiconductor substrate.

Abstract: In an example implementation, a method of fusing layers of 3D parts includes forming a layer of build material, and selectively applying a liquid agent onto the layer of build material to define a part layer of a 3D part and a sacrificial layer of a sacrificial part. The method includes, in a single pass of a thermal energy source over the layer of build material, applying fusing energy to the sacrificial layer, sensing a temperature of the sacrificial layer, adjusting a power level of the thermal energy source based on the sensed temperature, and applying fusing energy to the part layer with the adjusted power level of the thermal energy source.

Abstract: A dry non-plasma treatment system for removing material is described. The treatment system is configured to provide chemical treatment of one or more substrates, wherein each substrate is exposed to a gaseous chemistry under controlled conditions including surface temperature and gas pressure. Furthermore, the treatment system is configured to provide thermal treatment of each substrate, wherein each substrate is thermally treated to remove the chemically treated surfaces on each substrate.

Abstract: A mixing apparatus includes a phosphoric acid aqueous solution supply, an additive supply, a tank, a phosphoric acid aqueous solution supply path and an additive supply path. The phosphoric acid aqueous solution supply is configured to supply a phosphoric acid aqueous solution. The additive supply is configured to supply an additive configured to suppress precipitation of a silicon oxide. The phosphoric acid aqueous solution supply path is configured to connect the phosphoric acid aqueous solution supply with the tank. The additive supply path is configured to connect the additive supply with the tank. The additive is supplied while fluidity is imparted to the phosphoric acid aqueous solution supplied from the phosphoric acid aqueous solution supply into the tank.

Abstract: The present disclosure provides a slurry. The slurry includes an abrasive including a ceria compound; a removal rate regulator to adjust removal rates of the slurry to metal and to dielectric material; and a buffering agent to adjust a pH value of the slurry, wherein the slurry comprises a dielectric material removal rate higher than a metal oxide removal rate.

Abstract: Disclosed are electrochemical devices, such as sodium ion conducting solid state electrolytes, sodium battery electrodes, and solid-state sodium metal batteries including these electrodes and solid state electrolytes. One example method for preparing a sodium/sodium-??-alumina interface with low interfacial resistance and capable of achieving high current density in an electrochemical cell includes the steps of: (a) providing a precursor electrolyte having a resistive surface region, wherein the precursor electrolyte comprises sodium-??-alumina; (b) removing at least a portion of the resistive surface region; (c) heating the precursor electrolyte thereby forming a solid state electrolyte, and (d) placing a side of the solid state electrolyte in contact with a sodium anode.

Abstract: Apparatus and systems are disclosed of a splash guard for a grinder/polisher having a base, a bowl, and a platen having an outer edge to prevent splashing during the grinding/polishing operation. The splash guard includes an inner sidewall, a lower rib, and outer sidewall, and an upper rib. The lower rib has an inner edge that is spaced at least 2.5 centimeters from the outer edge of the platen to prevent pinching of an operator's hands between the platen and the splash guard. The splash guard may also include a recess formed by the upper rib, outer sidewall, and lower rib, and at least a portion of an inner edge of the upper rib is extending further inwardly towards that platen than the inner edge of the lower rib.

Abstract: A peripheral circuit includes a data preparation circuit, configured to selectively import, to a row or column of the resistive random access memory (RRAM) crossbar array based on a first control signal, preprocessed data obtained by first preprocessing on first data that is input into the data preparation circuit, a data selection circuit, configured to selectively export second data from the row or column of the RRAM crossbar array based on a second control signal, and perform second preprocessing on the second data to obtain third data, a data reading circuit, configured to: perform a weight update control operation, and perform a max pooling operation on fourth data that is input into the data reading circuit, to obtain fifth data, and a reverse training computation circuit, configured to calculate an error and a derivative of sixth data that is input into the reverse training computation circuit.

Abstract: An optical modulator includes: a substrate; a waveguide layer including first and second optical waveguides formed of an electro-optic material film on the substrate to have a ridge shape and to be disposed adjacent to each other; an RF part that applies a modulated signal to the optical waveguides; and a DC part that applies a DC bias to the optical waveguides. The DC part includes: a buffer layer covering at least upper surfaces of the optical waveguides; a first bias electrode opposed to the first optical waveguide through the buffer layer; and a second bias electrode provided adjacent to the first bias electrode. A first DC bias voltage is applied between the first and second bias electrodes. A waveguide layer removal area in which at least part of the waveguide layer is removed is provided at least under an area between the first and second bias electrodes.

Abstract: A capacitor structure includes a first metal layer, a first metal oxide layer, a second metal oxide layer, a first conductive member, a second conductive member and a metal composite structure. The first metal layer has a first surface and a second surface opposite the first surface. The first metal oxide layer is formed on the first surface of the first metal layer. The second metal oxide layer is formed on the second surface of the first metal layer. The first conductive member penetrates through the capacitor structure and is electrically isolated from the first metal layer. The second conductive member is electrically connected to the first metal layer. The metal composite structure is disposed between the second conductive member and the first metal layer.

Abstract: The present invention provides a method for treating a substrate, which can remove transition metal-containing substances on a substrate with high efficiency while inhibiting cerium from remaining on the surface of the treated substrate. Furthermore, the present invention provides a method for manufacturing a semiconductor device including the method for treating a substrate, and a kit for treating a substrate that is applicable to the method for treating a substrate.

Abstract: A delocalizer and a light emitting device using the same are provided. The light emitting device includes a substrate and a first electrode layer. The first electrode layer is disposed over the substrate, in which two sides of the first electrode layer have a first contact pad and a second contact pad, respectively. The delocalizer is disposed between the first contact pad and the second contact pad. The delocalizer may include a plurality of strip-shaped transparent conductive members adjacent to each other, and a plurality of transparent conductive blocks adjacent to each other may be disposed between adjacent two of the strip-shaped transparent conductive members.

Abstract: An embodiment of a camera module comprises: a lens portion; a front body on which the lens portion is mounted; a substrate portion arranged to be spaced from the lens portion in a first direction and coupled to the front body; an image sensor arranged on the substrate portion and provided to face the lens portion; a first fastener, one side of which is inserted into the front body such that at least a part of the substrate portion is coupled to the front body; and a first attachment portion arranged between the front body and the substrate portion, wherein the first attachment portion may comprise at least one through-hole formed between the front body and the substrate portion so as to couple the front body and the substrate portion.

Abstract: When a silicon concentration of a phosphoric acid aqueous solution inside a tank reaches an upper limit value of a specified concentration range, the phosphoric acid aqueous solution is drawn off from the tank and/or an amount of the phosphoric acid aqueous solution returning to the tank is decreased to decrease a liquid amount inside the tank to a value not more than a lower limit value of a specified liquid amount range. When the liquid amount inside the tank decreases to the value not more than the lower limit value of the specified liquid amount range, the phosphoric acid aqueous solution is replenished to the tank to increase the liquid amount inside the tank to a value within the specified liquid amount range and decrease the silicon concentration of the phosphoric acid aqueous solution inside the tank to a value within the specified concentration range.

Abstract: A heating assembly for heating an aerosol-forming substrate is provided, including: a heater including an electrically resistive heating element and a heater substrate; and a heater mount coupled to the heater; wherein the heating element includes a first portion and a second portion configured such that, when an electrical current is passed through the heating element, the first portion is heated to a higher temperature than the second portion as a result of the electrical current; and wherein the heater mount surrounds the second portion of the heating element.

Abstract: This method for manufacturing a lead-free niobate-system ferroelectric thin film device includes: a lower electrode film formation step of forming a lower electrode film on a substrate; a ferroelectric thin film formation step of forming a niobate-system ferroelectric thin film on the lower electrode film; an etch mask pattern formation step of forming an etch mask in a desired pattern on the niobate-system ferroelectric thin film; and a ferroelectric thin film etching step of shaping the niobate-system ferroelectric thin film into a desired fine pattern by wet etching using an etchant comprising: a predetermined chelating agent including at least one selected from EDTMP, NTMP, CyDTA, HEDP, GBMP, DTPMP, and citric acid; an aqueous alkaline solution containing an aqueous ammonia solution; and an aqueous hydrogen peroxide solution.

Abstract: The present invention relates to a method of producing porous alpha-SiC containing shaped body and porous alpha-SiC containing shaped body produced by that method. The porous alpha-SiC containing shaped body shows a characteristic microstructure providing a high degree of mechanical stability.

Abstract: A system and method of forming a sapphire component. The method may include disposing an absorptive-barrier layer on a first surface of a sapphire substrate, performing a cut in the sapphire substrate using a laser beam incident on the absorptive-barrier layer, and forming and removing molten sapphire from the cut. The method may also include shielding a region of the first surface that is adjacent to the cut from the molten sapphire using the absorptive-barrier layer, and removing the absorptive-barrier layer from the first surface of the sapphire substrate.

Abstract: There is provided a roughened copper foil which can significantly improve adhesion to an insulating resin and reliability (e.g., hygroscopic heat resistance). The roughened copper foil of the present invention has at least one roughened surface having fine irregularities composed of acicular crystals, wherein the entire surface of the acicular crystals is composed of a mixed phase of Cu metal and Cu2O.

Abstract: A rechargeable lithium battery with improved electro-conductivity and improved rate characteristics and capacity characteristics is disclosed. The battery includes a positive active material that includes an olivine-type composite oxide; and a metal or an alloy thereof adhered to a surface of the olivine-type composite oxide, wherein the metal or the alloy is selected from the group consisting of germanium (Ge), zinc (Zn), gallium (Ga), and a combination thereof.

Abstract: This method for manufacturing a lead-free niobate-system ferroelectric thin film device includes: a lower electrode film formation step of forming a lower electrode film on a substrate; a ferroelectric thin film formation step of forming a niobate-system ferroelectric thin film on the lower electrode film; an etch mask pattern formation step of forming an etch mask in a desired pattern on the niobate-system ferroelectric thin film; and a ferroelectric thin film etching step of shaping the niobate-system ferroelectric thin film into a desired fine pattern by wet etching using an etchant comprising: a predetermined chelating agent including at least one selected from EDTMP, NTMP, CyDTA, HEDP, GBMP, DTPMP, and citric acid; an aqueous alkaline solution containing an aqueous ammonia solution; and an aqueous hydrogen peroxide solution.

Abstract: To provide a PBNZT ferroelectric film capable of preventing sufficiently oxygen ion deficiency. The PBNZT ferroelectric film according to an embodiment of the present invention is a ferroelectric film including a perovskite-structured ferroelectric substance represented by ABO3, wherein the perovskite-structured ferroelectric substance is a PZT-based ferroelectric substance containing Pb2+ as A-site ions and containing Zr4+ and Ti4+ as B-site ions, and the A-site contains Bi3+ as A-site compensation ions and the B-site contains Nb5+ as B-site compensation ions.

Abstract: A process for manufacturing a transparent body for a touch screen panel is described. The process includes: depositing a first transparent layer stack over a flexible transparent substrate, wherein said first transparent layer stack includes at least a first dielectric film with a first refractive index, and a second dielectric film with a second refractive index different from the first refractive index; providing a transparent conductive film over the first transparent layer stack; depositing a layer of a conductive material over the transparent conductive film; providing a polymer layer over the layer of a conductive material; imprinting a pattern, e.g. a 3D pattern, on the polymer layer; etching the layer of the conductive material based upon the pattern to form conductive paths for the touch screen panel; and etching the transparent conductive film based upon the pattern to form a structured transparent conductive pattern for touch detection.

Abstract: According to embodiments of the present invention, there are provided an array substrate, a method for manufacturing the same and a display device, capable of reducing production difficulty of the array substrate. The manufacturing process of the array substrate is simplified, and the production cost is reduced. The array substrate comprises thin film transistor in a top-gate, bottom-contact configuration which is located on a substrate. Regarding the thin film transistor, its gate electrode is connected to a gate line, its source electrode is connected to a data line, and its drain electrode is connected to a pixel electrode.

Abstract: A method of spray coating a surface having a magnesium base is provided. The method includes, in sequence, applying a magnesium oxidizing agent onto the surface; determining whether an entirety of the surface has oxidized as a result of applying the magnesium oxidizing agent onto the surface; and spray coating the surface.

Abstract: Methods are provided for the manufacture of razor blades from silicon material. In some implementations, the method includes aligning a mono-crystalline silicon wafer comprising a {100} surface at an angle where {111} planes intersect the {100} surface parallel and perpendicular to the wafer; etching the mono-crystalline silicon wafer to expose an {111} plane and a second plane to provide a blade edge having between about a 20 degree included blade angle and about a 35 degree included blade angle; applying a hard coating on the blade edge; providing a radius of curvature of the blade edge between about 20 nanometers and about 100 nanometers after deposition of the hard coating; applying a soft coating on the blade edge; and removing the razor blade from the mono-crystalline silicon wafer.

Abstract: A rechargeable lithium battery with improved electro-conductivity and improved rate characteristics and capacity characteristics is disclosed. The battery includes a positive active material that includes an olivine-type composite oxide; and a metal or an alloy thereof adhered to a surface of the olivine-type composite oxide, wherein the metal or the alloy is selected from the group consisting of germanium (Ge), zinc (Zn), gallium (Ga), and a combination thereof.

Abstract: A heating assembly for heating an aerosol-forming substrate is provided, including: a heater including an electrically resistive heating element and a heater substrate; and a heater mount coupled to the heater; wherein the heating element includes a first portion and a second portion configured such that, when an electrical current is passed through the heating element, the first portion is heated to a higher temperature than the second portion as a result of the electrical current; and wherein the heater mount surrounds the second portion of the heating element.

Abstract: A method of fabricating circuitry in a wafer includes depositing a superconducting metal on a silicon on insulator wafer having a handle wafer, coating the wafer with a sacrificial layer and bonding the wafer to a thermally oxide silicon wafer with a first epoxy. The method includes flipping the wafer, thinning the flipped wafer by removing a handle wafer, etching a buried oxide layer, depositing a superconducting layer, bonding the wafer to a thermally oxidized silicon wafer having a handle wafer using an epoxy, flipping the wafer again, thinning the flipped wafer, etching a buried oxide layer from the wafer and etching the sacrificial layer from the wafer. The result is a wafer having superconductive circuitry on both sides of an ultra-thin silicon layer.

Abstract: A cyclic deposition and etch method is provided. The method includes depositing an epitaxial layer over a substrate at a first temperature and etching a portion of the deposited epitaxial layer at a variable temperature higher than the first temperature. The step of etching is performed while varying the temperature.

Abstract: Embodiments of present invention provide a method of forming a semiconductor structure. The method includes forming a semiconductor structure having a first metal layer and a plurality of dielectric layers on top of the first metal layer; creating one or more openings through the plurality of dielectric layers to expose the first metal layer underneath the plurality of dielectric layers; causing the one or more openings to expand downward into the first metal layer and expand horizontally into areas underneath the plurality of dielectric layers; applying a layer of lining material in lining sidewalls of the one or more openings inside the plurality of dielectric layers; and filling the expanded one or more openings with a conductive material.

Abstract: A double-sided patterned transparent conductive film includes an upper surface conductive layer (12) and a lower surface conductive layer (12). The upper surface conductive layer is a patterned trench network; the lower surface conductive layer is a full-surface trench network. A trench of the upper surface conductive layer is filled with conductive material (13), and a trench of the lower surface conductive layer is intermittently filled with conductive material (13). The double-sided patterned transparent conductive film has a high resolution, transmittance, independently adjustable square resistance and many other advantages, such that the transparent conductive film saves a cost of PET. According to the manufacturing method, the alignment is not needed for double-sided imprinting of a single flexible substrate, thus the process is simple, low cost, advantageous for industrial production.

Abstract: An optical waveguide for guiding electromagnetic waves. One example of an optical waveguide includes a waveguide substrate, at least one layer of low index optical coating formed on a surface of the waveguide substrate, and a thin layer of metal formed on a surface of the at least one layer of the low index optical coating, where the at least one layer of low index optical coating is disposed between the waveguide substrate and the thin layer of metal. The thin layer of metal can have a thickness in a range of about 5 nm to about 20 nm. In one example, the thin layer of metal is chromium.

Abstract: In one aspect, the present invention features a method of manufacturing a solid dosage form, the method including the steps of: (a) measuring an amount of a first powder blend within a dosing nozzle, wherein the first powder blend includes a pharmaceutically active agent; (b) discharging the measured amount of a first powder blend from the dosing nozzle into a forming cavity within a die block, the forming cavity having an inner wall, a first opening at the surface of one side of the die block, and a second opening at the surface on the opposite side of the die block; (c) moving a first forming tool into the forming cavity through the first opening of the forming cavity such that the first powder blend is formed into the shape of the dosage form within the forming cavity between the inner wall, the first forming tool and a second forming tool within or adjacent to the cavity; (d) applying RF energy between a first electrode and a second electrode such that the energy heats the first powder blend within the fo

Abstract: Disclosed herein is a ceramic article with an increased surface roughness. The ceramic article includes a ceramic body having an engagement surface and a composite porous layer disposed on the engagement surface of the ceramic body. The composite porous layer is formed from a material including multiple first ceramic particles and multiple second ceramic particles. The sintering temperature of the first ceramic particle is lower than the melting temperature of the second ceramic particle, and at least some of the second ceramic particles are disperse within the composite porous layer whereby increasing the surface roughness of the ceramic article. Methods for manufacturing such ceramic article are also disclosed.

Abstract: In a method for manufacturing a ridge-type waveguide, a substrate is provided. An etching resistance stripe is coated on the substrate. The substrate with the etching resistance stripe is subjected to a wet etching process to form a ridge under the etching resistance stripe. The etching resistance stripe is removed. A titanium stripe is then coated onto the ridge and diffused into the ridge to form a waveguide in the ridge by a high temperature diffusing process.

Abstract: A process for providing a topography to the surface of a dental implant, the surface being made of a ceramic material having yttria-stabilized zirconia, the process including: providing a macroscopic roughness to the surface of the dental implant by a mechanical process and/or injection molding technique; and etching at least a part of the roughened surface, wherein etching is carried out using an etching solution having hydrofluoric acid at a temperature of 70° C. at least, such that discrete grains or agglomerates of grains are removed from the yttria-stabilized zirconia, thereby forming recesses and cavities in the roughened surface is disclosed.

Abstract: Provided is a particle that includes a first porous region and a second porous region that differs from the first porous region. Also provided is a particle that has a wet etched porous region and that does have a nucleation layer associated with wet etching. Methods of making porous particles are also provided.

Abstract: Disclosed is a method for producing ZnO contact layers for solar cells. The layers are etched using hydrofluoric acid so as to generate a texture.

Abstract: A method for surface treatment of a stainless steel separator for a fuel cell comprises preparing a stainless steel sheet containing nickel, chrome and iron, and having a passive film on a surface of the stainless steel sheet, and dipping the stainless steel sheet into a mixed etching solution of nitric acid (HNO3) and sulfuric acid (H2SO4) at a temperature of 50-70° C. for 30 seconds to 30 minutes to selectively lower an amount of Fe in the passive film formed on the surface of the stainless steel sheet.

Abstract: A method for texturing an alkali alumina silicate glass substrate includes cleaning the glass substrate with at least one surfactant and etching the glass substrate using a caustic solution. The percentage of caustic solution is provided by controlling a fluid flow and temperature to control the depth of the etching. The method also includes acid cleaning the etched glass substrate to remove glass residuals and surfactants and chemically strengthening the etched and cleaned substrate.

Abstract: Selective etching techniques are used to manufacture a basic filtration element, which can then be used as a basis for constructing various devices for different applications. In this process, sheets of etchable material are etched from one or both sides of that sheet to form channels in a premasked pattern, which controls the minimum opening of the filtration element. The desired channel opening is only limited by the capability of the photochemical etching system being used. Alternatively, a filter element may be made by rolling or extruding a first sheet to form a plurality of recessed areas bordered by lands, selectively etching or punching through the recessed pattern areas, and bonding a second sheet having a plurality of etched or punched through areas to the first sheet, and, aligning the etched through areas to the second sheet with the recessed areas of the first sheet.

Abstract: A method of patterning a first material on a polymeric substrate is described. The method includes providing a polymeric film substrate having a major surface with a relief pattern including a recessed region and an adjacent raised region, depositing a first material onto the major surface of the polymeric film substrate to form a coated polymeric film substrate, forming a layer of a functionalizing material selectively on the raised region of the coated polymeric film substrate to form a functionalized raised region and an unfunctionalized recessed region, and etching the first material from the polymeric substrate selectively from the unfunctionalized recessed region.

Abstract: A method for manufacturing an epitaxial wafer that can reduce occurrence of a surface defect or a slip formed on an epitaxial layer is provided. The manufacturing method is characterized by comprising: a smoothing step of controlling application of an etchant to a wafer surface in accordance with a surface shape of a silicon wafer to smooth the wafer surface; and an epitaxial layer forming step of forming an epitaxial layer formed of a silicon single crystal on the surface of the wafer based on epitaxial growth.

Abstract: A method for preparing nanotubes by providing nanorods of a piezoelectric material having an asymmetric crystal structure and by further providing hydroxide ions to the nanorods to etch inner parts of the nanorods to form the nanotubes.

Abstract: An etching paste includes an acid compound, an organic binder, a nitrogen-containing component, the nitrogen-containing component including one or more of an amine compound or an ammonium compound, a cobalt aluminum oxide, and a solvent.