Abstract: A metal/insulator/metal capacitor and a fabrication method thereof are presented. The method includes forming a first electrode on an insulation film; forming a side wall made of insulating material on a side surface of the first electrode; forming an interlayer insulation film on the top surface of the insulation film including the first electrode and the side wall; forming a via hole to expose the first electrode by selectively etching the interlayer insulation film such that an edge area at which a side surface and a bottom of the via hole intersect is positioned on a top surface of the side wall; forming a dielectric layer on an inner wall of the via hole; forming a second electrode on the dielectric layer such that the via hole is filled; and forming a metal wire on the second electrode such that the metal wire is electrically connected to the second electrode.

Abstract: In one disclosed embodiment a layer is formed over a transistor gate and a field oxide region. For example, a polycrystalline silicon layer can be deposited over a PFET gate oxide and a silicon dioxide isolation region on the same chip. The layer is then doped over the transistor gate without doping the layer over the field oxide. A photoresist layer can be used as a barrier to implant doping, for example, to block N+ doping over the field oxide region. The entire layer is then doped, for example, with P type dopant after removal of the doping barrier. The second doping results in formation of a high resistivity resistor over the field oxide region, without affecting the transistor gate. Contact regions are then formed of a silicide, for example, for connecting the resistor to other devices.

Abstract: As for the resistor on the semiconductor substrate, it is required to achieve obtaining a metal resistor, which can be formed in the latter half of a preliminary process for manufacturing a semiconductor, in addition to forming a polysilicon resistor, which is formed in the first half of the preliminary process. A capacitor having MIM structure comprises a lower electrode, a capacitive insulating film and an upper electrode, all of which are sequentially formed in this sequence. A resistor structure having MIM structure also comprises a lower electrode, a capacitive insulating film and a resistor, all of which are sequentially formed in this sequence. In this case, the biasing conditions thereof should be selected so that the resistor structure lower electrode of the MIM structure resistor is not coupled to any electric potential, and is in a floating condition.

Abstract: An electronic component arrangement includes a discrete electronic component having first and second terminals and a centre-exposed pad. A substrate has a first electrical conductor electrically connected to the first terminal, a second electrical conductor electrically connected to the second terminal, and a third electrical conductor. A thermally conductive element is in direct thermal communication with both the centre-exposed pad of the electronic component and the third electrical conductor of the substrate.

Abstract: The electrostatic protection device provided between an input/output terminal and an internal circuit of a semiconductor device according to the present invention has a first insulated gate field effect transistor (MOS transistor) and a second MOS transistor that are connected mutually in parallel between an input/output wiring connected to the input/output terminal and an electrode wiring of a prescribed potential, where the first MOS transistor and the second MOS transistor are MOS transistors of the same channel type, the second MOS transistor has s higher drive capability than the first MOS transistor, and the electrostatic protection device is formed such that it is started by the first MOS transistor.