Abstract: Non-magnetic composite particles composed of non-magnetic core particles having an average particle size of 0.01 to 0.3 &mgr;m, and inorganic fine particles having an average particle size of 0.001 to 0.07 &mgr;m. The fine particles are present in an amount of 0.1 to 20% by weight based on the weight of the non-magnetic particles are on the surface of each non-magnetic particle, and are fixed or anchored on the surface of each non-magnetic particle through a silicon compound.The non-magnetic composite particles have a high polishing effect and a high dispersibility, and are useful as a non-magnetic undercoat layer for a magnetic recording medium.

Abstract: The invention relates to a method for applying a non-permeable, ceramic layer of a thickness of not more than about 100 &mgr;m to a ceramic or metallic body by applying a solution of one or more elastomers, which elastomers contain substantially not exclusively sulfur, carbon, hydrogen and oxygen, optionally drying, and pyrolyzing to form a porous layer and subsequently sintering at increased temperature to form a non-permeable ceramic layer.

Abstract: A surface of a nickel-base article such as an internal surface of a gas turbine airfoil is protected with a donor layer of aluminum and at least one other element. To form the protective layer, a donor alloy is contacted to the protected surface of the article, and simultaneously the article and the donor alloy are heated to a coating temperature that is greater than about 0.7 of the absolute solidus temperature of the donor alloy but is such that the donor alloy remains in the form of a condensed phase contacting the protected surface of the article. The donor alloy is thereafter interdiffused into the protected surface of the article.

Abstract: A perovskite-containing composite material comprising a substrate, an intermediate layer of a first titanium-containing perovskite and a covering layer of a second perovskite, both the first and the second perovskites being quaternary or higher-substituted perovskites. This composite material exhibits a single-phase perovskite covering layer and, consequently, can very suitably be used for the manufacture of electronic components and modules comprising integrated passive components. A description is given of a method of manufacturing said composite material.

Abstract: A niobium doped tin oxide coating is applied onto a glass substrate to produce a low emissivity (low E) glass. The coating can optionally be doped with both niobium and other dopant(s), such as fluorine. The low emissivity glass has properties comparable or superior to conventional low E glass with fluorine doped tin oxide coatings.

Abstract: Improved articles of manufacture are disclosed, together with methods for preparing such articles, whereby the surface of a graphite or comparable substrate is first densified with carbon to reduce surface porosity while still retaining sufficient surface texture to enhance the adherence of a subsequently applied boron coating.

Abstract: A deposition method may include, at a first temperature, contacting a substrate with a first precursor and chemisorbing a first layer at least one monolayer thick over the substrate. At a second temperature different from the first temperature, the first layer may be contacted with a second precursor, chemisorbing a second layer at least one monolayer thick on the first layer. Temperature may be altered by adding or removing heat with a thermoelectric heat pump. The altering the substrate temperature may occur from the first to the second temperature. The second layer may be reacted with the first layer by heating to a third temperature higher than the second temperature. A deposition method may also include atomic layer depositing a first specie of a substrate approximately at an optimum temperature for the first specie deposition.

Abstract: The invention is about a process for depositing via the sol-gel route a continuous or discontinuous layer based on metal oxide(s) on a substrate (1), especially a transparent substrate, which includes at least the following steps: (a)—preparation of a sol from at least one metal precursor, at least one chelating/stabilizing agent, optionally at least one solvent and/or at least one dopant precursor, (b)—deposition of the sol as a layer on at least part of one of the faces of the substrate (1), (c)—irradiation by ultraviolet rays of at least part of the sol deposited as a layer on the substrate (1), (d)—heat treatment of at least that part of the sol which was irradiated by the ultraviolet rays.

Abstract: Defective, e.g. worn or substandard, carbon-carbon fibre composite materials such as frictional materials in brakes or clutches may be restored and/or upgraded by impregnation with a molten reactive metal source comprising a carbide-forming metal or a derivative thereof such as an oxide.

Abstract: A method of on-line coating a coat film on the inner wall of a reaction tube in a hydrocarbon pyrolysis reactor for preventing the formation and the deposit of coke on the inner walls. This method comprises the steps of vapor depositing a mixed solution of a metal alkoxide and a chromic compound on the inner walls concurrently with introducing a carrier at a flow rate of 1-5000 kg/hr/coil at a temperature of 600-900° C. under a pressure of 0-3 kg/cm2 to form a buffer layer on the inner walls; and vapor depositing a metal alkoxide as a barrier on the buffer layer; and vapor depositing an alkali metal/alkaline earth metal compound alone or mixed with metal alkoxide as a decoking layer on the barrier. A decoking layer may further be provided on the diffusion barrier.

Abstract: A method for manufacturing an electron source comprised of a substrate and a plurality of electron-emitting devices arrayed upon the substrate. Each electron-emitting device includes an electroconductive film disposed over the substrate, and is manufactured according to a method comprising the steps of (a) applying a solution containing a metal compound to the substrate, and (b) applying another solution selected from the group consisting of (i) a solution containing at least one component effective to decompose the metal compound and (ii) a solution containing a resin.

Abstract: Disclosed is a process for the production of Zintl compounds by thermal decomposition of heterometallic phosphinidene complexes. The heterometallic phosphinidene complex typically comprises at least two metals, at least one of which is selected from a Group I metal, M1, and another being a metal M2, selected from Group 13, 14 or 15 of the Periodic Table. The heterometallic phosphinidene complex further comprises one or more phosphinidene ligands, [PR], wherein R is typically a substituted or unsubstituted hydrocarbyl group, and a Lewis base stabilizing ligand. Thermal decomposition of the heterometallic phosphinidene complexes in accordance with the invention forms a Zintl compound comprising metals M1 and M2 coordinated to Lewis base stabilizing ligands, Lg. The invention further provides a process for removal of the stabilizing ligand from the Zintl compounds to form an intermetallic compound.

Abstract: A method for forming an insulating film, wherein a precursor film of a coating type insulating film having Si—H bonding is coated, the precursor film is calcined in an atmosphere containing at least one of an inert gas and oxygen gas for converting it into a ceramic film as the insulating film, and then the ceramic film is cooled under reduced pressure lower than that for the calcination.

Abstract: The present invention is a composition for deposition of a mixed metal or metal compound layer, comprising a solventless mixture of at least two metal-ligand complex precursors, wherein the mixture is liquid at ambient conditions and the ligands are the same and are selected from the group consisting of alkyls, alkoxides, halides, hydrides, amides, imides, azides cyclopentadienyls, carbonyls, and their fluorine, oxygen and nitrogen substituted analogs.

Abstract: Complex mixed metal containing thin films can be deposited by CVD from liquid mixtures of metal complexes without solvent by direct liquid injection and by other precursor dispersing method such as aerosol delivery with subsequent annealing to improve electrical properties of the deposited films. This process has potential for commercial success in microelectronics device fabrication of dielectrics, ferroelectrics, barrier metals/electrodes, superconductors, catalysts, and protective coatings. Application of this process, particularly the CVD of ZrSnTiOx (zirconium tin titanate, or ZTT) and HfSnTiOx (hafnium tin titanate, or HTT) thin films has been studied successfully.

Abstract: The liner provided metallic shell having an outer-facing surface and an inner-facing surface, said inner-facing surface including a cured enamel coating thereon comprising a solids mixture of an epoxy resin, a phenolic resin, carboxypolyolefin resin and polyester resin; and a shaped thermoplastic elastomer member adhered to said enamel inner surface.

Abstract: A method for preparing a release coating and applying it to crucibles used to contain molten material while it solidifies, by mixing a release coating power with a dry organic binder into a powder and binder dry mixture, mixing a defoamer with a liquid into a liquid and defoamer mixture, mixing the dry mixture with the liquid and defoamer mixture into a wet release coating, sieving to remove lumps and particles, checking the viscosity, wet-spraying onto a crucible, evaporating the liquid from the wet release coating so as to leave a dry release coating on the crucible, and separating the binder from the dry release coating by thermal decomposition.

Abstract: Improved adhesion of thermal barrier coatings to nonmetallic substrates using a dense layer of ceramic on an underlying nonmetallic substrate that includes at least one oxidizable component. The improved adhesion occurs because the application of the dense ceramic layer forms a diffusion barrier for oxygen. This diffusion barrier prevents the oxidizable component of the substrate from decomposing. The present invention applies ceramic by a process that deposits a relatively thick and dense ceramic layer on the underlying substrate. The formation of the dense layer of ceramic avoids the problem of void formation associated with ceramic formation by most prior art thermal decomposition processes. The formation of voids has been associated with premature spalling of thermal barrier layers and other protective layers applied to substrates.

Abstract: A novel compound shown by M[N(OC2H5)5(OC2H4OCH3)]2, wherein M represents Sr or Ba, N represents Nb or Ta, which is a liquid at room temperature, is hard to be thermally dissociated, and has a vapor pressure of about 0.2 Torr at 190° C. The compound is produced by reacting 2 moles of N(OC2H5)5 and from 1 to 1.1 moles of M(OC2H4OCH3)2 and then recovering the product by distillation. By using the compounds as raw materials for a CVD method, an SrBi2Ta2O9 thin film or a (Sr0.75Ba0.25)Nb2O6 thin film for semiconductor devices can be produced.

Abstract: A method for manufacturing a metallized luminescent screen, for a cathode-ray tube, includes the steps of: depositing at least one phosphor layer on an inner surface of a faceplate of a panel to form said luminescent screen, depositing on said layer a sub-layer consisting of a lacquer, drying said sub-layer to form a film, coating at least partially the internal surface of the faceplate panel with an aqueous solution of a copolymer of acrylic/styrene, drying the copolymer coating, depositing a metallic layer onto said copolymer coating, removing the organic materials contained in the luminescent screen, the film and the copolymer coating, by baking the tube panel.

Abstract: A method for preparing a release coating and applying it to crucibles used to contain molten material while it solidifies, by mixing a release coating power with a dry organic binder into a powder and binder dry mixture, mixing a defoamer with a liquid into a liquid and defoamer mixture, mixing the dry mixture with the liquid and defoamer mixture into a wet release coating, sieving to remove lumps and particles, checking the viscosity, wet-spraying onto a crucible, evaporating the liquid from the wet release coating so as to leave a dry release coating on the crucible, and separating the binder from the dry release coating by thermal decomposition.

Abstract: Silica-based refractories are impregnated with protective material that is more resistant towards attack by corrosive species. The protective material coats the surface of the refractory matrix and fills some of the cavity volume of its pores, crevices, surfaces imperfections and irregularities. The protective material is positioned by impregnating the refractory with a precursor which, under the input of energy, is converted into the corrosion resistant protective material.

Abstract: A composition comprising (A) a silanol group-bearing silicone resin comprising 30-100 mol % of T units: R1—SiZ3 and among the entire T units, 30-80 mol % of T-2 units containing only one silanol group: R1—Si(OH)Z′2 wherein R1 is a monovalent hydrocarbon group, Z is OH, hydrolyzable group or siloxane residue, at least one Z being a siloxane residue, and Z′ is a siloxane residue, and having a number average molecular weight of at least 100, and (B) a polymer resulting from an acrylate and/or methacrylate monomer is applied to a substrate and heated above the decomposition temperature of polymer (B) to form a porous film. The porous film is flat and uniform despite porosity, and has a low permittivity and high mechanical strength. It is best suited as an interlayer insulating layer when used in semiconductor device fabrication.

Abstract: A coating liquid for forming a silica-containing film with a low-dielectric constant, which enables the formation of a low-density film having a dielectric constant as low as 3 or less and being excellent not only in resistance of oxygen plasma and in process adaptation but also in adhesion to a substrate and in film strength, is provided. A substrate coated with the silica-containing film having the above characteristics, which is obtained by the use of the above coating liquid, is further provided.

Abstract: The present invention provides a method for making a high temperature coating comprising applying to a surface a precursor polymer which decomposes to a product selected from the group consisting of a refractory metal carbide and a refractory metal boride, and exposing the precursor polymer to conditions effective to decompose the precursor polymer to the product.

Abstract: An electrically insulating thin-film-forming resin composition comprising (A) a hydrogen silsesquioxane resin, (B) a solvent-soluble polymer, and (C) a solvent; and a method for forming an electrically insulating thin film therefrom.

Abstract: Disclosed is an alkoxysilane/organic polymer composition for use in producing an insulating thin film, comprising (A) a specific alkoxysilane; (B) a specific organic polymer; and (C) a solvent for alkoxysilane (A) and organic polymer (B), wherein solvent (C) comprises at least one organic solvent selected from the group consisting of amide linkage-containing organic solvents and ester linkage-containing organic solvents. Also disclosed are a silica-organic polymer composite thin film which is produced by a process comprising: forming a thin film of the composition of the present invention; subjecting the thin film to a hydrolysis and dehydration-condensation reaction with respect to the alkoxysilane thereof, to thereby cause the alkoxysilane to be gelled in the thin film; and removing the solvent remaining in the thin film by drying, and a porous silica thin film which is obtained by removing the organic polymer from the silica-organic polymer composite thin film.

Abstract: A method of repairing a thermal barrier coating on a component designed for use in a hostile thermal environment, such as turbine, combustor and augmentor components of a gas turbine engine. The method more particularly involves repairing a thermal barrier coating on a component that has suffered localized spallation of the thermal barrier coating. After cleaning the surface area of the component exposed by the localized spallation, a ceramic paste comprising a ceramic powder in a binder is applied to the surface area of the component. The binder is then reacted to yield a ceramic-containing repair coating that covers the surface area of the component and comprises the ceramic powder in a matrix of a material formed when the binder was reacted. The binder is preferably a ceramic precursor material that can be converted immediately to a ceramic or allowed to thermally decompose over time to form a ceramic, such that the repair coating has a ceramic matrix.

Abstract: A method and article are disclosed wherein a substrate is provided with a photocatalytically-activated self-cleaning surface by forming a photocatalytically-activated self-cleaning coating on the substrate by spray pyrolysis chemical vapor deposition or magnetron sputter vacuum deposition. The coating has a thickness of at least about 500 Angstroms to limit sodium-ion poisoning to a portion of the coating facing the substrate. Alternatively, a sodium ion diffusion barrier layer is deposited over the substrate prior to the deposition of the photocatalytically-activated self-cleaning coating to prevent sodium ion poisoning of the photocatalytically-activated self-cleaning coating. The substrate includes glass substrates, including glass sheet and continuous float glass ribbon.

Abstract: An object of the present invention is to reduce a leakage current of a Pb Zr Ti O base ferroelectric thin film when a voltage is applied. A ferroelectric thin film comprising a composition of PbZrxTi1−xSbyO3 (where 0 <x<1, 0.0001≦y≦0.05) is provided herein as well as a method of producing it. The presence of the Sb serves to reduce the leakage current of the film when a voltage is applied.

Abstract: A process for depositing metal coatings on polyimide surfaces for producing conductor tracks includes depositing a first metal coating by decomposition of volatile metal compounds by a glow discharge in a gas mixture containing inert gases and oxygen containing compounds, followed by electroless deposition of a second metal coating from an acid or neutral metallizing bath.

Abstract: A method of forming a metal colloid comprising a plurality of particles, each particle comprising a core of a metal, is described. The method comprises the steps of providing an organometallic precursor comprising the metal, combining the organometallic precursor and a solvent, which comprises water molecules, heating the combination of organometallic precursor and solvent so that the organometallic precursor decomposes to form a solution including the metal colloid and by-products, and removing the by-products to provide the metal colloid.

Abstract: The present invention relates to a method for carrying out a magnesium oxide based deposition on the dielectric surface of a glass plate of a display panel. The method includes the creation of a mist from a metalorganic compound of magnesium dissolved in a solvent, the conveying of the mist to the dielectric surface of the plate, the evaporation the solvent when approaching the dielectric surface of the plate which is taken to a temperature of about 380° to 430°, and the pyrolysis of the metalorganic compound leading to the magnesium oxide based deposit on the surface of the plate and the evaporation of the organic radical of the compound, this deposit being practically waterproof. The method is especially useful in the manufacture of plasma panels.

Abstract: The present invention relates to a coated body such as a cutting tool insert comprising a wear resistant coating and a cemented carbide body particularly useful for the machining of cast iron parts by turning, milling or drilling at high speeds. The cemented carbide body consists of WC, 3.5-9 wt-% Co and <2 wt-% carbides of Ta, Ti and Nb. It has a core containing finely distributed eta phase islands and an intermediate zone 50-250 &mgr;m thick essentially free of eta phase and with nominal Co content whereby the binder phase in the intermediate zone is present as smaller original islands and larger islands transformed from original eta phase. These latter Co-islands therefore have a size and distribution essentially the same as that of the eta phase in the core. There may be present a thin surface zone free of eta phase with a Co content lower than the nominal Co-content.

Abstract: Integrated circuit capacitors in which the capacitor dielectric is a thin film of BST having a grain size smaller than 2000 Å. Typical gain sizes are 40 nanometers and less. The BST is formed by deposition of a liquid precursor by a spin-on process. The original liquid precursor includes an alkoxycarboxylate dissolved in 2-methoxyethanol and an xylene exchange is preformed just prior to spinning. The precursor is dried in air at a temperature of about 400° C. and then furnace annealed in oxygen at a temperature of between 675° C. and 850° C.

Abstract: Spherical, non-crystalline silica particles made by burning a non-halogenated siloxane starting material are substantially halogen-free, and have a content of metallic impurities other than silicon of not more than 1 ppm, a particle size of 10 nm to 10 &mgr;m and a specific surface area of 3-300 m2/g. Production of the particles is carried out by oxidative combustion of the non-halogenated siloxane in a flame at a high adiabatic flame temperature to effect the formation of a large number of core particles and promote their coalescence and growth.

Abstract: The method is disclosed for coating or impregnating a substrate with a metal oxide. The method includes the steps of applying a liquid metal carboxylate composition, or a solution thereof, to a substrate material, and exposing the substrate material to an environment that will cause vaporization or dissipation of any excess carboxylic acids in the liquid metal carboxylate composition and conversion of the metal carboxylates to metal oxides.

Abstract: A method of forming a film on a substrate using chemical vapor deposition techniques and carboxylate complexes. The complexes and method are particularly suitable for the preparation of semiconductor structures.

Abstract: A ferroelectric element comprising a ferroelectric material containing at least two metals, the ferroelectric element having been produced by a process including a sol-gel process in the presence of a thickener and/or an association preventive from aqueous solutions of respective salts of the metals. The ferroelectric element is advantageous in that the handling of starting compounds and the production of the ferroelectric element are easy, the storage stability of the starting compound solution is good, the cost is low, the ferroelectric element can be formed as a thin layer, particles on the surface of the thin layer are fine and dense, and, hence, the surface smoothness is good. The ferroelectric element is excellent also in piezoelectric properties and therefore can be advantageously used as a piezoelectric element in a piezoelectric ink jet head.

Abstract: Hollow carbon particles having an average particle size of 0.05 to 5.0 &mgr;m, a shell thickness of 5 to 50 nm and a particle size distribution of not more than 30%. The hollow carbon particles have a desired shape, and are excellent in particle size distribution and mechanical strength.

Abstract: A sol-gel precursor mixture for forming a perovskite ferroelectric material and a method for forming a ferroelectric material are provided. The precursor solution comprises a sol-gel formulation of a mixture of an inorganic salt of at least one metal, and metal-organic compounds of other constituent metals in a suitable pH controlled aqueous solvent mixture to form a stable, clear sol-gel mixture. The precursor solution and method provides for formation of thin layers of other ferroelectric dielectrics and piezoelectric materials, particularly lead containing materials, for application including non-volatile DRAMs, optoelectronic devices relying on non-linear optical properties, and piezoelectric devices, and is compatible with processing for submicron device structures for bipolar, CMOS or bipolar CMOS circuits.

Abstract: The present invention provides a method for manufacturing zeolite which is useful as catalyst carrier for exhaust gas clean up by decomposition, reduction or oxidation catalyst carrier for synthesis and/or decomposition of organic or inorganic chemicals, and membrane for selective separation of organic substances, gases and inorganic cations. This new method is one in which a crystalline silica or amorphous glass contained in a fired ceramic substrate is used as a silica source for forming a natural or synthetic zeolite film on the ceramic substrate, while at the same time making the ceramic substrate porous.

Abstract: This invention is directed to novel silica compositions, metal silicates, germanosilicates, and metal germanosilicates, and patterned objects and films comprising the same. It also includes methods and compositions for making these films and patterned objects on substrates, ranging from silicon wafers to optical fibers, silica, sapphire, quartz and borosilicate glass. These methods incorporate the use of certain precursor compositions, procedures for their application to a substrate and subsequent treatment to produce a patterned object and/or the conversion to glass structures.

Abstract: A ferroelectric element comprising a ferroelectric material containing at least two metals, the ferroelectric element having been produced by a process including a sol-gel process in the presence of a thickener and/or an association preventive from aqueous solutions of respective salts of the metals. The ferroelectric element is advantageous in that the handling of starting compounds and the production of the ferroelectric element are easy, the storage stability of the starting compound solution is good, the cost is low, the ferroelectric element can be formed as a thin layer, particles on the surface of the thin layer are fine and dense, and, hence, the surface smoothness is good. The ferroelectric element is excellent also in piezoelectric properties and therefore can be advantageously used as a piezoelectric element in a piezoelectric ink jet head.

Abstract: Metal surfaces, metal-oxide surfaces, metal-salt surfaces, silicon-comprising surfaces and/or high-molecular-weight aquoxide-comprising organic surfaces are coated. The coating is carried out with a reagent having a reactive group chosen from Si—H, Sn—H, and Ge—H. The reagent is applied in liquid, pasty, or solid form to the surface that is to be coated. Furthermore, the coating reaction requires the presence of an activator. A platinum metal in form of a compound or in metallic form is used as activator.

Abstract: A raw material mixture, which has a glass composition containing a salt or an oxide of a flame reaction metal, is heated, and an intermediate base material, in which the salt of the flame reaction metal, or the like, has been thermally decomposed and which is in a temporary sintered state or a fused glass state, is thereby formed. The intermediate base material is ground, and a ground material is thereby obtained. The ground material is mixed together with a liquid and, optionally, a binder, and a viscous flame reaction material is thereby formed. The viscous flame reaction material is supported on a substrate and heated to a temperature, which is not lower than a vitrification melting temperature of the viscous flame reaction material. In this manner, the flame reaction material is fusion bonded to the substrate. Generation of a thermal decomposition gas in the baking step is thus restricted, and the carrying of the flame reaction material on the substrate is carried out appropriately.

Abstract: An activated cathode comprising an electrically conductive substrate, an interlayer comprising a nickel oxide formed on the surface of the electrically conductive substrate, and a catalyst layer containing at least one lanthanum component selected from oxides and hydroxides of lanthanum metals and at least one platinum component selected from platinum metals and silver and oxides and hydroxides thereof formed on the interlayer. A process for the preparation of an activated cathode is also disclosed which comprises forming an interlayer comprising a nickel oxide on the surface of an electrically conductive substrate, and then forming a catalyst layer containing at least one lanthanum component selected from oxides and hydroxides of lanthanum metals and at least one platinum. component selected from platinum metals and silver and oxides and hydroxides thereof on the surface of the interlayer.

Abstract: Disclosed is a method for producing a patterned calcined inorganic film such as an electroconducting or insulating (non-conductive) film, particularly a plasma display panel, embracing a calcining step. To produce a patterned calcined inorganic film without inducing warpage, shrinkage of line width, or breakage of patterned lines, a patterned film formed on a substrate with a composition containing a heat decomposable binder and particles of an inorganic material is covered, prior to the calcining step, with a coating film of a heat decomposable resin composition capable of hardening or drying at a temperature lower than the temperature at which the heat decomposable binder is thermally decomposed and further capable of being burned off below the highest temperature of the calcining profile and thereafter the calcining step is performed.

Abstract: A method of removing a diamond coating from a substrate of a diamond-coated body which includes the substrate coated with the diamond coating. The method includes a step of heating the diamond-coated body at a predetermined temperature in a reactor at a predetermined reduced pressure, while introducing an oxygen gas into the reactor at a predetermined flow rate, for burning the diamond coating to thereby remove the diamond coating from the substrate.

Abstract: In a solution for forming electron-emitting regions of electron-emitting devices, the solution contains a metal carboxylate expressed by the following general formula (I), an organic solvent and/or , and water; (R(COO)k)mM  (I) where k=numeral from 1 to 4 , m=a numeral from 1 to 4, and R=CnX2n+1−k R=CnX2n+2−k where X=a hydrogen or halogen (total number of hydrogen and halogen atoms is 2n+1) , n=an integer from 0 to 30, and M=a metal, wherein the organic solvent is a carboxylic ester having the same carboxylic group as R(COO)k expressed in the general formula (I). In a manufacture method of electron-emitting devices each provided between electrodes with a conductive film including an electron-emitting region, a process of forming the conductive film includes a step of coating and calcining the above solution. An image-forming apparatus is manufactured by using the electron-emitting devices.