Abstract: An electrostatic-magnetic lens is provided having either a symmetrical or asymmetrical magnetic lens which is overlaid with an electrostatic immersion lens. One electrode of the immersion lens is formed as a hollow cylinder, which is within an upper pole piece of the magnetic lens concentrically relative to the axis of symmetry thereof and extending into the region of the pole piece gap. The lower pole piece of the magnetic lens is preferably at a ground potential and clad with the beam guiding tube for protection against contamination and forming the lower electrode of the electrostatic immersion lens.

Abstract: A transmission electron microscope for irradiating a sample with an electron beam and for causing an image formation lens system to enlarge the electron beam having passed through the sample so that a magnified image of the sample is formed by the electron beam. The image formation lens system includes a plurality of lens groups each having a plurality of electromagnetic lenses, and the focal length of each of the electromagnetic lenses included in at least one lens group is changed while keeping the resultant focal length of each lens group constant, to rotate the magnified image in a state that the magnification of the image is kept constant.

Abstract: A time of flight mass spectrometer is disclosed comprised of a deflection field for ion parcels including at least one pair of inner and outer electrodes. The inner and outer electrodes present ion guiding surfaces which in planes normal to the ion flight path are convex and concave, respectively, and more closely spaced at their edges than at any mediate location.

Abstract: A spectrometer-lens for particle beam apparatus is formed by a short focal length magnetic lens having an integrated electrostatic retarding field spectrometer and a single-stage deflection unit arranged within said lens. To avoid deflecting secondary particles that are triggered at a specimen by a primary particle beam, nearly uniform electrical and magnetic deflection fields are generated by the deflection unit oriented relative to one another such that their field vectors reside perpendicular to one another and respectively perpendicular to a velocity vector of the secondary particles attracted from the specimen.

Abstract: The invention provides a charged-particle energy analyzer of the cylindrical mirror type (2,9,10) which incorporates beam shaping means (5,6) at one, or preferably both, ends. The beam shaping means to convert a substantially parallel beam of charged particles to an annular beam which diverges at the optimum entrance angle of the CMA, and v.v. They enable the CMA to operate efficiently with parallel input and output beams of circular cross section, and allow it to be efficiently combined with a mass analyzer, especially a quadrupole mass analyzer (31,32) to provide a compact energy-filtered mass spectrometer particularly suitable for secondary ion mass spectrometry.

Abstract: A method and an apparatus for irradiating a relatively large area with a charged particle beam. In the method, a pencil-like beam is generated and spread along a fan axis perpendicular to the beam axis. The fan axis is rotated around the beam axis so that finally a circular area is irradiated. The apparatus includes means for generating a pencil-like beam, a lens system for spreading the beam along the fan axis and means to rotate the fan axis around the beam axis. In a preferred embodiment, the beam is spread such that its transverse intensity distribution increases with increasing distance from the beam center so that the area swept by the beam is irradiated with an even intensity.

Abstract: A lens arrangement (30) for the focusing of a beam of electrically charged particles (24) in the beam path of imaging systems, more particularly in mass spectrometers (10), is indicated, the lens arrangement (30) being connected to an electrical voltage supply. The lens arrangement (30) is situated at the location or in the vicinity of the intermediate image (29) produced by the imaging system, and consists of a plurality of plates (32 to 35) disposed in succession, with aligned transmission apertures (38 to 41), the plates being connected to adjustable electrical voltages.

Abstract: In an electron spectrometer, electrons emanating from a source are collected and focused to a collimated stream by an electrostatic lens free of spherical aberration. The lens includes a pair of axially spaced concave grids approximating sections of concentric ellipsoids having a common focii and coaxial semi-major axes. The collimated electron stream is inducted into an electric radial cylindrical analyzer for focusing the electrons into radially dispersed lines on a position-sensitive detector with the radial dispersion being a function of their energies. The cylindrical analyzer section subtends an angle of approximately 63.5.degree.. The grid openings in the grids of the electrostatic collimating lens are elongated in a direction transverse to the stream of the electrons passing therethrough and parallel to the radial electric field lines at the entrance to the electric analyzer to reduce the dispersive effect of the grids.

Abstract: A method of correcting the aberration of an electron beam due to astigmatism and field curvature of focus by feeding a correction current through stigmator coils and a focus correction coil. The correction currents are determined by measuring a sharpness P of the electron beam. The sharpness P is defined as a product of p.sub.x, a sharpness measured when the electron beam is deflected in X direction, and p.sub.y, a sharpness measured when the electron beam is deflected in Y direction: P=p.sub.x .times.p.sub.y. The use of the sharpness P provides good convergence of the measurements and it becomes possible to calibrate the electron beam for many points in the scanning field. Thus, it is possible to attain maximum resolution over an entire scanning field.

Abstract: A technique for correcting spherical and other aberrations in a particle beam. Spherical aberration is caused by variations in beam behavior dependent on the cube of the radius or radial position with respect to the beam axis. To correct for such aberration, the beam is passed through multiple compensation electric field arrays, each of which has multiple rows of parallel wires stretched transversely across the beam path, the rows being biased with separate voltages to provide an electric field that varies in proportion to the cube of the distance from the central row of the array. The multiple arrays provide a cylindrically symmetrical electric field, and are oriented at a uniform angular spacing, which, for spherical aberration, is 120 degrees.

Abstract: An angular resolved spectrometer is provided which is capable of analyzing the energy of charged particles from an analysis source and simultaneouosly obtaining spectra with a resolution of .+-.1.0.degree. for a range of angles of emission up to an order of 340.degree. in a single selected plane of emission. Concentric toroidal electrode sectors move charged particles with emission angles -.alpha..sub.o .ltoreq..alpha..ltoreq.+.alpha..sub.o, any .beta. angle, and a chosen energy, entering at a path midway of the inlet end of an open-ended annular toroidal-contoured passageway formed by said concentric toroidal sectors and between which an electrical field is arranged in operation to be established, so that charged particles with said energy and angles (.alpha.,.beta.) will be refocused such that those charged particles with differing .alpha. angles are strongly refocused but those charged particles with differing .beta. angles are only weakly refocused, thereby to retain the required .beta.

Abstract: In an apparatus for forming a single crystal semiconductor layer from a non-single-crystalline semiconductor material by scanning a region of the material with an electron beam, a first pair of deflection electrodes and a second pair of deflection electrodes, both pairs being provided in the path of the electron beam. A deflection signal generated by modifying the amplitude of a high-frequency fundamental wave signal with a modulation wave signal having a frequency lower than that of the high-frequency fundamental wave signal is supplied to the deflection electrodes of the first pair. The electrodes rapidly deflect the electron beam in a first direction, while changing the range of deflecting the beam, thereby forming a locus of the beam spot on the sample. Simultaneously, the deflection electrodes of the second pair deflect the beam in a second direction, thereby annealing a region of the material, to form a single crystal semiconductor layer.

Abstract: Quadrupole electron lenses 21, 22, 23 and 24 are disposed between an energy-dispersing device 15 and a parallel detector 50 in an electron energy-loss spectrometer. The power and polarity of the quadrupole lenses may be adjusted to simultaneously provide the desired energy dispersion of the spectrum, and a precise match between the width of the spectrum and the width of the parallel detector. Additional quadrupole lenses may be interposed between quadrupole lens 24 and the detector 50 to further increase the energy dispersion.

Abstract: A spectrometer for high-resolution particle energy loss spectroscopy is described. Specifically, the high-resolution particle energy loss spectrometer of the present invention comprises: source means for producing a collimated beam of particles; first stage monochromator means for selecting particles within a specified energy range; intermediate particle lens means for collimating, accelerating and decelerating the particles exiting from the first stage monochromator means; second stage monochromator means for selecting particles within a specified energy range; exit particle focusing means; input particle focusing means; cylindrical analyzer means for selecting particles with a specified energy range; and detector means for detecting impinging particles. The spectrometer described herein obtains higher system resolution at a given output current than other spectrometers known in the art.

Abstract: An ion energy filter of the type useful in connection with secondary ion mass spectrometry is disclosed. The filter is composed of a stack of 20 thin metal plates, each plate being insulated from the others and having a centrally located hole with a unique radius. A metallic hemisphere is mounted on a base plate, and the 20 thin metal plates are attached to the base plate such that the plate with the smallest central hole is adjacent to the base plate and the radii of the holes in subsequent plates increase with increasing distance from the base plate. The relative potential of each plate is determined by a series string of 20 resistors with each plate being connected to a different junction in the series string. The radii of the centrally located holes are selected such that the voltage on each plate is inversely proportional to the radius of its centrally located hole.

Abstract: An electrostatic deflection plate for charged particle beam systems is formed of a planar semiconductive substrate having a conductive region at the substrate surface. The conductive region is diffused or implanted into the body of the substrate, or one or more conductive layers are deposited upon the substrate surface. The substrate material is preferably silicon and the diffused or implanted region is formed of a nonmagnetic, nonoxidizable metal such as gold or platinum. The deposited conductive region may be formed of a single layer of these or similar metals, one or more conductive underlayers with a nonmagnetic, nonoxidizable overlayer, a single or multilayer structure with a conductive oxide on the outermost layer, or a metallo-organic compound which forms a conductive layer during following heat treatment. The deflection plates are fabricated using conventional semiconductor processes and form durable structures which minimize eddy current effects.

Abstract: A method and apparatus which uses combined quadrupole (Qx and Qy) and multipole magnet sets (Mx and My) to focus a charged particle beam from a point source is described. Primarily the multipole magnet sets are octupole magnets. The apparatus is particularly useful for providing a uniform intensity for ion implantation, in cancer therapy and in other fields where uniform charged particle irradiation of a surface is important.

Abstract: Apparatus for measuring the angular distribution of charged particles scattered by a sample surface, having a source for the production of a primary particle beam and a deflection system for the deflection of the scattered particles onto the entry orifice of a detector connected to the deflection system, useful, for example, for the study of crystal surfaces by the so-called LEED technique. On the side of the deflection system opposite the sample not only a detector but also a particle source is disposed such that the primary beam also passes through the deflection system. The scannable range of the apparatus for determining the angular distribution of scattered electrons resulting from diffraction is considerably greater than that of the prior art.

Abstract: An ultra-compact electrostatic electron gun includes integrated beam-modifying means for use in electron beam memory systems, electron microscopes, electron lithographic devices and the like. The gun is illustrated as comprising means forming a point source of electrons and means receiving electrons from the point source for defining an electron beam. Electrostatic lens means receives the beam and forms a beam focus. An integrated magnetic field-generating means establishes a field of magnetic flux through the electrostatic lens for modifying the position, cross-sectional shape or other characteristic of the beam.

Abstract: Lithographic apparatus for producing microstructures which comprises a particle beam source 1 and a condenser lens system 2, 3 and a controllable aperture diaphragm 4 having line-shaped multi-hole structures 17 . . . 22 for generating a plurality of particle beam fingers. A blanking diaphragm and an imaging optic structure 6, 7 OL are also provided. The invention produces a higher output of exposed structures than the prior art and for this purpose the particle beams are combined to form a ribbon beam which has the greatest cross-sectional dimension 12, 13 approximately in the longitudinal direction 23 of the line-shaped multi-hole structure 17 . . . 22 and which has the smallest cross-sectional dimension which does not significantly exceed the width of the multi-hole structure. The multiple beams are utilized in lithographic apparatus for generating semiconductor circuits in the submicrometer region on a GaAs base and for generating components for optical communications technology.

Abstract: Method and apparatus for locating the centroid along a line section of an ion beam in a vacuum chamber, requiring no moving parts and requiring only two electrical conductors passing through the wall of the vacuum chamber. An array of Faraday cup current sensors is positioned along a line in the path of the beam at predetermined distances from a reference point, so that each sensor intercepts a component of the beam. A first plurality of resistors each has one end connected to one of the beam current sensors, has a value proportional to the distance between the beam current sensor to which it is connected and the reference point, and has its other end connected to a first common point. A second plurality of resistors having values equal to each other each has one end connected to one of the beam current sensors, has a value much greater than the largest of the first plurality of resistors, and has its other end connected to a second common point.

Abstract: An apparatus for pulsing an electron beam in an electron beam test probe used for examining integrated circuits is disclosed. The apparatus includes a structure having two intersecting channels cut therein. The electron beam passes through a first one of these channels enroute to the integrated circuit being tested. A linear conductor is disposed along the axis of the second channel such that the combination of said conductor and said second channel forms a coaxial transmission line. An electric field is generated in the second channel by applying a suitable potential between the linear conductor and the second channel. This electric field extends into the first channel from the region common to both channels.

Abstract: A spherical grid for use in instrumentation comprising a rigid non-magnetic frame having a pattern of holes. Into each hole a flat wafer is placed, each wafer having etched therein holes defining the grid mesh. The frame maintains the geometric conformal shape allowing large units to be constructed.

Abstract: The invention is concerned with a power supply for the lens for fine adjustment among the beam-focusing lenses in an ion microbeam apparatus, and is concerned with the control thereof. In this ion microbeam apparatus, the power supply is provided for the lens for fine adjustment in addition to the power supply for the lens for rough adjustment. The power supply is served with a potential that so controls the beam as to have an optimum diameter, responsive to the signals from the ion beam detector and from the beam deflector means.

Abstract: The invention includes a method for obtaining an exact electrostatic quadrupole field by the use of simple structures having high resistance materials of uniform or continuously varied thickness to form closed boundaries. The potential of these boundaries is continuously varied with respect to position in accordance with specified design criteria. The method and structures can be used in electron optical systems and related scientific instruments.

Abstract: An apparatus, such as an electron beam column (1), with high-speed deflection capability comprises a gun (2) which directs a beam (3) of charged particles by several magnetic lenses (9,11,13a,13b) towards a target (4). Magnetic deflection coils (12a,12b) produce a variable magnetic field for controllably deflecting the beam. The beam is surrounded by an electrically conductive surface (16a,16b,22) which in the vicinity of the deflection coils is constituted by a tube (22) comprising a single wire of, for example, nichrome preferably coated by an oxide film formed naturally and comprising a close-wound helix. This tube construction has a longitudinal resistance which significantly impedes the flow of undesirable eddy currents therein. On the other hand the tube can readily conduct along a helical path so that charge accumulation on the tube walls is avoided.

Abstract: An apparatus for implanting an ion microbeam consists of an ion source; a beam-focusing system which accelerates ions emitted from the ion source, focuses the ions, separates the ions by mass, and deflects the ions; and a sample plate which minutely moves a sample. A Wien filter in which a uniform electric field intersects a uniform magnetic field at right angles is used to separate the ions by mass in the beam-focusing system. A linear optical axis is bent in the Wien filter so that the axis of the ion beam emitted from the ion source intersects the axis of an ion beam implanted into the sample.

Abstract: The invention provides an improved direct-write/read charged particle beam lithography/readout system employing multiple channel charged particle beam optical columns wherein a plurality of individually controlled, single deflector stage charged particle beam optical columns are operated in parallel to simultaneously write or read the same or complementary semiconductor device microcircuit patterns on a plurality of different target areas of a semiconductor target wafer whereby considerably increased thru-put of a microcircuit fabrication facility is achieved.

Abstract: When AC voltages in-phase to each other are superposed on the DC voltages applied to a pair of opposing electrodes of a quadrupole lens, the waveform of the intensity of the ion beam is disturbed only if the central orbit of ions is deviated from the center of the quadrupole lens. In view of this, adjustment of the central orbit of ions is facilitated with the help of variations in the waveform of the intensity of the ion beam while superposing the AC voltages in-phase to each other on the DC voltages applied thereto.

Abstract: A system for scanning a beam of charged-particles across a target is described which compensates for energy dispersion in the beam. A time-varying magnet with circular pole pieces is used to sweep the beam left to right. Two wedge-shaped magnet dipoles, one on each side of the center line are used to bend the beam parallel to the center line and compensate for beam energy dispersion.

Abstract: A scanning lens system for a particle beam scanning device having deflection elements and optical lenses for corpuscular radiation characterized by the deflecting elements being deflecting dipole elements which are disposed in the particle beam directly preceding at least one imaging lens so that the deflection chromatic aberration for arbitrary deflection angles should disappear and the lens field of a magnetic projection lens should be free of magnetic deflection elements. As a result of the arrangement, the isotropic deflection chromatic aberrations of the dynamically deflecting dipole elements compensates the isotropic off-axis chromatic aberrations of at least one imaging lens and at least one imaging lens forms an image rotation-free system.

Abstract: A method and apparatus for measuring lengths in a scanning particle microscope employ a device for generating a particle beam directed toward a specimen stage on which a specimen is mounted. A second stage is placed over the specimen stage above the specimen, the second stage carrying a calibrated grid structure covering the region of the specimen to be measured. The grid structure is disposed a distance from the specimen which is less than or equal to the depth of focus of the apparatus. The grid structure is of known dimensions, and is utilized to provide bench marks for measuring distances on the specimen, and can be displaced as needed to measure longer distances.

Abstract: The technique of measuring the spotsize and edgewidth of an electron beam by incrementally scanning the beam through discrete scan locations across a sharp edge is improved by processing the resulting beam current signals directly rather than the differentiated beam current signal. A linear regression is performed on beam current data points expected to fall in the linear portion of the beam current versus beam position characteristic in order to provide a linear approximation of the overall characteristic. Extrapolation of the linear function to its intersections with the maximum (I.sub.1) and minimum (I.sub.0) beam current levels yields corresponding beam positions Z.sub.B and Z.sub.A, such that (Z.sub.B -Z.sub.A) is a measure of spotsize in the scan direction. Edgewidth between the twelve and eighty-eight percent amplitude levels is obtained by locating measured beam currents at incremental scan locations on both sides of beam positions Z.sub.A and Z.sub.

Abstract: An improved deflection amplifier interconnection circuit structure for charged particle beam write/read apparatus having a deflector stage wherein the charged particle apparatus is mounted within an evacuated housing by a support member. Transmission line-type printed wiring conductor patterns are provided within the insulating support member which serves as a combined electrical and vacuum feed-thru structure. The transmission line-type printed wiring conductor pattern interconnects the output of a deflector drive amplifier to the deflector element of the charged particle beam apparatus within the evacuated housing. An improved impedance match between the deflector drive amplifier and the deflector element is obtained along with improved cooling capability for the amplifier and elimination of the need for mounting the amplifier within a separate housing remotely located from the evacuated housing for the charged particle apparatus.

Abstract: In an electron microscope employing a multi-element electrostatic lens and a position adjustable electron emission gun, the gun tip must be in precise alignment with the very small apertures in the lens elements for high resolution imaging. If the tip is precisely aligned, there will be no variations in displacement of an image if the lens element potentials are varied; if there is misalignment, the image displacement will vary with voltage variations. Thus, proper alignment of the gun tip is easily and rapidly achieved by varying the lens element potential with an oscillator while adjusting the position of the gun tip to a zero image variation.

Abstract: The invention relates to an apparatus for irradiating material by an electron beam. The apparatus comprises guidance means for placing the material on the path of the beam, an electron gun provided in a tight enclosure having a shape with a symmetry or revolution with respect to an axis, an electron-emitting filament located in the axis of the enclosure, as well as a Wehnelt electrode surrounding the filament. It is provided with a first circular slot for concentrating electrons in the vicinity of the said slot and an electron accelerating electrode surrounding the Wehnelt electrode and having a second circular slot facing the first slot. The enclosure comprises a tightly closed circular window which is transparent to the electrons and which faces the two slots.

Abstract: The invention provides a modular-building block method and system of fabrication, installation, alignment and operation of a multi-beam assembly of miniaturized, all-electrostatic charged particle optical columns, such electron beam or ion beam optical columns mounted in parallel in a closely packed cluster over a small target surface area for parallel simultaneous charged particle beam writing on the target surface with the multiple-channel cluster of charged particle beam optical columns. The assembly provides a system and method of increased thru-put in the direct charged particle beam writing on semiconductor target wafers during fabrication of semiconductor micro-circuit chips.

Abstract: A spectrometer for high-resolution particle energy loss spectroscopy is described. Specifically, the high-resolution particle energy loss spectrometer of the present invention comprises: source means for producing a collimated beam of particles; first stage monochromator means for selecting particles within a specified energy range; intermediate particle lens means for collimating, accelerating and decelerating the particles exiting from the first stage monochromator means; second stage monochromator means for selecting particles within a specified energy range; exit particle focusing means; input particle focusing means; cylindrical analyzer means for selecting particles with a specified energy range; and detector means for detecting impinging particles. The spectrometer described herein obtains higher system resolution at a given output current than other spectrometers known in the art.

Abstract: The present invention relates to an apparatus for detecting the secondary electrons which are obtained from a sample (4) when the sample is irradiated with an electron beam (2). When this electron beam (2) is subjected to a low acceleration voltage, it is desirable to detect the secondary electrons efficiently without interfering with the deflection of the electron beam (2). In order to solve this subject matter, there is used a means (7) for generating an electric field and a magnetic field which are so perpendicular to each other that they apply deflecting forces in the direction common to the secondary electrons while applying no deflecting force to the electron beam as a whole.

Abstract: A particle-accelerating electrode designed as a Faraday cage and having positioned therein a blanking system for blanking a particle beam. With the electrode disclosed, the problem of providing a vacuum seal in a particle-optical column is solved in simple fashion without the particle-optical column having to be lengthened. A structure for vacuum sealing is provided in a beam path of the electrode as part of the particle-accelerating electrode.

Abstract: A variable energy, high flux atomic oxygen source (10) comprising means (48) for producing a high density beam of molecules which will emit O.sup.- ions when bombarded with electrons; means (44) for producing a high current stream of electrons at a low energy level passing through the high density beam of molecules to produce a combined stream (54) of electrons and O.sup.- ions; means (32) for accelerating the combined stream to a desired energy level; means (12) for producing an intense magnetic field to confine the electrons and O.sup.- ions; means (56, 58) for directing a multiple pass laser beam (62) through the combined stream to strip off the excess electrons from a plurality of the O.sup.- ions to produce ground-state O atoms within the combined stream; electrostatic deflection means (68, 70) for deflecting the path of the O.sup.- ions and the electrons in the combined stream; and, means (78) for stopping the O.sup.

Abstract: The invention relates to a system for the deflection of a beam of charged particles, which deflects a particle beam entering at any point into the deflection system such that it impinges upon the entrance orifice of a detector disposed at the exit from the deflection system. The deflection system comprises eight rotationally symmetrically disposed deflection plates and preferably includes two sections in order to achive a large range of uniform field strength in the deflection and a perpendicular impingement of the beam on the detector orifice.

Abstract: Between the electrostatic sector (SE 23) and the magnetic sector (SM 30) of a mass spectrometer, there is provided a quadrupole (QP 26) which applies parallel beams to the magnetic sector whose inclination depends on the energy dispersion of the particles. A slotted lens (LF 27) corrects the divergence of the quadrupole in the perpendicular plane. A suitable relationship between the angle of the inlet face of the magnetic sector (SM 30) and the deflection angle provided thereby ensures that the second order aperture aberrations of the magnetic sector are corrected. The chromatic aberrations may be corrected by means of a hexapole (HP 25) centered on the focus of the quadrupole (QP 26). Another hexapole (HP 22) placed upstream from the electrostatic sector (SE 23) level with a constriction in vertical section of the particle beam serves to correct second order aperture aberrations related to the electrostatic sector (SE 23).

Abstract: A three element asymmetric lens system having a very low chromatic aberration coefficient is used in conjunction with a TFE electron source having an angular intensity of approximately 10.sup.-3 amperes per steradian to achieve precise focusing of the resulting electron beam despite the large energy spread thereof for beam, accelerating ratios in the range from 0.2 to 6.0. In one embodiment, an FI ion source is used in conjunction with the same type of lens system to initially visualize the surface of the integrated circuit. The ion beam then is rapidly focused on and scanned across a small area of passivation over an underlying metal conductor to sputter a hole through the passivation layer to the metal. A secondary electron collecting apparatus detects a large increase in the secondary electron emission when the ion beam reaches the metal. The electron beam then is scanned across the surface of the integrated circuit.

Abstract: When a transmission-type electron microscope is used to make an observation of a diffraction image produced by a focused electron beam, it is desired that the divergence angle of the electron beam be varied at will while maintaining the spot diameter of the beam on a specimen constant. The present invention provides three stages of focusing lenses and a means for controlling these lenses in interrelated manner in a space between an objective lens and an electron gun in which the specimen is placed. The three stages of lenses are designed to be controlled independently. When an operation is performed to increase the divergence angle of the electron beam, the excitations of the first and second stages of focusing lenses are reduced while the excitation of the third stage of focusing lens is increased, thus maintaining the spot diameter of the beam on the specimen constant.

Abstract: An apparatus for chopping a charged particle beam comprises: deflecting means for deflecting a charged particle beam by a high frequency voltage; deflecting means for deflecting the charged particle beam by a DC voltage or low frequency saw-tooth voltage in the same deflecting direction as the high frequency deflecting means does; and aperture means for taking out only a part of the charged particle beam deflected. The generation time point of the pulse beam which is generated at a high frequency is arbitrarily adjusted by the DC voltage or low frequency saw-tooth voltage.

Abstract: In a corpuscular-optical beam path, the generation of short electron pulses with steep leading edges is to be effected without a probe movement in the probe plane taking place. For this purpose, the particle beam blanking system comprises at least two deflection systems and a knife edge arranged between two deflection systems in an intermediate image plane, the operating parameters of the deflection systems and the knife edge being matched to the energy distribution of the particles in such a fashion that shifting of the particle beam in the probe plane disappears.

Abstract: A method for large-angle convergent-beam diffraction comprises selecting a portion of the diffraction pattern formed by an objective lens, by the use of a diaphragm. Then, a portion of the electron micrograph which is formed by the electron beam passed through the diaphragm is detected, thus producing a signal. This enables a large-angle convergent-beam electron diffraction method that permits one to examine a specimen region which is much narrower than conventional.

Abstract: In order to find criteria for the adjustment of an optimum focus, lens correction, specimen shift and the like, measurements are performed by means of a beam wobbler and the corresponding generation of a variable F(s)=.THETA..vertline.(Xi-Yi+s).vertline.* in order to determine that s-value for which F(s) is a minimum. Using this image shift value is then used to make a correction preferably automatically.

Abstract: An electron beam or similar charged particles may be deflected by passing through an electrostatic field produced in a deflecting structure. The degree of deflection is controlled by rotating the deflecting structure and path relative to one another. The beam may be rotated relative to the structure by a magnetic beam deflector which compensates for a range of electron energies within the beam so that all electrons are deflected in the electrostatic field by an equal amount.