Abstract: A pixel structure controlled by a scan line and a data line on a substrate is provided. The pixel structure comprises a thin film transistor, a resistance wire, a first pixel electrode, and a second pixel electrode, which are disposed on the substrate. Additionally, the thin film transistor is electrically connected to the scan line, the data line, and the resistance wire. Further, the first pixel electrode is electrically connected to the thin film transistor and the second pixel electrode is electrically connected to the thin film transistor by the resistance wire. Especially, a method of manufacturing a pixel structure is also provided.
Abstract: A means of forming unevenness for preventing specular reflection of a pixel electrode, without increasing the number of process steps, is provided. In a method of manufacturing a reflecting type liquid crystal display device, the formation of unevenness (having a radius of curvature r in a convex portion) in the surface of a pixel electrode is performed by the same photomask as that used for forming a channel etch type TFT, in which the convex portion is formed in order to provide unevenness to the surface of the pixel electrode and give light scattering characteristics.
Type:
Application
Filed:
September 1, 2006
Publication date:
January 4, 2007
Applicant:
Semiconductor Energy Laboratory Co., Ltd.
Abstract: A means of forming unevenness for preventing specular reflection of a pixel electrode, without increasing the number of process steps, is provided. In a method of manufacturing a reflecting type liquid crystal display device, the formation of unevenness (having a radius of curvature r in a convex portion) in the surface of a pixel electrode is performed by the same photomask as that used for forming a channel etch type TFT, in which the convex portion is formed in order to provide unevenness to the surface of the pixel electrode and give light scattering characteristics.
Type:
Grant
Filed:
May 19, 2005
Date of Patent:
September 5, 2006
Assignee:
Semiconductor Energy Laboratory Co., Ltd.