Abstract: An apparatus for the application of coatings in a vacuum comprising a plasma duct surrounded by a magnetic deflecting system communicating with a first plasma source and a coating chamber in which a substrate holder is arranged off of an optical axis of the plasma source, has at least one deflecting electrode mounted on one or more walls of the plasma duct. In one embodiment an isolated repelling or repelling electrode is positioned in the plasma duct downstream of the deflecting electrode where the tangential component of a deflecting magnetic field is strongest, connected to the positive pole of a current source which allows the isolated electrode current to be varied independently and increased above the level of the anode current. The deflecting electrode may serve as a getter pump to improve pumping efficiency and divert metal ions from the plasma flow.

Abstract: In a power supply apparatus for discharge surface treatment which uses a green compact electrode as a discharge electrode, allows a pulse-type discharge to take place between said discharge electrode and a workpiece, and forms a film, which is made of an electrode material or a material obtained when the electrode material reacts to a discharge energy, on a surface of the workpiece following three measures are taken. (1) When a discharge voltage detected by the voltage detection means is less than or equal to discharge detection voltage set value which is slightly lower than a power supply voltage, the electric current cut-off means forcibly cuts off an output of the oscillator so that long-time pulse is prevented. (2) A capacitor is connected in parallel with an oscillation circuit of the oscillator, and the long-time pulse is prevented by capacitor discharge. (3) Time that the discharge takes place once is controlled by a timer so that the long-time pulse is prevented.

Abstract: A film deposition method, which can form a high quality functional thin film excellent in various physical properties on a surface such as a plastic substrate, is provided. A carbon precursor film is formed on the surface of the substrate K with carbon ions (N2A) using a processing source (4) (a FCVA ion source) with no voltage applied to the substrate K, and then carbon ions (N2B) are implanted in the carbon precursor film with a pulsed voltage containing a negative pulse voltage of −15 kV or less applied to the substrate K, in order to form the carbon thin film. The quality of the carbon precursor film is improved and the various physical properties of the carbon thin film can be controlled.

Abstract: The present invention provides UV curable coating powders comprising a blend of one or more than one free radical curable resin and one or more than one cationic curable resin, at least one free radical photoinitiator and at least one cationic photoinitiator, including suitable cross-linking agents and additives to enhance the chemical and physical properties of the coating appearance. The coating powder, preferably finely ground to between 5 and 30 microns in average particle size, is applied to a substrate, heat fused, and cured for an amount of time sufficient to form a powder coating having a low gloss finish.

Abstract: A hard film formed by an arc-discharge ion-plating method, having a composition comprising metal components represented by Alx,Cr1-x-ySiy, wherein x and y are respectively atomic ratios meeting 0.45≦x≦0.75, 0≦y≦0.35, and 0.5≦x+y<1, and non-metal components represented by N1-&agr;-&bgr;-&ggr;B&agr;C&bgr;O&ggr;, wherein &agr;,&bgr; and &ggr; are respectively atomic ratios meeting 0 ≦&agr;≦0.15, 0≦&bgr;≦0.35, and 0.003≦&ggr;≦0.25, the hard film having an NaCl-type crystal structure, with a half width of 2&thgr; at an X-ray diffraction peak corresponding to a (111) face or a (200) face being 0.5-2.0°, and the hard film containing oxygen more in grain boundaries than in crystal grains.

Abstract: According to an exemplary embodiment of the invention, a method of forming a plurality of layers on an article comprises steps of generating a plasma by forming an arc between a cathode and an anode; injecting a first material comprising an organic compound into the plasma to deposit a first layer on the article; injecting a second material comprising an organometallic material into the plasma to form a second layer on the first layer; and injecting a third material comprising a silicon containing organic compound into the plasma to deposit a third layer on the second layer. The invention also relates to an article of manufacture comprising a substrate; an interlayer disposed on the substrate; a second layer disposed on the interlayer, the second layer comprising an inorganic ultraviolet absorbing material; and a third layer disposed on the second layer, the third layer comprising an abrasion resistant material.

Abstract: A method and apparatus for locally raising the temperature of a material in order to facilitate chemical reactions or processes related to growth or removal of the material utilizes an electrode to apply, in the presence of a growth or removal medium, a controlled succession of thermal spikes or shockwaves of varying energy. The scale of the thermal spikes or shockwaves, and the area of the material affected by the resulting energy transfer, is on the order of a few nanometers to several hundred micrometers, and the duration of the thermal spikes or shockwaves ranges from a few picoseconds to several hundred nanoseconds. The growth or removal medium may be a cryogenic liquid, although other growth media, including liquids, solids, gases in critical or non-critical state, and mixtures of liquids and solids, solids and gases, and liquids and gases, may also be employed.

Abstract: A fuel cell and methods of producing same are provided. The fuel cell includes a fuel electrode, an oxygen electrode and a proton conductor material disposed there between. The fuel cell can be produced by producing an arc discharge across a pair of electrodes composed of carbon to form a carbonaceous material which can be deposited onto a proton conductor material to form at least one of the fuel and oxygen electrode thereon.

Abstract: Method for producing cutting tools provides a first hard material coating on a first region of a tool base body containing at least one cutting edge, using a plasma vacuum coating process. A second hard material coating is provided on a second region which is adjacent the first, also via plasma vacuum coating process. Hard material for the coatings is a carbide, oxide, oxicarbide, nitride, nitrocarbide, oxinitride or nitrooxicarbide of at least two of Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Al. The first coating has a content of at least two of the metal elements which is at most 2 at % different from the content of the two metal elements in the second coating if the tool is for higher adhesive strength than hardness. The first coating has a content of the two metal elements that is different from the content of the two metal elements of the second coating by more than 2 at % if the tool is for higher hardness than high adhesive strength.

Abstract: A method of manufacturing a coated workpiece utilizes a target made of an alloy which is substantially a one phase. Coating is achieved by cathodic arc evaporation of the target in an oxygen atmosphere.

Abstract: The invention relates to oriented webs of meso- and nanotubes (hollow fibers) wherein the tubes or hollow fibers have an internal diameter of 10 nm to 50 &mgr;m and are preferentially oriented in one direction and to a process for their production.

Abstract: A PVD method is proposed for coating substrates (10) in a vacuum chamber (20) with at least one anode (30), a cathode (40) and a magnetic field source (42). The cathode (40) can be controlled by the magnetic field source (42) in relation to the direction of the separated material. The method is based on the additional step of effectively turning the magnetic field source before the coating process so that the particles separated from the cathode (40) by the arc can impact on a chamber wall and thus cleaning processes can be carried out in the chamber and at the cathode. It is further proposed that the coating should be carried out successively in relation to the height by moving the magnetic field source (42) upwards and downwards, wherein the magnetic field source (42) is turned relative to the cathode (40) during the upward and downward movement and thus the deposition rate is varied in relation to the height.

Abstract: Methods and apparatus are provided for uniformly depositing a coating material from a vaporization source onto a powdered substrate material to form a thin coalescence film of the coating material that smoothly replicates the surface microstructure of the substrate material. The coating material is uniformly deposited on the substrate material to form optical interference pigment particles. The thin film enhances the hiding power and color gamut of the substrate material. Physical vapor deposition process are used for depositing the film on the substrate material. The apparatus and systems employed in forming the coated particles utilize vibrating bed coaters, vibrating conveyor coaters, or coating towers. These allow the powdered substrate material to be uniformly exposed to the coating material vapor during the coating process.

Abstract: A layer formation method is disclosed which comprises supplying gas to a discharge space, exciting the supplied gas at atmospheric pressure or at approximately atmospheric pressure by applying a high frequency electric field across the discharge space, and exposing a substrate to the excited gas, wherein the high frequency electric field is an electric field in which a first high frequency electric field and a second high frequency electric field are superposed, frequency &ohgr;2 of the second high frequency electric field is higher than frequency &ohgr;1 of the first high frequency electric field, strength V1 of the first high frequency electric field, strength V2 of the second high frequency electric field and strength IV of discharge starting electric field satisfy relationship V1≧IV>V2 or V1>IV≧V2, and power density of the second high frequency electric field is not less than 1 W/cm2.

Abstract: A particle film deposition apparatus and method are provided, with which ultra fine particles are generated by arc heating. The generated ultra fine particles can be efficiently sucked up into a transfer tube regardless of an arc voltage, and the resulting film can be stable in shape. An evaporation material 8 to be evaporated by arc heating and to generate ultra fine particles is connected to an electrode. As other electrodes, a plurality of rods 17 each having a discharge section at the tip thereof are provided. These rods 17 are so arranged as to be directed in each different direction with respect to the evaporation material 8.

Abstract: Methods for coating the interior surface of tubular structures having high aspect ratios and to tubular structures produced by such methods

Abstract: A method for depositing a coating onto a solid substrate for the fabrication of a functional layer in a solar cell device wherein the functional layer is used as an anti-reflection layer, an active layer for photon absorption and charge generation, a buffer layer, a window layer, or an electrode layer.

Abstract: A nickel-base superalloy article has a surface protective layer comprising nickel, from about 20 to about 35 weight percent aluminum, and from about 0.5 to about 10 weight percent rhenium. The protective layer, which is preferably an overlay coating of the beta (&bgr;) phase NiAl form, is formed by depositing nickel, aluminum, rhenium, and modifying elements onto the substrate surface. A ceramic layer may be deposited overlying the protective layer.

Abstract: Methods and apparatus are provided for uniformly depositing a coating material from a vaporization source onto a powdered substrate material to form a thin coalescence film of the coating material that smoothly replicates the surface microstructure of the substrate material. The coating material is uniformly deposited on the substrate material to form optical interference pigment particles. The thin film enhances the hiding power and color gamut of the substrate material. Physical vapor deposition process are used for depositing the film on the substrate material. The apparatus and systems employed in forming the coated particles utilize vibrating bed coaters, vibrating conveyor coaters, or coating towers. These allow the powdered substrate material to be uniformly exposed to the coating material vapor during the coating process.

Abstract: A method of forming a thin polycrystalline silicon film and a thin film forming apparatus allowing inexpensive formation of a thin polycrystalline silicon film at a relatively low temperature with high productivity. More specifically, a method of forming a thin polycrystalline silicon film and a thin film forming apparatus in which a state of plasma is controlled to achieve an emission intensity ratio of hydrogen atom radicals (H&bgr;) of one or more to the emission intensity of SiH* radicals in the plasma.

Abstract: In a method for manufacturing an Al clad product, first, cladding material is fused and coated on base material having Al. Then, slurry material is coated on the cladding material coated on the base material, the slurry material including mixture of a flux powder, a resin binder powder and a diluent. Thereafter, the slurry material is hardened to thereby provide a hardened product including the base material, the cladding material and hardened slurry material. In a subsequent step, the hardened product is brazed to thereby provide an Al clad product, wherein the diluent included in the slurry material is gasified in the hardening process of the slurry material and the cladding material is fused by employing an arc discharge technique.

Abstract: In a device for forming magnetic film which deposits magnetic material on a substrate 12, a device is provided which, before the magnetic film is formed in a magnetic film-forming chamber 11, cleans one or both of the film-forming face and reverse face of the substrate 12 in a cleaning processing chamber 13. The cleaning mechanism carries out cleaning by placing a substrate on a horseshoe-shaped insulator substrate-holding part 51 which moves up and down, and emission of gas from the reverse face of the substrate and the like is brought about by generating Ar plasma between the upper periphery of the substrate, the substrate and a lower insulator 61 of the substrate.

Abstract: A method of modifying a surface of an ophthalmic lens, includes the steps of: generating plasma at an atmospheric pressure between electrodes of a plasma generating device; and blowing the plasma from the plasma generating device by introducing a gas between the electrodes. The ophthalmic lens, which is located outside the plasma generating device, is irradiated with the plasma blown out from the plasma generating device to modify the surface of the ophthalmic lens to form a final ophthalmic lens product.

Abstract: The invention concerns a method of providing a coating having a predetermined hardness on a substrate comprising the steps of

Abstract: A discharge surface treatment method with which discharge is caused to occur between an electrode and a workpiece to generate energy to form a coating on a surface of the workpiece, and method therefore. An electrode is made by combining a hard material, such as WC, and a soft material, such as Co. The hard and soft materials are mixed and compressed into a green compact. The green compact is baked in a vacuum furnace at a temperature which is below the sintering temperature but high enough to melt the soft material. The melted soft material fills the gaps between the particles of the hard material, resulting in an electrode having a texture similar to chalk called incomplete-sintering. The electrode is then used in discharge surface treatment.

Abstract: A method for depositing a coating onto a solid substrate for the fabrication of a functional layer in a solar cell device wherein the functional layer is used as an anti-reflection layer, an active layer for photon absorption and charge generation, a buffer layer, a window layer, or an electrode layer.

Abstract: A method for producing a nano-porous coating onto a solid substrate from a precursor material selected from the group consisting of a metal, metal alloy, metal compound, and ceramic material.

Abstract: In one embodiment, the present invention is a method of coating at least one wafer with silicon nitride. The first step in the method is assembling at least one electrode set, wherein each electrode set includes at least one dielectric barrier between a top electrode and a bottom electrode. The second step is flowing at least one purge gas and at least one reactant at least partially between the electrodes, of at least one electrode set, substantially at atmospheric pressure. The next step in the inventive method is placing a wafer between the electrodes of at least one electrode set, wherein the wafer is substantially encompassed by the flowing gas. The last step in this embodiment of the inventive method is supplying AC power to at least one electrode set thereby causing a dielectric barrier discharge.

Abstract: To prevent the film forming characteristic deterioration by a magnetic field of a magnetic filter to thereby make vacuum arc vapor deposition uniform, in the invention, plurality of magnets includes a terminal magnet closest to a plasma injection hole located at the other end of duct and specified magnets. The terminal magnet located closest to plasma injection hole may be set to incline to a plasma injection plane of the plasma injection hole. Further, at lease one of specified magnets may be inclined to the plasma injection plane. Further more, at least one of magnetic field generating coils may be formed with a plurality of electromagnetic coils, which are inclined at different angles with respect to a cross section of the duct. One of electromagnetic coils may be selectively energized by current on a basis of setting and controlling of deflection magnetic field generated by the magnetic filter.

Abstract: The present invention relates to a heat transfer surface comprising a layer of carbon, to a heating element or condenser comprising said heat transfer surface, to a method of applying said heat transfer surface, and to a method for carrying out dropwise condensation employing said heat transfer surface. The carbon layer employed in the present invention is tetrahedral amorphous carbon and/or diamond-like carbon. In addition, the carbon layer may be a composite (eg. an alloy) of the above carbon sources with another component such as nickel, chromium or Teflon®. The heat transfer surface of the present invention permits dropwise condensation rather than film wise condensation to proceed. The surface also exhibits improved resistance to fouling such as scale build-up caused by hard water. The heat transfer surface of the present invention has particular application in kettles, washing machines, dishwashers and condensers.

Abstract: System and method for oxidizing contaminants to alter specific properties, such as tack, of contaminants. The present invention reduces the tack of the stickies and pitch by exposing the materials for a short duration to low-energy pulsed electrical discharges between a pair of electrodes that are submerged in a liquid medium, such as a fiber stream, water, a pulp slurry, or whitewater. An electrical discharge in the liquid medium oxidizes materials, which may be dissolved or suspended therein, such as stickies, pitch, sulfide, ink, toner, and other substances, thereby reducing tack, odor, and/or zeta potential, as well as producing other desirable effect.

Abstract: A method for making a magnetic disk comprises forming first and second protective carbon layers on a magnetic layer. The first protective carbon layer is predominantly SP3 carbon. The second protective carbon layer comprises about 50% or less SP3 carbon. The second protective carbon layer is very thin, e.g. between 0.1 and 1.0 nm thick. A lubricant layer (e.g. a perfluoropolyether lubricant) is applied to the second protective carbon layer. The second protective carbon layer facilitates improved cooperation between lubricant and the disk.

Abstract: A method for treating cellulosic fibres, according to which the fibre is submitted to an electrical discharge, in presence of a treatment gaseous mixture comprising a carrier gas, as well as a reducing gas and/or an oxidizing gas, at the atmospheric pressure, characterized in that:

Abstract: A system for applying a polyurethane coating to a polyolefin floor tile, comprising a conveyor for moving the floor tile past a plurality of treatment devices, including a heater, a plasma generator, an applicator, and an ultraviolet light system. The heater and plasma generator increase the energy of the top surface of the floor tile, and the applicator applies a liquid polyurethane to the top surface while in the energized state. The ultraviolet light system then exposes the polyurethane to ultraviolet light to at least partially cure it.

Abstract: Boron powders are sintered and densified utilizing a microwave environment for so doing.

Abstract: The invention relates to a device and method for coating substrates in a vacuum, wherein a plasma is to be generated from a target and ionized particles of the plasma are to be deposited on the substrate in the form of a layer, as has long been used in a very wide range of known PVD processes. The intention of the invention is to prevent droplets and particles from settling in the applied layer, which droplets and particles have an adverse effect on the properties of the layer, or at least to reduce the number of these droplets and particles. To solve this problem, an absorber electrode which is at an electrically positive potential is used, which electrode is a few mm away from the root of the plasma, and is arranged in front of or next to the plasma in such a way and is shaped in such a way that an electric field is formed around the absorber electrode. The electric field vector is to be oriented at least approximately orthogonally to the direction of movement of the ionized particles of the plasma.

Abstract: Methods and apparatus are provided for uniformly depositing a coating material from a vaporization source onto a powdered substrate material to form a thin coalescence film of the coating material that smoothly replicates the surface microstructure of the substrate material. The coating material is uniformly deposited on the substrate material to form optical interference pigment particles. The thin film enhances the hiding power and color gamut of the substrate material. Physical vapor deposition processes are used for depositing the film on the substrate material. The apparatus and systems employed in forming the coated particles utilize vibrating bed coaters, vibrating conveyor coaters, or coating towers. These allow the powdered substrate material to be uniformly exposed to the coating material vapor during the coating process.

Abstract: A system and method for altering the tack of a material, namely a polymer used as an adhesive, also known as stickies, or pitch. The present invention reduces the tack of the stickies and pitch by exposing the materials for a short duration to low-energy pulsed electrical discharges between a pair of electrodes that are submerged in a liquid medium, such as a fiber stream, water, a pulp slurry, or whitewater.

Abstract: A Z axis driving device (21) is controlled to be driven by a control device (23), and the processing power is supplied between the electrodes of a discharge surface processing electrode (14) and a punch (1). Thus, electric discharge is occurred between the end surface (4) of the punch (1) and the discharge surface processing electrode (14) to thereby form a hard coating film (24) on the end surface (4) of the punch (1) and also form a carved portion (14a) with a predetermined depth at the discharge surface processing electrode (14). Next, an X axis driving device (19) and a Y axis driving device (20) are controlled to be driven by the control device (23), and the processing power is supplied between the electrodes of the discharge surface processing electrode (14) and the punch (1) while relatively orbiting the punch (1) and the discharge surface processing electrode (14) within the horizontal plane. Thus, a hard coating film (25) is formed on the side surfaces (5) of the punch (1).

Abstract: An ultraviolet radiation absorbing layer formed over a polymeric substrate is disclosed herein. The layer is a doped metal oxide coating. The layer exhibits excellent weatherability and UV absorbing properties. The layer is preferably deposited by arc plasma deposition or by sputtering.

Abstract: A surface treatment method that increases the wear resistance of contact portions of levers of a diaphragm spring in a clutch cover assembly and of a plate member that slides there-against is provided. The surface treatment method is applied to the contact portions of the diaphragm spring of the clutch cover assembly and to the plate member that slides there-against. In this method, the contact portion of the diaphragm spring and the sliding portion of the plate member are designated as treatment surfaces. The treatment surfaces are subjected to an electric discharge coating using a coating material such that the treatment surface is covered with a coating layer of approximately 50 &mgr;m or less and a diffusion layer is formed inside the treatment surface.

Abstract: A cathode arc source for depositing a coating on a substrate has an anode and a cathode station for a target, a first filter means comprising a filter duct having at least one bend, and first magnetic means for steering plasma through the filter duct for removal of macroparticles from the plasma. The apparatus comprises a second filter for further removal of macroparticles from the plasma, made up of a baffle, an aperture through which plasma can pass and second magnetic means for steering plasma through the aperture. The source can also include an ion beam generator. Also described is a method of depositing coatings of ions using the second filter and closing the aperture in the filter when required.

Abstract: When performing film deposition on the surface of a wafer, a turntable supporting the wafer is first rotated. Next, a fluid containing an organic metal is applied onto the wafer via the tip of a nozzle. At the same time, an ultrasound wave is generated by an ultrasound wave generating device, and the turntable is vibrated. Thus the vibrations from the turntable are applied to the wafer, these wafer vibrations allow the fluid containing an organic metal to thoroughly permeate into the detailed patterning of the wafer surface, and said fluid covers its entirety. As a result, film deposition with excellent filling-in characteristics becomes possible.

Abstract: In the discharge surface treatment method, an electrode having a cylindrical shape and a work are aligned face to face with a predetermined gap therebetween in a machining fluid. The electrode is a green compact electrode formed by compressing metal powder or powder of a metal compound or ceramics powder, or a metal electrode. A hard coat film of the material with which the electrode is made or a reactant of this material is formed on a surface of the work because of the energy generated during the electric discharge.

Abstract: A process for increasing the lubrication of ductile-iron lubricated contacts includes abrasive-blasting and plasma etching a ductile-iron component prior to coating. A wear resistant or low friction coating is then formed on the iron substrate and the resulting coated component has greater lubrication than a corresponding non-blasted and non-coated component.

Abstract: A method for manufacturing a resin thin film of the present invention includes supplying a liquid resin material and a gas to a two-fluid nozzle by pressure; ejecting the resin material in the form of atomized particles toward a heating member by the two-fluid nozzle, thereby adhering the resin material to the heating member; or mixing a liquid resin material with a gas; ejecting the resin material in form of atomized particles toward a heating member that is provided under reduced pressure, thereby adhering the resin material to the heating member; and evaporating the resin material on the heating member to obtain the evaporated resin material. Thus, the present invention can provide a resin thin film having a uniform thickness stably with simple means at a low cost. The resin thin film obtained by the present invention can be used in a wide range, for example a magnetic recording medium such as a magnetic tape, a wrapping material, and an electronic component.

Abstract: The present invention provides a method for manufacturing a magnetic recording medium comprising the steps of forming a carbon protective film onto a disc, the non-magnetic substrate of which is layered with a non-magnetic base film and magnetic film, using a reactant gas containing carbon atoms as a starting material, according to a plasma CVD method, wherein a mixed gas of hydrocarbon and hydrogen, in which the mixing ratio of hydrocarbon to hydrogen is in the range of 2 to 1˜1 to 100 by volume, is used as a reactant gas, during bias applying to said disc. In addition, the present invention provides a magnetic recording medium comprising a carbon protective film formed onto a disc, the non-magnetic substrate of which is layered with a non-magnetic base film and magnetic film, wherein said carbon protective film is formed according to a plasma CVD method, while applying bias.

Abstract: A method for producing a nano-porous coating onto a substrate, including the steps of: (a) operating a twin-wire arc nozzle to heat and at least partially vaporize two wires of a metal for providing a stream of nanometer-sized vapor clusters of the metal into a chamber in which the substrate is disposed; (b) injecting a stream of reactive gas into the chamber to impinge upon the stream of metal vapor clusters and exothermically react therewith to produce substantially nanometer-sized metal compound or ceramic clusters; (c) operating heat treatment devices to heat treat the metal compound or ceramic clusters so that a non-zero proportion of the clusters is in a solid state when impinging upon the substrate; and (d) directing the metal compound or ceramic clusters to impinge and deposit onto the substrate for forming the nano-porous coating.

Abstract: A method of forming a thin polycrystalline silicon film and a thin film forming apparatus allowing inexpensive formation of a thin polycrystalline silicon film at a relatively low temperature with high productivity. More specifically, a method of forming a thin polycrystalline silicon film and a thin film forming apparatus in which a state of plasma is controlled to achieve an emission intensity ratio of hydrogen atom radicals (H&bgr;) of one or more to the emission intensity of SiH* radicals in the plasma.

Abstract: A process for producing antiadhesive layers on a web-form material, characterized in that the antiadhesive layers are applied to the web-form material by means of low pressure plasma polymerization by guiding the web-form material continuously through a plasma zone containing a low pressure plasma.