Abstract: A combination of a focusing means, and a filtering means which naturally adjusts the cross-sectional area of a beam of electromagnetic radiation passed to the focusing means as a function of wavelength, optionally as an element of an ellipsometer or polarimeter system.

Abstract: Instruments and methods relating to surface plasmon imaging are described. An instrument comprises a semi-circular rail and a driving mechanism. The driving mechanism is attached to a light source mount and a detector mount, and both the light source mount and the detector mount are attached to the semi-circular rail with connectors. Each connector allows the light source mount and detector mount to slide along the rail. The synchronous movement of the light source mount and the detector mount changes the angle of incidence of a light beam from the light source with respect to the plane of the sample surface on the sample stage.

Abstract: Application of digital light processor (DLP) systems in an imaging ellipsometer or imaging polarimeter with a focusing means, sample and detector arranged to meet the Scheimpflug condition.

Abstract: An imaging system with an imaging mechanism which includes polarization analyzers, which may be crossed polarization analyzers, positioned to provide birefringence images of particles in the fluid passing through the flow chamber. Captured images are of high resolution and may be used in comparison to known images of a library of images. The system and related method enhance the accuracy and sensitivity of particle monitoring by utilizing birefringence imaging combined with particle analysis and the detection of each particle's characteristic features, such as crystalline features. The system includes a scatter detector used to trigger backlighting of the flow chamber and capture images of particles therein.

Abstract: A measurement system for monitoring an LED chip surface roughening process is described. A reflective illuminator can run reflectance measurements. A vertical positioning means can adjust a distance between an objective lens and an industrial sample. A horizontal positioning means can move objects in XY plane, and is specifically configured to hold the industrial sample and a reference sample. An optical sensor can acquire images of the industrial sample. A spectrometer can acquire reflectance spectrums of the industrial sample and the reference sample. A processor can control these components. The processor can perform deskew, and calculate an average reflectance and an oscillation amplitude from the reflectance spectrums of the industrial sample.

Abstract: The present invention provides a defect inspection apparatus having high sensitivity and high throughput capabilities in defect inspection of a sample on which a pattern is formed, such as a semiconductor wafer. One feature of the present invention is that a direction of a pattern, directions in which illumination light beams are projected on a sample, and polarization of the illumination light beams are paid attention to. Another feature of the present invention is that projections on the sample in at least two illumination directions are perpendicular to or in parallel with a direction of the main pattern of the sample, and that the polarization of the illumination light beam in the first direction differs from the polarization of the illumination light beam in the second direction. Still another feature of the present invention is that the projection in the first direction and the projection in the second direction are perpendicular to each other.

Abstract: Mapping ellipsometer and polarimeter systems which comprise polarization state change compensating beam directing means.

Abstract: A system for and method of allowing visual observation of a sample being subject to investigation by an electromagnetic beam, to identify where thereupon a beam of sample investigating electromagnetic radiation is caused to impinge, in combination with a data detector of the beam of sample investigating electromagnetic radiation after it interacts with the sample.

Abstract: Before semiconductor units are shipped to customers, each unit is electrically tested for ensuring its functionality. However, when a unit is stuck in a test area of a testing equipment, subsequent units are thereafter not properly tested. A reflective sensor is used to check for a stuck unit within the test area. The reflective sensor includes a transmitter and a receiver. In each test cycle, a signal is transmitted toward the test area. An alert indicating a stuck unit is generated when: (1) the reflectivity and/or color of the transmitted signal is different from a bare test area reflectivity and/or color, (2) a reflected signal is received outside a window of the receiver or is not received by the receiver, or (3) the reflected signal has the same light intensity as the transmitted signal. Embodiments of the present invention protect untested units from being inadvertently shipped to customers.

Abstract: In an evaluation device an analyzer is rotated so that the azimuth of the transmission axis of the analyzer has an inclination angle of 90 degrees±3 degrees with respect to the transmission axis of a polarizer. An imaging camera captures a regularly reflected image of a wafer under each condition, and an image processing unit evaluates the shape of a repeating pattern and detects dose defects and focus defects on the basis of the two images of the wafer captured by the imaging camera.

Abstract: A Mueller ellipsometer of the type having a first rotating element on an incident beam side of a sample and a second rotating element on a reflected beam side of the sample and a detector having an integration time, having a controller for selectively and separately adjusting (1) a first angular frequency of the first rotating element and (2) a second angular frequency of the second rotating element.

Abstract: A non-invasive measurement of biological tissue reveals information about the function of that tissue. Polarized light is directed onto the tissue, stimulating the emission of fluorescence, due to one or more endogenous fluorophors in the tissue. Fluorescence anisotropy is then calculated. Such measurements of fluorescence anisotropy are then used to assess the functional status of the tissue, and to identify the existence and severity of disease states. Such assessment can be made by comparing a fluorescence anisotropy profile with a known profile of a control.

Abstract: In an embodiment, call information is received indicating that a called party, responsive to receiving a call from a calling party, desires to record a complaint against the calling party relating to receipt of the call. A call complaint based on the call information is added to a complaint database. Call rejection information based on the call information is forwarded to a call rejection database configured to indicate blocking of further calls from the calling party to the called party. The complaint information may be forwarded to the complaint database through a number of different communications paths. In another embodiment, a request for a change in status of an identifier entry on a user call rejection list is received. The status of the identifier entry on the user call rejection list is changed based on a comparison of the current status of the identifier entry with the request.

Abstract: Technologies are generally described for methods and systems for sensing or imaging. The apparatus includes a stack of a plurality of thin films, such as polymer thin films. The stack has a substantially imaginary total reflectance coefficient.

Abstract: A system and process for analyzing a sample includes an excitation section and an analyze section, said excitation section including a light source emitting an incident measurement luminous beam, a polarization state generator (PSG), first optics, and said analyze section includes a polarization state analyzer (PSA), a detection system and second optics. The excitation section includes an illumination source emitting an incident visualization luminous beam, superposition optics that direct the incident visualization luminous beam toward the sample surface along an optical axis which is identical to the optical axis of the incident measurement luminous beam and the analyze section includes separation optics that transmit a part of the reflected or transmitted visualization luminous beam and a part of the reflected or transmitted measurement luminous beam towards a visualization direction.

Abstract: The present invention relates to a minute measuring instrument for high speed and large area and a method thereof, and more particularly, to a minute measuring instrument for high speed and large area which measures properties of a specimen in high speed by a focused-beam ellipsometric part and then minutely remeasures the position showing a singular point by a minute measuring part and a method thereof.

Abstract: Light from a light source device is polarized through a polarizer and is caused to impinge obliquely onto an object to be inspected. The resulting scattered light is received by a CCD imaging device having an element for separating scattered polarized light disposed in a dark field. Component light intensities are worked out for an obtained P-polarized component image and an obtained S-polarized component image and a polarization direction is determined as a ratio of them. The component light intensities and the polarization directions are determined from images obtained by imaging of the light scattering entities in a state where static stress is not applied to the object to the inspected and in a state where static load is applied thereto so as to generate tensional stress on the side irradiated by light. The component light intensities and the polarization directions are compared with predetermined threshold values.

Abstract: A method and system are presented for use in characterizing properties of an article having a structure comprising a multiplicity of sites comprising different periodic patterns. The method comprises: providing a theoretical model of prediction indicative of optical properties of different stacks defined by geometrical and material parameters of corresponding sites, said sites being common in at least one of geometrical parameter and material parameter; performing optical measurements on at least two different stacks of the article and generating optical measured data indicative of the geometrical parameters and material composition parameters for each of the measured stacks; processing the optical measured data, said processing comprising simultaneously fitting said optical measured data for the multiple measured stacks with said theoretical model and extracting said at least one common parameter, thereby enabling to characterize the properties of the multi-layer structure within the single article.

Abstract: An ellipsometer includes an integrated focusing system with a beam splitter between the sample and the ellipsometer detector. The beam splitter provides a portion of the radiation to a lens system that magnifies any deviation from a best focus position by at least 2×. The focusing system includes a 2D sensor, where the spot of light focused on the sensor is 50 percent or smaller than the sensor. The focusing system may further include a compensator to correct optical aberrations caused by the beam splitter. A processor receives an image signal and finds the location of the spot from which focus error can be determined and used to correct the focal position of the ellipsometer. The processor compensates for movement of the spot caused by rotating optics. Additionally, a proportional-integral-derivative controller may be used to control exposure time and/or gain of the camera.

Abstract: A method and apparatus for testing a magnetic medium. The method comprises applying a magnetic field of a time-varying strength; directing a polarized optical beam towards a portion of the medium that is in the magnetic field, wherein the optical beam is reflected by a surface of the medium at a point of incidence in the magnetic field; moving the medium relative to the optical beam so as to cause the point of incidence to repeatedly traverse each of a plurality of sectors along a track on the surface; obtaining a series of Kerr signal measurements of the reflected optical beam; grouping measurements into ensembles such that the measurements in an individual ensemble are those obtained while the point of incidence was in a corresponding one of the sectors; and determining at least one magnetic property of at least one of the sectors from the measurements in the corresponding ensemble.

Abstract: A method of selecting for analysis a sample of a biological material anisotropically distributed on a substrate, said method comprising the steps of directing a beam of radiation onto said substrate, said radiation being selected to interact with said anisotropically distributed biological material to an extent corresponding to said anisotropy; measuring said interaction at plurality of locations on said substrate; and selecting said sample by reference to said measurements. An inspection apparatus for selecting for analysis a sample of a biological material anisotropically distributed on a substrate is also disclosed.

Abstract: A device (2) for evaluating the state of wetting of a surface (8) includes an emitter (4) emitting a beam (F, F1, F2) which is incident in the direction of the surface (8) and a single element (12) for receiving the beam reflected by the surface (8). The device includes: A polarization (10, 13, 14) including a first polarization zone (13) and a second polarization zone (14) designed to polarize a first part (F1) and a second part (F2) of the beam in a first and a second polarization direction; and a evaluation element (28) for calculating a polarization ratio between the polarizations of the first part of the reflected beam and the second part of the reflected beam to evaluate the state of wetting of the surface (8). Also described is an evaluation process and an associated indicator device.

Abstract: There is provided a surface inspection device configured to detect the surface state of the wafer, such as a defect in the uppermost layer and a variation of the CD value, using even diffracted light influenced by the baselayer. The surface inspection device is configured so that an illumination section illuminates the surface of a wafer with a first illuminating light at a high incident angle which is sensitive to a variation of the surface state of the wafer and a second illuminating light at a low incident angle which is insensitive thereto, a detection section detects diffracted light caused by the high and low incident angles, respectively, and a computing unit determines the CD value after correcting the influence of the baselayer of the wafer based on the information relating to the diffracted lights due to the high and low incident angles.

Abstract: An ellipsometer, polarimeter, reflectometer, spectrophotometer or scatterometer system for use in the UV and infrared range of wavelengths, characterized by the combination of a fiber optic capable of transmitting wavelengths from below 2.2 micron up to at least 3.5 microns, and a beam collimator formed from a combination of two off-axis concave astigmatism reducing spherical mirrors capable of operating between about 190 nm up to 5.5 microns.

Abstract: The embodiments relate to a method of calculating an image for simulating by calculation an image imaged by a projection optical system. In this method, a Stokes vector showing a characteristic of an illumination light is acquired first. Next, this Stokes vector is divided into a polarized light component vector and a non-polarized light component vector. The polarized light component vector is divided into a first coherent component vector and a first non-coherent component vector. The non-polarized light component vector is divided into a second coherent component vector and a second non-coherent component vector. Then, imaging calculation is performed at least for the first coherent component vector and the second coherent component vector, respectively.

Abstract: A system for and method of mapping process samples which are present in an environmental control chamber at a plurality of “X”-“Y” locations on the surface thereof, wherein the system includes a shield between windows for entering and exiting a beam of electromagnetic radiation, and a process sample.

Abstract: A method of applying spectroscopic ellipsometry to arrive at accurate values of optical and physical properties for thin films on samples having rough or textured surfaces.

Abstract: A measurement device for the determination of the characteristics of the object's surface by means of the optical radiation, wherein a measurement device comprises an optical radiation source and a detector to receive the radiation reflected from the surface being measured. In addition, a measurement device comprises an emitted optical radiation processing unit, which is adjusted to split optical radiation emitted by an optical source into separate wavelengths and to direct said separate wavelengths to the object being measured in a direction, that differs from the normal of the surface being measured so, that at least the shortest and the longest wavelengths of said wavelengths are focused on different halves and different heights of the measured object's surface, in the direction of the normal of the surface being measured.

Abstract: A structure including at least one airfoil, at least one device for detecting surface conditions on a surface of the at least one airfoil, and at least one sensor device, the sensor device including at least one radiation emitter adapted to emit radiation directed towards at least one surface of the airfoil, at least one first detector arranged for receiving a portion of the emitted radiation when reflected from the at least one surface and producing a first output according to an intensity thereof, at least one second detector arranged for receiving a portion of the emitted radiation when reflected from the at least one surface and producing a second output according to an intensity thereof, and control means adapted to receive and evaluate the output from the detectors based on an amount of diffuse reflected and mirror reflected radiation reflected from the at least one surface, and producing an output according thereto.

Abstract: The present invention relates to a prism for inducing Brewster's angle transmission and a fluorescence detection apparatus for enhancing a signal-to-noise ratio using thereof, and more specifically, to a prism for inducing Brewster's angle transmission and a fluorescence detection apparatus for enhancing a signal-to-noise ratio using thereof, in which evanescent waves are generated when light is cast onto fluorescence material applied on a sample surface at an angle greater than a critical angle, and the evanescent waves are used as excitation light of fluorescence to induce total internal reflection of the light so that the light may pass through the prism at a Brewster's angle. Therefore, effects of the re-reflected light on the sample surface are removed, and a signal-to-noise ratio (SNR) is improved at the same time. In addition, the prism is miniaturized, and therefore, usage of the sample area and efficiency of the light amount are improved.

Abstract: Provided is an oxygen sensor using surface plasmon resonance, including: a laser diode emitting light; a polarizer converting the emitted light into polarized light; a prism receiving the polarized light from the polarizer and having a sensor substrate on one surface thereof so that the polarized light is reflected, the sensor substrate coated with oxygen-sensitive organic material; an oxygen concentration measurement chamber provided to enclose the sensor substrate so that oxygen whose concentration is to be measured is contained therein; a photodiode measuring an amount of light reflected from the prism; and a microcontroller unit controlling operation of the oxygen sensor and calculating the oxygen concentration.

Abstract: An optical metrology apparatus for measuring nanoimprint structures using Vacuum Ultra-Violet (VUV) light is described.

Abstract: A system and method for improving data provided by ellipsometer, polarimeter and the like systems involving diminishing the effects of undesirable noise in the intensity of a beam of electromagnetic radiation caused by, for instance, random variations in intensity of a source provided beam of electromagnetic radiation and/or periodic or non-periodic variations in beam intensity resulting from wobble/wander of a moving sample, during investigation of the sample by the beam of electromagnetic radiation.

Abstract: Optical systems and methods are described that provide greater solving power for thin-film measurements in general, and provide a unique model-free solution for single-layer films in particular.

Abstract: An optical metrology device produces a broadband beam of light that is incident on and reflected by a sample and introduces multiple variations in the polarization state of the beam of light induced by an optical chiral element. Using the detected light, the Muller matrix or partial Mueller matrix for the sample is determined, which is then used to determine a characteristic of the sample. For example, simulated spectra for a Mueller matrix for a model is fit to the measured spectra for the Mueller matrix of the sample by adjusting the parameters of the model until an acceptable fit between the simulated spectra and measured spectra from the Mueller matrices is produced. The varied parameters are then used as the sample parameters of interested, which can be reported, such as by storing in memory or displaying.

Abstract: A surface plasmon apparatus includes a light source, a sensor unit for Surface Plasmon Resonance (SPR) which includes a transparent sensor structure forming at least one wall of a cavity, the wall being defined by a concave inner surface and a convex outer surface, wherein the inner surface is provided with a layer of a conductive material capable of supporting a surface plasmon, a flow structure in the cavity so as to form at least one compartment for sample between the flow structure and the inner wall of the cavity, a detector for detecting reflected light from the sensor unit, and a processing unit.

Abstract: An electronic polarimetric imaging system for a colposcopy device designed for in vivo observation of a cervix, wherein the colposcopy device includes a light source for illuminating the observable cervix and at least visual elements for monitoring an image of the cervix, the illumination optical path towards the cervix and the image optical path coming back from the cervix being separated from one another over at least one portion of the paths thereof. The system includes a polarimetric adapter housing which is removable into the separated portion of the illumination and image optical paths, the polarimetric adapter housing including a polarisation state generator (PSG) on the illumination optical path and a polarisation analyser (PSA) on the image optical path, wherein the polarisation state generator (PSG) and the polarisation analyser (PSA) are controllable. Several levels of polarimetric characterisation are possible. An adaptor housing is also disclosed.

Abstract: A surface inspection apparatus includes: an irradiation unit; a detection unit configured to detect a first detection signal according to a first light beam and a second detection signal according to a second light beam; a providing unit which is configured to provide a first reference data and a second reference data; and a determination unit which is configured to determine a processing condition of the pattern in the substrate as an inspection object substrate, based on consistency between the first detection signal and the first reference data, and consistency between the second detection signal and the second reference data.

Abstract: In an optical position-measuring device for recording the relative position of a scanning unit and a measuring standard, the scanning unit includes a light source, first annular scanning graduation, reflector element, beamsplitter element, and detection unit. A beam emitted by the light source impinges on the measuring graduation and is split into at least two partial beams of rays. The partial beams propagate toward the scanning unit, impinge the first scanning graduation on the reflector element, are reflected through the first scanning graduation toward the measuring graduation, impinge the measuring graduation, propagate toward the scanning unit and undergo superposition, and are deflected by the beamsplitter element toward the detection unit. There, a plurality of positionally dependent, phase-shifted scanning signals can be recorded.

Abstract: A surface position detection apparatus capable of highly precisely detecting the surface position of a surface to be detected without substantially being affected by relative positional displacement due to a polarization component occurring in a light flux having passed through a reflective surface. In the apparatus, a projection system has a projection side prism member (7) having first reflective surfaces (7b, 7c), and a light receiving system has a light receiving prism member (8) having second reflective surfaces (8b, 8c) arranged in correspondence with the projection side prism member.

Abstract: An optical inspection system includes a polarizing isolator that reduces error in measurements by preventing ghost light reflected or scattered from element of a detection subsystem from re-entering the illumination and detection optical paths. The polarizing isolator may include a polarizing splitter that isolates light directionally according the a linear polarization state and two quarter-wave plates for transforming linearly polarized light to circularly polarized light.

Abstract: Provided is an optical displacement meter capable of accurately detecting a displacement of an object. A light-projecting part selectively irradiates a workpiece with first and second light whose polarization directions are different from each other. Reflected light from the workpiece is incident on a light-receiving element through a light-receiving lens. A waveform creating part creates first and second waveform data showing light-receiving amount distributions of the first and second light obtained by the light-receiving element. A waveform processing part calculates a ratio between mutually corresponding peaks in the first and second waveform data, and selects one peak from each of the first and second waveform data based on the calculated ratios, to detect a position of the peak.

Abstract: An optical measurement apparatus includes: a storage processing part storing into a storage part a plurality of main reference positions where measurement is to be performed and at least one movement value relative to each main reference position; a main measuring part moving a measurement position to one of the main reference positions stored in the storage part, then irradiating light, and then measuring a change in a state of reflected light; an auxiliary measuring part moving the measurement position to an auxiliary reference position based on the movement value relative to one of the main reference positions stored in the storage part, then irradiating light, and then measuring a change in a state of reflected light; a main calculating part performing analysis and calculating a film thickness or an optical constant; and an auxiliary calculating part performing analysis and calculating a film thickness or an optical constant.

Abstract: A detection system includes a retroreflector and a layer of material over the retroreflector, the material being subject to change in transmission with respect to an optical property of radiation, e.g. wavelength or polarization, with exposure to a phenomenon. The retroreflector and layer are illuminated from a radiation source of multiple aspects of the optical property. A sensor senses radiation retroreflected back through the layer. The retroreflector may, for example, be an array of or individual prisms or an array of or individual cat's eye microspheres. The layer of material above the retroreflector can include a colorimetric dye. In an embodiment, the retroreflector and layer are on the surface of a carrier that moves through a medium, e.g. a projectile or vehicle moving through the air. In a method of detecting a phenomenon, retroreflective elements are distributed in an array, as in the atmosphere or across a region of ground.

Abstract: An optical sensor includes an irradiation system including a semiconductor laser having plural light-emitting parts; and at least one photodetector that detects an amount of light which is emitted from the irradiation system and reflected on a sheet-like object.

Abstract: Control of the angle-of-incidence of a beam of electromagnetic radiation provided by a horizontally oriented arc-lamp in ellipsometer, polarimeter, spectrophotometer, reflectometer, Mueller matrix measuring, or the like systems.

Abstract: Provided is an unevenness detecting apparatus comprising a determining section that determines a polarization state of returned light obtained from radiated light; an uneven portion judging section that judges whether an uneven portion is present based on the polarization state determined by the determining section; a convex/concave identifying section that identifies whether the uneven portion is convex or concave based on image data, captured by an image capturing element, of the uneven portion; and an output section that outputs information identifying whether the uneven portion is convex or concave.

Abstract: An apparatus for determining the depolarization efficiency of a environment includes a transmitter, a receiver, and signal processing circuitry. A reference object is located within the environment at a reference distance. The transmitter includes a radiation source providing incident radiation that has an initial polarization as it enters the environment. The receiver receives returned radiation from the reference, which may be diffuse reflection or photoluminescence. The signal processing circuitry calculates the depolarization efficiency of the environment from the initial polarization, luminescence or final polarization, and the reference distance. A method of determining depolarization efficiency includes directing incident radiation having initial polarization through an environment onto a reference, detecting returned radiation from the reference, and calculating the depolarization efficiency using the initial polarization and the luminescence or final polarization.

Abstract: An optical device for assessing optical depth in a sample illuminated by polarized radiation from a source include two radiation guides having their end portions arranged for capturing reflected radiation from the sample. A detector measures two polarizations of the reflected radiation, and two intensities of the reflected radiation in the two radiation guides, respectively. A processor is configured to calculate two pectral functions, which are indicative of single scattering events in the sample. The processor is further configured to calculate a measure of the correlation between the two spectral functions so as to assess whether the single scattering events originate from substantially the same optical depth within the sample. Thus, the causal relation between the two spectral functions can be used for assessing whether the single scattering events giving rise to the two spectral functions come from substantially the same optical depth within the sample.

Abstract: An arrangement and method for imaging and/or measuring tissue qualities, such as tissue thickness, tissue surface roughness and degree of tissue fiber linearization. The arrangement includes at least one light generating element, at least one light detecting element, a probe with an extension, and possibly a control apparatus including a signal processor for processing the detected signals and/or images. The extension is designed to convey light from the light generating element to the tissue for visualization and/or measurement. The extension is also designed to convey light back-scattered from the tissue to the light detecting element. The detecting element is designed to measure the intensity and/or spatial distribution of light back-scattered from the tissue.