Abstract: Embodiments of the invention include methods for in-situ chamber dry clean for metal deposition chambers.

Abstract: A layer-forming apparatus coats a solution containing a layer component and a flammable solvent on a surface of a base material, and forms a layer on the surface of the base material. In the layer-forming apparatus, a coating chamber in which the solution is coated on the surface of the base material is closed substantially hermetically, and a clean air is supplied from a clean-air supplier to the coating chamber. Then, ions that are produced by a corona discharger are sprayed to the surface of the base material in a state that a vapor concentration of the solvent in the coating chamber is below a burning lower limit, and dusts are removed from the base material. Then, the solution is coated on the surface of the base material from which the dusts are removed.

Abstract: A method of manufacturing a polymer electrode and a polymer actuator employing the polymer electrode, the method including: adhering a shadow mask onto a substrate, forming a hydrophilic electrode pattern on the substrate, coating the hydrophilic electrode pattern of the substrate with a conductive polymer water solution, removing the shadow mask, and drying the conductive polymer water solution, thus forming the polymer electrode. The method may be applied to electrodes disposed on both surfaces of a polymer deformation layer of a polymer actuator.

Abstract: Syringes for holding fluids susceptible to void formation when the syringe and fluid are frozen and thawed before use. The interior surface of the syringe barrel is modified by exposure to a plasma such that the incidence of void formation in the fluid is prevented or, at the least, significantly reduced in comparison with conventional syringes.

Abstract: A process of preparing a lamella from a substrate includes manufacturing a protection strip on an edge portion of the lamella to be prepared from the substrate, and preparing the lamella, wherein the manufacturing the protection strip includes a first phase of activating a surface area portion of the substrate, and a second phase of electron beam assisted deposition of the protective strip on the activated surface area portion from the gas phase.

Abstract: A transfer sheet includes a supporting substrate, a photothermal conversion layer disposed on the supporting substrate, and a passive layer disposed on the photothermal conversion layer.

Abstract: The invention relates to a method of manufacturing of metal electrodes for electrolytic applications by means of a continuous deposition of a layer of noble metals upon metal substrates by a physical vapour deposition technique.

Abstract: A method for manufacturing a magnetic sensor that result in improved magnetic bias field to the sensor, improved shield to hard bias spacing and a flatter top shield profile. The method includes a multi-angled deposition of the hard bias structure. After forming the sensor stack a first hard bias layer is deposited at an angle of about 70 degrees relative to horizontal. This is a conformal deposition. Then, a second deposition is performed at an angle of about 90 degrees relative to horizontal. This is a notching deposition, that results in notches being formed adjacent to the sensor stack. Then, a hard bias capping layer is deposited at an angle of about 55 degrees relative to horizontal. This is a leveling deposition that further flattens the surface on which the top shield can be electroplated.

Abstract: This disclosure describes a method for nano-patterning by incorporating one or more block copolymers and one or more nano-imprinting steps in the fabrication process. The block copolymers may be comprised of organic or organic components, and may be lamellar, spherical or cylindrical. As a result, a patterned medium may be formed having one-dimensional or two-dimensional patterns with a feature pitch of 5-100 nm and/or a bit density of at least 1 Tdpsi.

Abstract: A method of controlling the drug release rate of a drug coated endovascular stent by depositing a drug material layer on the stent and then modifying the drug material using gas cluster ion beam irradiation to create a carbon matrix with interstices containing the original drug. The rate at which the drug elutes through the interstices can be controlled by processing parameters. Multiple layers may be employed to create time varying release rates.

Abstract: The invention relates to a method of producing a substrate which is coated with a mesoporous layer and to the use thereof in ophthalmic optics. The inventive method comprises the following steps comprising: preparing a precursor sol containing (i) a precursor agent that is selected from compounds having formula M(X)4 (I), in which X is a hydrolysable group and M represents silicon or a tetravalent metal and mixtures thereof, (ii) at least one organic solvent, (iii) at least one pore-forming agent and (iv) water; depositing a film of the precursor sol on a main surface of the substrate; optionally consolidating the mesoporous structure of the deposited film; eliminating the pore-forming agent; and recovering the substrate coated with the mesoporous layer. The method is characterized in that: (i) the pore-forming agent is eliminated at a temperature of less than or equal to 150° C.

Abstract: There are provided a sheet having a silicon/plastic bi-layer structure capable of easily transferring a paste even when a hard roll is used, the hard roll having excellent durability but having disadvantages that the paste is poorly transferred when the paste is printed on a plastic base, and a method for producing the same. The bi-layer structured sheet having excellent printability when printed by hard roll includes a flexible substrate and a silicon resin formed on the substrate.

Abstract: An ion source impinging on the surface of the substrate to be coated is used to enhance a MOCVD, PVD or other process for the preparation of superconducting materials.

Abstract: Disclosed herein are methods of treating an article surface. The method comprises removing a metal oxide surface from the metal substrate to expose a metal surface; and delivering particles comprising a dopant from at least one fluid jet to the metal surface to impregnate the surface of the article with the dopant. The method also comprises delivering substantially simultaneously a first set of particles comprising a dopant and a second set of particles comprising an abrasive from at least one fluid jet to a surface of an article to impregnate the surface of the article with the dopant.

Abstract: Residues are removed from a surface of a substrate processing component which has a polymer coating below the residues. In one version, the component surfaces are contacted with an organic solvent to remove the residues without damaging or removing the polymer coating. The residues can be process residues or adhesive residues. The cleaning process can be conducted as part of a refurbishment process. In another version, the residues are ablated by scanning a laser across the component surface. In yet another version, the residues are vaporized by scanning a plasma cutter across the surface of the component.

Abstract: A method to achieve a conformal ultrathin film of platinum or one of its alloys on a substrate that can be economically used as a heterogeneous catalyst, such as automotive polymer electrolyte membrane (PEM) fuel cell catalyst. The method includes using a hydrogen plasma in platinum atomic layer deposition along with tungsten as a substrate or anchoring adhesive layer to assist platinum nucleation and deposition.

Abstract: The invention relates to a method for producing polycrystalline silicon rods by deposition of silicon on at least one thin rod in a reactor, wherein, before the silicon deposition, hydrogen halide at a temperature of 400-1000° C. is introduced into the reactor containing at least one thin rod and is irradiated by means of UV light, as a result of which halogen and hydrogen radicals arise and the volatile halides that form are removed from the reactor.

Abstract: A method of increasing the hydrophilicity of a polymer surface, such as a contact lens surface, includes exposing the polymer substrate to a first plasma under conditions selected to generate free radicals on the surface of the polymer substrate. The method also includes reacting an organic compound with the free radicals on the surface of the polymer substrate to thereby form an organic coating. The method further includes exposing the organic coating to a second plasma under conditions selected to oxidize the organic coating to thereby form a hydrophilic layer at the substrate surface. The hydrophilic layer can have a contact angle with respect to water that is less than about 50°.

Abstract: A method of forming a patterned functional layer on a substrate using a poly(hydroxyethyl methacrylate) lift-off layer is described. The method can be used with substrates that would not tolerate the organic solvents required for processing of known poly(methyl methacrylate) lift-off layers. When used in combination with known nanoimprint lithography and step-and-flash imprint lithography techniques, the method can be used to generate patterned functional structures with dimensions as small as five nanometers.

Abstract: Disclosed is a structure made of a trench patterned substrate having a pre-determined trench period and a pre-determined mesa to trench width ratio, and a block copolymer on top of the trench patterned substrate. The block copolymer has at least an organic block and a silicon-containing block, wherein the block copolymer can have either perpendicular or parallel cylinders. The structure is annealed under a pre-determined vapor pressure for a predetermined annealing time period, wherein the pre-determined trench period, the pre-determined mesa to trench width ratio, the predetermined vapor pressure and the predetermined annealing time period are chosen such that cylinders formed in the block copolymer are either perpendicular or parallel with respect to the trench-patterned substrate. A method is also described to form the above-mentioned structure.

Abstract: The invention relates to an optical article having antireflection properties, optionally antistatic properties, having a high thermal and abrasion resistance, as well as the method for producing the same. The article of the invention comprises a substrate and, starting from the substrate: a sub-layer comprising a SiO2-based layer, said SiO2-based layer having a thickness greater than or equal to 75 nm et free from Al2O3; and a multilayered antireflection coating comprising a stack consisting in at least one high refractive index layer and at least one low refractive index layer, all the low refractive index layers of which comprising a mixture of SiO2 and Al2O3, and the high refractive index layers of which are not layers that do absorb in the visible region comprising a substoichiometric titanium oxide and reducing the relative visible light transmission factor (Tv) of the optical article by at least 10% as compared to a same article without any of said visible light absorbing layers.

Abstract: A process of preparing a lamella from a substrate includes manufacturing a protection strip on an edge portion of the lamella to be prepared from the substrate, and preparing the lamella, wherein the manufacturing the protection strip includes a first phase of activating a surface area portion of the substrate, and a second phase of electron beam assisted deposition of the protective strip on the activated surface area portion from the gas phase.

Abstract: A display apparatus includes a plurality of pixel units and each pixel unit includes a substrate, a first electrode, a second electrode, an image display part and a protective layer. The first electrode is formed on the substrate. The second electrode is formed over the first electrode while interposing a first insulating layer therebetween to define a TSC (tunnel-shaped cavity) extending in a first direction between the first and second electrodes. The image display part is provided in the TSC to display an image according to an electric field generated by the first and second electrodes. The protective layer covers the second electrode and seals the TSC. The display apparatus having the above structure is manufactured by forming the first electrode, a sacrificial layer and the second electrode and forming the image display part by removing the sacrificial layer.

Abstract: There is provided a method of making a heat treated (HT) coated article to be used in shower door applications, window applications, or any other suitable applications where transparent coated articles are desired. For example, certain embodiments of this invention relate to a method of making a coated article including a step of heat treating a glass substrate coated with at least a layer of or including diamond-like carbon (DLC) and an overlying protective film thereon. In certain example embodiments, the protective film may be of or include both (a) an oxygen blocking or barrier layer, and (b) a release layer. Following and/or during heat treatment (e.g., thermal tempering, or the like) the protective film may be removed. Other embodiments of this invention relate to the pre-HT coated article, or the post-HT coated article.

Abstract: A method for operating a chemical deposition chamber is disclosed. First, a digital liquid flow controller is provided to guide a precursor fluid into a chemical deposition chamber. Then, a pre-cleaning step is performed in the chemical deposition chamber. Later, a pre-tuning step is performed on the digital liquid flow controller so that the precursor fluid can be substantially stably guided into the chemical deposition chamber. Afterwards, the chemical deposition chamber is used to carry out the chemical deposition.

Abstract: A submount with an electrode layer having excellent wettability in soldering and method of manufacturing the same are disclosed. A submount (1) for having a semiconductor device mounted thereon comprises a submount substrate (2), a substrate protective layer (3) formed on a surface of the submount substrate (2), an electrode layer (4) formed on the substrate protective layer (3) and a solder layer (5) formed on the electrode layer (3) wherein the electrode layer (4) is made having an average surface roughness of less than 1 ?m. The reduced average surface roughness of the electrode layer (4) improves wettability of the solder layer (5), allowing the solder layer (5) and a semiconductor device to be firmly bonded together without any flux therebetween. A submount (1) is thus obtained which with the semiconductor device mounted thereon is reduced in heat resistance, reducing its temperature rise and improving its performance and service life.

Abstract: A method for treating a surface of a glass substrate according to the invention has the steps of placing the glass substrate into a vacuum treatment chamber, introducing a gas into the vacuum treatment chamber, providing electric power to generate an ion source and using the ion source to treat the surface of the glass substrate. By this way, the invention can achieve an effect of surface cleaning and further render the conductive film to be coated on the glass substrate in the subsequent stage to have a reduced surface resistance, thereby improving the conductivity of the glass substrate. The film coated on the glass substrate in the subsequent stage will have higher crystalline level as well.

Abstract: A supported graphene device comprises at least one graphene feature of 1 to about 10 graphene layers having a predetermined shape and pattern, with at least a portion of each graphene feature being supported on a substrate. In some embodiments the device comprises graphene features supported on crystalline semiconductor substrate, such as silicon or germanium. The graphene features on a crystalline semiconductor substrate can be fabricated by forming an amorphous carbon doped semiconductor on the crystalline semiconductor substrate and then epitaxially crystallizing the amorphous semiconductor with carbon migration to the surface to form a graphene feature of one or more graphene layers. The epitaxy can be promoted by heating the device or by irradiation with a laser.

Abstract: The present disclosure provides a surface processing apparatus, comprising a reaction chamber provided to form a deposition layer on a substrate, a carrying chamber connected to the reaction chamber and comprising a slot, and a plasma generator installed in the slot and providing plasma to process the substrate surface. Whereby the disclosure further provides a surface processing method, which flatten surface of a deposition layer on the substrate when the substrate is carried form the reaction chamber to the carrying chamber after the deposition process in the reaction chamber.

Abstract: Showerhead electrodes for a semiconductor material processing apparatus are disclosed. An embodiment of the showerhead electrodes includes top and bottom electrodes bonded to each other. The top electrode includes one or more plenums. The bottom electrode includes a plasma-exposed bottom surface and a plurality of gas holes in fluid communication with the plenum. Showerhead electrode assemblies including a showerhead electrode flexibly suspended from a top plate are also disclosed. The showerhead electrode assemblies can be in fluid communication with temperature-control elements spatially separated from the showerhead electrode to control the showerhead electrode temperature. Methods of processing substrates in plasma processing chambers including the showerhead electrode assemblies are also disclosed.

Abstract: A method of forming an inorganic alignment film made substantially of an inorganic material on a base substrate is provided comprising a milling process of irradiating ion beams onto the surface of the base substrate, on which the inorganic alignment film is to be formed, from a direction inclined at a predetermined angle ?b with respect to a direction vertical to the surface, and a film-forming process of forming the inorganic alignment film on the base substrate onto which the ion beams are irradiated. In the milling process, the predetermined angle ?b is preferably 2° or more. In the milling process, an acceleration voltage of the ion beams during the irradiation of the ion beams is preferably 400 to 1400 V.

Abstract: Systems and methods for ALD thin film deposition include a mechanism for removing excess non-chemisorbed precursors from the surface of a substrate in a translation-based process involving multiple separate precursor zones. Excess precursor removal mechanisms according to the present disclosure may introduce localized high temperature conditions, high energy conditions, or azeotropes of the excess precursor, to liberate the excess precursor before it reaches a separate precursor zone, thereby inhibiting CVD deposition from occurring without causing heat-induced degradation of the substrate.

Abstract: Techniques for making nanowires with a desired diameter are provided. The nanowires can be grown from catalytic nanoparticles, wherein the nanowires can have substantially same diameter as the catalytic nanoparticles. Since the size or the diameter of the catalytic nanoparticles can be controlled in production of the nanoparticles, the diameter of the nanowires can be subsequently controlled as well. The catalytic nanoparticles are melted and provided with a gaseous precursor of the nanowires. When supersaturation of the catalytic nanoparticles with the gaseous precursor is reached, the gaseous precursor starts to solidify and form nanowires. The nanowires are separate from each other and not bind with each other to form a plurality of nanowires having the substantially uniform diameter.

Abstract: A treatment gas is supplied to form a Ti-based film on a predetermined number of wafers W while setting a temperature of a susceptor 2 in a chamber 1 to a predetermined temperature. After this, the interior of the chamber 1 containing no wafers W is cleaned by discharging Cl2 gas as a cleaning gas from a shower head 10 into the chamber 1. During this cleaning, the temperature of each of the susceptor 2, the shower head 10, and the wall portion of the chamber 1 is independently controlled so that the temperature of the susceptor 2 is not lower than the decomposition start temperature of Cl2 gas and the temperature of the shower head 10 and the wall portion of the chamber 1 is not higher than the decomposition start temperature.

Abstract: A method for processing a substrate by plasma CVD includes: (i) forming a film on a substrate placed on a susceptor by applying RF power between the susceptor and a shower plate in the presence of a film-forming gas in a reactor; and (ii) upon completion of step (i), without unloading the substrate, applying amplitude-modulated RF power between the susceptor and the shower plate in the absence of a film-forming gas but in the presence of a non-film-forming gas to reduce a floating potential of the substrate.

Abstract: There are provided a sheet having a silicon/plastic bi-layer structure capable of easily transferring a paste even when a hard roll is used, the hard roll having excellent durability but having disadvantages that the paste is poorly transferred when the paste is printed on a plastic base, and a method for producing the same. The bi-layer structured sheet having excellent printability when printed by hard roll includes a flexible substrate and a silicon resin formed on the substrate.

Abstract: A coating system and coating method for damping vibration in an airfoil of a rotating component of a turbomachine. The coating system includes a metallic coating on a surface of the airfoil, and a ceramic coating overlying the metallic coating. The metallic coating contains metallic particles dispersed in a matrix having a metallic and/or intermetallic composition. The metallic particles are more ductile than the matrix, and have a composition containing silver and optionally tin. The method involves ion plasma cleaning the surface of the airfoil before depositing the metallic coating and then the ceramic coating.

Abstract: A microwave is radiated into a processing chamber (1) from a planar antenna member of an antenna (7) through a dielectric plate (6). With this, a C5F8 gas supplied into the processing chamber (1) from a gas supply member (3) is changed (activated) into a plasma so as to form a fluorine-containing carbon film of a certain thickness on a semiconductor wafer (W). Each time a film forming process of forming a film on one wafer is carried out, a cleaning process and a pre-coating process are carried out. In the cleaning process, the inside of the processing chamber is cleaned with a plasma of an oxygen gas and a hydrogen gas. In the pre-coating process, the C5F8 gas is changed into a plasma, and a pre-coat film of fluorine-containing carbon thinner than the fluorine-containing carbon film formed in the film forming process is formed.

Abstract: According to the invention, an insulating or semi-insulating barrier layer which has a thickness where a tunnel current can flow through is provided between a hole injection electrode and an organic compound layer with hole transport characteristics (a hole injection layer or a hole transport layer). Specifically, a thin insulating or semi-insulating barrier layer which contains silicon or silicon oxide; silicon or silicon oxide and a light transmitting conductive oxide material; or silicon or silicon oxide, a light transmitting conductive oxide material, and carbon may be provided between a light transmitting conductive oxide film formed of a light transmitting conductive oxide material, such as ITO and a hole injection layer containing an organic compound.

Abstract: There is disclosed a method of forming crystalline tantalum pentoxide on a ruthenium-containing material having an oxygen-containing surface wherein the oxygen-containing surface is contacted with a treating composition, such as water, to remove at least some oxygen. Crystalline tantalum pentoxide is formed on at least a portion of the surface having reduced oxygen content.

Abstract: A laminate including a resin layer and a metal layer, the resin layer being obtained by modifying at least part of the surface of a resin film including a thermoplastic cyclic olefin resin by ionizing irradiation, and the metal layer being formed on the modified area of the surface of the resin film by plating, a method of producing the same, and an electronic circuit board including a circuit formed by etching the metal layer of the laminate by photolithography, are disclosed. The laminate ensures that the insulating resin layer (flat surface) exhibits high adhesion to the conductor layer.

Abstract: Methods for removing hydrogen from molecules are disclosed. In one embodiment, hydrogen-containing molecules are deposited on a solid substrate and are bombarded with hydrogen projectile particles. The particles may have energies of 5-100 eV, or more preferably 10-50 eV. The hydrogen projectile particles remove hydrogen atoms from the deposited molecules while they are on the substrate, without removing other atoms from the molecules. Dangling bonds are created by the loss of hydrogen and can be used to cross-link the molecules. The resulting product can be a nanometer-thick dense film.

Abstract: A method and a device for descaling a metal strip, in which the metal strip is guided in a direction of conveyance through at least one plasma descaling unit in which it is subjected to a plasma descaling. The metal strip is subjected to an automatically controlled cooling process in a cooling unit following the plasma descaling in the one or more plasma descaling units in such a way that it has a well-defined temperature downstream of the cooling unit.

Abstract: The invention provides a coating system for coating substrates in a cyclic mode. The process stations of the coating system are disposed in a circular fashion. A handling mechanism is provided for transferring the substrates between the process stations. The process stations comprise a lock for loading and unloading the substrates, at least two coating chambers, each of which comprises a plasma source for stationary coating of the substrate, and preferably a heating station.

Abstract: A white LED phosphor film is provided. The white LED phosphor film includes a transparent phosphor carrier, and an LED phosphor layer. The LED phosphor layer is manufactured on the phosphor carrier by screen printing process. A method of manufacturing the white LED phosphor film is also provided.

Abstract: A disk that is identified as defective in a manufacturing process is reused for conditioning a deposition tool that deposits a magnetic material onto disks. After the disk has been identified as defective, a surface of the disk is cleaned in a cleaning tool to remove a lubricant material using a dry etch process. The cleaned disk is moved from the cleaning tool into the deposition tool. The deposition tool is conditioned by depositing the magnetic material onto the cleaned surface of the disk. Because the disk has been cleaned, reusing the defective disk to condition the deposition tool does not contaminate the deposition tool.

Abstract: An organic light emitting diode (OLED) display device and a method of fabricating the same are disclosed. In one embodiment, the method includes: i) preparing a support and a flexible layer, ii) forming a first metal layers on one side of a support and a second metal layer on one side of a flexible layer, iii) performing a cleaning process to the first metal layer and the second metal layer, iv) forming a first radical layer on the first metal layer and a second radical layer on the second metal layer and v) joining the first and second radial layers to each other. At least one embodiment of the invention enhances process convenience and manufacturing yield, and reduces manufacturing costs and time for a flat panel display device having a flexible substrate.

Abstract: [Object] To provide a deposition apparatus and a deposition method that are capable of reducing an evacuation time in an evacuation system having a large condensing load to improve productivity. [Solving Means] A deposition apparatus that forms a film on a plurality of base materials at the same time, includes a support unit including a support section that rotatably supports the plurality of base materials around a rotation shaft, a vacuum chamber including a cylindrical processing chamber that rotatably accommodates the support unit, deposition sources provided inside the vacuum chamber, a low temperature evacuation section including a low temperature condensation source provided opposed to an upper support member on an upper surface of the vacuum chamber, and auxiliary pumps.

Abstract: An organic semiconductor device is provided. The device has a first electrode and a second electrode, with an organic semiconductor layer disposed between the first and second electrodes. An electrically conductive grid is disposed within the organic semiconductor layer, which has openings in which the organic semiconductor layer is present. At least one insulating layer is disposed adjacent to the electrically conductive grid, preferably such that the electrically conductive grid is completely separated from the organic semiconductor layer by the insulating layer. Methods of fabricating the device, and the electrically conductive grid in particular, are also provided. In one method, openings are formed in an electrically conductive layer with a patterned die, which is then removed. In another method, an electrically conductive layer and a first insulating layer are etched through the mask to expose portions of a first electrode.

Abstract: An apparatus includes: a process chamber for treating a substrate; a susceptor in the process chamber; a supporting frame over the susceptor; and at least one wire connected to the supporting frame.