Abstract: Hardmask compositions having antireflective properties useful in lithographic processes, methods of using the same, and semiconductor devices fabricated by such methods, are provided.

Abstract: A polymer which has siloxane group at a main chain thereof and a composition including the same, for forming an organic anti-reflective coating layer are disclosed. The polymer for forming an organic anti-reflective coating layer is represented by following Formula. In Formula, R is hydrogen atom, C1˜C20 alkyl group, C1˜C10 alcohol group or epoxy group, R1 is independently hydrogen atom, n is an integer of 1-50, R2 is C1˜C20 alkyl group, C3˜C20 cycloalkyl group, C6˜C20 aryl group or C7˜C12 arylalkyl group, R3 is hydrogen atom, C1˜C10 alcohol group or epoxy group and POSS is a polyhedral oligosilsesquioxane.

Abstract: The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent, and optionally, a photoacid generator and/or an acid and/or a thermal acid generator. The invention further relates to a process for using such a composition.

Abstract: The invention relates to an antireflective coating composition capable of being coated beneath a photoresist layer, where the antireflective coating composition comprises a polymeric crosslinker and a solvent mixture, where the solvent mixture comprises at least one primary organic solvent and at least one secondary organic solvent selected from any of structures 1, 2 and 3, where, R1, R3, and R4, are selected from H and C1-C6 alkyl, and R2, R5, R6, R7, R8, and R9 are selected from C1-C6 alkyl, and n=1-5. The invention also relates to an antireflective coating composition capable of being coated beneath a photoresist layer, where the antireflective coating composition comprises a polymeric crosslinker and a solvent mixture, where the solvent mixture comprises at least 2 organic solvents, and where the antireflective coating composition has a liquid particle count at 0.2 micron of less than 100/ml after accelerated aging.

Abstract: Positive-working imageable elements comprise a radiation absorbing compound and inner and outer layers on a substrate having a hydrophilic surface. The inner layer comprises a specific polymeric binder represented by Structure (I): -(A)w-(B)x-(C)y-(D)z-??(I) wherein A represents recurring units derived from one or more N-alkoxymethyl (alkyl)acrylamides or alkoxymethyl (alkyl)acrylates, B represents recurring units derived from one or more ethylenically unsaturated polymerizable monomers having a pendant cyano group, C represents recurring units derived from one or more ethylenically unsaturated polymerizable monomers having one or more carboxy, sulfonic acid, or phosphate groups, D represents recurring units derived from one or more ethylenically unsaturated polymerizable monomers other than those represented by A, B, and C, w is from about 3 to about 80 weight %, x is from about 10 to about 85 weight %, y is from about 2 to about 80 weight %, and z is from about 10 to about 85 weight %.

Abstract: A lithographic printing plate precursor includes: a support; and a photosensitive layer containing (A) an initiator compound, (B) a polymerizable compound and (C) a binder, wherein the photosensitive layer or other layer in contact with the support contains as (D) a component different from the component (C), a copolymer containing (a1) a repeating unit having at least one ethylenically unsaturated bond introduced through an ion pair and (a2) a repeating unit having at least one functional group capable of interacting with a surface of the support.

Abstract: An antireflective coating that contains at least two polymer components and comprises chromophore moieties and transparent moieties is provided. The antireflective coating is useful for providing a single-layer composite graded antireflective coating formed beneath a photoresist layer.

Abstract: To provide a coating-type underlayer coating forming composition containing a naphthalene resin derivative. A coating-type underlayer coating forming composition for lithography comprising a compound of formula (1): wherein A is an organic group having an aromatic group, R1 is hydroxy group, an alkyl group, an alkoxy group, a halogen group, a thiol group, an amino group or an amide group, m1 is the number of A substituted on the naphthalene ring and is an integer of 1 to 6, m2 is the number of R1 substituted on the naphthalene ring and is an integer of 0 to 5, a sum of m1 and m2 (m1+m2) is an integer of 1 to 6, in cases where the sum is an integer other than 6, the reminder is hydrogen atom, and n is the number of repeating units ranging from 2 to 7000.

Abstract: A laser patterning apparatus for handling a donor film and improving compression uniformity between the donor film and an acceptor substrate is provided. The laser patterning apparatus includes: a stage that supports an acceptor substrate; a shielding mask that is placed on the acceptor substrate to form a pattern and is attached to a donor film on one surface thereof; a laser gun that is disposed at an upper part of the stage to radiate laser light to a portion of the donor film through the pattern of the shielding mask; a pressing member that corresponds to a portion of the shielding mask; and an actuator that is connected to one side of the pressing member to press the pressing member.

Abstract: A method for preparing a lithographic printing plate comprising: exposing a lithographic printing plate precursor comprising a hydrophilic support, a photosensitive layer containing (A) a sensitizing dye having an absorption maximum in a wavelength range of from 350 to 450 nm represented by the formula (I) or (II) as defined herein, (B) a polymerization initiator, (C) a polymerizable compound and (D) a hydrophobic binder polymer having an acid value of 0.3 meq/g or less and a protective layer provided in this order with a laser beam of from 350 to 450 nm; and rubbing a surface of the exposed lithographic printing plate precursor with a rubbing member in a presence of a developer having pH of from 2 to 10 in an automatic processor equipped with the rubbing member to remove the protective layer and an unexposed area of the photosensitive layer.

Abstract: A composition suitable for use as a planarizing underlayer in a multilayer lithographic process is disclosed. The inventive composition comprises a polymer containing heterocyclic aromatic moieties. In another aspect, the composition further comprises an acid generator. In yet another aspect, the composition further comprises a crosslinker. The inventive compositions provide planarizing underlayers having outstanding optical, mechanical and etch selectivity properties. The present invention also encompasses lithographic structures containing the underlayers prepared from the compositions of the present invention, methods of making such lithographic structures, and methods of using such lithographic structures to pattern underlying material layers on a substrate.

Abstract: A lithographic printing plate precursor includes in the following order: a support; an image-recording layer containing (A) an infrared absorbing agent, (B) a polymerization initiator and (C) a polymerizable compound; and a protective layer, an unexposed area of the image-recording layer is capable of being removed with at least one of printing ink and dampening water on a printing machine, and the lithographic printing plate precursor contains a compound represented by the following formula (I): wherein R1 represents an alkyl, alkenyl or aryl group having from 6 to 36 carbon atoms which may have a substituent, R2 and R3 each independently represents a methyl group, an ethyl group, a hydroxyethyl group or a hydroxypropyl group, L represents a single bond or a divalent connecting group, and n represents an integer of from 0 to 11.

Abstract: There is provided an anti-reflective coating forming composition for lithography comprising a reaction product obtained by reacting a sulfur-containing compound having thiourea structure with a nitrogen-containing compound having two or more nitrogen atoms substituted with a hydroxymethyl group or an alkoxymethyl group in the presence of an acid catalyst and a solvent. The anti-reflective coating obtained from the composition has a high preventive effect for reflected light, causes no intermixing with photoresists, has a higher dry etching rate compared with photoresists and can use in lithography process for manufacturing semiconductor device.

Abstract: An object of the present invention is to provide a lead-free bismuth glass wherein decrease of the degree of accuracy of the patterning is prevented. Specifically, the present invention provides a lead-free bismuth glass characterized in that said lead-free bismuth glass is used for an optical patterning glass material which is patterned by light irradiation and the optical-absorption coefficient to light with a wavelength of 365 nm is 300 to 3000 cm?1.

Abstract: There is provided an underlayer coating forming composition for lithography that is used in lithography process of manufacture of semiconductor device; and an underlayer coating having a high dry etching rate compared with photoresist. Concretely, it is a composition for forming an underlayer without use of crosslinking reaction by an strong acid catalyst, and an underlayer coating forming composition containing a component having an epoxy group (a polymer, a compound) and a component having a phenolic hydroxyl group, a carboxyl group, a protected carboxyl group or an acid anhydride structure (a polymer, a compound).

Abstract: There is provided an anti-reflective coating forming composition comprising a polymer having a pyrimidinetrione structure, imidazolidinedione structure, imidazolidinetrione structure or triazinetrione structure and a solvent. The anti-reflective coating obtained from the composition has a high preventive effect for reflected light, causes no intermixing with photoresists, and can use in lithography process by use of a light having a short wavelength such as ArF excimer laser beam (wavelength 193 nm) or F2 excimer laser beam (wavelength 157 nm), etc.

Abstract: A lithographic printing plate precursor includes an image-recording layer and a support, and the image-recording layer contains: (A) at least one compound selected from compounds represented by the following formulae (1) and (2); and (B) an infrared absorbing agent: wherein R1 and R2 each represents Ra—SO3—, Ra—CO2— or Ra—OCO2—, Ra represents a monovalent organic group, R3 to R12 each represents a hydrogen atom or a monovalent substituent, or adjacent two of R3 to R12 may be combined with each other to form a ring, X1, Y1 and Z1 and X2, Y2 and Z2 each represents an atomic group necessary to form a thiazole ring, an oxazole ring, an imidazole ring, a triazole ring or a 3H-indole ring, provided that one nitrogen atom of the imidazole ring is connected to a hydrogen atom or a monovalent organic group.

Abstract: Negative-working imageable elements that can be imaged using infrared radiation comprise an imageable layer and a protective overcoat on a hydrophilic substrate. The imageable layer includes an IR-sensitive cyanine dye. The protective overcoat predominantly comprises one or more poly(vinyl alcohol) resins, each of which has a hydrolysis level of 85% or less. The use of this particular overcoat composition used in combination with the IR-sensitive cyanine dye provides improved tolerance to fogging by white light while maintaining desired imaging speed.

Abstract: Negative-working imageable element can be used to prepared lithographic printing plates. These elements include a water-soluble contrast dye having a ?max in the range of from about 450 to about 750 nm and having an absorption that is lower than 10% with respect to the absorption of the radiation sensitive compound in the element at the wavelength used for exposure. The contrast dye is present in sufficient H-aggregation such that less than 40% of the entire absorption spectrum from the contrast dye is contributed by it in non-H-aggregated form.

Abstract: Antihalation compositions and methods for reducing the reflection of exposure radiation of a photoresist overcoated said compositions. The antihalation compositions of the invention comprise a resin binder and material capable of causing a thermally induced crosslinking reaction of the resin binder.

Abstract: A polymer for crosslinking an anti-reflective film has a high refractive index. An anti-reflective composition containing the polymer for crosslinking is useful in an immersion lithography process using ArF (193 nm) of a semiconductor device manufacturing process.

Abstract: A negative-working photopolymerization type photosensitive lithographic printing plate precursor capable of conducting image recording with laser, includes: a hydrophilic support; a photopolymerizable photosensitive layer containing (i) a sensitizing dye having an absorption maximum in a wavelength range of from 360 to 450 nm, (ii) a hexaarylbiimidazole compound and (iii) an addition polymerizable compound having an ethylenically unsaturated double bond; and a protective layer, in this order, wherein the protective layer has oxygen permeability at 25° C. under one atmosphere of from 25 ml/m2·day to 200 ml/m2·day.

Abstract: In immersion lithography, to avoid internal reflections in the final element of the projection system, immersion fluid and topcoat, the thicknesses, dl, dtc, and dr, and refractive indices, nl, ntc and nr, of the immersion fluid, topcoat and resist may meet the following criteria: nl?ntc?nr dl>˜5.? dtc?˜5.?.

Abstract: The present invention discloses novel bottom anti-reflective coating compositions where a coating from the composition has an etch rate that can be regulated by the etch plate temperature.

Abstract: A polymer for crosslinking an anti-reflective film has a high refractive index. An anti-reflective composition containing the polymer is useful in a damascene process and an immersion lithography process using ArF (193 nm) of a semiconductor device manufacturing process.

Abstract: The present invention provides a slip sheet that protects a planographic printing plate in which the coefficient of static friction between corresponding surfaces of the slip sheet that contact an image-forming surface of the planographic printing plate is 0.35 or less, the surface strength of the slip sheet is 15 or more, or the Clark stiffness of the slip sheet is 20 to 50. In a production process of the planographic printing plate, the image-forming surface and the slip sheet are adhered by suitably charging, and following their lamination, the charge rapidly dissipates resulting in favorable separation, discharge characteristics and storage characteristics in an automatic plate feeder. In addition, sticking between the slip sheet and the image-forming surface during heat treatment can also be prevented simultaneously. This slip sheet is particularly effective for planographic printing plates of the heat mode type and photon mode type on which images are formed by exposure to laser light.

Abstract: The present invention provides a photosensitive flexographic printing original plate provided with a heat sensitive mask layer having high light blocking effect and durability yet prepared as a thin film. A photosensitive flexographic printing original plate including at least (A) a supporting member, (B) a photosensitive resin layer, (C) a protective layer and (D) a heat sensitive mask layer that are successively laminated, wherein the heat sensitive mask layer (D) contains carbon black and, as a dispersion binder therefor, a butyral resin as well as polyamide containing polar group selected from the group consisting of polyamide containing a tertiary amine group, polyamide containing a quaternary ammonium salt group, polyamide containing an ether group and polyamide containing a sulfonic group.

Abstract: A method for producing a lithographic printing plate is provided, wherein, in the non-alkaline development of a lithographic printing plate precursor having a protective layer, even if the protective layer components are mingled into the developer, the reduction in development removability of the image recording layer and the generation of development scum can be inhibited; an on-press development type lithographic printing plate precursor with excellent inking property, high scratch resistance, satisfied on-press developability and good fine line reproducibility is provided; and a lithographic printing method is provided, each of which is a method for producing a lithographic printing plate, comprising: imagewise exposing a lithographic printing plate precursor comprising a support, an image recording layer and a protective layer, and rubbing the plate surface by a rubbing member of an automatic processor in the presence of a developer at a pH of 2 to 10 to remove the protective layer and the image recording

Abstract: There is disclosed a bottom resist layer composition for a multilayer-resist film used in lithography comprising, at least, a polymer comprising a repeating unit represented by the following general formula (1). Thereby, there can be provided a bottom resist layer composition that exhibits optimum n value and k value on exposure to shorter wavelengths, excellent etching resistance under conditions for etching substrates, and is promising for forming a bottom resist layer used for a multilayer-resist process such as a silicon-containing bilayer resist process or a trilayer resist process using a silicon-containing intermediate resist layer.

Abstract: Disclosed is a photosensitive resin composition showing excellent contrast performance after exposure to light. Also disclosed is a photosensitive resin laminate using the composition. The photosensitive resin composition comprises (a) 20 to 90% by mass of a binder having a carboxyl group, (b) 5 to 75% by mass of an addition-polymerizable monomer having at least one ethylenically unsaturated terminal group, (c) 0.01 to 30% by mass of a photopolymerization initiator, and (d) 0.01 to 10% by mass of a leuco dye, wherein a specific binder is contained as the binder (a) and a specific monomer is contained as the addition-polymerizable monomer (b).

Abstract: A resist transfer pad and method of use are described for forming a uniform photoresist on the surface of a workpiece such as a slider. The resist transfer pad includes a layer of cured polydimethylsiloxane (PDMS) on a cushioning layer, e.g. silicone rubber, and an optional stiffening layer. The sliders are preferably mounted on a carrier or pallet. In one preferred embodiment the loaded resist transfer pads are applied to the slider surface by roll lamination where the loaded resist transfer pad is transported by a roller system using a cover-tape and pressed against the slider surface. Subsequently the cover-tape and the resist transfer pad are lifted off and the photoresist remains on the transducer. An alternative embodiment uses a vacuum, piston laminator to press the loaded resist transfer pad onto the surface of the transducer.

Abstract: A composition for the organic hard mask includes a polyamic acid compound, and a method for forming a pattern is used in a manufacturing process of semiconductor devices by coating the composition for organic hard mask film on an underlying layer, and depositing a second hard mask film with a silicon nitride SiON film thereon to form a double hard mask film having an excellent etching selectivity, thereby obtaining a uniform pattern.

Abstract: The present invention provides a light-shielding image-carrying substrate including a substrate and a light-shielding image formed on at least part of at least one face of the substrate, wherein the light-shielding image includes at least two layers, and at least one of the at least two layers is a light-absorbing layer containing shape-anisotropic fine metal particles, and at least one layer of the at least two layers is a reflected light-absorbing layer.

Abstract: An etch resistant thermally curable Underlayer for use in a multiplayer liyhographic process to produce a photolithographic bilayer coated substrate, the composition having: (a) at least one cycloolefin polymer comprising at least one repeating unit of Structure (I), and at least one repeating unit of Structure (II), and optionally at least one repeating unit of Structure (III) with the proviso that neither Structure (I) nor Structure (II) nor Structure (III) contains acid sensitive groups. b) at least one cross-linking agent selected from the group consisting of an amino or phenolic cross-linking agent; c) a least one thermal acid generator (TAG); d) at lest one solvent; and e) optionally, at least one surfactant.

Abstract: A method of fabricating an electronic device is disclosed. The method of fabricating an electronic device comprises providing a substrate. A first conductive layer is formed on the substrate. A silylation polyphenol (PVP) dielectric layer is formed on the first conductive layer. A patterned second conductive layer is formed on the silylation PVP dielectric layer.

Abstract: The photosensitive resin composition of the present invention is a photosensitive resin composition comprising: (A) a binder polymer; (B) a photopolymerizable compound with at least one polymerizable ethylenic unsaturated group in the molecule; and (C) a photopolymerization initiator, wherein component (A) contains a polymer that contains a compound represented by the following general formula (I) as a polymerization component: CH2?C(L1)-COOL2??(I) (wherein L1 represents a hydrogen atom or methyl group and L2 represents a C2-20 alkyl group group) and component (B) contains a compound represented by the following general formula (II): (wherein R1 represents a hydrogen atom or methyl group, R2 represents a C3-20 alkyl group that has at least 2 tertiary or higher carbon atoms, X represents a C2-6 alkylene group, and n is an integer from 1 to 20).

Abstract: This invention provides a material for protective film formation, comprising at least an alkali soluble polymer comprising at least one of constitutional units represented by general formulae (I) and (II) and an alcoholic solvent. The material for protective film formation can simultaneously prevent a deterioration in a resist film during liquid immersion exposure and a deterioration in a liquid for liquid immersion exposure used and, at the same time, can form a resist pattern with a good shape without the need to increase the number of treatment steps.

Abstract: A recording layer including a novel dye for a high density optical recording medium, employing short wavelength laser source with a wavelength not longer than 530 nm for recording high density information and reproduction/playback of the high density information recordings, is provided.

Abstract: A composite photoresist structure includes a first organic layer disposed over a substrate to be etched, a sacrificial layer disposed on the first organic layer, and a second organic layer disposed on the sacrificial layer. The thickness of the first organic layer and the thickness of the second organic layer are both larger than the thickness of the sacrificial layer.

Abstract: A material comprising a novolac resin having a C6-C30 aromatic hydrocarbon group substituted with a sulfo group or an amine salt thereof is useful in forming a photoresist undercoat. The undercoat-forming material has an extinction coefficient sufficient to provide an antireflective effect at a thickness of at least 200 nm, and a high etching resistance as demonstrated by slow etching rates with CF4/CHF3 gas for substrate processing.

Abstract: A lithographic printing plate precursor comprising a hydrophilic support, an undercoat layer and a laser-sensitive photopolymerizable layer, wherein the undercoat layer contains a copolymer containing (a1) a repeating unit having at least one ethylenically unsaturated bond and (a2) a repeating unit having at least one functional group capable of interacting with a surface of the support, and the repeating unit (a1) is a repeating unit represented by the formula (A1) as defined herein.

Abstract: The invention provides a planographic printing plate precursor that is writable by laser exposure and is composed of a support, a photosensitive recording layer formed on the support, and a backcoat layer containing an epoxy resin, the backcoat layer being formed on the side of the support opposite to the photosensitive recording layer side; and a stack of the planographic printing plate precursors. According to the invention, scratches on the photosensitive recording side of the planographic printing plate precursor can be prevented when brought into contact with another planographic printing plate precursor in the stack without interleaving slip sheets, and productivity in a plate making process can be improved.

Abstract: A photosensitive lithographic printing plate comprising a hydrophilic support and a photopolymerizable photosensitive layer containing: (i) a sensitizing dye having an absorption maximum in a wavelength range of from 360 to 450 nm; (ii) a hexaarylbisimidazole compound; (iii) an addition polymerizable compound having an ethylenically unsaturated double bond; (iv) a binder polymer; and (v) a mercapto compound represented by the following formula (1) as defined herein.

Abstract: The present invention relates to a coating solution comprising a polymer obtained by reacting a glycoluril compound with at least one reactive compound containing at least one hydroxy group and/or at least one acid group, and further where the polymer is soluble in an organic solvent. The invention also relates to a process for imaging a photoresist coated over such a coating composition and to a polymer for the coating composition.

Abstract: An antireflection film composition, wherein an etching speed is fast, thus, when used as a resist lower layer, a film loss of a resist pattern and deformation of the pattern during etching can be minimized, and because of a high crosslinking density, a dense film can be formed after thermal crosslinking, thus, mixing with an upper layer resist can be prevented and the resist pattern after development is good is provided. The antireflection film composition comprising; at least a polymer having a repeating unit represented by the following general formula (I).

Abstract: There is provided an underlayer coating forming composition for lithography for forming an underlayer coating having a high dry etching rate compared with photoresist, causing no intermixing with the photoresist, and excellent in property of filling hole on the semiconductor substrate, which is used in lithography process of manufacture of semiconductor device. The composition comprises a cyclodextrin compound that 10% to 90% of total number of hydroxy groups in cyclodextrin is converted into an ether or ester group, a crosslinking compound, a crosslinking catalyst and a solvent.

Abstract: A method for producing a polymer structure on a patterning region of a substrate surface includes the steps of depositing an adhesion layer having a first polymer material onto the substrate surface, patterning the adhesion layer such that the first polymer material of the adhesion layer is removed in a first region and the first polymer material of the adhesion layer remains in a second region including the patterning region, depositing a polymer layer of a second polymer material onto the substrate surface and the adhesion layer and patterning the polymer layer such that the polymer structure forms in the second region.

Abstract: A heat-sensitive lithographic printing plate precursor is disclosed which comprises a support having a hydrophilic surface and a coating which does not dissolve in an aqueous alkaline developer in the unexposed areas and which becomes soluble in an aqueous alkaline developer in the exposed areas, and an intermediate layer between said hydrophilic surface or said hydrophilic layer and said coating, wherein the intermediate layer comprises a first polymer having a first monomeric unit of formula I wherein R1, R2 and R3 are independently a hydrogen atom or an optionally substituted alkyl group, R4 and R5 are independently an optionally substituted alkyl, cycloalkyl, aryl or arylalkyl group. The precursor exhibits an excellent differentiation in dissolution kinetics between the exposed and non-exposed areas of the coating and a high chemical resistance against printing liquids and press chemicals.

Abstract: A heat-sensitive positive-working lithographic printing plate precursor comprising (1) a support having a hydrophilic surface or which is provided with a hydrophilic layer, (2) a heat-sensitive coating, comprising an underlayer on said support and thereon an upperlayer, an IR absorbing agent in at least one of said underlayer and upperlayer, a phenolic resin in said upperlayer, and a first polymer in said underlayer, characterised in that said first polymer is an alkaline soluble polymer comprising a first sulfonamide containing monomeric unit having a specified structure according to formula I or formula II and a second amide containing monomeric unit having a specified structure according to formula III. The printing plates show an improved chemical resistance of the coating and a reduced undercutting of the image forming parts of the coating.

Abstract: A positive type photosensitive image-forming material for use with an infrared laser is provided. The material includes a substrate, a layer (A) containing not less than 50% by weight of a copolymer which contains, as a copolymerization component, not less than 10% by mol of at least one of the following monomers (a-1) to (a-3), wherein (a-1) is a monomer having in the molecule a sulfonamide group wherein at least one hydrogen atom is linked to a nitrogen atom, (a-2) is a monomer having in the molecule an active imino group represented by the following general formula (I): and (a-3) is a monomer selected from acrylamide, methacrylamide, acrylate, methacrylate and hydroxystyrene, which respectively have a phenolic hydroxyl group; and a layer (B) containing not less than 50% by weight of an aqueous alkali solution-soluble resin having a phenolic hydroxyl group. The layer (A) and the layer (B) are laminated on the substrate in that order.