Abstract: A technique to provide power management for multiple dice. The technique provides for determining for each respective die of the multiple dice, power consumption for operating each respective die; and generating a respective signal from each respective die that corresponds to the power consumption of each respective die. The technique further provides for converting each respective signal to a respective analog voltage to drive a common node; and utilizing a charge storage device coupled to the common node to accumulate the respective analog voltages from the dice, where the accumulated voltage indicates total power consumption of the dice.

Abstract: Semiconductor devices, packaging architectures and associated methods are disclosed. In one embodiment, a memory chiplet is disclosed. The memory chiplet includes at least one memory die of a first memory type. Memory control circuitry is coupled to the at least one memory die. An interface circuit is for coupling to a host IC chiplet. The interface circuit includes data input/output (I/O) circuitry for coupling to multiple data lanes. Link directional control circuitry selects, for a first memory transaction, a first subset of the multiple data lanes to transfer data between the memory chiplet and the host IC chiplet.

Abstract: A processing apparatus includes a processing resource including a general-purpose parallel processing engine and a matrix accelerator. The matrix accelerator includes first circuitry to receive a command to perform operations associated with an instruction, second circuitry to configure the matrix accelerator according to a physical depth of a systolic array within the matrix accelerator and a logical depth associated with the instruction, third circuitry to read operands for the instruction from a register file associated with the systolic array, fourth circuitry to perform operations for the instruction via one or more passes through one or more physical pipeline stages of the systolic array based on a configuration performed by the second circuitry, and fifth circuitry to write output of the operations to the register file associated with the systolic array.

Abstract: A semiconductor structure includes a substrate, an insulating layer disposed on the substrate, an active layer disposed on the insulating layer, a plurality of isolation structures in the active layer to define a first device region and a non-device region of the active layer, a first semiconductor device formed on the first device region of the active layer, and a charge trap structure extending through the non-device region of the active layer. In a plane view, the charge trap structure and the non-device region form concentric closed ring surrounding the first device region.

Abstract: Systems and methods for mitigating defects in a crossbar-based computing environment are disclosed. In some implementations, an apparatus comprises: a plurality of row wires; a plurality of column wires connecting between the plurality of row wires; a plurality of non-linear devices formed in each of a plurality of column wires configured to receive an input signal, wherein at least one of the non-linear device has a characteristic of activation function and at least one of the non-linear device has a characteristic of neuronal function.

Abstract: The embodiments herein relate to semiconductor memory devices and methods of forming the same. A semiconductor memory device is provided. The semiconductor memory device includes a memory cell having a first electrode, a second electrode, a switching layer, and a via structure. The second electrode is adjacent to a side of the first electrode and the switching layer overlays uppermost surfaces of the first and second electrodes. The via structure is over the uppermost surface of the second electrode.

Abstract: An anti-fuse array includes first through fourth adjacent anti-fuse bit columns, the anti-fuse bits of the first and second anti-fuse bit columns including portions of active areas of a first active area column, and the anti-fuse bits of the third and fourth anti-fuse bit columns including portions of active areas of a second active area column. Each row of a first set of conductive segment rows includes first and second conductive segments positioned between adjacent active areas of the first active area column and a third conductive segment positioned between adjacent active areas of the second active area column. Each row of a second set of conductive segments alternating with the first set of conductive segment rows includes a fourth conductive segment positioned between adjacent active areas of the first active area column and fifth and sixth conductive segments positioned between adjacent active areas of the second active area column.

Abstract: Semiconductor devices, packaging architectures and associated methods are disclosed. In one embodiment, a multi-chip module (MCM) is disclosed. The MCM includes a common substrate and a first integrated circuit (IC) chiplet disposed on the common substrate. The first IC chiplet includes at least one processing element. A communications fabric switchably couples to the at least one processing element. A peripheral gearbox chiplet (PGC) includes a first port having a second memory-agnostic interface coupled to the first memory-agnostic interface of the first IC chiplet. The PGC includes a second port having a memory interface of a first type and interface conversion circuitry disposed between the second memory-agnostic interface and the memory interface of the first type.

Abstract: A wafer-level method of testing an integrated circuit (IC) device includes: (i) applying a plurality of test operation signals to a wafer containing the IC device, (ii) generating a test enable signal in response to detecting, on the wafer, a toggling of at least one of the plurality of test operation signals, and then (iii) testing at least a portion of the IC device in response to the generating the test enable signal. The generating may also include generating a test enable signal in response to detecting, on the wafer, an inactive-to-active transition of a toggle detection signal.

Abstract: A method of forming a storage cell includes: forming a transistor on a semiconductor substrate; forming a plurality of fuses in at least one conductive layer on the semiconductor substrate to couple a connecting terminal of the transistor; forming a bit line to couple the plurality of fuses; and forming a word line to couple a control terminal of the transistor.

Abstract: A hybrid Schottky diode is described herein where the forward characteristics are determined by the metal-semiconductor junction, and the reverse characteristics and breakdown are determined by the metal/dielectric/semiconductor junction. Experimental demonstration of such hybrid Schottky diodes shows significant improvement in the breakdown performance with average breakdown field up to 2.22 MV/cm with reduced turn on of 0.47 V and enable state-of-art power switching figure of merit for GaN lateral Schottky diodes.

Abstract: According to one embodiment, a semiconductor memory device includes, on a substrate, a memory region and a peripheral circuit region in which an MOS transistor is formed. The MOS transistor includes a drain region and a source region disposed in a first direction parallel to a surface of the substrate. On a surface of the drain region, a drain electrode is formed to be connected with a contact plug. Further, on a surface of the source region, a source electrode is formed to be connected with a contact plug. When viewed in the first direction, the drain electrode has a region that does not overlap with the source electrode, and the source electrode has a region that does not overlap with the drain electrode.

Abstract: An IC device includes a first anti-fuse structure including a first dielectric layer between a first gate conductor and a first active area, and a second anti-fuse structure including a second dielectric layer between a second gate conductor and the first active area. A first via is electrically connected to the first gate conductor at a first location a first distance from the first active area, a second via is electrically connected to the second gate conductor at a second location a second distance from the first active area, and the first distance is approximately equal to the second distance.

Abstract: A system and method for hybrid callback management, utilizing a callback cloud and an on-premise callback system, allowing brands to utilize a hybrid system that protects against any premise outages or cloud service faults and failures by introducing redundancies and co-maintenance of data key to callback execution while allowing for mixed telephony types to be seamlessly integrated into one communication platform.

Abstract: A System-on-Chip includes a first partition configured to implement a first application using of at least a first portion of one or more of a plurality of subsystems of the System-on-Chip and a second partition configured to implement a second application concurrently with the first partition. The second application uses at least a second portion of one or more of the plurality of subsystems. The first partition is isolated from the second partition.

Abstract: Active-on-active microelectronic devices are described. For example, a first die is on a second die with a bottom surface of a first substrate facing a top surface of a second substrate, respectively, to provide a die stack. The first and second dies each have metal layers in ILD layers to provide a first stack structure and a second stack structure, respectively. The first stack structure is interconnected to an upper end of a TSV of the first die. A metal layer of the second stack structure near a bottom surface of the first substrate is interconnected to a lower end of the TSV. A power distribution network layer of the second stack structure is located between lower and upper layers of the metal layers thereof. A transistor located at least in part in the second substrate is interconnected to the power distribution network layer to receive supply voltage or ground.

Abstract: Disclosed herein are structures, devices, and methods for electrostatic discharge protection (ESDP) in integrated circuits (ICs). In some embodiments, an IC package support may include: a first conductive structure; a second conductive structure; and a material in contact with the first conductive structure and the second conductive structure, wherein the material includes a positive temperature coefficient material.

Abstract: A programmable device may have logic circuitry formed in a top die and memory and specialized processing blocks formed in a bottom die, where the top die is stacked directly on top of the bottom die in a face-to-face configuration. The logic circuitry may include logic sectors, logic array blocks, logic elements, and other types of logic regions. The memory blocks may include large banks of multiport memory for storing data. The specialized processing blocks may include multipliers, adders, and other arithmetic components. The logic circuitry may access the memory and specialized processing blocks via an address encoded scheme. Configured in this way, the maximum operating frequency of the programmable device can be optimized such that critical paths will no longer need to traverse any unused memory and specialized processing blocks.

Abstract: A microelectronic device comprises pillar structures extending vertically through an isolation material, conductive lines electrically coupled to the pillar structures, contact structures between the pillar structures and the conductive lines, and interconnect structures between the conductive lines and the contact structures. The conductive lines comprise one or more of titanium, ruthenium, aluminum, and molybdenum. The interconnect structures comprise a material composition that is different than one or more of a material composition of the contact structures and a material composition of the conductive lines. Related memory devices, electronic systems, and methods are also described.

Abstract: A method of manufacturing a vertical metal-semiconductor field-effect transistor (MESFET) device is provided. The method includes forming a first oxide layer, forming a first electrode in the oxide layer, forming a crystallized silicon layer on the first electrode, forming a second electrode on the first oxide layer and on sidewalls of the crystalized silicon layer, forming a second oxide layer on upper surfaces of the second electrode. The method also includes forming a third electrode on an upper surface of the crystallized silicon layer.

Abstract: A construction of integrated circuitry comprises a trench isolation region in semiconductive material. The trench isolation region comprises laterally-opposing laterally-outermost first regions which comprise a first material and a second region laterally-inward of the first regions. The second region comprises a second material of different composition from that of the first material. A diffusion region is in the uppermost portion of the semiconductive material directly against a sidewall of one of the first regions. Insulator material is above the trench isolation region and the diffusion region. An elevationally-elongated conductive via is in the insulator material and extends to the diffusion region and the trench isolation region. The conductive via laterally overlaps the diffusion region and the one first region.

Abstract: In some embodiments, the present disclosure relates to a one-time program (OTP) memory cell. The OTP memory cell includes a read transistor and a program transistor neighboring the read transistor. The read transistor includes a read dielectric layer and a read gate electrode overlying the read dielectric layer. The program transistor includes a program dielectric layer and a program gate electrode overlying the program dielectric layer. The program transistor has a smaller breakdown voltage than the read transistor.

Abstract: A semiconductor device assembly, including an interposer comprising a glass material, a semiconductor die comprising a proximity coupling on a side of the interposer, and at least one other semiconductor die comprising a proximity coupling configured for communicating signals with the proximity coupling of the semiconductor die, on an opposing side of the interposer. The assembly may optionally be configured for optical signal communication with higher level packaging. Semiconductor device packages, systems and methods of operation are also disclosed.

Abstract: A low-voltage anti-fuse element is provided with a first gate dielectric layer and a first gate sequentially disposed on a substrate. A first ion-doped region is formed in the substrate on one side of the first gate. The first gate includes a body portion and a sharp corner portion extending and gradually reducing from one side of the body portion both adjacent to the first gate dielectric layer. During the operation, the principle of higher density of charges at sharp corners is utilized. When the write voltage is applied between the first gate and the first ion-doped region, a portion of the first gate dielectric layer below the sharp corner portion is liable to break down. Therefore, the breakdown voltage is reduced to achieve the purpose of reducing current consumption, while decreasing the gate area, the element size and production costs.

Abstract: A non-volatile memory circuit in embodiments of the present invention may have one or more of the following features: (a) a logic source, and (b) a semi-conductive device being electrically coupled to the logic source, having a first terminal, a second terminal and a nano-grease with significantly reduced amount of carbon nanotube loading located between the first and second terminal, wherein the nano-grease exhibits non-volatile memory characteristics.

Abstract: An integrated circuit device includes first and second features, each including an end portion arranged along a common axis, and separated by a space. The end portion of the first feature includes a first indention adjacent to the space. The end portion of the second feature includes a first indention adjacent to the space, mirroring the first indention of the first feature about the space. The end portions are substantially similar in shape.

Abstract: Reduced-profile semiconductor device apparatus are achieved by thinning a semiconductive device substrate at a backside surface to expose a through-silicon via pillar, forming a recess to further expose the through-silicon via pillar, and by seating an electrical bump in the recess to contact both the through-silicon via pillar and the recess. In an embodiment, the electrical bump contacts a semiconductor package substrate to form a low-profile semiconductor device apparatus. In an embodiment, the electrical bump contacts a subsequent die to form a low-profile semiconductor device apparatus.

Abstract: A vertical OTP fuse formed in a semiconductor device has a substrate and an insulating layer formed over the substrate with an opening through the insulating layer extending to the substrate. A conductive layer, such as silicide, is formed over a sidewall of the opening. A resistive material, such as polysilicon, is deposited within the opening over the first conductive layer to form a first vertical OTP fuse. A plurality of vertical OTP fuses can be arranged in an array. A PN junction diode or transistor is formed in the substrate aligned with the first vertical OTP fuse. A second conductive layer is formed over the first vertical OTP fuse. The first vertical OTP fuse can be disposed between the second conductive layer and a third conductive layer. A second vertical OTP fuse can be formed over the first vertical OTP fuse for redundancy.

Abstract: One IC product disclosed herein includes, among other things, a semiconductor substrate, a first anti-fuse device formed on the semiconductor substrate, the first anti-fuse device comprising at least one first fin formed with a first fin pitch, a first source region and a first drain region, wherein the first anti-fuse device is adapted to breakdown when a first programing voltage is applied to the first anti-fuse device, and a second anti-fuse device formed on the semiconductor substrate, the second anti-fuse device comprising at least one second fin formed with a second fin pitch, a second source region and a second drain region, wherein the second anti-fuse device is adapted to breakdown when a second programing voltage is applied to the second anti-fuse device, wherein the first fin pitch is greater than the second fin pitch and wherein the first programming voltage is greater than the second programing voltage.

Abstract: Embodiments of the invention are directed to a method and resulting structures for a semiconductor device having self-aligned contacts. In a non-limiting embodiment of the invention, a semiconductor fin is formed vertically extending from a bottom source/drain region of a substrate. A conductive gate is formed over a channel region of the semiconductor fin. A top source/drain region is formed on a surface of the semiconductor fin and a top metallization layer is formed on the top source/drain region. A dielectric cap is formed over the top metallization layer.

Abstract: A semiconductor package, a semiconductor device and a method for packaging the semiconductor device are provided. A semiconductor package includes a first conductive wire layer with a first mounting area and a second mounting area, an integrated circuit (IC), a radiation fin structure and an antenna. The first mounting area and the second mounting area do not overlap. The IC is disposed on a first surface of the first mounting area. The radiation fin structure is disposed on a second surface of the first mounting area. The antenna is disposed on the second mounting area.

Abstract: A BEOL eFuse is provided that includes a fuse element-containing layer having an entirely planar topmost surface. An upper portion of the fuse element-containing layer including the entirely planar topmost surface is present above a topmost surface of a second interconnect dielectric material layer, and a lower portion of the fuse-element containing layer is present in an opening that is formed in the second interconnect dielectric material layer and has a surface that contacts a first electrode structure that is partially embedded in a first interconnect dielectric material layer which underlies the second interconnect dielectric material layer. A second electrode structure that is present in a third interconnect dielectric material layer that overlies the second interconnect dielectric material layer contacts a portion of the planar topmost surface of the fuse-element-containing layer.

Abstract: An integrated circuit device may include a programmable fabric die having programmable logic fabric and configuration memory that may configure the programmable logic fabric. The integrated circuit device may also include a base die that may provide fabric support circuitry, including memory and/or communication interfaces. The first die and the second die may be coupled using a multi-purpose interface that may allow communication between the first die and the second die. The multi-purpose interface may allow concurrent access to the base die by the programmable logic fabric and the configuration memory by using multiple channels over the multi-purpose interface.

Abstract: A resistive element in an electrochemical artificial neural network, includes a transition metal oxide thin film forming a working electrode, a pair of first electrodes connected to the working electrode, and a reference electrode for electrochemical doping of the working electrode. The biasing of the pair of first electrodes with respect to the reference electrode according to a determination of conductivity between the pair of first electrodes controls the resistance of the working electrode.

Abstract: A first contact hole is formed so as to extend to a NiSi layer as a lower wiring conductor layer connecting to an N+ layer of an SGT formed within a Si pillar, and so as to extend through a NiSi layer as an upper wiring conductor layer connecting to a gate TiN layer, and a NiSi layer as an intermediate wiring conductor layer connecting to an N+ layer. A second contact hole is formed so as to extend to the NiSi layer, and surround, in plan view, the first contact hole. An insulating SiO2 layer is formed on a side surface of the NiSi layer. A wiring metal layer in the contact holes connects the NiSi layer and the NiSi layer to each other.

Abstract: A liquid-discharge-head substrate includes a first covering portion covering a first heating resistance element and having electrical conductivity, a second covering portion covering a second heating resistance element and having electrical conductivity, a fuse, and a common wiring line for electrically connecting the first and second covering portions. The common wiring line is electrically connected with the first covering portion via the fuse. The common wiring line and the fuse each have a multilayer structure including a stack of a plurality of conductive layers including a first conductive layer and a second conductive layer that is less oxidizable than the first conductive layer.

Abstract: A structure and a formation method of a semiconductor device structure are provided. The semiconductor device structure includes a semiconductor substrate and a conductive feature over the semiconductor substrate. The semiconductor device structure also includes a dielectric layer over the conductive feature and the semiconductor substrate and a via hole in the dielectric layer. The via hole has an oval cross section. The semiconductor device structure further includes a trench in the dielectric layer, and the via hole extends from a bottom portion of the trench. The trench has a trench width wider than a hole width of the via hole. In addition, the semiconductor device structure includes one or more conductive materials filling the via hole and the trench and electrically connected to the conductive feature.

Abstract: An integrated circuit device may include programmable logic fabric disposed on a first integrated circuit die and having configuration memory. The integrated circuit device may also include a base die that may provide memory and/or operating supporting circuitry. The first die and the second die may be coupled using a high-speed parallel interface. The interface may employ microbumps. The first die and the second die may also include controllers for the interface.

Abstract: The present disclosure is directed to a method of creating an object flow integrity (OFI) library module, capable of redirecting an object-like programmatic call, by initiating a multi-pass, recursive process to analyze a module's interfaces, function parameters, and data types. In another aspect, a method is disclosed to modify the binary code of an untrusted module to enable its usage of the OFI library module. In another aspect, during runtime operations of an untrusted module, the OFI library module can receive an object from a caller module, substitute a proxy object, stored in a secure location, and continue the programmatic call using the proxy object.

Abstract: An integrated circuit and a code generating method are described. The integrated circuit includes a plurality of field effect transistors, a plurality of sense-amplifiers, and a processing circuit. Each field effect transistor is configured to represent an address in a mapping table and includes a source, a drain, a channel and a gate. Each sense-amplifier is connected to the drain and configured to sense an electric current from the drain and identify a threshold voltage of the corresponding field effect transistor. The processing circuit is configured to categorize each of the threshold voltages identified by the corresponding sense-amplifiers into a first state and a second state and mark the state of each of the threshold voltages at the corresponding address in the mapping table.

Abstract: Provided is a semiconductor device including a fuse element arranged on an interlayer insulating film formed on a semiconductor substrate. The fuse element is formed of polysilicon and a silicide region arranged on an upper surface of the polysilicon. A region of the polysilicon included in a range to be irradiated with a laser beam in plan view is non-doped polysilicon into which impurities are not introduced. With this structure, it is possible to provide the semiconductor device including the fuse element, which can be stably cut with a laser beam while an underlying film is not damaged.

Abstract: A method for producing a semiconductor memory device includes forming two Si pillars on a substrate. In the Si pillars, inverter circuits are formed. The inverter circuits include drive N-channel SGTs each including first and second N+ layers functioning as a source and a drain, and load SGTs each including first and second P+ layers functioning as a source and drain. Selection SGTs each including third and fourth N+ layers functioning as a source and a drain are formed above SiO2 layers disposed above the inverter circuits. The first N+ layer is connected to a ground wiring metal layer. The first P+ layers are connected to a power supply wiring metal layer through a NiSi layer. Gate TiN layers are connected to a word-line wiring metal layer through a NiSi layer. The third N+ layers are connected to an inverted bit-line wiring metal layer and a bit-line wiring metal layer.

Abstract: Provided is a semiconductor structure including a substrate, an isolation structure, a fuse and two gate electrodes. The isolation structure is located in the substrate and defines active regions of the substrate. The fuse is disposed on the isolation structure. The gate electrodes are disposed on the active regions and connected to ends of the fuse. In an embodiment, a portion of a bottom surface of the fuse is lower than top surfaces of the active regions of the substrate.

Abstract: A semiconductor structure is provided in which metal semiconductor alloy pillars are formed at least partially within the sidewall surfaces of each semiconductor fin that extends from a surface of a substrate. These pillars are fuses (i.e., FinFET fuses) that are formed at a very tight pitch dimensions. The pillars can be trimmed after forming FinFET devices. The present application provides a method for forming on-chip FinFET fuses easily by choice of the metal semiconductor alloy, the amount of pillar trim, the number of contacted pillars and to a lower design degree the height of each pillar.

Abstract: A processor-memory system, a stacked-wafer processor-memory system, and a method of fabricating a processor-memory system are disclosed. In an embodiment, the invention provides a processor-memory system comprising a memory area, a multitude of specialized processors, and a management processor. The specialized processors are embedded in the memory area, and each of the specialized processors is configured for performing a specified set of operations using an associated memory domain in the memory area. The management processor is provided to control operations of an associated set of the specialized processors. In one embodiment, each of the specialized processors controls a respective one associated memory domain in the memory area. In an embodiment, the processor-memory system further comprises a specialized processor wafer. The specialized processor wafer includes the memory area, and the multitude of specialized processors are embedded in the specialized processor wafer.

Abstract: A semiconductor package includes an integrated circuit (IC), a heat dissipation structure, a molding layer and an antenna. The IC is mounted on a first surface of a first redistribution layer (RDL). The heat dissipation structure is mounted on a second surface of the first RDL. The molding compound is disposed over the first surface of the first RDL. The antenna is disposed on the second surface of the first RDL, wherein the antenna is disposed side-by-side to the heat dissipation structure.

Abstract: A power module includes a first MOS transistor and a first Schottky barrier diode for a lower arm, and a second MOS transistor and a second Schottky barrier diode for an upper arm. In one embodiment, one positive-side power supply terminal and one negative-side power supply terminal are provided, while an output terminal to which the first and second MOS transistors are connected and an output terminal to which the first and second Schottky barrier diodes are connected are provided as separate output terminals.

Abstract: A vertical OTP fuse formed in a semiconductor device has a substrate and an insulating layer formed over the substrate with an opening through the insulating layer extending to the substrate. A conductive layer, such as silicide, is formed over a sidewall of the opening. A resistive material, such as polysilicon, is deposited within the opening over the first conductive layer to form a first vertical OTP fuse. A plurality of vertical OTP fuses can be arranged in an array. A PN junction diode or transistor is formed in the substrate aligned with the first vertical OTP fuse. A second conductive layer is formed over the first vertical OTP fuse. The first vertical OTP fuse can be disposed between the second conductive layer and a third conductive layer. A second vertical OTP fuse can be formed over the first vertical OTP fuse for redundancy.

Abstract: A method for integrating vertical transistors and electric fuses includes forming fins through a dielectric layer and a dummy gate stack on a substrate; thinning top portions of the fins by an etch process; epitaxially growing top source/drain regions on thinned portions of the fins in a transistor region and top cathode/anode regions on the thinned portions of the fins in a fuse region; and removing the dummy gate layer and exposing sidewalls of the fins. The fuse region is blocked to form a gate structure in the transistor region. The transistor region is blocked and the fuse region is exposed to conformally deposit a metal on exposed sidewalls of the fins. The metal is annealed to form silicided fins. Portions of the substrate are separated to form bottom source/drain regions for vertical transistors in the transistor region and bottom cathode/anode regions for fuses in the fuse region.

Abstract: A method is provided that includes forming a word line above a substrate, the word line disposed in a first direction, forming a bit line above the substrate, the bit line disposed in a second direction perpendicular to the first direction, forming a nonvolatile memory material between the word line and the bit line, the nonvolatile memory material including a semiconductor material layer and conductive oxide material layer, forming a first barrier material layer between the word line and the nonvolatile memory material, forming a second barrier material layer between the bit line and the nonvolatile memory material, and forming a memory cell including the nonvolatile memory material at an intersection of the bit line and the word line.