Abstract: Disclosed is a system for controlling focus, angle of incidence and intensity of an electromagnetic beam over a spectrum of wavelengths, and methodology for optimizing investigation of samples which demonstrate low specular reflectance and/or are depolarizing of a polarized beam of electromagnetic radiation, such as solar cells.

Abstract: The present invention relates to near-field scanning optical microscopy (NSOM) and near-field/far-field scanning microscopy methods, systems and devices that permit the imaging of biological samples, including biological samples or structures that are smaller than the wavelength of light. In one embodiment, the present invention permits the production of multi-spectral, polarimetric, near-field microscopy systems that can achieve a spatial resolution of less than 100 nanometers. In another embodiment, the present invention permits the production of a multifunctional, multi-spectral, polarimetric, near-field/far-field microscopy that can achieve enhanced sub-surface and in-depth imaging of biological samples. In still another embodiment, the present invention relates to the use of polar molecules as new optical contrast agents for imaging applications (e.g., cancer detection).

Abstract: Instead of constructing a full multi-dimensional look-up-table as a model to find the critical dimension or other parameters in scatterometry, regression or other optimized estimation methods are employed starting from a “best guess” value of the parameter. Eigenvalues of models that are precalculated may be stored and reused later for other structures having certain common characteristics to save time. The scatterometric data that is used to find the value of the one or more parameter can be limited to those at wavelengths that are less sensitive to the underlying film characteristics. A model for a three-dimensional grating may be constructed by slicing a representative structure into a stack of slabs and creating an array of rectangular blocks to approximate each slab. One dimensional boundary problems may be solved for each block which are then matched to find a two-dimensional solution for the slab.

Abstract: Methods and systems for fabricating and testing semiconductor devices are disclosed. In one embodiment, a method of forming a material includes providing a first workpiece, forming a material on the first workpiece using a first process condition, and measuring a defect state of the material using a test that utilizes a monochromatic light source. If the defect state is below a predetermined value, the material is formed on at least one second workpiece using the first process condition.

Abstract: An apparatus and method for providing image contrast enhancement is disclosed. A mobile object is equipped with a laser source, polarization filter, and imaging apparatus. The reflection of the laser source output passes through the filter and is received by the imaging apparatus. If the output of the laser source impinges a metallic marker plate located at a pre-determined location, the filter decreases the intensity level of image components not associated with the reflection of the laser source output. The imaging apparatus uses such filtered image components to determine the position and/or orientation of the mobile object.

Abstract: A method of optimising the sensitivity of surface plasmon ellipsometry (SPE) apparatus used to analyse a surface comprising a conducting film, the method comprising calculating a sensitivity map of SPE for the film, the sensitivity map comprising data defining variations in sensitivity of said SPE apparatus with angle of incidence and polarisation angle of polarised light incident on said film for analysis by said SPE apparatus, and using said sensitivity map to configure said SPE apparatus with a combination of said angle of incidence and polarisation angle located in a region of substantially maximum sensitivity in said sensitivity map.

Abstract: A method and apparatus for convolving spectroscopic data with certain phase information for practicing phase-compensated sensitivity-enhanced spectroscopy (PCSES). PCSES uses a beam of radiation in a polarization state PSp from a source emitting at a plurality of wavelengths, and places in the beam a compensator capable of altering polarization state PSp by applying a delimited phase shift ? between two orthogonal polarization axes of the radiation to restrict a finely-vibrating spectrum. A sample disposed in the beam after the compensator generates a response beam by reflection, transmission or even both. A polarization state PSa of the response beam is passed to a detector to determine a spectrum of the response beam. A first spectrum is collected when polarization states PSp, PSa and the compensator are in a first polarization-altering configuration and a second spectrum is collected when polarization states PSp, PSa and the compensator are in a second polarization-altering configuration.

Abstract: A robust multichannel SPR instrument with exceptionally high sensitivity (<pg/mm2). The instrument utilizes an SPR detection scheme providing multiple reflections from a planar light guide configuration to amplify the reflected light intensity changes near the resonance angle. This SPR approach is amenable to simultaneous multichannel detection while maintaining high sensitivity with a simple, cost-effective design. The idea of using multiple reflections to excite multiple surface plasmon waves seems counterintuitive at first because the SPR resonance will be broadened; the broadened resonance will diminish sensitivity for angle or wavelength detection modes. However, changes in reflected light intensity near the resonance angle will be amplified by the multiple reflections, thereby increasing the sensitivity of SPR utilizing intensity detection at a fixed angle of incidence.

Abstract: An ellipsometer is used to analyze each of a plurality of sample portions that each include a substrate portion with a coating portion thereon, the substrate portions corresponding to respective spaced portions of a part with a curved surface. For each sample portion, the analysis includes: directing onto the coating portion a beam of radiation that includes first and second components with different polarizations; detecting energy of each of the first and second components reflected by the sample portion; and generating data that includes, for each of a plurality of different wavelengths, information regarding a change caused by the sample portion to a relationship between the first and second components.

Abstract: A polarimeter includes a multi-wavelength source for generating electromagnetic waves having at least two different wavelengths, means for separating electromagnetic waves, the electromagnetic waves including electromagnetic waves generated by the multi-wavelength source and electromagnetic waves received from a sample contacted by the electromagnetic waves generated by the multi-wavelength source, a fixed waveplate, wherein the fixed waveplate is configured to convert one polarization state to multiple polarization states that allow for calculations of linear and circular polarization components of the electromagnetic waves, a free space coupler, a beam splitter, and more than one detector. The polarimeter may be used in a method for high-speed measurement of linear and circular polarization components of electromagnetic waves.

Abstract: A system and method of substantially achromatically controlling the intensity of a spectroscopic beam with application in spectrophotometers, reflectometers, ellipsometers, polarimeters or the like systems.

Abstract: The present invention relates to a prism for inducing Brewster's angle transmission and a fluorescence detection apparatus for enhancing a signal-to-noise ratio using thereof, and more specifically, to a prism for inducing Brewster's angle transmission and a fluorescence detection apparatus for enhancing a signal-to-noise ratio using thereof, in which evanescent waves are generated when light is cast onto fluorescence material applied on a sample surface at an angle greater than a critical angle, and the evanescent waves are used as excitation light of fluorescence to induce total internal reflection of the light so that the light may pass through the prism at a Brewster's angle. Therefore, effects of the re-reflected light on the sample surface are removed, and a signal-to-noise ratio (SNR) is improved at the same time. In addition, the prism is miniaturized, and therefore, usage of the sample area and efficiency of the light amount are improved.

Abstract: An inspection apparatus and method includes a light source which emits an ultraviolet laser beam, an illuminating unit having a polarization controller and an object lens for illuminating a specimen with light emitted from the light source and passed through the polarization controller and the object lens, a detection unit having a sensor for detecting light from the specimen illuminated by the illuminating unit, a processor which processes a signal output from the sensor so as to detect a defect on the specimen, and a display which displays information output from the processor. The processor processes an image formed from the signal output from the sensor in which the image is reduced in speckle pattern.

Abstract: According to the present invention, a polarized image is captured, a variation in its light intensity is approximated with a sinusoidal function, and then the object is spatially divided into a specular reflection area (S-area) and a diffuse reflection area (D-area) in Step S402 of dividing a reflection area. Information about the object's refractive index is entered in Step S405, thereby obtaining surface normals by mutually different techniques in Steps S406 and S407, respectively. Finally, in Steps S410 and S411, the two normals are matched to each other in the vicinity of the boundary between the S- and D-areas.

Abstract: The illumination profile of a radiation beam is initially measured using a CCD detector. A reference mirror is then placed in the focal plane of the high aperture lens and the reflected radiation measured. By comparing the illumination profile and the detected radiation it is possible to determine the transmission losses for S and P polarisation which can then be used in scatterometry modeling.

Abstract: Disclosed is a method for characterizing a sample having a structure disposed on or within the sample, comprising the steps of applying a first pulse of light to a surface of the sample for creating a propagating strain pulse in the sample, applying a second pulse of light to the surface so that the second pulse of light interacts with the propagating strain pulse in the sample, sensing from a reflection of the second pulse a change in optical response of the sample, and relating a time of occurrence of the change in optical response to at least one dimension of the structure.

Abstract: A system for reducing reflections of a beam of electromagnetic radiation from the opposite, back, surface of an anisotropic sample, including methodology for investigating the incident, front, surface thereof with electromagnetic radiation, and analyzing the data as if the sample is isotropic.

Abstract: Application of digital light processor (DLP) systems in monochromator, spectrophotometer or the like systems to mediate selection of individual wavelengths, and/or to image elected regions of a sample in an imaging ellipsometer, imaging polarimeter, imaging reflectometer, imaging spectrophotometer, and/or to provide chopped beams.

Abstract: This invention concerns the in-situ and real-time determination of thickness, optical properties and quality of transparent inorganic thin films (oxides, nitrides) and organic materials during their growth and during modification of transparent polymeric materials, with the use of Spectroscopic Ellipsometry, with measurements in the spectral region of Vis-FUV from 1.5-6.5 eV, and IR from 0.1-0.49 eV (900-4000 cm?1). This method can be used in-line for the monitoring and/or control of the processes in air and in vacuum, that concern substrates on which the thin films will be grown, and of the growth processes of transparent oxides, nitrides and other inorganic and organic films with final result the production of integrated systems with desirable properties.

Abstract: Method and a polarimetric measurement device of a planar object carrying patterns repeated regularly and forming the lines of a grid. A first measurement is carried out at zero order, under an angle of incidence ?1 and for a first azimuthal angle ?1, a second measurement at least is carried out at zero order, under an angle of incidence ?2 and for a second azimuthal angle ?2, the polarization of the incident beam is modulated and the polarization of the reflected beam is analyzed for each measurement, theoretical polarimetric data is calculated for a model object of the real object, the model object including parameters adjustable using a formalism of electromagnetism. An iterative comparison of the measurements is conducted with the theoretical polarimetric data for different values of the adjustable parameters.

Abstract: Techniques, apparatus and systems that use an optical probe head to deliver light to a target and to collect light from the target for imaging, monitoring, medical diagnostics and medical treatment applications.

Abstract: An apparatus for classifying articles may include a frame connected to (1) transport means for directing articles to create a product stream, (2) an emitter section having a radiation source and (3) a detection section for detecting a portion of radiation reflected by articles. The detection section may include first detection means for converting radiant power of reflected radiation having a first polarization state into a first electrical signal, second detection means for converting radiant power of reflected radiation having a second polarization state into a second electrical signal, and third detection means for converting radiant power of reflected radiation into a third electrical signal. Control circuitry, which may receive the electrical signals, may include decision means for generating a selection signal. Selection means may separate an article from the product stream according to the received selection signal from the control circuitry.

Abstract: Disclosed is the use of a focused electromagnetic beam which is caused to impinge on the top surface of a tube shaped sample, to investigate a film coating on its inner surface during fabrication thereof and/or thereafter.

Abstract: The present invention relates to an imaging device (1) for imaging microscopic or macroscopic objects (5). The imaging device (1) comprises a light source (2), an illumination beam path (6), an imaging beam path (7) and an imaging optical means (4), in particular in the form of an objective. The illumination beam path (6) extends from the light source (2) to the object (5). The imaging beam path (7) extends from the object (5) to a detector or a tube (3). At least one polarization means (9) is provided in the illumination beam path (6), which polarization means (9) can be used to convert the light of the light source to a prescribable polarization state. An analyzer means (10) is provided in the imaging beam path (7), with the analyzer means (10) and the polarization means (9) being able to be adjusted in relation to one another in such a manner that the light entering the imaging beam path (7) cannot pass through the analyzer means (10).

Abstract: Various systems for measurement of a specimen are provided. One system includes a first optical subsystem, which is disposed within a purged environment. The purged environment may be provided by a differential purging subsystem. The first optical subsystem performs measurements using vacuum ultraviolet light. This system also includes a second optical subsystem, which is disposed within a non-purged environment. The second optical subsystem performs measurements using non-vacuum ultraviolet light. Another system includes two or more optical subsystems configured to perform measurements of a specimen using vacuum ultraviolet light. The system also includes a purging subsystem configured to maintain a purged environment around the two or more optical subsystems. The purging subsystem is also configured to maintain the same level of purging in both optical subsystems.

Abstract: A surface inspection apparatus includes units illuminating repetitive patterns formed on a surface of a suspected substance and measuring a variation in an intensity of regular reflection light caused by a change in shapes of the repetitive patterns, units illuminating the repetitive patterns with linearly polarized light, setting an angle formed between a repetitive direction of the repetitive patterns and a direction of a plane of vibration of the linearly polarized light at a tilt angle, and measuring a variation in a polarized state of the regular reflection light caused by the change in the shapes of the repetitive patterns, and a unit detecting a defect of the repetitive patterns based on the variation in the intensity and the variation in the polarized state of the regular reflection light.

Abstract: A surface inspection device includes an illumination optical system that illuminates, with a linearly polarized light, a surface of a wafer where a repeated pattern is formed; an alignment stage that holds the wafer; a pick-up optical system that picks up an image of reflected light from the surface of the wafer; an image storage unit that stores the image picked up by the pick-up optical system; an image processing unit that performs predetermined image processing on the image stored in the image storage unit and detects a defect of the repeated pattern; and an image output unit that outputs the results of the image processing by the image processing unit. The orientation of the transmission axis of a second polarizing plate is set to be inclined at 45 degrees with respect to the transmission axis of a first polarizing plate.

Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam; a polarization sensor configured at least in part to couple to a reticle stage, wherein components of the reticle polarization sensor can be loaded and unloaded in the lithographic apparatus in the manner used for conventional reticles. In one configuration an active reticle tool includes a rotatable retarder configured to vary the retardation applied to polarized light received from a field point in the illumination system. In another configuration, a passive reticle tool is configured as an array of polarization sensor modules, where the amount of retardation applied to received light by fixed retarders varies according to position of the polarization sensor module. Accordingly, a plurality of retardation conditions for light received at a given field point can be measured, wherein a complete determination of a polarization state of the light at the given field point can be determined.

Abstract: A pattern inspection apparatus is provided to compare images of regions, corresponding to each other, of patterns that are formed so as to be identical and judge that non-coincident portions in the images are defects. The pattern inspection apparatus is equipped with an image comparing section which plots individual pixels of an inspection subject image in a feature space and detects excessively deviated points in the feature space as defects. Defects can be detected correctly even when the same patterns in images have a brightness difference due to a difference in the thickness of a film formed on a wafer.

Abstract: The above and other needs are met by a method of determining actual properties of a film stack by directing an incident beam of light towards the film stack, such that the incident beam of light is reflected from the film stack as a reflected beam of light. The actual properties of the reflected beam of light are measured, and properties of the film stack are estimated. A mathematical model of the film stack is solved with the estimated properties of the film stack, to yield theoretical properties of the reflected beam of light. The mathematical model is solved in part using a fast Z-matrix algorithm. The theoretical properties of the reflected beam of light are compared to the actual properties of the reflected beam of light, to yield a cost function. The estimated properties of the film stack are iteratively adjusted, and the mathematical model is iteratively solved, until the cost function is within a desired tolerance.

Abstract: An optical method and system for measuring characteristics of a sample using a broadband metrology tool in a purge gas flow environment are disclosed. In the method a beam path for the metrology tool is purged with purge gas at a first flow rate. A surface of the sample is illuminated by a beam of source radiation having at least one wavelength component in a vacuum ultraviolet (VUV) range and/or at least one wavelength component in an ultraviolet-visible (UV-Vis) range. A flow rate of a purge gas is adjusted between the first flow rate for metrology measurements made when the source radiation is in the VUV spectral region and a second flow rate for metrology measurements made when the source radiation is in the UV-Vis spectral region. The system includes a light source, illumination optics, collection optics, detector, a purge gas source and a controller.

Abstract: This invention relates to photonic biosensor arrays in particular employing plasmon resonance based sensing, and to methods and apparatus for reading such arrays. A biosensor array for plasmon resonance-based sensing of a plurality of different biological targets simultaneously, the array comprising a transparent substrate having a surface bearing a plurality of assay spots for plasmon resonance sensing, each of said assay spots comprising a discrete metallic island, a said metallic island comprising a plurality of metallic nanoparticles to which are attached functionalising molecules for binding to a said biological target, different said islands bearing different said functionalising molecules for binding to different ones of said biological targets, and wherein total internal reflection of light at said surface at a wavelength at or near a said plasmon resonance results in scattering of said light away from said surface, said scattering being modulated by said binding of said biological targets.

Abstract: Before the diffraction from a diffracting structure on a semiconductor wafer is measured, where necessary, the film thickness and index of refraction of the films underneath the structure are first measured using spectroscopic reflectometry or spectroscopic ellipsometry. A rigorous model is then used to calculate intensity or ellipsometric signatures of the diffracting structure. The diffracting structure is then measured using a spectroscopic scatterometer using polarized and broadband radiation to obtain an intensity or ellipsometric signature of the diffracting structure. Such signature is then matched with the signatures in the database to determine the grating shape parameters of the structure.

Abstract: Systems and methodology for orienting the tip/tilt and vertical height of samples, preferably automated, as applied in ellipsometer and the like systems.

Abstract: A substantially self-contained “on-board” material system investigation system for effecting relative translational and rotational motion between a source and detector of electromagnetic radiation and a sample, which system is functionally mounted on a three dimensional locational system to enable positioning at desired locations on, and distances from, the surface of a sample, including the capability to easily and conveniently effect rotation and/or to change the angle-of-incidence of a beam of electromagnetic radiation onto a sample surface and/or to provide gas flow confined in a mini-chamber near the surface of a sample, at a location at which a beam having UV, VUV, IR and/or NIR wavelengths of electromagnetic radiation is caused to be impinged thereupon.

Abstract: The simultaneous measurement of four separately polarized beams upon diffraction from a substrate is used to determine properties of the substrate. Circularly or elliptically polarized light sources are passed via up to three polarizing elements. This polarizes the light sources by 0, 45, 90 and 135°. The plurality of polarizing beamsplitters replaces the use of a phase modulator, but enables the measurement of the intensity of all four beams and thus the measurement of the phase modulation and amplitude of the combined beams to give the features of the substrate.

Abstract: A polarizing device including a plurality of polarized light radiating units for radiating polarized light rays each of which is polarized in a particular direction, a rotary reflector for receiving light rays emitted by the plurality of polarized light radiating units while being rotated and for outputting reflected light in a certain direction, and an analyzer disposed midway an optical path of the reflected light from the rotary reflector to set a polarization direction of the reflected light in a certain direction, wherein each of the polarized light radiating units includes a light source, a polarizer for setting a polarization direction of light from the light source, and a first compensator for compensating for a change in a state of polarization attributable to the rotary reflector, and the plurality of polarized light radiating units are disposed in a radial arrangement that is centered at the rotary reflector.

Abstract: At least one surface characteristic of a sample, e.g. gloss, refractive index, micro-roughness, macroroughness, colour shift, is determined by illuminating a surface of the sample with a collimated beam of light at an angle to the plane of the surface and using an imaging detector to record an intensity and angular distribution image of the light from the beam reflected from the surface.

Abstract: The system includes an excitation source for providing a beam of electromagnetic radiation having a source wavelength. A first wavelength selective device is positioned to be impinged by the beam of electromagnetic radiation. The first wavelength selective device is constructed to transmit at least a portion of any radiation having the source wavelength and to reflect radiation of other wavelengths. A medium containing particles is positioned to be impinged by the beam of electromagnetic radiation. At least a portion of the beam of electromagnetic radiation becomes scattered within the medium, the scattered electromagnetic radiation including forward scattered electromagnetic radiation and backward scattered electromagnetic radiation. An optical detector is positioned to receive backward and/or forward scattered electromagnetic radiation.

Abstract: A method and system are presented for use in characterizing properties of an article having a structure comprising a multiplicity of sites comprising different periodic patterns. The method comprises: providing a theoretical model of prediction indicative of optical properties of different stacks defined by geometrical and material parameters of corresponding sites, said sites being common in at least one of geometrical parameter and material parameter; performing optical measurements on at least two different stacks of the article and generating optical measured data indicative of the geometrical parameters and material composition parameters for each of the measured stacks; processing the optical measured data, said processing comprising simultaneously fitting said optical measured data for the multiple measured stacks with said theoretical model and extracting said at least one common parameter, thereby enabling to characterize the properties of the multi-layer structure within the single article.

Abstract: A miniaturized Surface Plasmon Resonance (SPR) imaging system (20) is provided, which includes a light source (21), a sensor substrate (26c) arranged to receive light at an incident angle from the light source, and a detector (31) for detecting an image from the sensor substrate. The system further includes a folded light path structure (23) arranged between the light source and the detector. The folded light path structure includes the sensor substrate (26c), and is configured so as to receive the light from the light source, to redirect the received light to be incident on the sensor substrate (26c) at the incident angle (first redirection), and to further redirect the light reflected from the sensor substrate (26c) toward the detector (second redirection). The folded light path structure allows for a minimal instrumentation footprint, which in turn allows for the construction of a miniaturized, hand-portable SPR imaging system.

Abstract: A material independent profiler system and method for measuring a slope on the surface of an object such as a thin film disk, a silicon wafer, or a glass substrate is disclosed.

Abstract: A system and process for analyzing a sample includes an excitation section and an analyze section, said excitation section including a light source emitting an incident measurement luminous beam, a polarisation state generator (PSG), first optics, and said analyze section includes a polarisation state analyzer (PSA), a detection system and second optics. The excitation section includes an illumination source emitting an incident visualization luminous beam, superposition optics that direct the incident visualization luminous beam toward the sample surface along an optical axis which is identical to the optical axis of the incident measurement luminous beam and the analyze section includes separation optics that transmit a part of the reflected or transmitted visualization luminous beam and a part of the reflected or transmitted measurement luminous beam towards a visualization direction.

Abstract: In one embodiment, a surface inspection system comprises a radiation directing assembly to target radiation onto a surface of an object, the radiation directing assembly comprising a radiation source that emits a broadband radiation beam, a polarization control assembly comprising at least one of a linear polarizer and an apochromatic retarder, an aperture control mechanism, and a beam splitter, a radiation collection assembly to collect radiation reflected from the surface of the object, the radiation collection assembly comprising, a polarization control assembly comprising at least one of a linear polarizer and an apochromatic retarder, an aperture control mechanism, and at least one radiation sensing device.

Abstract: An optical system includes both a microspot broadband spectroscopic ellipsometer and a photoacoustic film thickness measurement system that are supplied laser light by the same laser light source. One of the systems makes a measurement, the result of which is used to adjust a parameter of the other system; e.g. the ellipsometer measures thickness and the photoacoustic system uses the thickness result to measure the speed of sound. In one version, the ellipsometer converts the laser beam to a broad-spectrum beam that provides higher intensity.

Abstract: A film thickness measuring method can carry out measurement of a thickness of an oxide film more simply in a shorter time. The film thickness measuring method includes determining a thickness of an oxide film or thin film of a metal or alloy by solely using a phase difference ?, measured by ellipsometry, based on a predetermined relationship between the phase difference ? and the thickness of the oxide film or thin film of the metal or alloy.

Abstract: The present invention refers to the simultaneous measurement of four separately polarized beams upon diffraction from a substrate in order to determine properties of the substrate. Circularly or elliptically polarized light sources are passed via up to three polarizing elements. This polarizes the light sources by 0, 45, 90 and 135°. The plurality of polarizing beamsplitters replaces the use of a phase modulator, but enables the measurement of the intensity of all four beams and thus the measurement of the phase modulation and amplitude of the combined beams to give the features of the substrate.

Abstract: This application describes designs, implementations, and techniques for controlling propagation mode or modes of light in a common optical path, which may include one or more waveguides, to sense a sample.

Abstract: A method and apparatus for resolving both the angular (nx,ny) and spatial (x,y) dependence of the effective source coherence matrix for lithographic steppers and scanners is described. First an in-situ source metrology instrument is combined with in-situ polarization elements to create an in-situ source imaging polarizer or ISIP. The ISIP is loaded into a photolithographic exposure tool, aligned, and then exposed onto a suitable recording media or recording sensor. The recording sensor comprising either resist coated wafers or electronic sensors capture the image intensity at a multiplicity of different field points. The resulting measurements are entered into a computer program that reconstructs the source coherence matrix as a function of direction cosine at multiple field points. Alternative ISIP configurations are discussed in some detail. Applications of the ISIP include polarization source mapping for deep-UV and EUV lithography, process optimization, process monitoring, and chip manufacturing.

Abstract: A two dimensional beam deflector is disclosed which deflects beams from multiple optical assemblies. The input of beams of the multiple optical assemblies follow parallel optical paths until deflection to a wafer. An ellipsometer using a two-dimensional beam deflector is also disclosed.