Lens Patents (Class 216/26)
  • Publication number: 20130155522
    Abstract: The present invention provides a lens having broadband anti-reflective nanostructures formed using nano-island masks and a method for making the same, in which nanostructures having a size and period equal to or smaller than the light wavelength are formed on the surface of a lens to obtain a lens having decreased reflectance, increased transmittance and high efficiency. The lens having broadband anti-reflective nanostructures formed using nano-island masks comprises: a lens having a planar shape or a predetermined curvature; and anti-reflective nanostructures formed on one surface of the lens using nano-island masks, in which the horizontal and vertical cross-sections of the anti-reflective nanostructures have a size equal to or smaller than the light wavelength.
    Type: Application
    Filed: November 26, 2012
    Publication date: June 20, 2013
    Applicant: Kaist (Korea Advanced Institute of Science and Technology)
    Inventor: Kaist (Korea Advanced Institute of Science and T
  • Publication number: 20130114924
    Abstract: According to embodiments of the present invention, an optical arrangement is provided. The optical arrangement includes a support substrate; at least one optical fiber arranged on the support substrate; at least one waveguide arranged on the support substrate and adjacent to the at least one optical fiber; the at least one waveguide defining a light propagation direction; and at least one grin index lens arranged asymmetrically relative to the light propagation direction such that light is coupled from the at least one optical fiber through the at least one grin index lens to the at least one waveguide.
    Type: Application
    Filed: April 26, 2011
    Publication date: May 9, 2013
    Applicant: AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH
    Inventors: Ter-Hoe Loh, Seng-Tiong Ho, Yingyan Huang
  • Patent number: 8404129
    Abstract: A method and system for fabricating an optical component are described. The method and system include providing a first planarization stopping and a second planarization stopping structure. The first planarization stopping structure has a first height and a first edge. The second planarization stopping structure has a second height different from the first height and a second edge. The first edge is separated from the second edge by a distance. The method and system also include providing an optical material. The optical material resides at least between the first edge of the first planarization stopping structure and the second edge of the second planarization stopping structure. The method and system also include planarizing the optical components. The planarization removes a portion of the optical material to form a surface between the first planarization stopping structure and the second planarization stopping structure. This surface has a curvature.
    Type: Grant
    Filed: March 31, 2010
    Date of Patent: March 26, 2013
    Assignee: Western Digital (Fremont), LLC
    Inventors: Guanghong Luo, Danning Yang, Ming Jiang
  • Patent number: 8377323
    Abstract: A mold is for obtaining, on a substrate, an array of carbon nanotubes with a high control of their positioning. The mold includes a first layer of a first preset material having a surface having in relief at least one first plurality of projections having a free end portion with a substantially pointed profile.
    Type: Grant
    Filed: March 30, 2009
    Date of Patent: February 19, 2013
    Assignee: STMicroelectronics S.R.L.
    Inventors: Raffaele Vecchione, Luigi Occhipinti
  • Patent number: 8366949
    Abstract: A mold for producing microlenses or a microlens array is produced by sequentially carrying out an etching step of forming quadrangular pyramid concave parts on a single crystal silicon substrate by anisotropic etching and an ion etching step of forming molding concave parts with spherical or cylindrical surface parts from the quadrangular pyramid concave parts.
    Type: Grant
    Filed: August 17, 2006
    Date of Patent: February 5, 2013
    Inventor: Kiichi Takamoto
  • Patent number: 8361332
    Abstract: A method of fabricating micro-lenses is provided. A first layer is formed on a substrate. The first layer is comprised of a first material and the substrate is comprised of a second material. An opening is formed in the first layer and an etchant is provided in the opening to etch both the substrate and the first layer to form a first mold for a first micro-lens. The etchant etches the first layer at a different rate than the substrate. A lens material is added to the etched molds to form micro-lenses.
    Type: Grant
    Filed: July 13, 2009
    Date of Patent: January 29, 2013
    Assignee: Micron Technology, Inc.
    Inventor: Jin Li
  • Patent number: 8349227
    Abstract: A motheye mold fabrication method of at least one embodiment of the present invention includes the steps of: (a) preparing an Al base in which an Al content is less than 99.99 mass %; (b) partially anodizing the Al base to form a porous alumina layer which has a plurality of very small recessed portions; (c) after step (b), allowing the porous alumina layer to be in contact with an etchant which contains an anodic inhibitor, thereby enlarging the plurality of very small recessed portions of the porous alumina layer; and (d) after step (c), further anodizing the Al base to grow the plurality of very small recessed portions.
    Type: Grant
    Filed: July 16, 2010
    Date of Patent: January 8, 2013
    Assignee: Sharp Kabushiki Kaisha
    Inventor: Ichiro Ihara
  • Patent number: 8337712
    Abstract: A method for forming an etching mask comprises irradiating a focused ion beam onto a surface of a substrate and forming an etching mask used for oblique etching including an ion containing portion in the irradiated region. A method for fabricating a three-dimensional structure comprises preparing a substrate, irradiating a focused ion beam onto a surface of the substrate and forming an etching mask including an ion-containing portion in the irradiated region, and dry-etching the substrate from a diagonal direction using the etching mask and forming a plurality of holes.
    Type: Grant
    Filed: May 14, 2008
    Date of Patent: December 25, 2012
    Assignee: Canon Kabushiki Kaisha
    Inventors: Kenji Tamamori, Masahiko Okunuki, Shinan Wang, Taiko Motoi, Haruhito Ono, Toshiaki Aiba
  • Publication number: 20120320466
    Abstract: A lens device and a method of manufacturing the same are provided, wherein the lens device includes a transparent substrate, a metal layer, a hydrophobic layer and an aspherical lens. The metal layer is formed on the transparent substrate, and the hydrophobic layer is formed on the metal layer. The metal layer has a first opening, such that an area of the transparent substrate corresponding to the first opening is not covered by the metal layer. The hydrophobic layer has a second opening connected to the first opening, and the second opening is larger than the first opening, such that a portion of the metal layer adjacent to a peripheral edge of the first opening is not covered by the hydrophobic layer. The aspherical lens is formed on the area of the transparent substrate and contacts the portion of the metal layer.
    Type: Application
    Filed: October 21, 2011
    Publication date: December 20, 2012
    Applicant: NATIONAL CHIAO TUNG UNIVERSITY
    Inventors: Kuo-Yung Hung, Fan-Gang Tseng
  • Patent number: 8329069
    Abstract: A motheye mold fabrication method of at least one embodiment of the present invention includes the steps of: (a) preparing an Al base in which an Al content is less than 99.99 mass %; (b) partially anodizing the Al base to form a porous alumina layer which has a plurality of very small recessed portions; (c) after step (b), allowing the porous alumina layer to be in contact with an etchant which contains an anodic inhibitor, thereby enlarging the plurality of very small recessed portions of the porous alumina layer; and (d) after step (c), further anodizing the Al base to grow the plurality of very small recessed portions.
    Type: Grant
    Filed: December 22, 2009
    Date of Patent: December 11, 2012
    Assignee: Sharp Kabushiki Kaisha
    Inventor: Ichiro Ihara
  • Patent number: 8313662
    Abstract: A method for preventing damage caused by high intensity light sources to optical components includes annealing the optical component for a predetermined period. Another method includes etching the optical component in an etchant including fluoride and bi-fluoride ions. The method also includes ultrasonically agitating the etching solution during the process followed by rinsing of the optical component in a rinse bath.
    Type: Grant
    Filed: October 1, 2009
    Date of Patent: November 20, 2012
    Assignee: Lawrence Livermore National Security, LLC
    Inventors: Philip Edward Miller, Tayyab Ishaq Suratwala, Jeffrey Devin Bude, Nan Shen, William Augustus Steele, Ted Alfred Laurence, Michael Dennis Feit, Lana Louie Wong
  • Publication number: 20120262795
    Abstract: A lens and a method of forming a lens are included. A lens can include a plurality of concentric rings formed from a dielectric material interleaved by a plurality of gaps separating the plurality of concentric rings.
    Type: Application
    Filed: April 15, 2011
    Publication date: October 18, 2012
    Inventors: JINGJING LI, David A. Fattal, Marco Fiorentino, Raymond G. Beausoleil
  • Patent number: 8169716
    Abstract: A phase-adjusting element configured to provide substantially liquid-invariant extended depth of field for an associated optical lens. One example of a lens incorporating the phase-adjusting element includes the lens having surface with a modulated relief defining a plurality of regions including a first region and a second region, the first region having a depth relative to the second region, and a plurality of nanostructures formed in the first region. The depth of the first region and a spacing between adjacent nanostructures of the plurality of nanostructures is selected to provide a selected average index of refraction of the first region, and the spacing between adjacent nanostructures of the plurality of nanostructures is sufficiently small that the first region does not substantially diffract visible light.
    Type: Grant
    Filed: June 24, 2010
    Date of Patent: May 1, 2012
    Assignee: Xceed Imaging, Ltd.
    Inventors: Zeev Zalevsky, Ofer Limon
  • Publication number: 20120092747
    Abstract: The present disclosure provides methods, systems, and apparatus for directing incident light toward central regions of interferometric modulator displays. In one aspect, a display includes an array of microlenses embedded in a substrate adjacent a first surface of the substrate. An array of light modulators can be disposed over the first surface of the substrate. A light modulator can be disposed over a corresponding microlens. The microlenses can converge or concentrate incident light onto central regions of the corresponding light modulators. The microlenses may include single-element lenses, compound lenses, and/or graded-index lenses. Various methods of manufacturing such displays are also disclosed.
    Type: Application
    Filed: October 18, 2010
    Publication date: April 19, 2012
    Applicant: QUALCOMM MEMS TECHNOLOGIES, INC.
    Inventors: Russel Allyn Martin, Koorosh Aflatooni
  • Publication number: 20120026593
    Abstract: There is provided a manufacturing method for a microlens array including a multiple number of microlenses protruded in a substantially hemispherical shape from a surface. The manufacturing method includes forming a resist layer for forming a shape of the microlenses on an organic film layer serving as a material layer of the microlenses; and etching the formed resist layer and the organic film layer by using a mixed gas including hydrogen-containing molecules and fluorine-containing molecules.
    Type: Application
    Filed: March 11, 2010
    Publication date: February 2, 2012
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Shota Yoshimura, Masaru Sasaki
  • Patent number: 8075810
    Abstract: In a microlens formation step, the portions of a lens material film (32) supported on elevations (BG) are melted by heat so that part of the lens material film (32) flows into trenches (DH); thus, the shape of the portions of the lens material film (32) supported on the elevations (BG) is so changed as to be formed into microlenses (MS).
    Type: Grant
    Filed: March 6, 2007
    Date of Patent: December 13, 2011
    Assignee: Sharp Kabushiki Kaisha
    Inventor: Takayuki Kawasaki
  • Patent number: 8058585
    Abstract: A plasma processing method includes the steps of: loading a substrate on a lower electrode, the substrate having a resist mask formed on a transcription film; supplying a processing gas into a processing chamber; forming a magnetic field, which is oriented toward one direction and perpendicular to a line connecting an upper and the lower electrode; supplying a high frequency power to the lower electrode in the processing chamber to thereby form an electric field; converting the processing gas into a plasma by a magnetron discharge caused by a presence of an orthogonal electromagnetic field; and forming lenses on the transcription film by using the plasma. The high frequency power is supplied to the lower electrode while controlling the magnitude of the electric power divided by a surface area of the substrate to be in a range from about 1200 W/31415.9 mm2 to 2000 W/31415.9 mm2.
    Type: Grant
    Filed: March 12, 2007
    Date of Patent: November 15, 2011
    Assignee: Tokyo Electron Limited
    Inventors: Hiroki Amemiya, Akihito Toda, Hiroshi Nagahata
  • Patent number: 8052883
    Abstract: A method for forming a periodic structure is disclosed. A structural layer and an optical modulation element are provided. A light is emitted to pass through the optical modulation element to irradiate interference strips on the structural layer. A photoelectrochemical etching (PEC) is performed to form the periodic structure according the interference strips irradiated on the structural layer.
    Type: Grant
    Filed: May 6, 2008
    Date of Patent: November 8, 2011
    Assignee: National Taiwan University
    Inventors: Chih-Chung Yang, Cheng-Yen Chen, Cheng-Hung Lin, Dong-Ming Yeh
  • Publication number: 20110226728
    Abstract: Device for generating a plasma discharge for patterning the surface of a substrate, comprising a first electrode having a first discharge portion and a second electrode having a second discharge portion, a high voltage source for generating a high voltage difference between the first and the second electrode, and positioning means for positioning the first electrode with respect to the substrate, wherein the positioning means are arranged for selectively positioning the first electrode with respect to the second electrode in a first position in which a distance between the first discharge portion and the second discharge portion is sufficiently small to support the plasma discharge at the high voltage difference, and in a second position in which the distance between the first discharge portion and the second discharge portion is sufficiently large to prevent plasma discharge at the high voltage difference.
    Type: Application
    Filed: August 20, 2008
    Publication date: September 22, 2011
    Applicant: VISION DYNAMICS HOLDING B.V.
    Inventors: Paulus Petrus Maria Blom, Philip Rosing, Alquin Alphons Elisabeth Stevens, Laurentia Johanna Huijbregts, Eddy Bos
  • Publication number: 20110216238
    Abstract: According to one embodiment, an optical element includes: a substrate in which a through-hole is formed; a transparent thin film formed on at least one of the rear surface and the front surface of the substrate to cover the through-hole; and a lens formed in contact with the surface of the thin film in an area where the thin film covers the through-hole.
    Type: Application
    Filed: March 2, 2011
    Publication date: September 8, 2011
    Inventors: Mika FUJII, Mie Matsuo
  • Patent number: 8007695
    Abstract: A method is disclosed of implementing lens elements or lens arrays having dimensions ranging from a few centimeters down to the micro-scale or nano-scale using the surface tension of the lens material in a molten state to allow the curved shape of the lens to be precisely defined. The method has useful application in the fabrication of lens elements and lens arrays out of a large variety of material types, including elemental materials, as well as compound materials and alloys. The method also allows the implementation of lenses having far superior surface smoothness compared to other approaches, as well as very accurate lens shapes. The method allows the making of high quality lenses and lens arrays, wherein the diameter of the lenses are on the order of a few microns or less. Convex, concave, plano-convex, plano-concave, compound lenses, and many other types of lens shapes can be implemented using the method of the present invention.
    Type: Grant
    Filed: March 12, 2009
    Date of Patent: August 30, 2011
    Assignee: Corporation for National Research Initiatives
    Inventor: Michael A. Huff
  • Patent number: 8002999
    Abstract: An exemplary stamper includes molding portions arranged in an array. Each of the molding portions includes a central optical molding portion and an annular peripheral molding portion surrounding the central optical molding portion. Each molding portion is capable of facilitating formation of a respective optical article. A surface roughness of the annular peripheral molding portion is larger than a predetermined wavelength of light. The predetermined wavelength is selected according to a wavelength of light that is expected to be incident on the optical article when the optical article is in use.
    Type: Grant
    Filed: April 28, 2009
    Date of Patent: August 23, 2011
    Assignee: Hon Hai Precision Industry Co., Ltd.
    Inventor: Keng-Ming Chang
  • Publication number: 20110194195
    Abstract: A phase-adjusting element configured to provide substantially liquid-invariant extended depth of field for an associated optical lens. One example of a lens incorporating the phase-adjusting element includes the lens having surface with a modulated relief defining a plurality of regions including a first region and a second region, the first region having a depth relative to the second region, and a plurality of nanostructures formed in the first region. The depth of the first region and a spacing between adjacent nanostructures of the plurality of nanostructures is selected to provide a selected average index of refraction of the first region, and the spacing between adjacent nanostructures of the plurality of nanostructures is sufficiently small that the first region does not substantially diffract visible light.
    Type: Application
    Filed: June 24, 2010
    Publication date: August 11, 2011
    Inventors: Zeev Zalevsky, Ofer Limon
  • Publication number: 20110181966
    Abstract: An optical probe for emitting and/or receiving light within a body comprises an optical fiber that transmits and/or receives an optical signal, a silicon optical bench including a fiber groove running longitudinally that holds an optical fiber termination of the optical fiber and a reflecting surface that optically couples an endface of the optical fiber termination to a lateral side of the optical bench. The fiber groove is fabricated using silicon anisotropic etching techniques. Some examples use a housing around the optical bench that is fabricated using LIGA or other electroforming technology. A method for forming lens structure is also described that comprises forming a refractive lens in a first layer of a composite wafer material, such as SOI (silicon on insulator) wafers and forming an optical port through a backside of the composite wafer material along an optical axis of the refractive lens. the refractive lens is preferably formed using grey-scale lithography and dry etching the first layer.
    Type: Application
    Filed: January 25, 2010
    Publication date: July 28, 2011
    Applicant: AXSUN TECHNOLOGIES, INC.
    Inventors: Dale C. Flanders, James W. Getz, Peter S. Whitney, Mark E. Kuznetsov, Christopher C. Cook
  • Publication number: 20110149408
    Abstract: The invention relates to an optical element having adjustable focal length comprising a first transparent layer having a chosen flexibility and being provided with a piezoelectric layer adapted to contract upon the application of an electrical voltage and thus bend the first transparent layer, the piezoelectric layer being symmetrically positioned relative to an axis, and wherein the first transparent layer is applied on a substrate having a through going cavity positioned essentially symmetrical relative to said axis, and a transparent polymer being positioned in said cavity having a surface contact with said first transparent layer.
    Type: Application
    Filed: September 21, 2007
    Publication date: June 23, 2011
    Applicant: SINVENT AS
    Inventors: Karl H. Hahgholt, Dag Thorsten Wang, Frode Tyholdt, Wilfred E. Booij, Ib-Rune Johansen
  • Publication number: 20110122498
    Abstract: A sub-millimeter solid immersion lens (SIL), comprises a body of a high-index material transparent to electromagnetic radiation in a frequency band to be observed, the body having a flat bottom surface which receives an object to be observed, and the body further having a first upper surface whose limits approximate a zone of a spherical segment and a second upper surface defined by an upper bound of the zone of the spherical segment which prevents passage of electromagnetic radiation in the frequency band to be observed. The SIL may be incorporated into an array, according to other aspects.
    Type: Application
    Filed: November 22, 2010
    Publication date: May 26, 2011
    Applicant: MASSACHUSETTS INSTITUTE OF TECHNOLOGY
    Inventor: Zong-Long Liau
  • Patent number: 7919230
    Abstract: Methods of forming a lens master wafer having aspheric lens shapes. In one embodiment, a substrate is coated with a polymer material. Isolated sections are formed in the polymer material. The isolated sections are reflowed. The reflowed sections are formed into aspheric lens shapes using a lens stamp.
    Type: Grant
    Filed: June 25, 2008
    Date of Patent: April 5, 2011
    Assignee: Aptina Imaging Corporation
    Inventors: Steve Oliver, Shashikant Hegde, Jeff Viens
  • Publication number: 20110076456
    Abstract: In general, in a first aspect, the invention features a method that includes depositing a first material on a surface of an article to form a layer including the first material. The surface of the article includes a plurality of protrusions and the layer including the first material forms a plurality of lenses. Each lens corresponds to a protrusion on the substrate surface.
    Type: Application
    Filed: August 5, 2010
    Publication date: March 31, 2011
    Applicant: Abraxis Bioscience LLC
    Inventor: Jian Jim Wang
  • Publication number: 20110069395
    Abstract: According to embodiments of the invention, a lens assembly and method for forming the same is provided. The method includes providing a first lens layer having a first transparent substrate and a first lens on the first transparent substrate, providing a second lens layer having a second transparent substrate and a second lens on the second transparent substrate, forming a spacer structure between the first lens layer and the second lens layer, and thinning the first transparent substrate to a first thickness after the spacer is formed.
    Type: Application
    Filed: September 23, 2009
    Publication date: March 24, 2011
    Inventors: Tzy-Ying LIN, Chieh-Yuan Cheng
  • Patent number: 7875196
    Abstract: A method for forming micro lenses includes the step of performing an etching treatment to an object to be processed, which includes a lens material layer and a mask layer having lens shapes and formed on the lens material layer, using an etching gas including SF6 gas and CHF3 gas, an etching gas including SF6 gas and CO gas, an etching gas including a gas having therein carbon and fluorine and CO gas, or an etching gas including two or more kinds of gases from a first gas having therein carbon and fluorine and a second gas having therein carbon and fluorine, to etch the lens material layer and the mask layer and transfer the lens shapes of the mask layer to the lens material layer, thereby forming the micro lenses.
    Type: Grant
    Filed: July 30, 2009
    Date of Patent: January 25, 2011
    Assignee: Tokyo Electron Limited
    Inventor: Hiroki Amemiya
  • Publication number: 20110011832
    Abstract: In securing adhesion of a hard coat layer to be formed on the surface of a plastic lens, modification of the lens surface is carried out without using an abrasive, and thereby the cleaning time after modification is shortened. A method for producing a plastic lens includes rubbing to rub the surface of a plastic lens substrate using a removing member, and forming a hard coat layer on the rubbed surface of the plastic lens substrate by a wet surface treatment. The removing member has flexibility, and is made of a hard material that is harder than the material of the surface of the lens substrate or has such constitution that a hard material is fixed on a base material having flexibility.
    Type: Application
    Filed: February 24, 2009
    Publication date: January 20, 2011
    Applicant: HOYA CORPORATION
    Inventors: Takako Ishizaki, Katsuaki Uchida
  • Publication number: 20110008719
    Abstract: A method, structure, system of aligning a substrate to a photomask. The method comprising: directing light through a clear region of the photomask in a photolithography tool, through a lens of the tool and onto a set of at least three diffraction mirror arrays on the substrate, each diffraction mirror array of the set of at least three diffraction minor arrays comprising a single row of mirrors, all mirrors in any particular diffraction mirror array spaced apart a same distance, mirrors in different diffraction mirror arrays spaced apart different distances; measuring an intensity of light diffracted from the set of at least three diffraction mirror arrays onto an array of photo detectors; and adjusting a temperature of the photomask or photomask and lens based on the measured intensity of light.
    Type: Application
    Filed: September 23, 2010
    Publication date: January 13, 2011
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Axel Aguado Granados, Benjamin Aaron Fox, Nathaniel James Gibbs, Andrew Benson Maki, Trevor Joseph Timpane
  • Publication number: 20110002053
    Abstract: The present invention provides wafer level optical elements that obviate a substrate wafer or a portion thereof disposed between optical structures or optical surfaces of the element.
    Type: Application
    Filed: July 2, 2009
    Publication date: January 6, 2011
    Inventors: David Ovrutsky, Jeremy Huddleston
  • Patent number: 7862732
    Abstract: In a method for forming micro lenses, a lens material layer made of an inorganic material is formed on a substrate, and an intermediate layer made of an organic material is formed on the lens material layer. Then, a mask layer made of an organic material is formed on the intermediate layer, and lens shapes are formed in the mask layer. The lens shapes of the mask layer are transcribed to the intermediate layer by etching the mask layer and the intermediate layer. Thereafter, the lens shapes of the intermediate layer are transcribed to the lens material layer to form micro lenses by etching the intermediate layer and the lens material layer using a processing gas containing SF6 gas and CHF3 gas.
    Type: Grant
    Filed: June 12, 2007
    Date of Patent: January 4, 2011
    Assignee: Tokyo Electron Limited
    Inventor: Hiroki Amemiya
  • Publication number: 20100328779
    Abstract: An antenna element suitable for integrated arrays at terahertz frequencies is disclosed. The antenna element comprises an extended spherical (e.g. hemispherical) semiconductor lens, e.g. silicon, antenna fed by a leaky wave waveguide feed. The extended spherical lens comprises a substantially spherical lens adjacent a substantially planar lens extension. A couple of TE/TM leaky wave modes are excited in a resonant cavity formed between a ground plane and the substantially planar lens extension by a waveguide block coupled to the ground plane. Due to these modes, the primary feed radiates inside the lens with a directive pattern that illuminates a small sector of the lens. The antenna structure is compatible with known semiconductor fabrication technology and enables production of large format imaging arrays.
    Type: Application
    Filed: June 30, 2010
    Publication date: December 30, 2010
    Applicant: California Institute of Technolology
    Inventors: Nuria Llombart Juan, Choonsup Lee, Goutam Chattopadhyay, John J. Gill, Anders Skalare, Peter H. Siegel
  • Publication number: 20100314354
    Abstract: Methods and apparatus may operate to position a sample within a processing chamber and operate on a surface of the sample. Further activities may include creating a layer of reactive material in proximity with the surface, and exciting a portion of the layer of reactive material in proximity with the surface to form chemical radicals. Additional activities may include removing a portion of the material in proximity to the excited portion of the surface to a predetermined level, and continuing the creating, exciting and removing actions until at least one of a plurality of stop criteria occurs.
    Type: Application
    Filed: August 23, 2010
    Publication date: December 16, 2010
    Inventors: Neal R. Rueger, Mark J. Williamson, Gurtej S. Sandhu, Justin R. Arrington
  • Publication number: 20100266241
    Abstract: Provided is an optical transmitter including, a substrate (silicon optical bench), a light emitting element, and a temperature sensing element; wherein, two recesses are formed in a surficial portion of the silicon optical bench; the light emitting element is provided inside one recess; and the temperature sensing element is provided inside the other recess.
    Type: Application
    Filed: April 14, 2010
    Publication date: October 21, 2010
    Applicant: NEC ELECTRONICS CORPORATION
    Inventor: Tetsuya HOSODA
  • Patent number: 7808709
    Abstract: Disclosed are a microlens array, and a method of positioning and aligning the microlens array on another device. Generally, the microlens array comprises an array of injection molded microlens elements, and a supporting flange. Each of the microlens elements has a generally spheroid or spherical shape, and the supporting flange connects together the array of microlens elements to facilitate positioning that array of lenses on a printed circuit board, semiconductor package or wafer. This array is well suited for use with vertical cavity surface emitting lasers (VCSELs); and, in particular, the preferred embodiment of the invention addresses the problem of VCSEL laser array alignment by using arrays of microlenses elements fabricated by injection molding.
    Type: Grant
    Filed: May 19, 2008
    Date of Patent: October 5, 2010
    Assignee: International Business Machines Corporation
    Inventors: Lawrence Jacobowitz, Casimer DeCusatis
  • Patent number: 7807061
    Abstract: A method of producing a structure by three-dimensionally processing a flat member includes a preparing, a first forming and a second forming. In the preparing, a substrate is prepared. In the first forming, an etching mask is formed on the substrate. The etching mask has at least two openings, and areas of the two openings are different from each other. In the second forming, at least a part of a three-dimension surface shape of the structure is formed on a surface of the substrate by a dry-etching on the substrate in accordance with the area of the opening of the etching mask.
    Type: Grant
    Filed: July 10, 2007
    Date of Patent: October 5, 2010
    Assignee: DENSO CORPORATION
    Inventors: Hiroyuki Wado, Kazuhiko Kanoh
  • Patent number: 7776225
    Abstract: In a method for forming a lens according to the present invention, a digging step of digging a depression includes a depositing substep of depositing a pattern film on a surface of a base film, the pattern film being made of a second material and in an inverted shape of the depression, a forming substep of forming an embedding film to flatten the surface of the pattern film, the embedding film being made of a third material and embedding therein the pattern film, and an etch-back substep of conducting etch-back on a surface of the embedding film toward the base film to dig the depression, and an etch rate of the second material is higher than an etch rate of the third material.
    Type: Grant
    Filed: March 27, 2007
    Date of Patent: August 17, 2010
    Assignee: Panasonic Corporation
    Inventor: Akira Tsukamoto
  • Publication number: 20100200770
    Abstract: The invention generally pertains to the field of solid immersion lenses for optical applications in high resolution microscopy. The lens of the invention includes a spherical sector limited by a planar surface and an object having nanometric dimensions arranged on the planar surface at the focus of said solid immersion lens. A light-opaque layer having a central opening with nanometric dimensions can be provided on the planar surface, said opening being centred on the focus of the solid immersion lens. The nano-object can be a tube or a thread having a cylindrical shape. The lens of the invention can be made using lithography techniques.
    Type: Application
    Filed: September 16, 2008
    Publication date: August 12, 2010
    Applicant: Commissariat A L' Energie Atomique Et Aux Energies Alternative
    Inventors: Mickaël Brun, Salim Mimouni, Sergio Nicoletti, Ludovic Poupinet, Hubert Moriceau
  • Publication number: 20100200541
    Abstract: The invention relates to a method for treating an optical lens coated onto at least one of the main surfaces thereof with an outer hydrophobic and/or oleophobic coating, and for making it capable of undergoing an edging process, comprising a step of treating the peripheral area of said coated main surface which results in the removal of the hydrophobic and/or oleophobic coating and/or in the modification of said coating that lowers the hydrophobic character thereof, and a step of depositing a temporary polymeric coating onto said main surface of the lens so as to cover at least partially the hydrophobic and/or oleophobic coating and the peripheral area treated during the previous step, in order to provide an optical lens having onto at least one of the main surfaces thereof an outer hydrophobic and/or oleophobic coating and, in direct contact with said hydrophobic and/or oleophobic coating, a temporary polymeric coating adhering to the surface of the coated lens.
    Type: Application
    Filed: September 12, 2008
    Publication date: August 12, 2010
    Inventors: Chefik Habassi, Marcel Yaigre
  • Patent number: 7771630
    Abstract: High performance microlens arrays are fabricated by (i) depositing liquid on the hydrophilic domains of substrates of patterned wettability by either (a) condensing liquid on the domains or (b) withdrawing the substrate from a liquid solution and (ii) optionally curing the liquid to form solid microlenses. The f-number (f#) of formed microlenses is controlled by adjusting liquid viscosity, surface tension, density, and index of refraction, as well as the surface free energies of the hydrophobic and hydrophilic areas. The f-number of formed microlenses is also adjustable by controlling substrate dipping angle and withdrawal speed, the array fill factor and the number of dip coats used. At an optimum withdrawal speed f# is minimized and array uniformity is maximized. At this optimum, arrays of f/3.48 microlenses were fabricated using one dip-coat with uniformity better than ?f/f˜±3.8% while multiple dip-coats permit production of f/1.38 microlens arrays and uniformity better than ?f/f˜±5.9%.
    Type: Grant
    Filed: February 23, 2001
    Date of Patent: August 10, 2010
    Assignee: The Regents of the University of California
    Inventors: Daniel M. Hartmann, Sadik C. Esener, Osman Kibar
  • Patent number: 7760435
    Abstract: A method is for forming three-dimensional micro- and nanostructures, based on the structuring of a body of material by a mould having an impression area which reproduces the three-dimensional structure in negative form. This method includes providing a mould having a substrate of a material which can undergo isotropic chemical etching, in which the impression area is to be formed. An etching pattern is defined on (in) the substrate, having etching areas having zero-, uni- or bidimensional extension, which can be reached by an etching agent. A process of isotropic chemical etching of the substrate from the etching areas is carried out for a corresponding predetermined time, so as to produce cavities which in combination make up the impression area. The method is advantageously used in the fabrication of sets of microlenses with a convex three-dimensional structure, of the refractive or hybrid refractive/diffractive type, for forming images on different focal planes.
    Type: Grant
    Filed: February 21, 2005
    Date of Patent: July 20, 2010
    Assignee: Consiglio Nazionale Delle Ricerche- INFM Instituto Nazionale per la Fisica Della Materia
    Inventors: Massimo Tormen, Alessandro Carpentiero, Enzo Mario Di Fabrizio
  • Publication number: 20100177387
    Abstract: End reflectors, flat panel lens that may utilize the end reflector, and methods are provided. The end reflector for a flat panel lens may include a first grating having a first set of parallel planes. The first set of parallel planes may be of layers of alternating refractive indexes disposed at a first angle with a central plane of the flat panel lens. The end reflector may also include a second grating having a second set of parallel planes. The second set of parallel planes may be of layers of alternating refractive indexes of alternating refractive indexes disposed at a second angle with the central plane. The second angle may be equivalent to the first angle reflected about the central plane.
    Type: Application
    Filed: January 15, 2009
    Publication date: July 15, 2010
    Applicant: Microsoft Corporation
    Inventors: Adrian Travis, Timothy Andrew Large, Neil Emerton
  • Publication number: 20100177408
    Abstract: Micro-electrical-mechanical (MEMS) wafers in which a lens is formed on a micro-electrical-mechanical structure. The micro-electrical-mechanical wafers can comprise a substrate, MEMS structures, and a lens array. A method of forming a micro-electrical-mechanical wafer comprises providing a substrate, forming a micro-electrical-mechanical structure on the substrate, forming a carrier, forming a lens array on the carrier, and transferring the lens array from the carrier onto the micro-electrical-mechanical structure. The lens array is placed above the micro-electrical-mechanical structure.
    Type: Application
    Filed: January 14, 2009
    Publication date: July 15, 2010
    Inventors: Rick Lake, Ulrich Boettiger, Shashikant Hegde, Jacques Duparre
  • Publication number: 20100165473
    Abstract: A design method, apparatus, and fabrication method for structures for controlling the flow of electromagnetic energy at a sub-wavelength scale is disclosed. Transformational optics principles are used as a starting point for the design of structures that operate as, for example, hyperlenses or concentrators such that evanescent waves at a first surface are radiated in the far field at a second surface. Plane waves incident at a first surface may be focused to a spot size substantially smaller than a wavelength, so as to interact with objects at the focal point, or be re-radiated.
    Type: Application
    Filed: October 23, 2009
    Publication date: July 1, 2010
    Inventors: Alexander V. Kildishev, Vladimir M. Shalaev
  • Publication number: 20100133230
    Abstract: The present invention provides method steps for manufacturing an assembly of adjustable lenses on a wafer. The method steps provide an easy manufacturing of such lenses, minimizing the cost of assembly, and at the same time provide a solution for mass production of compact adjustable lenses for use in mobile phones, etc.
    Type: Application
    Filed: October 5, 2007
    Publication date: June 3, 2010
    Applicant: POLIGHT AS
    Inventors: Lars Henriksen, Morten Eliassen, Vladimir Kartashov, Jon Herman Ulvensøen
  • Patent number: 7720332
    Abstract: Provided is an optical fiber illuminator used for recording and reading high density optical information according to a near field recording (NFR) scheme, a method of fabricating the optical fiber illuminator, and an optical recording head and recording apparatus having the optical fiber illuminator. The optical fiber illuminator includes: an optical fiber having a core upon which light is incident and a clad that surrounds the core, one end of the optical fiber having a mirror formed in an inclined manner; and a lens formed on an outer surface of the optical fiber for focusing light reflected by the mirror. The optical fiber illuminator has an improved optical arrangement for optical illumination and detection, it is easy to manufacture, its optical input is easy to control, and it can be readily provided in an array form.
    Type: Grant
    Filed: December 17, 2008
    Date of Patent: May 18, 2010
    Assignee: Electronics and Telecommunications Research Institute
    Inventors: Kang Ho Park, Eun Kyoung Kim, Sung Q Lee
  • Patent number: 7708899
    Abstract: A method for forming micro lenses includes the step of performing an etching treatment to an object to be processed, which includes a lens material layer and a mask layer having lens shapes and formed on the lens material layer, using an etching gas including SF6 gas and CHF3 gas, an etching gas including SF6 gas and CO gas, an etching gas including a gas having therein carbon and fluorine and CO gas, or an etching gas including two or more kinds of gases from a first gas having therein carbon and fluorine and a second gas having therein carbon and fluorine, to etch the lens material layer and the mask layer and transfer the lens shapes of the mask layer to the lens material layer, thereby forming the micro lenses.
    Type: Grant
    Filed: September 20, 2004
    Date of Patent: May 4, 2010
    Assignee: Tokyo Electron Limited
    Inventor: Hiroki Amemiya