Abstract: The spatial structure of an optical element is determined. The optical element has a first optically active surface and a second optically active surface. The optical element is arranged in a holding device. The position of a point (P) on the first optically active surface and the position of a point (P?) on the second optically active surface are referenced in a coordinate system fixed to the holding device. The topography of the first optically active surface is determined in a coordinate system referenced to the holding device by the position of point (P) and the spatial structure of the optical element is calculated from the topography of the first optically active surface and from a data set as to the topography of the second optically active surface. The data set is referenced to the fixed coordinate system of the holding device by the position of point (P?).

Abstract: Methods and mechanisms for correcting a wavefront error in an optical element are disclosed. A wavefront error that is downstream of an optical element in an optical path is determined. A refractive index prescription that reduces the wavefront error is determined. A beam of energy is directed at a surface of the optical element in accordance with the refractive index prescription to alter the surface to change an index of refraction at multiple locations on the surface.

Abstract: A method for measuring the positions of centers of curvature of optical surfaces of a single- or multi-lens optical system, an imaging lens system simultaneously images an object plane into a first and a second image plane. The optical system is arranged so that a supposed position of a first center of curvature is situated in the first image plane of the imaging lens system and a supposed position of a second center of curvature is situated in the second image plane of the imaging lens system. An object arranged in the object plane is then imaged simultaneously or sequentially at the first and the second image plane by means of measuring light. Reflections of the measuring light at optical surfaces of the optical system are detected by means of a spatially resolving light sensor. The actual positions of the first and the second center of curvature are calculated from the detected reflexes.

Abstract: Provided is an imaging method for correcting aberration generated when imaging an object to be inspected. The imaging method includes: irradiating an imaging area with a first light beam which is scanned by a scan unit and taking an image of the object to be inspected based on return light of the first light beam; detecting a moving amount of the object to be inspected; comparing the detected moving amount with a predetermined threshold value; and adjusting the imaging area to be irradiated with the first light beam. The adjusting includes determining in accordance with a result of the comparison to change the imaging area by at least one of: using the scan unit, and using an aberration correcting unit.

Abstract: This method, which allows acquisition and computation of geometrical data of at least one pattern associated with an ophthalmic object (6) for manufacturing ophthalmic lenses similar to the object or complementary thereto, is of the type in which a device (12) for acquiring and computing geometrical data is used, which comprises: a transparent support (13) adapted for bearing an ophthalmic object; on one side of the support, means (17) for illuminating this support; on the other side of the support, a video camera (25) adapted for producing a video signal representative of at least one pattern associated with the ophthalmic object laid on the support; and signal processing and analysis means (27) receiving at the input the video signal produced by the camera, and adapted for computing and providing the geometrical data.

Abstract: A patterning device, for use in forming a marker on a substrate by optical projection, the patterning device including a marker pattern having a density profile that is periodic with a fundamental spatial frequency corresponding to a desired periodicity of the marker to be formed. The density profile is modulated (such as sinusoidally) so as to suppress one or more harmonics of the fundamental frequency, relative to a simple binary profile having the fundamental frequency.

Abstract: A method and system for identifying a given geometrical feature of an optical component or semi-finished ophthalmic lens blank, where an optical component is made of an organic material that can emit light at an emission wavelength ?e when being lighten at an illumination wavelength ?i different from the emission wavelength ?e, a surface of the optical component is illuminated with an incident light beam including at least light at the illumination wavelength but devoid from light at the emission wavelength, light emitted at the emission wavelength by the illuminated surface is collected to build an image of the surface, and the surface image is processed to apply metrics to compare the image with reference data specific to the given geometrical feature.

Abstract: A method of measuring surface curvature comprises forming an intensity distribution defined by Fresnel diffraction, wherein said intensity distribution is formed by electromagnetic radiation reflected from a surface, obtaining data for the intensity distribution and determining information relating to the curvature of the surface using the obtained data.

Abstract: A method for inspecting a light source module for defects includes preparing a board on which a light emitting device and a lens covering the light emitting device are installed. A current is applied to the light emitting device to turn on the light emitting device. The lens is imaged with the light emitting device turned on. A central symmetry denoting a symmetry of light emission distribution from the center of the lens is calculated based on the obtained image, and the calculated central symmetry is compared with a reference value to determine whether unsymmetrical light emission distribution has occurred. Various other methods and apparatuses for inspecting light source modules are additionally provided.

Abstract: A mask inspection apparatus includes a mask transfer unit configured to transfer a mask in one of a first direction and a direction opposite to the first direction, a displacement sensor unit configured to measure a distance to a sheet of the mask transferred by the mask transfer unit, a photographic unit configured to photograph the sheet of the mask transferred by the mask transfer unit, a control unit configured to send a height control signal for controlling a height of the photographic unit according to the measured distance, and a height control unit configured to control the height of the photographic unit according to the height control signal sent by the control unit.

Abstract: An apparatus for determining the angular error in the placement of fiducial marks on a toric intraocular lens with respect to the true location of a meridional axis of the intraocular lens, the fiducial marks defining an estimate of the angular orientation of the meridional axis of the intraocular is disclosed. The apparatus includes a rotatable intraocular lens holder coupled to drive assembly and an actuator which are mounted into an optical measurement cell receptacle of a wavefront measuring instrument or an angular error measuring instrument. A method for determining the angular error in the placement of fiducial marks on a toric intraocular lens with respect to the true location of a meridional axis of the intraocular lens is also disclosed.

Abstract: A measuring system (10) for measuring an imaging quality of an EUV lens (30) includes a diffractive test structure (26), a measurement light radiating device (16) which is configured to radiate measurement light (21) in the EUV wavelength range onto the test structure, a variation device (28) for varying at least one image-determining parameter of an imaging of the test structure that is effected by a lens, a detector (14) for recording an image stack including a plurality of images generated with different image-determining parameters being set, and an evaluation device (15) which is configured to determine the imaging quality of the lens from the image stack.

Abstract: An optical system comprises a detector to determine one or more intensities of light impinging on one or more locations of the detector and an optical element to redirect light towards the detector along a detection axis. The detector and optical element are coupled together by three or more substantially flat flexures respectively defining three or more flexure planes parallel to the detection axis.

Abstract: According to one embodiment, an optical delay apparatus includes the following elements. The first retroreflector includes a first and a second reflection surface. The second retroreflector includes a third and a fourth reflection surface opposite to the first reflection surface. The third retroreflector includes a fifth and a sixth reflection surface opposite to the second reflection surface. The first driving mechanism moves the first retroreflector and a set of the second retroreflector and the third retroreflector relative to each other. The second retroreflector and the third retroreflector are misaligned with each other in a direction along a first line of intersection between the first reflection surface and the second reflection surface.

Abstract: A method of designing lenses includes defining a material having an inside reflective surface spanning an area, and providing an optical design algorithm which defines a plurality of oxels across the area. Each oxel has a plurality of sub-elements including a center sub-element and a plurality of neighboring sub-elements. Based on a defined optical prescription for the inside reflective surface, an optically corrected reference 3D surface is calculated for each oxel having spherical and cylindrical corrections relative to a spherical contour which spans a predetermined field of view (FOV) with respect to a single (common) predetermined reference point. A position of at least a first of the sub-elements for each of the oxels is moved to respective final 3D positions on the optically corrected reference 3D surface, where the moving is constrained to be along an individual line connecting each of the first sub-elements to the single predetermined reference point.

Abstract: Demultiplexing systems and methods are discussed which may be small and accurate without moving parts. In some cases, demultiplexing embodiments may include optical filter cavities that include filter baffles and support baffles which may be configured to minimize stray light signal detection and crosstalk. Some of the demultiplexing assembly embodiments may also be configured to efficiently detect U.V. light signals and at least partially compensate for variations in detector responsivity as a function of light signal wavelength.

Abstract: Methods for measuring the image quality of a projection objective include providing a measuring structure on an image-side of the projection objective, providing an immersion fluid between the projection objective and the measuring structure, directing light through the projection objective and the immersion fluid to the measuring structure while shielding the measuring structure from the immersion fluid, detecting light transmitted by the measuring structure, and determining an image quality of the projection objective based on the detected light.

Abstract: An apparatus including a cup attaching unit, includes: a lens support portion for supporting a lens on a reference axis extending in a vertical direction; a support arm to which an attaching portion to which the cup is attached is attached; a moving arm for support the support arm to be movable so that the attaching portion can be directed in a downward direction toward the lens support portion and in an upward direction or a forward direction; and a lever configured to be operated by the operation and rotate the support arm so as to direct the attaching portion in from the second direction to the first direction. The lever is provided at the support arm and lowers the attaching portion together with the moving arm after the attaching portion is directed in the downward direction.

Abstract: An on-tool measurement system and a method for measuring optical system's wavefront (WF) aberrations are disclosed. The on-tool measurement system includes an optical setup comprising a moveable deflection element further comprising a highly transparent region. The deflection element includes a first surface configured to project a first image of at least one object onto a sensor and the highly transparent region includes a second surface configured to project a second image of the at least one object onto the sensor. The on-tool measurement system includes a sensor configured to capture the first and second images and a controller configured to measure differential displacements between the first and second images at each deflection element position and to calculate the optical setup local WF gradients that depend on the measured differential displacements.

Abstract: Disclosed are apparatus and methods for determining optimal focus for a photolithography system. A plurality of optical signals are acquired from a particular target located in a plurality of fields on a semiconductor wafer, and the fields were formed using different process parameters, including different focus values. A feature is extracted from the optical signals related to changes in focus. A symmetric curve is fitted to the extracted feature of the optical signals as a function of focus. An extreme point in the symmetric curve is determined and reported as an optimal focus for use in the photolithography system.

Abstract: A focusing device that includes a differential interference prism used in differential interference observation in a focusing detection optical system includes: a light source that emits light with which a measurement surface of an observation sample is irradiated; a photo detection unit that detects light from the measurement surface; a focusing detection unit that detects an error signal near a focusing point of the measurement surface on the basis of an output signal from the photo detection unit; and a condition changing unit that changes an acquisition condition of the error signal.

Abstract: In embodiments of object presence and condition detection, a light is emitted that is directed at a first edge of a translucent object to pass through the translucent object, such as a lens. An intensity of the light is detected proximate an opposing, second edge of the translucent object. A presence and/or a condition of the translucent object can then be determined based on the detected intensity of the light that passes through the object. The translucent object can be implemented as a multi-lens array, and a laser light is directed through optic surfaces of the multi-lens array with a laser. The presence and the condition of the multi-lens array can be continuously determined as a safety compliance of the laser light being directed through the multi-lens array.

Abstract: The spatial resolution of captured plenoptic images is enhanced. In one aspect, the plenoptic imaging process is modeled by a pupil image function (PIF), and a PIF inversion process is applied to the captured plenoptic image to produce a better resolution estimate of the object.

Abstract: A projection exposure system (10) for microlithography. The system includes projection optics (12) configured to image mask structures into a substrate plane (16), an input diffraction element (28) which is configured to convert irradiated measurement radiation (21) into at least two test waves (30) directed onto the projection optics (12) with differing propagation directions, a detection diffraction element (34; 28) which is disposed in the optical path of the test waves (30) after the latter have passed through the projection optics (12) and is configured to produce a detection beam (36) from the test waves (30) which has a mixture of radiation portions of both test waves (30), a photo detector (38) disposed in the optical path of the detection beam (36) which is configured to record the radiation intensity of the detection beam (36), time resolved, and an evaluation unit which is configured to determine the lateral imaging stability of the projection optics (12) from the radiation intensity recorded.

Abstract: An applanation tonometer for measuring intraocular pressure (IOP) so that the health of a human or animal eye can be determined. The applanation tonometer includes a prism having a contact tip at one end to be moved into contact with and lightly touched against the cornea or the eye. Incident laser light is transmitted inwardly through the prism to the contact tip at which some of the light is decoupled and lost though the contact tip depending upon the area of contact between the contact tip and the cornea. The remaining light is reflected by the contact tip outwardly through the prism. A photo defector which is responsive to the light reflected by the contact tip of the prism and a force detector which is responsive to the pressure at the area of contact between the contact tip and the cornea generate paired force and area data pairs that are processed to measure IOP.

Abstract: An aberration estimating method using a steepest descent method is configured to estimate, as an aberration of a test optical system, an aberration when a predetermined evaluation function becomes less than or equal to a permissible value. The aberration estimating method comprising the step of updating the aberration with a sum of a current aberration and a first derivative of the evaluation function by the aberration when the evaluation function is larger than the permissible value. The aberration is an aberration of an entire pupil plane of the test optical system. The updating step includes calculating the first derivative by Fourier-transforming the difference instead of an integration at coordinates of respective points on an image plane of the test optical system.

Abstract: A method, apparatus and computer program is provided. The apparatus includes at least one processor; and at least one memory storing a computer program including computer program instructions that, when executed by the at least one processor, cause at least the following to be performed: determining at least one area of interest in a scene imaged by an image sensor; initiating capture of a image, including the at least one area of interest, by causing the image sensor to be exposed to light conveyed by an optical arrangement; detecting movement of the apparatus during capture of the image; and controlling movement of at least one of: the image sensor and the optical arrangement, in dependence upon the detected movement of the apparatus and the at least one area of interest, in order to mitigate the perspective error, at the at least one area of interest, in the image being captured.

Abstract: Systems and methods for facilitating focusing of an image scanner, such as a confocal microscope, are disclosed. Measurement of optical characteristics in certain areas of a test sample are compared to stored or baseline optical characteristic profiles to determine an appropriate correction to properly focus the scanner. In one aspect, the method includes obtaining a dynamic profile at a current detection region of a test sample and associating the dynamic profile to a profile selected from a set of stored baseline profiles. Each of the stored baseline profiles is associated with a correction.

Abstract: Lens module testing device for testing a lens module includes a testing platform, a light source, a testing board, a sensing element, a processor, a driving element, and a position feedback unit. The light source, the testing board, and the sensing element are arranged in order on the testing platform along an optical axis of the lens module. The lens module is positioned between the testing board and the sensing element. The light source emits testing light to the testing board, and the sensing element senses an image of the testing board and sends the image to the processor. The processor determines whether the testing board is in a focal plane of the lens module, controls the driving element to adjust a position of the testing board relative to the lens module, and obtains position information from the position feedback unit to generate a focal length of the lens module.

Abstract: Aspects are disclosed for determining refractive error. In an aspect, a line pattern is displayed to a user, and a distance between the line pattern and the user is ascertained. The line pattern includes a first and second line in which an aspect of the line pattern is varied, and where refractive error is quantified based on the distance and a selected variance of the line pattern. In another aspect, the varied aspect of the line is at least one of a width between the first and second line, a thickness of the first or second line, a darkness of the first line or the second line, or a color of the first line or the second line. An input corresponding to a focused line pattern variance selected by the user is then received, and a refractive error is quantified based on the input and an approximate distance between the line pattern and the user.

Abstract: The present disclosure illustrates an image adjusting system with multiple lens modules and method thereof. The system is adapted for an image capturing device having a zoom lens module and a prime lens module. When the zoom lens module and the prime lens module captures a first image and a second image, the image adjusting system can select a first reference calibration parameter table from multiple first calibration parameter tables, and search a current focus parameter from a focus parameter lookup table according to a current motor step, and then multiply the second image, the first reference calibration parameter table and the current focus parameter to generate a third image. Therefore, the third image has substantially consistent with the first image.

Abstract: The present invention relates to a method for manufacturing colored contact lenses, and in particular to automated inspection of colored images printed either on molds or on contact lenses.

Abstract: Provided is a method of characterizing photolithography lens quality. The method includes selecting an overlay pattern having a first feature with a first pitch and a second feature with a second pitch different than the first pitch, performing a photolithography simulation to determine a sensitivity coefficient associated with the overlay pattern, and providing a photomask having the overlay pattern thereon. The method also includes exposing, with a photolithography tool, a wafer with the photomask to form the overlay pattern on the wafer, measuring a relative pattern placement error of the overlay pattern formed on the wafer, and calculating a quality indicator for a lens in the photolithography tool using the relative pattern placement error and the sensitivity coefficient.

Abstract: A method of manufacturing an optical component may include providing a plate formed from a transparent material, cutting depth-wise through a planar surface of the plate along first and second linear directions to define first and second planar surfaces, and cutting depth-wise through the planar surface along a curved direction to define a curved surface such that an optical component is obtained including the first and second planar surfaces and the curved surface extending between an edge of the first planar surface and an edge of the second planar surface.

Abstract: Apparatus and methods for detecting wave front aberration of a projection objective lens in a photolithography machine are disclosed. The apparatus comprises: a light source system configured to generate an illuminating beam; a spatial filter configured to receive the illuminating beam and generate ideal spherical wave; a splitter plate arranged downstream to the spatial filter at a predetermined angle with respect to an optical axis of the spherical wave and having a transflective film being applied on a surface thereof; the projection objective lens configured to receive a beam from the splitter plate and generate an output beam; a spherical mirror configured to reflect the output beam from the projection objective lens to the projection objective lens, light passing through the projection objective lens being reflected by the splitter plate; and an interferometer configured to receive light reflected by the splitter plate and measure the wave front aberration of the projection objective lens.

Abstract: An apparatus for inspecting lenses includes an inspection system including an open cuvette, a communicatively coupled CT measurement device, and a user interface communicatively coupled to the inspection system. According to one embodiment, the lens inspection system provides a single instrument for inspecting the quality of a lens, thereby minimizing the transference of the lens from one inspection component to another.

Abstract: An optical characteristic measurement apparatus acquires a measurement value pertaining to an image characteristic of an optical system to be tested on a plurality of evaluation planes, and measures an optical characteristic, comprising a measurement value correction unit correcting a measurement value pertaining to a width or a light intensity of one of a line spread distribution and a point spread distribution of a beam, on the evaluation planes, wherein: in case where the measurement value pertains to the width, the image plane is regarded as an evaluation reference plane, and the measurement value correction unit outputs a corrected value; in case where the measurement value pertains to the light intensity, the image plane is regarded as an evaluation reference plane, and the measurement value correction unit also outputs a corrected value; and the optical characteristic of the optical system to be tested is measured based on the corrected value.

Abstract: A measuring assembly for measuring an inside of a lens frame of a spectacle frame, said lens frame at least partially delimiting an inscribed surface area F that corresponds to a lens shape, comprising a holding device for mounting the spectacle frame, at least one light source for generating a light beam to be projected on a region of the lens frame to be evaluated, and at least one sensor that can be coupled to an evaluation unit for detecting the reflected light beam, wherein the holding device can be rotated about a rotational axis r and moved in the direction of a movement axis x, and the movement axis x comprises at least one movement component in a direction perpendicular to the rotational axis r. The holding device is used to fix the spectacle frame by spectacle frame bows, wherein at least one free space is provided in the region of the holding device, said free space being used to receive the spectacle frame bows of a spectacle frame to be held which are not folded in or cannot be folded in.

Abstract: A device and method for subaperture stray light detection and diagnosis. A test light beam is generated. Stray light is detected. Based on the detected stray light, potential paths that light may have taken to arrive at the detection surface are determined. A testing device comprises a test light beam source whereby the cross sectional area of the test light beam is made less than the cross sectional area of the system aperture. A relative lateral positioning stage and an angular beam directing stage launch the test light beam into the aperture. A detector and a data processing system produce a data set relating the stray light to the location and directional angles of the test light beam to identify the sources of stray light. A light trap and test light beam delivery system are provided.

Abstract: A test chart for characterizing lenses comprises X radial lines extending from a central point and Y concentric X-sided polygons centered at the central point. Each of the X radial lines intersects one vertex of each of the polygons. Each of the X radial lines is divided into Y segments by its intersection points with the central point and with the polygons. The radial lines and the polygons define boundaries of X*Y non-overlapping patches. At least two of the patches share a boundary and are distinctly colored from each other.

Abstract: The present disclosure describes techniques for testing optical devices in a manner that, in some implementations, simulates the environment in which the devices will be used when they are integrated into the end-product or system. For example, one aspect includes providing a transparent sheet that is positioned near the optical device in a manner that simulates at least some aspects of the environment when the device is incorporated into the end-product or system. The testing can be performed, for example, while the optical devices are in production or at some other time prior to their being integrated into an end-product or system.

Abstract: A laser based lens analysis device comprising of a laser for emitting a laser beam, a beam expander for increasing the diameter of the laser beam, a beam collimator for collimating the increased diameter laser beam, an aperture for controlling the collimated laser beam and rendering the collimated laser beam to be substantially symmetrical, and a beam profiler for analyzing the laser beam characteristics after the controlled-symmetrical laser beam passes through the lens being tested. A method for lens analysis comprising the steps of emitting a laser beam, increasing the diameter of the laser beam, collimating the increased diameter laser beam, rendering the collimated laser beam substantially symmetrical, directing the symmetrical laser beam towards the lens being tested, and analyzing characteristics of the directed laser beam after the directed laser beam passes through the lens being tested.

Abstract: A lens assembly testing method includes: providing a lens assembly having a first lens and a second lens placed on the first lens; determining whether a modulation transfer function value of the lens assembly is in a predetermined range; if not, separating the first lens and the second lens, and forming a first coating layer and a second coating layer on the first lens to obtain a coated first lens with a number of dots; capturing two images of the coated first lens; attaching the coated first lens on the second lens, and capturing another two images of the coated first lens; determining an actual moving distance of a chosen dot using a 3D-Digital image correlation method according to the four images; adjusting a size of the first lens according to the actual moving distance; and displaying the adjusted size of the first lens to a user.

Abstract: A method of rating eyewear includes providing eyewear to be rated, measuring a physical property of the eyewear selected from a group that includes ultraviolet radiation absorption, blue light radiation absorption, infrared radiation absorption, and light blocking capability, transforming the physical property into a rating value, and informing a prospective consumer of the rating value.

Abstract: A lens testing system may have a test pattern source that generates a test pattern of light. A lens may have a lens surface that reflects the test pattern of light. A digital camera system may capture an image of the reflected test pattern of light. Computing equipment may perform image processing operations to evaluate the captured image of the reflected test pattern. The test pattern may contain a known pattern of test elements such as a rectangular array of spots or test elements of other configurations. During image processing operations, the computing equipment may analyze the reflected version of the spots or other test elements to measure characteristics of the lens such as radius of curvature, whether the lens contains flat regions, pits, or bumps, lens placement in a support structure, and other lens performance data. The computing equipment may compare the measured lens data to predetermined criteria.

Abstract: An optical coupling lens includes a first reference portion, a second reference portion and a main portion sandwiched between the first reference portion and the second reference portion. The main portion includes a first surface having at least one first converging lens, a second surface having at least one second converging lenses, and a reflecting surface. The second surface is substantially perpendicular to the first surface forming intersection line. An angle between the reflecting surface and the first surface is about 45 degrees. Each reference portion includes a reference member. The reference member includes a reference point. A connecting line of the reference points of the reference portions is substantially parallel to the intersection line.

Abstract: An optical testing method and system for 3D display products are disclosed, the method comprising: the 3D display product to be tested displaying white light and/or black light, a left eye lens and a right eye lens receiving white light signals and/or black light signals of left eye pixels and right eye pixels respectively and transmitting them to a data processor for processing, obtaining test results for brightness difference; the 3D display product to be tested displaying primary colors, the left eye lens and the right eye lens receiving light signals of the left eye pixels and the right eye pixels respectively and transmitting them to the data processor for processing, and obtaining test results for color difference.

Abstract: The subject of the present invention is a method and a system for measuring the geometric or optical structure of an optical component.

Abstract: A method for calculating the surfaces of optical lenses including the steps of: providing a desired light distribution to be generated with light passing through the lens; deforming a first surface of the lens to generate light source images of different sizes; deforming a second surface of the lens to displace the light source images such that they lie at their highest point directly at or on a light/dark border in a resulting light distribution; determining a quality of the resulting light distribution by a comparison with the predefined light distribution; if the quality lies above a predefined limit value, storing the calculated surfaces for the lens; otherwise, renewed deformation of the first surface; renewed deformation of the second surface; repeating the previous two steps until the quality of the resulting light distribution lies above the limit value; and storing the calculated surfaces for the lens.

Abstract: Disclosed are apparatus and methods for determining optimal focus for a photolithography system. A plurality of optical signals are acquired from a particular target located in a plurality of fields on a semiconductor wafer, and the fields were formed using different process parameters, including different focus values. A feature is extracted from the optical signals related to changes in focus. A symmetric curve is fitted to the extracted feature of the optical signals as a function of focus. An extreme point in the symmetric curve is determined and reported as an optimal focus for use in the photolithography system.