Source Patents (Class 378/119)
  • Patent number: 6590959
    Abstract: Sources are disclosed for producing short-wavelength electromagnetic radiation (EMR) such as extreme ultraviolet (“EUV” or “soft X-ray”) radiation useful in microlithography. The sources collect a greater amount of the EMR produced by a plasma than conventional sources and form the collected EMR into an illumination EMR flux having higher intensity than conventionally. The EMR flux desirably has a rotationally symmetrical intensity distribution. The plasma is produced by two electrodes contained in a vacuum chamber. A high-voltage pulsed power supply applies a plasma-creating potential across the electrodes. EMR produced by the plasma is collected, typically by a reflective element configured to form a collimated beam of EMR. The electrodes are configured and oriented such that, as the collimated beam passes by the electrodes, the electrodes exhibit minimal blocking of the EMR flux.
    Type: Grant
    Filed: June 21, 2001
    Date of Patent: July 8, 2003
    Assignee: Nikon Corporation
    Inventors: Noriaki Kandaka, Hideki Komatsuda
  • Patent number: 6586757
    Abstract: A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at repetition rates of 1000 Hz or greater and at voltages high enough to create electrical discharges between the electrodes to produce very high temperature, high density plasma pinches in the working gas providing radiation at the spectral line of the source or active gas. A fourth generation unit is described which produces 20 mJ, 13.5 nm pulses into 2 &pgr; steradians at repetition rates of 2000 Hz with xenon as the active gas. This unit includes a pulse power system having a resonant charger charging a charging capacitor bank, and a magnetic compression circuit comprising a pulse transformer for generating the high voltage electrical pulses at repetition rates of 2000 Hz or greater.
    Type: Grant
    Filed: June 6, 2001
    Date of Patent: July 1, 2003
    Assignee: Cymer, Inc.
    Inventors: Stephan T. Melnychuk, William N. Partlo, Igor V. Fomenkov, Richard M. Ness, Daniel L. Birx late of, Richard L. Sandstrom, John E. Rauch
  • Patent number: 6582531
    Abstract: The present invention relates to structures within an x-ray device including an x-ray can, an x-ray can window frame insert, a rotor sleeve, and a bearing support assembly for a rotor structure. The various structures are fabricated from a chromium alloy of copper that is essentially oxygen free copper having a minor amount of chromium, the combination of which imparts desirable qualities to the x-ray device structures, including efficient heat sink and emissivity qualities that are beneficial in an x-ray device environment. In one preferred embodiment of the present invention, oxygen free high conductivity (OFHC) copper is melted in an RF furnace in the presence of a minor amount of chromium and is either ingot cast or powder metallurgically cast into a desired article and further fabricated into a finished article.
    Type: Grant
    Filed: August 21, 2001
    Date of Patent: June 24, 2003
    Assignee: Varian Medical Systems, Inc.
    Inventor: Don Warburton
  • Publication number: 20030108155
    Abstract: X-ray generation apparatus including an elongated target body and a mount from which the body projects to a tip remote from the mount. The target body includes a substance that, on being irradiated by a beam of electrons of suitable energy directed onto the target body from laterally of the elongate target body, generates a source of x-ray radiation from a volume of interaction of the electron beam with the target body. The mount provides a heat sink for the target body.
    Type: Application
    Filed: December 20, 2002
    Publication date: June 12, 2003
    Inventors: Stephen William Wilkins, Peter Robert Miller
  • Publication number: 20030099326
    Abstract: An object of the present invention is to provide an X-ray generator capable of compensating for the volume expansion of an insulating oil without the necessity of labor-intensive maintenance. A tubular body is included to penetrate through a tank that is sealed while accommodating a high-voltage assembly and an X-ray tube assembly and having an insulating oil poured thereinto. The lumen of the tubular body opens onto the ambient space at both ends of the tubular body. The tubular body expands or contracts depending on a difference between the pressure in the lumen and the internal pressure of the tank.
    Type: Application
    Filed: November 26, 2002
    Publication date: May 29, 2003
    Applicant: GE Medical Systems SA
    Inventors: Lijo Joseph Thandiackal, Denis Perrillat
  • Patent number: 6566668
    Abstract: A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at repetition rates of 1000 Hz or greater and at voltages high enough to create electrical discharges between the electrodes to produce very high temperature, high density plasma pinches in the working gas providing radiation at the spectral line of the source or active gas. A fourth generation unit is described which produces 20 mJ, 13.5 nm pulses into 2 &pgr; steradians at repetition rates of 2000 Hz with xenon as the active gas. This unit includes a pulse power system having a resonant charger charging a charging capacitor bank, and a magnetic compression circuit comprising a pulse transformer for generating the high voltage electrical pulses at repetition rates of 2000 Hz or greater.
    Type: Grant
    Filed: June 6, 2001
    Date of Patent: May 20, 2003
    Assignee: Cymer, Inc.
    Inventors: John E. Rauch, William N. Partlo, Igor V. Fomenkov, Richard M. Ness, Daniel L. Birx, Richard L. Sandstrom, Stephan T. Melnychuk
  • Patent number: 6567499
    Abstract: A source of photons includes a discharge chamber, first and second groups of ion beam sources in the discharge chamber and a neutralizing mechanism. Each of the ion beam sources electrostatically accelerates a beam of ions of a working gas toward a plasma discharge region. The first group of ion beam sources acts as a cathode and the second group of ion beam sources acts as an anode for delivering a heating current to the plasma discharge region. The neutralizing mechanism at least partially neutralizes the ion beams before they enter the plasma discharge region. The neutralized beams and the heating current form a hot plasma that radiates photons. The photons may be in the soft x-ray or extreme ultraviolet wavelength range and, in one embodiment, have wavelengths in a range of about 10-15 nanometers.
    Type: Grant
    Filed: June 7, 2001
    Date of Patent: May 20, 2003
    Assignee: Plex LLC
    Inventor: Malcolm W. McGeoch
  • Patent number: 6566667
    Abstract: A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at voltages high enough to create electrical discharges between the electrodes to produce very high temperature, high density plasma pinches in the working gas providing radiation at the spectral line of the source or active gas. Preferably the electrodes are configured co-axially with the anode on the axis. The anode is preferably hollow and the active gas is introduced through the anode. This permits an optimization of the spectral line source and a separate optimization of the buffer gas. Preferred embodiments present optimization of capacitance values, anode length and shape and preferred active gas delivery systems are disclosed.
    Type: Grant
    Filed: October 16, 2000
    Date of Patent: May 20, 2003
    Assignee: Cymer, Inc.
    Inventors: William N. Partlo, Igor V. Fomenkov, I. Roger Oliver, Richard M. Ness, Daniel L. Birx
  • Patent number: 6563907
    Abstract: Employing a source of radiation, such as an electric discharge source, that is equipped with a capillary region configured into some predetermined shape, such as an arc or slit, can significantly improve the amount of flux delivered to the lithographic wafers while maintaining high efficiency. The source is particularly suited for photolithography systems that employs a ringfield camera. The invention permits the condenser which delivers critical illumination to the reticle to be simplified from five or more reflective elements to a total of three or four reflective elements thereby increasing condenser efficiency. It maximizes the flux delivered and maintains a high coupling efficiency. This architecture couples EUV radiation from the discharge source into a ring field lithography camera.
    Type: Grant
    Filed: December 7, 2001
    Date of Patent: May 13, 2003
    Assignee: EUV LLC
    Inventors: Glenn D. Kubiak, William C. Sweatt
  • Publication number: 20030086532
    Abstract: A filament circuit resistance adjusting apparatus (36), for a filament circuit (38) having a filament (50) with a first resistance is provided. The filament circuit resistance adjusting apparatus (36) includes a first resistor (70), which has a second resistance and is electrically coupled to the filament (50). The first resistor (70) adjusts the resistance of the filament circuit (38). A method for adjusting the resistance of the filament (50) is also provided.
    Type: Application
    Filed: October 18, 2001
    Publication date: May 8, 2003
    Inventors: Thomas D. Schaefer, Lloyd Wang, Gregory Steinlage, Earl Warden
  • Patent number: 6560314
    Abstract: A converter and method for converting electron energy to irradiative energy comprising foam and/or foil. Foam and foil optionally comprise a high-Z material, such as, but not limited to, tantalum.
    Type: Grant
    Filed: February 28, 2001
    Date of Patent: May 6, 2003
    Assignee: The United States of America as represented by the Department of Energy
    Inventor: Peter Poulsen
  • Publication number: 20030081727
    Abstract: It is an object to provide an X-ray generating apparatus of an integrate type, which permits easy alignment of an X-ray tube and easy insulation against high voltages and which has an X-ray shielding means superior in thermal conductivity. A screw through hole and pin through holes corresponding respectively to a screw hole and plural pin holes formed in an end face of a base portion of an X-ray tube are formed in an abutment face of a bracket against which the end face of the base portion of the X-ray tube comes into abutment, and a screw and plural pins are inserted respectively from the bracket side into the screw hole and plural pin holes in the X-ray tube through the screw through hole and the pin through holes, thereby mounting the X-ray tube to the bracket. The bracket is formed by an integral structure of FR4. An X-ray tube container which receives the X-ray tube therein is constituted by copper alloy plates with lead incorporated therein.
    Type: Application
    Filed: October 29, 2002
    Publication date: May 1, 2003
    Inventors: Balasubramannian Kandankumarath, Biju S. Nathan, Ravindra P. Prabhu, Lijo Joseph Thandiackal
  • Publication number: 20030081728
    Abstract: An object of the present invention is to provide a circuit for generating a pair of well-balanced positive and negative dc high voltages, and an X-ray generator including such a high-voltage generation circuit. The X-ray generator includes a transformer, a pair of rectifier-type dc high-voltage generation circuits, and an X-ray tube. The transformer transfers an ac voltage, which is applied to a primary winding thereof and stepped up, from a single secondary winding thereof that has one terminal thereof grounded. The pair of rectifier-type dc high-voltage generation circuits generates positive and negative dc high voltages according to an ac voltage developed at the other terminal of the secondary winding. The positive dc high voltage is applied to the anode of the X-ray tube, while the negative dc high voltage is applied to the cathode thereof.
    Type: Application
    Filed: October 29, 2002
    Publication date: May 1, 2003
    Inventors: Biju S. Nathan, Ravindra P. Prabhu, Balasubramannian Kandankumarath
  • Publication number: 20030081726
    Abstract: The invention relates to a vacuum tube (1) for the processing or conversion of electric powers, for example, an X-ray tube or a traveling-wave tube, which tube includes at least one surface which is to be cooled by thermal emission in the operating condition, as well as a getter which serves to avoid an undesirable pressure increase. The tube is notably characterized in that the getter is provided in the form of a coating (30) partly or completely on the surface of the tube (1) to be cooled, the coating having a thickness such that it has a thermal emissive power which is adequate for the cooling.
    Type: Application
    Filed: October 24, 2002
    Publication date: May 1, 2003
    Inventor: Lothar Koch
  • Publication number: 20030081729
    Abstract: It is an object to provide an X-ray generating apparatus which permits easy alignment of an X-ray tube and easy insulation against high voltages. A screw through hole and pin through holes corresponding respectively to a screw hole and plural pin holes formed in an end face of a base portion of an X-ray tube are formed in an abutment face of a bracket against which the end face of the base portion of the X-ray tube comes into abutment, and a screw and plural pins are inserted respectively from the bracket side into the screw hole and plural pin holes in the X-ray tube through the screw through hole and the pin through holes, thereby mounting the X-ray tube to the bracket. The bracket is formed by an integral structure of FR4.
    Type: Application
    Filed: October 29, 2002
    Publication date: May 1, 2003
    Inventors: Lijo Joseph Thandiackal, Denis Perrillat
  • Publication number: 20030068012
    Abstract: The invention is directed to a method and an arrangement for generating extreme ultraviolet (EUV) radiation, i.e., radiation of high-energy photons in the wavelength range from 11 to 14 nm, based on a gas discharge. The object of the invention, to find a novel possibility for generating EUV radiation in which an extended life of the system is achieved with stable generation of a dense, hot plasma column, is met according to the invention in that a preionization discharge is ignited between two parallel disk-shaped flat electrodes prior to the main discharge by a surface discharge along the superficies surface of a cylindrical insulator with a plasma column generated through the gas discharge with pulsed direct voltage, which preionization discharge carries out an ionization of the working gas in the discharge chamber by means of fast charged particles.
    Type: Application
    Filed: October 9, 2002
    Publication date: April 10, 2003
    Applicant: XTREME technologies GmbH;
    Inventors: Imtiaz Ahmad, Guido Schriever, Juergen Kleinschmidt
  • Patent number: 6541786
    Abstract: A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. A working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at voltages high enough to create electrical discharge between the electrodes to produce very high temperature, high density plasma pinch in the working gas providing radiation at the spectral line of the active gas. An external reflection radiation collector-director collects radiation produced in the plasma pinches and directs the radiation in a desired direction. In a preferred embodiment the active gas is lithium and the buffer gas is helium and the radiation collector-director is coated with the material used for the electrodes. A good choice for the material is tungsten.
    Type: Grant
    Filed: June 2, 1999
    Date of Patent: April 1, 2003
    Assignee: Cymer, Inc.
    Inventors: William N. Partlo, Igor V. Fomenkov, Daniel L. Birx
  • Patent number: 6542576
    Abstract: An x-ray tube assembly (16) includes a vacuum envelope (52) and an x-ray permeable exit window (58). An anode (50) is positioned within the vacuum envelope (52) such that a near side is adjacent to the exit window (58) and a far side is opposite thereof. A cathode assembly (66) is also mounted within the vacuum envelope (52) which directs an electron beam (72) toward a focal spot or point (62) on the far side of the anode (50). The anode further includes a central cavity or indentation (70) which provides a location for mounting a set of radiation attenuating vanes (64) in addition to a shaped x-ray filter or compensator (68). Close placement of the vanes (64) and the filter (68) relative to the focal spot of the anode desirably reduce off focal radiation and allow beam shaping. An externally located collimator (18) further shapes the output x-ray beam.
    Type: Grant
    Filed: January 22, 2001
    Date of Patent: April 1, 2003
    Assignee: Koninklijke Philips Electronics, N.V.
    Inventor: Rodney A. Mattson
  • Patent number: 6538257
    Abstract: A method of generating EUV radiation is described, comprising the steps of: transporting a solid medium (33) through a source space (34) connected to a vacuum pump (35), and irradiating a portion (37) of the medium with an intense, pulsed, laser beam (41) focused on said portion of the medium, thus creating a plasma (47) which emits EUV radiation. To increase the intensity of the EUV radiation and improve the possibility to collect particles (51, 52, 53) released from the medium, at least the medium portions (37) to be irradiated have a concave shape. The method can be improved by embedding the medium in a flow of rare gas. Also described are a EUV radiation source unit for realizing the method and the application of the method in the manufacture of devices such as IC devices, and in a lithographic projection apparatus.
    Type: Grant
    Filed: November 30, 2000
    Date of Patent: March 25, 2003
    Assignee: Koninklijke Philips Electronics N.V.
    Inventor: Theodorus Hubertus Josephus Bisschops
  • Publication number: 20030053593
    Abstract: Debris generation from an EUV electric discharge plasma source device can be significantly reduced or essentially eliminated by encasing the electrodes with dielectric or electrically insulating material so that the electrodes are shielded from the plasma.
    Type: Application
    Filed: September 18, 2001
    Publication date: March 20, 2003
    Inventor: Howard Albert Bender III
  • Publication number: 20030053594
    Abstract: A gas curtain device is employed to deflect debris that is generated by an extreme ultraviolet and soft x-ray radiation discharge source such as an electric discharge plasma source. The gas curtain device projects a stream of gas over the path of the radiation to deflect debris particles into a direction that is different from that of the path of the radiation. The gas curtain can be employed to prevent debris accumulation on the optics used in photolithography.
    Type: Application
    Filed: September 18, 2001
    Publication date: March 20, 2003
    Inventors: Neal R. Fornaciari, Michael P. Kanouff
  • Publication number: 20030048874
    Abstract: Methods and apparatus for generating x-ray beams are described. In one embodiment, the method includes operating a cathode to generate an electron beam, directing the electron beam from the cathode through an aperture in an accelerating electrode, and impinging the electron beam on an anode surface to form a focal spot on the anode surface.
    Type: Application
    Filed: September 7, 2001
    Publication date: March 13, 2003
    Inventors: Colin Richard Wilson, Amy Linsebigler Smentkowski, Lembit Salasoo
  • Patent number: 6529578
    Abstract: An X-ray condenser for condensing X-rays radiated from an X-ray source to a very small condensing spot is disclosed. X-rays from the X-ray source are formed to a parallel X-ray beam by a parallel type parabolic reflection mirror. The parallel X-ray beam is made monochromatic by an analyzing crystal and condensed to the condensing spot by a zone plate. The zone plate is constructed by alternately arranging a plurality of X-ray transmitting bands and a plurality of X-ray shielding bands and can condense the parallel X-ray beam to a very small focus point.
    Type: Grant
    Filed: September 27, 2000
    Date of Patent: March 4, 2003
    Assignee: Rigaku Corporation
    Inventors: Takeyoshi Taguchi, Katsuhiko Ogiso
  • Patent number: 6519318
    Abstract: An improved x-ray tube cooling system is disclosed. The system utilizes a shield structure that is connected between a cathode cylinder and an x-ray tube housing and is disposed between the electron source and the target anode. The shield includes a plurality of cooling fins to improve overall cooling of the x-ray tube and the shield so as to extend the life of the x-ray tube and related components. When immersed in a reservoir of coolant fluid, the fins facilitate improved heat transfer by convection from the shield to the to the coolant fluid. The cooling effect achieved with the cooling fins is further augmented by a convective cooling system provided by a plurality of fluid passageways formed within the shield, which are used to provide a fluid path to the coolant. In particular, a cooling unit takes fluid from the reservoir, cools the fluid, then circulates the cooled fluid through the fluid passageways.
    Type: Grant
    Filed: September 7, 2000
    Date of Patent: February 11, 2003
    Assignee: Varian Medical Systems, Inc.
    Inventor: Gregory C. Andrews
  • Patent number: 6516048
    Abstract: A voltage control section for controlling a pulsed acceleration voltage applied between a photoelectron releasing layer and an X-ray target in order to accelerate a photoelectron is further provided, so that the acceleration voltage is maintained at a pulse top voltage until the X-ray target is bombarded with the photoelectron after the photoelectron is released from the photoelectron releasing layer. The pulse width of acceleration voltage can be set narrower to such an extent that no discharge occurs, which enables the pulse top voltage to become higher, whereby the energy of pulse X-rays can be made higher by enhancing the speed of photoelectrons.
    Type: Grant
    Filed: January 31, 2002
    Date of Patent: February 4, 2003
    Assignee: Hamamatsu Photonics K.K.
    Inventor: Kuniyoshi Mori
  • Publication number: 20030012339
    Abstract: A cathode for a miniature X-ray device includes an insulating shell, a cathode and an anode. The cathode includes a focusing cup formed into an end. The focusing cup can include a thin metal layer that conforms to an inner surface of the cathode. An emitting material having a low work function, such as diamond, is deposited directly onto the internal surface of the focusing cup. The anode has a flat receiving surface for collecting electrons emitted from the anode. An interior coating is applied as a circumferential belt on the interior surface of the insulating shell. The interior coating, formed of a negative secondary emission yield material, extends lengthwise in the region of the cathode to an anode gap, covering the region of the insulating shell most likely to be subject to stray electrons emitted from the cathode.
    Type: Application
    Filed: July 12, 2001
    Publication date: January 16, 2003
    Applicant: Medtronic AVE, Inc
    Inventors: Graham S. Kerslick, Victor I Chornenky, Ali Jaafar
  • Patent number: 6507641
    Abstract: X-ray-generation devices are disclosed that generate X-rays in a stable manner over extended periods of time. An exemplary device includes an anode electrode and a cathode electrode coaxially arranged, and an insulating member. A nozzle connected to a reservoir of fluid target material directs a flow of fluid target material to the anode electrode. Meanwhile, a pulsed high voltage is applied between the anode electrode and cathode electrode in coordination with the supply of target material. The pulses are timed such that, whenever a unit of target material reaches a tip of the anode electrode, a plasma sheath generated at the surface of the insulating member also reaches the tip of the anode electrode. Hence, the target material is supplied automatically as required to produce X-rays continuously over an extended time period. Intense X-ray fluxes can be produced in a stable manner by monitoring the rate at which target material is supplied to the plasma, relative to the timing of discharge pulses.
    Type: Grant
    Filed: October 6, 2000
    Date of Patent: January 14, 2003
    Assignee: Nikon Corporation
    Inventors: Hiroyuki Kondo, Katsuhiko Murakami, Masayuki Shiraishi, Katsumi Sugisaki
  • Patent number: 6507640
    Abstract: An X-ray beam position monitor has a first plate assembly (1, 3) for detecting the position of the X-ray beam in a horizontal plane and a second plate assembly (6, 8) for detecting the position of the X-ray beam in a vertical plane. The first plate assembly (1, 3) and the second plate assembly (6, 8) are located at the same position along the direction of propagation of the X-ray beam, to provide a compact arrangement suitable for use with X-ray diffractors and for laboratory use.
    Type: Grant
    Filed: October 15, 2001
    Date of Patent: January 14, 2003
    Assignee: Medical Research Council
    Inventors: Ulrich Wolfgang Arndt, Martin Paul Kyte
  • Publication number: 20030006383
    Abstract: The present invention provides a high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at voltages high enough to create electrical discharges between the electrodes to produce very high temperature, high density plasma pinches in the working gas providing radiation at the spectral line of the source or active gas. Preferably the electrodes are configured co-axially. The central electrode is preferably hollow and the active gas is introduced out of the hollow electrode. This permits an optimization of the spectral line source and a separate optimization of the buffer gas. In preferred embodiments the central electrode is pulsed with a high negative electrical pulse so that the central electrode functions as a hollow cathode.
    Type: Application
    Filed: July 3, 2002
    Publication date: January 9, 2003
    Inventors: Stephan T. Melnychuk, William N. Partlo, Igor V. Fomenkov, I. Roger Oliver, Richard M. Ness, Norbert Bowering, Oleh Khodykin
  • Patent number: 6504903
    Abstract: The end of a nozzle of a laser-excited plasma light source is made of a specific material, such as silicon Si, the transmittance of which to EUV light is higher than those of heavy metals. Therefore, even if the temperature of the end of the nozzle is higher than the melting point of the specific material because of the high temperature of the plasma produced around the focal point, the end of the nozzle is therefore eroded, and sputtered particles of the material adhere to a light-collecting mirror provided near the nozzle, the degradation of the reflectance of the light-collecting mirror is mitigated compared to the transmittance of the sputtered particles (specific material) to EUV light is higher than those of heavy metals.
    Type: Grant
    Filed: November 28, 2000
    Date of Patent: January 7, 2003
    Assignee: Nikon Corporation
    Inventors: Hiroyuki Kondo, Noriaki Kandaka
  • Publication number: 20020196900
    Abstract: A miniaturized, optically driven, therapeutic radiation source is disclosed in which the voltage gradient between a high electron accelerating voltage and the ground potential can be controlled. The electron source and the target element are disposed within a capsule which defines a substantially evacuated region extending along an electron beam axis. The inner surface of the capsule is coated with a weakly conductive or semiconductive coating, so that a substantially uniform voltage gradient is maintained within the evacuated capsule. In this way, the chances of electric flashover or breakdown are reduced. Also, secondary emissions of electrons striking the inner wall of the capsule are reduced. X-ray production efficiency is optimized by maximizing the percentage of electrons propagated directly to the target.
    Type: Application
    Filed: June 19, 2002
    Publication date: December 26, 2002
    Inventor: Mark Dinsmore
  • Patent number: 6498832
    Abstract: It has been demonstrated that debris generation within an electric capillary discharge source, for generating extreme ultraviolet and soft x-ray, is dependent on the magnitude and profile of the electric field that is established along the surfaces of the electrodes. An electrode shape that results in uniform electric field strength along its surface has been developed to minimize sputtering and debris generation.
    Type: Grant
    Filed: March 13, 2001
    Date of Patent: December 24, 2002
    Assignee: EUV LLC
    Inventors: Paul Andrew Spence, Neal Robert Fornaciari, Jim Jihchyun Chang
  • Publication number: 20020191746
    Abstract: A miniaturized, increased efficiency x-ray source for materials analysis includes a laser source, an optical delivery structure, a laser-driven thermionic cathode, an anode, and a target element. The optical delivery structure may be an aspherical lens that focuses a beam of light from the laser source and directs the beam onto a surface of the thermionic cathode. The surface is heated to a temperature sufficient to cause thermionic emission of electrons. The emitted electrons form an electron beam along a beam path. The target element is disposed in the beam path, and emits x-rays in response to incident accelerated electrons from the thermionic cathode. The target element includes an inclined surface that forms an angle of inclination of about 40 degrees with respect to the electron beam path, so that x-rays are emitted from the target substantially at an angle of about 45 degrees with respect to the electron beam path.
    Type: Application
    Filed: June 19, 2001
    Publication date: December 19, 2002
    Inventor: Mark Dinsmore
  • Publication number: 20020191745
    Abstract: A therapeutic radiation source includes a spiral-shaped, laser-heated thermionic cathode. A fiber optic cable directs a beam of radiation, having a power level sufficient to heat at least a portion of the electron-emissive surface to an electron emitting temperature, from a laser source onto the cathode. The cathode generates an electron beam along a beam path by thermionic emission, and strikes a target positioned in its beam path. The target includes radiation emissive material that emits therapeutic radiation in response to incident accelerated electrons from the electron beam. The spiral-shaped conductive element has a plurality of spaced apart turns, and is disposed in a vacuum. An interstitial spacing is defined between adjacent turns, so that heat transfer across the spacing between each adjacent turn is essentially eliminated, thereby substantially reducing heat loss in the cathode caused by thermal conduction.
    Type: Application
    Filed: June 19, 2001
    Publication date: December 19, 2002
    Inventor: Mark Dinsmore
  • Publication number: 20020186815
    Abstract: A source of photons or neutrons includes a housing that defines a discharge chamber, a first group of ion beam sources directed toward a plasma discharge region in the discharge chamber, the first group of ion beam sources including a first electrode and an inner shell, and a second electrode spaced from the plasma discharge region. The source of photons or neutrons further includes a first power supply for energizing the first group of ion beam sources to electrostatically accelerate toward the plasma discharge region ion beams which are at least partially neutralized before they enter the plasma discharge region, and a second power supply coupled between the first and second electrodes for delivering a heating current to the plasma discharge region. The ion beams and the heating current form a hot plasma that radiates photons or neutrons. The source of photons or neutrons may further include a second group of ion beam sources.
    Type: Application
    Filed: June 10, 2002
    Publication date: December 12, 2002
    Applicant: PLEX LLC
    Inventor: Malcolm W. McGeoch
  • Publication number: 20020186814
    Abstract: A source of photons includes a discharge chamber, first and second groups of ion beam sources in the discharge chamber and a neutralizing mechanism. Each of the ion beam sources electrostatically accelerates a beam of ions of a working gas toward a plasma discharge region. The first group of ion beam sources acts as a cathode and the second group of ion beam sources acts as an anode for delivering a heating current to the plasma discharge region. The neutralizing mechanism at least partially neutralizes the ion beams before they enter the plasma discharge region. The neutralized beams and the heating current form a hot plasma that radiates photons. The photons may be in the soft x-ray or extreme ultraviolet wavelength range and, in one embodiment, have wavelengths in a range of about 10-15 nanometers.
    Type: Application
    Filed: June 7, 2001
    Publication date: December 12, 2002
    Applicant: Plex LLC
    Inventor: Malcolm W. McGeoch
  • Patent number: 6493423
    Abstract: A method is described for generating EUV radiation, comprising the steps of generating a flow of a medium (39); transporting this medium through a source space (60) connected to a vacuum pump (75), and irradiating part of the medium with an intensive, pulsed laser beam (41) focused on said part of the medium, thus creating a plasma (47) which emits EUV radiation. In order to maintain a vacuum in the source space and to prevent elements of the medium, like vapor or elementary particles, from leaving the source space through apertures (63, 64) provided in the wall of the space for passing the laser beam and EUV radiation, the flow of medium is embedded in a flow of rare gas. The invention also describes an EUV radiation source unit for performing the method and the application of the method in the manufacture of devices like IC devices, and in a lithographic projection apparatus.
    Type: Grant
    Filed: November 30, 2000
    Date of Patent: December 10, 2002
    Assignee: Koninklijke Philips Electronics N.V.
    Inventor: Theodorus Hubertus Josephus Bisschops
  • Publication number: 20020181655
    Abstract: A fusion device consisting of two colliding ion beams, each produced by a high power, femtosecond regime, chirped pulsed amplification (CPA) laser acceleration device. The CPA laser creates an ionized plasma and subsequently accelerates electrons to multi-MeV energies, thus creating electric fields due to separation of electrons and ions, of sufficient magnitude to accelerate the plasma ions to energies ranging from multi-keV to multi-MeV levels. The magnetic fields created by the laser pulses, as well as the electrons and/or ions, also helps confine the ions to the region of the size of the laser beam focal spot diameter, and thus enhance the collision probability of the counter-streaming ions and provide a sizable population of fusion events. Ion beam generation by high powered, short pulse CPA lasers has been previously demonstrated in thin foil targets.
    Type: Application
    Filed: November 14, 2001
    Publication date: December 5, 2002
    Inventor: Neil C. Schoen
  • Publication number: 20020168050
    Abstract: For eliminating a high-tension cable in order to improve the handling, the open type X-ray generating apparatus (1) in accordance with the present invention employs a mold power unit in which a high-voltage generating part, a grid connecting line, and a filament connecting line which attain a high voltage are molded with a resin, whereas the mold power unit is secured to the proximal end side of a tubular portion (2), whereby an apparatus of a type integrated with a power supply is realized. Since the high-voltage generating part, grid connecting line, and filament connecting line are confined within the resin mold as such, the degree of freedom in structure of the high-voltage generating part and the degree of freedom in bending the lines improve remarkably.
    Type: Application
    Filed: April 26, 2002
    Publication date: November 14, 2002
    Inventors: Yutaka Ochiai, Kinji Takase
  • Publication number: 20020168049
    Abstract: An EUV photon source includes a plasma chamber filled with a gas mixture, multiple electrodes within the plasma chamber defining a plasma region and a central axis, a power supply circuit connected to the electrodes for delivering a main pulse to the electrodes for energizing the plasma around the central axis to produce an EUV beam output along the central axis, and a preionizer for ionizing the gas mixture in preparing to form a dense plasma around the central axis upon application of the main pulse from the power supply circuit to the electrodes. The EUV source preferably includes an ionizing unit and precipitator for collecting contaminant particulates from the output beam path. A set of baffles may be disposed along the beam path outside of the pinch region to diffuse gaseous and contaminant particulate flow emanating from the pinch region and to absorb or reflect acoustic waves emanating from the pinch region away from the pinch region.
    Type: Application
    Filed: March 27, 2002
    Publication date: November 14, 2002
    Applicant: Lambda Physik AG
    Inventors: Guido Schriever, Ulrich Rebhan
  • Patent number: 6479830
    Abstract: The invention relates to an extreme ultraviolet lithography system that utilizes thin film protective coatings to protect a plurality of hardware components, located near a laser-produced light source, from the erosive effects of energetic particles emitted by the laser-produced light source.
    Type: Grant
    Filed: November 1, 2000
    Date of Patent: November 12, 2002
    Assignee: TRW Inc.
    Inventors: Steven W. Fornaca, Samuel Talmadge
  • Patent number: 6480573
    Abstract: A therapeutic radiation source includes a optically heated thermionic cathode that is shaped so as to maximize the coupling efficiency of the incident optical radiation to the thermionic cathode. A fiber optic cable directs a beam of radiation, having a power level sufficient to heat at east a portion of the electron-emissive surface to an electron emitting temperature, from a laser source onto the cathode. An electron beam generated by said cathode strikes a target which is positioned in its beam path and which emits therapeutic radiation in response to incident accelerated electrons from the electron beam. The thermionic cathode has a non-planar configuration, such as a conical shape and a concave shape, adapted to allow an incident ray of optical radiation to impinge upon, and undergo absorption from, a plurality of regions within the surface of the cathode in succession.
    Type: Grant
    Filed: December 4, 2001
    Date of Patent: November 12, 2002
    Assignee: Photoelectron Corporation
    Inventor: Mark Dinsmore
  • Patent number: 6477235
    Abstract: A method of manufacturing an X-ray device is described including the step of coupling a housing that includes diamond to an anode structure that includes diamond. Further, a target metal may be formed on a tip of the anode structure. An X-ray device is also described including a housing made of diamond, a cathode within the housing, and an anode structure that includes diamond. The anode structure may include conductive diamond, while the housing structure may include high resistivity diamond.
    Type: Grant
    Filed: September 10, 2001
    Date of Patent: November 5, 2002
    Inventors: Victor Ivan Chornenky, Ali Jaafar, Graham Steven Kerslick
  • Publication number: 20020159568
    Abstract: It has been demonstrated that debris generation within an electric capillary discharge source, for generating extreme ultraviolet and soft x-ray, is dependent on the magnitude and profile of the electric field that is established along the surfaces of the electrodes. An electrode shape that results in uniform electric field strength along its surface has been developed to minimize sputtering and debris generation.
    Type: Application
    Filed: March 13, 2001
    Publication date: October 31, 2002
    Inventors: Paul Andrew Spence, Neal Robert Fornaciari, Jim Jihchyun Chang
  • Publication number: 20020154739
    Abstract: An emitter for a miniature X-ray apparatus comprises an insulating shell, an anode, and a cathode. The insulating shell includes a conical brazing surface, brazed to a conical brazing surface on the anode. The braze consists of a pure titanium layer and a pure tin layer. During brazing, the pure metals react and bond to the insulating shell and create a titanium-tin alloy between the pure layers. Pure tin is sputtered from tin sputter target onto the exposed brazing surfaces of the cathode cap and the anode. The insulating shell is placed in a vacuum chamber of deposition applicator, which deposits an active metal onto the shell brazing surface. In a brazing oven, the anode is placed within insulating shell such that the anode conical brazing surface and the shell conical brazing surface are contacting and aligned with each other. During brazing, the cathode is brought into contact with the insulating shell. The sealed emitters are placed in a sputtering machine's vacuum chamber.
    Type: Application
    Filed: January 17, 2001
    Publication date: October 24, 2002
    Inventors: Victor I. Chornenky, Eunsung Park, Graham S. Kerslick, Ali Jaafar, Mark Gailloux
  • Publication number: 20020154738
    Abstract: A voltage control section for controlling a pulsed acceleration voltage applied between a photoelectron releasing layer and an X-ray target in order to accelerate a photoelectron is further provided, so that the acceleration voltage is maintained at a pulse top voltage until the X-ray target is bombarded with the photoelectron after the photoelectron is released from the photoelectron releasing layer. The pulse width of acceleration voltage can be set narrower to such an extent that no discharge occurs, which enables the pulse top voltage to become higher, whereby the energy of pulse X-rays can be made higher by enhancing the speed of photoelectrons.
    Type: Application
    Filed: January 31, 2002
    Publication date: October 24, 2002
    Inventor: Kuniyoshi Mori
  • Patent number: 6469310
    Abstract: A radiation source of a radiation system of a lithographic projection apparatus includes a primary jet nozzle 10 constructed and arranged to eject a primary gas or liquid 15 in a first direction; a supply 11 for the primary gas or liquid which is to be brought into an excited energy state when ejected from the primary nozzle 10 and is to emit ultraviolet electromagnetic radiation when falling back to a lower energy state; an exciting mechanism such as a laser 30 for bringing the primary gas or liquid into the excited energy state; a secondary jet nozzle 20 constructed and arranged to eject a secondary gas or liquid 25 in the first direction and positioned aside, possibly enclosing, the primary jet nozzle 10; and a supply 21 for the secondary gas or liquid.
    Type: Grant
    Filed: December 17, 1999
    Date of Patent: October 22, 2002
    Assignee: ASML Netherlands B.V.
    Inventors: Henryk Fiedorowicz, Frederik Bijkerk, Cornelis C. De Bruijn, Andrzej Bartnik
  • Patent number: 6465954
    Abstract: A cathode structure comprising a getter material provided with a diamond film. The getter material may include zirconium, vanadium and iron. Cathode structures may have a substantially rounded configuration including a substantially straight portion. Other cathode structures may have a substantially flat portion, with the diamond film covering essentially the entire flat surface. Methods of manufacturing cathode structures may include conditioning the cathode structure by applying a voltage.
    Type: Grant
    Filed: December 27, 2000
    Date of Patent: October 15, 2002
    Assignee: Medtronic AVE, Inc.
    Inventors: Graham Steven Kerslick, Victor Ivan Chornenky
  • Publication number: 20020146092
    Abstract: A cooling system for use with high-power x-ray tubes. The cooling system includes a dielectric coolant disposed in the x-ray tube housing so as to absorb heat dissipated by the stator and other electrical components, as well as absorbing some heat from the x-ray tube itself. To improve heat absorption from the stator and the x-ray tube, the dielectric coolant is circulated throughout the housing by a circulating pump. The cooling system also includes a coolant circuit employing a pressurized water/glycol solution as a coolant. Pressurization of the water/glycol solution is achieved by way of an accumulator which, by pressurizing the coolant to a desired level, raises its boiling point and capacity to absorb heat.
    Type: Application
    Filed: April 9, 2001
    Publication date: October 10, 2002
    Applicant: Varian Medical Systems, Inc.
    Inventors: John E. Richardson, Gregory C. Andrews, Robert S. Miller, Allen C. Campbell
  • Publication number: 20020146091
    Abstract: An apparatus and method for the generation of ultrabright multikilovolt x-rays from saturated amplification on noble gas transition arrays from hollow atom states is described. Conditions for x-ray amplification in this spectral region combine the production of cold, high-Z matter, with the direct, selective multiphoton excitation of hollow atoms from clusters using ultraviolet radiation and a nonlinear mode of confined, self-channeled propagation in plasmas. Data obtained is consistent with the presence of saturated amplification on several transition arrays of the hollow atom Xe(L) spectrum (&lgr;˜2.9 Å). An estimate of the peak brightness achieved is ˜1029 &ggr;·s−1·mm−2·mr−2 (0.1% Bandwidth)−1, that is ˜105-fold higher than presently available synchotron technology.
    Type: Application
    Filed: September 14, 2001
    Publication date: October 10, 2002
    Inventors: Charles K. Rhodes, Keith Boyer