Abstract: A layer-forming apparatus coats a solution containing a layer component and a flammable solvent on a surface of a base material, and forms a layer on the surface of the base material. In the layer-forming apparatus, a coating chamber in which the solution is coated on the surface of the base material is closed substantially hermetically, and a clean air is supplied from a clean-air supplier to the coating chamber. Then, ions that are produced by a corona discharger are sprayed to the surface of the base material in a state that a vapor concentration of the solvent in the coating chamber is below a burning lower limit, and dusts are removed from the base material. Then, the solution is coated on the surface of the base material from which the dusts are removed.

Abstract: A method of manufacturing vacuum plasma treated workpieces includes the steps of introducing at least one workpiece to be treated into a vacuum chamber; treating the workpiece in the vacuum chamber, thereby establishing a plasma discharge in the vacuum chamber by a supply signal with maximum energy at a first frequency which is at least in the Hf frequency range; removing the workpiece treated from the vacuum chamber; performing a cleaning inside the vacuum chamber, thereby establishing the plasma discharge by a supply signal with maximum energy at a second frequency higher than the Hf frequency; and repeating these steps at least one time.

Abstract: A method for coating a fuel cell component is provided. The method includes the steps of providing a fuel cell component, and forming a coating on a surface of the fuel cell component with a plasma jet. The step of forming the coating may include applying a coating precursor to a surface of the fuel cell component and then reacting the coating precursor with the plasma jet to form the coating. The step of forming the coating may also include growing the coating on the surface of the fuel cell component by delivering the plasma jet containing the coating precursor.

Abstract: Embodiments of the present invention provide apparatus and method for front side protection while processing side and backside of a substrate. One embodiment of the present invention provides a showerhead configured to provide a purge gas to a front side of a substrate during a backside etch processing. The showerhead comprises a body configured to be disposed over the front side of the substrate. The body has a process surface configured to face the front side of the substrate. The process surface has an outer circular region, a central region, a middle region between the outer central region and the central region. The first plurality of holes are distributed in the outer circular region and configured to direct the purge gas towards an edge area of the front side of the substrate. No gas delivery hole is distributed within a substantial portion of the middle region.

Abstract: Systematic and effective methodology to clean capacitively coupled plasma reactor electrodes and reduce surface roughness so that the cleaned electrodes meet surface contamination specifications and manufacturing yields are enhanced. Pre-cleaning of tools used in the cleaning process helps prevent contamination of the electrode being cleaned.

Abstract: In at least one embodiment, the present invention relates to a increasing the hydrophilicity of an organic surface. One method in accordance with the present invention includes oxidizing at least a portion of the organic surface to form an oxidized surface portion, and treating the oxidized surfaces portion with an aqueous treatment solution comprising water-soluble and/or water-dispersible polyphenoresin. In at least another embodiment, the present invention relates to preventing the formation of coating defects in polymeric coated surfaces. In at least one embodiment, the present invention relates to increasing paint, ink, and adhesive adhesion.

Abstract: In a plasma CVD apparatus, unnecessary discharge such as arc discharge is prevented, the amount of particles due to peeling of films attached to a reaction chamber is reduced, and the percentage of a time contributing to production in hours of operation of the apparatus is increased while enlargement of the apparatus and easy workability are maintained. The plasma CVD apparatus is configured such that in a conductive reaction chamber 104 with a power source 113, a vacuum exhausting means 118, and a reaction gas introduction pipe 114, plasma 115 is generated in a space surrounded by an electrode 111, a substrate holder 112, and an insulator 120.

Abstract: In a parallel flat plate type plasma CVD apparatus, plasma damage of constituent parts in a reaction chamber due to irregularity of dry cleaning in the reaction chamber is reduced and the cost is lowered. In the parallel flat plate type plasma CVD apparatus in which high frequency voltages of pulse waves having mutually inverted waveforms are applied to an upper electrode and a lower electrode, and the inversion interval of the pulse wave can be arbitrarily changed, the interior of the reaction chamber is dry cleaned.

Abstract: Disclosed herein is a method for regenerating a separator for a fuel cell in which the separator is composed of a substrate of Ti or Ti alloy and a conductive film formed thereon. The method includes a step of removing the conductive film from the separator for a fuel cell and also removing part of the surface of the substrate, thereby giving a regenerated substrate, and a step of forming a regenerated conductive film on the regenerated substrate. The conductive film and the regenerated conductive film are at least one species of noble metal or alloy thereof selected from the group of noble metals consisting of Au, Pt, and Pd, or an alloy composed of at least one species selected from the group of noble metals and one species selected from the group of metals consisting of Ti, Zr, Hf, Nb, Ta, and Si.

Abstract: A method for repairing optical elements having a coating, in which the coating is fully or partially removed or left on the optical element, a polishing layer being provided in the coating or a polishing layer being applied, which allows simple processing of the surface to achieve high geometrical accuracy and lower surface roughness. A new coating is applied onto the corresponding polishing layer. Also addressed are corresponding optical elements, including optical elements recycled according to the method.

Abstract: The disclosure is directed to a tube. The tube includes a silicone elastomer and at least one reinforcement member substantially embedded within the silicone elastomer. The disclosure is also directed to a tube including a first layer and a second layer adjacent the first layer. The first layer includes a fluoropolymer liner and the second layer includes a silicone elastomer and at least one reinforcement member substantially embedded within the silicone elastomer. This disclosure is further directed to a method for making the aforementioned tubes.

Abstract: There is disclosed a method of forming crystalline tantalum pentoxide on a ruthenium-containing material having an oxygen-containing surface wherein the oxygen-containing surface is contacted with a treating composition, such as water, to remove at least some oxygen. Crystalline tantalum pentoxide is formed on at least a portion of the surface having reduced oxygen content.

Abstract: The present invention relates to a method for producing fluorocarbon layers on a substrate, e.g., a metal, polymer, ceramic material and/or textiles by means of a low-pressure plasma method and products produced in this way.

Abstract: In a method of using and cleaning one or more shadow masks of a shadow mask vapor deposition system used to form an electronic device, a substrate is advanced through series connected deposition vacuum vessels. As the substrate advances through each deposition vacuum vessel, material from a material deposition source positioned in the deposition vacuum vessel is deposited on the substrate through a shadow mask positioned therein. The material is also deposited on a surface of the shadow mask that faces the one material deposition source. Following the deposit of material on the surface of the shadow mask in at least one deposition vacuum vessel, a reactive gas is introduced into the deposition vacuum vessel absent the substrate therein. The reactive gas is then ionized to remove the material deposited on the shadow mask.

Abstract: Syringes for holding fluids susceptible to void formation when the syringe and fluid are frozen and thawed before use. The interior surface of the syringe barrel is modified by exposure to a plasma such that the incidence of void formation in the fluid is prevented or, at the least, significantly reduced in comparison with conventional syringes.

Abstract: A method and a device for coating an inner surface of a hollow endless geometry, in particular of a pipe/tube includes introducing a gas mixture comprising at least one precursor into the endless geometry, in which the endless geometry is passed through at least one electrode unit, in which an alternating electric voltage is applied to the electrode unit, so that the gas mixture inside the endless geometry is at least partially transformed into a plasma state in the region of the electrode unit. A reaction product is produced in the gas mixture from the precursor by the plasma and the reaction product is deposited on the inner surface of the endless geometry.

Abstract: A method for layering lenses includes: plasma treating a lens surface; applying a removable ink layer onto the lens surface; applying a base ink layer over the removable ink layer; applying at least one colored ink layer over the base ink layer; and removing the removable ink layer. Additional steps may include drying the lens, sealing the sides of the lens, and applying liquid to the lens before removing the removable ink layer.

Abstract: A cleaning arrangement for a lithographic apparatus module may be provided in a collector. The cleaning arrangement includes a hydrogen radical source configured to provide a hydrogen radical containing gas to at least part of the module and a pump configured to pump gas through the module such that a flow speed of the hydrogen radical containing gas provided through at least part of the module is at least 1 m/s. The cleaning arrangement may also include a gas shutter configured to modulate a flow of the hydrogen radical containing gas to at least part of the module, a buffer volume of at least 1 m3 in communication with the module, and a pump configured to provide a gas pressure in the buffer volume between 0.001 mbar (0.1 Pa) and 1 mbar (100 Pa). The cleaning arrangement may further include a gas return system.

Abstract: In this etching method, since an etching gas is introduced before introduction of free radicals into a processing chamber, the etching gas has been adsorbed on the surface of substrates when the free radicals are introduced. Accordingly, the free radicals react with the etching gas adsorbed on the surface of the substrates, and the reaction proceeds uniformly on the surface of the substrate. As a result, nonuniform etching does not occur on the surface of the substrate. Moreover, since the reaction between the etching gas and the free radicals occurs on the surface of the substrate, an intermediate product produced according to the reaction between the etching gas and the free radicals reacts with an etching object promptly. Therefore, the intermediate product is not exhausted from the processing chamber 12 excessively, and hence the etching efficiency is high.

Abstract: A method for producing single-dimensioned gold-nano-particle patterns having a single-particle resolution in which the line-width is only limited by the particle size. Initially, a focused electron beam is used to generate a positive charge layer on an SiO2 surface. Biotinated DNA molecules attracted by these positive charges are then used to acquire Au-nano-particles revealing the e-beam exposure patterns. The particles in the single-line patterns become separated in an orderly manner, due to the repulsive force between different Au colloidal particles. Each single-line pattern has potential use in nano-photonics and nano-electronics. In nano-electronics, the line patterns serve as a template for high or low resistance conductive nano-wires. Low resistance wires exhibit linear current-voltage characteristics with an extremely high maximum allowed current density. The high resistance wires display charging effect with clear Coulomb oscillation behavior at low temperatures.

Abstract: A cleaning arrangement for a lithographic apparatus module may be provided in a collector. The cleaning arrangement includes a hydrogen radical source configured to provide a hydrogen radical containing gas to at least part of the module and a pump configured to pump gas through the module such that a flow speed of the hydrogen radical containing gas provided through at least part of the module is at least 1 m/s. The cleaning arrangement may also include a gas shutter configured to modulate a flow of the hydrogen radical containing gas to at least part of the module, a buffer volume of at least 1 m3 in communication with the module, and a pump configured to provide a gas pressure in the buffer volume between 0.001 mbar (0.1 Pa) and 1 mbar (100 Pa).

Abstract: In order to metallise a support made from high temperature polymer, the melting temperature of which is higher than 180° C., it is shown that the stages of cleaning, plasma etching, grafting and then metallising in a metallisation bath can be applied. According to the invention, the metallisation bath is brought to a temperature between 50° C. and 70° C., the plasma being a nitrogenous plasma.

Abstract: A method of forming a patterned functional layer on a substrate using a poly(hydroxyethyl methacrylate) lift-off layer is described. The method can be used with substrates that would not tolerate the organic solvents required for processing of known poly(methyl methacrylate) lift-off layers. When used in combination with known nanoimprint lithography and step-and-flash imprint lithography techniques, the method can be used to generate patterned functional structures with dimensions as small as five nanometers.

Abstract: A process and an arrangement by means of which it is possible to generate a layer system for the protection against wear, for the protection against corrosion and for improving the sliding properties or the like, which has an adhesive layer for the arrangement on a substrate, a transition layer for the arrangement on the adhesive layer and a cover layer of an adamantine carbon, the adhesive layer including at least one element from the Group which contains the elements of the 4th, 5th and 6th Subgroup and silicon, the transition layer comprising carbon and at least one element from the above-mentioned Group, and the cover layer consisting essentially adamantine carbon, the layer system having a hardness of at least 15 GPa, preferably at least 20 GPa, and an adhesion of at least 3 HF.

Abstract: A method of processing a workpiece includes placing the workpiece on a workpiece support pedestal in a main chamber with a gas distribution showerhead, introducing a process gas into a remote plasma source chamber and generating a plasma in the remote plasma source chamber, transporting plasma-generated species from the remote plasma source chamber to the gas distribution showerhead so as to distribute the plasma-generated species into the main chamber through the gas distribution showerhead, and applying plasma RF power into the main chamber.

Abstract: The present invention is a production method for a magnetic recording media in which at least a magnetic layer, a protective layer, and a lubricant layer are sequentially layered onto a non-magnetic substrate 1, and non-magnetic substrate 1 is surface treated using a gas activated by plasma generated at around atmospheric pressure. As a result of the present invention, it is possible to produce magnetic recording media with good yield that have few errors and superior head floating properties, by effectively removing foreign material and projections present on the surface of the magnetic recording media.

Abstract: Disclosed herein are methods for coating metal substrates, systems therefore, and articles made therefrom. In one embodiment, the method of coating a metal substrate comprises: disposing a metallic bond coating on the metal substrate, creating ions with a reverse polarity high frequency apparatus at a frequency of greater than or equal to about 2.5 kHz, roughening the surface with the ions to a subsequent average surface roughness of greater than or equal to about 5 ?m, and disposing a ceramic coating on the metallic bond coating surface. The metallic bond coating had a surface with an initial average surface roughness of less than or equal to about 1 ?m.

Abstract: A method of making a hydrophobic, disordered composite material having protrusive surface features includes the following steps: making a disordered composite body comprised of a recessive phase and a protrusive phase, the recessive phase having a higher susceptibility to a preselected etchant than the protrusive phase; treating a surface of the composite body with the preselected etchant so that the protrusive phase protrudes from the surface to form a plurality of protrusive surface features and the recessive phase defines a recessive surface between the surface features; and applying a hydrophobic coating to the protrusive surface features.

Abstract: Disclosed is a radiant heat printed circuit board, which has improved heat-radiating properties and reliability, and a method of fabricating the same.

Abstract: In a process involving the formation of an insulating film on a substrate for an electronic device, the insulating film is formed on the substrate surface by carrying out two or more steps for regulating the characteristic of the insulating film involved in the process under the same operation principle. The formation of an insulating film having a high level of cleanness can be realized by carrying out treatment such as cleaning, oxidation, nitriding, and a film thickness reduction while avoiding exposure to the air. Further, carrying out various steps regarding the formation of an insulating film under the same operation principle can realize simplification of the form of an apparatus and can form an insulating film having excellent property with a high efficiency.

Abstract: The embodiments fill the needs of systems and processes that perform substrate surface treatment to provide homogenous, clean, and sometimes activated surface in order to provide good adhesion between layers to improve metal migration and void propagation. In an exemplary embodiment, a proximity head for treating a substrate surface is provided. The proximity head is configured to dispense a treatment gas to treat an active process region of a substrate surface under the proximity head. The proximity head covers the action process region of the substrate surface and the proximity head includes at least one vacuum channel to pull excess treatment gas from a reaction volume between the proximity head and the substrate. The proximity head has an excitation chamber to excite the treatment gas before the treatment gas being dispensed on the active process region portion of the substrate surface.

Abstract: A PVD coating is disclosed, and in particular a nanoscale multilayer superlattice PVD coating comprising high hardness, a low friction coefficient and increased chemical inertness. The multilayer coating comprises a repeating bilayer represented by (VxMe(i-x))CyN(i-y)/(MezV(1-z))CyN(i-y) where 0.1?x?0.9; 0.01<y<0.99 and 0.1?z?0.9 and Me is a substantially pure metal or a metal alloy. The composition of the coating through the layers alternates from layer to layer according to a V-rich layer and a Me-rich layer modulated sequence. Vanadium is incorporated within the layer composition and has been found to act as a lubricating agent during sliding wear. Carbon, also incorporated within the coating, serves to further stabilise the friction coefficient thereby increasing the chemical inertness between cutting tool and workpiece material.

Abstract: The present invention is related to a chemical vapor deposition method of depositing layers of materials to provide super-hydrophilic surface properties, or super-hydrophobic surface properties, or combinations of such properties at various locations on a given surface. The invention also relates to various product applications which make use of super-hydrophobic surface properties, such as electronic devices, biological analytical and diagnostic tools, and optical devices, for example.

Abstract: This invention involves a process of forming an oxide coating with dimples on Al, Mg and Ti alloys. The oxide coating with dimples on its surface is produced by the process consisting of an electrochemical etching on the surface of those alloys followed by plasma oxidation in an alkaline electrolytic solution using a high voltage power supply. The as-prepared coating has smooth surface finish and improved properties being suitable for wear and corrosion protection of materials which have contacts with each other. The present invention can also be applied onto Al—Si and Mg alloys for wear and corrosion-wear prevention of sleeveless aluminium and magnesium engines.

Abstract: The invention relates to a process and to a web deposition machine for coating a plastic substrate with at least one metal layer, in particular plastic foil for flexible, printed circuit boards, wherein before depositing a first layer onto a surface of the plastic substrate to be deposited, a non depositing pretreatment of this surface is performed. It is the object of the invention to provide a process as described above through which the adhesion of metal layers on a plastic substrate is improved. Furthermore, a web deposition machine shall be provided through which such process can be performed. The object is accomplished through a process so that the non depositing pretreatment is performed in two steps, thus in a first step in which the surface of the plastic substrate (2) is cleaned with a non reactive low energy plasma (14), and in a second step in which the surface of the plastic substrate (2) is activated through reactive high energy ion radiation (17).

Abstract: A process for the production of a printing form, especially within a printing press, where a permanent and erasable image is provided on the rewritable surface of a printing form by means of the following steps: (a) the preparation of a printing form with a rewritable surface; (b) the all-over application of a rubber coating to the rewritable surface of the printing form; (c) the image data-oriented removal of the previously applied rubber coating; (d) the image data-oriented application of an imaging polymer to the surface in the areas from which the rubber coating was previously removed; and (e) the all-over fixation of the imaged surface.

Abstract: Embodiments described herein provide methods for removing native oxide surfaces on substrates while simultaneously passivating the underlying substrate surface. In one embodiment, a method is provided which includes positioning a substrate containing an oxide layer within a processing chamber, adjusting a first temperature of the substrate to about 80° C. or less, generating a cleaning plasma from a gas mixture within the processing chamber, such that the gas mixture contains ammonia and nitrogen trifluoride having an NH3/NF3 molar ratio of about 10 or greater, and condensing the cleaning plasma onto the substrate. A thin film, containing ammonium hexafluorosilicate, is formed in part, from the native oxide during a plasma clean process. The method further includes heating the substrate to a second temperature of about 100° C. or greater within the processing chamber while removing the thin film from the substrate and forming a passivation surface thereon.

Abstract: A method for layering lenses includes: plasma treating a lens surface; applying a removable ink layer onto the lens surface; applying at least one base ink layer over the removable ink layer; applying at least one colored ink layer over the base ink layer; and removing the removable ink layer. Additional steps may include drying the lens, sealing the sides of the lens, and applying liquid to the lens before removing the removable ink layer.

Abstract: In an embodiment, one reinforced substrate for use in a photovoltaic device includes a polymer base material and a reinforcing structure bonded with the base material. The reinforced substrate presents a surface in a condition that is made-ready for deposition of thin film layers of the photovoltaic device. A thin film photovoltaic device includes the reinforced substrate, a back contact layer formed on the surface of the reinforced substrate, and a solar absorber layer formed on the back contact layer. A plurality of thin film photovoltaic devices may be formed on a common reinforced substrate. A process of producing a reinforced substrate includes combining a fluid base material and a fiber reinforcing structure to form an impregnated fiber reinforcement. The impregnated fiber reinforcement is cured to form the reinforced substrate, and the reinforced substrate is annealed.

Abstract: A continuous, uninterrupted two-step treatment process capable of forming nanometer scale physical structures on the surface of articles fabricated from metallic, ceramic, glass, or plastic materials, and then depositing a thin conformal coating on the nanostructured surface such that the physical structures previously produced are neither masked nor are the dimensions of the physical structures substantially altered. In an additional embodiment, a thicker coating can be grown from the thin conformal coating which itself can be nanostructured as it is deposited. In this case adhesion of the thicker coating is not dependent upon the use of conventional surface pretreatments such as machining, chemical etching, or abrasive blasting. Surface texturing may be performed by ion beam sputtering, and ion assisted coating forms the thin conformal coating, and thicker coating if desired. The treatment process is useful for improving the mechanical, catalytic, chemical, or biological activity of the surfaces so treated.

Abstract: A mounting device includes a mounting body for sustaining a target object to be processed thereon; an electrostatic chuck disposed on the mounting body and having an electrode layer interposed between insulating layers, and the electrostatic chuck serving to electrostatically attract and hold the target object on a surface of the insulating layer by a electrostatic force generated between the electrode layer and the target object by a voltage applied to the electrode layer. Herein, an electrostatic chuck layer, which is one of the insulating layers on the side of a top surface of the electrode layer, is made of a plasma spray coating of yttrium oxide, which is formed by a plasma spraying, having a thickness of about 200 ?m to 280 ?m, and the electrostatic chuck layer has a surface roughness dependent on a particle diameter of the yttrium oxide used in the plasma spraying.

Abstract: An antiscattering grid for an X-ray imaging apparatus of the type comprising a substrate having a plurality of metallized partitions that together define a plurality of cells distributed over the substrate. The partitions allow passage of the X-rays emitted from a source lying in line with the grid, and absorbing the X-rays not coming directly from this source. The substrate is made of a polymer material that may be formed by radiation curing of a monomer sensitive to this radiation. The substrate may be substantially planar and the partitions may be oriented to form a focused grid.

Abstract: A substrate treating apparatus includes a substrate support unit with a chuck on which a substrate is loaded; a bottom chamber having an open top and configured to surround the circumference of the chuck; a top chamber configured to open or close the top of the bottom chamber such that the substrate is dried while the top chamber is sealed from the outside; and a direct injection nozzle member installed at the top chamber to inject fluid directly to the substrate while the top of the bottom chamber is closed. According to the substrate treating apparatus, drying efficiency of an entire substrate is enhanced, external contaminants are blocked, and generation of an oxide layer is suppressed.

Abstract: An antireflective composition and a lithographic structure comprising a silicon-metal oxide, antireflective material derived from the composition. The antireflective composition comprises a polymer of formula I, wherein 1?x?2; 1?y?5; 1?0; m>0; n>0; R is a chromophore, M is a metal selected from Group IIIB to Group VIB, lanthanides, Group IIIA, Group IVA except silicon; and L is an optional ligand. The invention is also directed to a process of making a lithographic structure including a silicon-metal oxide, antireflective material.

Abstract: The present invention is related to a method for fabricating an imprint mold which can be used in the field of nano-imprint lithography. Firstly, a diamond film and a photoresist film are successively formed onto a substrate; wherein the photoresist film is more capable of anticorrosion than the diamond film. Then an energy beam lithography system is provided to make the photoresist film form a photoresist mask with particularly arranged patterns. Because of the etching selectivity between the diamond film and the photoresist film, on the surface of the diamond film a pattern can be easily formed with recessions and protrusions according to the photoresist mask by dry etching method.

Abstract: The coating of internal surfaces of a workpiece is achieved by connecting a bias voltage such that the workpiece functions as a cathode and by connecting an anode at each opening of the workpiece. A source gas is introduced at an entrance opening, while a vacuum source is connected at an exit opening. Pressure within the workpiece is monitored and the resulting pressure information is used for maintaining a condition that exhibits the hollow cathode effect. Optionally, a pre-cleaning may be provided by introducing a hydrocarbon mixture and applying a negative bias to the workpiece, so as to sputter contaminants from the workpiece using argon gas. Argon gas may also be introduced during the coating processing to re-sputter the coating, thereby improving uniformity along the length of the workpiece. The coating may be a diamond-like carbon material having properties which are determined by controlling ion bombardment energy.

Abstract: A method of self-cleaning a plasma reactor upon depositing a carbon-based film on a substrate a pre-selected number of times, includes: (i) exciting oxygen gas and/or nitrogen oxide gas to generate a plasma; and (ii) exposing to the plasma a carbon-based film accumulated on an upper electrode provided in the reactor and a carbon-based film accumulated on an inner wall of the reactor.

Abstract: The present invention relates to a process for producing a porous layer adhering to a substrate, which comprises the steps: a. preparation of a composition comprising an organic polymer constituent and an inorganic-organic constituent and/or an inorganic constituent, b. application of this composition to a substrate and formation of a layer on the substrate, and c. removal of the inorganic-organic constituent and/or the inorganic constituent from the layer to form a porous layer adhering to the substrate.

Abstract: Intraocular lenses or contact lenses 20 are placed on a lower spindle 34 and held there by a vacuum in conduit 34. Noble and reactive gases 56, 58 are introduced and a voltage is applied across upper spindle 32 and lower spindle 34 to plasma treat one surface of the lens. The lens is transferred to the other spindle and the process is repeated.

Abstract: A liquid crystal dropping apparatus is used in the manufacture of liquid crystal display devices, which is designed to apply vibration energy to liquid crystal charged in a liquid crystal container, thereby allowing the liquid crystal to be dropped as a spray. The liquid crystal dropping apparatus includes a liquid crystal container in which liquid crystal is charged so that a pressure is applied to the liquid crystal if gas is supplied into the liquid crystal container, an opening and closing device for opening and closing a liquid crystal discharge hole provided at a lower end of the liquid crystal container, and a vibration energy supply device for supplying vibration energy to the interior of the liquid crystal container.