Surface Condition Patents (Class 356/237.2)
  • Patent number: 10446096
    Abstract: Aspects of the subject technology relate to an image generation device that generates an image with good white balance while preventing burn-in of a liquid crystal element, and a head-up display. A light adjustment unit includes a liquid crystal element for adjusting a polarization angle of laser light, and adjusts the polarization angle of the laser light in order to adjust the intensity of laser light that is oriented in an emission direction. A light detection unit detects the light intensity of the laser light (reflected light) that has passed through the light adjustment unit. A control unit corrects outputs of a plurality of light sources based on the light intensity of the laser light (reflected light) detected by the light detection unit at a timing different from a timing at which a voltage applied to the liquid crystal element is reversed.
    Type: Grant
    Filed: July 4, 2016
    Date of Patent: October 15, 2019
    Assignee: NIPPON SEIKI CO., LTD.
    Inventors: Yasuhiro Yamakawa, Takashi Nakamura
  • Patent number: 10444161
    Abstract: A metrology system includes an image device and a controller. The image device includes a spectrally-tunable illumination device and a detector to generate images of a sample having metrology target elements on two or more sample layers based on radiation emanating from the sample in response to illumination from the spectrally-tunable illumination device. The controller determines layer-specific imaging configurations of the imaging device to image the metrology target elements on the two or more sample layers within a selected image quality tolerance in which each layer-specific imaging configuration includes an illumination spectrum from the spectrally-tunable illumination device. The controller further receives one or more images of the metrology target elements on the two or more sample layers generated using the layer-specific imaging configurations. The controller further provides a metrology measurement based on the one or more images of the metrology target elements on the two or more sample layers.
    Type: Grant
    Filed: May 30, 2017
    Date of Patent: October 15, 2019
    Assignee: KLA-Tencor Corporation
    Inventors: Amnon Manassen, Daria Negri, Andrew V. Hill, Ohad Bachar, Vladimir Levinski, Yuri Paskover
  • Patent number: 10444640
    Abstract: A metrology apparatus is disclosed that has an optical system to focus radiation onto a structure and directs redirected radiation from the structure to a detection system. The optical system applies a plurality of different offsets of an optical characteristic to radiation before and/or after redirected by the structure, such that a corresponding plurality of different offsets are provided to redirected radiation derived from a first point of a pupil plane field distribution relative to redirected radiation derived from a second point of the pupil plane field distribution. The detection system detects a corresponding plurality of radiation intensities resulting from interference between the redirected radiation derived from the first point of the pupil plane field distribution and the redirected radiation derived from the second point of the pupil plane field distribution. Each radiation intensity corresponds to a different one of the plurality of different offsets.
    Type: Grant
    Filed: October 12, 2018
    Date of Patent: October 15, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Janneke Ravensbergen, Duygu Akbulut, Nitesh Pandey, Jin Lian
  • Patent number: 10438771
    Abstract: Provided is a measurement device including: an irradiation optical system which emits a primary charged quantum beam to a sample for scanning; a detector which detects secondary charged particles generated from the sample; and a signal processing unit which processes an output signal from the secondary charged particle detector which has detected the secondary charged particles, in which the signal processing unit includes a measurement unit which measures widths of a first pattern group calibrated with a well-known first dimension and a second pattern group calibrated with a well-known second dimension, and an operation unit which defines a relationship between the well-known dimensions of the first and second pattern groups and length measurement values of the first and second pattern groups as a function.
    Type: Grant
    Filed: September 22, 2016
    Date of Patent: October 8, 2019
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Michio Hatano, Yoshinori Nakayama, Masaru Matsuzaki, Hiroki Kawada, Yoshinori Momonoi, Zhigang Wang
  • Patent number: 10430985
    Abstract: A display system comprises a wearable display device for displaying augmented reality content. The display device comprises a display area comprising light redirecting features that are configured to direct light to a user. The display area is at least partially transparent and is configured to provide a view of an ambient environment through the display area. The display device is configured to determine that a reflection of the user is within the user's field of view through the display area. After making this determination, augmented reality content is displayed in the display area with the augmented reality content augmenting the user's view of the reflection. In some embodiments, the augmented reality content may overlie on the user's view of the reflection, thereby allowing all or portions of the reflection to appear to be modified to provide a realistic view of the user with various modifications made to their appearance.
    Type: Grant
    Filed: January 18, 2017
    Date of Patent: October 1, 2019
    Assignee: Magic Leap, Inc.
    Inventors: Christopher M. Harrises, Nicole Elizabeth Samec, Nastasja U. Robaina, Mark Baerenrodt, Adam Carl Wright, Adrian Kaehler
  • Patent number: 10429319
    Abstract: The present disclosure is directed to a system for inspecting a sample with multiple wavelengths of illumination simultaneously via parallel imaging paths. The system may include at least a first detector or set of detectors configured to detect illumination reflected, scattered, or radiated along a first imaging path from a selected portion of the sample in response to the first wavelength of illumination and a second detector or set of detectors configured to concurrently detect illumination reflected, scattered, or radiated along a second imaging path from the selected portion of the sample (i.e. the same location on the sample) in response to the second wavelength of illumination, where the second imaging path may at least partially share illumination and/or detection optics with an autofocus channel.
    Type: Grant
    Filed: March 17, 2014
    Date of Patent: October 1, 2019
    Assignee: KLA-Tencor Corporation
    Inventors: Shiow-Hwei Hwang, Amir Bar, Grace Hsiu-Ling Chen, Daniel L. Cavan
  • Patent number: 10424059
    Abstract: Implementations of the present disclosure relate to methods, systems, and computer program products for quality evaluation. In one implementation, a computer-implemented method is disclosed. In the method, a pattern period may be extracted from an image of a target object, the pattern period indicating a period of a pattern that is repeated in the image. A reference image may be generated by repeating the pattern based on the extracted pattern period. Quality of the target object may be evaluated by comparing the generated reference image and the image of the target object. In other implementations, a computer-implemented system and a computer program product for quality evaluation are disclosed.
    Type: Grant
    Filed: September 11, 2017
    Date of Patent: September 24, 2019
    Assignee: International Business Machines Corporation
    Inventors: Jing Chang Huang, Jun Zhu, Jun Chi Yan, Guo Qiang Hu
  • Patent number: 10416551
    Abstract: An image pickup apparatus includes a receiver that receives, from an external apparatus, an instruction for changing a zoom position of a lens, a controller that performs control processing to change a zoom position of the lens based on a received instruction, and a determination unit that determines whether the external apparatus includes a function regarding zooming of the lens. While determining the external apparatus including the function, the controller controls a zoom adapter, which performs a zoom setting of the lens and is attached to the lens, to change a zoom position of the lens based on a zoom setting notified by the external apparatus. While determining the external apparatus not including the function, the controller controls the zoom adapter to change a zoom position of the lens based on a zoom setting performed in the zoom adapter.
    Type: Grant
    Filed: December 8, 2015
    Date of Patent: September 17, 2019
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Sentaro Aihara, Ken Minoda
  • Patent number: 10401842
    Abstract: The present disclosure relates to control systems for controlling and dynamically configuring a production line. The production line includes one or multiple peripheral devices respectively located throughout the production line. A controller, or control unit, may, in one embodiment, extract binary instructions included in a file received from a source external to the controller, and the controller operates each of the devices on the production line based on the binary instructions embedded in the file.
    Type: Grant
    Filed: May 1, 2015
    Date of Patent: September 3, 2019
    Assignee: SICPA HOLDING SA
    Inventors: Jesper Spring, Iacopo Giangrandi, Francesca Acerra, Philippe Leuba, Frederic Defever
  • Patent number: 10401677
    Abstract: The present disclosure relates to a display device including a display panel on which an image is displayed, a polarizer disposed on the display panel, a lower fluorescent filter disposed on the polarizer, and an upper fluorescent filter disposed on the lower fluorescent filter. The present disclosure may improve visibility when an image is displayed on the display device and light of a laser pointer in a visible light region is emitted thereto by absorbing the light using the upper and lower fluorescent filters, converting the light into light in a long wavelength band, which is a higher wavelength band than that of the absorbed light, and emitting the light in the long wavelength band.
    Type: Grant
    Filed: November 29, 2017
    Date of Patent: September 3, 2019
    Assignee: LG Display Co., Ltd.
    Inventors: Ji-Su Han, Dae-Heung Lee, Hye-Jeong Park
  • Patent number: 10393500
    Abstract: An interference observation apparatus includes a light source which outputs incoherent light, a beam splitter, a sample holding table, an objective lens, a reference mirror, a lens, an aberration correction plate, a piezo element, a tube lens, a beam splitter, an imaging unit, a photodetector, an image acquisition unit, and a control unit. The control unit obtains an interference intensity of combined light on the basis of a detection signal output from the photodetector, and adjusts an interference optical system to increase the interference intensity.
    Type: Grant
    Filed: December 14, 2015
    Date of Patent: August 27, 2019
    Assignee: HAMAMATSU PHOTONICS K.K.
    Inventors: Toyohiko Yamauchi, Hidenao Yamada
  • Patent number: 10381843
    Abstract: Aspects of a hierarchical power distribution network are described. In some embodiments, a first guided surface waveguide probe launches a first guided surface wave along a surface of a terrestrial medium within a first power distribution region. A guided surface wave receive structure obtains electrical energy from the first guided surface wave. A second guided surface waveguide probe launches a second guided surface wave along the surface of the terrestrial medium within a second power distribution region using the electrical energy obtained from the first guided surface wave.
    Type: Grant
    Filed: February 2, 2018
    Date of Patent: August 13, 2019
    Assignee: CPG Technologies, LLC
    Inventors: James F. Corum, Kenneth L. Corum, Basil F. Pinzone, Jr., James D. Lilly
  • Patent number: 10359270
    Abstract: An interference observation apparatus includes a light source which outputs incoherent light, a beam splitter, a sample holding table, an objective lens, a reference mirror, a lens, an aberration correction plate, a piezo element, a tube lens, a beam splitter, an imaging unit, a photodetector, an image acquisition unit, and a control unit. The control unit obtains an interference intensity of combined light on the basis of a detection signal output from the photodetector, and adjusts an interference optical system to increase the interference intensity.
    Type: Grant
    Filed: December 14, 2015
    Date of Patent: July 23, 2019
    Assignee: HAMAMATSU PHOTONICS K.K.
    Inventors: Toyohiko Yamauchi, Hidenao Yamada
  • Patent number: 10346969
    Abstract: A convolutional neural network may be trained to inspect subjects such as carbon fiber propellers for surface flaws or other damage. The convolutional neural network may be trained using images of damaged and undamaged subjects. The damaged subjects may be damaged authentically during operation or artificially by manual or automated means. Additionally, images of undamaged subjects may be synthetically altered to depict damages, and such images may be used to train the convolutional neural network. Images of damaged and undamaged subjects may be captured for training or inspection purposes by an imaging system having cameras aligned substantially perpendicular to subjects and planar light sources aligned to project light upon the subjects in a manner that minimizes shadows and specular reflections. Once the classifier is trained, patches of an image of a subject may be provided to the classifier, which may predict whether such patches depict damage to the subject.
    Type: Grant
    Filed: January 2, 2018
    Date of Patent: July 9, 2019
    Assignee: Amazon Technologies, Inc.
    Inventors: Aniruddh Raghu, Joseph Rutland, Christian Leistner, Andres Perez Torres
  • Patent number: 10345504
    Abstract: A backlight device 13 includes LEDs 22, a light guide plate 24, and a light reflecting portion 34. The light guide plate 24 is a plate member and includes a light entrance surface 24a, an opposite edge surface 24d, and a light exit surface 24b. The light entrance surface 24a is an edge surface of the plate member and opposite the LEDs 22 and light emitted by the LEDs 22 enters the light guide plate 24 through the light entrance surface. The opposite edge surface 24d is another edge surface of the plate member that is on an opposite side from the light entrance surface 24a. The light exit surface 24b is a plate surface of the plate member and the light entering through the light entrance surface 24a exits the light guide plate 24 through the light exit surface. The light reflecting portion 34 is disposed on at least the opposite edge surface 24d and reflecting light travelling within the light guide plate 24 toward the opposite edge surface 24d.
    Type: Grant
    Filed: October 8, 2015
    Date of Patent: July 9, 2019
    Assignee: SHARP KABUSHIKI KAISHA
    Inventors: Hisashi Watanabe, Ryuzo Yuki, Mitsuhiro Murata
  • Patent number: 10341550
    Abstract: An end face inspection apparatus which inspects an end face of an test object, and includes optical system causing an image acquisition unit to form an image of an end face of a held test object, focusing degree changing means for changing a distance between the end face of the test object and a focal position of the optical system, and a control unit processing image data acquired in the image acquisition unit. The end face inspection apparatus acquires a series of image data which is output from the image acquisition unit at a preset time interval while the distance between the end face of the test object and the focal position of the optical system is changed, determines whether or not each piece of the image data is focused, and selects focused image data as image data for end face inspection.
    Type: Grant
    Filed: October 30, 2017
    Date of Patent: July 2, 2019
    Assignee: ANRITSU CORPORATION
    Inventors: Yasuhiro Miyake, Taichi Murakami, Masayuki Shinohara
  • Patent number: 10337953
    Abstract: A method and an apparatus for determining surface data and/or measurement data relating to a surface, for the quality control of an at least a partially transparent object, an ophthalmic lens, having an optically active first surface and an opposite optically active second surface. The method includes irradiating polarized light with an irradiation polarization from at least one illumination device onto an analysis area of the object to be examined, wherein, for the purpose of setting the irradiation polarization, the light is passed through a polarizer assigned to the illumination device or integrated in the latter, and receiving light which is reflected at the first and/or second surface and has an analysis polarization by use of at least one receiving device, wherein the light is passed through an analyzer assigned to the receiving device or integrated in the latter.
    Type: Grant
    Filed: March 23, 2016
    Date of Patent: July 2, 2019
    Assignee: RODENSTOCK GMBH
    Inventors: Stephan Trumm, Rainer Sessner, Dietmar Uttenweiler
  • Patent number: 10324046
    Abstract: Methods and systems for monitoring a non-defect related characteristic of a patterned wafer are provided. One computer-implemented method includes generating output responsive to light from a patterned wafer using an inspection system. The method also includes determining differences between a value of a non-defect related characteristic of the patterned wafer and a known value of the non-defect related characteristic based on differences between one or more attributes of the output and one or more attributes of other output of the inspection system for a different patterned wafer having the known value of the non-defect related characteristic.
    Type: Grant
    Filed: August 18, 2016
    Date of Patent: June 18, 2019
    Assignee: KLA-Tencor Corp.
    Inventors: Tao-Yi Fu, Steve Lange, Lisheng Gao, Xuguang Jiang, Ping Gu, Sylvain Muckenhirn
  • Patent number: 10317294
    Abstract: An optical manufacturing process sensing and status indication system is taught that is able to utilize optical emissions from a manufacturing process to infer the state of the process. In one case, it is able to use these optical emissions to distinguish thermal phenomena on two timescales and to perform feature extraction and classification so that nominal process conditions may be uniquely distinguished from off-nominal process conditions at a given instant in time or over a sequential series of instants in time occurring over the duration of the manufacturing process. In other case, it is able to utilize these optical emissions to derive corresponding spectra and identify features within those spectra so that nominal process conditions may be uniquely distinguished from off-nominal process conditions at a given instant in time or over a sequential series of instants in time occurring over the duration of the manufacturing process.
    Type: Grant
    Filed: September 26, 2016
    Date of Patent: June 11, 2019
    Assignee: SIGMA LABS, INC.
    Inventors: Vivek R. Dave, Mark J. Cola, R. Bruce Madigan, Martin S. Piltch, Alberto Castro
  • Patent number: 10311563
    Abstract: Certain example embodiments relate to detecting and recognizing coatings on articles. A captured image and/or video of an article includes source light reflections associated with each major surface of that article. A color coordinate characterization for each source light reflection is calculated. Detection and recognition of any coatings formed on the major surfaces of the article is performable by comparing the calculated color coordinate characterizations and/or changes between calculated color coordinate characterizations to information stored in a data store including known color coordinate characterizations and/or known changes between color coordinate characterizations for different known coatings.
    Type: Grant
    Filed: June 20, 2017
    Date of Patent: June 4, 2019
    Assignee: Guardian Steklo Services, LLC
    Inventor: Maxim Koldyshev
  • Patent number: 10290502
    Abstract: An apparatus comprises an optical detector configured to receive scattered light signals from a surface of a wafer including a plurality of sensor arrays, each of which has a boundary smaller than a boundary of a laser beam, a light source optically coupled to the surface of the wafer, wherein light from the light source hits the surface with a small incident angle and a processor configured to measure a distance between a sensor array boundary and a laser beam boundary, wherein a laser annealing process is recalibrated if the distance is less than a predetermined value.
    Type: Grant
    Filed: August 3, 2015
    Date of Patent: May 14, 2019
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chung Chien Wang, Yeur-Luen Tu, Cheng-Ta Wu, Chia-Shiung Tsai
  • Patent number: 10281707
    Abstract: Provided is a solid immersion lens (SIL) holder for optical axis precision correction of a high resolution optical microscope, equipped with a SIL and an objective lens barrel equipped with a plurality of objective lenses, the SIL holder comprising: a circular flange providing in the middle of the objective lens barrel to be coupled to the SIL holder; a coupling flange formed at one end portion thereof and coupled to the circular flange; a conical tube formed at the other end portion thereof, the SIL being mounted onto a lower end portion of the conical tube, wherein the SIL holder comprises an optical axis adjusting part which adjusts such that the central axis of the SIL approaches the central axis of an objective lens, and the SIL holder comprises an extension/contraction adjusting part which allows the SIL to be very close to a measurement surface of a specimen.
    Type: Grant
    Filed: December 21, 2016
    Date of Patent: May 7, 2019
    Assignee: KOREA BASIC SCIENCE INSTITUTE
    Inventors: Ji Yong Bae, Kye Sung Lee, Geon Hee Kim, Ki Soo Chang
  • Patent number: 10255669
    Abstract: Provided is a device for measuring wafer defects, which prevents damage of a wafer and also measures defects at upper, lower and side surfaces of the wafer simultaneously. The device for measuring wafer defects includes a lower blower configured to inject air to a lower surface of a wafer to float the wafer; an upper blower provided to be moved up and down with respect to the lower blower and configured to inject the air to an upper surface of the wafer to fix the wafer; an upper contamination measuring part provided at an upper side of the upper blower and configured to detect contamination on the upper surface of the wafer; a lower contamination measuring part provided at a lower side of the lower blower and configured to detect contamination on the lower surface of the wafer; and a side contamination measuring part provided between the upper and lower blowers and configured to detect contamination on a side surface of the wafer.
    Type: Grant
    Filed: July 28, 2015
    Date of Patent: April 9, 2019
    Assignee: SK Siltron Co., Ltd.
    Inventors: Chi-Hun Kang, Kee-Yun Han
  • Patent number: 10234403
    Abstract: An embodiment of the present disclosure, provides a method of optical inspection on a carbon fiber reinforced plastics (CFRP) component in which performs an inspection, by maintaining the focal distance for a surface of an object to be inspected, and making a light axis of an image device and a normal line of the surface of the object to be inspected to be identical.
    Type: Grant
    Filed: May 20, 2016
    Date of Patent: March 19, 2019
    Assignee: Korea Institute of Industrial Technology
    Inventors: Hyo Young Kim, Tae Gon Kim, Seok Woo Lee
  • Patent number: 10215710
    Abstract: Method and apparatus for classifying defect in component having a monocrystalline structure.
    Type: Grant
    Filed: September 16, 2016
    Date of Patent: February 26, 2019
    Assignee: ROLLS-ROYCE plc
    Inventors: Michael J. Wingfield, Adriano Pulisciano
  • Patent number: 10215559
    Abstract: Methods and systems for evaluating the performance of multiple patterning processes are presented. Patterned structures are measured and one or more parameter values characterizing geometric errors induced by the multiple patterning process are determined. In some examples, a primary, multiple patterned target is measured and a value of a parameter of interest is directly determined from the measured data by a Signal Response Metrology (SRM) measurement model. In some other examples, a primary, multiple patterned target and an assist target are measured and a value of a parameter of interest is directly determined from the measured data by a Signal Response Metrology (SRM) measurement model. In some other examples, a primary, multiple patterned target is measured at different process steps and a value of a parameter of interest is directly determined from the measured data by a Signal Response Metrology (SRM) measurement model.
    Type: Grant
    Filed: October 9, 2015
    Date of Patent: February 26, 2019
    Assignee: KLA-Tencor Corporation
    Inventors: Stilian Ivanov Pandev, Dzmitry Sanko, Alexander Kuznetsov
  • Patent number: 10215707
    Abstract: An inspection system for inspection a surface of a substrate, the inspection system may include an interface for holding the substrate; a movement mechanism for moving the interface, thereby moving the substrate between different positions; a bright field light source that is configured to illuminate different bright field illuminated parts of the surface of the substrate when the substrate is positioned at the different positions; at least one dark field light source that is configured to illuminate different dark field illuminated parts of the surface of the substrate when the substrate is positioned at the different positions; and a camera that is configured to: (a) generate bright field detection signals in response to light that is detected by the camera as a result of the illumination of the different bright field illuminated parts; and (b) generate dark field detection signals in response to light that is detected by the camera as a result of the illumination of the different dark field illuminated par
    Type: Grant
    Filed: July 12, 2016
    Date of Patent: February 26, 2019
    Assignee: CAMTEK LTD.
    Inventors: Zehava Ben Ezer, Guy Kafry, Shimon Koren, Eldad Langmans, Natan Deutsch
  • Patent number: 10215695
    Abstract: An inspection system and method that use a differential technique to accurately detect interface defects at a resolution on the order of tens of nanometers or less. Specifically, a radiation source (e.g., a THz or sTHz radiation source) is used to illuminate a materials interface within an object under test (e.g., a semiconductor wafer, integrated circuit (IC) chip package, etc.) under selectively varied inspection conditions. Suitable detector(s) are used to capture images of the materials interface when that interface is illuminated under the selectively varied inspection conditions. The captured images can be compared and contrasted to determine an actual differential in a property of the images. Based on this actual differential, a determination can be made as to whether or not the materials interface is defective and, particularly, as to whether or not the materials interface contains defects even defects that are a few nanometers or less in size.
    Type: Grant
    Filed: April 25, 2018
    Date of Patent: February 26, 2019
    Assignee: GLOBALFOUNDRIES INC.
    Inventors: Mukta Farooq, Michael Shur
  • Patent number: 10217190
    Abstract: A method for reconstructing one or more high-resolution point spread functions (PSF) from one or more low-resolution images includes acquiring one or more low-resolution images of a wafer, aggregating the one or more low-resolution image patches, and estimating one or more sub-pixel shifts in the one or more low-resolution images and simultaneously reconstructing one or more high-resolution PSF from the aggregated one or more low-resolution image patches.
    Type: Grant
    Filed: December 27, 2016
    Date of Patent: February 26, 2019
    Assignee: KLA-Tencor Corporation
    Inventors: Helen Liu, Rohit Patnaik, Stephen Osborne
  • Patent number: 10200635
    Abstract: A system for providing active real-time characterization of an article under test is disclosed. An infrared light source, a first visible light source and a second visible light source each outputs and directs a beam of coherent light at a particular area on the article under test. A visible light camera and a visible light second harmonic generation camera, an infrared camera and an infrared second harmonic generation camera, a sum frequency camera and a third order camera are each configured to receive a respective predetermined return beam of light from the particular area on the article under test. A processor receives signals from the cameras and calculates in real time respective spectroscopic signals and compares each calculated signal with each other calculated signal and with a predetermined baseline signal to ensure that the article under test conforms to an expected value.
    Type: Grant
    Filed: September 21, 2017
    Date of Patent: February 5, 2019
    Assignee: THE BOEING COMPANY
    Inventors: Jeffrey H. Hunt, John H. Belk
  • Patent number: 10156436
    Abstract: An illumination apparatus includes a light source including a semiconductor laser that emits coherent light, a polarization splitter including rutile, a half-phase retardation film, and another rutile to split optical paths by the polarization direction of incident light, and a projection polarization switching mechanism including a half-wave plate unit, a quarter-wave plate unit, and a polarizing film to switch projected light emitted from the polarization splitter between polarization components of light transmitted over optical paths split by the polarization splitter and a polarization component of light transmitted over any one optical path. As a result, a compact illumination apparatus, and a measurement apparatus using the same, with a common light source and optical system for both observation light and measurement light can be provided.
    Type: Grant
    Filed: November 15, 2017
    Date of Patent: December 18, 2018
    Assignee: OLYMPUS CORPORATION
    Inventor: Daichi Watanabe
  • Patent number: 10151090
    Abstract: A flush actuator for engaging a flush valve. The flush actuator provides a mechanism assembly for automatically flushing the flush valve. A sensor provides a presence detection to trigger the automatic flushing. Redundant manual activation is provided.
    Type: Grant
    Filed: April 24, 2017
    Date of Patent: December 11, 2018
    Assignee: SLOAN VALVE COMPANY
    Inventors: John Wilson, Kay Herbert, Xiaoxiong Mo, Alfred J. Costa, Joshua D. Anthony, Klaus H. Renner, Matthew T. Kowalczyk, Joshua P. Kinsley
  • Patent number: 10145981
    Abstract: Various controllers detect whether or not a remote object is in a predetermined position. A controller emits a laser through a laser emitter at the remote object and measures an intensity of light reflected back to the controller through a photosensor disposed in close proximity to the laser emitter. The surface of the remote object may comprise a retroreflective portion, which reflects most of the laser beam's light in the direction from which it came. A predetermined position of the remote object is detected when the intensity of light measured by the photosensor reaches a threshold level. The controller and retroreflective portion are configured such that when the remote object is not in the predetermined position, the intensity of the reflected laser light diminishes due to a scattering of the light when the laser beam is incident on any non-retroreflective portion of the remote object.
    Type: Grant
    Filed: January 25, 2017
    Date of Patent: December 4, 2018
    Assignee: Garadget Inc.
    Inventor: Denis Grisak
  • Patent number: 10145737
    Abstract: A Laser Induced Breakdown Spectroscopy (LIBS) probe using a dove prism for the laser media. The use of a dove prism allows for the removal of two mirrors over prior art schemes. The use of the dove prism allows for the light from the spark to be analyzed from the return path.
    Type: Grant
    Filed: October 26, 2017
    Date of Patent: December 4, 2018
    Assignee: U.S. Department of Energy
    Inventor: Dustin McIntyre
  • Patent number: 10139284
    Abstract: Disclosed is a temperature distribution measuring device for measuring the temperature distribution or the heat generation distribution in a sample. An embodiment collects a reflection signal the reflectivity of which changes on the basis of a bias signal applied to a sample, detects a signal of interest, which has been reflected from a region of interest in the sample, from the reflected signal, converts the signal of interest to a frequency range signal, calculates the relative amount of change in reflectivity of the sample by using a direct current component extracted on the basis of filtering of the frequency range signal and a frequency component of the bias signal, and acquires a thermal image of the sample on the basis of the relative amount of change in reflectivity.
    Type: Grant
    Filed: August 24, 2015
    Date of Patent: November 27, 2018
    Assignee: KOREA BASIC SCIENCE INSTITUTE
    Inventors: Ki Soo Chang, Dong Uk Kim
  • Patent number: 10137533
    Abstract: A multi-functional apparatus for testing and etching a substrate capable of increasing spatial efficiency and manufacturing efficiency by performing testing and etching operations in a same chamber body and a substrate processing apparatus including the same, the multi-functional apparatus including a chamber body having an entrance into which the substrate is injected in one of its sides and an exit from which the substrate is ejected in another one of its sides; a transfer unit disposed inside of the chamber body and for transferring the injected substrate in a direction from the entrance to the exit; a laser etching unit disposed on an upper portion of the transfer unit and for etching a part of the substrate disposed on the transfer unit; and a testing unit for testing the substrate disposed on the transfer unit.
    Type: Grant
    Filed: May 16, 2016
    Date of Patent: November 27, 2018
    Assignee: Samsung Display Co., Ltd.
    Inventors: Sung-Hwan Kim, Sang-Su Kim, Byoung-Seong Jeong, Je-Hyun Song, Tae-Hun Lee, Sung-Won Yang, Tae-Hyung Kim
  • Patent number: 10129491
    Abstract: A system for providing active real-time characterization of an article under test is disclosed. An infrared light source, a first visible light source and a second visible light source each outputs and directs a beam of coherent light at a particular area on the article under test via respective optical fibers. A visible light camera and a visible light second harmonic generation camera, an infrared camera and an infrared second harmonic generation camera, a sum-frequency camera and a third-order camera are each configured to receive a respective return beam of light from the particular area on the article under test via respective optical fibers. A processor receives signals from the cameras and calculates in real time respective spectroscopic signals and compares each calculated signal with each other calculated signal and with a predetermined baseline signal to ensure that the article under test conforms to an expected value.
    Type: Grant
    Filed: February 22, 2018
    Date of Patent: November 13, 2018
    Assignee: THE BOEING COMPANY
    Inventor: Jeffrey H. Hunt
  • Patent number: 10124715
    Abstract: A smart light control system includes a light source device and a controller. The light source device has a plurality of transparent parts and a plurality of sensors, and the sensors are separately disposed beside a light source, and the sensors correspond to the transparent parts in terms of position, wherein a channel is formed for light to pass through between each sensor and its corresponding transparent part, and in addition, the controller is connected with the sensors The sensors send sensed signals to the controller according to the brightness of light beams, and the brightness of the light source is adaptively adjusted by the controller so as to achieve the purpose of improving the control efficiency and safety of the light source through the smart control.
    Type: Grant
    Filed: February 9, 2018
    Date of Patent: November 13, 2018
    Assignee: Keeper Technology Co., Ltd.
    Inventors: Wen-Fu Wang, Ying-Wei Kuo
  • Patent number: 10110863
    Abstract: A scanning projector includes one or more scanning mirrors that reflect a light beam to create an image. The beam is created by multiple laser light sources, at least two of which create light at substantially the same color. The multiple laser light sources are used alternately to illuminate successive pixels, lines, and/or frames. Speckle reduction is achieved because of spatial overlap of the light beams produced by the multiple laser light sources.
    Type: Grant
    Filed: November 30, 2016
    Date of Patent: October 23, 2018
    Assignee: Microvision, Inc.
    Inventors: Dale Eugene Zimmerman, Matthieu Saracco, Jonathan A. Morarity
  • Patent number: 10109047
    Abstract: Systems and methods for identifying potentially defective individual packaged modules are presented. A printed circuit board (PCB) having individual module substrates can be received. An image of the PCB is captured and a PCB recipe associated with the PCB is loaded. For each individual module substrate, a portion of the image corresponding to the individual module substrate is compared to the PCB recipe. It can be determined based on the comparison whether the individual module substrate matches the PCB recipe within a degree of tolerance. When an individual module substrate does not match the PCB recipe within the degree of tolerance, a location of the individual module substrate within a map of the PCB can be stored.
    Type: Grant
    Filed: December 19, 2016
    Date of Patent: October 23, 2018
    Assignee: Skyworks Solutions, Inc.
    Inventors: Carlos Fabian Nava, Viviano Almonte
  • Patent number: 10095118
    Abstract: Methods and apparatus for in situ compensation for damage or misalignment of optical elements are disclosed. Also disclosed are methods and apparatus for facilitating alignment of replacement optical elements so that the amount of time in a system including the optical elements can be reduced. Also disclosed are methods and apparatus for processing an image of a beam generated by an optical system to extract information indicative of an extent of damage to optical elements in the optical system and/or misalignment of the optical elements. Information pertaining to an extent of damage to optical elements in the optical system can be used to optimally schedule maintenance events for the optical system.
    Type: Grant
    Filed: July 12, 2016
    Date of Patent: October 9, 2018
    Assignee: CYMER, LLC
    Inventors: Thomas Frederick Allen Bibby, Khalid Khulusi Tahboub, Donald James Haran, Rostislav Rokitski, Joshua Jon Thornes
  • Patent number: 10036712
    Abstract: A defect inspection system is provided for inspection of defects in the surface of a sample. An array of light sources is used, with different light sources providing light to the sample from different directions. A main direction of illumination is defined with highest intensity, and this direction evolves over time. By providing varying directional illumination instead of blanket illumination, it becomes easier to detect defects.
    Type: Grant
    Filed: October 13, 2014
    Date of Patent: July 31, 2018
    Assignee: PHILIPS LIGHTING HOLDING B.V.
    Inventors: Shuguang Kuai, Mark Christoph Jaeger, Weixi Zhou
  • Patent number: 10018460
    Abstract: A device for the interferometric measuring of an object, including a light source to generate an emitted beam, a beam splitting device for splitting the emitted beam into a measuring beam and at least first and second reference beams, an optic interference device, and first and second detectors, with the interference device and the first detector being embodied cooperating such that the measuring beam, at least partially reflected by the object, and the first reference beam are interfered on at least one detector area of the first detector. The interference device and the second detector are embodied cooperating such that the measuring beam, at least partially scattered by the object, and the second reference beam are interfered on at least one detector area of the second detector. A method is also provided for the interferometric measuring of an object.
    Type: Grant
    Filed: November 2, 2012
    Date of Patent: July 10, 2018
    Assignee: Polytec GmbH
    Inventors: Matthias Schussler, Christian Rembe, Alexander Drabenstedt, Robert Kowarsch, Wanja Ochs
  • Patent number: 9989479
    Abstract: A computer-based apparatus for adjusting an auto-focus in a wafer inspection system, including: a wafer adjustment system; and an electronic feedback loop system configured to compare an intensity of a first light beam rotating in a first spiral about a first central axis, and when the intensity is less than a preselected threshold, adjust, using the wafer adjustment system, a position of the wafer until the intensity reaches the preselected threshold.
    Type: Grant
    Filed: June 13, 2016
    Date of Patent: June 5, 2018
    Assignee: KLA-Tencor Corporation
    Inventors: Pavel Kolchin, Mikhail Haurylau, Robert Danen
  • Patent number: 9959380
    Abstract: Methods for integrated circuit design are provided. In one embodiment, a method for determining a physical layout pattern includes accessing a layout pattern configuration graph. The graph includes layout pattern configurations meeting a circuit requirements. At least two of the layout pattern configurations are annotated with characteristics by analyzing sample layout patterns. An integrated circuit electrical design is partitioned into circuit design configurations. One of the circuit design configurations meets one of the circuit requirements. One of the layout pattern configurations is selected from the layout pattern configuration graph to meet the selected circuit requirements. In another embodiment, a method for determining a netlist for an integrated circuit electrical design is provided. In a further embodiment, a method for determining a tool configuration for a manufacturing process is provided.
    Type: Grant
    Filed: November 4, 2016
    Date of Patent: May 1, 2018
    Assignee: Motivo, Inc.
    Inventors: Vito Dai, Edward Kah Ching Teoh, Ji Xu, Bharath Rangarajan
  • Patent number: 9958268
    Abstract: The invention provides a surveying system comprising a total station installed at a known point and having a tracking function, at least one movable measuring device having a prism for retro-reflecting a distance measuring light and a tracking light projected from the total station and capable of moving and of performing three-dimensional measurement on an object to be measured and an arithmetic control part, wherein the movable measuring device has an auxiliary measuring unit capable of measuring a distance and an angle of the object to be measured and an attitude detector capable of detecting a measuring direction, a tilting and a tilting direction of the movable measuring device, wherein the movable measuring device performs three-dimensional measurement on the object to be measured with reference to direction of the total station based on the measurement result of the auxiliary measuring unit and on the detection result of the attitude detector at an arbitrary measurement position as being sighted from th
    Type: Grant
    Filed: October 20, 2014
    Date of Patent: May 1, 2018
    Assignee: Kabushiki Kaisha TOPCON
    Inventors: Fumio Ohtomo, Kaoru Kumagai, Hitoshi Otani, Kazuki Osaragi
  • Patent number: 9952236
    Abstract: Disclosed is a method for monitoring a generative fabrication process in which a component is formed in an installation space from a multiplicity of layers by using a three-dimensional data model and a following layer is fixed to a preceding layer by means of a high-energy beam. The method comprises detecting the component at least optically and detecting the installation space thermally during layer application. Also disclosed is a device for carrying out the method.
    Type: Grant
    Filed: January 11, 2012
    Date of Patent: April 24, 2018
    Assignee: MTU AERO ENGINES AG
    Inventors: Wilhelm Satzger, Siegfried Sikorski, Karl-Heinz Dusel, Wilhelm Meir, Bertram Kopperger, Josef Waermann, Andreas Jakimov, Manuel Hertter, Hans-Christian Melzer, Thomas Hess
  • Patent number: 9952039
    Abstract: A system for measuring reflected optical distortion in a contoured panel having a specular surface includes a conveyor for conveying the panel in a first direction, at least one display projecting a preselected multi-phase non-repeating contrasting pattern, and at least one camera, each one of the cameras uniquely paired with one of the displays. The system may also include a control programmed to execute logic for controlling each of the cameras to acquire the desired images, and logic for analyzing and combining the data acquired by the cameras to construct a definition of the surface of the panel, and logic for performing one or more optical processing operations on the surface data to analyze the optical characteristics of the panel.
    Type: Grant
    Filed: June 26, 2015
    Date of Patent: April 24, 2018
    Assignee: Glasstech, Inc.
    Inventors: Jason C. Addington, Michael J. Vild, Benjamin L. Moran
  • Patent number: 9946056
    Abstract: Provided is an illumination optical system that illuminates a target illumination region by using light emitted from a discharge lamp. The system includes a condensing mirror that condenses the light from the discharge lamp, an optical integrator which has a polygonal cross-sectional shape and is arranged on an optical path from the condensing mirror to the target illumination region, an imaging optical system that forms an image on the target illumination region with respect to an exit end face of the optical integrator as an object plane, and a power supply cable connecting to an electrode of the discharge lamp across the optical path directed from the condensing mirror to the optical integrator. The cable is arranged so that a shadow of the cable is neither parallel nor perpendicular to each side of the polygon of an entrance surface of the optical integrator.
    Type: Grant
    Filed: March 9, 2016
    Date of Patent: April 17, 2018
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Hiromi Suda
  • Patent number: 9939624
    Abstract: An inspection system that is effective to collect images of a part under inspection. This inspection system includes (a) a three axis linear motion stage; (b) a rotary fourth axis stage configured to hold and rotate an object to be inspected. This rotary fourth axis stage is mounted on the three axis linear stage; (c) a fifth axis camera and optical system mounted to one of the axes of the three axis linear motion stage. This fifth axis camera has an optical axis substantially parallel to the axis of linear motion; (d) a 45 degree mirror configured to bend the optical axis of the fifth axis camera by 90° to point towards the object; and (e) a motor configured to rotate the mirror over a range of angles to obtain a fifth axis of viewing orientation.
    Type: Grant
    Filed: May 6, 2015
    Date of Patent: April 10, 2018
    Assignee: Electro Scienctific Industries, Inc.
    Inventors: Daniel Freifeld, John Burnett, Minh Chau Ngo