Cleaning Or Removing Part Of Substrate (e.g., Etching With Plasma, Glow Discharge, Etc.) Patents (Class 427/534)
  • Patent number: 10115583
    Abstract: There is provided a method of manufacturing a semiconductor device which includes: supplying a process gas to a process chamber in a state in which a substrate with an insulating film formed thereon is mounted on a substrate support part inside the process chamber; supplying a first power from a plasma generation part to the process chamber to generate plasma and forming a first silicon nitride layer on the insulating film; and supplying a second power from an ion control part to the process chamber in parallel with the generation of plasma, to form a second silicon nitride layer having lower stress than that of the first silicon nitride layer on the first silicon nitride layer.
    Type: Grant
    Filed: August 28, 2017
    Date of Patent: October 30, 2018
    Assignee: HITACHI KOKUSAI ELECTRIC INC.
    Inventors: Satoshi Shimamoto, Hiroshi Ashihara, Kazuyuki Toyoda, Naofumi Ohashi
  • Patent number: 9953829
    Abstract: A semiconductor manufacturing method includes setting a relative position between first through holes of a first plate-shaped part and second through holes of a second plate-shaped part to a first relative position. The method includes supplying a first gas containing a component of the first film onto the semiconductor substrate in a reactor through the first through holes not closed with the second plate-shaped part, to form the first film on the semiconductor substrate. The method includes relatively moving the first plate-shaped part and the second plate-shaped part to change the relative position to a second relative position. The method includes supplying a second gas containing a component of the second film onto the semiconductor substrate through the first through holes not closed with the second plate-shaped part, to laminate the second film on the first film.
    Type: Grant
    Filed: January 21, 2016
    Date of Patent: April 24, 2018
    Assignee: TOSHIBA MEMORY CORPORATION
    Inventors: Hideaki Masuda, Nobuhide Yamada
  • Patent number: 9638995
    Abstract: The embodiments disclose a method including depositing a resist layer using a mixture of several different length polymer strings materials spanning a range of natural periodicity, and imprinting the mixture of several different length polymer strings using sheared guiding patterns to increase flexibility.
    Type: Grant
    Filed: March 6, 2014
    Date of Patent: May 2, 2017
    Assignee: Seagate Technology LLC
    Inventors: René van de Veerdonk, XiaoMin Yang, Kim Lee, Justin Hwu
  • Patent number: 9616617
    Abstract: The present disclosure provides a biochip and methods of fabricating. The biochip includes a fluidic part and a sensing part bonded together using a polymer. The fluidic part has microfluidic channel pattern on one side and fluidic inlet and fluidic outlet on the other side that are fluidly connected to the microfluidic channel pattern. The fluidic inlet and fluidic outlet are formed by laser drilling after protecting the microfluidic channel pattern with a sacrificial protective layer. The polymer bonding is performed at low temperature without damaging patterned surface chemistry on a sensing surface of the sensing part.
    Type: Grant
    Filed: March 8, 2013
    Date of Patent: April 11, 2017
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Wei-Cheng Shen, Yi-Shao Liu, Yi-Hsien Chang, Chun-Ren Cheng
  • Patent number: 9399813
    Abstract: Disclosed is a TiAgN coating layer, formed by subjecting a substrate having a surface roughness of about 0.05˜0.1 ?m to plasma coating by periodically turning on/off an Ag source while a Ti source is continuously turned on in a nitrogen gas atmosphere, a TiAgN coating method, and a TiAgN coating apparatus.
    Type: Grant
    Filed: March 14, 2013
    Date of Patent: July 26, 2016
    Assignee: Hyundai Motor Company
    Inventors: Woong Pyo Hong, In Woong Lyo, Hyuk Kang, Kwang Hoon Choi
  • Patent number: 9305803
    Abstract: Provided are a plasma processing apparatus with a radio-frequency power supply supplying temporally modulated intermittent radio-frequency power which can be controlled with high precision in a wide repetition frequency band, and a plasma processing method using the plasma processing apparatus. A plasma processing apparatus includes: a vacuum vessel; a plasma generating section plasma in the vacuum vessel; a stage installed in the vacuum vessel and mounted with a sample; and a radio-frequency power supply applying temporally modulated intermittent radio-frequency power to the stage, wherein the radio-frequency power supply has two or more different frequency bands and temporally modulates the radio-frequency power by a repetition frequency which has the same range of analog signals used in each of the frequency band.
    Type: Grant
    Filed: July 19, 2011
    Date of Patent: April 5, 2016
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Michikazu Morimoto, Yasuo Ohgoshi, Yuuzou Oohirabaru, Tetsuo Ono
  • Patent number: 9297061
    Abstract: In a transparent electroconductive film including a transparent substrate and a transparent electroconductive oxide layer disposed on the transparent substrate, when the transparent electroconductive oxide layer is composed of zinc oxide, the surface resistivity of the transparent electroconductive oxide layer increases with time and thus it has been difficult to obtain a transparent electroconductive film stable against an environmental variation. Consequently, hard carbon films are provided on the surfaces of a transparent electroconductive oxide layer including at least one layer and containing zinc oxide as a main component in “the order of transparent substrate-hard carbon film-transparent electroconductive oxide layer-hard carbon film” or “the order of hard carbon film-transparent substrate-transparent electroconductive oxide layer-hard carbon film”. Alternatively, an organosilicon compound covering layer is provided on a surface of the transparent electroconductive oxide layer.
    Type: Grant
    Filed: February 15, 2008
    Date of Patent: March 29, 2016
    Assignee: KANEKA CORPORATION
    Inventors: Takashi Kuchiyama, Kenji Yamamoto
  • Patent number: 9169550
    Abstract: Disclosed is a surface treatment method for producing a coating layer, which improves surface properties (e.g., low friction wear-resistance) of the coating layer at high temperature. The surface treatment method controls a process pressure during the formation of a coating layer to form a fine surface morphology with increased silver (Ag) content. The surface treatment method includes: heating a coated material in a chamber; removing foreign substances from the surface of the heated, coated material; forming a buffer layer on the surface of the coated material; and forming a coating layer on the buffer layer, wherein the process pressure is controlled during the formation of the coating layer to improve the surface properties at high temperatures.
    Type: Grant
    Filed: May 1, 2012
    Date of Patent: October 27, 2015
    Assignee: Hyundai Motor Company
    Inventors: Kwang Hoon Choi, In Woong Lyo, Woong Pyo Hong, Hyuk Kang
  • Patent number: 9074735
    Abstract: A light emitting diode (LED) package including a substrate unit, a light emitting unit and an encapsulant. The substrate unit includes a metal substrate and a circuit board. The metal substrate has a first carrier portion and a second carrier portion. The second carrier portion is projected from the first carrier portion. The first carrier portion has a first carrier face. The second carrier portion has a second carrier face located higher than the first carrier face. The circuit board is disposed on the first carrier face, and the second carrier portion passes through the circuit board. The light emitting unit includes at least one LED chip disposed on the second carrier face of the second carrier portion, and the LED chip electrically connected to the circuit board. The encapsulant encapsulates the LED chip.
    Type: Grant
    Filed: March 31, 2014
    Date of Patent: July 7, 2015
    Assignees: LITE-ON OPTO TECHNOLOGY (CHANGZHOU) CO., LTD., LITE-ON TECHNOLOGY CORPORATION
    Inventors: Chen-Hsiu Lin, Chia-Hao Wu
  • Patent number: 9059226
    Abstract: The substrate treatment apparatus includes a first substrate transport robot having a hand which holds a substrate, a second substrate transport robot having a hand which holds the substrate, and a hand cleaning unit which cleans the hand of the first substrate transport robot and the hand of the second substrate transport robot. The hand cleaning unit is configured to be accessible by the hand of the first substrate transport robot and the hand of the second substrate transport robot, and is disposed above or below a substrate transfer place at which the substrate is transferred between the first and second substrate transport robots.
    Type: Grant
    Filed: March 8, 2012
    Date of Patent: June 16, 2015
    Assignee: SCREEN Holdings Co., Ltd.
    Inventor: Ryo Muramoto
  • Publication number: 20150140232
    Abstract: A system and method A method of growing an elongate nanoelement from a growth surface includes: (a) cleaning a growth surface on a base element; (b) providing an ultrahigh vacuum reaction environment over the cleaned growth surface; (c) generating a reactive gas of an atomic material to be used in forming the nanoelement; (d) projecting a stream of the reactive gas at the growth surface within the reactive environment while maintaining a vacuum of at most 1×10?4 Pascal; (e) growing the elongate nanoelement from the growth surface within the environment while maintaining the pressure of step c); (f) after a desired length of nanoelement is attained within the environment, stopping direction of reactive gas into the environment; and (g) returning the environment to an ultrahigh vacuum condition.
    Type: Application
    Filed: January 26, 2015
    Publication date: May 21, 2015
    Inventors: Biswajit Das, Myung B. Lee
  • Publication number: 20150140231
    Abstract: The present invention is a method and apparatus for applying coatings in a rarefied gaseous medium. A cold cathode electron gun is used to generate an electron beam, which is directed to a crucible containing initial solid materials in a vacuum chamber, thus generating an initial solid material vapor. Nitrogen reaction gas is bled into the vacuum chamber, and ionization of the nitrogen gas in high frequency discharge. Subsequent interaction of initial material vapor with nitrogen ions and atoms results in generation of solid product heating of the substrate. Condensation of the vapor on the surface of substrate generates a thin film of solid electrode or electrolyte. The resulting rate of deposition of thin film of vitreous solid electrolyte and LiPon solid electrolyte is substantially higher than can be achieved with a magnetron sputtering process.
    Type: Application
    Filed: October 20, 2014
    Publication date: May 21, 2015
    Inventors: Elena M Shembel, Valetiy Tutyk, Volodymyr I Redko, Alexandr Markevich, Tymofiy Pastushkin, Irina M Maksyuta
  • Publication number: 20150129288
    Abstract: A circuit substrate includes: a substrate; an insulating coating layered structure formed on the substrate, having top and bottom surfaces, and formed with a patterned recess that is indented inwardly from the top surface, that is disposed above the bottom surface, and that is defined by a recess-defining wall, the recess-defining wall having a bottom wall portion and a surrounding wall portion that extends upwardly from a periphery of the bottom wall portion; and a patterned metallic layered structure including an electroless plating metal layer formed on the bottom wall portion of the recess-defining wall.
    Type: Application
    Filed: November 13, 2013
    Publication date: May 14, 2015
    Applicant: TAIWAN GREEN POINT ENTERPRISES CO., LTD.
    Inventors: Pen-Yi LIAO, Tsung-Han WU, Fu-Pin TANG, Mei-Chun CHEN, Yu-Jen CHOU
  • Publication number: 20150125620
    Abstract: The present invention relates to a separator plate for a fuel cell and to a method for producing the same, and relates to an invention wherein a surface-modification layer is formed through the use of low temperature plasma processing such that it is possible to prevent the hydrophobic characteristics which occur during gasket forming and to have outstanding hydrophilic characteristics, and such that it is possible to obtain the advantageous effect of highly outstanding corrosion resistance and electrical conductivity not only initially but also even after long-term use in a fuel-cell operating environment, and also such that it is possible to maintain outstanding durability even when using a normal low-price stainless-steel sheet base material, and it is possible to reduce the unit cost of production of the separator plate for the fuel cell since surface processing can be carried out at low cost.
    Type: Application
    Filed: January 13, 2015
    Publication date: May 7, 2015
    Inventors: Yoo-Taek JEON, Eun-Young KIM, Man-Bean MOON
  • Publication number: 20150104584
    Abstract: A method of increasing strength of a panel edge includes providing a panel having a lateral surface treated by plasma. An elastic material is provided, photoinitiator is added therein, and the elastic material is then liquefied by heating. Subsequently, the liquefied elastic material is sprayed on the lateral surface, and is then cured to result in a protective layer bonded on the lateral surface.
    Type: Application
    Filed: November 5, 2013
    Publication date: April 16, 2015
    Applicant: HengHao Technology Co. LTD
    Inventors: Ting-Chieh Chen, Chin-Liang Chen, Hsiao-Tzu Hsu
  • Patent number: 9006681
    Abstract: A process of preparing a lamella from a substrate includes manufacturing a protection strip on an edge portion of the lamella to be prepared from the substrate, and preparing the lamella, wherein the manufacturing the protection strip includes a first phase of activating a surface area portion of the substrate, and a second phase of electron beam assisted deposition of the protective strip on the activated surface area portion from the gas phase.
    Type: Grant
    Filed: March 10, 2014
    Date of Patent: April 14, 2015
    Assignee: Carl Zeiss Microscopy GmbH
    Inventors: Heinz Wanzenboeck, Wolfram Buehler, Holger Doemer, Carl Kuebler, Daniel Fischer, Gottfried Hochleitner, Emmerich Bertagnolli
  • Publication number: 20150099123
    Abstract: Provided herein is a carbon based coating and methods of producing the same. The carbon based coating comprising an amorphous carbon thin film deposited on a substrate, the carbon based coating characterized in that the carbon based coating imparts enhanced surface durability properties.
    Type: Application
    Filed: November 17, 2012
    Publication date: April 9, 2015
    Inventors: Brent William Barbee, Jordan Moriah Larson, Michael Raymond Greenwald, Christopher Shane Alexander, Matthew James Decourcelle, Jamey Tollfeldt Ewing
  • Publication number: 20150080678
    Abstract: The system of the present invention includes a conductive element, an electronic component, and a partial power source in the form of dissimilar materials. Upon contact with a conducting fluid, a voltage potential is created and the power source is completed, which activates the system. The electronic component controls the conductance between the dissimilar materials to produce a unique current signature. The system can also measure the conditions of the environment surrounding the system.
    Type: Application
    Filed: June 18, 2014
    Publication date: March 19, 2015
    Inventors: Jeremy Frank, Peter Bjeletich, Hooman Hafezi, Robert Azevedo, Robert Duck, Iliya Pesic, Benedict Costello, Eric Snyder
  • Patent number: 8980379
    Abstract: During a deposition process, material may deposit not only on the substrate, but also on other chamber components. In a MOCVD chamber, one of those components is the gas distribution showerhead. The showerhead may be cleaned by bombarding the showerhead with radicals generated by a plasma that includes an inert gas and chlorine. In order to generate the plasma, the showerhead may be negatively biased or floating relative to the substrate support. The showerhead may comprise stainless steel and be coated with a ceramic coating.
    Type: Grant
    Filed: August 27, 2010
    Date of Patent: March 17, 2015
    Assignee: Applied Materials, Inc.
    Inventors: Hiroji Hanawa, Kyawwin Maung, Hua Chung
  • Patent number: 8945684
    Abstract: The invention relates to a process for depositing an anti-fouling top coat onto the outermost coating layer of a coated optical article, comprising the following steps: a) providing an optical article having two main faces, at least one of which being coated with an outermost layer; b) treating said outermost layer with energetic species resulting in surface physical attack and/or chemical modification; and c) vacuum evaporating a liquid coating material for an anti-fouling top coat by means of an evaporation device, resulting in the deposition of the evaporated coating material onto the treated outermost layer of the optical article, wherein prior to the vacuum evaporation step of the liquid coating material, said liquid coating material has been treated with energetic species.
    Type: Grant
    Filed: November 4, 2005
    Date of Patent: February 3, 2015
    Assignee: Essilor International (Compagnie Generale d'Optique)
    Inventor: Gérald Fournand
  • Publication number: 20150017473
    Abstract: A non-magnetic stainless steel wire with an adherent corrosion resistant coating is disclosed. The surface of the non-magnetic stainless steel is pre-treated so as to be sufficiently free from oxides and form a good adhesion with the above corrosion resistant coating. The non-magnetic stainless steel wire is used as a armouring wire for a power cable for transmitting electrical power.
    Type: Application
    Filed: December 12, 2012
    Publication date: January 15, 2015
    Applicant: NV BEKAERT SA
    Inventors: Flip Verhoeven, David Hejcman, Geert Lagae, Peter Gogola
  • Publication number: 20150017344
    Abstract: A method of forming a graphene film (20) on one or more surfaces (10) of a copper-containing substrate (12) comprising the steps of: (i) heating a copper-containing substrate (12) defining one or more surfaces (10) to an exposure temperature; (ii) exposing the substrate (12) to a carbon-containing precursor gas at the exposure temperature for a predetermined period of time to dissolve carbon atoms into the substrate (12) and saturate the substrate (12) with carbon atoms; and (iii) cooling the substrate (12) so as to segregate the dissolved carbon atoms (16) from the substrate (12) to form a graphene film (20) on the or each surface (10) of the substrate (12); wherein the method further includes the step of selecting the copper-containing substrate (12) on the basis of its thickness to control the depth of the graphene film (20) formed on the or each surface (10) of the substrate (12) on cooling the substrate (12) so as to segregate the dissolved carbon atoms from the substrate (12).
    Type: Application
    Filed: January 29, 2013
    Publication date: January 15, 2015
    Inventors: Guocai Dong, Richard Van Rijn
  • Publication number: 20140357012
    Abstract: A method for manufacturing an optical substrate includes: a step for preparing a long film-shaped mold; a step for preparing a sol; a step for forming a coating film of the sol on a substrate; a step for drying the coating film; a step for pressing a pattern surface of the film-shaped mold against the dried coating film with a pressing roll while feeding the film-shaped mold to the pressing roll; a step for releasing the film-shaped mold from the coating film; and a step for baking the coating film to which the concave and convex pattern has been transferred.
    Type: Application
    Filed: August 20, 2014
    Publication date: December 4, 2014
    Inventors: Shigetaka TORIYAMA, Suzushi NISHIMURA, Naoto KOZASA, Yoshihiro KUMAGAI, Madoka TAKAHASHI
  • Patent number: 8900674
    Abstract: There is provided a method of coating a substrate with a zinc oxide film. The method includes (a) providing a substrate with at least one substantially flat surface, (b) subjecting the surface at least partially to a plasma-etching process, and (c) depositing on the etched surface, a layer that includes zinc oxide. The method is particularly suitable for manufacturing solar cells.
    Type: Grant
    Filed: September 27, 2010
    Date of Patent: December 2, 2014
    Assignee: Tel Solar AG
    Inventors: Daniel Borrello, Evelyne Vallat-Sauvain, Ulrich Kroll, Johannes Meier
  • Patent number: 8877299
    Abstract: A method of enhancing a material layer on a substrate is described. The method comprises establishing a gas cluster ion beam (GCIB), and treating a host region of the substrate by exposing the host region of the substrate to the GCIB. The treatment with the GCIB may selectively remove an undesirable specie and/or introduce a desirable specie to the host region.
    Type: Grant
    Filed: March 31, 2009
    Date of Patent: November 4, 2014
    Assignee: TEL Epion Inc.
    Inventors: John J. Hautala, Nathan E. Baxter, Koji Yamashita
  • Patent number: 8840954
    Abstract: Provided is a transparent carbon nanotube (CNT) electrode comprising a net-like (i.e., net-shaped) CNT thin film and a method for preparing the same. More specifically, a transparent CNT electrode comprises a transparent substrate and a net-shaped CNT thin film formed on the transparent substrate, and a method for preparing a transparent CNT electrode, comprising forming a thin film using particulate materials and CNTs, and then removing the particulate materials to form a net-shaped CNT thin film. The transparent CNT electrode exhibits excellent electrical conductivity while maintaining high light transmittance. Therefore, the transparent CNT electrode can be widely used to fabricate a variety of electronic devices, including image sensors, solar cells, liquid crystal displays, organic electroluminescence (EL) displays, and touch screen panels, that have need of electrodes possessing both light transmission properties and conductive properties.
    Type: Grant
    Filed: August 15, 2011
    Date of Patent: September 23, 2014
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Dong Kee Yi, Seon Mi Yoon, Jae Young Choi, O Ok Park, Mun Ho Kim, Hong Kyoon Choi
  • Publication number: 20140272184
    Abstract: Methods for maintaining clean etch rate and reducing particulate contamination with PECVD of amorphous silicon films are provided. The method comprises cleaning a processing chamber with a plasma comprising a cleaning gas, exposing at least a portion of the interior surfaces and components of the processing chamber to an oxidation gas and a nitration gas in the presence of a plasma and depositing a bi-layer seasoning layer on the interior surfaces and components of the processing chamber.
    Type: Application
    Filed: February 12, 2014
    Publication date: September 18, 2014
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Subbalakshmi SREEKALA, Xinhai HAN, Nagarajan RAJAGOPALAN, Bok Hoen KIM, Yoichi SUZUKI, Tsutomu KIYOHARA
  • Publication number: 20140248438
    Abstract: A method of coating molded metals includes cleaning a molded metal, coating the molded metal with a coating, and curing the coated molded metal. The coating includes monofunctional monomers, multifunctional monomers, and acrylic oligomers. A molded metal coating application system includes a conveyor configured to transport a molded metal. A cleaning stage is configured to clean the molded metal. A coating stage is configured to deposit a coating on the molded metal. A curing stage is configured to cure the deposited coating on the molded metal. The coating includes monofunctional monomers, multifunctional monomers, and acrylic oligomers.
    Type: Application
    Filed: March 4, 2013
    Publication date: September 4, 2014
    Applicant: Uni-Pixel Displays, Inc.
    Inventors: Danliang Jin, Robert J. Petcavich
  • Publication number: 20140242294
    Abstract: Method of manufacturing a resistive touch sensor circuit using a roll to roll process to print microscopic patterns on a single side of at least one flexible dielectric substrate using a plurality of flexo-masters to print the microscopic patterns which are then plated to form conductive microscopic patterns.
    Type: Application
    Filed: October 24, 2012
    Publication date: August 28, 2014
    Applicant: UNIPIXEL DISPLAYS, INC.
    Inventors: Robert J. Petcavich, Ed S. Ramakrishnan, Daniel K. Van Ostrand, Reed Killion, Kevin J. Derichs
  • Patent number: 8815060
    Abstract: A method for applying a protective layer to an electronic device such as the ABS of a slider, magnetic head, etc. for reducing paramagnetic deadlayer thickness includes selecting an etching angle for minimizing formation of a paramagnetic deadlayer at an interface of an electronic device and an adhesive layer subsequently formed on the electronic device, etching a surface of an electronic device at the selected angle, the selected angle being less than about 75 degrees from an imaginary line extending perpendicular to the surface, forming an adhesive layer on the etched surface of the electronic device, and forming a protective layer on the adhesive layer. A magnetic head formed by the process is also disclosed.
    Type: Grant
    Filed: August 30, 2004
    Date of Patent: August 26, 2014
    Assignee: HGST Netherlands B.V.
    Inventors: Eric Wayne Flint, Ning Shi, Qi-Fan Xiao
  • Patent number: 8808809
    Abstract: A method for applying hot melt adhesive powder onto a sole or shoe part includes the steps of applying a cleaning agent, irradiating, applying a conductive liquid which has a conductivity at least 100 times higher than purified water which has a conductivity of 5.5·10?6 S/m, spraying hot melt adhesive powder; and heating. The method can save energy, reduce the working space, reduce the labor intensity and improve the working environment by continuously carrying out the spraying and the melting operation of the hot melt adhesive.
    Type: Grant
    Filed: August 29, 2013
    Date of Patent: August 19, 2014
    Assignee: Orisol Asia Ltd.
    Inventors: Jakov Makover, Bar Cochva Mardix, Yaacov Sadeh
  • Publication number: 20140227631
    Abstract: The present invention proposed manufacturing method of coating layers with good conductivity and corrosion resistance at high productivity comprising etching the oxide layer on the stainless steel substrate by plasma etching to activate the surface and prevent from decreasing it's conductivity, coating metal nitrides like CrN or TiN in nano size thickness on the etched surface and coating carbon layer at nano size thickness on top of it. According to the present invention, it is possible to produce manufacture fuel cell bipolar plate, electrode material and stainless steel with reinforced conductivity and corrosion resistance in mass.
    Type: Application
    Filed: February 9, 2013
    Publication date: August 14, 2014
    Inventors: Youngha Jun, Jaimoo Yoo, Kiho Yeo, Shin Eui Chul
  • Patent number: 8802224
    Abstract: Disclosed is a reinforcing material for the local reinforcement of a component formed with a composite material, in particular in areas of force introduction and/or connecting areas. The reinforcing material is formed by a metallic sheet-like formation, the metallic sheet-like formation having a surface with increased roughness to improve adhesion and a coating applied to the surface to provide a seal and improve the bond with the composite material. As a result of the presence of a coating on the metallic sheet-like formation, once it has been rolled up on supply rolls, said sheet-like formation can be drawn off from the supply rolls and at the same time processed in an automated manner by means of known computer-controlled laying devices with CRP prepreg materials in web form by laying layer by layer to produce components, in particular of large format, for aircraft.
    Type: Grant
    Filed: February 1, 2007
    Date of Patent: August 12, 2014
    Assignee: Airbus Operations GmbH
    Inventor: Axel Herrmann
  • Patent number: 8795790
    Abstract: [Problem] An object is to provide a magnetic recording medium with improved HDI characteristics, such as impact resistance, and its manufacturing method. [Solution] A typical structure of a magnetic recording medium 100 according to the present invention includes, on a base, at least a magnetic recording layer 122, a protective layer 126, and a lubricating layer 128, wherein the magnetic recording layer 122 includes, in an in-plane direction, a magnetic recording part 136 configured of a magnetic material and a non-recording part 134 magnetically separating the magnetic recording part 136, and a surface corresponding to the non-recording part 134 protuberates more than a surface corresponding to the magnetic recording part 136.
    Type: Grant
    Filed: December 9, 2009
    Date of Patent: August 5, 2014
    Assignee: WD Media (Singapore) Pte. Ltd.
    Inventors: Yoshiaki Sonobe, Akira Shimada, Tsuyoshi Ozawa, Masanori Aniya
  • Publication number: 20140198318
    Abstract: An optical fiber with a b-stageable hybrid adhesive coating includes an optical fiber and an outer jacket. The outer jacket includes at least one layer that includes a partially cured b-stageable hybrid adhesive.
    Type: Application
    Filed: January 15, 2013
    Publication date: July 17, 2014
    Applicant: HONEYWELL INTERNATIONAL INC.
    Inventors: Charlie Gray, Stan Kopacz, William R. Schulzetenberg, Michael D. Sardinha, Joseph M. Rivera
  • Publication number: 20140186544
    Abstract: Methods of forming dielectric layers using high-density plasma chemical vapor deposition are described. Dielectric layers are formed over metal films. The metal film is present on a substrate prior to entering the high-density plasma processing chamber. The metal film is processed to remove oxidation and optionally to improve adhesion of the dielectric layer on the metal film.
    Type: Application
    Filed: January 29, 2013
    Publication date: July 3, 2014
    Applicant: APPLIED MATERIALS, INC.
    Inventor: Zhong Qiang Hua
  • Publication number: 20140186619
    Abstract: A coated article includes a substrate and an anti-fingerprint film formed on the substrate. The anti-fingerprint film is a mixture layer of tin and polyformaldehyde, a mixture layer of indium and polyformaldehyde, or a polyformaldehyde layer. The anti-fingerprint film has an excellent abrasion resistance. A method for making the coated article is also described.
    Type: Application
    Filed: April 19, 2013
    Publication date: July 3, 2014
    Applicants: FIH (HONG KONG) LIMITED, SHENZHEN FUTAIHONG PRECISION INDUSTRY CO., LTD.
    Inventors: CHUN-JIE ZHANG, XU LIU
  • Patent number: 8764952
    Abstract: In a method of irradiating a gas cluster ion beam on a solid surface and smoothing the solid surface, the angle formed between the solid surface and the gas cluster ion beam is chosen to be between 1° and an angle less than 30°. In case the solid surface is relatively rough, the processing efficiency is raised by first irradiating a beam at an irradiation angle ? chosen to be something like 90° as a first step, and subsequently at an irradiation angle ? chosen to be 1° to less than 30° as a second step. Alternatively, the set of the aforementioned first step and second step is repeated several times.
    Type: Grant
    Filed: September 29, 2004
    Date of Patent: July 1, 2014
    Assignee: Japan Aviation Electronics Industry Limited
    Inventors: Akinobu Sato, Akiko Suzuki, Emmanuel Bourelle, Jiro Matsuo, Toshio Seki, Takaaki Aoki
  • Patent number: 8747631
    Abstract: The present disclosure relates to an apparatus and method utilizing double glow discharge for sputter cleaning of a selected surface. The surface may include the inner surface of a hollow substrate such as a tube which inner surface may then be coated via magnetron sputter deposition.
    Type: Grant
    Filed: March 15, 2010
    Date of Patent: June 10, 2014
    Assignee: Southwest Research Institute
    Inventors: Ronghua Wei, Edward Langa, Sabrina L. Lee
  • Patent number: 8747960
    Abstract: The embodiments fill the need to enhance electro-migration performance, provide lower metal resistivity, and improve silicon-to-metal interfacial adhesion for copper interconnects by providing improved processes and systems that produce a silicon-to-metal interface. An exemplary method of preparing a substrate surface of a substrate to selectively deposit a layer of a metal on a silicon or polysilicon surface of the substrate to form a metal silicide in an integrated system is provided.
    Type: Grant
    Filed: August 30, 2006
    Date of Patent: June 10, 2014
    Assignee: Lam Research Corporation
    Inventors: Yezdi Dordi, John Boyd, Tiruchirapalli Arunagiri, Johan Vertommen, Fritz C. Redeker, William Thie, Arthur M. Howald
  • Patent number: 8741394
    Abstract: Methods for depositing film stacks by plasma enhanced chemical vapor deposition are described. In one example, a method for depositing a film stack on a substrate, wherein the film stack includes films of different compositions and the deposition is performed in a process station in-situ, is provided. The method includes, in a first plasma-activated film deposition phase, depositing a first layer of film having a first film composition on the substrate; in a second plasma-activated deposition phase, depositing a second layer of film having a second film composition on the first layer of film; and sustaining the plasma while transitioning a composition of the plasma from the first plasma-activated film deposition phase to the second plasma-activated film deposition phase.
    Type: Grant
    Filed: December 16, 2010
    Date of Patent: June 3, 2014
    Assignee: Novellus Systems, Inc.
    Inventors: Jason Haverkamp, Pramod Subramonium, Joe Womack, Dong Niu, Keith Fox, John Alexy, Patrick Breiling, Jennifer O'Loughlin, Mandyam Sriram, George Andrew Antonelli, Bart van Schravendijk
  • Publication number: 20140141255
    Abstract: A laminate body includes a base material, a film-like or a membrane-like undercoat layer that is formed in at least a portion of the outer surface of the base material, and an atomic layer deposition film that is formed on a surface opposite to a surface coming into contact with the base material among both surfaces of the undercoat layer in the thickness direction thereof. At least a portion of precursors of the atomic layer deposition film bind to the undercoat layer, and the atomic layer deposition film is formed into a membrane shape covering the undercoat layer.
    Type: Application
    Filed: January 27, 2014
    Publication date: May 22, 2014
    Applicant: TOPPAN PRINTING CO., LTD.
    Inventors: Mitsuru KANO, JIN SATO, TOSHIAKI YOSHIHARA, MASATO KON
  • Patent number: 8728244
    Abstract: A method for descaling a metal strip, in which the metal strip is guided in a direction of conveyance through at least two plasma descaling units, in which it is subjected to a plasma descaling, where the plasma descaling is followed directly or indirectly by an operation in which the metal strip is coated with a coating metal by hot dip galvanizing of the metal strip. The metal strip is coated with the coating metal by a vertical passage process. The coating metal is retained as a coating bath in a coating tank by an electromagnetic seal. The metal strip preheated by the plasma descaling is guided, without exposure to air, from the plasma descaling into a protective gas atmosphere of a continuous furnace necessary for the coating.
    Type: Grant
    Filed: April 14, 2011
    Date of Patent: May 20, 2014
    Assignee: SMS Siemag Aktiengesellschaft
    Inventors: Holger Behrens, Rolf Brisberger, Klaus Adolf Frommann, Matthias Kretschmer, Rüdiger Zerbe, Evgeny Stepanovich Senokosov, Andrei Evgenievich Senokosov
  • Publication number: 20140113146
    Abstract: A coated metallic part includes a substrate including a metallic surface; a first coating layer supported on the metallic surface and including a first polymer, the first polymer including silicon; and a second coating layer including a second polymer different from the first polymer, the first coating layer being positioned between the metallic surface and the first coating layer. The first coating layer may have a silicon atomic percentage of 5 to 50 atomic weight percent. The first polymer of the first coating layer may have an oxygen-to-silicon ratio of 1.0 to 4.0. The second polymer of the second polymer layer may include at least one of an acrylic polymer, a polyester, an alkyd, a polyurethane, a polyamide, a polyether, a copolymer thereof, and a mixture thereof.
    Type: Application
    Filed: October 24, 2012
    Publication date: April 24, 2014
    Applicant: FORD GLOBAL TECHNOLOGIES, LLC
    Inventors: Larry P. Haack, Ann Marie Straccia, Kenneth Edward Nietering
  • Patent number: 8703247
    Abstract: A cross section processing method to be performed on a sample by irradiating the sample having a layer or a structure of an organic substance on a surface at a cross section processing position thereof with a focused ion beam using a focused ion beam apparatus includes: a protective film forming step for forming a protective film on the surface of the layer or the structure of the organic substance by irradiating the surface of the sample including the cross section processing position with the focused ion beam under the existence of source gas as the protective film; and a cross section processing step for performing cross section processing by irradiating the cross section processing position formed with the protective film with the focused ion beam at a voltage higher than an accelerating voltage in the protective film forming step.
    Type: Grant
    Filed: January 26, 2010
    Date of Patent: April 22, 2014
    Assignees: SII Nanotechnology Inc., SII Nanotechnology USA Inc.
    Inventors: Hidekazu Suzuki, Toshiaki Fujii, Mike Hassel-Shearer
  • Patent number: 8697187
    Abstract: Resist coating treatments for application of a resist solution to removal of a resist film on a wafer edge portion. A laser irradiation unit applies a laser light in a resist coating unit. At the time of resist coating treatment, the resist solution is discharged onto a central portion of the rotated wafer from a resist solution supply nozzle to form a resist film on the wafer. Thereafter, the laser irradiation unit moves to an outer peripheral portion of the wafer and applies the laser light onto the resist film on the outer peripheral portion to dry the resist film on the outer peripheral portion. The application of laser light is continued, and the solvent supply nozzle moves to a position above the edge portion and supplies solvent to the resist film on the edge portion. The solvent dissolves and removes the resist film on the edge portion.
    Type: Grant
    Filed: October 19, 2010
    Date of Patent: April 15, 2014
    Assignee: Tokyo Electron Limited
    Inventors: Yoshiteru Fukuda, Tomohiro Iseki, Takayuki Ishii
  • Patent number: 8697195
    Abstract: A method for forming a protective coating on a substrate comprising, applying a bond coating to the substrate, the bond coating having a first surface roughness, ionizing an inert gas which flows into the surface of the bond coating so as to impart a second surface roughness to the bond coating greater than the first surface roughness, wherein the inert gas is ionized and caused to flow into the surface of the bond coating by a reverse polarity current supplied to an electrode which removes at least one electron from the inert gas, and applying a top coating to the bond coating. Additionally, a method for preparing a surface to receive and adhere to a coating comprising roughening the surface to create a micro-roughening network on the surface. In addition, a method of improving strain tolerance and cyclic spallation life of a protective coating.
    Type: Grant
    Filed: January 30, 2006
    Date of Patent: April 15, 2014
    Assignee: General Electric Company
    Inventors: David Bucci, Daniel A. Nowak, Paul S. Dimascio
  • Patent number: 8679592
    Abstract: A method for continuously processing carbon fiber including establishing a microwave plasma in a selected atmosphere contained in an elongated chamber having a microwave power gradient along its length defined by a lower microwave power at one end and a higher microwave power at the opposite end of the elongated chamber. The elongated chamber having an opening in each of the ends of the chamber that are adapted to allow the passage of the fiber tow while limiting incidental gas flow into or out of said chamber. A continuous fiber tow is introduced into the end of the chamber having the lower microwave power. The fiber tow is withdrawn from the opposite end of the chamber having the higher microwave power. The fiber to is subjected to progressively higher microwave energy as the fiber is being traversed through the elongated chamber.
    Type: Grant
    Filed: October 4, 2010
    Date of Patent: March 25, 2014
    Assignee: UT-Battelle, LLC
    Inventors: Terry L. White, Felix L. Paulauskas, Timothy S. Bigelow
  • Patent number: 8673406
    Abstract: The invention relates to a method for the plasma treatment of glass surfaces, the metal component, in particular the alkali and/or alkaline-earth metal component in the superficial region of the substrate being reduced by a plasma treatment of a substrate.
    Type: Grant
    Filed: February 28, 2007
    Date of Patent: March 18, 2014
    Assignee: Schott AG
    Inventors: Matthias Bicker, Uwe Rothhaar, Robert Hormes, Bernd Hanser, Manfred Lohmeyer, Stefan Bauer
  • Publication number: 20140060937
    Abstract: A cutting element may comprise a substrate, a first polycrystalline diamond volume, and a second diamond or diamond like volume. The first polycrystalline diamond volume may contain a catalyst material. The first polycrystalline diamond volume may be bonded to the substrate. The second diamond or diamond like volume may be formed predominantly from carbon atoms and free of catalyst materials. The second diamond or diamond like volume may be adjacent to a working surface of cutting element. The second diamond or diamond like volume may be bonded to the first polycrystalline diamond volume.
    Type: Application
    Filed: August 31, 2012
    Publication date: March 6, 2014
    Applicant: Diamond Innovations, Inc.
    Inventors: Valeriy V. Konovalov, Ram Raghavan