Abstract: A method of obtaining high quality passivation layers on silicon carbide surfaces by oxidizing a sacrificial layer of a silicon-containing material on a silicon carbide portion of a device structure to substantially consume the sacrificial layer to produce an oxide passivation layer on the silicon carbide portion that is substantially free of dopants that would otherwise degrade the electrical integrity of the oxide layer.

Abstract: The total base-collector capacitance of a double-heterostructure bipolar transistor device is reduced by removing semiconductor material from the extrinsic regions and replacing the removed material with a relatively-low-dielectric-constant material, The base-collector capacitance is further reduced by using a composite subcollector structure that permits the extrinsic regions to be made thicker than the intrinsic region of the device.

Abstract: A thin-film transistor for connecting a signal electrode line to a pixel electrode of a liquid crystal display, the thin-film transistor including: a substrate; a gate electrode formed on the substrate; a gate insulating layer formed on the gate electrode; a semiconductor layer formed on the gate insulating layer; an ohmic contact layer formed on the semiconductor layer; a source electrode formed on the ohmic contact layer over a first end of the semiconductor layer; a drain electrode formed on the ohmic contact layer over a second end of the semiconductor layer such that a channel region is formed; and a protective film formed on the gate insulating layer, the source electrode, the channel region of the semiconductor layer, and the drain electrode. A width of the gate electrode is wider than a width of the semiconductor layer.

Abstract: A semiconductor device includes a semiconductor body (1) having a semiconductor element with connection points (2, 3) which adjoins a surface (4) of the semiconductor body (1) and is laterally insulated and surrounded by a first depression (5) in the surface (4), which depression (5) is provided with a wall (6) and a bottom (7), while the surface (4) of the semiconductor body (1) and the wall (6) and bottom (7) of the depression (5) are covered with an insulating layer (8). The connection points (2, 3) are provided in the insulating layer (8) on the surface (4) of the semiconductor body (1) and are connected to conductor tracks (10, 11) which connect the connection points (2, 3) across a wall (6) to connection surfaces (12, 13) associated with the connection points (2, 3) and situated on the bottom (7). It is found in practice that, in the case of progressive miniaturization, the manufacture of such devices leads to rejects caused by short-circuits between connection surfaces (12, 13).

Abstract: A semiconductor structure to prevent gate wrap-around and corner parasitic leakage comprising a semiconductor substrate having a planar surface. A trench is located in the substrate, the trench having a sidewall. An intersection of the trench and the surface forms a corner. A dielectric lines the sidewall of the trench. And, a corner dielectric co-aligned with the corner extends a subminimum dimension distance over the substrate from the corner.

Abstract: The power metal oxide semiconductor field effect transistor (MOSFET) has a drain region, a channel region, and a source region formed of silicon carbide. The drain region has a substrate of silicon carbide of a first conductivity type and a drain-drift region of silicon carbide adjacent the substrate having the same conductivity type. The channel region is adjacent the drain-drift region and has the opposite conductivity type from the drain-drift region. The source region is adjacent the channel region and has the same conductivity type as the drain-drift region. The MOSFET also has a gate region having a gate electrode formed on a first portion of the source region, a first portion of the channel region, and a first portion of the drain region. A source electrode is formed on a second portion of the source region and a second portion of the channel region. Also, a drain electrode is formed on a second portion of the drain region.

Abstract: A semiconductor integrated circuit device of this invention includes a semiconductor substrate having an active region arranged in a main surface area and an inactive region arranged in a peripheral portion of the main surface area. A semiconductor integrated circuit is formed in the active region in the main surface area of the semiconductor substrate. A connection electrode is formed on the inactive region. One end of a lead is connected to the connection electrode and the other end thereof is arranged to extend to the exterior of the semiconductor substrate. The semiconductor integrated circuit and the connection electrode are electrically connected to each other via an impurity diffusion region. At least the active region of the semiconductor substrate, the connection electrode, part of the lead arranged on the main surface of the semiconductor substrate, and the impurity diffusion region are covered with a sealing body having a sealing substrate.

Abstract: A selective growth mask having a plurality of openings is formed on a semiconductor substrate. Desired epitaxially grown regions are formed on the openings by controlling the upward epitaxial growth from the openings. Two resonance tunnel barrier diodes are formed on respective separated two epitaxially grown regions and connected together. Thereafter, a tunnel barrier diode is formed on the connected two resonance tunnel barrier diodes to form a composite element having an SRAM function. A number of composite functional elements can be integrally formed on a semiconductor substrate by selective growth and a small number of fine processes.

Abstract: A MOSFET device for ULSI circuits includes a semiconductor body having first and second spaced doped regions of a first conductivity type which function as source and drain regions, a third doped region between the first and second regions of a second conductivity type, and a first intrinsic region between the third doped region and the drain region, a channel of said MOSFET device including the third doped region and said first intrinsic region. Preferably the device further includes a second intrinsic region between the third doped region and the source region, the channel region of the MOSFET device including the third doped region, the first intrinsic region, and the second intrinsic region. The device further includes an insulating layer over the channel region and a gate electrode formed on the insulating layer over the channel region. A source electrode contact, the first doped region, and a drain electrode contact the second doped region. Several processes are described for fabricating the device.

Abstract: This invention relates to a light detecting device comprising a first conduction-type semiconductor substrate, a first conduction-type semiconductor crystal layer formed on the surface of the substrate, and a second conduction-type first region formed in the semiconductor crystal layer. The first region is surrounded by a second conduction-type second region. On the surface of the semiconductor crystal layer, an electrode is formed on the first region, and a reflection preventing layer is formed on that part of the first region inside the electrode, and a device protecting film is formed on that part of the first region outside the electrode. On the semiconductor crystal layer, a metal film is formed in contact both with the semiconductor crystal layer and with the second region. This structure enables the second region to capture unnecessary charges and further to recombine and extinguish them.

Abstract: A mesa-type PIN diode and method for making same are disclosed. A diode made according to the present invention includes a junction formed in the top surface of the mesa-shaped structure, having an area that is less than (and preferrably, approximately half) the area of the top surface. A highly-doped, N-type conducting layer is formed in the side-walls of the mesa-shaped structure. The resulting diode is subject to greatly reduced charge carrier recombination effects and suffers from much less carrier-to-carrier scattering than conventional diodes. Thus, a diode made according to the present invention is capable of achieving much higher stored charge, lower resistance, lower capacitance, better switching characteristics, and lower power consumption than one made according to the prior art. Particular utility is found, inter alia, in the areas of high-frequency microwave and monolithic circuits.

Abstract: A semiconductor device of vertical arrangement includes an anode region formed of a first semiconductor substrate and a second semiconductor substrate joined with the first semiconductor substrate. The first semiconductor substrate forms a high-resistance layer with a predetermined impurity density, and the second semiconductor substrate forms a low-resistance layer whose impurity density is higher than that of the high-resistance layer. A PN junction is formed inside the first semiconductor substrate. The periphery of the first semiconductor substrate including the PN junction is configured in an inverted mesa structure and coated with an insulation material. With this arrangement, the semiconductor device has a high withstand voltage and enables an employment of a large diameter wafer.

Abstract: A semiconductor structure comprises a gate-turn-off thyristor region (GR) and a diode region (DR) with an isolation area (SR) therebetween. The isolation area is provided with a multistage groove (30) having step structures (34,35). The multistage groove is formed through a two-stage etching process, and over-etched regions in the bottom corners of the multistage groove are relatively shallow ones. This structure is effective for increasing the breakdown voltage of the semiconductor structure and isolations between a the gate-turnoff thyristor region and the diode region.

Abstract: A semiconductor device and a method of manufacture thereof by which circuit elements are readily formed as a three-dimensional structure without increasing the device size are provided. An N.sup.31 type epitaxially grown layer (4) is first formed on a P.sup.30 type silicon substrate (2), and then a P.sup.30 type diffusion layer (31), an emitter layer (32) (P.sup.30 type) and an N.sup.30 type diffusion layer (33) are formed in the N.sup.31 type epitaxially grown layer (4). Next, an underside of the substrate (2) is etched to form a bottom recessed part (6), from which a collector region (8) (P.sup.+ type) is formed in such a manner that it reaches the P.sup.+ type diffusion layer (31). Thus, a vertical PNP type transistor is obtained readily. In this method, the collector region (8) is formed at a latter step, so that redistribution of the collector region (8) due to epitaxial growth can be avoided.

Abstract: A process for forming a semiconductor device begins by diffusing an N layer having a relatively high concentration into a P wafer having a relatively low concentration. Next, the wafer is etched to yield a plurality of mesa semiconductor structures, each having a P-N junction intersecting a sidewall of the mesa structure. Then, a layer of oxide is grown on the sidewalls of the mesas, which oxide layer passivates the device. The oxidizing step curves the P-N junction toward the P layer in the vicinity of the oxide layer. Then, the P-N junction is diffused deeper into the P layer with a diffusion front which tends to curve the P-N junction back toward the N layer in the vicinity of the oxide layer. This diffusion is carried out to such an extent as to compensate for the curvature caused by the oxidizing step and thereby substantially flatten the P-N junction. A plurality of successive oxidation/diffusion steps can be undertaken to further flatten the junction adjacent the mesa sidewall.