Surface Condition Patents (Class 356/237.2)
  • Patent number: 11497400
    Abstract: The present invention relates to a hybrid imaging system for photodiagnosis and phototherapy and, more particularly, to a hybrid imaging system for photodiagnosis and phototherapy, which simultaneously acquires a visible ray image or a near-infrared ray image and a lonq wave infrared ray image by using an optical method. The hybrid imaging system for photodiagnosis and phototherapy according to the present invention includes a light distribution unit, a visible ray/near-infrared ray measurement unit, a long wave infrared ray measurement unit, and a light source unit, thereby simultaneously and quickly extracting a visible ray image, a near-infrared ray image, and a long wave infrared ray image without mutual distortion.
    Type: Grant
    Filed: November 30, 2018
    Date of Patent: November 15, 2022
    Inventors: Jaesung Ahn, Hyeong Ju Park, Anjin Park, Joo Beom Eom, Jonghyun Eom, Hong Lyel Jung
  • Patent number: 11499983
    Abstract: [Task] To provide an automatic analysis apparatus including a photomultiplier tube which controls a sensitivity of the photomultiplier tube without adjusting a high voltage value. [Solution] An automatic analysis apparatus according to the present invention includes a photomultiplier tube which detects light from a reaction vessel; a determination unit which determines an output signal of the photomultiplier tube in a case where the photomultiplier tube is irradiated with first light; and a control unit which irradiates the photomultiplier tube with second light to lower a sensitivity of the photomultiplier tube in accordance with a determination result by the determination unit.
    Type: Grant
    Filed: November 19, 2018
    Date of Patent: November 15, 2022
    Assignee: Hitachi High-Tech Corporation
    Inventors: Shunichirou Nobuki, Koshin Hamasaki, Taku Sakazume, Yoshihiro Yamashita, Hidetsugu Tanoue, Tatsuki Takakura
  • Patent number: 11493442
    Abstract: Various embodiments of the present invention relate to an apparatus and method for measuring the surface of an electronic device, the apparatus comprising: a seating portion on which the electronic device is seated; a first light source for irradiating first light on the surface of the electronic device; a first camera for photographing the surface using the first light; a second light source for irradiating second light on the surface of the electronic device; a second camera for photographing the surface using the second light; and an analyzer electronically connected to the first light source, the first camera, the second light source, and the second camera, wherein the analyzer is setup to analyze the color of the surface acquired using the first light source and the first camera; and the gloss of the surface acquired using the second light source and the second camera, so as to analyze the color and gloss of the surface of the electronic device using quantified and digitized data, thereby enabling qualit
    Type: Grant
    Filed: May 29, 2019
    Date of Patent: November 8, 2022
    Assignees: SAMSUNG ELECTRONICS CO., LTD., 3D INDUSTRIAL IMAGING CO., LTD.
    Inventors: Jaeseon Kim, Kyunyeon Kim, Hyungbum Kim, Jongsu Lee, Youngjin Yi, Donghyeon Hwang
  • Patent number: 11449711
    Abstract: There is provided a method of defect detection on a specimen and a system thereof. The method includes: obtaining a runtime image representative of at least a portion of the specimen; processing the runtime image using a supervised model to obtain a first output indicative of the estimated presence of first defects on the runtime image; processing the runtime image using an unsupervised model component to obtain a second output indicative of the estimated presence of second defects on the runtime image; and combining the first output and the second output using one or more optimized parameters to obtain a defect detection result of the specimen.
    Type: Grant
    Filed: January 2, 2020
    Date of Patent: September 20, 2022
    Assignee: Applied Materials Isreal Ltd.
    Inventors: Ran Badanes, Ran Schleyen, Boaz Cohen, Irad Peleg, Denis Suhanov, Ore Shtalrid
  • Patent number: 11385280
    Abstract: An apparatus for inspecting an electronic device, includes: a placement table on which a substrate having the electronic device provided thereon is placed and including a refrigerant flow path; a light irradiation mechanism having LEDs directed to the substrate; and a controller for controlling heat absorption by the refrigerant and heating by light from the LEDs. The controller includes: a temperature information acquisition part for acquiring information on a temperature of the electronic device; a heating controller for performing the heating control based on the temperature of the electronic device as a current inspection object; and a heat absorption controller for estimating a transition of power applied to the electronic device at a next inspection based on a transition of the temperature of the electronic device in a past inspection, and performing the heat absorption control at a time of the next inspection.
    Type: Grant
    Filed: May 9, 2019
    Date of Patent: July 12, 2022
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Shigeru Kasai, Yoshinori Fujisawa
  • Patent number: 11386539
    Abstract: A system and method for specimen examination, the system comprising a processing and memory circuitry (PMC) for: obtaining an image of at least a part of a specimen, the image acquired by an examination tool; receiving one or more characteristics of a defect of interest and a location of interest associated therewith; modifying within the image one or more pixels corresponding to the location of interest, wherein the modification is provided in accordance with a characteristic of the defect of interest, thereby planting the defect of interest into the image; processing the modified image to detect locations of potential defects of the specimen in accordance with a detection recipe; and determining whether the detected locations include the location of interest. Subject to the location of interest not being detected, modifying the detection recipe to enable detecting the planted defect of interest at the location of interest.
    Type: Grant
    Filed: May 29, 2019
    Date of Patent: July 12, 2022
    Assignee: Applied Materials Israel Ltd.
    Inventors: Elad Cohen, Yuri Feigin, Lior Katz, Eyal Neistein
  • Patent number: 11379968
    Abstract: An inspection system includes an acquisition unit and a determination unit. The acquisition unit acquires an image representing a surface of an object. The determination unit performs color determination processing. The color determination processing is performed to determine a color of the surface of the object based on a plurality of conditions of reflection. The plurality of conditions of reflection are obtained from the image representing the surface of the object as acquired by the acquisition unit, and have a specular reflection component and a diffuse reflection component at respectively different ratios on the surface of the object.
    Type: Grant
    Filed: December 7, 2018
    Date of Patent: July 5, 2022
    Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
    Inventors: Takanobu Ojima, Jeffry Fernando, Hideto Motomura
  • Patent number: 11380560
    Abstract: The inventive concept relates to an apparatus and method for forming a film on a substrate by spin coating. The apparatus includes liquid dispensing units that dispense processing liquids to form liquid films on the first and second substrates, respectively, air-flow supply units that form downward air flows in the first and second spaces, respectively, and a controller that controls the liquid dispensing units and the air-flow supply units. Each of the liquid dispensing units includes a pre-treatment nozzle that dispenses a pre-treatment liquid and a coating solution nozzle that dispenses a coating solution onto a corresponding one of the first and second substrates. The controller controls the liquid dispensing units to dispense the pre-treatment liquids and thereafter the coating solutions onto the first and second substrates and adjusts supply states of the downward air flows according to amounts of the pre-treatment liquids dispensed.
    Type: Grant
    Filed: April 29, 2019
    Date of Patent: July 5, 2022
    Assignee: SEMES CO., LTD.
    Inventors: Ki Seung Lee, Choongki Min, Soo Hyun Cho, Okseong Lee
  • Patent number: 11366069
    Abstract: Disclosed is apparatus for inspecting a sample. The apparatus includes illumination optics for simultaneously directing a plurality of incident beams at a plurality of azimuth angles towards a sample and collection optics for directing a plurality of field portions of output light from two or more of the plurality of angles towards two or more corresponding sensors. The two or more sensors are arranged for receiving the field portions corresponding to two or more angles and generating two or more corresponding images. The apparatus further comprises a processor for analyzing the two or more images to detect defects on the sample.
    Type: Grant
    Filed: July 2, 2020
    Date of Patent: June 21, 2022
    Assignee: KLA-TENCOR CORPORATION
    Inventors: Guoheng Zhao, Sheng Liu, Ben-Ming Benjamin Tsai
  • Patent number: 11353798
    Abstract: The present invention has a computation device for measuring the dimensions of patterns formed on a sample on the basis of a signal obtained from a charged particle beam device. The computation device has a positional deviation amount calculation unit for calculating the amount of positional deviation in a direction parallel to a wafer surface between two patterns having different heights on the basis of an image acquired at a given beam tilt angle; a pattern inclination amount calculation unit for calculating an amount of pattern inclination from the amount of positional deviation using a predetermined relational expression for the amount of positional deviation and the amount of pattern inclination; and a beam tilt control amount calculation unit for controlling the beam tilt angle so as to match the amount of pattern inclination. The pattern measurement device sets the beam tilt angle to a calculated beam tilt angle, reacquires an image and measures the patterns.
    Type: Grant
    Filed: October 13, 2017
    Date of Patent: June 7, 2022
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Takuma Yamamoto, Hiroya Ohta, Kenji Tanimoto, Yusuke Abe, Tomohiro Tamori, Masaaki Nojiri
  • Patent number: 11320406
    Abstract: A non-destructive testing calibration system includes a first multi-axis robotic device having a first end effector, a second multi-axis robotic device having a second end effector. A calibration assembly includes an emitter arranged on the first end effector and a receiver arranged on the second end effector, where the emitter and the receiver exchange a calibration signal between the first robotic device and the second robotic device. A data processor and a memory storing instructions, which when executed causes the data processor to perform operations comprising: performing a calibration scan, where the calibration scan includes a plurality of measurement points along a scan path of the emitter and the receiver; measuring the deviation between the emitter and the receiver at each measurement point along the scan path; and determining a corrected scan path based on the deviation between the emitter and receiver at each measurement point during the calibration scan.
    Type: Grant
    Filed: March 31, 2020
    Date of Patent: May 3, 2022
    Assignee: BAKER HUGHES OILFIELD OPERATIONS LLC
    Inventor: Andreas Franzen
  • Patent number: 11302555
    Abstract: A substrate processing apparatus includes a substrate transfer device that transfers a substrate accommodated in a substrate transfer container to a substrate holder; a substrate holder transfer stage that introduces the substrate holder into a reaction container; a substrate transfer controller that obtains a film thickness measurement result of the substrate, and determines a placing position of the substrate in the substrate holder by a model created in advance from the film thickness measurement result and a transfer position setting circuit; an information processing circuit that analyzes an eccentricity state from a film thickness variation state when a film thickness measurement result is newly obtained; a learning function circuit that updates the model from the eccentricity state; and an optimization function circuit that updates the placing position of the substrate by an updated model and the transfer position setting circuit.
    Type: Grant
    Filed: July 13, 2020
    Date of Patent: April 12, 2022
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Youngtai Kang, Yuichi Takenaga
  • Patent number: 11287366
    Abstract: A scanning microwave ellipsometer includes: a microwave ellipsometry test head including: a polarization controller; a transmission line; and a sensor that produces sensor microwave radiation, subjects a sample to the sensor microwave radiation, receives a sample reflected microwave radiation from the sample that results from subjecting the sample with the sample reflected microwave radiation, and produces a sensor-received microwave radiation from the sample reflected microwave radiation, wherein a polarization of the sensor microwave radiation is controlled by the polarization controller; an electrical signal measurement system that produces an electrical readout signal such that a magnitude of reflection coefficient ? and an angle of reflection coefficient ? of the sample reflected microwave radiation is determined from the electrical readout signal; and a position controller that adjusts a relative position of the sensor and the sample.
    Type: Grant
    Filed: May 1, 2020
    Date of Patent: March 29, 2022
    Assignee: GOVERNMENT OF THE UNITED STATES OF AMERICA, AS REPRESENTED BY THE SECRETARY OF COMMERCE
    Inventors: Christian John Long, Nathan Daniel Orloff, Nina Popovic Basta, Edward Joseph Garboczi
  • Patent number: 11287745
    Abstract: A reticle-masking structure is provided. The reticle-masking structure includes a magnetic substrate and a paramagnetic part disposed on the magnetic substrate. The paramagnetic part includes a plurality of fractions disposed on a plurality of protrusion structures. In some embodiments, the protrusion structures are irregularly arranged. A method for forming a reticle-masking structure and an extreme ultraviolet apparatus are also provided.
    Type: Grant
    Filed: December 14, 2020
    Date of Patent: March 29, 2022
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Ching-Hsiang Hsu, James Jeng-Jyi Hwang, Feng Yuan Hsu
  • Patent number: 11270430
    Abstract: Systems and methods increase the signal to noise ratio of optical inspection of wafers to obtain higher inspection sensitivity. The computed reference image can minimize a norm of the difference of the test image and the computed reference image. A difference image between the test image and a computed reference image is determined. The computed reference image includes a linear combination of a second set of images.
    Type: Grant
    Filed: May 4, 2018
    Date of Patent: March 8, 2022
    Assignee: KLA-TENCOR CORPORATION
    Inventors: Abdurrahman Sezginer, Xiaochun Li, Pavan Kumar, Junqing Huang, Lisheng Gao, Grace H. Chen, Yalin Xiong, Hawren Fang
  • Patent number: 11262661
    Abstract: A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.
    Type: Grant
    Filed: June 5, 2019
    Date of Patent: March 1, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Nitesh Pandey, Arie Jeffrey Den Boef, Duygu Akbulut, Marinus Johannes Maria Van Dam, Hans Butler, Hugo Augustinus Joseph Cramer, Engelbertus Antonius Fransiscus Van Der Pasch, Ferry Zijp, Jeroen Arnoldus Leonardus Johannes Raaymakers, Marinus Petrus Reijnders
  • Patent number: 11243160
    Abstract: Systems and methods for producing a calibration standard for an optical analysis system (e.g., a diagnostic reader) from a live test sample are disclosed. The calibration standard may include an image reproduced on a substrate. The reproduced image may be a replication of a digital image of a live test sample captured using the optical analysis system and then digitally processed to be reproduced on the substrate. The image reproduced on the substrate may include at least one optical feature digitally added to the replication of the digital image of the live test sample. The added optical features may be used to allow for more robust calibration using the calibration standard.
    Type: Grant
    Filed: March 18, 2019
    Date of Patent: February 8, 2022
    Assignee: DETEKT BIOMEDICAL, LLC
    Inventors: Damon Vincent Borich, Michelle Silveyra, Alejandro Silveyra, Andrea Grbavac, Zwckxally Obregon
  • Patent number: 11237115
    Abstract: An appearance inspection device includes: a transparent conveyance body having a surface and a rear face and conveyed in a predetermined direction; an illumination device that irradiates with predetermined light an inspection area through which a plurality of objects pass, wherein the objects are arranged at predetermined intervals on a first face that is one of the surface and the rear face; a plurality of imaging devices each of which takes, along a predetermined direction, an image of part of side faces of the objects located in the inspection area, wherein the predetermined direction is inclined to both the surface and the rear face; and a processor that inspects an appearance of the side faces of the objects based on image data obtained by the imaging device.
    Type: Grant
    Filed: February 17, 2020
    Date of Patent: February 1, 2022
    Assignee: CKD CORPORATION
    Inventor: Tadashi Inoguchi
  • Patent number: 11237209
    Abstract: Apparatus for testing microelectronic components on a substrate, including a scanner operative to scan a light beam over a plurality of thin film transistors disposed on a substrate, one transistor at a time, so as to induce a photoconductive response in the plurality of transistors, one transistor at a time; current sensing circuitry operative, synchronously with said scanner, to measure an output induced by the photoconductive response associated with a transistor and to generate photoconductive response output values, the photoconductive response output values representing a photoconductive response induced by the light beam, for one transistor at a time from among the plurality of transistors; and diagnostic apparatus operative to analyze the electronic response output values and to characterize each of the transistors in accordance therewith.
    Type: Grant
    Filed: September 27, 2018
    Date of Patent: February 1, 2022
    Assignee: SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD.
    Inventor: Yalan Zheng
  • Patent number: 11231573
    Abstract: Position detection apparatus includes illumination optical system for illuminating target, detection optical system for forming image of the illuminated target illuminated on photoelectric converter, first array having first aperture stops, second array having second aperture stops, first driving mechanism for arranging the selected first aperture stop on pupil of the illumination optical system by driving the first array such that first aperture stop crossing optical axis of the illumination optical system moves in first direction, second driving mechanism for arranging the selected second aperture stop on pupil of the detection optical system by driving the second array such that second aperture stop crossing optical axis of the detection optical system moves in second direction. The first and second driving mechanisms fine-tune positions of the selected first and second aperture stops in the first and second directions, respectively.
    Type: Grant
    Filed: March 23, 2020
    Date of Patent: January 25, 2022
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Hironobu Fujishima, Hironori Maeda
  • Patent number: 11215567
    Abstract: Apparatus (1) for checking tyres, comprising: a support frame (2); a flange (3); and an acquisition system (4) of three-dimensional images of a surface of a tyre, the acquisition system being mounted on the support frame and comprising: a matrix camera (5), a linear laser source (7), and a reflecting surface (12) which intersects the propagation axis (9) of the linear laser beam and the optical axis (6) of the matrix camera (5), wherein a first angle (50) formed between a first section (14) and a second section (31) of the optical axis (6) mutually symmetrical with respect to a normal to the reflecting surface in the respective point of incidence to the reflecting surface, is obtuse, and wherein a second angle (51) formed between a first section (16) and a second section (32) of the propagation axis (9) mutually symmetrical with respect to a normal to the reflecting surface in the respective point of incidence to the reflecting surface, is obtuse.
    Type: Grant
    Filed: October 13, 2020
    Date of Patent: January 4, 2022
    Assignee: PIRELLI TYRE S.p.A.
    Inventors: Vincenzo Boffa, Alessandro Held, Fabio Regoli, Valeriano Ballardini, Giuseppe Casadio Tozzi
  • Patent number: 11198339
    Abstract: An apparatus for detecting and checking defects on a tire at the end of a production process, the apparatus comprising a workstation comprising a workbench comprising a rotating table for supporting a tire; a profilometer; a high-resolution color linear camera for scanning outer surfaces of tire tread and tire shoulders; mechanical supports for the profilometer and color linear camera; a data processor for storing and processing data detected by the profilometer and the color linear camera means, for providing a three-dimensional model of a tire, and for management of a database including parameters referring to surface characteristics of defect-free tires; an interface for facilitating interaction between an operator and the apparatus; wherein the profilometer and the color linear camera are configured to operate simultaneously and perform a full scan of all the profiles of inner and outer surfaces of a tire while the tire is in rotation at a controlled speed on the rotating table; and wherein the data proce
    Type: Grant
    Filed: February 14, 2018
    Date of Patent: December 14, 2021
    Inventors: Michele De Stasio, Salvatore Romano, Angelo Pagliuso
  • Patent number: 11200658
    Abstract: Methods and systems for combining information present in measured images of semiconductor wafers with additional measurements of particular structures within the measured images are presented herein. In one aspect, an image-based signal response metrology (SRM) model is trained based on measured images and corresponding reference measurements of particular structures within each image. The trained, image-based SRM model is then used to calculate values of one or more parameters of interest directly from measured image data collected from other wafers. In another aspect, a measurement signal synthesis model is trained based on measured images and corresponding measurement signals generated by measurements of particular structures within each image by a non-imaging measurement technique.
    Type: Grant
    Filed: June 27, 2019
    Date of Patent: December 14, 2021
    Assignee: KLA-Tencor Corporation
    Inventor: Stilian Ivanov Pandev
  • Patent number: 11189372
    Abstract: A system for verifying medication doses in a filled medication package comprises a camera(s), a contour light source(s), a set of relief light sources. A verification unit may be used for imaging a contour of the medication items, imaging a surface relief of the medication items, processing the images, confirming the content of the medication package relative to identification of a type of medication item and/or medication package using the processing of the images. An interface produces a verification output based on the confirmation by the verification unit.
    Type: Grant
    Filed: September 19, 2019
    Date of Patent: November 30, 2021
    Assignee: RX-V INC.
    Inventors: Frederic Poirier, Johnny Pietraroia, Kim Bourbonnais
  • Patent number: 11156819
    Abstract: A method for scanning along a substantially straight line (3D line) lying at an arbitrary direction in a 3D space with a given speed uses a 3D laser scanning microscope having a first pair of acousto-optic deflectors deflecting a laser beam in the x-z plane (x axis deflectors) and a second pair of acousto-optic deflectors deflecting the laser beam in the y-z plane (y axis deflectors) for focusing the laser beam in 3D. Further, a method for scanning a region of interest uses a 3D laser scanning microscope having acousto-optic deflectors for focusing a laser beam within a 3D space defined by an optical axis (Z) of the microscope and X, Y axes that are perpendicular to the optical axis and to each other.
    Type: Grant
    Filed: March 1, 2019
    Date of Patent: October 26, 2021
    Inventors: Balazs Rozsa, Gergely Katona, Pal Maak, Mate Veress, Andras Feher, Gergely Szalay, Peter Matyas
  • Patent number: 11151708
    Abstract: The present invention relates to a print quality inspection apparatus comprising: an illuminator (35 or 35A-35C) for irradiating light onto a printout (1) provided with a motion thread (1b); a camera (34 or 34A) for capturing an image of the printout; and a print quality inspection unit (10) for inspecting the print quality of the printout (1) on the basis of image data captured by the camera (34 or 34A). The camera (34) captures images of printouts (1) for each RGB color, and the print quality inspection unit (10) performs a print quality inspection having a scope that includes the motion thread (1b) on the basis of image data of a color of the same hue as the color of the motion thread (1b), or the illuminator (35A-35C) emits a color of the same hue as the color of the motion thread (1b), and the monochrome camera (34A) captures a monochrome image.
    Type: Grant
    Filed: September 21, 2017
    Date of Patent: October 19, 2021
    Assignee: KOMORI CORPORATION
    Inventor: Kentaro Ohama
  • Patent number: 11145045
    Abstract: An image processing method is performed by a computer, for determining that a line is a crack or something other than the crack. The method includes: extracting a linear region from an image of an object captured by an imaging apparatus; determining a luminosity change in a direction traversing the linear region at each of a plurality of positions separate in a longitudinal direction of the linear region; and identifying a type of the linear region based on the luminosity changes at the plurality of positions.
    Type: Grant
    Filed: May 20, 2019
    Date of Patent: October 12, 2021
    Assignee: FUJITSU LIMITED
    Inventors: Yusuke Nakanishi, Hideyuki Kikuchi, Koichi Oikawa
  • Patent number: 11120539
    Abstract: A method for scanning and analyzing a surface, the method comprising: receiving a piece of equipment with a target surface for inspection; receiving an input from a user; determining at least one scan parameter based on the user input; scanning the target surface using an optical detector in accordance with the at least one scan parameter; generating an image of the target surface; correcting the image of the target surface to remove at least one undesired feature to generate a corrected image based on the at least one scan parameter; and analyzing the corrected image to determine at least one geometric parameter of the target surface.
    Type: Grant
    Filed: November 29, 2018
    Date of Patent: September 14, 2021
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Sheng-Hsiang Chuang, Jiao-Rou Liao, Cheng-Kang Hu, Shou-Wen Kuo, Jiun-Rong Pai, Hsu-Shui Liu
  • Patent number: 11112304
    Abstract: Calibrating a spectrometer module includes performing measurements using the spectrometer module to generate wavelength-versus-operating parameter calibration data for the spectrometer module, performing measurements using the spectrometer module to generate optical crosstalk and dark noise calibration data for the spectrometer module, and performing measurements using the spectrometer module to generate full system response calibration data, against a known reflectivity standard, for the spectrometer module. The method further includes storing in memory, coupled to the spectrometer module, a calibration record that incorporates the wavelength-versus-operating parameter calibration data, the optical crosstalk and dark noise calibration data, and the full system response calibration data, and applying the calibration record to measurements by the spectrometer module.
    Type: Grant
    Filed: May 3, 2018
    Date of Patent: September 7, 2021
    Assignee: Heptagon Micro Optics Pte. Ltd.
    Inventors: Kotaro Ishizaki, Javier Miguel-Sánchez, Peter Roentgen
  • Patent number: 11094051
    Abstract: The present invention relates to a print quality inspection apparatus comprising: an illuminator (35 or 35A-35C) for irradiating light onto a printout (1) provided with a motion thread (1b); a camera (34 or 34A) for capturing an image of the printout; and a print quality inspection unit (10) for inspecting the print quality of the printout (1) on the basis of image data captured by the camera (34 or 34A). The camera (34) captures images of printouts (1) for each RGB color, and the print quality inspection unit (10) performs a print quality inspection having a scope that includes the motion thread (1b) on the basis of image data of a color of the same hue as the color of the motion thread (1b), or the illuminator (35A-35C) emits a color of the same hue as the color of the motion thread (1b), and the monochrome camera (34A) captures a monochrome image.
    Type: Grant
    Filed: June 3, 2020
    Date of Patent: August 17, 2021
    Assignee: KOMORI CORPORATION
    Inventor: Kentaro Ohama
  • Patent number: 11060846
    Abstract: Methods and systems for measuring optical properties of transistor channel structures and linking the optical properties to the state of strain are presented herein. Optical scatterometry measurements of strain are performed on metrology targets that closely mimic partially manufactured, real device structures. In one aspect, optical scatterometry is employed to measure uniaxial strain in a semiconductor channel based on differences in measured spectra along and across the semiconductor channel. In a further aspect, the effect of strain on measured spectra is decorrelated from other contributors, such as the geometry and material properties of structures captured in the measurement. In another aspect, measurements are performed on a metrology target pair including a strained metrology target and a corresponding unstrained metrology target to resolve the geometry of the metrology target under measurement and to provide a reference for the estimation of the absolute value of strain.
    Type: Grant
    Filed: October 22, 2019
    Date of Patent: July 13, 2021
    Assignee: KLA Corporation
    Inventors: Houssam Chouaib, Aaron Rosenberg, Kai-Hsiang Lin, Dawei Hu, Zhengquan Tan
  • Patent number: 11051001
    Abstract: Methods, systems, and techniques for generating two-dimensional (2D) and three-dimensional (3D) images and image streams. The images and image streams may be generated using active stereo cameras projecting at least one illumination pattern, or by using a structured light camera and a pair of different illumination patterns of which at least one is a structured light illumination pattern. When using an active stereo camera, a 3D image may be generated by performing a stereoscopic combination of a first set of images (depicting a first illumination pattern) and a 2D image may be generated using a second set of images (optionally depicting a second illumination pattern). When using a structured light camera, a 3D image may be generated based on a first image that depicts a structured light illumination pattern, and a 2D image may be generated from the first image and a second image that depicts a different illumination pattern.
    Type: Grant
    Filed: May 29, 2019
    Date of Patent: June 29, 2021
    Assignee: AVIGILON CORPORATION
    Inventors: Barry Gravante, Pietro Russo, Mahesh Saptharishi
  • Patent number: 11047807
    Abstract: There may be provided a method for determining three dimensional (3D) defect information, the method may include performing a two-dimensional (2D) inspection of an area of a wafer to generate 2D defect information related to defects of the area of the wafer; estimating 3D defect information regarding the defects of the area of the wafer, wherein the estimating is based on the 2D defect information related to defects of the area of the wafer, and a mapping between 2D defect information and 3D defect information, wherein the mapping is generated using a supervised deep learning machine process.
    Type: Grant
    Filed: March 25, 2020
    Date of Patent: June 29, 2021
    Assignee: CAMTEK LTD.
    Inventor: Daniel Buzaglo
  • Patent number: 11044412
    Abstract: Systems and methods for observing a substrate, and laser operations thereon, are described. Dark field illumination is directed through a camera port of a laser beam delivery system and through laser beam delivery system optics of the laser beam delivery system onto the substrate. Simultaneously, a high dynamic range (HDR) camera system to observe light reflected from the substrate and transmitted through the laser beam delivery system optics of the laser beam delivery system to the camera port of the laser beam delivery system. The wavelengths of a pilot laser of the laser beam delivery system reaching the lensing system of the HDR camera system may be attenuated in intensity and may be confined to a peripheral, off-axis optical path.
    Type: Grant
    Filed: May 12, 2020
    Date of Patent: June 22, 2021
    Assignee: XIRIS AUTOMATION INC.
    Inventors: Cameron Serles, Vladimir Chpakovski
  • Patent number: 11036147
    Abstract: A system for estimating front side overlay on a sample based on shape data is disclosed. The system includes a characterization sub-system and a controller. The controller includes one or more processors configured to: generate a vacuum hole map of a vacuum chuck; generate a vacuum force distribution across a sample based on the generated vacuum hole map of the vacuum chuck; determine shape data of the sample based on the vacuum force distribution and an identified relationship between backside surface roughness and vacuum force of the vacuum chuck; and convert the shape data of the sample to an overlay value of a frontside surface of the sample.
    Type: Grant
    Filed: March 6, 2020
    Date of Patent: June 15, 2021
    Assignee: KLA Corporation
    Inventors: Jian Shen, Ningqi Zhu, John McCormack, Yanfei Sun
  • Patent number: 11025891
    Abstract: Methods, systems, and techniques for generating two-dimensional (2D) and three-dimensional (3D) images and image streams. The images and image streams may be generated using active stereo cameras projecting at least one illumination pattern, or by using a structured light camera and a pair of different illumination patterns of which at least one is a structured light illumination pattern. When using an active stereo camera, a 3D image may be generated by performing a stereoscopic combination of a first set of images (depicting a first illumination pattern) and a 2D image may be generated using a second set of images (optionally depicting a second illumination pattern). When using a structured light camera, a 3D image may be generated based on a first image that depicts a structured light illumination pattern, and a 2D image may be generated from the first image and a second image that depicts a different illumination pattern.
    Type: Grant
    Filed: June 7, 2019
    Date of Patent: June 1, 2021
    Assignee: AVIGILON CORPORATION
    Inventors: Barry Gravante, Pietro Russo, Mahesh Saptharishi
  • Patent number: 11018063
    Abstract: A measurement apparatus for measuring dimensions within a semiconductor device includes an illumination source configured to direct light onto a stage configured to hold the semiconductor device, and a detection assembly configured to receive light diffracted by the semiconductor device, in which the detection assembly includes a detector configured to receive light diffracted by the semiconductor device and determine a measurement of a periodic structure within the semiconductor device based on the received diffracted light, and a diffraction pattern filter configured to permit light diffracted by the periodic structure to be measured to reach the detector and block at least a portion of light diffracted by other structures in the semiconductor device from reaching the detector. Embodiments include methods of measuring a semiconductor device using the measurement apparatus and methods of making the diffraction pattern filter.
    Type: Grant
    Filed: November 26, 2018
    Date of Patent: May 25, 2021
    Assignee: SANDISK TECHNOLOGIES LLC
    Inventor: Koetsu Sawai
  • Patent number: 11004712
    Abstract: Disclosed are methods of inspecting semiconductor wafers, inspection systems for performing the same, and methods of fabricating semiconductor devices using the same. A method of inspecting a semiconductor wafer including preparing a wafer including zones each having patterns, obtaining representative values for the patterns, scanning the patterns under an optical condition to obtain optical signals for the patterns, each of the optical signals including optical parameters, selecting a representative optical parameter that is one of the optical parameters that has a correlation with the representative values, obtaining a reference value of the representative optical parameter for a reference pattern, and obtaining a defect of an inspection pattern by comparing the reference value with an inspection value of the representative optical parameter for the inspection pattern.
    Type: Grant
    Filed: August 6, 2019
    Date of Patent: May 11, 2021
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sung Yoon Ryu, Joonseo Song, Souk Kim, Younghoon Sohn, Yusin Yang, Chihoon Lee
  • Patent number: 10987977
    Abstract: A tire wear tracking system including network interface hardware configured to communicatively couple a vehicle with a remote server, a processor, and a memory module that stores one or more processor-readable instructions. When executed by the processor, the one or more processor-readable instructions cause the tire wear tracking system to receive image data of one or more tires of a vehicle from one or more image sensors, determine tire information associated with the one or more tires, retrieve reference image data based on the determined tire information, compare the received image data with the retrieved reference image data; and generate an alert based on the comparison between the received image data and the retrieved reference image data.
    Type: Grant
    Filed: October 26, 2018
    Date of Patent: April 27, 2021
    Assignee: TOYOTA MOTOR NORTH AMERICA, INC.
    Inventor: Nishikant N. Puranik
  • Patent number: 10989679
    Abstract: A time-resolved photoemission electron microscopy including: a laser light source that outputs a pulse having less than or equal to a femtosecond level pulse width and variable repetition frequency; a pump light pulse generator configured to generate pump light pulse that excites photo-carriers of a sample by converting wavelength of light output from the laser light source; and a probe light pulse generator configured to generate probe light pulse that photo-emits photo-carriers excited by the pump light pulse from the sample by photoelectric effect by converting wavelength of light output from the laser light source. The energy of at least one of the pump light pulse and the probe light pulse is configured to continuously vary in a range not less than 0.1 eV and not more than 8 eV.
    Type: Grant
    Filed: February 9, 2018
    Date of Patent: April 27, 2021
    Assignees: TOKYO INSTITUTE OF TECHNOLOGY, INTER-UNIVERSITY RESEARCH INSTITUTE CORPORATION HIGH ENERGY ACCELERATOR RESEARCH ORGANIZATION
    Inventors: Shinya Koshihara, Keiki Fukumoto
  • Patent number: 10984516
    Abstract: Provided are an image inspection device and an illumination device capable of thinning and downsizing the illumination device. An image inspection device includes a photographing part photographing an object, a light transmissive illumination part, and an optical member. The illumination part is arranged between the object and the photographing part and has a light emitting surface arranged to face the object. The optical member is arranged on the light emitting surface of the illumination part and transmits light emitted by the illumination part toward the object. The optical member includes a plurality of optical regions. The optical regions are arranged so as to surround a central region of the light emitting surface centered on an optical axis of the photographing part, and are configured to emit light having mutually different color characteristics toward the object.
    Type: Grant
    Filed: October 17, 2018
    Date of Patent: April 20, 2021
    Assignee: OMRON Corporation
    Inventor: Yutaka Kato
  • Patent number: 10957035
    Abstract: A semiconductor die is inspected using an optical microscope to generate a test image of the semiconductor die. A difference image between the test image of the semiconductor die and a reference image is derived. For each defect of a plurality of defects for the semiconductor die, a point-spread function is fit to the defect as indicated in the difference image and one or more dimensions of the fitted point-spread function are determined. Potential defects of interest in the plurality of defects are distinguished from nuisance defects, based at least in part on the one or more dimensions of the fitted point-spread function for respective defects of the plurality of defects.
    Type: Grant
    Filed: March 15, 2019
    Date of Patent: March 23, 2021
    Assignee: KLA Corporation
    Inventors: Soren Konecky, Bjorn Brauer
  • Patent number: 10935501
    Abstract: An optical metrology device, such as an interferometer, detects sub-resolution defects on a sample, i.e., defects that are smaller than a pixel in the detector array of the interferometer. The optical metrology device obtains optical metrology data at each pixel in at least one detector array and determines parameter values of a signal model for a pixel of interest using the optical metrology data received by a plurality of pixels neighboring a pixel of interest. A residual for the pixel of interest is determined using the optical metrology data received by the pixel of interest and determined parameter values for the signal model for the pixel of interest. A defect, which may be smaller than the pixel of interest can then be detected based on the residual for the pixel of interest.
    Type: Grant
    Filed: November 21, 2018
    Date of Patent: March 2, 2021
    Assignee: Onto Innovation Inc.
    Inventor: Nigel P. Smith
  • Patent number: 10935893
    Abstract: Disclosed are apparatus and methods for determining process or structure parameters for semiconductor structures. A plurality of optical signals is acquired from one or more targets located in a plurality of fields on a semiconductor wafer. The fields are associated with different process parameters for fabricating the one or more targets, and the acquired optical signals contain information regarding a parameter of interest (POI) for a top structure and information regarding one or more underlayer parameters for one or more underlayers formed below such top structure. A feature extraction model is generated to extract a plurality of feature signals from such acquired optical signals so that the feature signals contain information for the POI and exclude information for the underlayer parameters. A POI value for each top structure of each field is determined based on the feature signals extracted by the feature extraction model.
    Type: Grant
    Filed: August 6, 2014
    Date of Patent: March 2, 2021
    Assignee: KLA-Tencor Corporation
    Inventors: Stilian Ivanov Pandev, Andrei V. Shchegrov
  • Patent number: 10909673
    Abstract: Systems and methods for detecting the cracks in illuminated electronic device screens are disclosed. In one embodiment, the method includes receiving an image of an electronic device screen and retrieving a plurality of kernels, each having values corresponding to a line region and a non-line region, with the orientation of the line region and the non-line region differing for each kernel. At least some of the kernels are applied to the image to obtain, at various locations of the image, values corresponding to the line regions and the non-line regions. Based on the values corresponding to the line regions and the non-line regions, cracks are automatically identified in the electronic device screen.
    Type: Grant
    Filed: March 18, 2019
    Date of Patent: February 2, 2021
    Assignee: ecoATM, LLC
    Inventors: Babak Forutanpour, Jeffrey Ploetner
  • Patent number: 10865139
    Abstract: A large-size synthetic quartz glass substrate has a diagonal length of at least 1,000 mm. Provided that an effective range is defined on the substrate surface, and the effective range is partitioned into a plurality of evaluation regions such that the evaluation regions partly overlap each other, a flatness in each evaluation region is up to 3 ?m. From the quartz glass substrate having a high flatness and a minimal local gradient within the substrate surface, a large-size photomask is prepared.
    Type: Grant
    Filed: May 7, 2018
    Date of Patent: December 15, 2020
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Yoko Ishitsuka, Atsushi Watabe, Daijitsu Harada, Masaki Takeuchi
  • Patent number: 10863661
    Abstract: A substrate working device including: an imaging device configured to image a substrate; a memory device configured to memorize various information; and an image processing device configured to perform, when specified work is performed with respect to multiple substrates, for a leading substrate, leading-substrate processing of performing imaging processing for detecting a specified detection target required for the specified work with respect to a leading image obtained by imaging the leading substrate using the imaging device, acquiring region information related to a region in the leading image in which the detection target was detected, and memorizing the region information in the memory device, and, for subsequent substrates except for the leading substrate, subsequent-substrate processing of setting a partial processing region in a subsequent image of the subsequent substrate captured by the imaging device based on the region information, and performing the image processing with respect to the set proce
    Type: Grant
    Filed: February 23, 2017
    Date of Patent: December 8, 2020
    Assignee: FUJI CORPORATION
    Inventors: Masafumi Amano, Yuki Inaura, Mikiya Suzuki, Shuichiro Kito
  • Patent number: 10845187
    Abstract: Remote measurements using images are particularly useful in structural health monitoring cases in which the installation of contact sensors is difficult. Some limitations, though, associated with photogrammetry-type optical metrology involve the application of speckle patterns, which become even more important with variable working distance or when the required resolution and sensitivity are not a priori known. In this context, multispectral sensing combined with tailored speckle patterns can circumvent some of the challenges of acquiring data at different working distances. The present invention uses multispectral imaging combined controlled generation of speckle patterns to demonstrate an approach for remote sensing related to deformation measurements at the structural level. To demonstrate this approach, two speckle patterns were designed for measurements at specified working distances.
    Type: Grant
    Filed: March 1, 2019
    Date of Patent: November 24, 2020
    Assignee: Drexel University
    Inventors: Antonios Kontsos, Fnu Melvin Domin Mathew, Andrew James Ellenberg, Ivan Bartoli
  • Patent number: 10839506
    Abstract: A convolutional neural network may be trained to inspect subjects such as carbon fiber propellers for surface flaws or other damage. The convolutional neural network may be trained using images of damaged and undamaged subjects. The damaged subjects may be damaged authentically during operation or artificially by manual or automated means. Additionally, images of undamaged subjects may be synthetically altered to depict damages, and such images may be used to train the convolutional neural network. Images of damaged and undamaged subjects may be captured for training or inspection purposes by an imaging system having cameras aligned substantially perpendicular to subjects and planar light sources aligned to project light upon the subjects in a manner that minimizes shadows and specular reflections. Once the classifier is trained, patches of an image of a subject may be provided to the classifier, which may predict whether such patches depict damage to the subject.
    Type: Grant
    Filed: July 8, 2019
    Date of Patent: November 17, 2020
    Assignee: Amazon Technologies, Inc.
    Inventors: Aniruddh Raghu, Joseph Rutland, Christian Leistner, Andres Perez Torres
  • Patent number: 10816923
    Abstract: A print head includes a memory, an input and output unit, and a plurality of light emitting elements. The memory is configured to store a first light quantity value obtained by measuring a light quantity of each of the plurality of light emitting elements when supplied with a first reference current value, and a light quantity difference value between the first light quantity value and a second light quantity value obtained by measuring a light quantity of each of the plurality of light emitting elements when supplied with a second reference current value. The input and output unit is configured to output the first light quantity value and the light quantity difference value and receive a correction value determined based on the first light quantity value and the light quantity difference value. The light emitting elements are configured to emit light based on a correction current value corresponding to the correction value.
    Type: Grant
    Filed: July 19, 2019
    Date of Patent: October 27, 2020
    Assignee: TOSHIBA TEC KABUSHIKI KAISHA
    Inventor: Shigeru Morino