Abstract: Systems and methods are disclosed herein to provide zoom and/or autofocus lenses. For example, in accordance with an embodiment of the present invention, a lens is provided with at least one tunable lens. The focal length and/or focus of the lens may be varied without mechanically moving or changing the separation between one or more lens components.

Abstract: A microlens for an image sensor fabricated using a seed layer and a method for fabrication of the same that does not involve a reflow process. The method of fabricating a microlens includes forming a seed layer pattern on a wafer, rounding the corner portions of the seed layer pattern by applying plasma, and then depositing an oxide film on the seed layer pattern.

Abstract: A main object of the present invention is to provide a pattern formed body capable of forming highly precise functional parts on various base materials, and a method for manufacturing the same. To achieve the object, the present invention provides a method for manufacturing a pattern formed body, having a plasma radiating step of radiating plasma to a patterning substrate having: a base material; an intermediate layer formed on the base material and containing a silane coupling agent or a polymer of the silane coupling agent; and a resin layer formed in a pattern form on the intermediate layer, wherein a fluorine gas is used as an introduction gas to radiate the plasma from the resin layer side.

Abstract: The present invention relates to a photochromic film comprising a photochromic dye and a resin component. The photochromic film has a nanoindentation hardness of equal to or greater than 800 nm on at least one of surfaces, surface A, thereof. The present invention further relates to a method of manufacturing a photochromic lens. The method of manufacturing a photochromic lens of the present invention comprises forming a photochromic film having a nanoindentation hardness ranging from 500 to 5000 nm on an outermost surface thereof as well as having a smaller nanoindentation hardness on a surface facing a first mold than that on the outermost surface by coating a photochromic liquid comprising a photochromic dye and a curable component on one surface of the first mold for formation of one of surfaces of a lens and subjecting the photochromic liquid to curing treatment, and a photochromic lens comprising a photochromic film on a lens substrate is obtained by means of the above first mold.

Abstract: A method for forming micro lenses includes the step of performing an etching treatment to an object to be processed, which includes a lens material layer and a mask layer having lens shapes and formed on the lens material layer, using an etching gas including SF6 gas and CHF3 gas, an etching gas including SF6 gas and CO gas, an etching gas including a gas having therein carbon and fluorine and CO gas, or an etching gas including two or more kinds of gases from a first gas having therein carbon and fluorine and a second gas having therein carbon and fluorine, to etch the lens material layer and the mask layer and transfer the lens shapes of the mask layer to the lens material layer, thereby forming the micro lenses.

Abstract: A method for forming micro lenses includes the step of performing an etching treatment to an object to be processed, which includes a lens material layer and a mask layer having lens shapes and formed on the lens material layer, using an etching gas including SF6 gas and CHF3 gas, an etching gas including SF6 gas and CO gas, an etching gas including a gas having therein carbon and fluorine and CO gas, or an etching gas including two or more kinds of gases from a first gas having therein carbon and fluorine and a second gas having therein carbon and fluorine, to etch the lens material layer and the mask layer and transfer the lens shapes of the mask layer to the lens material layer, thereby forming the micro lenses.

Abstract: Microelectronic imagers with integrated optical devices and methods for manufacturing imagers. The imagers, for example, typically have an imaging unit including a first substrate and an image sensor on and/or in the first substrate. An embodiment of an optical device includes a stand-off having a compartment configured to contain the image sensor. The stand-off has a coefficient of thermal expansion at least substantially the same as that of the first substrate. The optical device can further include an optics element in alignment with the compartment of the stand-off. The stand-off can be formed by etching a compartment into a silicon wafer or a wafer of another material having a coefficient of thermal expansion at least substantially the same as that of the substrate upon which the image sensor is formed. The optics elements can be formed integrally with the stand-offs or separately attached to a cover supported by the stand-offs.

Abstract: A light-condensing device and a method of fabricating the same are provided. The light-condensing device includes a central block, a pair of vertical diffraction grating blocks respectively located left and right of the central block, and a pair of horizontal diffraction grating blocks respectively located above and below the central block. The vertical diffraction grating blocks include parallel vertical diffraction gratings in the form of lines extending in the direction of a vertical axis, and the horizontal diffraction grating blocks include parallel horizontal diffraction gratings in the form of lines extending in the direction of a horizontal axis.

Abstract: A lens includes a gradient index of refraction and a curved shape. A method of making the lens includes forming a plurality of layers, forming a shaped resist on the plurality of layers, and etching the resist and the plurality of layers to transfer the shape of the resist into the plurality of layers.

Abstract: A new and improved optical element manufacturing method, through which lens elements can be efficiently mounted on a silicon V-shaped groove substrate at lower manufacturing costs, is provided. The method comprises a lens element forming step in which an oxide layer 104 is formed at a supporting layer 102 and lens elements 120 are formed at the upper surface of the silicon oxide film, a coating step in which a solder connection metal film is coated onto the side surfaces of the lens elements and a separating step in which the lens elements are separated by removing the silicon oxide film. Through this method, the solder connection metal film can be formed with ease at the sidewalls of the lens elements. The lens elements with the solder connection metal film formed at the side walls thereof can easily be soldered onto a supporting substrate.

Abstract: A stamp for patterning onto a receiving surface of an object (101) according to a defined pattern (P) comprises a stamping surface (21) of a resilient diaphragm (20). The stamping surface is planar at rest. The pattern is reproduced on the stamping surface and the diaphragm is affixed to a rigid body (13) along a peripheral edge, so that a middle part of the diaphragm can move along a direction perpendicular to the stamping surface. The diaphragm (20) is more flexible near the peripheral edge than in the middle part. Then, the pattern (P) printed on a pseudo-spherical receiving surface (103) using the stamp exhibits few distortion.

Abstract: A Fresnel lens-integrated optical fiber that can be easily aligned and manufactured in miniature, and a method of fabricating the same are provided. The Fresnel lens-integrated optical fiber includes a light transmission section transmitting incident light, a light expansion section coupled to the light transmission section and expanding light provided from the light transmission section, and a Fresnel lens surface formed on a section of the light expansion section and focusing by passing through the light expanded in the light expansion section at a predetermined focal length. Accordingly, since the Fresnel lens surface has no curvature, arrangement of an optical coupling system is easy, manufacture is easy, and the optical coupling system can be miniaturized.

Abstract: A method of fabricating micro-lenses is provided. A first layer is formed on a substrate. The first layer is comprised of a first material and the substrate is comprised of a second material. An opening is formed in the first layer and an etchant is provided in the opening to etch both the substrate and the first layer to form a first mold for a first micro-lens. The etchant etches the first layer at a different rate than the substrate. A lens material is added to the etched molds to form micro-lenses.

Abstract: A lens and its method of making. The lens includes a material having a lower index of refraction and a material having a higher index of refraction arranged in a pattern such that the lens has a gradient effective index of refraction.

Abstract: A micro-lens and a method for forming the micro-lens is provided. A micro-lens includes a substrate and lens material located within the substrate, the substrate having a recessed area serving as a mold for the lens material. The recessed can be shaped such that the lens material corrects for optical aberrations. The micro-lens can be part of a micro-lens array. The recessed area can serve as a mold for lens material for the micro-lens array and can be shaped such that the micro-lens array includes arcuate, non-spherical, or non-symmetrical micro-lenses.

Abstract: A laminated lens package and a method of fabricating the same are disclosed. The laminated lens package includes a first lens layer including a first lens element formed at one surface thereof through a first mold; a second lens layer including a second lens element formed at one surface thereof through a second mold, corresponding to a location of the first lens element; and a polymer layer provided between the first lens layer and the second lens layer. Accordingly, desired refraction can be implemented by controlling a refractive index. Also, since no spacers are used, defects caused by adhesion of an adhesive agent do not occur. Thus, a fabrication process is simplified, so that productivity can be improved and a fabrication cost can be reduced.

Abstract: A process that enables coplanarization of the structures that have been created in multiple independent etch steps. The various etches are performed independently by selectively exposing only certain patterns to particular etching conditions. After these structures have been created, it is possible that the various structures will exist at different planes/elevations relative to the template surface. The elevations of the various structures may be adjusted independently by selectively exposing “higher” structures to an anisotropic etch that reduces the overall elevation of the structures, while preserving the structural topography.

Abstract: A method for manufacturing an image sensor is provided. The method can include forming an oxide layer on a color filter layer, forming a first oxide layer microlens by etching the oxide layer, forming a second oxide layer microlens on the first oxide layer microlens, and forming a third oxide layer microlens on the second oxide layer microlens.

Abstract: Infrared radiation detection systems and methods of making the same are provided. In one embodiment, the radiation detection system comprises: a housing having an open end exposed to a radiation emitting object; a detector positioned in the housing, the detector comprising a radiation sensing material for detecting infrared radiation, the radiation sensing material having a portion removed by etching or coated by a mask such that only a region of the radiation sensing material is capable of detecting the infrared radiation; and a lens positioned in the housing for transmitting infrared radiation from the object to the detector.

Abstract: A microlens for an image sensor fabricated using a seed layer and a method for fabrication of the same that does not involve a reflow process. The method of fabricating a microlens includes forming a seed layer pattern on a wafer, rounding the corner portions of the seed layer pattern by applying plasma, and then depositing an oxide film on the seed layer pattern.

Abstract: A micro-optical element includes a support substrate, a micro-optical lens in a cured replication material on a first surface of the support substrate, and an opaque material aligned with and overlapping the micro-optical lens along a vertical direction.

Abstract: A packaged electro-optic integrated circuit and a multi-fiber connector including an integrated circuit substrate, at least one optical signal providing element, at least one optical signal sensor, sensing at least one optical signal from the at least one optical signal providing element and at least one discrete reflecting optical element, mounted onto the integrated circuit substrate, cooperating with the at least one optical signal providing element and being operative to direct light from the at least one optical signal providing element.

Abstract: A method of deforming a surface comprises exposing a composite article to a plurality of biological contractile cells, wherein the composite article comprises a substrate comprising a depression formed on a surface thereof; and a deformable layer having a first surface and an opposite, second surface, wherein the first surface of the layer is adheringly disposed on the surface of the substrate, and a portion of the layer covers the depression; and wherein the exposure is for a length of time and under conditions effective for the biological contractile cells to adhere to the second surface of the layer and deform the portion of the second layer covering the depression.

Abstract: Microlenses are fabricated with a refractive-index gradient. The refractive-index gradient is produced in a microlens material such that the refractive index is relatively higher in the material nearest the substrate, and becomes progressively lower as the layer gets thicker. After formation of the layer with the refractive-index gradient, material is etched from the layer through a resist to form microlenses. The index of refraction can be adjusted in the microlens material by controlling oxygen and nitrogen content of the microlens materials during deposition. High-oxide material has a lower index of refraction. High-oxide material also exhibits a faster etch-rate. The etching forms the material into a lens shape. After removal of the resist, the microlenses have a lower relative refractive index at their apex, where the index of refraction preferably approaches that of the ambient surroundings. Consequently, light loss by reflection at the ambient/microlens interface is reduced.

Abstract: A method for forming a micro-lens on a sapphire substrate in an LED process. In the method for forming the micro-lens on the sapphire substrate in the LED process, the ratio of source power and bias power used to generate plasma into a chamber is set to the optimum ratio of 3:1 in order to minimize the burning phenomenon of a photoresist mask caused by plasma having strong potential when a conventional micro-lens is formed. In essence, plasma having low potential energy can be realized in RIE etch used to form the micro-lens on the sapphire substrate, thereby minimizing the burning phenomenon of the photoresist mask. A yield rate can be improved in the LED process.

Abstract: A method for manufacturing an image sensor including forming an interlayer dielectric layer on a substrate including a photo diode; forming a color filter layer on the interlayer dielectric layer; forming an oxide film on the color filter layer; forming a plurality of micro lens patterns spaced apart on the oxide film; forming an oxide-based micro lens having a predetermined curvature by etching the oxide film using the micro lens pattern as a mask; and cleaning the micro lens patterns with a peroxosulfuric acid mixing solution.

Abstract: A method for forming an etching mask comprises the steps of: irradiating focus ion beam to a surface of a substrate and forming an etching mask used for oblique etching including an ion containing portion in the irradiated region. A method for fabricating a three-dimensional structure comprises the steps of: preparing a substrate; irradiating focus ion beam to a surface of the substrate and forming an etching mask including an ion containing portion in the irradiated region; and dry-etching the substrate from a diagonal direction using the etching mask and forming a plurality of holes.

Abstract: A semiconductor device and a method for manufacturing the same. The method includes setting a pattern region, forming a series of virtual mesh lines on the pattern region, forming a plurality of patterns in the pattern region, and substituting each of the patterns with either a red (R), green (G), or blue (B) patterns in accordance with a contact rule between the virtual mesh lines. Accordingly, it is possible to enhance the pattern uniformity between a main pattern region and a dummy pattern region, and thus to secure a uniform critical dimension (CD) of each pattern. Also, the patterning process for the color filter can be automatized to minimize the amount of data required to design a pattern. Also, the designing and manufacturing processes can be simplified, meaning that they can be more rapidly and precisely achieved.

Abstract: A method for manufacturing a lens forming master includes coating an organic insulation material on a substrate to form an organic insulation layer, removing a portion of the organic insulation layer with a laser which is irradiated through a first mask to form a lens shape on a surface of the organic insulation layer, and removing portions of the organic insulation layer with a laser irradiated through a second mask to form a contact hole and a bank area in the organic insulation layer.

Abstract: A method is for forming three-dimensional micro- and nanostructures, based on the structuring of a body of material by a mould having an impression area which reproduces the three-dimensional structure in negative form. This method includes providing a mould having a substrate of a material which can undergo isotropic chemical etching, in which the impression area is to be formed. An etching pattern is defined on (in) the substrate, having etching areas having zero-, uni- or bidimensional extension, which can be reached by an etching agent. A process of isotropic chemical etching of the substrate from the etching areas is carried out for a corresponding predetermined time, so as to produce cavities which in combination make up the impression area. The method is advantageously used in the fabrication of sets of microlenses with a convex three-dimensional structure, of the refractive or hybrid refractive/diffractive type, for forming images on different focal planes.

Abstract: A varifocal optical system includes a substantially circular membrane deposited on a substrate, and a ring-shaped PZT thin film deposited on the outer portion of the circular membrane. The membrane may be a MEMS-micromachined membrane, made of thermal oxide, polysilicon, ZrO2 and SiO2. The membrane is initially in a buckled state, and may function as a mirror or a lens. Application of an electric voltage between an inner and outer electrode on the piezoelectric thin film induces a lateral strain on the PZT thin film, thereby altering the curvature of the membrane, and thus its focal length. Focal length tuning speeds as high as 1 MHz have been demonstrated. Tuning ranges of several hundred microns have been attained. The varifocal optical system can be used in many applications that require rapid focal length tuning, such as optical switching, scanning confocal microscopy, and vibration compensation in optical storage disks.

Abstract: A flexible substrate having a plurality of lenses disposed in an array on a surface of the substrate wherein the lenses are formed by etching the substrate.

Abstract: A manufacturing method of an optical member for optical path conversion to be connected to an optical waveguide provided in a substrate includes forming plural inclined surfaces on a wafer by etching, forming openings corresponding to the inclined surfaces in a plate-like member, forming a combined body, in which the inclined surfaces and the openings correspond to each other, by bonding the wafer and the plate-like member, and dividing the combined body into small pieces each of which includes the inclined surface and the opening.

Abstract: The invention provides a method for manufacturing a microelectronic device and a microelectronic device. The method for manufacturing the microelectronic device, without limitation, may include forming a first mirror layer over and within one or more openings in a sacrificial spacer layer, and forming a dielectric layer over an upper surface of the first mirror layer and within the one or more openings. The method may further include subjecting the dielectric layer to an etch, the etch removing the dielectric layer from the upper surface and leaving dielectric portions along sidewalls of the one or more openings, and forming a second mirror layer over the first mirror layer and within the one or more openings, the dielectric portions separating the first mirror layer and the second mirror layer along the sidewalls.

Abstract: Provided is a method for fabricating an image sensor. In the method, a low temperature oxide layer is formed on a color filter layer, and a photoresist pattern is formed on the low temperature oxide layer. Subsequently, a heat treatment is performed on the photoresist pattern to form sacrificial microlenses. The sacrificial microlenses and the low temperature oxide layer are etched to form preliminary microlenses formed the low temperature oxide layer. The preliminary microlenses are etched to form microlenses having a reduced curvature radius in comparison with that of the preliminary microlenses.

Abstract: An image sensor and method for fabricating an image sensor are provided. The image sensor includes a substrate and a microlens array in a checkerboard pattern. In some embodiments, the checkerboard pattern involves alternating hydrophilic and hydrophobic microlenses.

Abstract: An image sensor and method of manufacturing thereof are provided. In an embodiment, an image sensor can include a photodiode on a substrate, an interlayer dielectric formed on the substrate, an insulating layer micro-lens on the interlayer dielectric, and an organic micro-lens on the insulating layer micro-lens.

Abstract: Increased yield of optical elements from cubic crystal rods, such as made of calcium fluoride, is made possible by orienting the optical elements for supporting the propagation of light along one of the <1 1 2>, <1 2 1>, or < 2 1 1> alternative crystal axis, which extend perpendicular to a main <1 1 1> crystal axis. A cleave is taken through the crystal rod along a primary crystal plane {1 1 1} normal to the <1 1 1> main axis. One of the <1 1 2>, <1 2 1>, or < 2 1 1> alternative crystal axes is located by optical inspection and indicated on the crystal rod with an orientation label. Additional cuts are taken parallel to the {1 1 1} primary crystal plane to divide the crystal rod into disks each containing a portion of the orientation label.

Abstract: A method of manufacturing a microlens includes: forming on a transparent substrate an etching stop layer in a lens formation region where a curved lens surface of the microlens is to be formed, the etching stop layer having an island shape as a planar shape thereof; forming an intermediate layer on the etching stop layer; forming an etching mask layer on the intermediate layer, the etching mask layer having an opening at a position facing the etching stop layer; and etching, by means of isotropic etching, the intermediate layer from the opening, and etching the transparent substrate and the intermediate layer from a side of the etching stop layer.

Abstract: Methods for fabricating refractive element(s) and aligning the elements in a compound optic, typically to a zone plate element. The techniques are used for fabricating micro refractive, such as Fresnel, optics and compound optics including two or more optical elements for short wavelength radiation. One application is the fabrication of the Achromatic Fresnel Optic (AFO). Techniques for fabricating the refractive element generally include: 1) ultra-high precision mechanical machining, e.g,. diamond turning; 2) lithographic techniques including gray-scale lithography and multi-step lithographic processes; 3) high-energy beam machining, such as electron-beam, focused ion beam, laser, and plasma-beam machining; and 4) photo-induced chemical etching techniques. Also addressed are methods of aligning the two optical elements during fabrication and methods of maintaining the alignment during subsequent operation.

Abstract: Methods for creating a write head by forming a bump after the top pole is formed are provided. In one embodiment, a bottom pole is created out of a first layer. A non-magnetic gap material is applied to the surface of the wafer. A top pole is created out of a second layer. After creating the top pole, a bump is created. The bump is used to protect at least a portion of the first layer while etching to create a stray flux absorber.

Abstract: In a micro-lens array substrate (12) that includes first and second micro-lens arrays (6, 7) respectively having a plurality of lenses, the first micro-lens array (6) is sandwiched between two inorganic dielectric substrates (21, 24), and the second micro-lens array (7) is formed on one of the two inorganic dielectric substrates (21, 24).

Abstract: A large diameter glass wafer is pattern-etched to provide a plurality of elongated lens elements arranged side-by-side, the etching leaving small rods in place to keep the lens elements connected to the wafer during mirror processing. The etching provides curved surfaces for lenses and flat surfaces for mirrors. The mirrors are formed by selectively depositing reflective material on the flat surfaces. The reflective material may comprise an oxide, nitride, sulfide, or fluoride of a transition metal. The flat surfaces that define the mirrors are disposed at angles to the longitudinal dimension of each lens element. In use in an optical disc system, light from a laser diode is reflected by the mirrors and directed at an optical disc through a first lens. Light returns from the disc on a parallel path through a second lens, passes through the lens element, and is directed at a photodetector. The system may include an elongated base element attached to each lens element.

Abstract: An ink-jet recording head has a plate-shaped member including a first layer with a partition wall formed by a first etching process and defining a pressure chamber, an ink inlet passage and a common ink storage chamber, a second layer with a land formed by a second etching process so as to correspond to the pressure chamber, and an intermediate layer sandwiched between the first and the second layers. The recording head also has a pressure producing device disposed with its extremity in contact with the land, and a nozzle plate with a nozzle hole bonded to the front surface of the plate-shaped member. An ink particle is jetted through the nozzle hole when the pressure in the pressure chamber is changed by the pressure producing device.

Abstract: A method of forming a microlens array includes preparing a substrate; fabricating a photosensitive array on the substrate; depositing a layer of lens material on the photosensitive array; depositing and patterning photoresist on the lens material, wherein patterning includes forming a photoresist region having a solid curved upper surface and a substantially rectangular base on the lens material layer; developing the photoresist; reflowing the photoresist; and processing the lens material for form a microlens array.

Abstract: A method of manufacturing a micro-lens is disclosed. The method includes providing a convex photoresist surface, forming a lens mold on the convex photoresist surface, removing the lens mold from the convex photoresist surface, forming a micro-lens in the lens mold and removing the micro-lens from the lens mold.

Abstract: A substrate processing method is provided including: shaping a laser beam emitted from a laser beam source into a beam having a focal depth larger than the maximum value of a variation in thickness of a processing area portion of a processed substrate and the maximum value of a variation in bend thereof by making the laser beam pass through an diffractive optical element; forming plural etching holes by irradiating the shaped beam onto a film formed on the substrate to remove the film; and forming plural recessed portions by etching the substrate through the plural etching holes.

Abstract: A method of microlens fabrication for use in a photosensor includes preparing a photodetector element array which is sensitive to light in a specific color domain and depositing microlens material on the photodetector element array. The structure is coated with photoresist, and the photoresist is masked and exposed in a separate exposure for each color in the color domain. The photoresist is developed and the microlens material etched to form a microlens array.

Abstract: A method is provided for manufacturing an electro-optical device, in which fine scratches or cracks can be removed by etching without damaging wiring, an electro-optical device, and an electronic apparatus. According to the method, a liquid crystal panel used in an electro-optical device is cut as a single product. Then, before an IC mounting step, in a state of the single product liquid crystal panel, a wet etching is performed on the cut faces and edges of the first and second substrates to remove fine scratches or cracks from the cut faces and edges of the substrates. At this time, wiring portions, IC mounting terminals, substrate mounting terminals, and alignment marks, which are formed on the protruding region, are covered with a protection layer.

Abstract: If after manufacture it is found that the thickness of a solid immersion lens is less than a target thickness value, an adjustment portion is adhered thereto by vapor deposition so as to reduce the amount of thickness deficiency. If the solid immersion lens is made of quartz glass, SiO2 is used as the material which is vapor deposited. If the thickness of the solid immersion lens is greater than the target value, then it is reduced by etching.