Abstract: Encapsulating a component structure includes applying a fluid, light-sensitive first reactive resin layer to a surface of a component substrate containing the component structure, exposing and developing the first reactive resin layer so as to form a frame structure that encloses the component structure, covering the frame structure with an auxiliary foil, applying a second reactive resin layer to a surface of the auxiliary foil so as to form ceiling structures on the surface of the auxiliary foil, at least one of the ceiling structures making a seal with the frame structure, and removing the auxiliary foil in areas between ceiling structures.

Abstract: A transfer belt for a paper machine has a substrate and a coating on at least one flat side. The coating has an inner layer and an outer layer adjacent thereto. The outer layer has a porous structure having cavities open toward the outer side.

Abstract: A treatment method for preservation of plant leaves wherein the plant leaves are immersed in a dehydrating solvent consisting of acetone and ethyl alcohol to replace the tissue water and remove chlorophyll in the leaves by the dehydrating solvent. Thereafter, the leaves are immersed in a permeating solution containing polyethylene glycol and acetone for allowing polyethylene glycol to permeate the leaves for replacing the dehydrating solvent. Thereafter, the leaves are dyed with a coloring matter.

Abstract: An impregnation process of a porous support including immersing the support in an aqueous colloidal dispersion of ionomeric (per)fluorinated polymer, containing suiphonyl fluoride groups and having a concentration greater than 15% by weight, thermal treatment at 200° C. or less, conversion of the ionomer sulphonyl groups into the corresponding salts, ionomer crosslinking when ionomer equivalent weight is less than 650 g/eq.

Abstract: A complex porous structure of a reticulated foam, felt or fabric types, wherein their metallisation over their entire developed surface, by electrolysis of lead or lead alloys, is made possible by a specific preliminary conductive activation treatment obtained by using two consecutive phases of coating the developed surface of the structures, comprising a first deposition of a conductive polymer, which provides the structures with the required conductivity, and a second thin deposition of conductive lacquer or varnish which ensures the surface protection of the conductive polymer against the deactivating effect of the conductive nature of the latter, due to the cathodic polarisation of the said structures in the electrolytic lead-coating bath.

Abstract: A connecting member, used for serially connecting two carrier tapes, comprises a base film, a belt-like reference band substantially fixed on the base film, a bonding tape adhering on the base film, and a cover film covering the bonding tape. A straight reference face is provided on a longitudinal side of the reference band closely to the bonding tape.

Abstract: A system and method of coating articles with the method comprising directing a plurality of articles into an enclosure; applying a vehicle carrying a first agent onto the plurality of articles; converted the vehicle into a gaseous state to leave the first agent on each the plurality of articles; collecting the vehicle in the gaseous state; converting the vehicle in the gaseous state back into a reclaimed state to enable one to add a further agent to the reclaimed vehicle so that one can apply the reclaimed vehicle and a further agent onto a further set of articles.

Abstract: There are provided a dust generation preventing structure of a wafer storage case and a process for preventing dust generation thereof, wherein dust generation is effectively prevented by blocking or suppressing free movement of particles constantly generated from a surface of a wafer storage case of a synthetic resin with a coating layer of a surfactant, and a wafer storing method using the wafer storage case. The wafer storage case of synthetic resin is used for housing wafers, and a surface of the wafer storage case is coated with a coating layer of a coating agent to prevent dust generation from the surface.

Abstract: A method for coating low viscosity materials onto a wafer to form a uniform film. After a wafer is rotated at a first rotation speed, coating solution is dispensed onto the wafer. The wafer is decelerated to a second rotation speed at a first deceleration rate to spread the coating solution. Next, the wafer is slowly decelerated to a third rotation speed at a second deceleration rate considerably lower than the first deceleration rate, so the coating solution reflows to the center of the wafer. The wafer is then quickly accelerated to a fourth rotation speed at a third acceleration rate larger than the first deceleration rate to spread the coating solution again.

Abstract: The present invention is a CVD process for forming a thin film which includes a step of recovering an organometallic compound component from an exhaust gas which has been conventionally discarded, and a purifying step of purifying the recovered organometallic compound to thereby eliminate a by-product formed in a film forming step by CVD. According to this process, the organometallic compound is recycled. As a recovering technique, any of the followings is employed: a technique in which the exhaust gas is cooled and is recovered as a recovered content; a technique in which the exhaust gas is brought into contact with a solvent to dissolve the organometallic compound in the solvent; and a technique in which the exhaust gas is brought into contact with an adsorbent to thereby adsorb the organometallic compound.

Abstract: A method for applying a highly porous alumina material that is useful in the hot section of a jet aircraft engine. In order to apply the porous alumina, an aluminum-based metal/alumina material known in the art is first placed onto an aircraft engine component substrate. The aluminum-based metal is then dissolved using a solution that will not affect the alumina or the underlying substrate. The alumina is then washed with deionized water and dried. The aircraft engine component may be first masked by applying a non-porous metal oxide material to the component or by oxidizing the surface of the component. The resulting alumina has a porosity in the range of about 20% to about 45%. The alumina has globular interconnected surface features in the range of about 0.5 ?m to about 20 ?m.

Abstract: The present invention provides a process for fabricating ultrathin monolayers or ultrathin multilayer films, the process comprising the steps of: introducing positive or negative charge or a material capable of hydrogen-bonding to a substrate and placing the substrate on a spinner(pretreating step); introducing a material (A) bindable with the material deposited on the substrate, and spinning the substrate at 500 rpm to 30000 rpm for 4 to 200 seconds(first coating step); dropping washing solvent onto the substrate after completion of the first coating and spinning the substrate at 500 rpm to 30000 rpm for 4 to 200 sec to remove weakly-bound material (A) and form a thin film (A)(first washing step); introducing another material (B) bindable with the material (A) coated on the substrate and further coating it in the same condition as of the first coating(second coating step), dropping washing solvent onto the substrate after completion of the second coating and spinning the substrate at 500 rpm to 30000 rpm for

Abstract: Electro-optic structures are constructed by spin coating water based emulsions or solvent based sensor materials, preferably a solvent-based polymer dispersed liquid crystal (PDLC), onto a substrate under conditions of controlled solvent evaporation. In a particular process, the uniformity of the PDLC coating is achieved by 1) spin coating in a semi-sealed chamber, 2) “converting” a square substrate into round substrate by using a fixture; 3) providing a controllable distance between the substrate and a spin coater top cover; and 4) providing a controllable solvent evaporation rate.

Abstract: A method for spin coating a polymeric material film upon a wafer rotatably mounted within a spin coater; the wafer having a surface, including the following steps. A first step of rotating the wafer on an axis perpendicular to the wafer surface while applying a predetermined amount of polymeric material while rotating the wafer at a rotational speed of from about 300 to 1200 rpm for from about 2.5 to 5 seconds to spread the polymeric material on the whole surface of the wafer. A second step of increasing the rotational speed of the wafer to about 5500 rpm for about 2.5 seconds. A third step of decreasing the rotational speed of the wafer to about 300 to 1200 rpm for about 2.5 seconds. A fourth step of increasing the rotational speed of the wafer to about 5500 rpm for about 20 seconds to form the polymeric material film having a predetermined thickness over the whole surface of the wafer.

Abstract: A process for impregnating a porous part is provided. In one embodiment, the process comprises impregnating the part with an impregnant that is not water soluble, and curing the impregnated part in a water bath. In another embodiment, the process comprises impregnating a part with an impregnant that is not water soluble, washing the impregnated part in a washing solution, and then curing the impregnated part in a water bath.

Abstract: In a ceramic hybrid substrate and a method for treating the surface of a ceramic hybrid substrate having ceramic surface areas and metallic surface areas, the ceramic surface areas are esterified.

Abstract: Substrate processing methods and apparatuses are disclosed. One embodiment of the invention is directed to a substrate processing apparatus for processing an analytical substrate. The apparatus includes a substrate holder for holding a substrate and a processing chamber including an opening for receiving the substrate holder and the substrate. A fluid inlet and a fluid outlet are in the processing chamber. A washing device adapted to supply a wash liquid to the substrate while the substrate is in the processing chamber. A liquid removal device adapted to dry the substrate when the substrate is being withdrawn from the processing chamber.

Abstract: The present invention relates to an artificial leather having nap very little oriented on the surface and having short fibers densely, and hence having a good nubuck-like look and hand, and also relates to a production process thereof. The present invention provides an artificial leather having a nap surface of ultra-fine fibers at least on one side, which is formed by applying an elastic polymer to an ultra-fine fiber-entangled substrate, characterized by being 0.3 g/cm3 or more in the apparent density of the artificial leather, being 0.5 mm or less in the nap length, and being 25% or less in the R value obtained from the goniometric reflectance distribution measured with the nap surface rotated from 0 degree to 180 degrees using a goniophotometer.

Abstract: The invention relates to a method for coating substrate surfaces, in particular for influencing the hydrophilic or hydrophobic properties thereof. According to the invention, the above effect may be achieved easily and not at great expense and furthermore with a removal of polymer which is not deposited on the surface, whereby a polymer with derivatised hydroxyl and/or carboxyl groups and/or CN, halogen and/or amino substituents is brought into contact with the surface as a solution, the derivatised hydroxyl and/or carboxyl groups or the CN, halogen or amino substituents are subjected to solvolysis, thus converting the polymer into a form with reduced solubility.

Abstract: A method for texturing substrate surfaces and a substrate product, such as for computer disk drives. Microbump textured substrates are produced having a Rp value of about 20-200 Å and a ratio of Rmax:Rp of about 1.4 or less. In an exemplary embodiment, a microbump textured substrate is produced having colloidal particles on a surface thereof at a density of at least about 25 particles per 25 &mgr;m2, wherein the surface topography includes a Rp value of about 20-200 Å, a micro-roughness Rq of about 10 Å or less, and a ratio of Rmax:Rp of about 1.4 or less. An exemplary method includes first providing a substrate surface having a surface micro-roughness Rq of about 10 Å or less and depositing colloidal particles on the surface to provide a Rp value of about 20-200 Å and a ratio of Rmax:Rp of about 1.4 or less. In a further exemplary embodiment, the method increases the micro-roughness Rq, but to a value that is still less than about 10 Å with Rmax:Rp still of about 1.

Abstract: A new method is proposed for the production of plane-parallel platelets, comprising the steps a) vapour-deposition, at a pressure below atmospheric pressure, of a separating agent onto a carrier to produce a separating agent layer, b) vapour-deposition, at a pressure below atmospheric pressure, of at least one product layer onto the separating agent layer, c) dissolution of the separating agent layer in a solvent and production of a suspension in which the at least one product layer is present in the form of plane-parallel platelets, in which method the separating agent is selected from the group consisting of anthracene, anthraquinone, acetamidophenol, acetylsalicylic acid, camphoric anhydride, benzimidazole, benzene-1,2,4-tricarboxylic acid, biphenyl-2,2-dicarboxylic acid, bis(4-hydroxyphenyl)-sulfone, dihydroxyanthraquinone, hydantoin, 3-hydroxybenzoic acid, 8-hydroxyquinoline-5-sulfonic acid monohydrate, 4-hydroxycoumarin, 7-hydroxycoumarin, 3-hydroxynaphthalene-2-carboxylic acid, isophthalic acid, 4,4-me

Abstract: An apparatus and method for extracting impurities from a layer on a substrate includes decomposing the layer on the substrate to expose impurities and extracting the impurities from the substrate. During the decomposing, reacting material may be supplied to the layer as an aerosol. By detecting and monitoring the volume of discharged material from the decomposing, an end point of decomposing may be determined. Surface tension may be provided to extraction solution during extracting to prevent the extraction solution from separating from a nozzle injecting the extraction solution and from being locally saturated with impurities. A receiving module for receiving various sizes of the wafer may be included.

Abstract: An economical process for creating decorative and/or functional finishes on chrome, involves formation of a polyurethane film on the chrome substrate, wherein a strong and durable adhesion between the polyurethane film and the metal substrate is achieved by employing a silane adhesion promoter. Specific embodiments involve the use of an aromatic amine functional silane-coupling agent and/or an epoxy functional silane-coupling agent to achieve excellent adhesion between the polyurethane film and a chrome surface.

Abstract: A method of preparing a treated textile, having steps of: (1) preparing a treatment liquid comprising a water- and oil-repellent agent, (2) adjusting pH of the treatment liquid to at most 7, (3) applying the treatment liquid to a textile, (4) treating the textile with steam, and (5) washing the textile with water and dehydrating the textile, wherein the water- and oil-repellent agent contains (A) a fluorine-containing compound which is a fluorine-containing polymer, and (B) a urethane compound and/or (C) a silicon-containing compound, can give a textile which is excellent in water repellency, oil repellency and soil releasability, when the textile is treated with the treatment liquid by an Exhaust process.

Abstract: An apparatus for and method of rinsing one side of a two-sided substrate and removing unwanted material from the substrate's edge and/or backside. One embodiment of the method is directed toward rinsing and cleaning a substrate having a front side upon which integrated circuits are to be formed and a backside. This embodiment includes dropping the substrate front side down onto a pool of rinsing liquid in a manner such that the front side of the substrate is in contact with the solution while the substrate is held in suspension by the surface tension of the solution liquid thereby preventing the backside of the substrate from sinking under an upper surface of the pool. Next, while the substrate is in suspension in said rinsing liquid, the substrate is secured by its edge with a first set of fingers and in some embodiments the substrate is subsequently spun. In another embodiment, a method of forming a copper layer on a front side of a substrate is disclosed.

Abstract: A method for manufacturing a microporous film comprising the steps of: (a) providing a first polymer which is a hydrophobic thermoplastic polymer and a second polymer which is a hydrophilic polymer or copolymer of N-vinylpyrrolidone; (b) dissolving said first and second polymers in a solvent system which is compatible with both polymers, said solvent system comprising a blend of an aprotic organic solvent and an alcohol; (c) coating the resulting solution on a support; (d) effecting at least a partial drying of the resulting coating; and (e) washing the coating in an aqueous medium so as to extract at least 50% by weight of the said second polymer.

Abstract: A method for producing a coating of fluorescent or luminophore material includes the steps of depositing the luminophore material from a vapor phase on a substrate in such a manner that at least 30 weight-% of the luminophore material used is deposited on the substrate and then abrading or polishing the luminophore coating to a predetermined even layer thickness utilizing a polishing agent.

Abstract: The present invention is related to systems and methods for modifying various non-equidimensional substrates with modifying agents. The system comprises a processing chamber configured for passing the non-equidimensional substrate therethrough, wherein the processing chamber is further configured to accept a treatment mixture into the chamber during movement of the non-equidimensional substrate through the processing chamber. The treatment mixture can comprise of the modifying agent in a carrier medium, wherein the carrier medium is selected from the group consisting of a supercritical fluid, a near-critical fluid, a superheated fluid, a superheated liquid, and a liquefied gas. Thus, the modifying agent can be applied to the non-equidimensional substrate upon contact between the treatment mixture and the non-equidimensional substrate.

Abstract: An organic solvent-free process for deposition of metal oxide thin films is presented. The process includes aqueous solutions of necessary metal precursors and an aqueous solution of a water-soluble polymer. After a coating operation, the resultant coating is fired at high temperatures to yield optical quality metal oxide thin films.

Abstract: A liquid pressure transfer print method for printing a steering wheel rim of an automobile includes lowering the steering wheel rim up to a boundary line of a primary transfer print portion, without attaching a mask member to the other side surface of the steering wheel rim, opposite to the primary transfer print portion, after floating the transfer print film on liquid, half drying the polyvinyl alcohol layer on the primary transfer print portion of the steering wheel rim for a predetermined time and at a predetermined rate so the polyvinyl alcohol layer at a first transfer print surface is dried to a gel state, flipping the steering wheel rim and lowering the other side surface to beyond the boundary line, and soaking the steering wheel rim having the entire surface transfer printed in a solution and cleaning the polyvinyl alcohol layers by spraying the solution against the surface of the steering wheel rim.

Abstract: A lubricating layer is applied to the surface of a thin protective layer on a magnetic recording medium. The surface of the protective layer is burnished to reduce protuberances. The lubricating layer is removed by solvent washing. Then, a replacement lubricating layer is deposited on the surface of the protective layer. The resulting surface of the magnetic recording medium exhibits reduced scratching and particle contamination.

Abstract: The invention provides methods of forming a monomolecular chemisorption film having an excellent uniformity and liquid crystal alignment performance with a high production efficiency. The monomolecular chemisorption film of the invention can be suitably used for liquid crystal alignment layers.

Abstract: A process of drying a cast film polymeric disposed upon a workpiece. In this process a cast polymeric film, which includes a volatile organic compound therein, disposed on a workpiece, is contacted with an extraction agent which may be liquid carbon dioxide or supercritical carbon dioxide.

Abstract: At least one monomolecule film is formed on a transparent substrate surface directly or via a protective film. The monomolecule film is formed with chemical coupling of chlorosilane surface active compound, for example, of the formula: F(CF2)m(CH2)nSiRqX3—q where m is an integer of from 1 to 15, n is an integer of from 0 to 15 provided that the total of m and n is an integer of from 10 to 30 and R is an alkyl or an alkoxyl group, or F(CF2)m′(CH2)n′A(CH2)pSiRqX3−q where m represents an integer ranging from 1 to 8, n′ represents an integer ranging from 0 to 2, p represents an integer ranging from 5 to 25, q represents an integer ranging from 0 to 2, X represents a halogen atom or an alkoxyl group, R represents an alkyl or an alkoxyl group, and A represents —O—, a —COO— or —Si(CH3)2—. The transparent substrate such as glass is made hydrophobic and free of contamination.

Abstract: A functional member having a molecular layer on its surface, wherein the molecular layer is formed through a coordinate bond, and the coordinate bond is a multidentate bond in which at least one molecule is bonded to one metallic atom of the member and two or more ligands of the molecule are coordinated.

Abstract: An apparatus and method for processing substrates are provided. The apparatus includes a first processing unit and a second processing unit. A substrate holder is vertically displaceable over the first processing unit, and is guided outside the first and second processing units. In a raised position of the substrate holder relative to the first processing unit, the second processing unit is movable between the substrate holder and the first processing unit.

Abstract: A compound represented by a general formula (1) ABXn (where A is a carbon-containing group; B is at least one element selected from Si, Ge, Sn, Ti and Zr; X is a hydrolyzable group; and n is 1, 2 or 3), for example, a chlorosilane compound having a fluorocarbon group, is measured in an amount required for one time application, and dropped from a nozzle on a surface of a substrate having an active hydrogen on the surface, and simultaneously it is rubbed with a coater made of a sponge or a nonwoven fabric, etc. Furthermore, it is rubbed with a coater made of a sponge or a nonwoven fabric, etc. while blowing a dry warm air, and an elimination reaction is caused between the active hydrogen on the surface of the substrate and the hydrolyzable group of the compound. Thus, the compound is covalently bonded to the substrate. The molecules of the silane compound also are polymerized with one another to be fixed.

Abstract: An apparatus and method is disclosed for holding semiconductor wafer samples that are to be stained with treatment chemicals prior to microanalysis. The apparatus includes at least one slotted support member and a handle which may be attached to or integral with the support member. The number of slots in the support member correspond to at least the number of wafer samples that are to be retained in the slots. Preferably, three support members are spaced parallel to each other and the slots in all three support members are aligned in parallel planes so that larger wafer samples can be seated within the slots on more than one support member and the handle is attached perpendicular to and bisects each member. Also two bending rods are disposed on opposite sides of the handle perpendicular to the support members for bending the support members to open the slots to receive the wafer samples.

Abstract: The present invention relates to methods of treating surfaces, to protect or clean said surfaces. The invention more particularly relates to the treatment of interior walls or surfaces, particularly indoor household walls or surfaces, to protect the same from soiling or stains. This invention also relates to compositions, kits and devices for use in the above methods, to protect or clean indoor surfaces. This invention can be applied to various indoor surfaces, such as soft and permeable surfaces, in particular painted walls, wall paper and wallcloth.

Abstract: Adsorbent particles comprising superparamagnetic and/or low Curie Temperature transition metal-containing cores surrounded by a hydrous siliceous oxide coating can be formed by an aqueous process wherein the core is precipitated from an aqueous solution and a siliceous oxide coating is deposited thereon while complete drying of the core is avoided until after the siliceous oxide is deposited. The resulting siliceous adsorbents exhibit strong superparamagnetic and/or low Curie temperature magnetic properties with low transition metal leachability.

Abstract: The present invention provides a chemical adsorption solution prepared by dissolving a silane-based chemical adsorption material in a non-aqueous organic solvent, in which the non-aqueous organic solvent is a mixture including a first non-aqueous organic solvent and a second non-aqueous organic solvent having a boiling point higher than that of the first non-aqueous organic solvent. A preferable difference in the boiling point is at least 10° C. Preferably, the first non-aqueous organic solvent has a boiling point of not more than 120° C. and the second non-aqueous organic solvent has a boiling point of not less than 150° C. The chemical adsorption solution coated on a substrate is concentrated by evaporating the solvent having the lower boiling point, so that a chemically adsorbed film having a uniform film thickness can be formed in a short time.

Abstract: The sensor is formed by disposing an electrolyte between and in intimate contact with a first electrode on the one side and a second electrode on the other side to form an assembly, heating the assembly, treating the assembly with an alkaline solution and removing the impurities to obtain optimal sensor performance. Alternatively, an electrolyte is formed, sintered, treated with alkaline solution, and then the electrodes are applied.

Abstract: An adherent, transparent moisture barrier is applied to alkaline earth sulfide phosphor particles by stirring in an anhydrous polar solvent including a fluorinating compound present in a concentration of no higher than 0.02 molar until a transparent fluorine-containing moisture-impervious coating has been applied to the particles. The polar solvent is removed and the coated particles dried. A second moisture barrier can also be applied to ensure long term resistance of the phosphors to degradation by moisture.

Abstract: The present invention provides a method of treating silica, wherein dry silica is contacted with a reaction medium consisting essentially of concentrated aqueous acid and a hydrophobing agent selected from the group consisting of organosiloxanes and organochlorosilanes. The silica is then reacted with the hydrophobing agent in the reaction medium for about 90 minutes or less at a temperature from about 10° C. to about 40° C. to provide a hydrophobic treated silica. The hydrophobic treated silica then is recovered.

Abstract: This pertains generally to precursors and deposition methods suited to aerogel thin film fabrication of nanoporous dielectrics. An aerogel precursor sol is disclosed. This aerogel precursor sol contains a metal alkoxide (such as TEOS) and a solvent, but no gelation catalyst. By a method according to the present invention, such a precursor sol is applied as a nongelling thin film 14 to a semiconductor substrate 10. This substrate may contain patterned conductors 12, gaps 13, or other structures. An independent gelation catalyst (preferably, vapor phase ammonia) is added to promote rapid gelation of the thin film sol 14 at the desired time. One advantage is that it allows substantially independent control of gelation and pore fluid evaporation. This independent catalyst introduction allows additional processing steps to be performed between sol deposition and the onset of substantial gelation. One potential step is to evaporate a portion of the pore fluid solvent.

Abstract: The invention comprises a method for applying a curable resin such as a photosensitive resin, to a substrate such as a papermaker's dewatering felt. The method comprises the steps of providing a curable liquid resin, providing a substrate having a first surface and a second surface, the substrate comprising fibers defining voids intermediate the first and second surfaces, and the substrate comprising a second material different from the curable liquid resin, the second material coating at least some of the fibers, wherein the voids adjacent the coated fibers provide fluid communication from the first surface of the substrate to the second surface of the substrate; removing at least some of the second material coating at least some of the fibers; applying the curable liquid resin to the substrate; and curing at least some of the resin to provide a resin layer on the substrate.

Abstract: The methods of forming a chemically adsorbed film by contacting a substrate with a solution mixture containing an alkoxysilane surface active agent, a non-aqueous solvent and a silanol-condensing catalyst to form a film covalently bonded to the substrate via siloxane bonds. These methods do not generate hydrochloric acid gas in forming the films and allow practical reaction rates.

Abstract: A method for staining a portion of a semiconductor wafer sample with a semiconductor treatment chemical. On embodiment of the method includes gripping the semiconductor wafer sample in a first openly biasable slot in a flexible bar and suspending the semiconductor wafer into the chemical. Other embodiments of the method may further include gripping plural semiconductor wafer samples in openly biasable sots in flexible bars to enable a plurality of semiconductor wafer samples to be treated with a semiconductor treatment chemical.

Abstract: The invention relates to a process for producing aerogels with permanently hydrophobic surface groups, in which a) silicate lyogel is provided, b) the gel provided in step a) is washed with an organic solvent, c) the gel obtained in step b) is surface silylated and d) the surface-silylated gel obtained in step c) is dried, where the organic solvent used in step b) is a diether of formula (I) R.sup.1 --O--(CH.sub.2).sub.n --O--R.sup.2 in which R.sup.1 and R.sup.2 are mutually independently the same or different alkyl groups with 1 to 4 C atoms and n is a natural number in the range from 1 to 5.

Abstract: The susceptibility to heat degradation of an autodeposited coating in which the principal organic constituents are copolymers of vinylidene chloride in which vinylidene chloride residues constitute at least half the weight of the total binder phase in the autodeposited coating is improved if the wet autodeposited coatings are rinsed, before being later dried and cured, with a water-based liquid rinse that comprises dissolved phosphate ions in a concentration that corresponds stoichiometrically to at least 0.5 g/l of tripolyphosphate ions. The water-based liquid rinse preferably has a strongly alkaline pH and also comprises dissolved organic molecules that are effective chelating agents for dissolved iron cations by reason of having in each molecule at least two carboxyl, carboxylate, and/or other hydroxy moieties.