Oxygen Containing Atmosphere Patents (Class 427/539)
  • Patent number: 5514501
    Abstract: A process for creating a two dimensional spacial distribution pattern of ferent thiolate molecules on a substrate by illuminating a surface of a self-assembled monolayer of a first thiolate compound in the presence of oxygen with high frequency electromagnetic radiation distributed according to a desired pattern, and subsequently immersing the illuminated substrate in a solution of a second thiolate compound so that molecules of the first thiolate compound in illuminated areas of the monolayer are exchanged for molecules of said second thiolate compound; and a patterned biomolecular composite formed of a substrate which forms a self-assembled thiolate monolayer when immersed in a solution of a thiolate forming compound, a thiolate monolayer deposited on the substrate and composed of patterned areas of first and second thiolate compounds, respectively, the first thiolate compound having an affinity for specifically or nonspecifically adsorbing a biological molecule, and the second thiolate compound having esse
    Type: Grant
    Filed: June 7, 1994
    Date of Patent: May 7, 1996
    Assignee: The United States of America as represented by the Secretary of Commerce
    Inventor: Michael J. Tarlov
  • Patent number: 5512333
    Abstract: A method of making and using a compostable paperboard container and package for liquids which is coated with a polymeric material capable of degrading under composting conditions and subsequently in the presence of light to form carbon dioxide, water, and biomass.
    Type: Grant
    Filed: April 6, 1994
    Date of Patent: April 30, 1996
    Assignee: ICD Industries
    Inventor: Stuart P. Suskind
  • Patent number: 5510156
    Abstract: A method for forming sub-micron sized bumps on the bottom surface of a suspended microstructure or the top surface of the underlying layer in order to reduce contact area and sticking between the two layers without the need for sub-micron standard photolithography capabilities and the thus-formed microstructure. The process involves the deposition of latex spheres on the sacrificial layer which will later temporarily support the microstructure, shrinking the spheres, depositing aluminum over the spheres, dissolving the spheres to leave openings in the metal layer, etching the sacrificial layer through the openings, removing the remaining metal and depositing the microstructure material over the now textured top surface of the sacrificial layer.
    Type: Grant
    Filed: August 23, 1994
    Date of Patent: April 23, 1996
    Assignee: Analog Devices, Inc.
    Inventor: Yang Zhao
  • Patent number: 5503878
    Abstract: A method of preparing a patterned thin film resistor that is appropriately used in combination with semiconductor devices. The method comprises a thin film forming step comprising forming a thin film of a compound comprising at least one metal on an oxide film such as a silicon oxide film; a masking step comprising covering a desired area of the thin film by an organic material; a patterning step comprising converting to plasma a gas mixture comprising a fluorine compound gas and oxygen, and removing an area of the thin film, that is not covered by the organic material by exposing it to a gas containing activated fluorine by the plasma conversion; and a removing step comprising removing the organic material remaining on the desired area of the thin film.
    Type: Grant
    Filed: August 18, 1994
    Date of Patent: April 2, 1996
    Assignee: Nippondenso Co., Ltd.
    Inventors: Mikimasa Suzuki, Makio Iida, Makoto Muto
  • Patent number: 5487920
    Abstract: A process for the plasma enhanced vapor deposition of a silicon-containing compound having one to three Si atoms onto a surface of glass, mirror, microchip or polymer substrates in flat or complex shape to provide thereon anti-fog and/or anti-scratch coating(s) is provided. The surface modifying step is conducted with a plasma composition derived from a gas stream consisting essentially of from about 80 to 40 mole percent N.sub.2 O and from about 20 to 60 mole percent CO.sub.2.
    Type: Grant
    Filed: April 19, 1994
    Date of Patent: January 30, 1996
    Assignee: The BOC Group, Inc.
    Inventors: Eugene S. Lopata, John S. Nakanishi
  • Patent number: 5486357
    Abstract: Internal polymeric surfaces of medical devices are provided that have enhanced biocompatibility properties. The internal polymeric surface presents an anti-thrombogenic, fibrinolytic or thrombolytic interface with body fluids such as blood flowing through medical device tubing during implantation for medical procedures. The biocompatibility enhancing agent is secured to the polymeric substrate by a spacer molecule which is covalently bound to the internal polymeric surface which had been subjected to radiofrequency plasma treatment with a low pressure plasma medium of water vapor, oxygen or combination of water vapor and oxygen gas.
    Type: Grant
    Filed: October 27, 1993
    Date of Patent: January 23, 1996
    Assignee: Cordis Corporation
    Inventor: Pallassana V. Narayanan
  • Patent number: 5472747
    Abstract: A method of and apparatus for treating a polyolefin surface to become receptive to inks and adhesives is disclosed. The present invention provides a method of and apparatus for treating a polyolefin surface to become receptive to inks and adhesives, using the steps of introducing the shaped object onto a conveyor belt; conveying the shaped object towards an output end of the conveyor belt; aligning and guiding the shaped object across a treatment device to treat the entire 360.degree. surface of the shaped object. The treatment device includes, for example, an electrode spark generator.
    Type: Grant
    Filed: November 23, 1993
    Date of Patent: December 5, 1995
    Inventors: Ramon E. Poo, Faustino Poo
  • Patent number: 5468326
    Abstract: Apparatus and process for polishing a diamond or carbon nitride film by reaction of the film with oxygen anions at the interface between the film and a superionic conductor (e.g., yttria stabilized zirconia) placed in contact with the film. Oxygen anions produced by the formation of vacancies in the superionic conductor are transported to the interface under the influence of a chemical gradient and react with the diamond or carbon nitride. Application of an electric field and/or heat can be used to increase the oxygen partial pressure on the side of the interface opposite the film. An oxygen plasma can be supplied to the superionic conductor such that oxygen ions from the plasma transpire through the superionic conductor to the interface and react with the diamond or carbon nitride.
    Type: Grant
    Filed: March 13, 1995
    Date of Patent: November 21, 1995
    Assignee: International Business Machines Corporation
    Inventors: Jerome J. Cuomo, Joseph E. Yehoda
  • Patent number: 5466424
    Abstract: A surface treating method is described, which method comprising applying, between electrodes, a potential sufficient to cause corona discharge to occur in the presence of a gas which comprises molecules containing at least one atom selected from the group consisting of halogen atom, oxygen atom and nitrogen atom. The resultant corona discharge is applied to an object to be treated for the surface treatment of the object, said object being outside said electrodes. The excellent adhesive surface can be obtained when said object is separated from said electrodes at a distance in the range of 10 mm to 5 m.
    Type: Grant
    Filed: December 28, 1993
    Date of Patent: November 14, 1995
    Assignees: Bridgestone Corporation, Bridgestone Sports Co., Ltd.
    Inventors: Yukihiro Kusano, Tomoko Inagaki, Masato Yoshikawa, Setsuo Akiyama, Kazuo Naitoh
  • Patent number: 5445682
    Abstract: A method of applying a surface hydrophilic treatment to a heat-transfer tube with a good productivity, which obtains an excellent surface hydrophilic property not deteriorated for a long term. The method includes the steps of: heating a copper or copper alloy heat-transfer tube for 5 to 10 min at a temperature ranging from 250.degree. to 350.degree. C. in an atmosphere mainly containing an inert gas; and applying corona discharge or plasma discharge to the copper or copper alloy heat-transfer tube. To prevent the coloring, the atmosphere preferably contains O.sub.2 in a concentration of 3% or less and CO in a concentration of 1 to 5%, the balance being an inert gas.
    Type: Grant
    Filed: July 7, 1994
    Date of Patent: August 29, 1995
    Assignee: Kabushiki Kaisha Kobe Seiko Sho
    Inventors: Naoyuki Hasegawa, Seiji Ishida, Hisanori Shiraishi
  • Patent number: 5443743
    Abstract: A gas plasma treated porous medium and method of using such a medium to separate or remove materials such as components of biological fluids.
    Type: Grant
    Filed: May 31, 1994
    Date of Patent: August 22, 1995
    Assignee: Pall Corporation
    Inventor: Thomas C. Gsell
  • Patent number: 5437894
    Abstract: A water- and oil-repelling adsorbing film formed on a material having active hydrogen such as hydroxyl group, imino group and amino group at the surface. This film is a chemically adsorbed film having surface irregularities exceeding 10 nanometers. It is directly or indirectly covalently bonded to the material surface and includes a monomolecular film or a polymer film with the molecules thereof containing a fluorocarbon group and a --Si-- bond. The surface irregularities which exceed the molecular level are at least either those formed on the material surface itself, those due to particles formed on the substrate surface or those due to particles present in the chemically adsorbed film.
    Type: Grant
    Filed: January 25, 1994
    Date of Patent: August 1, 1995
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Kazufumi Ogawa, Mamoru Soga
  • Patent number: 5427638
    Abstract: A method for reaction bonding surfaces at low temperatures in which polished and cleaned surfaces are bombarded with a mixture of oxygen and fluorine ions to produce activated surfaces. The activated surfaces are then cleaned to remove particulates, then contacted at room temperature to affect a reaction bond therebetween. The bond energy of the reaction bonded surfaces increase with time at room temperature. The rate at which the bond energy of the reaction bonded surfaces increases may be enhanced by moderate heating at a low temperature below a temperature which would be detrimental to any part of the reaction bonded structure. A satisfactory bond energy for silicon wafers can be achieved in four hours at room temperature and in less than 10 minutes at 50.degree. C.
    Type: Grant
    Filed: December 3, 1993
    Date of Patent: June 27, 1995
    Assignee: AlliedSignal Inc.
    Inventors: George G. Goetz, Warren M. Dawson
  • Patent number: 5411769
    Abstract: It is possible to use an oriented monolayer to limit the Van der Waals forces between two elements by passivation. The invention disclosed here details how to do so by building the device to be passivated, cleaning the surface to be passivated, activating the surface, heating it along with the material to be used as the monolayer, exposing a vapor of the material to the surface and evacuating the excess material, leaving only the monolayer.
    Type: Grant
    Filed: September 29, 1993
    Date of Patent: May 2, 1995
    Assignee: Texas Instruments Incorporated
    Inventor: Larry J. Hornbeck
  • Patent number: 5411638
    Abstract: A method of treating an aramid monofilament by plasma in such a manner that the monofilament has a wettability by water satisfying the relationship WS.sub.SL .gtoreq.120, W.sub.SL being the reversible solid-liquid adhesion work expressed in mJ/m.sup.2. By way of example, the treatment is carried out by means of a plasma at reduced pressure, and the monofilament is subjected to a coating treatment after the surface treatment. The aramid monofilament is characterized by the following relationships:1.7.ltoreq.Ti.ltoreq.260;40.ltoreq.D.ltoreq.480;T.gtoreq.170-D/3;Mi.gtoreq.2,000; andW.sub.SL .gtoreq.120.In the above relationships, Ti represents linear density in tex, D represents diameter in .mu.m (micrometers), T represents tenacity in cN/tex, and Mi represents initial modulus in cN/tex. The aramid monofilament is particularly useful for reinforcing tires.
    Type: Grant
    Filed: June 22, 1993
    Date of Patent: May 2, 1995
    Assignee: Compagnie Generale Des Establissements Michelin-Michelin & Cie
    Inventors: Denis Bernard, Jean-Luc Cornillon
  • Patent number: 5409696
    Abstract: Polymeric surfaces of medical devices or components of medical devices are provided that have enhanced biocompatibility properties. The polymeric surface presents an anti-thrombogenic, fibrinolytic or thrombolytic interface with body fluids such as blood during implant ation or medical procedures. The biocompatibility enhancing agent is secured to the polymeric substrate by a spacer molecule which is covalently bound to the polymeric substrate which had been subjected to radiofrequency plasma treatment with a water vapor medium.
    Type: Grant
    Filed: November 22, 1993
    Date of Patent: April 25, 1995
    Assignee: Cordis Corporation
    Inventors: Pallassana V. Narayanan, Kimberly D. Stanley
  • Patent number: 5407506
    Abstract: A method for enhancing the bond energy of reaction bonded surfaces in which polished (10) and cleaned surfaces (12) are bombarded with oxygen ions, fluorine ions or a mixture of oxygen and fluorine ions (14) to activate these surfaces. The activated surfaces are then cleaned to remove particulates (15) and then contacted (16) at room temperature to make a reaction bond therebetween. The reaction bond may be heated (18) to further increase the bond energy. The bond energy of oxygen ion bombarded surfaces can have two times the bond energy of surfaces subject to a conventional bonding process. The addition of fluorine ions to the oxygen ions used to activate the surfaces can further increase the bond energy between the contacted surfaces by at least another factor of 2.
    Type: Grant
    Filed: May 12, 1994
    Date of Patent: April 18, 1995
    Assignee: AlliedSignal Inc.
    Inventors: George G. Goetz, Warren M. Dawson
  • Patent number: 5407709
    Abstract: This invention provides for an anti-contaminating film which is adsorbed to a substrate surface. The film contains a --Si-- group and fluorocarbon group. The --Si-- group is covalently bonded to the substrate surface. It also provides a forming method of an anti-contaminating film on a hydrogen active substrate surface by contacting the substrate surface with a non-aqueous solution, containing a surface active material having fluorocarbon groups and chlorosilane groups, the substrate surface having active hydrogen groups, removing unreacted surface active material remaining on the substrate by washing the substrate with a non-aqueous organic solution for making a monomolecular precursor film, reacting chlorosilane groups unreacted in the adsorbed monomolecular a precursor film with water after the removing step, and drying the adsorbed monomolecular film.
    Type: Grant
    Filed: November 8, 1993
    Date of Patent: April 18, 1995
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Kazufumi Ogawa, Norihisa Mino, Mamoru Soga
  • Patent number: 5403626
    Abstract: A process for preparing a hydrophilic polymer film comprising coating a photopolymerization solution which comprises a hydrophilic monomer of lower water swelling ability and a UV stabilizer, on the film surface pre-treated with high frequency, and photopolymerizing the solution so as to improve the hydrophilic property, climate-resistability, and blocking property of the polymer film.
    Type: Grant
    Filed: September 29, 1993
    Date of Patent: April 4, 1995
    Assignee: Sam Yang Co., Limited
    Inventors: Young H. Kim, Jae W. Kim, Jeong W. An, Woog Y. Lee
  • Patent number: 5403436
    Abstract: A plasma treating method subjects an object surface to a plasma treating within a chamber. First, first and second gasses are supplied into the chamber, where the first gas includes hydrogen molecules as a main component, the second gas includes a quantity of hydrogen less than that included in the first gas and is selected from a group of materials consisting of organic compounds and inorganic compounds, the organic compounds include hydrogen and oxygen and the inorganic compounds include hydrogen. Second, plasma of a mixed gas which is made up of the first and second gasses is generated within the chamber to subject the object surface to the plasma treating. Preferably, the second gas is water vapor.
    Type: Grant
    Filed: July 11, 1994
    Date of Patent: April 4, 1995
    Assignee: Fujitsu Limited
    Inventors: Shuzo Fujimura, Tetsuya Takeuchi, Takeshi Miyanaga, Yoshimasa Nakano, Yuji Matoba
  • Patent number: 5397597
    Abstract: A chemically adsorbed film containing fluorocarbon groups is formed on an optical recording medium. Thus, an excellently water- and moisture-proof optical recording medium can be obtained. The optical recording medium is obtained by forming a chemically adsorbed film composed of fluorocarbon chain surface active material. The chemically adsorbed film is chemically bonded via siloxane covalent bonds. In the method of manufacture, an optical recording medium, e.g., an optical recording disk, is contacted with a solution which is made by dissolving a straight carbon chain surface active material having a chlorosilyl group at one end and a fluorocarbon group at the other end in a non-aqueous solvent or a gaseous phase condition, thereby chemically bonding the chlorosilane-based straight chain surface active material to the surface of the substrate via covalent siloxane bonds.
    Type: Grant
    Filed: July 19, 1993
    Date of Patent: March 14, 1995
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Mamoru Soga, Shinji Ozaki, Norihisa Mino, Kazufumi Ogawa
  • Patent number: 5395662
    Abstract: Improvements in the method and apparatus of vacuum deposition of a highly reflective surface onto aluminum base, including unanodized roll-polished aluminum, wherein a coil of the aluminum is disposed within the vacuum chamber, both as it unwinds and as it rewinds, and the water vapor created by heating the aluminum web is made available to other vacuum deposition processing compartments within the vacuum chamber including a glow discharge chamber typically fueled by argon gas. A relatively thick layer of oxide is vacuum deposited onto an unanodized aluminum base as a substrate for the reflective surface.
    Type: Grant
    Filed: May 5, 1993
    Date of Patent: March 7, 1995
    Assignee: Dielectric Coating Industries
    Inventors: Carmen B. Bischer, Jr., Edward A. Small, Jr.
  • Patent number: 5378507
    Abstract: A continuous dry coating method and an apparatus therefor which are capable of removing cut chips and burrs from and smoothing inner walls of small-diameter holes in a substrate material and, then, successively performing a cold coating on these small holes in a short period of time. The continuous dry process coating method comprises the steps of: arranging electrodes on opposite sides of a substrate material; performing a plasma discharge to surface-treat small holes made in the substrate material; and then performing an electron cyclotron resonance plasma (ECR plasma) coating on the surfaces of these holes.
    Type: Grant
    Filed: June 4, 1993
    Date of Patent: January 3, 1995
    Assignees: Sakae Electronics Industrial Co., Ltd., Kazuo Ohba, Yoshinori Shima, Akira Ohba
    Inventors: Kazuo Ohba, Yoshinori Shima, Akira Ohba
  • Patent number: 5376628
    Abstract: Herein is disclosed a method of improving or producing an oxide superconductor. An oxide superconductor or starting material of oxide superconductor as an object material is irradiated with active oxygen species. The irradiation process is carried out while keeping the object material at a temperature at which the object material is effectively oxidized with the active oxygen species. The active oxygen species are formed on the inside or in the peripheral portion of a nonequilibrium or equilibrium, high-temperature plasma.
    Type: Grant
    Filed: March 9, 1992
    Date of Patent: December 27, 1994
    Assignee: Anelva Corporation
    Inventors: Atsushi Sekiguchi, Hideo Mito
  • Patent number: 5376400
    Abstract: A method for modifying the surface of a material by:a. exposing the surface to a glow discharge plasma to activate the surface;b. exposing the surface to an ethylenically unsaturated monomer or mixture of monomers; andc. irradiating the activated surface with gamma radiation or electron beam radiation in the presence of the ethylenically unsaturated monomer to form a graft polymerized coating thereon.
    Type: Grant
    Filed: January 13, 1993
    Date of Patent: December 27, 1994
    Assignee: University of Florida Research Foundation, Inc.
    Inventors: Eugene P. Goldberg, Ali Yahiaoui, James Burns
  • Patent number: 5348632
    Abstract: In order to increase at least the adherence of lacquer on a workpiece surface consisting of at least substantially one synthetic, organic polymer, which workpiece is plasma treated in an environment of reactive gas, the treatment duration is selected at least close to an adherence maximum in a lacquer adherence-/treatment duration diagram and/or the gas pressure at least close to an adherence maximum in a lacquer adherence-/gas pressure diagram.
    Type: Grant
    Filed: December 2, 1992
    Date of Patent: September 20, 1994
    Assignee: Balzers Aktiengesellschaft
    Inventor: Stephan Jost
  • Patent number: 5340451
    Abstract: A process is disclosed for producing a metal-organic polymer combination by contacting the polymer with a plasma followed by an aqueous solution of a metal salt. In one embodiment a water or nitrous oxide plasma is used to treat a polyimide or a fluorinated polymer. The polymer is combined with a metal cation, the metal being a catalyst for a conventional electroless coating after which it is contacted with an electroless metal plating bath for the formation of electrical circuits and especially for plating high aspect ratio vias in microcircuits. Unlike the conventional electroless process, the cationic catalytic metal is not reduced to a zero valent metal catalyst prior to the application of the electroless metal coating solution.The process also improves the wettability of the polymer, especially the fluorinated polymer and is especially useful in improving the wettability of high aspect ratio vias.
    Type: Grant
    Filed: May 13, 1993
    Date of Patent: August 23, 1994
    Assignee: International Business Machines Corporation
    Inventors: Leena P. Buchwalter, Stephen L. Buchwalter, Charles R. Davis, Ronald D. Goldblatt, John E. Heidenreich, III, Sharon L. Nunes, Jae M. Park, Richard R. Thomas, Domenico Tortorella, Luis M. Ferreiro, deceased
  • Patent number: 5338579
    Abstract: A method of manufacturing a chemically adsorbed film, which can efficiently provide a water and oil repelling and anti-contaminating ultra thin film with uniform thickness by spraying a solution comprising a chemical adsorbent on a substrate surface having active hydrogen groups in a dry atmosphere. A chemically adsorbed film can be formed by spraying a chlorosilane-based surface active agent on a substrate surface having active hydrogen groups such as hydroxyl, imino groups or the like. After forming a siloxane-based monomolecular layer or polysiloxane layer beforehand by spraying a chlorosilane compound or a solution comprising a chlorosilane compound on a substrate surface, a chemically adsorbed monomolecular or polymer layer can be formed by spraying a solution comprising a chlorosilane-based surface active agent. The film can be formed in a short time without being inhibited by the shapes and sizes of substrates.
    Type: Grant
    Filed: May 27, 1993
    Date of Patent: August 16, 1994
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Kazufumi Ogawa, Mamoru Soga, Shinji Ozaki, Shigeo Ikuta
  • Patent number: 5320875
    Abstract: A method of preparing a coated substrate is disclosed. The substrate is coated with a plasma generated polymer containing Si, Or C and H in specific atom ratio wherein the polymer also contains certain functional groups, A power density of about 10.sup.6 to about 10.sup.8 J/Kg is employed in the plasma polymerization process.
    Type: Grant
    Filed: August 27, 1993
    Date of Patent: June 14, 1994
    Assignee: The Dow Chemical Company
    Inventors: Ing-Feng Hu, James C. Tou
  • Patent number: 5295220
    Abstract: A process is disclosed for the production of an optical thin film waveguide of TiO.sub.2 with an attenuation of <5 dB/cm on a planar inorganic substrate wherein the thin film waveguide is produced by a microwave plasma CVD process (PCVD).
    Type: Grant
    Filed: November 16, 1992
    Date of Patent: March 15, 1994
    Assignee: Schott Glaswerke
    Inventors: Martin Heming, Roland Hochhaus, Jurgen Otto, Volker Paquet
  • Patent number: 5286532
    Abstract: Disclosed herein is a method for producing golf balls which comprises surface-treating a golf ball with atmospheric pressure plasma prior to finish coating. The resulting golf balls have a coating film which is in good adhesion to the golf ball and highly resistant to discoloration and deterioration by heat, moisture, and light. The surface treatment is by the atmospheric pressure plasma which does not need the treating apparatus to be evacuated. The surface treatment under atmospheric pressure requires only a simple treating apparatus and can be applied to any golf balls without evaporating volatile matters contained therein.
    Type: Grant
    Filed: August 19, 1992
    Date of Patent: February 15, 1994
    Assignees: Bridgestone Corporation, Satiko Okazaki, Masuhiro Kogoma
    Inventors: Masato Yoshikawa, Yukihiro Kusano, Kazuo Naito, Satiko Okazaki, Masuhiro Kogoma
  • Patent number: 5286531
    Abstract: The invention relates to a method for the aftertreatment of an oxide coating, and specifically an SiO.sub.x coating on a synthetic film. In this aftertreatment the oxide coating is exposed to a plasma whose particles effect positive changes of the oxide coating.
    Type: Grant
    Filed: August 3, 1992
    Date of Patent: February 15, 1994
    Assignees: Leybold Aktiengesellschaft, Toppan Printing Company, Ltd.
    Inventors: Thomas Krug, Klemens Ruebsam, Andreas Meier, Gerhard Steiniger, Mitsuru Kano, Noboru Sasaki, Takashi Miyamoto, Mamoru Sekiguchi
  • Patent number: 5283085
    Abstract: A method of manufacturing a hot-cathode element which consists of a rare-earth-oxide-doped refractory metal, notably thoriated tungsten, and which also contains carbon components, first a plurality of layers of the hot-cathode element being successively deposited on a substrate member (2) by means of a CVD process, after which notably the hot-cathode element is separated from the substrate member (2). The strength required for further working of the hot-cathode element is improved in that in the course of the CVD process decarburizing intermediate treatments are performed, the hot-cathode element being carburized during an aftertreatment.
    Type: Grant
    Filed: April 20, 1992
    Date of Patent: February 1, 1994
    Assignee: U.S. Philips Corporation
    Inventors: Georg Gartner, Peter Janiel
  • Patent number: 5270082
    Abstract: A process of organic vapor deposition for significantly improved corrosion protection of metal. The process involves deposition of a thin film by polymerization of certain precursors onto the surface of a metal phosphate treated metal substrate (15). A primer or topcoat is subseqently applied over the metal substrate.
    Type: Grant
    Filed: April 15, 1991
    Date of Patent: December 14, 1993
    Inventors: Tyau-Jeen Lin, Joseph A. Antonelli, Duck J. Yang, Hirotsugu Yasuda
  • Patent number: 5268208
    Abstract: A plasma enhanced chemical vapor deposition method is provided for depositing an oxide film onto a substrate surface. Deposition is achieved even onto a surface of a glass or other relatively non-receptive substrate. A sub-film is deposited under plasma enhanced chemical vapor deposition conditions more strongly favoring deposition, followed by deposition of the desired oxide film under second plasma enhanced chemical vapor deposition conditions less strongly favoring deposition. High quality oxide films can be achieved by deposition at second plasma enhanced chemical vapor deposition conditions only marginally favoring deposition over etching.
    Type: Grant
    Filed: July 1, 1991
    Date of Patent: December 7, 1993
    Assignee: Ford Motor Company
    Inventors: Annette J. Krisko, James W. Proscia
  • Patent number: 5254372
    Abstract: A method for plasma treatment of a predetermined portion of a substrate. The impedance of the coil and an established normal plasma is matched with the impedance of a power source, thereby maximizing the efficiency of the transfer of energy from the power source to the coil and producing a resonant plasma. The predetermined portion of the substrate is exposed to the resonant plasma for treatment. Additionally, a method for plasma treatment of a predetermined portion of the outside surface of a filament. The filament is trained through an inlet and exit of a plasma treatment chamber, through an inlet side tubular mask within the chamber, and through an exit side tubular mask within the chamber, each mask being adjustable within the chamber axially of the filament to expose a predetermined segment of the filament to plasma in the chamber while masking the remainder of the filament within the chamber from exposure to plasma.
    Type: Grant
    Filed: February 27, 1991
    Date of Patent: October 19, 1993
    Assignee: Nichols Technologies, Inc.
    Inventor: Michael F. Nichols
  • Patent number: 5246451
    Abstract: A vascular graft with improved endothelial cell adhesion can be achieved on a fluoropolymer surface of a vascular graft by treating the fluoropolymer with a plasma in the presence of a non-polymerizing gas capable of providing the fluoropolymer with anionic groups and binding a protein to the treated fluoropolymer. In a preferred embodiment, the fluoropolymer surface is a plasma deposited fluoropolymer. Also in a preferred embodiment, autologous endothelial cells are seeded onto the vascular graft prior to implantation of the vascular graft in the human body.
    Type: Grant
    Filed: April 30, 1991
    Date of Patent: September 21, 1993
    Assignee: Medtronic, Inc.
    Inventors: Paul V. Trescony, Patrick Cahalan, Kenneth Keeney
  • Patent number: 5232747
    Abstract: An improved method for making aluminum connections to platinum electrodes is described. The method utilizes an oxide layer to isolate the aluminum from the platinum. The oxide layer is created by ashing the surface of the platinum using an Oxygen plasma.
    Type: Grant
    Filed: July 27, 1992
    Date of Patent: August 3, 1993
    Assignee: Radiant Technologies
    Inventor: Joseph T. Evans, Jr.
  • Patent number: 5229163
    Abstract: A microtiter plate containing a plurality of reaction wells for conducting immunogenic reactions the bottom wall of the reaction well has an inner surface which is substantially hydrophilic, and the side wall of the reaction well has an inner surface which is substantially hydrophobic and a process for producing said trays.
    Type: Grant
    Filed: April 26, 1991
    Date of Patent: July 20, 1993
    Assignee: Hoffmann-La Roche Inc.
    Inventor: William A. Fox
  • Patent number: 5229172
    Abstract: A method for modifying the surface characteristics of a polymeric material by irradiating a surface of the polymeric material in the presence of an oxygen and then grafting acrylamide to the irradiated surface by contacting the irradiated surface with an aqueous solution including acrylamide monomer and ceric ion. Grafted polymer surfaces with dense surface coverage are produced without using a deaerated monomer solution. Biofunctional molecules can be ionically or covalently bonded to the grafted surface.
    Type: Grant
    Filed: January 19, 1993
    Date of Patent: July 20, 1993
    Assignee: Medtronic, Inc.
    Inventors: Patrick T. Cahalan, Michel Verhoeven
  • Patent number: 5169675
    Abstract: A process for adhering high nitrile resins onto a plastic material. The process comprises the steps of selecting a high nitrile resin having a nitrile content of at least about 60 percent by weight and prepared by the copolymerization of an olefinically unsaturated monovinyl nitrile and a monovinyl monomer copolymerizable therewith in the presence of a conjugated diene rubber, preparing a solution comprising from about one to 70 percent by weight of the high nitrile resin in a photopolymerizable solvent comprising from about 30 to 99 percent by weight of the solution and from about 0.
    Type: Grant
    Filed: January 25, 1989
    Date of Patent: December 8, 1992
    Assignee: The Standard Oil Company
    Inventors: Rosemary Bartoszek-Loza, George W. Prohaska, Joseph McCaul