Abstract: A spectroscopic system may include: a spectroscopic scatterometer; an angular-resolved spectrometer; and a fiber bundle having a two-dimensional input surface and a one-dimensional output surface.

Abstract: A flow cell for use in an arrayed imaging reflectometry detection system is described herein. The flow cell includes: first and second members that are secured together to define a substantially fluid-tight chamber having an inlet and an outlet, at least the second member being light transmissive; and a chip having a substrate, one or more coating layers on the substrate, and one or more probe molecules tethered to the outermost coating layer, the chip being positioned with the outermost coating layer and the one or more probe molecules thereon exposed to fluid in the chamber and facing the second member, whereby light passing through the second member is reflected by the chip.

Abstract: In an optical sensor, a light emission system emits an irradiated light of a linear polarization in a first polarization direction toward a surface of a target object having a sheet shape from an incident direction which is inclined with respect to a normal direction of the surface. A first light detection system includes a first light detector arranged on a first light path of a specular reflected light, which is emitted from the light emission system and is specularly reflected from the target object. A second light detection system includes a second light detector arranged on a second light path of a diffuse reflected light which is diffusely reflected from an incident plane on the target object. The second light detector receives second light passed by an optical element which passes a linear polarization component of a second polarization direction perpendicular to the first polarization direction.

Abstract: A method of applying an ellipsometer or polarimeter system which operates in a frequency range between 300 GHz or lower and extending to higher than at least 1 Tera-hertz (THz), and preferably through the Infra-red (IR) range up to, and higher than 100 THz; wherein the ellipsometer or polarimeter system includes a source such as a backward wave oscillator, a Smith-Purcell cell, a free electron laser, an FTIR source or a solid state device; and a detector such as a Golay cell a bolometer or a solid state detector; and preferably includes at least one odd-bounce polarization state image rotating system and a polarizer, and at least one compensator and/or modulator, in addition to an analyzer.

Abstract: A sensor and method for determining the optical properties of a sample material is disclosed. The sensor comprises a light source that generates a linearly polarized light beam having a predetermined polarization orientation with respect to the plane of incidence. The linearly polarized light beam is reflected off the sample and is split into second and third light beams where the second and third light beam consist of the combined projections of mutually orthogonal components of the first light beam. A signal processor measures the intensity difference between the second and third light beams to calculate the phase difference induced by the sample material.

Abstract: Electromagnetic radiation scanning is used to monitor the integrity of a composite laminate structure. The laminate is designed to be optically resonant at the frequency of the radiation, allowing the inconsistencies in the laminate to be detected and mapped.

Abstract: The present invention may include a modulatable illumination source configured to illuminate a surface of a sample disposed on a sample stage, a detector configured to detect illumination emanating from a surface of the sample, illumination optics configured to direct illumination from the modulatable illumination source to the surface of the sample, collection optics configured to direct illumination from the surface of the sample to the detector, and a modulation control system communicatively coupled to the modulatable illumination source, wherein the modulation control system is configured to modulate a drive current of the modulatable illumination source at a selected modulation frequency suitable for generating illumination having a selected coherence feature length. In addition, the present invention includes the time-sequential interleaving of outputs of multiple light sources to generate periodic pulses trains for use in multi-wavelength time-sequential optical metrology.

Abstract: An inspection system and a method. The method may include: illuminating the object with impinging light of a first polarization; performing a polarization based filtering of (a) multiple-reflected light signals, each multiple-reflected light signal being reflected from at least two different bevel side surfaces of the object, and (b) additional light signals, each additional light signal being reflected from a single element of the object, such as to suppress the multiple-reflected light signals, and to provide polarization based filtered light signals; and detecting the polarization based filtered light signals.

Abstract: An apparatus and method for use on precision refractive index experiments that are performed on individual faces of single crystals or liquid surfaces of material using specific wavelengths of light. The process is used to measure the major and minor axes of the optical indicatrix of a single crystal of material at a very specific wavelength. This process is repeated for each crystal face in order to form a complete picture of the refractive index for the sample.

Abstract: A method of measuring the thickness of a one or more layers using ellipsometry is presented which overcomes problems with fitting a model to data collected in the presence of a top surface having a surface roughness (peak-to-trough) greater than about 100 ?. Prior to measurement, the top layer is pretreated to form an oxide layer of thickness between about 15 ? and about 30 ?. Ellipsometry data as a function of wavelength is then collected, and the ellipsometry data is fitted to a model including the oxide layer. For layers of doped polycrystalline silicon layers with a rough surface, the model comprises a layer consisting of a mixture of polycrystalline silicon and amorphous silicon and a top layer consisting of a mixture of polycrystalline silicon and silicon dioxide, and the pretreatment can be performed for about 10 minutes at 600 C in an oxygen atmosphere.

Abstract: An inspection method reflects radiation with a known polarization beam off a periodic structure, such as a grating. The reflected radiation beam is split into first and second orthogonally polarized sub-beams. The phase of the first sub-beams is shifted with respect to the second sub-beam. A first image resultant from the first sub-beam and a second image resultant from the second sub-beam are simultaneously detected. A difference in intensity values is used to derived from the detected first and second images together to determine an overlay error in the periodic structure.

Abstract: An improved system and method for investigation of a wobbling surface of a sample with an electromagnetic beam, involving application of a beam directing dual reflection surface “prism” system, which, while effecting beam locus direction rotation of 90 degrees also preserves beam polarization state. The system allows causing an electromagnetic beam to access an otherwise difficult to access sample in, for instance, a vacuum deposition chamber, and enables achieving very closely spaced incident and spherical mirror reflected points of beam reflection from a sample surface in use.

Abstract: A structure that is located adjacent to a measurement target on a substrate is used to convert incident radiation from an optical metrology device to be in-plane with the measurement target. The structure may be, e.g., a grating or photonic crystal, and may include a waveguide between the structure and the measurement target. The in-plane light interacts with the measurement target and is reflected back to the structure, which converts the in-plane light to out-of-plane light that is received by the optical metrology device. The optical metrology device then uses the information from the received light to determine one or more desired parameters of the measurement target. Additional structures may be used to receive light that is transmitted through or scattered by the measurement target if desired.

Abstract: A system, method of configuring, and application a system for introducing a relative phase retardation into orthogonally polarized components of an electromagnetic beam entered thereinto, wherein the system involves a substantially achromatic multiple element retarder system for use in wide spectral range (for example, 190-1700 nm) rotating compensator spectroscopic ellipsometer and/or polarimeter systems.

Abstract: In an electron probe microanalyzer (EPMA) and a method of use thereof, even if plural sets of X-ray image data are obtained at different timings from regions between which a positional deviation occurs, processing for obtaining the correlation is performed precisely. The sets of X-ray image data are obtained from the same region of a sample using the EPMA at different timings and stored in memory along with sets of electron image data based on detection of secondary or backscattered electrons arising from the region. The sets of electron image data obtained at the different timings are compared, and the amount of positional deviation is calculated. An operation for extracting a region common to the regions respectively producing the sets of X-ray image data obtained at the different timings is performed on these sets of X-ray image data based on the calculated amount of positional deviation.

Abstract: A Mueller ellipsometer of the type having a first rotating element on an incident beam side of a sample and a second rotating element on a reflected beam side of the sample and a detector having an integration time, having a controller for selectively and separately adjusting (1) a first angular frequency of the first rotating element and (2) a second angular frequency of the second rotating element.

Abstract: A light focusing unit and a spectrum measuring apparatus having the same are provided. The light focusing unit includes a light source section configured to emit light, a light guiding section configured to guide the light emitted from the light source section along multiple parallel light incidence paths, and a light focusing section configured to direct the light from the guiding section to be incident on a test position of a sample at different incidence angles.

Abstract: A device includes an incident arm, a detection arm, a sample stage, and an image processing computer. The incident arm includes a light source and a first polarizing element, and is disposed on one side of the sample stage. The detection arm includes a second polarizing element and a photoelectric detector, and is disposed on a light-detection path. The photoelectric detector is connected to the computer. The device further includes a device for adjusting polarization angles of the first and second polarizing elements. A method includes: illuminating a sample surface using linearly polarized light with a certain polarization angle; detecting outgoing polarized light by a photoelectric detector; adjusting polarization angles of the incident and detected polarized light, and repeating the above two steps to obtain a series of polarized images, each image corresponding to incident and detected polarization angles; and computer processing the obtained images to obtain sample information.

Abstract: Various metrology systems and methods are provided.

Abstract: There is provided an inspection apparatus, including: an illumination section configured to irradiate a pattern, a detection section configured to detect a reflected light from the pattern, and a calculation section configured to compare a first change and a second change to calculate a deviation between the first and second changes. The first change which is a change, of a detection result of a pattern formed by a plurality of first exposure conditions, with respect to the first exposure conditions. The second change which is a change, of a detection result of a reflected light, from a pattern, generated by irradiating the pattern with the illumination light. The pattern is formed by a plurality of second exposure conditions each having a predetermined interval in a range which has at least one part overlapping with a range of the first exposure conditions, with respect to the second exposure conditions.

Abstract: The present invention is an apparatus and method for enhancing the electromagnetic signal of a sample for ellipsometry which uses at least one auxiliary layer and at least one substrate layer.

Abstract: An optical inspection system includes a polarizing isolator that reduces error in measurements by preventing ghost light reflected or scattered from element of a detection subsystem from re-entering the illumination and detection optical paths. The polarizing isolator may include a polarizing splitter that isolates light directionally according the a linear polarization state and two quarter-wave plates for transforming linearly polarized light to circularly polarized light.

Abstract: A method of optimising the sensitivity of surface plasmon ellipsometry (SPE) apparatus used to analyse a surface comprising a conducting film is disclosed. The method includes calculating a sensitivity map of plasmon ellipsometry for the film. The sensitivity map comprises data defining variations in sensitivity of the plasmon ellipsometry apparatus with angle of incidence and polarization angle of polarized light incident on the conducting film for analysis by the apparatus. The method further comprises using the sensitivity map to configure the plasmon ellipsometry apparatus with a combination of the angle of incidence and polarization angle located in a region of substantially maximum sensitivity in the sensitivity map.

Abstract: A surface position detecting apparatus is arranged to be able to detect a surface position of a detection target surface with high accuracy, while restraining influence of a relative positional deviation between polarization components in a beam totally reflected on an internal reflection surface of a prism member, on detection of the surface position of the detection target surface. At least one of a light projection system and a light reception system is provided with a total reflection prism member (7; 8) having an internal reflection surface (7b, 7c; 8b, 8c) which totally reflects an incident beam.

Abstract: An apparatus for measuring a parameter includes: an optical crystal having an optical axis and configured to be disposed at a selected location; an optical signal source in optical communication with a surface of the crystal and configured to transmit an optical signal having an initial polarization to the surface, the surface configured to reflect at least a portion of the signal as a reflected signal; a detector configured to receive the reflected signal; and a processor configured to determine a polarization of the reflected signal and estimate the parameter at the location based on the polarization of the reflected signal.

Abstract: This application describes designs, implementations, and techniques for controlling propagation mode or modes of light in a common optical path, which may include one or more waveguides, to sense a sample.

Abstract: A surface inspection apparatus and a surface inspection method aim to securely deal with finer repetition pitch without shortening the wavelength of illumination light. To this end, the apparatus includes a unit illuminating repetitive pattern(s) formed on the substrate surface to be inspected with linearly polarized light, a unit setting to an oblique angle an angle between the direction of an intersecting line of a vibration plane of the linearly polarized light on the substrate surface and the repetition direction of repetitive pattern(s), a unit extracting a polarized light component perpendicular to the vibration plane of the linearly polarized light, from light having been emitted from the repetitive pattern(s) in a specular direction, and a unit detecting a defect of the repetitive pattern(s) according to the light intensity of the polarized light component.

Abstract: An optical metrology device produces a broadband beam of light that is incident on and reflected by a sample and introduces multiple variations in the polarization state of the beam of light induced by an optical chiral element. Using the detected light, the Muller matrix or partial Mueller matrix for the sample is determined, which is then used to determine a characteristic of the sample. For example, simulated spectra for a Mueller matrix for a model is fit to the measured spectra for the Mueller matrix of the sample by adjusting the parameters of the model until an acceptable fit between the simulated spectra and measured spectra from the Mueller matrices is produced. The varied parameters are then used as the sample parameters of interested, which can be reported, such as by storing in memory or displaying.

Abstract: An optical collection system for use in a surface inspection system for inspecting a surface of a workpiece. The surface inspection system has an incident beam projected through a back quartersphere and toward a location on the surface of the workpiece to impinge on the surface. This forms a reflected beam that extends along a light channel axis in a front quartersphere, and forms scattered light having a haze scatter portion. The incident beam and the light channel axis form an incident plane. The optical collection system includes back collectors that are positioned in the back quartersphere for collecting the scattered light, where each of the back collectors is disposed in the back quartersphere outside the incident plane, and at a relative minimum in the Rayleigh scatter.

Abstract: The present invention relates to ellipsometer and polarimeter systems, and more particularly is an ellipsometer or polarimeter or the like system which operates in a frequency range between 300 GHz or lower and extending to higher than at least 1 Tera-hertz (THz), and preferably through the Infra-red (IR) range up to, and higher than 100 THz, including: a source such as a backward wave oscillator; a Smith-Purcell cell; a free electron laser, or an FTIR source and a solid state device; and a detector such as a Golay cell; a bolometer or a solid state detector; and preferably including a polarization state generator comprising: an odd bounce image rotating system and a polarizer, or two polarizers; and optionally including least one compensator and/or modulator, in addition to an analyzer.

Abstract: A lens system which allows easy relative adjustment of the position of at least two elements therein to minimize the effects of aberration, having particularly relevant application in ellipsometers, polarimeters, reflectometers and spectrophotometers finite size source is imaged onto a sample.

Abstract: A method of obtaining information about a target by using an ellipsometric technique of illuminating the target with coherent light beams from moveable light sources and recording reflections from the target. By analyzing the reflections, the surface material refractive index or dielectric tensors may be classified to yield information about the surface material properties. The beams can be emitted at different polarities and/or different frequencies. Ultra-coherent lasers can be used to produce beams that illuminate targets up to 100 kilometers from the beam source.

Abstract: Methods, apparatuses and systems for monitoring a stage alignment in a processing system are disclosed. A method for monitoring a stage alignment in a processing system may include providing a calibration target on a surface of the stage; measuring an angle of incident of a light beam to the calibration target; and monitoring the stage alignment based on the determined angle of incidence.

Abstract: A spectroscopic polarimetric system of broad spectral range, includes a light source suitable for emitting an incident light beam over a wavelength range, a polarization state generator (PSG), a polarization state analyzer (PSA), and a detector. The PSG and the PSA have respective elements for modulating the polarization of the light beam. The elements of the PSG for modulating polarization are suitable for generating a sequence of m polarization states with m>4 at each measurement wavelength, the elements of the PSA for modulating polarization are suitable for determining a sequence of n polarization states with n>4 for each measurement wavelength, and the detector elements are suitable for acquiring a sequence of N measurements with 16<N?n×m at each wavelength to extract therefrom a polarimetric spectroscopic measurement of the Mueller matrix of the sample. An extended spectroscopic polarimetric measurement method is also described.

Abstract: A method of compensating for sample misalignment in an optical measurement apparatus (40), comprises the steps of: determining an expected response from a detector (58) in said optical measurement apparatus given a particular set of parameters defining a path that light can take through the optical measurement apparatus from a source (42), via a sample (50), to the detector (58); measuring a response from the detector for the sample under test; and refining the set of parameters until the expected response and the measured response converge so as to determine the set of parameters giving rise to the measured response.

Abstract: In an evaluation device, an analyzer is rotated so that the azimuth of the transmission axis of the analyzer has an inclination angle of 90 degrees±3 degrees with respect to the transmission axis of a polarizer. An imaging camera captures a regularly reflected image of a wafer under each condition, and an image processing unit evaluates the shape of a repeating pattern and detects dose defects and focus defects on the basis of the two images of the wafer captured by the imaging camera.

Abstract: An oblique incidence broadband spectroscopic polarimeter which is easy to adjust the focus, achromatic, maintains the polarization and has simple structure is provided. It comprise at least one polarizer (P, A), at least one curved reflector element (OAP1, OAP2, OAP3, OAP4) and at least two flat reflector elements (M1, M2). By utilizing the flat reflector element, the oblique incidence broadband spectroscopic polarimeter can change the propagate direction of beam, and compensate the polarization changes caused by the reflective focusing unit, make the polarization of beam passed the polarizer unchanged when obliquely incident and focus on the sample surface. The oblique incidence broadband spectroscopic polarimeter can accurately measure the optical constants of sample material, film thickness, and/or the critical dimension (CD) properties or three-dimensional profile for analyze the periodic structure of the sample.

Abstract: This invention relates to a method for the fabrication of photonic biosensor arrays and applications of arrays produced by the method in the biomedical field.

Abstract: A moisture sensor for detecting moisture content of an object includes a light source to emit light having an infrared wavelength that is absorbed by water; an optical system to receive the light from the light source and output linearly polarized light having a first polarization direction in a direction toward the object, and to receive light scattered from the object and output linearly polarized light having a second polarization direction perpendicular to the first polarization direction in another direction other than the direction toward the object; and a photodetector to receive the linearly polarized light having the second polarization direction output from the optical system.

Abstract: This invention relates to photonic biosensor arrays in particular employing plasmon resonance based sensing, and to methods and apparatus for reading such arrays. A biosensor array for plasmon resonance-based sensing of a plurality of different biological targets simultaneously, the array comprising a transparent substrate having a surface bearing a plurality of assay spots for plasmon resonance sensing, each of said assay spots comprising a discrete metallic island, a said metallic island comprising a plurality of metallic nanoparticles to which are attached functionalizing molecules for binding to a said biological target, different said islands bearing different said functionalizing molecules for binding to different ones of said biological targets, and wherein total internal reflection of light at said surface at a wavelength at or near a said plasmon resonance results in scattering of said light away from said surface, said scattering being modulated by said binding of said biological targets.

Abstract: Determining line edge roughness comprises reflecting at least one radiation beam off the object, observing a first optical response signature from a beam reflected from the object, or a component thereof, being polarized with an electrical vector in a first orientation relative to the object; and observing a second optical response signature from a beam reflected from the object, or a component thereof, being polarized with an electrical vector in a second orientation relative to the object. Line edge roughness can then be determined from the two optical response signatures.

Abstract: A surface sensing device comprising an optical monitoring system for measuring a displacement of the tip a hollow stylus with respect to a stylus carrier. According to the invention, the light emitting means of the optical monitoring system are built in such a way that the beam has at least two distinguishable light characteristics with a given characteristics distribution. The optical monitoring system further comprises an optically encoding component positioned in the stylus carrier in the optical return path and designed to transform the information of an impinging position of the returned beam upon the optical encoding component into a change of the characteristics distribution of the returned beam, and the detector means is sensitive for the at least two distinguishable light characteristics and built for generating the electrical output signal dependent on the changed characteristics distribution of the returned beam.

Abstract: A kind of normal incidence broadband spectroscopic polarimeter which is easy to adjust the focus, has no chromatic aberration, maintains the polarization and has simple structure. The normal incidence broadband spectroscopic polarimeter can make the probe beam normal incidence and focus on the sample surface by using at least one flat reflector element to change propagation direction of the focused beam. Moreover, the normal incidence broadband spectroscopic polarimeter contains at least one polarizer as to measure the anisotropy or non-uniform samples, such as three-dimensional profile and material optical constants of thin films consisting of the periodic structure. An optical measurement system including the normal incidence broadband spectroscopic polarimeter is also provided.

Abstract: A method for determining a flatness characteristic for a facet of a polygon assembly includes a) rotating a polygon assembly with facets at a desired speed, b) directing a light beam from a light source toward the polygon assembly so light is reflected by consecutive facets during revolutions of the polygon assembly, reflected light passing through a focusing lens that directs a spot light toward a target with spaced-apart bars arranged in a grating pattern that block a portion of the reflected light and allows another portion to pass through another focusing lens that directs another spot light toward a light sensor, the light sensor detecting intensity of the spot light, and c) measuring the intensity over time during revolutions of the polygon assembly to obtain measurements for each facet. An associated test setup includes a fixture, motor controller, light source, light sensor, two focusing lens, target, and system controller.

Abstract: Provided is a real-time spectroscopic ellipsometer capable of obtaining information on properties of a sample, a nano pattern shape, in real time by measuring and analyzing, for a plurality of wavelengths, a change in a polarization state of incident light generated while being reflected or transmitted due to the sample when light having a specific polarization component is incident to the sample.

Abstract: A system (40) for diagnosis and staging of early stages of cancer in the tissue of a patient is provided. The system—is configured to combine information from a Polarized Light Scattering Spectroscopy measurement (70) having a first probe depth, and a Differential Path Length Spectroscopy measurement (60) having a second probe depth, wherein the second probe depth is set larger than' the first probe depth. By comparing the results of the Polarized Light Scattering Spectroscopy and Differential Path Length Spectroscopy measurements early stages of cancer, such as dysplasia may be detected. Also hyperplasia, carcinoma in situ, and carcinoma may be detected. A computer-readable medium, method and use are also provided.

Abstract: The present invention provides for an apparatus for measuring a curvature of a surface of a wafer in a multi-wafer epitaxial reactor.

Abstract: An ellipsometer for determining thickness and ellipsometric parameters (? and ?) of a thin film material. The apparatus includes a light source emitting light, a transmitting optical system that has a polarizer, modulator and an optical compensator for conveying polarized modulated light for incidence on a film, and a receiving optical system that has an analyzer and conveys the reflected light to a photodetector device. The apparatus is used for full range measurement of ellipsometric parameters by applying two-phase detection method. It also determines thickness of thin films with a high degree of accuracy.

Abstract: A method of real-time processing and monitoring comprises the steps of blending a material of interest (e.g., an active pharmaceutical material), with a secondary material, (e.g., an excipient), illuminating the blended materials with light, reflecting light carrying information about the blended materials through at least one multivariate optical element (148) and detecting said light with a first detector (152), detecting a deflected portion of the information carrying light with a second detector (156), and determining in real-time at least one selected property of the blended materials based on the detector outputs.

Abstract: Ellipsometry systems and ellipsometry data collection methods with improved stabilities are disclosed. In accordance with the present disclosure, multiple predetermined, discrete analyzer angles are utilized to collect ellipsometry data for a single measurement, and data regression is performed based on the ellipsometry data collected at these predetermined, discrete analyzer angles. Utilizing multiple discrete analyzer angles for a single measurement improves the stability of the ellipsometry system.