Abstract: This application describes designs, implementations, and techniques for controlling propagation mode or modes of light in a common optical path, which may include one or more waveguides, to sense a sample.

Abstract: A system, method of configuring, and application a system for introducing a relative phase retardation into orthogonally polarized components of an electromagnetic beam entered thereinto, wherein the system involves a substantially achromatic multiple element retarder system for use in wide spectral range (for example, 190-1700 nm) rotating compensator spectroscopic ellipsometer and/or polarimeter systems.

Abstract: An overlay measurement apparatus has a polarized light source for illuminating a sample with a polarized light beam and an optical system to capture light that is scattered by the sample. The optical system includes a polarizer for transmitting an orthogonal polarization component that is orthogonal to a polarization direction of the polarized light beam. A detector measures intensity of the orthogonal polarization component. A processing unitise connected to the detector, and is arranged to process the orthogonal polarization component for overlay metrology measurement using asymmetry data derived from the orthogonal polarization component.

Abstract: A surface inspection apparatus includes units illuminating repetitive patterns formed on a surface of a suspected substance and measuring a variation in an intensity of regular reflection light caused by a change in shapes of the repetitive patterns, units illuminating the repetitive patterns with linearly polarized light, setting an angle formed between a repetitive direction of the repetitive patterns and a direction of a plane of vibration of the linearly polarized light at a tilt angle, and measuring a variation in a polarized state of the regular reflection light caused by the change in the shapes of the repetitive patterns, and a unit detecting a defect of the repetitive patterns based on the variation in the intensity and the variation in the polarized state of the regular reflection light.

Abstract: A device for optically detecting and distinguishing airborne liquid water droplets and ice crystals includes an illumination portion and a detection portion. The illumination portion outputs a circularly polarized illuminating beam. The detection portion receives circularly polarized backscattered light from moisture in the cloud, in response to the illuminating beam. The circularly polarized backscattered light is passed through a circular polarizer to convert it into linearly polarized backscattered light, which is split into two components. Each of the two components is optionally subject to further linear polarization to filter out any leakage-type orthogonal polarization. The two components are then optically detected and the resulting detection signals are used to calculate one or more parameters reflective of the presence or absence of airborne ice crystals and/or water droplets.

Abstract: To avoid the rotation action with the polarizer and the analyzer in ellipsometric measurement, complex measurement and repeated process, this invention proposes to polarize the incident light in a fixed azimuthal angle then illuminate the polarized light onto the target surface, analyze the surface polarized characteristics light in a fixed azimuthal angle, and obtain the light intensity and phase information corresponding to the target surface, then based on the relationship between the characteristics information detected by electromagnetic wave and the light intensity information, to obtain the characteristics information of the target surface.

Abstract: This method comprises the steps of: transmitting a beam of light onto a surface (17) of an element (1) comprising a fissile material, passing the beam of light reflected by the surface into a polarisation analyser (27) having a modifiable analysis direction, transmitting the beam from the polarisation analyser (27) to a device (31) for acquiring digital images, acquiring at least one digital image (31) of the surface (17) of the element (1) and processing the digital image acquired in order to measure the anisotropy. Use, for example, in controlling particles of nuclear fuel for an HTR/VHTR type reactor.

Abstract: A spectroscopic ellipsometer can compare data different in a measurement condition and facilitate setting an initial value of fitting data even for an inexperienced operator such as a beginner. The spectroscopic ellipsometer includes a reference data storage part storing therein reference data to be compared with measurement data, a conversion operation part converting the measurement data or the reference data into comparable data, so that the measurement data can be compared with the reference data, and a comparison and determination part comparing the measurement data with the reference data made comparable by the conversion operation part with each other and determining a coincidence between the measurement data and the reference data.

Abstract: A method for obtaining a refractive index (n) and extinction coefficient (k) map of a slider surface, the method comprising the steps of processing an image of the slider surface to obtain spatially resolved normalized intensity data of the slider surface; measuring n and k values of the slider surface at different areas of the slider surface to obtain reflectivity data of the slider surface; mapping a distribution of the normalized intensity data to a distribution of the reflectivity data for deriving the n and k map of the slider surface.

Abstract: A system which automatically reduces change in effective angle and plane of incidence of a reflected focused beam of electromagnetic radiation entering a detector, via use of a detector with dimensions less than is the spatial spread of a reflected focused beam at a location distal to the location on said sample from which it is caused to reflect, preferably after passing through a collimating lens. The basis of operation is that the portion of a reflected focused beam intercepted by the detector changes with change in sample position and/or orientation.

Abstract: Provided are: an optical device for shape and gradient detection and/or measurement which has a simple structure, is robust to external disturbance, and enables accurate measurement of the gradient angle of an object surface, including a human body; a method for optical shape and gradient detection and/or measurement; and a circularly polarized light illumination device. The optical device for shape and gradient detection and/or measurement uses the optical reflection characteristics of the surface of an object to detect and/or measure the surface shape or gradient of an observed object, and is provided with an illumination device and a polarized light image detection device. The illumination device makes the incident light, which surrounds the periphery of the object and is essentially a known perfect polarized light, fall uniformly.

Abstract: An object is to efficiently measure the resistivity of a transparent conductive film with high accuracy in a non-destructive and non-contact manner.

Abstract: In the present invention, we present a robust technical approach of how the use of a modified detector set-up eliminates a complication in relation to the usage of prism-based optical reflectometry in contact with liquid sample suspension. Additionally we disclose how molecular interactions at a solid-liquid interface can be investigated simultaneously using optical reflectometry. combined with other techniques that do not have technical interference with reflectometry when sharing the same solid sensing surface, for instance with a quartz crystal microbalance of some suitable type.

Abstract: High-precision normal information on the surface of a subject is generated by capturing an image of the subject. A normal information generating device captures the image of the subject and thereby passively generates normal information on the surface of the subject. The normal information generating device includes: a stereo polarization image capturing section for receiving a plurality of polarized light beams of different polarization directions at different viewpoint positions and obtaining a plurality of polarization images of different viewpoint positions; and a normal information generating section for estimating a normal direction vector of the subject based on the plurality of polarization images of different viewpoint positions.

Abstract: Four separately polarized beams are simultaneously measured upon diffraction from a substrate (W) to determine properties of the substrate. Linearly, circularly or elliptically polarized radiation is transmitted through a first beam splitter (N-PBS) and split into two polarized beams. These two beams are further split into two further beams using two further beam splitters, the further beam splitters (32,34) being rotated by 45° with respect to each other. The plurality of polarizing beam splitters enables the measurement of the intensity of all four beams and thus the measurement of the phase modulation and amplitude of the combined beams to give the features of the substrate. Algorithms are used to compare the four intensities of each of the polarized angles to give rise to the phase difference between the polarization directions and the ratio between the two main polarization direction amplitudes of the original polarized beam.

Abstract: An optical metrology method is disclosed for evaluating the uniformity of characteristics within a semiconductor region having repeating features such a memory die. The method includes obtaining measurements with a probe laser beam having a spot size on the order of micron. These measurements are compared to calibration information obtained from calibration measurements. The calibration information is derived by measuring calibration samples with the probe laser beam and at least one other technology having added information content. In the preferred embodiment, the other technology includes at least one of spectroscopic reflectometry or spectroscopic ellipsometry.

Abstract: In a spectroscopic ellipsometer, light emitted from a light source enters a measurement surface of a substrate through an optical system in a lighting part so as to incline to the measurement surface to be directed to a light receiving device, and ellipsometry is performed based on spectral intensity of reflected light reflected on the measurement surface, the spectral intensity being acquired by the light receiving device. In focusing of the spectroscopic ellipsometer, a focus position of the measurement surface is obtained based on a total light amount in a predetermined wavelength band of the reflected light, the total light amount being obtained by the light receiving device. In the spectroscopic ellipsometer, since the optical system for ellipsometry and the optical system for focusing are common, it is possible to eliminate influences of change of the optical systems by temperature change or the like and to achieve high accurate focusing.

Abstract: Instruments and methods relating to surface plasmon imaging are described. An instrument comprises a semi-circular rail and a driving mechanism. The driving mechanism is attached to a light source mount and a detector mount, and both the light source mount and the detector mount are attached to the semi-circular rail with connectors. Each connector allows the light source mount and detector mount to slide along the rail. The synchronous movement of the light source mount and the detector mount changes the angle of incidence of a light beam from the light source with respect to the plane of the sample surface on the sample stage.

Abstract: Asymmetry metrology is performed using at least a portion of Mueller matrix elements, including, e.g., the off-diagonal elements of the Mueller matrix. The Mueller matrix may be generated using, e.g., a spectroscopic or angle resolved ellipsometer that may include a rotating compensator. The Mueller matrix is analyzed by fitting at least a portion of the elements to Mueller matrix elements calculated using a rigorous electromagnetic model of the sample or by fitting the off-diagonal elements to a calibrated linear response. The use of the Mueller matrix elements in the asymmetry measurement permits, e.g., overlay analysis using in-chip devices thereby avoiding the need for special off-chip targets.

Abstract: In the channeled spectroscopic polarimetry, a measurement error of a parameter showing a spectropolarization characteristic of a sample is effectively removed, the error being generated by various variations in retardation of a retarder depending upon the state of the sample. With attention being focused that the retardation of the retarder may be kept constant by stabilization of an incident direction of light that transmits through the retarder, the retarder was arranged on the light source side with respect to the sample so as to effectively remove an influence relative to a measurement error, such as variations in direction of a light ray due to the sample.

Abstract: Horizontally oriented attenuated total reflection (HATR) system applied in spectroscopic ellipsometer or polarimeter systems, and methodology of use.

Abstract: Systems and methods for using common-path interferometric imaging for defect detection and classification are described. An illumination source generates and directs coherent light toward the sample. An optical imaging system collects light reflected or transmitted from the sample including a scattered component and a specular component that is predominantly undiffracted by the sample. A variable phase controlling system is used to adjust the relative phase of the scattered component and the specular component so as to change the way they interfere at the image plane. The resultant signal is compared to a reference signal for the same location on the sample and a difference above threshold is considered to be a defect. The process is repeated multiple times each with a different relative phase shift and each defect location and the difference signals are stored in memory. This data is then used to calculate an amplitude and phase for each defect, which can be used for defect detection and classification.

Abstract: Various metrology systems and methods are provided.

Abstract: Light from a light source device (4) is polarized through a polarizer (5) and is caused to impinge obliquely on an object (W) to be inspected. The resulting scattered light (SB) is received by a CCD imaging device (7) having an element (9) for separating scattered light disposed in a dark field. Component light intensities are worked out for an obtained P-polarized component image and an obtained S-polarized component image and a polarization direction is determined as a ratio of them. The component light intensities and the polarization directions are determined from images obtained by imaging of the light scattering entities in a state where stress is applied to the object to be inspected and in a state where stress is not applied thereto. The component light intensities and the polarization directions are compared with predetermined threshold values.

Abstract: A new and useful method is provided for Goos-Hanchen compensation in an optical autofocus (AF) system that uses light reflected from a substrate to determine changes in the z position of a substrate. According to the method of the invention reflected light from the substrate is provided at a plurality of wavelengths and polarizations, detected and used to make corrections that compensate for the errors due to the Goos-Hanchen effect.

Abstract: A defect inspection apparatus includes a movable stage for mounting a substrate having circuit patterns as an object of inspection, an irradiation optical system which irradiates a slit-shaped light beam from an oblique direction to the circuit patterns of the substrate, a detection optical system which includes an image sensor for receiving reflected/scattered light from the substrate by irradiation of the slit-shaped light beam and converting the received light into a signal, and an image processor which processes the signal. The irradiation optical system includes a cylindrical lens and a coherency reduction optical system, which receives the light beam and emits a plurality of slit-shaped light sub-beams which are spatially reduced in coherency in a light-converging direction of the cylindrical lens. The cylindrical lens focuses the plurality of slit-shaped light sub-beams into the slit-shaped light beam irradiated to the surface of the substrate.

Abstract: This application describes designs, implementations, and techniques for controlling propagation mode or modes of light in a common optical path, which may include one or more waveguides, to sense a sample.

Abstract: A method of configuring a system for introducing a relative phase retardation into orthogonally polarized components of an electromagnetic beam entered thereinto, wherein the system involves a substantially achromatic multiple element retarder system for use in wide spectral range (for example, 190-1700 nm) rotating compensator spectroscopic ellipsometer and/or polarimeter systems.

Abstract: A surface inspection method inspects a surface of a wafer having a repeated pattern formed by double patterning. The method includes: a first step (S121) which applies an inspection light to a surface of a wafer; a second step (S122) which detects a diffracted light from the surface of the wafer to which the inspection light has been applied; and a third step (S123) which checks whether a defect is present in the repeated pattern according to the diffracted light detected in the second step. The second step detects a diffracted light corresponding to a pattern having a pitch multiplied by 2 with respect to the pitch of the repeated pattern.

Abstract: A method includes selecting one of performing ellipsometry or performing optical stress generation and detection. The method also includes, in response to selecting performing ellipsometry, applying at least one first control signal to a controllable retarder that modifies at least polarization of a light beam, and performing ellipsometry using the modified light beam. The method further includes, in response to selecting performing optical stress generation and detection, applying at least one second control signal to the controllable retarder, and performing optical stress generation and detection using the modified light beam. Apparatus and computer readable media are also disclosed.

Abstract: Before the diffraction from a diffracting structure on a semiconductor wafer is measured, where necessary, the film thickness and index of refraction of the films underneath the structure are first measured using spectroscopic reflectometry or spectroscopic ellipsometry. A rigorous model is then used to calculate intensity or ellipsometric signatures of the diffracting structure. The diffracting structure is then measured using a spectroscopic scatterometer using polarized and broadband radiation to obtain an intensity or ellipsometric signature of the diffracting structure. Such signature is then matched with the signatures in the database to determine the grating shape parameters of the structure.

Abstract: A flow monitoring system includes a pipe for transporting a fluid therethrough. An optical fiber generally spirals about the pipe along a longitudinal portion having a predetermined length to serve as a single transducer for detecting flow information from the longitudinal portion. A linear polarizer/analyzer circuit communicates with the optical fiber. A light source communicates with the linear polarizer/analyzer circuit and generates a light signal along the optical fiber at a frequency greater than a period of a disturbance to flow past the predetermined length of the transducer. A reflector is disposed along the optical fiber for reflecting the light signal along the optical fiber. An optical detector communicates with the linear polarizer/analyzer circuit. The optical detector determines from the light signal dynamic events along the optical fiber indicative of flow disturbances passing by the transducer.

Abstract: A method for testing moving products having at least two layers, such as cigarette packages wrapped with film, wherein at least one layer of the product, namely an inner layer which is arranged further inwards, is covered at least regionally by at least one, at least partially transparent product layer, namely an outer layer which is arranged further outwards, wherein the outer layer of the product is illuminated under an angle of incidence of about 35°, with light, in which the light that is reflected at this layer comprises at least 70%, at least 90%, or at least 95%, of linearly s-polarized light, the s-polarized component of the light reflected by the outer layer and/or of the light reflected by the inner layer and/or the p-polarized component of the light reflected by the outer layer and/or of the light reflected by the inner layer are recorded in each case using at least one suitable electrooptic recording element in the form of an image or partial image of the product and wherein the recorded s-polariz

Abstract: A sensor chip based on the WCSPR effect and an array thereof are disclosed. The sensor chip is a multilayer structure comprising a substrate, a dielectric waveguide layer (26) disposed on the substrate and a first metal layer (27) disposed on the dielectric waveguide layer (26), wherein parameters of physical properties of the dielectric waveguide layer (26) are tunable.

Abstract: Ellipsometry using two waveplates of complementary retardation in a dual rotating compensator configuration is disclosed. Two waveplates of complementary retardation may be used to increase the useful spectral range of a rotating compensator ellipsometer, in particular towards the deep Ultraviolet (UV) spectrum. The improved rotating compensating ellipsometer disclosed herein enables a user to select specific and different waveplate retardations for the purpose of increasing the operating wavelength range of the rotating compensating ellipsometer.

Abstract: Instruments and methods relating to surface plasmon imaging are described. An instrument comprises a semi-circular rail and a driving mechanism. The driving mechanism is attached to a light source mount and a detector mount, and both the light source mount and the detector mount are attached to the semi-circular rail with connectors. Each connector allows the light source mount and detector mount to slide along the rail. The synchronous movement of the light source mount and the detector mount changes the angle of incidence of a light beam from the light source with respect to the plane of the sample surface on the sample stage.

Abstract: In embodiments of the present invention a second, different waveplate is introduced into a single rotating compensator normal incidence ellipsometer. The second waveplate provides a quarter wavelength retardation that is different from and complementary to that of the first waveplate in order to increase the spectral range for which useful retardation is available, especially towards the deep UV spectrum. The sensitivity for the system may also be increased in the conventional spectral range, since each of the two waveplates may be optimized for its own, somewhat more narrow spectral range of operation. With the proper choice of two waveplates of different retardation, the useful spectral range may be extended from typically 190-820 nm to 150-1000 nm, and beyond if necessary, while increasing the sensitivity within the conventional wavelength range at the same time.

Abstract: The measurement of two separately polarized beams (Ix, Iy) upon diffraction from a substrate (W) in order to determine properties of the substrate is disclosed. Circularly or elliptically polarized radiation is passed via a variable phase retarder in order to change the phase of one of two orthogonally polarized radiation beams with respect to the other of the two beams. The phase change is dependent on the wavelength of the polarized beam. The relative phases of the two radiation beams and other features of the beams as measured in a detector gives rise to properties of the substrate surface.

Abstract: An object is to efficiently measure the resistivity of a transparent conductive film with high accuracy in a non-destructive and non-contact manner.

Abstract: An illumination subsystem configured to provide illumination for a measurement system includes first and second light sources configured to generate light for measurements in different wavelength regimes. The illumination subsystem also includes a TIR prism configured to be moved into and out of an optical path from the first and second light sources to the measurement system. If the TIR prism is positioned out of the optical path, light from only the first light source is directed along the optical path. If the TIR prism is positioned in the optical path, light from only the second light source is directed along the optical path. Various measurement systems are also provided. One measurement system includes an optical subsystem configured to perform measurements of a specimen using light in different wavelength regimes directed along a common optical path. The different wavelength regimes include vacuum ultraviolet, ultraviolet, visible, and near infrared wavelength regimes.

Abstract: A defect inspection apparatus is capable of inspecting an extremely small defect present on the top and edge surfaces of a sample such as a semiconductor substrate or a thin film substrate with high sensitivity and at high speed. The defect inspection apparatus has an illumination optical system, a plurality of detection optical units and a signal processor. One or more of the detection optical units receives either light diffracted from an edge portion of the sample or light diffracted from an edge grip holding the sample. The one or more of the detection optical units shields the diffracted light received by the detection optical unit based on a signal obtained by monitoring an intensity of the diffracted light received by the detection optical unit in order to inspect a sample portion located near the edge portion and a sample portion located near the edge grip.

Abstract: An inspection apparatus and method includes a light source, an illuminating unit having a polarization controller and an object lens for illuminating a specimen with light emitted from the light source and passed through the polarization controller and the object lens, a detection unit having a sensor for detecting light from the specimen illuminated by the illuminating unit, a processor which processes a signal output from the sensor so as to detect a defect on the specimen, and a display which displays information output from the processor. The processor processes an image formed from the signal output from the sensor in which the image is reduced in speckle pattern.

Abstract: A large number of properties of nanostructures depend on their size, shape and many other parameters. As the size of a nanostructure decreases, there is a rapid change in many properties. When the nanostructure is completely destroyed, those properties essentially disappear. Systems based on changes in properties of nanostructures due to the destruction of nanostructures are proposed. The systems can be used for monitoring the total exposure to organic, inorganic, organometallic and biological compounds and agents using analytical methods.

Abstract: A spectroscopic ellipsometer has a polarized light generating part for generating elliptically polarized lights of a plurality of wavelengths included in a predetermined measurement wavelength band from white light and directing the elliptically polarized lights to a measurement surface of a substrate, a rotating analyzer where reflected light reflected on the measurement surface enters, and a spectrometer for acquiring spectral intensity of light from the rotating analyzer. A polarization state acquiring part in a control part acquires a polarization state at each wavelength in the measurement wavelength band of the reflected light.

Abstract: A Raman method and system for analysing a sample including an excitation source emitting an incident light beam, a sample holder for mounting the sample, elements for focusing the incident light beam onto the sample surface to generate a Raman scattered light having an intensity, elements for collecting the Raman scattered light to form a Raman scattered light beam, a detection system measuring intensity of the Raman scattered light beam as a function of time. The system includes at least a polarization state generator able to generate four independent polarization states or a polarization state analyzer able to analyze four independent polarization states to detect the intensity of the Raman scattered light beam and calculate a partial or complete Mueller-Stokes matrix of the sample.

Abstract: The present invention relates to a minute measuring instrument for high speed and large area and a method thereof, and more particularly, to a minute measuring instrument for high speed and large area which measures properties of a specimen in high speed by a focused-beam ellipsometric part and then minutely remeasures the position showing a singular point by a minute measuring part and a method thereof.

Abstract: An optical measurement system includes a rotating element ellipsometer comprising a radiant source and a rotating optical element coupled to the radian source, an optical system to provide a modulated pump beam, a detection system optically coupled to the ellipsometer and a signal analyzer. The rotating element ellipsometer is configured to deliver a probe beam to a measurement spot on a sample and to measure one or more ellipsometric parameters of the sample at one or more discrete wavelengths or wavelength ranges, or a plurality of wavelengths across a wavelength range. Methods for determining sample characteristics from radiation scattered, reflected, diffracted or otherwise emitted from a sample surface using the optical measurement systems are also disclosed.

Abstract: A method for calibrating an apparatus for ellipsometric measurements performed on an arbitrarily large or continuously moving sample, using a visible sample reference frame, and one or more laser sources in order to calibrate the ellipsometer for variations in the distance between the ellipsometer apparatus and the sample of interest. Included are techniques for projecting a first laser beam spot from an incident laser source onto a sample, then analyzing the position of the first laser beam spot relative to the center of the sample reference frame using human-aided measurements and confirmations and/or computer vision techniques. Then adjusting pivot points and/or apparatus-to-sample distance to achieve a first beam spot being located about the center of the sample reference frame, and concurrently intersecting the plane of the sample. Other techniques include changing the incidence and reflectance angle using a semi-circular track arc design with a stepping motor activating each goniometer arm.

Abstract: The present invention relates to a single-polarizer focused-beam ellipsometer. An ellipsometer according to the present invention includes a light source (210); a beam splitting part (220) for splitting a light generated in the light source (210) into a polarized light; an objective lens (230) for concentrately irradiating some of light split by the beam splitting part (220) onto a specimen (240); a photodetector (250) for detecting the light passed through the objective lens 230 and the beam splitting part (220) after reflected from the specimen (240) with unit cells; and a central processing unit (260) for correcting the intensity of the light detected by the photodetector (250) into a value corresponding to the unit cell of the photodetector (250) along multiple incidence plane passage of 360° with respect to respective incidence angles and processing the corrected value.

Abstract: The simultaneous measurement of four separately polarized beams upon diffraction from a substrate is used to determine properties of the substrate. Circularly or elliptically polarized light sources are passed via up to three polarizing elements. This polarizes the light sources by 0, 45, 90 and 135°. The plurality of polarizing beamsplitters replaces the use of a phase modulator, but enables the measurement of the intensity of all four beams and thus the measurement of the phase modulation and amplitude of the combined beams to give the features of the substrate.