Abstract: A method for an automated inline determination of the refractive power of an ophthalmic lens (5) including providing an inspection cuvette having an optically transparent bottom (21) and having a concave inner surface (210) and containing the ophthalmic lens (5) immersed in a liquid, and providing a light source (42) and a wavefront sensor (6) including a detector. The light coming from the light source (42) and having passed the ophthalmic lens (5) contained in the inspection cuvette and impinging on the detector generates signals at the detector. By comparing the signals generated at the detector with predetermined signals representative of a reference refractive power, the refractive power of the ophthalmic lens (5) is thereby determined.

Abstract: A wavefront aberration measuring apparatus comprising: an illumination optical system provided to an incident side of a test lens; and a measuring optical system provided to an exit side of the test lens, the illumination optical system including an aperture stop capable of being opened and closed, and the illumination optical system being movable along an optical axis of the illumination optical system so as to adjust positions of the aperture stop and an entrance pupil of the test lens to have an optically conjugate relation with each other. Accordingly, it becomes possible to provide a wavefront aberration measuring apparatus capable of suppressing errors in measured result.

Abstract: A system and method of determining a focal position for an objective positioned at a measurement location of a sample holder in a microscopy imaging system are provided. The objective is moved to a position relative to the sample holder that corresponds to a distance between the objective and the sample holder. The sample holder has a conditioned upper surface. A focusing light beam is projected onto the sample holder when the objective is located at the position, and the objective focuses the focusing light beam on the sample holder. A reflected light beam resulting from reflection of the focusing light beam off the conditioned upper surface is observed. The focal position for the objective is determined based on the reflected light beam such that the objective produces an in focus image of a microscopy sample when the objective is located at the focal position.

Abstract: Determining position parameters defining relative position of manufactured derivable surface relative to reference surface, the process comprising: a step during which a nominal surface expressed in a nominal frame of reference and corresponding to the theoretical derivable surface to be manufactured with the nominal value of the position parameters defining the relative position of the nominal surface relative to the reference surface is provided, a step during which a measured surface of the manufactured derivable surface expressed in the nominal frame of reference is provided, a step (S3) during which at least one deformation surface defined by at least one deformation adjustable parameter is provided, a step (S4) during which a composed surface is determined by adding the measured surface and the deformation surface, a step during which the position parameters and at least one deformation parameter are determined by minimizing the difference between the nominal surface and the composed surface.

Abstract: The present application relates to a high precision method for calibrating and removing distortion from a lens, and more particularly, a method for calibrating and removing distortion by arranging sensor readings to compensate for its presence and simultaneously optimize the resulting image magnification for best image quality.

Abstract: The invention comprises a method and a device for measuring a reflector for radiation during the operation thereof, in which to determine the current reflection properties of the reflector in a number of at least one measurement points provided in the path of the radiation reflected by the reflector, the pattern of predetermined characteristics of the currently reflected radiation is measured and compared with a predetermined reference pattern, wherein the current geometrical properties of the reflector are inferred from the comparison and in the event of undesired geometrical properties, appropriate operational parameters of the reflector are modified. This method is preferably applied in trough collectors for solar power plants, in order to measure flexible concentrators arranged in a pressure cell, during their operation.

Abstract: There is provided an exposure condition determining method for determining an exposure condition for an exposure-objective substrate having a plurality of semiconductor pattern features formed by predetermined exposure on a surface thereon, the method including, irradiating an illumination light onto a surface of a substrate, which has the pattern features, detecting a diffracted light from the plurality of semiconductor pattern features of the substrate irradiated with the illumination light, and determining the exposure condition based on a variation in brightness of the detected diffracted light.

Abstract: In an eccentricity measuring method according to the present invention, a first position of a light source image formed by reflection at one optical surface is measured (S2), a predetermined second position related to another optical surface is measured (S3), and a relative eccentricity between both optical surfaces is calculated based on the first and second positions (S5). Therefore, the eccentricity measuring method enables measurement of eccentricity by a same measurement optical system regardless of a radius of curvature of an optical surface of an optical element.

Abstract: Disclosed are an ambient light reflection determination apparatus and an ambient light reflection determination method enabling to determine reflection without using an edge and even in a case where luminance of a reflection generating part in eyeglasses is low. In a reflection determination apparatus (100), a luminance histogram calculation section (102) calculates a luminance histogram representing a luminance distribution of an eye area image, a difference calculation section (104) calculates a difference histogram by finding a difference between the two luminance histograms calculated from the two eye area images having different photographing timings, an evaluation value calculation section (105) calculates an evaluation value regarding reflection of ambient light based on the difference histogram and a weight in accordance with luminance, and a reflection determination section (107) determines the reflection of ambient light based on the calculated evaluation value.

Abstract: An optical testing method and system for 3D display products are disclosed, the method comprising: the 3D display product to be tested displaying white light and/or black light, a left eye lens and a right eye lens receiving white light signals and/or black light signals of left eye pixels and right eye pixels respectively and transmitting them to a data processor for processing, obtaining test results for brightness difference; the 3D display product to be tested displaying primary colors, the left eye lens and the right eye lens receiving light signals of the left eye pixels and the right eye pixels respectively and transmitting them to the data processor for processing, and obtaining test results for color difference.

Abstract: A method for measuring lens quality includes receiving and transmitting an image's information to a location module through an image collecting module. A location module partitions the image's information into a plurality of measure areas. An image processing module computes the Modulation Transfer Function (MTF) of each measure area. A comparing module compares the MTF with a predetermined MTF to determine quality of the lenses.

Abstract: Provided is a method of manufacturing imaging optical elements which cause a plural light beams to enter a deflection unit, and guide those beams to corresponding surfaces to be scanned, the imaging optical elements being arranged optically at the same position, having the same optical performance, the method including: measuring, with respect to the imaging optical elements having the same optical performance, the optical performance at each of a plurality of positions of the different light beam passing states; calculating a correction shape of an optical functional surface of the imaging optical element based on a deviation amount from a design value of the optical functional surface of the imaging optical element; performing correction processing on a shape of a mirror-finish insert of a mold for molding based on the correction shape of the optical functional surface; and performing molding by using the mirror-finish insert subjected to the correction processing.

Abstract: Methods for inspecting ophthalmic lenses with different wavelengths of radiation are disclosed herein.

Abstract: Improving the optical state of a progressive addition lens along a principal line of vision through which the line-of-sight of a wearer passes by making the displacement of a position at which an optical state becomes the best to be the same as the amount of inward movement of line-of-sight, when the wearer moves his line-of-sight from the front far distance to the front near distance. An expression OI<DH may be satisfied to improve such an optical state of the progressive addition lens.

Abstract: An ophthalmic lens scanner includes an inspection platform configured to receive an ophthalmic lens thereon. A camera is spaced apart from the inspection platform and is arranged to, in response to an activation signal, capture an image of the ophthalmic lens. A light source is spaced apart from the inspection platform and is configured to emit light when the camera is activated to capture an image of the ophthalmic lens. The inspection platform is located between the camera and the light source. A first Fresnel lens is located between the inspection platform and the camera. A second Fresnel lens is located between the inspection platform and the light source. The ophthalmic lens scanner may be incorporated in an ophthalmic lens scanner system that includes a computing device and a display device.

Abstract: In a precision testing method of an optical lens using a computing device, the computing device is connected to an imaging system. The computing device controls the imaging system to generate an image of an object according to light rays reflected from the object and collected by the optical lens. A dimension of the object is measured from the image. A maximum value and a minimum value of the dimension of the object are determined. A difference between the maximum value and the minimum value is calculated. According to the difference, it is determined whether the optical lens agrees with a precision requirement.

Abstract: A system and method for wavefront measurement of an EO sensor is performed in-situ using the sensor's EO detector in a manner that disambiguates the local wavefront measurements for different sub-pupils in time and maximizes the dynamic range for measuring the local wavefronts. A single sub-pupil sized optical beam is traced in a spatial pattern over the EO sensor's entrance pupil to serially illuminate a temporal sequence of sub-pupils to form a serially addressed sub-pupil screen. The EO detector and video card capture a video signal for one sub-pupil at a time as the optical beam traces the spatial pattern. The video signal is routed to a computer processor that generates a spatio-temporal mapping of the spatial positions of the sub-pupils in the sub-pupil screen to the temporal positions of frames in the video signal. The computer processor uses the mapping to process the video signal to compute a wavefront estimate spanning the entrance pupil.

Abstract: A method of predicting clinical performance of an ophthalmic optical correction using simulation by imaging a series of objects of different sizes by each of a plurality of eye optical systems, each of the eye optical systems including the ophthalmic optical correction, the method providing an output value representing the resolution and contrast performance of the optical design at that vergence for the eye optical systems.

Abstract: A lens module testing device includes a base substrate, a supporting assembly, a bearing assembly, a receiving element, and an operation element. The supporting assembly is positioned on the base substrate and includes two supporting plates parallel with each other. One of the supporting plates defines an arc shaped slot. The bearing assembly is rotatably received between the two supporting plates. The receiving element is positioned on the bearing assembly and configured for receiving a lens module. The operation element penetrates the slot and connects to the bearing assembly; the bearing assembly is driven by the operation element to move along the slot and thereby adjusting the angle of the lens module which is presented to a light source.

Abstract: First test beams (464a-d), after passing through an optical system on optical paths that differ in pairs, impinge on a first measurement region (461) at angles that differ in pairs with respect to the measurement plane. Second test beams (465a-d), after passing through the optical system on optical paths that differ in pairs, impinge on a second measurement region (462) at angles that differ in pairs, wherein the second region differs from the first. A value of a first measurement variable of the test beam at the first region is detected for each of the first test beams, and comparably for a second measurement variable at the second region for the second test beams. Impingement regions (467a-d) on reference surface(s) (466, 471) of the optical system are determined and a spatial diagnosis distribution of a property of the reference surface(s) for each test beam is calculated.

Abstract: A wavefront aberration measuring apparatus comprising: an illumination optical system provided to an incident side of a test lens; and a measuring optical system provided to an exit side of the test lens, the illumination optical system including an aperture stop capable of being opened and closed, and the illumination optical system being movable along an optical axis of the illumination optical system so as to adjust positions of the aperture stop and an entrance pupil of the test lens to have an optically conjugate relation with each other. Accordingly, it becomes possible to provide a wavefront aberration measuring apparatus capable of suppressing errors in measured result.

Abstract: A simple matrix method and computer program product for stray-light correction in imaging instruments is provided. The stray-light correction method includes receiving raw signals from an imaging instrument and characterizing the imaging instrument for a set of point spread functions. For high resolution imaging instruments, the raw signals may be compressed to reduce the size of the correction matrix. Based on stray-light distribution functions derived from the point spread functions, a correction matrix is derived. This fast correction is performed by a matrix multiplication to the measured raw signals, and may reduce stray-light errors by more than one order of magnitude. Using the stray-light corrected instrument, significant reductions may be made in overall measurement uncertainties in radiometry, colorimetry, photometry and other applications. Because the PSFs may include other types of undesired responses, the stray-light correction also eliminates other types of errors, e.g.

Abstract: A method of rating eyewear includes providing eyewear to be rated, measuring a physical property of the eyewear selected from a group that includes ultraviolet radiation absorption, blue light radiation absorption, infrared radiation absorption, and light blocking capability, transforming the physical property into a rating value, and informing a prospective consumer of the rating value.

Abstract: A computer-implemented image pattern matching method for wafer alignment is provided, for determining an overall similarity value and an overall geometry relationship between a target wafer image and a model wafer image. The method includes: determining a plurality of model patterns in the model wafer image; searching the target wafer image to identify a plurality of target patterns, thereby generating a plurality of matches each including a respective target pattern and model pattern; selecting, using multiple threshold values, ones of the plurality of matches according to a plurality of similarity values; and determining, using a predetermined algorithm and the selected ones of the matches, the overall similarity value and the overall geometry relationship between the target wafer image and the model wafer image.

Abstract: Method of determining at least one refractive characteristic of an ophthalmic lens, includes: a) placing the lens on a support having at least one prop element contacting one of the main faces of the lens in a contact zone area smaller than that of the main faces; b) lighting the lens placed on its support with lighting elements; c) capturing an image of the prop element of the support lighted by light rays that have passed through the lens, the image being captured in an image capture plane substantially perpendicular to an optical axis of the lens; d) in the image, identifying the image of the prop element of the support and determining at least one characteristic representative of the geometry of the image of the prop element; and e) from the characteristic representative of the geometry of the image of the prop element, deducing the looked-for refractive characteristic.

Abstract: A method includes the steps of measuring a first transmitted wavefront in a first medium having a first refractive index and a second transmitted wavefront in a second medium having a second refractive index different from the first refractive index, and obtaining a refractive index distribution projected value of the object in each orientation by removing a shape component of the object utilizing measurement results of the first transmitted wavefront and the second transmitted wavefront and each transmitted wavefront of a reference object that has the same shape as that of the object and a specific refractive index distribution and is located in one of the first medium and the second medium with the same orientation as that of the object, and calculating a three-dimensional refractive index distribution of the object based on a plurality of refractive index distribution projected values corresponding to the plurality of orientations.

Abstract: A system for controlling a light beam in an optical setup includes a light source that directs a collimated light beam along a path, through a sample, and toward the active area of a stationary detector. A lens is selectively movable into the path of the light beam for spreading the beam in instances where the path of the beam is altered by the sample between the source and the stationary detector. The detector, therefore, is held stationary. Adjustment mechanisms are provided for increasing the intensity characteristic of the light that reaches the detector to account for a decrease in intensity that occurs when the lens is in the path of the light beam to spread the beam.

Abstract: This invention provides for a method and an ophthalmic lens thickness profile measuring apparatus. More specifically, the apparatus which is capable of measuring the ophthalmic lens in a precursor state after it is free-formed on an optic forming mandrel on which it can be formed. Additionally, the present invention can also allow for a design profile of the formed ophthalmic lens to be compared to the resulting free-formed ophthalmic lens to ensure it meets specified convergence design criteria.

Abstract: The measuring method includes a step of causing reference light to enter an object placed in a first medium to measure a first transmitted wavefront, a step of causing the reference light to enter the object placed in a second medium to measure a second transmitted wavefront, a step of measuring first and second placement positions where the object is placed in the first and second media, and a calculating step of calculating an internal refractive index distribution of the object by using measurement results of the first and second transmitted wavefronts. The calculating step calculates the internal refractive index distribution from which a shape component of the object is removed by using the measurement results of the first and second transmitted wavefronts, and first and second reference transmitted wavefronts of a reference object to be placed at positions identical to the first and second placement positions.

Abstract: A substrate includes a diffracting structure providing a hologram which encodes one or more holographic images. Every image of the one or more holographic images has a holographic location at either a finite or substantially infinite effective optical distance. The hologram is to be used as an ophthalmic eye chart or an eye exercise device or to provide a scale for measuring distances.

Abstract: A device for measuring a lens, comprising apparatus for maintaining the lens at a location, at least a first point source, a second point source and a third point source, at least a first beam splitter, and a second beam splitter, and a wavefront sensor configured and arranged to receive a wavefront of light from the first source, a wavefront of light from the second source, and a wavefront of light from the third source after the light from each source has passed through the lens. The point sources and beam splitters are arranged such that the first source has a first object distance relative to the location, the second source has a second object distance relative to the location, the third source has a third object distance relative to the location, the first object distance, the second object distance, and the third object distance being different than one another.

Abstract: A device for measuring eccentricity of a lens includes a support portion, an eccentricity detector, a driving device, a vacuum absorption device, a clamping device, and a rotatable pole. The support portion includes a plurality of gear teeth and a first through hole. The eccentricity detector is positioned above the lens. The driving device includes a driving mechanism and a motor. The motor rotates the driving mechanism. The vacuum absorption device includes an air pipe and a vacuum generation element. The vacuum generation element is for removing air from the air pipe. The clamping device includes a first clamping element and a second clamping element. The first clamping element cooperates with the second clamping element to locate and fix the lens. The rotatable pole includes a second through hole. The rotatable pole is for supporting the support portion.

Abstract: A method is disclosed for power normalization of spectroscopic signatures obtained from laser based chemical sensors that employs the compliance voltage across a quantum cascade laser device within an external cavity laser. The method obviates the need for a dedicated optical detector used specifically for power normalization purposes. A method is also disclosed that employs the compliance voltage developed across the laser device within an external cavity semiconductor laser to power-stabilize the laser mode of the semiconductor laser by adjusting drive current to the laser such that the output optical power from the external cavity semiconductor laser remains constant.

Abstract: An embodiment of a method and system for inspecting clear and printed contact lenses is provided. A contact lens is inspected by illuminating the contact lens using bright-field illumination and low-angle dark-field illumination simultaneously, when the contact lens is disposed in a cavity between a male mold and a female mold. Further, the light emerging from the contact lens is received by an imaging optical system, and a camera uses the light received by the imaging optical system to capture an image of the contact lens. Further, a data processing system is configured to identify dark defects in the image that are in a first portion of a dynamic range of brightness, and to identify bright defects in the image that are in a second portion of the dynamic range of brightness.

Abstract: The method measures first transmitted wavefronts and second transmitted wavefronts by respectively causing reference light to enter an object placed in plural placement states in a first medium and a second medium, calculates an aberration sensitivity with respect to changes of the placement state of the object, and calculates an alignment error of the object in each placement state by using the aberration sensitivity and the first and second transmitted wavefronts measured in each placement state. The method further calculates first and second reference transmitted wavefronts respectively acquirable when causing the reference light to enter the reference object placed in placement states including the alignment errors in the first medium and the second medium, and calculates a refractive index distribution of the object which a shape component thereof is removed, by using the first and second transmitted wavefronts and the first and second reference transmitted wavefronts.

Abstract: An embodiment of a system and a method for inspecting a contact lens is provided. The illumination system illuminates the center zone and the peripheral zone of the contact lens when it is inside a cavity between a male mold and a female mold. The imaging optical system has two channels to capture two images or a composite single image to inspect the entire contact lens. The imaging optical system of the first channel has its entrance pupil far away from the mold tool. The camera of the first channel is used to capture the image of the center zone of the contact lens. The image optical system of the second channel is located outside the mold tool but its entrance pupil is located inside the mold tool or outside but substantially close to it. This enables the camera of the second channel to capture the image of the peripheral zone of the contact lens.

Abstract: A lens testing method is disclosed which comprises the following three steps. First, test a lens under test to obtain a testing characteristic value of the lens under test for a first object distance. Second, provide a correction datum. Third, calculate a simulated characteristic value for a second object distance according to the testing characteristic value and the correction datum.

Abstract: A refractive index distribution measurement method includes the steps of measuring a first transmission wavefront of a test object by introducing reference light to the test object immersed in a first medium having a first refractive index lower than that of the test object by 0.01 or more, measuring a second transmission wavefront of the test object by introducing the reference light to the test object immersed in a second medium having a second refractive index lower than that of the test object by 0.01 or more and different from the first refractive index, and obtaining a refractive index distribution of the test object based on a measurement result of the first transmission wavefront and a measurement result of the second transmission wavefront.

Abstract: A method includes measuring a transmitted wavefront of a test object by introducing reference light into the test object arranged in a medium having a refractive index different from a refractive index of the test object, and calculating a refractive index distribution of the test object by using a measurement result of the transmitted wavefront. The measuring step measures a first transmitted wavefront for a first wavelength and a second transmitted wavefront for a second wavelength different from the first wavelength. The calculating step calculates the refractive index distribution of the test object by removing a shape component of the test object utilizing measurement results of the first and the second transmitted wavefront, and a transmitted wavefront of a reference object arranged in the medium for each of the first and second wavelengths. The reference object has the same shape as the test object and a specific refractive index distribution.

Abstract: A lens shape measuring apparatus measures a peripheral shape of a lens in order to measure the peripheral shape of the lens accurately according to a non-contact technique. The lens shape measuring apparatus includes: a lens holding mechanism section for holding the lens with the holding axis from the side of a lens surface; and a laser displacement meter for measuring a lens peripheral shape by irradiating a laser beam to the periphery of the lens and receiving a reflected light thereof. The laser displacement meter is installed such that a light projecting section for projecting a laser beam and a light receiving section for receiving a laser beam are aligned in a direction perpendicular to an axis line of the holding axis.

Abstract: An apparatus for testing a lens module includes a light source, a recording element, and an analyzing device. The lens module includes an actuator and a barrel. The light source emits a light beam towards the barrel. The light beam is reflected by the barrel and forms a light spot on the recording element. The recording element records a position of the light spot. The analyzing device calculates a distance between the position of the light spot and a reference position, compares the distance with a predetermined value, and determines whether the distance is larger than the predetermined value. If the distance is less than or equal to the predetermined value, the analyzing device determines that the lens module is satisfactory. If the distance is larger than the predetermined value, the analyzing device determines that the lens module is unsatisfactory.

Abstract: A method for qualifying optics (16; 14, 16) of a projection exposure tool (10) for microlithography. The optics include (16; 14, 16) at least one mirror element (14-1 to 14-7, 16-1 to 16-6) with a reflective coating (52) disposed on the latter. The method includes: irradiating electromagnetic radiation (13, 42) of at least two different wavelengths onto the optics (16; 14, 16), a penetration depth of the radiation into the coating (52) of the mirror element varying between the individual wavelengths, taking an optical measurement on the optics (16; 14, 16) for each of the wavelengths, and evaluating the measurement results for the different wavelengths taking into consideration a respective penetration depth of the radiation into the coating (52) of the mirror element for each of the different wavelengths.

Abstract: A method and an apparatus serve for visualizing a signature mark on a spectacle lens. in order to identify the signature mark, an illumination light beam is directed onto the spectacle lens, which impinges on the spectacle lens, after impinging on the spectacle lens is reflected at a retroreflector, impinges once again on the spectacle lens, and finally is passed as an observation light beam to a camera. A reflection region of the illumination light beam on the reflector is varied by means of a moved first optical element.

Abstract: An inspecting system for inspecting a lens module includes an inspection device; and a transmitting and loading device. The transmitting and loading device includes a grasping assembly, a supporting assembly, a sliding assembly loaded on the supporting assembly, and a control unit for controlling the grasping assembly and the sliding assembly. The grasping assembly is configured to clamp the lens module and to load the lens module on the sliding assembly, and the sliding assembly is adapted to transfer the lens module to a testing position of the inspection device.

Abstract: An optical component focus testing apparatus includes a plurality of test pattern displays. One or more illuminators are configured to selectively illuminate different test pattern displays at different times. Light directors are provided to direct light from at least one of the illuminated test pattern displays towards an optical component under test. The light directors and test pattern displays are arranged such that, in use, light directed from different illuminated test pattern displays travel different distances to reach the optical component under test.

Abstract: A method of measuring focus of a lithographic projection apparatus includes exposure of a photoresist covered test substrate with a plurality of verification fields. Each of the verification fields includes a plurality of verification markers, and the verification fields are exposed using a predetermined focus offset. After developing, an alignment offset for each of the verification markers is measured and translated into defocus data using a transposed focal curve.

Abstract: A method and apparatus provide identification of a spherical error of a microscope imaging beam path in a context of microscopic imaging of a sample using a microscope having an objective. A coverslip that carries or covers the sample is arranged in the imaging beam path. A measurement beam is guided through the objective onto the sample in a decentered fashion that is outside an optical axis of the objective. The measurement beam is reflected at an interface of the coverslip with the sample and the reflected measurement beam is guided through the objective onto a detector. An intensity profile of the reflected measurement beam is detected with the detector and a presence of a spherical error from the intensity profile is determined qualitatively and/or quantitatively.

Abstract: Various embodiments provide an optical alignment apparatus that includes a mirror structure having a plurality of mirrors, the mirror structure being configured for mounting a lens. The plurality of mirrors are arranged so as to redirect a collimated beam of radiation into the lens at different angles so as to measure one or more alignment parameter of the lens.

Abstract: A substrate processing apparatus having a polishing unit for polishing a periphery of a substrate. The substrate processing apparatus includes: a polishing unit configured to polish a periphery of a substrate; an imaging module configured to take an image of the periphery of the substrate polished by the polishing unit; and an image processing section configured to inspect a polished state of the substrate based on the image taken by the imaging module. The imaging module is configured to take the image of the periphery of the substrate when the polishing unit is not polishing the periphery of the substrate.

Abstract: In a precision testing method of an optical lens using a computing device, the computing device is connected to an imaging system. The computing device controls the imaging system to generate an image of an object according to light rays reflected from the object and collected by the optical lens. A dimension of the object is measured from the image. A maximum value and a minimum value of the dimension of the object are determined. A difference between the maximum value and the minimum value is calculated. According to the difference, it is determined whether the optical lens agrees with a precision requirement.