Abstract: A memory circuit includes a first memory cell including a first resistor; and a first transistor coupled to the first resistor, wherein a first bulk port of the first transistor is biased at a first voltage level; a second memory cell coupled to the first memory cell, the second memory cell including a second resistor; and a second transistor coupled to the second memory cell, wherein a second bulk port of the second transistor is biased at a second voltage level, wherein the second voltage level is less than the first voltage level.

Abstract: In one embodiment, a semiconductor device includes a first substrate including first and second regions on its surface, a first control circuit on the first substrate in the first region, a first memory cell array above the first control circuit in the first region and connected to the first control circuit, and a first pad above the first memory cell array in the first region and connected to the first control circuit. The device further includes a second control circuit on the first substrate in the second region, a second memory cell array above the second control circuit in the second region and connected to the second control circuit, a second pad above the second memory cell array in the second region and connected to the second control circuit, and a connection line above the first and second memory cell arrays and connecting the first and second pads.

Abstract: Apparatuses and methods for manufacturing semiconductor memory devices are described.

Abstract: Methods, systems, and devices related to access schemes for access line faults in a memory device are described. In one example, a method may include isolating a first word line of a section of a memory device from a voltage source (e.g., a deselection voltage source) during a first portion of a period when the first word line is deselected, and coupling the first word line with the voltage source during a second portion of the period when the first word line is deselected based on determining that an access operation is performed during the second portion of the period when the word line is deselected. In some examples, the method may include identifying that the first word line is associated with a fault, such as a short circuit fault with a digit line of the memory device.

Abstract: Methods, apparatuses, and systems related to a memory device are described. The memory device may include local latching circuits each having a retention circuit and a driving circuit. The retention circuit may be configured to provide local storage of broadcasted information for a down-stream circuit. The driving circuit may be configured to connect a first voltage and a second voltage to the retention circuit at different times across the broadcast and the local storage.

Abstract: A memory device that operates at high speed is provided. The memory device includes first and second memory cells, first and second bit lines, first and second switches, and a sense amplifier. The sense amplifier comprises a first node and a second node. The first memory cell is electrically connected to the first node through the first bit line and the first switch, and the second memory cell is electrically connected to the second node through the second bit line and the second switch. The sense amplifier amplifies the potential difference between the first node and the second node. The first memory cell and the second memory cell include an oxide semiconductor in a channel formation region.

Abstract: Systems and devices are provided for fully discharging leakage current generated during standby and/or power down modes regardless of variations in PVT conditions. An apparatus may include a power generation unit that powers components of the apparatus and a bleeder circuit. The bleeder circuit may include an operational amplifier. Further, the bleeder circuit may include leakage current generator circuitry that is coupled to the operational amplifier and generates a first current that mimics leakage current generated by the power generation unit. Furthermore, the bleeder circuit may include leakage current mirroring circuitry that is coupled to an output of the operational amplifier and that generates a second current that mirrors the first current. In addition, the bleeder circuit may also include leakage current bleeder circuitry that is coupled to the leakage current mirroring circuitry and that generates a third current that sinks the leakage current to ground.

Abstract: A semiconductor device includes: memory cells, first word lined arranged for first ports and each arranging corresponding to respective rows of the memory cells; second word lines arranged for second ports and each arranged corresponding to respective rows of the memory cells, first dummy word lines each provided above the respective first word lines, second dummy word lines each provided above the respective second word lines, a word line driver driving the first and second word lines, and a dummy word line driver driving, in an opposite phase, the second dummy word line for the adjacent second word line according to driving of the first word line from among the first and second word lines, or the first dummy word line for the adjacent first word line according to driving of the second word line from among the first and second word lines.

Abstract: Methods, systems, and devices for cell voltage accumulation discharge are described. One or more sections of a bank of ferroelectric memory cells may be coupled with one or more access lines. By activating one or more switching components, one or more sections (that may include a memory array and/or a driver) of memory cells may be isolated. When isolated, a voltage may be applied across an access line associated with the section to activate an access device of each memory cell. By activating a switching component of a respective memory cell, a capacitor of the memory cell may be discharged and then the isolated section may be coupled with the plurality of access lines.

Abstract: Systems and methods are provided for implementing an array reset mode. An example system includes at least one mode register configured to enable an array reset mode, a memory cell array including one or more sense amplifiers, and control logic. Each of the one or more sense amplifier may include at least a first terminal coupled to a first bit line and a second terminal coupled to a second bit line. The control logic may be coupled to the memory cell array, and in communication with the at least one mode register. The control logic may be configured to drive, in response to array reset mode being enabled, each of the first and second terminals of the sense amplifier to a bit-line precharge voltage that corresponds to a bit value to be written to respective memory cells associated with each of the first and second bit lines.

Abstract: An electronic control unit where an external watch dog timer (WDT) can always normally detect an abnormality (a failure) to a micro controller unit (MCU) related to a built-in self-test (BIST) function and which can maintain safety of a system. The control unit includes an external WDT to detect an abnormality of the MCU, a reset circuit to reset the MCU when the external WDT detects the abnormality of the MCU, and an ON/OFF control section to turn a gate of the semiconductor switching device on or off in accordance with the external WDT. The inverter is stopped by turning the gate off via the ON/OFF control section when the external WDT is a disable state. When the abnormality of the MCU is not detected in an enable state, the inverter is driven by turning the gate on via the ON/OFF control section. When the abnormality of the MCU is detected, the inverter is stopped by turning the gate off via the ON/OFF control section and the MCU is reset by the reset circuit.

Abstract: A sensing circuit of a semiconductor memory device is provided which includes a bit line having a first edge and a second edge, a sensing line, a current supply unit, and a sense amplifier. A plurality of memory cells is connected between the first edge and the second edge. The sensing line is connected to the second edge of the bit line, and the current supply unit supplies a sensing current via the first edge of the bit line. The sense amplifier senses data stored at a selected memory cell by comparing a sensing voltage of the sensing line with a reference voltage when the sensing current flows to the selected memory cell from the first edge of the bit line.

Abstract: A bit line equalizer includes a first line-shaped gate extended in a first direction, a second line-shaped gate spaced apart from the first line-shaped gate by a predetermined distance and extending parallel to the first gate, a third gate configured to interconnect the first gate and the second gate, a first contact node located at one side of the first gate, a second contact node located at one side of the second gate, a third contact node located between the first gate and the second gate and located at one side of the third gate, and a fourth contact node located between the first gate and the second gate and located at the other side of the third gate.

Abstract: A semiconductor structure includes a first device and a second device. The first device has a first surface. The first device includes a first active region defined by a first material system. The second device has a second surface. The second surface is coplanar with the first surface. The second device includes a second active region defined by a second material system. The second material system is different from the first material system.

Abstract: Level shifters are disclosed for high performance sub-micron IC designs. One embodiment is a level shifting device that comprises a first input circuit that toggles a first internal signal between a logical zero of a first voltage range and a logical one of a second voltage range based on an input data signal and an output data signal, and a second input circuit that toggles a second internal signal between a logical zero of the second voltage range and a logical one of the first voltage range based on the input data signal and the output data signal. An output circuit of the device toggles the output data signal between a logical zero of the second voltage range and a logical one of the second voltage range based on the first internal signal, the second internal signal, and a compliment of the input data signal.

Abstract: At least one method, apparatus and system disclosed involves circuit layout for an integrated circuit device. A design for an integrated circuit device is received; The design comprises a first functional cell and a second functional cell. The first functional cell is placed on a circuit layout. A determination is made as to whether the first cell comprises a vertical boundary that is electrically floating. A filler cell is placed adjacent to the vertical boundary on the circuit layout in response to determining that the first cell comprises the vertical boundary that is electrically floating. The second functional cell is placed adjacent to the filler cell to form a contiguous active area on the circuit layout.

Abstract: A plurality of memory mats classified into groups selected by bits of a row address, a main word driver for selecting a main word line based on bits of the row address, an FX driver for selecting a word driver selecting line based on bits regardless of the bits of the row address, and a plurality of sub-word drivers selected by the main word line and the word driver selecting line to drive the corresponding sub-word line are arranged.

Abstract: A semiconductor device may include a mat array. and a plurality of memory cell mats each including bit lines. The memory cell mats may be included in the mat array. The semiconductor device may include edge sense amplifier blocks comprising edge sense amplifiers coupled to half of the bit lines of the outermost memory cell mats among the memory cell mats. The half of the bit lines of the outermost memory cell mats may be coupled to the edge sense amplifiers, respectively, and may be configured for a first input. The semiconductor device may include half dummy mats each having an area corresponding to half of the area of a memory cell mat of the plurality of memory cell mats and configured to provide reference bit lines for a second input to the edge sense amplifiers, respectively.

Abstract: To provide a semiconductor device featuring reduced variation in capacitor characteristics. In the semiconductor device, a protective layer is provided at the periphery of the upper end portion of a recess (hole). This protective layer has a dielectric constant higher than that of an insulating layer placed in the same layer as the protective layer and configuring a multilayer wiring layer placed in a logic circuit region.

Abstract: A semiconductor integrated circuit device includes a first signal line and a second signal line, and a sense amplifier that includes a plurality of PMOS transistors and a plurality of NMOS transistors. The sense amplifier is configured to sense amplify a potential difference between the first signal line and the second signal line. The junction regions of the NMOS and PMOS transistors having the same conductivity type, and to which the same signal is applied, are formed in one integrated active region.

Abstract: Provided are semiconductor integrated circuit (IC) devices including gate patterns having a step difference therebetween and a connection line interposed between the gate patterns. The semiconductor IC device includes a semiconductor substrate including a peripheral active region, a cell active region, and a device isolation layer. Cell gate patterns are disposed on the cell active region and the device isolation layer. A peripheral gate pattern is disposed on the peripheral active region. A cell electrical node is disposed on the cell active region adjacent to the cell gate patterns. Peripheral electrical nodes are disposed on the peripheral active region adjacent to the peripheral gate pattern. Connection lines are disposed on the cell gate patterns disposed on the device isolation layer. The connection lines are connected between the cell gate patterns and the peripheral gate pattern.

Abstract: A set of metal line structures including a signal transmission metal line and a capacitively-grounded inductively-signal-coupled metal line is embedded in a dielectric material layer. A capacitor is serially connected between the capacitively-grounded inductively-signal-coupled metal line and a local electrical ground, which may be on the input side or on the output side. The set of metal line structures and the capacitor collective provide a frequency dependent inductor. The Q factor of the frequency dependent inductor has multiple peaks that enable the operation of the frequency dependent inductor at multiple frequencies. Multiple capacitively-grounded inductively-signal-coupled metal lines may be provided in the frequency-dependent inductor, each of which is connected to the local electrical ground through a capacitor. By selecting different capacitance values for the capacitors, multiple values of the Q-factor may be obtained in the frequency dependent inductor at different signal frequencies.

Abstract: A semiconductor device includes a semiconductor substrate having a memory cell region and a peripheral circuit region; a bit line extending over the memory cell region and the peripheral circuit region, the bit line including a first portion in the peripheral circuit region; and a sense amplifier in the peripheral circuit region. The sense amplifier includes a transistor having a gate electrode which includes the first portion of the bit line.

Abstract: A Three-Dimensional Structure (3DS) Memory allows for physical separation of the memory circuits and the control logic circuit onto different layers such that each layer may be separately optimized. One control logic circuit suffices for several memory circuits, reducing cost. Fabrication of 3DS memory involves thinning of the memory circuit to less than 50 ?m in thickness and bonding the circuit to a circuit stack while still in wafer substrate form. Fine-grain high density inter-layer vertical bus connections are used. The 3DS memory manufacturing method enables several performance and physical size efficiencies, and is implemented with established semiconductor processing techniques.

Abstract: Disclosed herein are embodiments of non-planar capacitor. The non-planar capacitor can comprise a plurality of fins above a semiconductor substrate. Each fin can comprise at least an insulator section on the semiconductor substrate and a semiconductor section, which has essentially uniform conductivity, stacked above the insulator section. A gate structure can traverse the center portions of the fins. This gate structure can comprise a conformal dielectric layer and a conductor layer (e.g., a blanket or conformal conductor layer) on the dielectric layer. Such a non-planar capacitor can exhibit a first capacitance, which is optionally tunable, between the conductor layer and the fins and a second capacitance between the conductor layer and the semiconductor substrate. Also disclosed herein are method embodiments, which can be used to form such a non-planar capacitor and which are compatible with current state of the art multi-gate non-planar field effect transistor (MUGFET) processing.

Abstract: Nonvolatile memory elements that are based on resistive switching memory element layers are provided. A nonvolatile memory element may have a resistive switching metal oxide layer. The resistive switching metal oxide layer may have one or more layers of oxide. A resistive switching metal oxide may be doped with a dopant that increases its melting temperature and enhances its thermal stability. Layers may be formed to enhance the thermal stability of the nonvolatile memory element. An electrode for a nonvolatile memory element may contain a conductive layer and a buffer layer.

Abstract: A capacitor structure for a pumping circuit includes a substrate, a U-shaped bottom electrode in the substrate, a T-shaped top electrode in the substrate and a dielectric layer disposed between the U-shaped bottom and T-shaped top electrode. The contact area of the capacitor structure between the U-shaped bottom and T-shaped top electrode is extended by means of the cubic engagement of the U-shaped bottom electrode and the T-shaped top electrode.

Abstract: A set of metal line structures including a signal transmission metal line and a capacitively-grounded inductively-signal-coupled metal line is embedded in a dielectric material layer. A capacitor is serially connected between the capacitively-grounded inductively-signal-coupled metal line and a local electrical ground, which may be on the input side or on the output side. The set of metal line structures and the capacitor collective provide a frequency dependent inductor. The Q factor of the frequency dependent inductor has multiple peaks that enable the operation of the frequency dependent inductor at multiple frequencies. Multiple capacitively-grounded inductively-signal-coupled metal lines may be provided in the frequency-dependent inductor, each of which is connected to the local electrical ground through a capacitor. By selecting different capacitance values for the capacitors, multiple values of the Q-factor may be obtained in the frequency dependent inductor at different signal frequencies.

Abstract: Nonvolatile memory elements that are based on resistive switching memory element layers are provided. A nonvolatile memory element may have a resistive switching metal oxide layer. The resistive switching metal oxide layer may have one or more layers of oxide. A resistive switching metal oxide may be doped with a dopant that increases its melting temperature and enhances its thermal stability. Layers may be formed to enhance the thermal stability of the nonvolatile memory element. An electrode for a nonvolatile memory element may contain a conductive layer and a buffer layer.

Abstract: A first transistor includes a first gate insulating film, a first gate electrode, and a first sidewall. A second transistor includes a second gate insulating film, a second gate electrode, and a second sidewall. A capacitive element is connected to one side of source and drain regions of the second transistor. The first gate insulating film has the same thickness as that of the second gate insulating film, and the first gate electrode has the same thickness of that of the second gate electrode. The width of the second sidewall is larger than the width of the first sidewall.

Abstract: Nonvolatile memory elements that are based on resistive switching memory element layers are provided. A nonvolatile memory element may have a resistive switching metal oxide layer. The resistive switching metal oxide layer may have one or more layers of oxide. A resistive switching metal oxide may be doped with a dopant that increases its melting temperature and enhances its thermal stability. Layers may be formed to enhance the thermal stability of the nonvolatile memory element. An electrode for a nonvolatile memory element may contain a conductive layer and a buffer layer.

Abstract: A semiconductor memory device has a semiconductor substrate, a plurality of word lines formed on the semiconductor substrate at predetermined intervals, a selecting transistor arranged on each of two sides of each of the plurality of word lines in which a spacing between the selecting transistor and an adjacent one of the word lines is not less than three times a width of each of the word lines, an interlayer insulating film formed to cover upper surfaces of the word lines and selecting transistors, a first cavity portion which is located between each pair of adjacent ones of the word lines and whose upper portion is covered with the interlayer insulating film, a second cavity portion which is formed at a side wall portion of the word line adjacent to each selecting transistor which faces the selecting transistor and whose upper portion is covered with the interlayer insulating film, and a third cavity portion which is formed at a side wall portion of each of the selecting transistors and whose upper portion

Abstract: In order to achieve the reduction of contact resistance by forming a metal silicide layer with a sufficient thickness in an interface between a polycrystalline silicon plug and an upper conductive plug, the polycrystalline silicon plug contains germanium, which is ion-implanted before forming the metal silicide layer.

Abstract: A distance “a” from a first gate electrode of a first transistor of a high-frequency circuit to a first contact is greater than a distance “b” from a second electrode of a second transistor of a digital circuit to a second contact. The first contact is connected to a drain or source of the first transistor, and the second contact is connected to a drain or source of the second transistor.

Abstract: A unit pixel of an image sensor having a three-dimensional structure includes a first chip and a second chip which are stacked, one of the first chip and the second chip having a photodiode, and the other of the first chip and the second chip having a circuit for receiving information from the photodiode and outputting received information. The first chip includes a first pad which is projectedly disposed on an upper surface of the first chip in such a way as to define a concavo-convex structure, and the second chip includes a second pad which is depressedly disposed on an upper surface of the second chip in such a way as to define a concavo-convex structure corresponding to the concavo-convex structure of the first chip. The first chip and the second chip are mated with each other through bonding of the first pad and the second pad.

Abstract: A semiconductor device includes a semiconductor substrate having a memory cell region and a peripheral circuit region; a bit line extending over the memory cell region and the peripheral circuit region, the bit line including a first portion in the peripheral circuit region; and a sense amplifier in the peripheral circuit region. The sense amplifier includes a transistor having a gate electrode which includes the first portion of the bit line.

Abstract: A semiconductor device is formed using a material which allows a sufficient reduction in off-state current of a transistor; for example, an oxide semiconductor material, which is a wide-gap semiconductor, is used. When a semiconductor material which allows a sufficient reduction in off-state current of a transistor is used, the semiconductor device can hold data for a ions time. Transistors each including an oxide semiconductor in memory cells of the semiconductor device are connected in series; thus, a source electrode of the transistor including an oxide semiconductor in the memory cell and a drain electrode of the transistor including an oxide semiconductor in the adjacent memory cell can be connected to each other. Therefore, the area occupied by the memory cells can be reduced.

Abstract: A process for manufacturing an eDRAM device comprises fabricating semiconductor features on a semiconductor substrate, the semiconductor substrate including a DRAM area and logic area. The process also includes fabricating a first conductive layer in the DRAM area and in the logic area, the first conductive layer in communication with a first group of the semiconductor features. After fabricating the first conductive layer, a storage component is fabricated in communication with a second group of the semiconductor features within the DRAM area.

Abstract: A semiconductor device includes a plurality of first electrodes standing over a substrate, and a supporter that supports the plurality of first electrodes in standing. The supporter includes a stack of first and second supporting films. The first supporting film has a compressive stress. The second supporting film has a tensile stress.

Abstract: A semiconductor device including: multiple layer wirings which are formed above a semiconductor substrate; multiple first electrode type contact plugs which have a granular shape in plane view, extend in a lower direction from the layer wirings to be connected to the layer wirings on an upper side, and serve as a first electrode; multiple second electrode type contact plugs which have a granular shape in plane view, extend in the lower direction from the layer wirings to be connected to the layer wirings on an upper side, and serve as a second electrode different from the first electrode; and a capacitative element section that fauns a capacity between adjacent ones of the first electrode type contact plugs and second electrode type contact plugs. The layer wirings serving as emergence portions of capacity electrodes of the first and second electrode type contact plugs are formed by different layer wirings.

Abstract: A finger length a1 of a transistor P11 is longer than a finger length A1 of a transistor P1, and a finger length b1 of a transistor N11 is longer than a finger length B1 of a transistor N1. The finger length b1 of the transistor N11 is shorter than the finger length A1 of the transistor P1, and the relation: a1>A1>b1>B1 is established. In a relation between an I/O section and a logic circuit section, as for MOS transistor of the same conductive type, a finger length of a MOS transistor constituting the logic circuit section is set so as to be longer than a finger length of a MOS transistor constituting the I/O section.

Abstract: In a conventional semiconductor device, an excessive etching occurs in a section where an opening for contact plug is formed, causing a damage to a diffusion layer located under the opening. A semiconductor device 1 includes a region D1 for forming an electric circuit, and a seal ring 30 (guard ring) that surrounds the region D1 for forming the electric circuit. A DRAM 40 is formed in the region D1 for forming the electric circuit. Interlayer insulating films 22, 24, 26 and 28 are formed on a semiconductor substrate 10. The seal ring 30 is formed in the interlayer insulating films 22, 24, 26 and 28, and at least a portion there of is located spaced apart from the semiconductor substrate 10.

Abstract: A semiconductor device includes: a first multi-layered structure; a first insulating film over the first multi-layered structure, the first insulating film containing fluorine; and a second insulating film over the first insulating film.

Abstract: Provided is a data storage device. The data storage device includes an interface, a buffer controller, a memory controller, a non-volatile memory, and a self-powered semiconductor device adjacent to and electrically connected to the buffer controller. The self-powered semiconductor device includes a semiconductor chip and a rechargeable micro-battery attached to the semiconductor chip. The rechargeable micro-battery includes a first current collector and a second current collector, which face each other, a first polarizing electrode in contact with the first current collector and facing the second current collector, a second polarizing electrode in contact with the second current collector and facing the first polarizing electrode, and an electrolyte layer formed between the first and second polarizing electrodes.

Abstract: A dynamic random access memory (DRAM) device has a metal-insulator-metal (MIM) capacitor electrically connected to a PN junction diode through a metal bridge for protecting the MIM capacitor from charge damage generated in back end of line (BEOL) plasma process.

Abstract: A method for fabricating a storage node contact in a semiconductor device includes forming a landing plug over a substrate, forming a first insulation layer over the landing plug, forming a bit line pattern over the first insulation layer, forming a second insulation layer over the bit line pattern, forming a mask pattern for forming a storage node contact over the second insulation layer, etching the second and first insulation layers until the landing plug is exposed to form a storage node contact hole including a portion having a rounded profile, filling a conductive material in the storage node contact hole to form a contact plug, and forming a storage node over the contact plug.

Abstract: To realize a semiconductor memory device whose capacitance value per unit area in a memory cell is increased without increase in the area of the memory cell. The memory cell includes a transistor, a memory element, a first capacitor, and a second capacitor. The first capacitor includes a semiconductor film, a gate insulating film, and a gate electrode which are included in the transistor and is formed at the same time as the transistor. The second capacitor includes an electrode which is included in the memory element and an insulating film and an electrode which are formed over the electrode. Further, the second capacitor is formed over the first capacitor. In this manner, the first capacitor and the second capacitor which are connected in parallel with the memory element are formed.

Abstract: A semiconductor device and its manufacture method wherein the semiconductor substrate has first and second insulating films, the first insulating film being an insulating film other than a silicon nitride film formed at least on a side wall of a conductive pattern including at least one layer of metal or metal silicide, and the second insulating film being a silicon nitride film formed to cover the first insulating film and the upper surface and side wall of the conductive pattern. The first insulating film may be formed to cover the upper surface and side wall of the conductive pattern. A semiconductor device and its manufacture method are provided which can realize high integrated DRAMs of 256 M or larger without degrading reliability and stability.

Abstract: A flash memory device can include a semiconductor fin protruding from a semiconductor substrate of a first conductive type to extend in one direction, a first doped layer and a second doped layer provided to an upper portion and a lower portion of the semiconductor fin, respectively, to be vertically spaced apart from each other, the first and second doped layers having a second conductive type, and a plurality of word lines extending over a top and a sidewall of the semiconductor fin to intersect the direction. The word lines overlap the first doped layer and the second doped layer to have vertical channels.

Abstract: A semiconductor memory device capable of preventing bridge formations in a peripheral circuit region includes: a cell region; a peripheral circuit region adjacent to the cell region; and a plurality of line patterns formed in the cell region and the peripheral circuit region, wherein a spacing distance between the line patterns is at least onefold greater than a width of the line pattern.